JP3397470B2 - Optical element molding die and method of manufacturing the same - Google Patents
Optical element molding die and method of manufacturing the sameInfo
- Publication number
- JP3397470B2 JP3397470B2 JP25502294A JP25502294A JP3397470B2 JP 3397470 B2 JP3397470 B2 JP 3397470B2 JP 25502294 A JP25502294 A JP 25502294A JP 25502294 A JP25502294 A JP 25502294A JP 3397470 B2 JP3397470 B2 JP 3397470B2
- Authority
- JP
- Japan
- Prior art keywords
- intermediate layer
- optical element
- molding
- mold
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/31—Two or more distinct intermediate layers or zones
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/38—Mixed or graded material layers or zones
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、レンズ、プリズム等の
ガラスよりなる光学素子をガラス素材のプレス成形によ
り製造するのに使用される型及びその製造方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold used for manufacturing an optical element made of glass such as a lens and a prism by press molding of a glass material, and a manufacturing method thereof.
【０００２】[0002]
【従来の技術】研磨工程を必要としないでガラス素材の
プレス成形によってレンズを製造する技術は、従来のレ
ンズの製造において必要とされた複雑な工程をなくし、
簡単かつ安価にレンズを製造することを可能とし、近来
レンズのみならずプリズム、その他のガラスよりなる光
学素子の製造に使用されるようになってきた。2. Description of the Related Art A technique for manufacturing a lens by press molding a glass material without the need for a polishing step eliminates the complicated process required in the conventional lens manufacturing,
It has become possible to manufacture lenses easily and inexpensively, and it has come to be used for manufacturing not only lenses but also prisms and other optical elements made of glass.
【０００３】このようなガラスの光学素子のプレス成形
に使用される型材に要求される性質としては、硬さ、耐
熱性、離型性、鏡面加工性等に優れていることが挙げら
れる。従来、この種の型材として、金属、セラミックス
及びそれらをコーティングした材料等数多くの提案がさ
れている。いくつかの例を挙げるならば、特開昭４９−
５１１１２号公報には１３Ｃｒマルテンサイト鋼が、特
開昭５２−４５６１３号公報にはＳｉＣ及びＳｉ3 Ｎ4
が、特開昭６０−２４６２３０号公報には超硬合金に貴
金属をコーティングした材料が、特開平３−１３７０３
２号公報には超硬合金上にＴｉＮをコーティングした材
料が、また特開昭６１−１８３１３４号公報、特開昭６
１−２８１０３０号公報、特開平１−３０１８６４号公
報にはダイアモンド薄膜またはダイアモンド状炭素膜を
コーティングした材料が、特開昭６４−８３５２９号公
報には硬質炭素膜をコーティングした材料が提案されて
いる。Properties required for the mold material used for press molding of such glass optical elements include excellent hardness, heat resistance, mold release property, mirror surface workability and the like. Heretofore, as this type of mold material, many proposals have been made such as metals, ceramics and materials coated with them. To give some examples, JP-A-49-
51112 discloses 13Cr martensitic steel, and JP-A-52-45613 discloses SiC and Si 3 N 4.
However, in JP-A-60-246230, a material obtained by coating a cemented carbide with a noble metal is disclosed in JP-A-3-13703.
No. 2 discloses a material in which a cemented carbide is coated with TiN, and JP-A No. 61-183134 and JP-A No. 6-183134.
JP-A 1-281030 and JP-A-1-301864 propose a material coated with a diamond thin film or a diamond-like carbon film, and JP-A 64-83529 proposes a material coated with a hard carbon film. .
【０００４】[0004]
【発明が解決しようとする課題】しかし、１３Ｃｒマル
テンサイト鋼は酸化し易く、更に高温下でＦｅがガラス
中に拡散してガラスが着色するという欠点を持つ。ま
た、ＳｉＣ，Ｓｉ3 Ｎ4 は一般的に酸化されにくいとさ
れるが、高温下ではやはり酸化が起こり、表面にＳｉＯ
2 の膜が形成されるためガラスと融着を起こす。一方、
貴金属をコーティングした材料は融着を起こしにくい
が、極めて柔らかいため傷がつき易くまた変形し易い欠
点を持つ。また、ダイアモンド薄膜、ダイアモンド状炭
素膜、水素化アモルファス炭素膜、硬質炭素膜を用いた
型は、型とガラスの離型性が良く、ガラスの融着を起こ
さないが、成形操作を数百回以上繰り返して行うと、前
記膜が部分的に剥離し、成形品において十分な成形性能
が得られないことがある。また、型母材の一つの材料で
ある超硬合金上にＴｉＮなどの中間層を設け、成形によ
る型母材の変形や酸化劣化を防止する手法が特開平３−
１３７０３２号公報に提案されているが、型母材と中間
層の密着が悪い場合、成形操作を数百回以上繰り返して
行うと、前記膜が部分的に剥離し、成形品において十分
な成形性能が得られないことがある。However, 13Cr martensitic steel is apt to oxidize, and further, Fe diffuses into the glass at a high temperature and the glass is colored. Although SiC and Si 3 N 4 are generally considered to be difficult to oxidize, they also oxidize at high temperatures, resulting in SiO 2 on the surface.
Since the film of 2 is formed, it fuses with the glass. on the other hand,
A material coated with a noble metal is unlikely to cause fusion, but has the drawback that it is easily soft and easily deformed because it is extremely soft. Further, the mold using the diamond thin film, the diamond-like carbon film, the hydrogenated amorphous carbon film, and the hard carbon film has a good mold-releasing property between the mold and the glass, and does not cause glass fusion, but the molding operation is performed several hundred times. When the above process is repeated, the film may be partially peeled off, and a molded product may not have sufficient molding performance. In addition, a method of forming an intermediate layer such as TiN on a cemented carbide which is one of the materials for the mold base material to prevent the deformation and oxidative deterioration of the mold base material due to molding is disclosed in Japanese Patent Laid-Open No. 3-300.
As proposed in Japanese Patent No. 137032, when the adhesion between the mold base material and the intermediate layer is poor, the film is partially peeled off when the molding operation is repeated several hundred times or more, and the molding product has sufficient molding performance. May not be obtained.
