JP3363557B2 - Single tank processing equipment - Google Patents
Single tank processing equipmentInfo
- Publication number
- JP3363557B2 JP3363557B2 JP33794393A JP33794393A JP3363557B2 JP 3363557 B2 JP3363557 B2 JP 3363557B2 JP 33794393 A JP33794393 A JP 33794393A JP 33794393 A JP33794393 A JP 33794393A JP 3363557 B2 JP3363557 B2 JP 3363557B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- treatment
- processing
- unit
- warm air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体製造装置用の大
型治具等の洗浄等の各種処理を、同一の処理槽へ薬品を
供給、回収し、純水、クリーン温風を所定順序で供給す
ることにより各種処理（洗浄等）から乾燥までの一連の
工程を行い得る一槽式クローズシステムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for various treatments such as cleaning of large jigs for semiconductor manufacturing equipment, by supplying and collecting chemicals in the same treatment tank, and purifying with pure water and clean warm air in a predetermined order. The present invention relates to a one-tank closed system capable of performing a series of steps from various treatments (washing, etc.) to drying by supplying.
【０００２】[0002]
【従来の技術】近年ウェハの大口径化が進み、装置の大
型化に伴う大型治具の洗浄が要求され、治具等のクリー
ン洗浄だけでなく、薬液洗浄から乾燥まで自動で行い洗
浄の信頼性及び安全性の向上、洗浄薬品、純水及び排気
量のランニングコスト低減ができる治具洗浄ドラフトが
要求されている。2. Description of the Related Art In recent years, the size of wafers has been increasing and cleaning of large jigs has been required due to the enlargement of equipment. Not only clean cleaning of jigs but also automatic cleaning from chemical cleaning to drying is reliable. There is a demand for a jig cleaning draft that can improve the performance and safety, and can reduce the running cost of cleaning chemicals, pure water, and exhaust volume.
【０００３】[0003]
【発明が解決しようとする課題】しかるに、従来装置に
あっては、大型の処理槽に任意で選択した洗浄薬品を溜
め、洗浄毎に人手により様々の寸法・形状の被洗浄物を
漬け洗いする方法が採用されているが、出し入れが容易
でなく、また大型の処理槽で完全な排気を行う機構がな
く、例えば、酸洗浄槽とアンモニア洗浄槽とが隣接して
いる場合、両者の雰囲気ガスが反応して生成物が治具洗
浄ドラフト内の壁や床に析出し、装置や被洗浄物を汚染
することがある。そして、処理槽に洗浄薬品を溜めるた
め池式のため、被洗浄物の処理量により洗浄薬品の汚れ
が増加し処理槽の汚れも蓄積する。また、薬品槽と水洗
槽とが独立しているため、槽間の移載時に被洗浄物から
の液垂れ等で洗浄ドラフト内を汚し、更に、乾燥機構が
無いため水洗槽から濡れた状態で取り出すために洗浄ド
ラフト前を汚す等といった不都合がある。However, in the conventional apparatus, the cleaning chemicals arbitrarily selected are stored in a large-sized processing tank, and each time cleaning is performed, the objects to be cleaned having various sizes and shapes are dipped and washed manually. Although the method is adopted, it is not easy to take in and out, and there is no mechanism for complete exhaust in a large processing tank.For example, when the acid cleaning tank and the ammonia cleaning tank are adjacent to each other, the atmosphere gas of both May react and cause the product to be deposited on the wall or floor in the jig cleaning draft and contaminate the device or the object to be cleaned. Since the cleaning chemical is stored in the processing tank, the cleaning chemical becomes dirty depending on the amount of the object to be cleaned, and the processing tank also accumulates dirt. In addition, since the chemical tank and the water washing tank are independent, the inside of the cleaning draft is contaminated by liquid dripping from the object to be cleaned when transferring between tanks, and even if it is wet from the water washing tank because there is no drying mechanism. There is an inconvenience that the front part of the cleaning draft is soiled for taking it out.
【０００４】[0004]
【課題を解決するための手段】上記課題を解決するため
に、本発明に係る一槽式処理装置は、（ａ）処理薬品を
貯蔵するタンクと、該処理薬品の供給、回収及び循環を
行うポンプ、フィルタ及び制御バルブを備える濾過送液
ユニット、とを含む貯蔵部と、（ｂ）温風発生装置を備
えた温風発生ユニットと、（ｃ）該処理薬品の供給ライ
ン及び回収ラインを介して該貯蔵部に接続されると共
に、該温風発生ユニットからの温風が供給される乾燥エ
アー供給ダクトを備える処理槽を含む処理部、とを有
し、該貯蔵部より該処理薬品を該処理部へ供給、循環濾
過を行って、該処理部における薬液処理を行い、且つ、
該温風発生ユニットによって該処理部へ温風を供給する
ことにより、薬液処理及び乾燥を同一処理槽で行う一槽
式処理装置において、前記処理部は、前記処理槽と、排
気ダクト及びドレン口を具えて該処理槽を囲うドレンパ
ンと、該処理槽の上部開口を塞ぐ水洗ノズルを具えた開
閉式扉と、その上部を被う空間部、とを含むことを特徴
とする。 In order to solve the above-mentioned problems, a one-tank type processing apparatus according to the present invention comprises (a) a tank for storing a processing chemical and a supply, recovery and circulation of the processing chemical. Through a storage unit including a pump, a filter and a filtration liquid sending unit including a control valve, (b) a warm air generating unit including a warm air generating device, and (c) a supply line and a recovery line of the processing chemical. And a treatment section including a treatment tank provided with a dry air supply duct to which warm air from the warm air generation unit is supplied, and the treatment chemicals are stored in the storage section. Supply to the processing unit, perform circulation filtration, perform chemical liquid treatment in the processing unit, and
One tank for performing chemical liquid processing and drying in the same processing tank by supplying warm air to the processing section by the warm air generation unit
In the processing apparatus, the processing section includes a treatment tank and a drainage tank.