【０００５】従って、本発明の目的は、プレス成形を多
数回行っても中間層の剥離やクラック、傷等の欠陥が生
じない極めて耐久性の高い光学素子成形用型及びその製
造方法を提供することにある。Therefore, an object of the present invention is to provide an optical element molding die having extremely high durability, which does not cause defects such as peeling, cracks and scratches of the intermediate layer even if press molding is carried out many times, and a manufacturing method thereof. Especially.
【０００６】[0006]
【課題を解決するための手段及び作用】すなわち、本発
明は、ガラスよりなる光学素子のプレス成形に用いる成
形用型において、型母材と成形表面層の間に中間層を有
し、型母材を構成する少なくとも１種類以上の元素の濃
度が型母材側から中間層側に向かって減少しかつ中間層
を構成する少なくとも１種類以上の元素の濃度が中間層
側から型母材側に向かって減少しているミキシング層を
有し、中間層材料がＴｉＮ、ＴａＮ、ＺｒＮ及びＨｆＮ
から選ばれ、かつ、成形表面層が炭素またはＰｔと、中
間層を構成する元素の少なくとも１種類以上からなり、
炭素原子またはＰｔ濃度が中間層側に向かって減少しか
つその他の原子濃度が表面層側に向かって減少している
ミキシング層を有することを特徴とする光学素子成形用
型である。That is, the present invention provides a mold for use in press molding of an optical element made of glass, which has an intermediate layer between a mold base material and a molding surface layer, The concentration of at least one element constituting the material decreases from the mold base material side toward the intermediate layer side, and the concentration of at least one element constituting the intermediate layer changes from the intermediate layer side to the mold base material side. headed have a mixing layer which has decreased, the intermediate layer material is TiN, TaN, ZrN and HfN
And the molding surface layer is carbon or Pt, and
Consisting of at least one of the elements that make up the interlayer,
Only the carbon atom or Pt concentration decreases toward the intermediate layer side
And other atomic concentrations decrease toward the surface layer
Is a type optical element molding characterized by have a mixing layer.
【０００７】本発明はイオンビーム等により型母材と中
間層の間にミキシング層を設け、従来型母材上に設けて
いた中間層の型母材への密着力を上げることにより上述
の問題を解決したものである。図１−ａにミキシングの
状態を模式図で示す。図１−ａ中破線の左側が「ミキシ
ング層」、破線の右側が「型母材又は中間層」である。
図１−ｂはそのイメージ図である。図１−ａ中横軸は表
面から型母材に向かう深さを表しており、深さ０の位置
が表面である。一方、縦軸は原子濃度を表している。ミ
キシング層の状態は、中間層を構成する原子（例えばＴ
ｉ）の原子濃度が表面に向かって増大し母材側に向かっ
て減少しているのに対し、その他の原子濃度が表面に向
かって減少し母材側に向かって増加していることが主た
る特徴である。According to the present invention, a mixing layer is provided between the mold base material and the intermediate layer by an ion beam or the like to increase the adhesion of the intermediate layer provided on the conventional mold base material to the mold base material. Is the solution. FIG. 1-a shows a schematic view of the mixing state. The left side of the broken line in Fig.
And the right side of the broken line is the "mold base material or intermediate layer".
FIG. 1-b is an image diagram thereof. The horizontal axis in FIG. 1-a represents the depth from the surface toward the die base material, and the position where the depth is 0 is the surface. On the other hand, the vertical axis represents the atomic concentration. The state of the mixing layer depends on the atoms (for example, T
While the atomic concentration of i) increases toward the surface and decreases toward the base metal side, the other atomic concentrations mainly decrease toward the surface and increase toward the base metal side. It is a feature.
【０００８】以下にその作用を示す。従来の型母材上に
中間層を設ける場合、ＰＶＤやＣＶＤなどの手法が知ら
れているが、数百回以上の高耐久光学素子成形用型とし
ては十分な密着力が得られない場合がある。その原因は
型母材と中間層の密着が良くないことが考えられる。そ
こで、型母材成分と中間層成分が混じり合う界面（ミキ
シング層）を作ることにより密着力を上昇させた。上記
界面（ミキシング層）は成形時の熱サイクルによる型母
材と中間層の熱膨張率差が起こす型母材と中間層間の応
力を吸収することができる。また、成形時の型−ガラス
間に発生する密着力にも耐え得る強度が得られる。The operation will be described below. When providing an intermediate layer on a conventional mold base material, PVD, CVD, and other techniques are known, but there are cases where sufficient adhesion cannot be obtained as a mold for molding a highly durable optical element several hundred times or more. is there. It is considered that the reason is that the adhesion between the mold base material and the intermediate layer is not good. Therefore, the adhesive force was increased by forming an interface (mixing layer) in which the mold base material component and the intermediate layer component were mixed. The interface (mixing layer) can absorb the stress between the mold base material and the intermediate layer caused by the difference in the coefficient of thermal expansion between the mold base material and the intermediate layer due to the thermal cycle at the time of molding. Further, the strength that can withstand the adhesion force generated between the mold and the glass during molding can be obtained.
【０００９】[0009]
【実施例】［参考例１ Ｐｔ表面層、ＴｉＮ中間層、
（ＴｉＮ，ＷＣ）ミキシング層］
図２、図３は参考例に係わる光学素子成形用型の一つの
実施様態を示すものである。図２は光学素子のプレス成
形面の状態を示し、図３は光学素子成形後の状態を示
す。図２中１，２は型母材、１−ａ，２−ａは成形表面
層であるＰｔ膜、１−ｃ，２−ｃは中間層であるＴｉＮ
膜、１−ｄ，２−ｄは中間層と型母材のミキシング層で
あり、図２中３はガラス素材であり、図３中４は光学素
子である。図２、３に示すように型の間に置かれたガラ
ス素材３をプレス成形することによってレンズ等の光学
素子４ができる。EXAMPLES [ Reference Example 1 Pt surface layer, TiN intermediate layer,
(TiN, WC) Mixing Layer] FIGS. 2 and 3 show an embodiment of an optical element molding die according to the reference example . 2 shows the state of the press-molded surface of the optical element, and FIG. 3 shows the state after the optical element is molded. 2, 1 and 2 are mold base materials, 1-a and 2-a are Pt films which are molding surface layers, and 1-c and 2-c are TiN which are intermediate layers.
Membranes 1-d and 2-d are a mixing layer of the intermediate layer and the mold base material, 3 in FIG. 2 is a glass material, and 4 in FIG. 3 is an optical element. As shown in FIGS. 2 and 3, the glass material 3 placed between the molds is press-molded to form the optical element 4 such as a lens.
【００１０】次に、参考例の光学素子成形用型について
詳細に説明する。Next, the optical element molding die of the reference example will be described in detail.
【００１１】型母材として超硬合金を所定の形状に加工
した後、成形面をＲｍａｘ＝０．０２μｍに鏡面研磨し
た。この型をよく洗浄した後、図６に示す成膜装置に設
置した。図中１１は真空槽、１２はイオンビーム装置、
１３はイオン化室、１４はガス導入口、１５はイオンビ
ーム引き出しグリット、１６はイオンビーム、１７は取
り付けられた型、１８は基板ホルダー及びヒーター、１
９は排気口、２５はバイアス電源、４４はイオン化電
極、４５は直流電源、４６は電子銃、４７は金属チタン
である。まず、真空槽１１内を４×１０-3Ｐａまで減圧
し、ガス導入口よりアルゴンガス１０ＳＣＣＭをイオン
化室に導入しイオン化した後、イオンビーム引き出しグ
リットに５００Ｖの電圧を印加してイオンビームを引き
出し、基板バイアスを−３００Ｖかけ、型表面に５分間
照射して型表面の洗浄を行った。次に、窒素ガス３０Ｓ
ＣＣＭをイオン化室に導入してガス圧３．５×１０-2Ｐ
ａとし、加速電圧９ＫｅＶ−エミッション電流３００ｍ
Ａの電子線蒸着条件で金属チタンを蒸発させ、加速電圧
１０ＫｅＶで窒素イオンビームを引き出し、型表面に照
射して０．１μｍの金属チタン、窒素と型母材とのミキ
シング層を得た。次に、加速電圧２００Ｖで窒素イオン
ビームを引き出し型表面に照射しながらイオン化電極に
＋２０Ｖの電圧をかけ、イオンプレーティングにより型
表面にＴｉＮ膜を１μｍ形成した。次に、金属チタンタ
ーゲットをＰｔターゲットに切り替え、連続してＰｔ膜
をＴｉＮ上に形成した。なお、この時のＰｔ膜成膜は加
速電圧９ＫｅＶ−エミッション電流４００ｍＡの電子線
蒸着条件でＰｔを蒸発させ、１００ｎｍの膜厚に成膜し
た。After processing a cemented carbide as a mold base material into a predetermined shape, the molding surface was mirror-polished to Rmax = 0.02 μm. After thoroughly washing this mold, it was installed in the film forming apparatus shown in FIG. In the figure, 11 is a vacuum chamber, 12 is an ion beam device,
13 is an ionization chamber, 14 is a gas inlet, 15 is an ion beam extraction grit, 16 is an ion beam, 17 is a mold attached, 18 is a substrate holder and a heater, 1
9 is an exhaust port, 25 is a bias power supply, 44 is an ionization electrode, 45 is a direct current power supply, 46 is an electron gun, and 47 is metallic titanium. First, the pressure inside the vacuum chamber 11 was reduced to 4 × 10 −3 Pa, 10 SCCM of argon gas was introduced into the ionization chamber through the gas introduction port for ionization, and then a voltage of 500 V was applied to the ion beam extraction grid to extract the ion beam. The substrate surface was washed by applying a substrate bias of -300 V and irradiating the surface of the die for 5 minutes. Next, nitrogen gas 30S
Gas pressure of 3.5 × 10 -2 P by introducing CCM into the ionization chamber
a, acceleration voltage 9 KeV-emission current 300 m
Metallic titanium was evaporated under the electron beam evaporation conditions of A, a nitrogen ion beam was extracted at an accelerating voltage of 10 KeV, and the surface of the mold was irradiated to obtain a mixing layer of 0.1 μm of metallic titanium, nitrogen and the mold base material. Next, a voltage of +20 V was applied to the ionization electrode while irradiating the mold surface with a nitrogen ion beam at an acceleration voltage of 200 V, and a TiN film of 1 μm was formed on the mold surface by ion plating. Next, the metallic titanium target was switched to the Pt target, and a Pt film was continuously formed on TiN. At this time, the Pt film was formed by evaporating Pt under an electron beam evaporation condition of an acceleration voltage of 9 KeV and an emission current of 400 mA to form a film having a thickness of 100 nm.
【００１２】次に、参考例による光学素子成形用型によ
ってプレス成形を行った例を示す。図７は光学素子成形
装置の断面図である。以下に参考例の光学素子成形用型
を用いた光学素子の製造方法を記す。ガラスブランク置
き台５０から不図示のオートハンドであらかじめ所定の
量に調整したゴブ状のクラウン系ガラスブランク（ＳＫ
１２）５１をシフタ１７２へ搬送し、シリンダ１８０の
制御によりピストンロッド１８０Ａを上昇させ、入換え
チャンバー１７１を上昇して、その開口１７１Ａを上記
ゲートバルブ１１０に気密に密着し、不図示のロータリ
ーポンプで入換えチャンバー１７１内を約１Ｐａまで減
圧し、その後窒素ガスを充填し、ゲートバルブ１１０を
開放して、成形チャンバー３００と入換えチャンバー１
７１とを連通する。そして、昇降機１７３でガラスブラ
ンクが置かれたシフタ１７２を成形チャンバー３００内
に導入し、旋回ハンドル回転軸４０１を軸に回転する旋
回ハンド４００を用い、吸着ハンド４０３でシフタ１７
２上のガラスブランクを吸着搬送し、胴型１００内に組
み込んだ光学素子成形用の上型と下型の間に投入し、該
下型上にガラスブランク５１を置いた。[0012] Next, an example of press molding was carried out by the optical element molding die according to a reference example. FIG. 7 is a sectional view of the optical element molding apparatus. The method for producing an optical element using the optical element molding die of Reference Example will be described below. A gob-shaped crown-type glass blank (SK-blank) that has been adjusted to a predetermined amount from the glass blank holder 50 by an auto hand (not shown).