A drainer that encloses the processing tank with an air duct and a drain port.
And an opening with a water washing nozzle that closes the upper opening of the treatment tank.
Characterized by including a closed door and a space part covering the upper part
And
【０００５】別の本発明に係る一槽式処理装置は、
（ａ）水の貯蔵が可能なタンクと、該水の供給、回収及
び循環を行うポンプ、フィルタ及び制御バルブを備える
濾過再生ユニット、とを含む貯蔵部と、（ｂ）温風発生
装置を備えた温風発生ユニットと、（ｃ）該水の供給、
回収ラインを介して該貯蔵部に接続されると共に、該温
風発生ユニットからの温風が供給される乾燥エアー供給
ダクトを備える処理槽を含む処理部、とを有し、該貯蔵
部より該水を該処理部へ供給、循環濾過を行って水洗処
理を行い、回収して、貯蔵部内循環濾過再生を行い貯蔵
し、且つ、該温風発生ユニットより該処理部へ温風を供
給し乾燥させることにより水洗を必要とする被洗浄物の
水洗、乾燥を同一処理槽で行う一槽式処理装置におい
て、前記濾過再生ユニットは、更に、イオン交換物質フ
ィルタ、温度調節ユニット及び紫外線殺菌灯を備えるも
のであり、また前記温風発生ユニットは、更に、ＨＥＰ
Ａフィルターを備えることを特徴とする。 Another one-tank type processing apparatus according to the present invention is
(A) A storage unit including a tank capable of storing water, a pump for supplying, collecting, and circulating the water, a filter regeneration unit including a filter and a control valve, and (b) a hot air generator A hot air generating unit, and (c) supplying the water,
A processing unit that is connected to the storage unit through a recovery line and that includes a processing tank provided with a dry air supply duct to which warm air from the warm air generation unit is supplied; Water is supplied to the treatment section, circulation filtration is performed to perform washing treatment, and the water is collected and subjected to circulation filtration regeneration in the storage section for storage, and hot air is supplied from the warm air generation unit to the treatment section for drying. In a one-tank type processing device that performs washing and drying of the object to be washed that requires washing with water in the same processing tank
The filtration regeneration unit further includes an ion exchange material flux.
Equipped with filter, temperature control unit and UV germicidal lamp
In addition, the warm air generating unit further includes a HEP
It is characterized by having an A filter.
【０００６】[0006]
【作用】被処理物（被洗浄物）と同一処理槽で処理（洗
浄）されるため、移載の必要性がなく被処理物（洗浄
物）からの液垂れ等で装置内外の汚れがなく、薬品別の
排気ダクトを系統別に切り換え、雰囲気ガスの反応を無
くし、薬品洗浄中は循環濾過を行い薬品の清浄維持を行
うことができる。薬品が洗浄後に貯蔵部のタンクへ回収
し貯蔵されるので、薬品使用量が減少し、洗浄中に処理
槽上部の扉が閉められるので、装置内排気を行うことな
く雰囲気ガスの装置外への拡散が抑制される。水洗は、
効率向上のため槽上部からシャワー水洗を行い、次に槽
内へ純水を供給し、設定時間水洗後、排液バルブを開い
て急速排水をする工程を繰り返し行い、純水オーバーフ
ロー式の水洗と比較して少量の純水及び短時間に水洗を
行うことができる。乾燥は、フィルターとファンヒータ
を組み合わせた温風ユニットによって温風をエアー供給
ダクトを介して槽内へ供給し対流乾燥を行うので効率が
良い。[Function] Since the object to be processed (object to be cleaned) is processed (cleaned) in the same processing tank, there is no need for transfer and there is no stain inside or outside the device due to liquid dripping from the object to be processed (object to be cleaned). The exhaust duct for each chemical can be switched for each system to eliminate the reaction of atmospheric gas, and the circulation and filtration can be performed during the chemical cleaning to keep the chemical clean. Since the chemicals are collected and stored in the storage tank after cleaning, the amount of chemicals used is reduced, and the door at the top of the processing tank is closed during cleaning. Diffusion is suppressed. Washing with water
To improve efficiency, perform shower water washing from the top of the tank, then supply pure water into the tank, wash the water for the set time, open the drain valve and perform rapid drainage. By comparison, a small amount of pure water and short-time water washing can be performed. Drying is efficient because hot air is supplied into the tank through the air supply duct by a warm air unit that is a combination of a filter and a fan heater to perform convective drying.