12) 51 is conveyed to the shifter 172, the piston rod 180A is moved up by the control of the cylinder 180, the exchange chamber 171 is moved up, and the opening 171A is airtightly attached to the gate valve 110. The exchange chamber 171 is depressurized to about 1 Pa, then nitrogen gas is filled, the gate valve 110 is opened, and the molding chamber 300 and the exchange chamber 1 are opened.
It communicates with 71. Then, the shifter 172 on which the glass blank is placed by the elevator 173 is introduced into the molding chamber 300, and the swivel hand 400 that rotates about the swivel handle rotation shaft 401 is used, and the shifter 17 is moved by the suction hand 403.
The glass blank on 2 was suction-conveyed and put into a space between the upper mold and the lower mold for molding an optical element incorporated in the barrel mold 100, and the glass blank 51 was placed on the lower mold.
【００１３】次に、型温を上昇させブランク温度が６２
０℃になった段階で、上記シリンダの制御により、光学
素子成形用上型と一体になっている上軸ロッド２００を
下降し、荷重３０００Ｎでガラスブランクのプレス成形
を行った。プレス終了後、−８０℃／ｍｉｎの速度で冷
却し、４００℃で型を開き、成形品を吸着ハンド４０３
で取り出し、シフタ１７２上に置き、昇降機１７３でシ
フタ１７２を降ろし、ゲートバルブ１１０を閉め、入換
えチャンバー１７１を降ろし、不図示のオートハンドで
成形品を取り出した。上記のようにしてクラウン系光学
ガラス（軟化点Ｓｐ＝６９２℃，転移点Ｔｇ＝５５０
℃）を使用して図３に示すレンズを成形した。以上のよ
うなプレス行程により１００００回成形した後の型部材
の成形面及び成形された光学素子の表面粗さ、並びに型
部材と成形された光学素子との離型性は良好であった。
特に、型部材の成形面について光学顕微鏡、走査電子顕
微鏡（ＳＥＭ）で観察しても傷やクラック等の欠陥やガ
ラス成分の反応析出物、ガラスの融着はなかった。Next, the mold temperature is raised to a blank temperature of 62.
When the temperature reached 0 ° C., the upper shaft rod 200 integrated with the optical element molding upper die was lowered by the control of the cylinder, and the glass blank was press-molded with a load of 3000 N. After the press is finished, it is cooled at a rate of −80 ° C./min, the mold is opened at 400 ° C., and the molded product is sucked by a hand 403.
And then placed on the shifter 172, the shifter 172 was lowered by the elevator 173, the gate valve 110 was closed, the exchange chamber 171 was lowered, and the molded product was taken out by an unillustrated auto hand. As described above, the crown optical glass (softening point Sp = 692 ° C., transition point Tg = 550
C) was used to mold the lens shown in FIG. The molding surface of the mold member and the surface roughness of the molded optical element after molding 10,000 times by the above pressing process and the releasability between the mold member and the molded optical element were good.
In particular, when the molding surface of the mold member was observed with an optical microscope or a scanning electron microscope (SEM), defects such as scratches and cracks, reaction precipitates of glass components, and glass fusion did not occur.
【００１４】［実施例１ Ｐｔ表面層、（Ｐｔ，Ｔｉ
Ｎ）ミキシング層、ＴｉＮ中間層、（ＴｉＮ，ＷＣ）ミ
キシング層］
図４及び図５は本発明に係わる光学素子成形用型の一つ
の実施様態を示すものである。図４は光学素子のプレス
成形面の状態を示し、図５は光学素子成形後の状態を示
す。図４中１，２は型母材である超硬合金、１−ａ，２
−ａは成形表面層であるＰｔ膜、１−ｂ，２−ｂは成形
表面層と中間層のミキシング層、１−ｃ，２−ｃは中間
層であるＴｉＮ膜、１−ｄ，２−ｄは中間層と型母材の
ミキシング層であり、図４中３はガラス素材であり、図
５中４は光学素子である。図４、５に示すように型の間
に置かれたガラス素材３をプレス成形することによって
レンズ等の光学素子４ができる。Example 1 Pt surface layer, (Pt, Ti
N) Mixing Layer, TiN Intermediate Layer, (TiN, WC) Mixing Layer] FIGS. 4 and 5 show one embodiment of the optical element molding die according to the present invention. FIG. 4 shows the state of the press-molded surface of the optical element, and FIG. 5 shows the state after the optical element is molded. In FIG. 4, reference numerals 1 and 2 are cemented carbide as a base material, 1-a and 2
-A is a Pt film which is a molding surface layer, 1-b and 2-b are mixing layers of a molding surface layer and an intermediate layer, 1-c and 2-c are TiN films which are intermediate layers, 1-d and 2- d is a mixing layer of the intermediate layer and the mold base material, 3 in FIG. 4 is a glass material, and 4 in FIG. 5 is an optical element. As shown in FIGS. 4 and 5, the glass material 3 placed between the molds is press-molded to form the optical element 4 such as a lens.
【００１５】次に本発明の光学素子成形用型について詳
細に説明する。Next, the optical element molding die of the present invention will be described in detail.
【００１６】中間層であるＴｉＮと型母材である超硬合
金とのミキシング層及び中間層の成膜は参考例１と同様
に行った。The mixing layer of TiN as the intermediate layer and the cemented carbide as the die base material and the intermediate layer were formed in the same manner as in Reference Example 1.
【００１７】次に、成形表面層であるＰｔ膜の成膜につ
いて述べる。Next, the formation of the Pt film which is the molding surface layer will be described.
【００１８】ＴｉＮ成膜終了後、ＴｉターゲットをＰｔ
ターゲットに切り替え、連続してＰｔ膜をミキシング層
を作りながらＴｉＮ上に形成した。このときの製造方法
を次に述べる。真空度を４×１０-3Ｐａまで上げアルゴ
ンガスを２０ｓｃｃｍイオン化室に導入してガス圧３．
５×１０-2Ｐａとし、加速電圧９ＫｅＶ−エミッション
電流４００ｍＡの電子線蒸着条件でＰｔを蒸発させ、加
速電圧１０ＫｅＶでイオンビームを引き出し、型表面に
照射してＰｔと型母材とのミキシング層約３０ｎｍを設
け膜厚１００ｎｍの成形表面膜を得た。After the TiN film formation, the Ti target is changed to Pt.
After switching to the target, a Pt film was continuously formed on TiN while forming a mixing layer. The manufacturing method at this time will be described below. 2. The vacuum degree was raised to 4 × 10 −3 Pa, and argon gas was introduced into the 20 sccm ionization chamber to obtain a gas pressure of 3.
Pt is evaporated under electron beam deposition conditions of 5 × 10 -2 Pa and acceleration voltage of 9 KeV-emission current of 400 mA, an ion beam is extracted at an acceleration voltage of 10 KeV, and the mold surface is irradiated to mix Pt and the mold base material. About 30 nm was provided to obtain a molded surface film having a film thickness of 100 nm.
【００１９】次に、上記参考例１に示した方法によって
ガラスレンズのプレス成形を行った結果、２００００回
成形した後の型部材の成形面及び成形された光学素子の
表面粗さ、並びに型部材と成形された光学素子との離型
性は良好であった。特に、型部材の成形面について光学
顕微鏡、走査電子顕微鏡（ＳＥＭ）で観察しても膜剥離
や傷やクラック等の欠陥やガラス成分の反応析出物、ガ
ラスの融着はなかった。Next, as a result of press molding of the glass lens by the method shown in Reference Example 1, the molding surface of the mold member after molding 20,000 times and the surface roughness of the molded optical element, and the mold member. The mold releasability between the molded optical element and In particular, when the molding surface of the mold member was observed with an optical microscope or a scanning electron microscope (SEM), defects such as film peeling, scratches and cracks, reaction precipitates of glass components, and glass fusion did not occur.
【００２０】［参考例２ 炭化水素膜表面層、ＴｉＮ中
間層、（ＴｉＮ，ＷＣ）ミキシング層］
本参考例の構成は参考例１の構成と同等である。つまり
図２中１，２は型母材である超硬合金、１−ａ，２−ａ
は成形表面層である炭化水素膜、１−ｃ，２−ｃの中間
層はＴｉＮ、１−ｄ，２−ｄは中間層と型母材のミキシ
ング層である。中間層であるＴｉＮと型母材である超硬
合金とのミキシング層および中間層の成膜は参考例１と
同様に行った。[ Reference Example 2 Hydrocarbon film surface layer, TiN intermediate layer, (TiN, WC) mixing layer] The configuration of this Reference Example is the same as that of Reference Example 1. That is, reference numerals 1 and 2 in FIG.
Is a hydrocarbon film which is a molding surface layer, TiN is an intermediate layer of 1-c and 2-c, and 1-d and 2-d are mixing layers of the intermediate layer and the mold base material. The mixing layer of TiN as the intermediate layer and the cemented carbide as the die base material and the intermediate layer were formed in the same manner as in Reference Example 1.
【００２１】次に、成形表面層である炭化水素膜の成膜
について述べる。図８は図５の成膜装置にいわゆる容量
結合型高周波プラズマＣＶＤ装置を加えたものであって
原料ガスの供給系２７、高周波放電（あるいは直流電源
でもよい）発生手段などが図５に示す装置に追加されて
いる。すなわち、図８中２８は上記高周波放電発生手段
のコイル状アンテナであり、これには真空槽１１の外側
に設けた高周波放電用電源３０からマッチングボックス
２９を介して高周波電流が供給される。次に、炭化水素
膜の成膜方法を述べる。ＴｉＮ成膜終了後、真空度４×
１０-3Ｐａとし、基板バイアス−３００Ｖをかけ、原料
ガス供給系２７からＣＨ4 ガスを上記成膜チャンバーに
供給する。また、高周波電源３０からマッチングボック
ス２９を介して高周波電力をアンテナ２８に供給し、放
電を開始した後、ＣＨ4 ガスを１×１０-1Ｐａに調整す
る。このように高周波放電を開始すると、ＣＨ4 ガスの
放電で型表面に炭化水素膜が成膜される。この手法によ
りＴｉＮ上に１００ｎｍの炭化水素膜を成膜した。Next, the formation of the hydrocarbon film which is the molding surface layer will be described. FIG. 8 shows a film-forming apparatus of FIG. 5 to which a so-called capacitively coupled high-frequency plasma CVD apparatus is added, and the source gas supply system 27, high-frequency discharge (or DC power supply) generating means, etc. are shown in FIG. Has been added to. That is, reference numeral 28 in FIG. 8 denotes a coil-shaped antenna of the high-frequency discharge generating means, to which a high-frequency current is supplied from a high-frequency discharge power source 30 provided outside the vacuum chamber 11 via a matching box 29. Next, a method for forming the hydrocarbon film will be described. After TiN film formation, vacuum degree 4 ×
The substrate bias is set to 10 −3 Pa, a substrate bias of −300 V is applied, and CH 4 gas is supplied from the source gas supply system 27 to the film formation chamber. Further, high frequency power is supplied from the high frequency power supply 30 to the antenna 28 through the matching box 29 to start the discharge, and then the CH 4 gas is adjusted to 1 × 10 −1 Pa. When the high frequency discharge is started in this way, a hydrocarbon film is formed on the mold surface by the discharge of CH 4 gas. A hydrocarbon film having a thickness of 100 nm was formed on TiN by this method.