【０００７】[0007]
【実施例】以下、本発明の複数の実施例を図面を参照し
て説明する。先ず、第１の実施例について図１を参照し
て説明するに、本システムは、貯蔵部と処理部を各１つ
有して成る。貯蔵部１は、その外側面に容量測定（秤
量）用のセンサ（Ｓ１、Ｓ２、Ｓ３、Ｓ６）を具えたタ
ンク３と、液材の供給・循環等のための配管系（多数の
バルブ、パイプ等）やポンプ等から成る送液ユニット、
とを有する。例えば、タンク３内には、 純水（ＰＷ
１）が、バルブＶ９の開閉により、センサＳ３の検知高
さまで供給され、 第１の薬品が、バルブＶ１１の開閉
により、センサＳ２の検知高さまで供給され、 第２の
薬品が、バルブＶ１０の開閉により、センサＳ１の高さ
まで供給される（尚、その他の薬品を同様の構成及び手
順でタンク内に供給し調合し得る）。このようにタンク
３内に供給された複数の液材は、バルブＶ１、Ｖ３の開
閉とポンプ５の所定時間運転により、濾過フィルタ７を
介して、循環ミキシング（調合）が為される。この際、
温度制御ユニット９によって温度管理が為される。尚、
タンク３内の液材（洗浄薬品）は、所定のライフサイク
ルの完了後に、バルブＶ１，Ｖ４の開閉とポンプ５の運
転により、タンク３内のそれがセンサＳ６の検知高さに
減るまで、ドレンへの排出（廃液処理）が行われる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A plurality of embodiments of the present invention will be described below with reference to the drawings. First, the first embodiment will be described with reference to FIG. 1. This system has one storage unit and one processing unit. The storage unit 1 has a tank 3 having sensors (S1, S2, S3, S6) for capacity measurement (weighing) on its outer surface, and a piping system (a large number of valves, Liquid transfer unit consisting of pipes etc.) and pumps,
Have and. For example, pure water (PW
1) is supplied to the detection height of the sensor S3 by opening / closing the valve V9, the first chemical is supplied to the detection height of the sensor S2 by opening / closing the valve V11, and the second chemical is opened / closed to the valve V10. Is supplied to the height of the sensor S1 (note that other chemicals may be supplied to and mixed in the tank with the same configuration and procedure). The plurality of liquid materials thus supplied into the tank 3 are circulated and mixed (mixed) through the filtration filter 7 by opening / closing the valves V1 and V3 and operating the pump 5 for a predetermined time. On this occasion,
Temperature control is performed by the temperature control unit 9. still,
After the predetermined life cycle is completed, the liquid material (cleaning chemicals) in the tank 3 is drained by opening / closing the valves V1 and V4 and operating the pump 5 until the level in the tank 3 is reduced to the detection height of the sensor S6. Is discharged (waste liquid treatment).
【０００８】処理部１１は、液材の供給及び回収のため
の行きと帰りの一対の配管系（ライン）を介して、貯蔵
部１と接続されており、温風発生用のファンヒータ１３
とＨＥＰＡ（あるいはＵＬＰＡ）フィルタ１５とから成
るクリーン温風発生ユニット１７が付設される。処理部
１１の、不純物の発生しない材料、例えばテフロン等の
樹脂で構成された処理槽２１は、水洗ノズル２３を具え
た開閉式（片開き式）の扉２５で開閉されるその上部開
口が、クリーンブース２７で被われ、それ以外の周囲
が、２つの排気系２９、３１（（酸系統）排気切換バル
ブ３３及び（アンモニア系統）排気切換バルブ３５）と
ドレンに接続されたドレンパン３７で被われ、処理槽内
の液材を急速排出するための大型排液バルブ３９を具
え、クリーン温風発生ユニット１７からの温風を内部へ
供給するための乾燥エアー供給ダクト４１を具える。The processing section 11 is connected to the storage section 1 via a pair of in-and-out piping systems (lines) for supplying and collecting the liquid material, and a fan heater 13 for generating hot air.
A clean hot air generating unit 17 including a HEPA (or ULPA) filter 15 is attached. The processing tank 21 of the processing unit 11 which is made of a material that does not generate impurities, for example, a resin such as Teflon, has its upper opening opened and closed by an openable (single-opening) door 25 equipped with a washing nozzle 23. The clean booth 27 is covered, and the other surroundings are covered with two exhaust systems 29 and 31 ((acid system) exhaust switching valve 33 and (ammonia system) exhaust switching valve 35) and a drain pan 37 connected to the drain. A large liquid discharge valve 39 for rapidly discharging the liquid material in the processing tank is provided, and a dry air supply duct 41 for supplying warm air from the clean hot air generating unit 17 to the inside is provided.