【００２２】次に、上記参考例１に示した方法によって
ガラスレンズのプレス成形を行った結果、２００００回
成形した後の型部材の成形面及び成形された光学素子の
表面粗さ、並びに型部材と成形された光学素子との離型
性は良好であった。特に、型部材の成形面について光学
顕微鏡、走査電子顕微鏡（ＳＥＭ）で観察しても膜剥離
や傷やクラック等の欠陥やガラス成分の反応析出物、ガ
ラスの融着はなかった。Next, as a result of press molding of the glass lens by the method shown in Reference Example 1, the molding surface of the mold member after molding 20000 times, the surface roughness of the molded optical element, and the mold member. The mold releasability between the molded optical element and In particular, when the molding surface of the mold member was observed with an optical microscope or a scanning electron microscope (SEM), defects such as film peeling, scratches and cracks, reaction precipitates of glass components, and glass fusion did not occur.
【００２３】［実施例２ 硬質炭素膜表面層、（硬質炭
素膜，ＴｉＮ）ミキシング層、ＴｉＮ中間層、（Ｔｉ
Ｎ，ＷＣ）ミキシング層］
図４及び図５は本発明に係わる光学素子成形用型の一つ
の実施様態を示すものである。図４は光学素子のプレス
成形面の状態を示し、図５は光学素子成形後の状態を示
す。図４中１，２は型母材、１−ａ，２−ａは硬質炭素
膜、１−ｂ，２−ｂは硬質炭素膜と中間層のミキシング
層、１−ｃ，２−ｃは中間層であるＴｉＮ膜、１−ｄ，
２−ｄは中間層と型母材のミキシング層であり、図４中
３はガラス素材であり、図５中４は光学素子である。図
４、５に示すように型の間に置かれたガラス素材３をプ
レス成形することによってレンズ等の光学素子４ができ
る。Example 2 Hard carbon film surface layer, (hard carbon film, TiN) mixing layer, TiN intermediate layer, (Ti
N, WC) Mixing Layer] FIGS. 4 and 5 show one embodiment of the optical element molding die according to the present invention. FIG. 4 shows the state of the press-molded surface of the optical element, and FIG. 5 shows the state after the optical element is molded. 4, 1 and 2 are mold base materials, 1-a and 2-a are hard carbon films, 1-b and 2-b are mixing layers of hard carbon film and an intermediate layer, and 1-c and 2-c are intermediate. TiN film which is a layer, 1-d,
2-d is a mixing layer of the intermediate layer and the mold base material, 3 in FIG. 4 is a glass material, and 4 in FIG. 5 is an optical element. As shown in FIGS. 4 and 5, the glass material 3 placed between the molds is press-molded to form the optical element 4 such as a lens.
【００２４】次に、本発明の光学素子成形用型について
詳細に説明する。Next, the optical element molding die of the present invention will be described in detail.
【００２５】型母材として超硬合金を所定の形状に加工
した後、成形面をＲｍａｘ＝０．０２μｍに鏡面研磨し
た。この型をよく洗浄した後、図６に示す成膜装置に設
置した。図中１１は真空槽、１２はイオンビーム装置、
１３はイオン化室、１４はガス導入口、１５はイオンビ
ーム引き出しグリット、１６はイオンビーム、１７は取
りつけられた型、１８は基板ホルダー及びヒーター、１
９は排気口、４４はイオン化電極、４５は直流電源、４
６は電子銃、４７は金属チタンである。まず、真空槽１
１内を４×１０-3Ｐａまで減圧し、ガス導入口よりアル
ゴンガス１０ＳＣＣＭをイオン化室に導入しイオン化し
た後、イオンビーム引き出しグリットに５００Ｖの電圧
を印加してイオンビームを引き出し、型表面に５分間照
射して型表面の洗浄を行った。次に、窒素ガス３０ＳＣ
ＣＭをイオン化室に導入してガス圧３．５×１０-2Ｐａ
とし、加速電圧９ＫｅＶ−エミッション電流３００ｍＡ
の電子線蒸着条件で金属チタンを蒸発させ、加速電圧９
ＫｅＶで窒素イオンビームを引き出し、型表面に照射し
て０．１μｍの金属チタン、窒素と型母材とのミキシン
グ層を得た。次に、加速電圧２００Ｖで窒素イオンビー
ムを引き出し型表面に照射しながらイオン化電極に＋２
０Ｖの電圧をかけ、イオンプレーティングにより型表面
にＴｉＮ膜を１μｍ形成した。次に、ＣＨ4 １５ＳＣＣ
Ｍ，Ｈ2 ３０ＳＣＣＭをイオン化室に導入してガス圧
３．５×１０-2Ｐａとし、加速電圧１０ＫｅＶでイオン
ビームを引き出し成形面に照射してミキシング層を約３
０ｎｍ形成し、成形表面に１００ｎｍの硬質炭素膜を成
膜し光学素子成形用型を得た。After processing a cemented carbide as a mold base material into a predetermined shape, the molding surface was mirror-polished to Rmax = 0.02 μm. After thoroughly washing this mold, it was installed in the film forming apparatus shown in FIG. In the figure, 11 is a vacuum chamber, 12 is an ion beam device,
13 is an ionization chamber, 14 is a gas inlet, 15 is an ion beam extraction grit, 16 is an ion beam, 17 is a mold attached, 18 is a substrate holder and a heater, 1
9 is an exhaust port, 44 is an ionization electrode, 45 is a DC power source, 4
6 is an electron gun and 47 is metallic titanium. First, the vacuum tank 1
After depressurizing the inside of 1 to 4 × 10 −3 Pa and introducing 10 SCCM of argon gas into the ionization chamber from the gas inlet to ionize it, a voltage of 500 V is applied to the ion beam extraction grit to extract the ion beam, and then the mold surface The mold surface was washed by irradiation for 5 minutes. Next, nitrogen gas 30SC
Gas pressure is 3.5 × 10 -2 Pa by introducing CM into the ionization chamber.
And acceleration voltage 9 KeV-emission current 300 mA
The metal titanium is evaporated under the electron beam evaporation conditions of
A nitrogen ion beam was extracted with KeV and irradiated on the mold surface to obtain a 0.1 μm metallic titanium / nitrogen / mixing layer of the mold base material. Next, while irradiating the surface of the extraction mold with a nitrogen ion beam at an acceleration voltage of 200 V, +2 is applied to the ionization electrode.