【０００９】以上の構成を有する本実施例システムの作
動例について以下簡単に説明する。先ず、処理槽２１内
に被洗浄物（図示せず）を入れて扉２５を閉じ、排気系
統（２９、３１）の切換バルブ（３３、３５）を選択
し、その後、処理槽２１には、貯蔵部１のタンク３内の
調合された液材（薬品）が、バルブＶ１、Ｖ５の開閉と
ポンプ５の所定時間運転により、濾過フィルタ７を介し
て、（薬品レベル）センサＳ４の検知高さまで供給され
る。その後、バルブＶ２、Ｖ５、Ｖ７の開閉とポンプ５
の所定時間運転により、液材（洗浄薬品）を循環濾過し
ながら処理槽２１内の被洗浄物（図示せず）の薬品洗浄
を行う。そして、洗浄終了後に、バルブＶ２、Ｖ３、Ｖ
７の開閉とポンプ５の運転により、処理槽２１内の液材
がセンサＳ５（処理槽底部）の検知高さに減るまで、貯
蔵部１のタンク３への液材の回収を行う。An operation example of the system of the present embodiment having the above configuration will be briefly described below. First, an object to be cleaned (not shown) is put into the processing tank 21, the door 25 is closed, and the switching valves (33, 35) of the exhaust system (29, 31) are selected. The mixed liquid material (chemicals) in the tank 3 of the storage unit 1 is opened and closed by the valves V1 and V5 and the pump 5 is operated for a predetermined time to reach the detection level of the (chemical level) sensor S4 through the filtration filter 7. Supplied. After that, opening and closing the valves V2, V5, V7 and the pump 5
By operating for a predetermined time, the liquid material (cleaning chemical) is circulated and filtered, and chemical cleaning of the object to be cleaned (not shown) in the processing tank 21 is performed. After the cleaning is completed, the valves V2, V3, V
By opening and closing 7 and operating the pump 5, the liquid material is collected in the tank 3 of the storage unit 1 until the liquid material in the processing tank 21 is reduced to the detection height of the sensor S5 (bottom of the processing tank).
【００１０】次に、バルブＶ８及び大型廃液バルブ３９
を開いて、純水（ＰＷ２）を扉２５の裏面側の水洗ノズ
ル２３から処理槽２１内の被洗浄物（図示せず）に向か
ってシャワー式に供給（シャワー水洗）し、所定時間経
過後、バルブＶ８及び大型廃液バルブ３９を閉じて、代
わりにバルブＶ６を開いて、別の純水（ＰＷ１）を供給
（ｄｉｐ水洗）し、処理槽２１からドレンパン３７に所
定時間オーバーフローさせ、その後、バルブＶ６を閉じ
て純水供給を止め、バルブＶ１２を開いて、薬品回収ラ
インのパージを設定時間行い、その後、大型廃液バルブ
３９を開いて、処理槽２１内の純水をドレンパン３７に
急速排水し、センサＳ５の検知高さまで減ったら、大型
廃液バルブ３９及びバルブＶ１２を閉じる。この一連の
水洗工程を設定回数繰り返して、効率的な水洗処理を行
う。尚、この水洗処理の前に、別の薬品洗浄工程がある
場合には、排気系統切換バルブ（３３、３５）を介して
排気系統（２９、３１）を選択し、図示しない別の貯蔵
部より処理槽２１へ薬品を供給し、薬品洗浄後に、これ
を回収し、その後、上記水洗工程を繰り返すことができ
る（これについては、第２実施例を参照のこと）。Next, the valve V8 and the large waste liquid valve 39
Open and supply pure water (PW2) from the water washing nozzle 23 on the back side of the door 25 toward the object to be cleaned (not shown) in the processing tank 21 (shower water washing), and after a predetermined time elapses. , The valve V8 and the large-sized waste liquid valve 39 are closed, and instead the valve V6 is opened, another pure water (PW1) is supplied (dip water washing), and overflowed from the processing tank 21 to the drain pan 37 for a predetermined time, and then the valve V6 is closed to stop the pure water supply, the valve V12 is opened, the chemical recovery line is purged for the set time, and then the large waste liquid valve 39 is opened to rapidly drain the pure water in the processing tank 21 to the drain pan 37. When the detection height of the sensor S5 is reduced, the large waste liquid valve 39 and the valve V12 are closed. This series of water washing steps is repeated a set number of times to perform efficient water washing treatment. If there is another chemical cleaning step before this water washing process, the exhaust system (29, 31) is selected via the exhaust system switching valve (33, 35) and the other storage unit (not shown) is used. The chemicals can be supplied to the treatment tank 21, and after cleaning the chemicals, the chemicals can be collected, and then the above-mentioned water washing step can be repeated (for this, refer to the second embodiment).