A voltage of 0 V was applied to form a TiN film of 1 μm on the mold surface by ion plating. Next, CH 4 15SCC
M, H 2 30 SCCM was introduced into the ionization chamber to a gas pressure of 3.5 × 10 -2 Pa, an ion beam was extracted at an accelerating voltage of 10 KeV, and the molding surface was irradiated with about 3 layers of the mixing layer.
Then, a hard carbon film having a thickness of 100 nm was formed on the molding surface to obtain an optical element molding die.
【００２６】次に、上記参考例１に示した方法によって
ガラスレンズのプレス成形を行った結果、２００００回
成形した後の型部材の成形面及び成形された光学素子の
表面粗さ、並びに型部材と成形された光学素子との離型
性は良好であった。特に、型部材の成形面について光学
顕微鏡、走査電子顕微鏡（ＳＥＭ）で観察しても膜剥離
や傷やクラック等の欠陥やガラス成分の反応析出物、ガ
ラスの融着はなかった。Next, as a result of press molding of the glass lens by the method shown in Reference Example 1, the molding surface of the mold member after molding 20000 times, the surface roughness of the molded optical element, and the mold member. The mold releasability between the molded optical element and In particular, when the molding surface of the mold member was observed with an optical microscope or a scanning electron microscope (SEM), defects such as film peeling, scratches and cracks, reaction precipitates of glass components, and glass fusion did not occur.
【００２７】以下、参考例３〜４８、実施例３〜４８に
ついて参考例１〜２、実施例１〜２を含め次表にまとめ
る。 Reference Examples 3 to 48 and Examples 3 to 48 are summarized in the following table including Reference Examples 1 and 2 and Examples 1 and 2 .
【００２８】なお、成形表面層にはＰｔ、炭化水素膜、
硬質炭素膜をイオンビーム蒸着、高周波プラズマＣＶＤ
により中間層上に成膜した。The molded surface layer contains Pt, a hydrocarbon film,
Ion beam evaporation of hard carbon film, high frequency plasma CVD
To form a film on the intermediate layer.
【００２９】また、中間層材料であるＴａＮ，ＺｒＮ，
ＨｆＮは参考例１の蒸発源（図６の４７）をそれぞれの
金属であるＴａ，Ｚｒ，Ｈｆに置き換えて成膜した。Further, the intermediate layer materials TaN, ZrN,
HfN was formed by replacing the evaporation source of Reference Example 1 (47 in FIG. 6) with Ta, Zr, and Hf, which are the respective metals.
【００３０】また、型母材材料であるサーメットはＴｉ
Ｎ−ＴｉＣ系のものを、高膨張鋼材は日立金属製ＹＨＤ
５０ＦＭ（α＝１７×１０-6）等を用いた。Cermet, which is the material of the die base material, is made of Ti.
N-TiC type, high expansion steel material is YHD made by Hitachi Metals
50FM (α = 17 × 10 −6 ) or the like was used.
【００３１】[0031]
【表１】 [Table 1]
【００３２】[0032]
【表２】 [Table 2]
【００３３】[0033]
【表３】 [Table 3]
【００３４】[0034]
【表４】 [Table 4]
【００３５】[0035]
【発明の効果】以上説明したように本発明の光学素子成
形用型によれば、型母材と中間層間にミキシング層を設
け、型母材と中間層の密着を高めたことにより、ガラス
のプレス成形において中間層の型母材からの剥離を抑え
ることに成功した。更にこの型を用いてプレス成形を多
数回行っても中間層の剥離やクラック、傷等の欠陥が生
じない極めて耐久性の高い光学素子成形用型が得られ
た。As described above, according to the optical element molding die of the present invention, the mixing layer is provided between the die base material and the intermediate layer to enhance the adhesion between the die base material and the intermediate layer. In press molding, we succeeded in suppressing the peeling of the intermediate layer from the mold base material. Further, even if press molding was carried out a number of times using this mold, an extremely durable optical element molding mold was obtained in which defects such as peeling, cracks and scratches of the intermediate layer did not occur.
【００３６】本発明により得られた光学素子成形用型を
用いることにより、生産性の向上とコストダウンを実現
することが可能となった。By using the optical element molding die obtained by the present invention, it has become possible to improve productivity and reduce cost.
【図１】本発明に係わる光学素子成形用型の成形表面に
形成したミキシング層の原子結合状態を示す模式図であ
る。FIG. 1 is a schematic view showing an atomic bond state of a mixing layer formed on a molding surface of a mold for molding an optical element according to the present invention.
【図２】参考例の光学素子成形用型の一例を示す断面図
で、プレス成形前の状態を示す。FIG. 2 is a cross-sectional view showing an example of an optical element molding die of a reference example , showing a state before press molding.
【図３】参考例の光学素子成形用型の一例を示す断面図
で、プレス成形後の状態を示す。FIG. 3 is a cross-sectional view showing an example of an optical element molding die of a reference example , showing a state after press molding.
【図４】本発明に係わる光学素子成形用型の一例を示す
断面図で、プレス成形前の状態を示す。FIG. 4 is a cross-sectional view showing an example of an optical element molding die according to the present invention, showing a state before press molding.
【図５】本発明に係わる光学素子成形用型の一例を示す
断面図で、プレス成形後の状態を示す。FIG. 5 is a cross-sectional view showing an example of an optical element molding die according to the present invention, showing a state after press molding.
【図６】本発明の実施例で用いる成膜装置を示す概略図
である。FIG. 6 is a schematic view showing a film forming apparatus used in an example of the present invention.
【図７】本発明に係わる光学素子成形用型を使用するレ
ンズの成形装置を示す断面図で非連続タイプである。FIG. 7 is a cross-sectional view showing a lens molding apparatus using an optical element molding die according to the present invention, which is a discontinuous type.
【図８】本発明の実施例で用いる成膜装置を示す概略図
である。FIG. 8 is a schematic view showing a film forming apparatus used in an example of the present invention.