【００１１】最後に、クリーン温風発生ユニット１７
（ファンヒータ１３、ＵＬＰＡフィルタ１５）の駆動と
ゲートバルブ４３の開閉により、乾燥エアー供給ダクト
４１を介して処理槽２１へクリーン温風を設定時間送風
供給し、被洗浄物（図示せず）の対流乾燥を行う。以上
の記載から、本システムには、次のような利点があるこ
とが理解されよう。すなわち、（ａ）薬品等の液材が、
貯蔵部１のタンク３から処理槽２１を経て再度タンク３
に回収されるので、いわゆる液材の使い捨てをしなくて
済み、経済的であり、（ｂ）洗浄中に、処理槽２１の上
部開口（及びドレンパン３７）が扉２５で閉塞されるの
で、好ましくない気体の排出量を低減でき、（ｃ）シャ
ワー水洗と急速排水を伴うｄｉｐ水洗とを必要回数繰り
返すので、効率的・効果的な水洗を行うことができ且つ
純水の使用量を実質的に低減することができ、（ｄ）ク
リーン温風による対流乾燥をで行うので、洗浄後の被洗
浄物を乾燥状態で取り出すことができ、（ｅ）薬液線上
から乾燥までの一連の工程を同一の処理槽２１で省エネ
ルギ的にシンプルな構成で行い得るので、極めて合理的
であり、槽から槽への移載機等を不要にでき、（ｆ）従
来のように作業者が防具を付けて洗浄したような作業が
不要となり、安全な洗浄作業を行うことができる。従っ
て、本システムは、クリーン洗浄を要する例えば半導体
製造装置の大型治具や薬液によるクリーンな処理を要す
る例えばウェハ等にとって好適な処理装置となり得る。Finally, the clean warm air generating unit 17
By driving the (fan heater 13, ULPA filter 15) and opening / closing the gate valve 43, clean warm air is blown and supplied to the processing tank 21 through the dry air supply duct 41 for a set period of time to clean an object to be cleaned (not shown). Perform convection drying. From the above description, it can be understood that the present system has the following advantages. That is, (a) a liquid material such as a chemical is
From the tank 3 of the storage unit 1 to the tank 3 again via the processing tank 21.
Therefore, it is economical because it is not necessary to dispose of the so-called liquid material, and (b) the upper opening (and the drain pan 37) of the processing tank 21 is closed by the door 25 during cleaning, which is preferable. It is possible to reduce the amount of exhausted gas, and (c) the shower rinsing and the dip rinsing with rapid drainage are repeated as many times as necessary, so that efficient and effective rinsing can be performed and the amount of pure water used is substantially reduced. Since it can be reduced, (d) convection drying with clean warm air can be performed, the cleaned object can be taken out in a dry state, and (e) a series of steps from the chemical liquid line to the drying can be performed in the same manner. Since it can be performed in the processing tank 21 with a simple structure for energy saving, it is extremely rational, a transfer machine from tank to tank can be dispensed with, and (f) the worker wears protective equipment as in the conventional case. Safe because it eliminates the need for washing work It is possible to perform the cleaning work. Therefore, the present system can be a processing apparatus suitable for, for example, a large jig of a semiconductor manufacturing apparatus that requires clean cleaning or a wafer that requires clean processing with a chemical solution.
【００１２】次に、第２の実施例について、主として図
２を参照して説明する。図示した一槽式治具洗浄システ
ムは、２つの貯蔵部（１Ａ、１Ｂ）と１つの処理部（１
１’）を有して成り（図３及び４参照）、図２で左側の
貯蔵部１Ａは、酸系統の液材、右側の貯蔵部１Ｂは、ア
ンモニア系統の液材を調合等するものであり、両者は、
基本構造的に上記第１実施例の貯蔵部１と同じである。
従って、重複する説明は省略し、特徴的な作用・効果を
以下詳説する。Next, the second embodiment will be described mainly with reference to FIG. The illustrated single tank jig cleaning system includes two storage units (1A, 1B) and one processing unit (1
1 ') (see FIGS. 3 and 4). In FIG. 2, the left storage 1A is for acid-based liquid material, and the right storage 1B is for mixing ammonia-based liquid material. Yes, both
The basic structure is the same as the storage unit 1 of the first embodiment.
Therefore, the overlapping description will be omitted, and the characteristic actions and effects will be described in detail below.
【００１３】予め、各貯蔵部１Ａ、１Ｂの、例えばクリ
ーンＰＶＣ（塩ビ）で製作された酸用のタンク３Ａとア
ンモニア用のタンク３Ｂにおいて、それぞれ洗浄薬品を
調合・製造しておく。 先ず、アンモニア用の貯蔵部１
Ｂのタンク３Ｂ内の薬品が、関連するバルブ（特に参照
番号を付さない）の開閉とポンプ５Ｂの運転により、濾
過フィルタ７Ｂを介して、処理部１１’の被洗浄物（図
示せず）のセットされた処理槽２１’の所定高さレベル
（上限）まで、供給ラインを通して供給される。次い
で、処理槽２１’内の薬品をバルブの開閉とポンプ５Ｂ
の運転により設定時間循環濾過しながら浸漬洗浄した後
に、処理槽２１’内の薬品は、関連するバルブの開閉と
ポンプ５Ｂの運転により、処理槽２１’の所定高さレベ
ル（下限）に減るまで、回収ラインを通してタンク３Ｂ
内に回収・貯蔵される。そして、上記第１実施例と同様
に、関連するバルブ及び大型廃液バルブ３９’の開閉に
より、水洗ノズル２３’によるシャワー式の純水の供給
（シャワー水洗）とｄｉｐ水洗を行い、この一連の水洗
工程を設定回数繰り返して、効率的な水洗処理を行う。
尚、処理槽２１’は、この工程中、その上部開口が開閉
式扉２５’で閉塞され得る。Cleaning chemicals are prepared and manufactured in advance in the storage tanks 1A and 1B, respectively, in the acid tank 3A and the ammonia tank 3B made of, for example, clean PVC (vinyl chloride). First, the storage unit 1 for ammonia
The chemical in the tank 3B of B is an object to be cleaned (not shown) of the processing section 11 ′ through the filtration filter 7B by opening / closing a related valve (not attached with a reference numeral) and operating the pump 5B. Is supplied through the supply line up to the predetermined height level (upper limit) of the set processing tank 21 '. Next, the chemical in the processing tank 21 'is opened and closed by the valve and the pump 5B.
After the immersion cleaning while circulating filtration for a set time by the operation of, the chemical in the processing tank 21 'is reduced to a predetermined height level (lower limit) of the processing tank 21' by opening and closing the related valve and operating the pump 5B. , Tank 3B through the recovery line
It is collected and stored inside. Then, similarly to the first embodiment, by opening and closing the related valves and the large-sized waste liquid valve 39 ', shower type pure water is supplied by the water washing nozzle 23' (shower water washing) and dip water washing, and this series of water washing is performed. The process is repeated a set number of times to perform efficient water washing treatment.
The upper opening of the processing tank 21 'can be closed by the openable door 25' during this process.
【００１４】次に、上記と同様に、酸用の貯蔵部１Ａの
タンク３Ａ内の薬品が、関連するバルブの開閉とポンプ
５Ａの運転により、濾過フィルタ７Ａを介して、処理槽
２１’の所定高さレベル（上限）まで、供給ラインを通
して供給される。次いで、処理槽２１’内の薬品をバル
ブの開閉とポンプ５Ａの運転により設定時間循環濾過し
ながら浸漬洗浄した後に、処理槽２１’内の薬品は、関
連するバルブの開閉とポンプ５Ａの運転により、処理槽
２１’の所定高さレベル（下限）に減るまで、回収ライ
ンを通してタンク３Ａ内に回収・貯蔵される。そして、
上記と同様に、関連するバルブ及び大型廃液バルブ３
９’の開閉により、水洗ノズル２３’によるシャワー式
の純水の供給（シャワー水洗）とｄｉｐ水洗を行い、こ
の一連の水洗工程を設定回数繰り返して、効率的な水洗
処理を行う。尚、処理槽２１’は、この工程中、その上
部開口が開閉式扉２５’で閉塞され得る。Next, in the same manner as described above, the chemicals in the tank 3A of the acid storage unit 1A pass through the filtration filter 7A and the predetermined amount in the processing tank 21 'by opening / closing the associated valve and operating the pump 5A. It is supplied through the supply line up to the height level (upper limit). Then, after the chemicals in the treatment tank 21 ′ are immersed and washed while circulating filtration for a set time by opening and closing the valve and operating the pump 5A, the chemicals in the treatment tank 21 ′ are controlled by opening and closing the related valves and operating the pump 5A. , Is collected and stored in the tank 3A through the recovery line until the height of the processing tank 21 'is reduced to a predetermined level (lower limit). And
Similar to the above, related valves and large waste liquid valve 3
By opening and closing 9 ', shower-type pure water is supplied from the washing nozzle 23' (shower washing) and dip washing, and this series of washing steps is repeated a set number of times to perform efficient washing treatment. The upper opening of the processing tank 21 'can be closed by the openable door 25' during this process.
【００１５】次に、クリーン温風発生ユニット１７’
（ファンヒータ１３’、ＵＬＰＡフィルタ１５’）の駆
動とゲートバルブ４３’の開閉により、乾燥エアー供給
ダクト４１’を介して処理槽２１’へクリーン温風を設
定時間送風供給し、被洗浄物（図示せず）の対流乾燥を
行う。以上のように、本第２実施例においては、２つの
貯蔵部により複数の液材を用いて、例えば半導体製造装
置用大型治具等の自動洗浄（薬品洗浄から水洗、乾燥ま
で）を安全且つクリーンに行うことができ、作業者の負
担を大幅に軽減することが可能である。また、薬品及び
純水等のランニングコスト低減を行うことができる。更
に、好ましくない排気ガス（ミスト等）につき、被洗浄
物の出し入れ時を除いて処理槽上部の扉（シャッタ）を
閉めることによって低減することが可能である。Next, the clean warm air generating unit 17 '
By driving the (fan heater 13 ′, ULPA filter 15 ′) and opening / closing the gate valve 43 ′, clean warm air is blown to the processing tank 21 ′ through the dry air supply duct 41 ′ for a set time, and the cleaning target ( Convection drying (not shown) is performed. As described above, in the second embodiment, by using a plurality of liquid materials in the two storage units, for example, automatic cleaning (from chemical cleaning to water cleaning and drying) of a large jig for a semiconductor manufacturing apparatus can be performed safely and safely. It can be performed cleanly, and the burden on the operator can be greatly reduced. In addition, running costs for chemicals and pure water can be reduced. Further, undesirable exhaust gas (mist, etc.) can be reduced by closing the door (shutter) at the upper part of the processing tank except when the object to be cleaned is taken in and out.