１ 型母材（上型） １−ａ 成形表面層 １−ｂ 成形表面層と中間層間のミキシング層 １−ｃ 中間層 １−ｄ 中間層と型母材間のミキシング層 ２ 型母材（上型） ２−ａ 成形表面層 ２−ｂ 成形表面層と中間層間のミキシング層 ２−ｃ 中間層 ２−ｄ 中間層と型母材間のミキシング層 ３ ガラス素材 ４ 成形されたレンズ １１ 真空槽 １２ イオンビーム装置 １３ イオン化室 １４ ガス導入口 １５ イオンビーム引き出しグリット １６ イオンビーム １７ 型母材 １８ 基板ホルダー及びヒーター １９ 排気口 ２５ バイアス電源 ２７ 原料ガス供給系 ２８ アンテナ ２９ マッチングボックス ３０ 高周波放電用電源 ４４ イオン化電極 ４５ 直流電源 ４６ 電子銃 ４７ 金属チタン ５０ ガラスブランク置き台 １１ クラウン系ガラスブランク １００ 胴型 １１０ ゲートバルブ １７１ 入換えチャンバー １７１Ａ 入換えチャンバー開口 １７２ シフタ １７３ 昇降機 １８０ シリンダ １８０Ａ ピストンロッド ２００ 上軸ロッド ３００ 成形チャンバー ４００ 旋回ハンド ４０１ 旋回ハンド回転軸 ４０３ 吸着ハンド 1 type base material (upper type) 1-a molding surface layer 1-b Mixing layer between molding surface layer and intermediate layer 1-c middle layer 1-d mixing layer between the intermediate layer and the mold base material 2 type base material (upper mold) 2-a Molded surface layer 2-b Mixing layer between molding surface layer and intermediate layer 2-c Intermediate layer 2-d mixing layer between the intermediate layer and the mold base material 3 glass material 4 Molded lens 11 vacuum chamber 12 Ion beam device 13 Ionization room 14 gas inlet 15 Ion beam extraction grid 16 ion beam 17 type base material 18 Substrate holder and heater 19 exhaust port 25 bias power supply 27 Raw material gas supply system 28 antenna 29 Matching Box 30 High frequency discharge power supply 44 Ionization electrode 45 DC power supply 46 electron gun 47 metal titanium 50 glass blank holder 11 Crown glass blank 100 body type 110 gate valve 171 Exchange chamber 171A Exchange chamber opening 172 shifter 173 Elevator 180 cylinders 180A piston rod 200 Upper shaft rod 300 molding chamber 400 turning hand 401 swivel hand rotation axis 403 Suction hand
───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮崎 直 東京都大田区下丸子３丁目30番２号 キ ヤノン株式会社内 (56)参考文献 特開 平３−257031（ＪＰ，Ａ) 特開 平５−124825（ＪＰ，Ａ) 特開 昭60−246230（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) C03B 11/00 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Nao Miyazaki 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (56) Reference JP-A-3-257031 (JP, A) JP-A-5 -124825 (JP, A) JP-A-60-246230 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C03B 11/00
Claims (3)
用いる成形用型において、 型母材と成形表面層の間に中間層を有し、型母材を構成
する少なくとも１種類以上の元素の濃度が型母材側から
中間層側に向かって減少しかつ中間層を構成する少なく
とも１種類以上の元素の濃度が中間層側から型母材側に
向かって減少しているミキシング層を有し、 中間層材料がＴｉＮ、ＴａＮ、ＺｒＮ及びＨｆＮから選
ばれ、 かつ、成形表面層が炭素またはＰｔと、中間層を構成す
る元素の少なくとも１種類以上からなり、炭素原子また
はＰｔ濃度が中間層側に向かって減少しかつその他の原
子濃度が表面層側に向かって減少しているミキシング層
を有 することを特徴とする光学素子成形用型。1. A molding die used for press molding of an optical element made of glass, which has an intermediate layer between a mold base material and a molding surface layer, and has a concentration of at least one or more elements constituting the mold base material. There have a mixing layer in which the concentration of at least one element constituting the reduced and intermediate layer toward the intermediate layer side from the mold base material side is decreased toward the intermediate layer side to the mold base material side, The intermediate layer material is selected from TiN, TaN, ZrN and HfN.
And the molding surface layer is carbon or Pt and constitutes an intermediate layer.
Of at least one of the elements
Indicates that the Pt concentration decreases toward the intermediate layer and other sources
Mixing layer whose child concentration decreases toward the surface layer
A mold for molding an optical element, comprising:
びＨｆＮから選ばれる請求項１記載の光学素子成形用
型。2. The optical element molding die according to claim 1, wherein the intermediate layer material is selected from TiN, TaN, ZrN and HfN.
Ｔｉを蒸発させ、窒素イオンまたはアルゴンイオンを１
０ＫｅＶで加速し、まずＴｉと型母材とのミキシング層
を型母材表面に形成し、次いで、連続してイオンプレー
ティングによりＴｉＮ膜を形成することを特徴とする、
請求項１記載の光学素子成形用型の製造方法。3. When the intermediate layer is formed, Ti is evaporated by an electron beam and nitrogen ions or argon ions are converted into 1
Accelerating at 0 KeV, first forming a mixing layer of Ti and the mold base material on the surface of the mold base material, and then continuously forming a TiN film by ion plating,
The method for manufacturing the optical element molding die according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25502294A JP3397470B2 (en) | 1994-10-20 | 1994-10-20 | Optical element molding die and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25502294A JP3397470B2 (en) | 1994-10-20 | 1994-10-20 | Optical element molding die and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08119642A JPH08119642A (en) | 1996-05-14 |
| JP3397470B2 true JP3397470B2 (en) | 2003-04-14 |
Family
ID=17273107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25502294A Expired - Fee Related JP3397470B2 (en) | 1994-10-20 | 1994-10-20 | Optical element molding die and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3397470B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101052036B1 (en) | 2006-05-27 | 2011-07-26 | 한국수력원자력 주식회사 | Ceramic coating and ion beam mixing device to improve corrosion resistance at high temperature and method of modifying interface of thin film using same |
| KR100790409B1 (en) * | 2007-04-26 | 2008-01-03 | (주)비피에스 | Apparatus and method for forming coating layer on subject with curved surface |
-
1994
- 1994-10-20 JP JP25502294A patent/JP3397470B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08119642A (en) | 1996-05-14 |
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