【００１６】最後に、本発明の様々な変更例につき以下
に簡単に説明する。先ず、ウェハ６１の両側から挟着し
てそれを支持し得るような腕部６３を具える、ウェハ６
１を少なくとも１枚支持し得る機構６５を処理槽２１’
内に設け（図５及び６参照）、ウェハ６１の薬品処理、
水洗、乾燥を同一処理槽（２１’）で行うことが考えら
れる。 また、貯蔵部とクリーン温風発生ユニットと処
理部とを、それぞれユニット化し、分離レイアウト及び
一体レイアウトの選択を可能にして、ウェハや半導体製
造装置用大型治具等を処理することが考えられる。Finally, various modifications of the present invention will be briefly described below. First, the wafer 6 is provided with an arm portion 63 that can be clamped from both sides of the wafer 61 to support it.
The processing tank 21 ′ is provided with a mechanism 65 capable of supporting at least one sheet 1
Provided inside (see FIGS. 5 and 6) for chemical treatment of the wafer 61,
It is conceivable to perform washing and drying in the same treatment tank (21 '). In addition, it is conceivable that the storage unit, the clean hot air generating unit, and the processing unit are each made into a unit so that a separation layout and an integrated layout can be selected and a wafer, a large jig for a semiconductor manufacturing apparatus, or the like is processed.
【００１７】更に、任意の処理薬品を貯蔵する複数の貯
蔵部とクリーン温風発生ユニットと処理部を一体にした
装置一台で構成し、任意に選択した薬品処理、水洗を設
定した処理工程に基づいて行い、クリーン温風発生ユニ
ットより処理部へクリーン温風を供給し乾燥させること
により、ウェハや半導体製造装置用大型治具等の複数の
薬品処理、水洗、乾燥を同一処理槽で行うことを特徴と
する一槽式処理システムが考えられる。Furthermore, a single storage device, in which a plurality of storage units for storing arbitrary treatment chemicals, a clean hot air generating unit, and a treatment unit are integrated, is used for a treatment process in which arbitrarily selected chemical treatment and water washing are set. Performing multiple chemical treatments such as wafers and large jigs for semiconductor manufacturing equipment, washing with water, and drying in the same treatment tank by supplying clean warm air from the clean warm air generation unit to the processing section and drying. A single-tank processing system characterized by
【００１８】更にまた、任意の処理薬品を貯蔵する複数
の貯蔵部と任意の数のクリーン温風発生ユニットと処理
部を一体にした装置で構成し、選択した処理部に選択し
た処理薬品を供給し薬品処理、水洗、乾燥ができ、一つ
の処理部に対し多種の薬品処理が任意で行うことができ
る処理部の効率利用が可能な、ウェハや半導体製造装置
用大型治具等の多槽式洗浄システムが考えられる。Furthermore, a plurality of storage units for storing arbitrary processing chemicals, an arbitrary number of clean hot air generating units, and a processing section are integrated into a device, and the selected processing chemicals are supplied to the selected processing section. Multi-tank type such as wafers and large jigs for semiconductor manufacturing equipment, which can perform various chemical treatments arbitrarily for one treatment unit, which can be treated with chemicals, washed with water, and dried. A cleaning system is possible.
【００１９】更に、水の貯蔵が可能なタンクと、水の供
給、回収及び循環を行うポンプ、フィルタ、イオン交換
物質フィルタ、温度調節ユニット、紫外線殺菌灯及び制
御バルブを有する濾過再生ユニット、とを含む貯蔵部
と；温風発生装置及びＨＥＰＡ（あるいはＵＬＰＡ）フ
ィルターを有する温風発生ユニットと；貯蔵部から濾過
再生された水の供給、回収ラインと接続され、温風発生
ユニットからクリーン温風を供給する乾燥エアー供給ダ
クトを持つ処理槽と、処理槽を囲う、排気ダクトに接続
されるドレンパンと、処理槽上部のドレンパンをふさぐ
開閉式扉と、その上部を覆うクリンブース、とを含む処
理部、とを有し；以て、開閉式扉を閉じ、低排気量で貯
蔵部より水を処理部へクリーンに供給、循環濾過を行っ
て水洗処理を行い、回収して、貯蔵部内循環濾過再生を
行い貯蔵する一方、クリーン温風発生ユニットより処理
部へクリーン温風を供給し乾燥させることによりクリー
ン水洗を必要とする被洗浄物の水洗、乾燥を同一処理槽
で行うことを特徴とする一槽式水洗装置が考えられる。
これらの貯蔵部と処理部とを、それぞれユニット化し、
分離レイアウト及び一体レイアウトの選択が可能にする
こともできる。Further, a tank capable of storing water and a pump for supplying, collecting and circulating water, a filter, an ion-exchange substance filter, a temperature control unit, a filtration regenerating unit having an ultraviolet germicidal lamp and a control valve are provided. A storage unit including; a warm air generation unit having a warm air generation device and a HEPA (or ULPA) filter; connected to a supply / recovery line of water filtered and regenerated from the storage unit to generate clean warm air from the warm air generation unit A processing section including a processing tank having a dry air supply duct for supply, a drain pan surrounding the processing tank, which is connected to an exhaust duct, an openable door for closing the drain pan at the upper part of the processing tank, and a clean booth covering the upper part. , And; therefore, the opening / closing door is closed, water is cleanly supplied from the storage unit to the processing unit at a low displacement, and circulation filtration is performed to perform washing treatment, While collecting and performing circulation filtration regeneration in the storage section and storing, clean hot water is supplied from the clean hot air generation unit to the processing section and dried to perform the same treatment of washing and drying of the object to be washed that requires clean washing. A one-tank type water washing device, which is characterized in that it is performed in a tank, is conceivable.
These storage section and processing section are each made into a unit,
It may also be possible to select a separate layout or an integrated layout.
【００２０】[0020]
【発明の効果】以上説明したように、本発明によれば、
従来の不都合が効果的・効率的に解消し、精密治具の洗
浄や精密部品等の薬品処理等を安全且つ経済的に合理的
に行うことが可能となり、集積度が高まる半導体製造技
術のプロセス工程以外の作業に対しての信頼性向上に多
大に寄与することができた。As described above, according to the present invention,
The process of semiconductor manufacturing technology, in which the conventional inconveniences are effectively and efficiently resolved, and the cleaning of precision jigs and the chemical treatment of precision parts can be performed safely and economically, and the degree of integration increases. It was possible to greatly contribute to the improvement of reliability for work other than the process.
【図１】図１は、本発明の第１の実施例の全体概略構成
図である。FIG. 1 is an overall schematic configuration diagram of a first embodiment of the present invention.
【図２】図２は、本発明の第２の実施例の全体概略構成
図である。FIG. 2 is an overall schematic configuration diagram of a second embodiment of the present invention.
【図３】図３は、一体レイアウト化された、第２実施例
装置の全体外観正面図である。FIG. 3 is a front view of the entire external appearance of the second embodiment device, which is integrally laid out.
【図４】図４は、図３の上方側から見た平面図である。FIG. 4 is a plan view seen from the upper side of FIG.
【図５】図５は、ウェハ支持機構の正面図である。FIG. 5 is a front view of a wafer support mechanism.
【図６】図６は、ウェハ支持機構の側面図である。FIG. 6 is a side view of a wafer support mechanism.
１、１Ａ、１Ｂ…貯蔵部 ３、３Ａ、３Ｂ…タンク ５、５Ａ、５Ｂ…ポンプ ７、７Ａ、７Ｂ…フィルタ ９…温度制御ユニット １１、１１’…処理部 １３、１３’…ファンヒータ １５、１５’…ＵＬＰＡフィルタ １７、１７’…クリーン温風発生ユニット ２１、２１’…処理槽 ２３、２３’…水洗ノズル ２５、２５’…開閉式扉 ２７、２７’…クリーンブース ２９、２９’…（酸系統）排気系 ３１、３１’…（アンモニア系統）排気系 ３３、３３’、３５、３５’…排気切換バルブ ３７、３７’…ドレンパン ３９、３９’…大型廃液バルブ ４１、４１’…乾燥エアー供給ダクト ４３、４３’…ゲートバルブ ６１…ウェハ ６３…腕部 ６５…ウェハ支持機構 1, 1A, 1B ... Storage section 3, 3A, 3B ... Tank 5, 5A, 5B ... Pump 7, 7A, 7B ... Filter 9 ... Temperature control unit 11, 11 '... Processing unit 13, 13 '... Fan heater 15, 15 '... ULPA filter 17, 17 '... Clean hot air generation unit 21, 21 '... Processing tank 23, 23 '... Washing nozzle 25, 25 '... Openable door 27, 27 '... Clean booth 29, 29 '... (acid system) Exhaust system 31, 31 '... (Ammonia system) Exhaust system 33, 33 ', 35, 35' ... Exhaust gas switching valve 37, 37 '... Drain pan 39, 39 '... Large waste liquid valve 41, 41 '... Dry air supply duct 43, 43 '... Gate valve 61 ... Wafer 63 ... Arm 65 ... Wafer support mechanism
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) B08B 3/10 C23G 1/36 C23G 3/00 H01L 21/02 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) B08B 3/10 C23G 1/36 C23G 3/00 H01L 21/02
Claims (4)
処理薬品の供給、回収及び循環を行うポンプ、フィルタ
及び制御バルブを備える濾過送液ユニット、とを含む貯
蔵部と、 （ｂ）温風発生装置を備えた温風発生ユニットと、 （ｃ）該処理薬品の供給ライン及び回収ラインを介して
該貯蔵部に接続されると共に、該温風発生ユニットから
の温風が供給される乾燥エアー供給ダクトを備える処理
槽を含む処理部、とを有し、 該貯蔵部より該処理薬品を該処理部へ供給、循環濾過を
行って、該処理部における薬液処理を行い、且つ、該温
風発生ユニットによって該処理部へ温風を供給すること
により、薬液処理及び乾燥を同一処理槽で行う一槽式処
理装置において、 前記処理部は、前記処理槽と、排気ダクト及びドレン口
を具えて該処理槽を囲うドレンパンと、該処理槽の上部
開口を塞ぐ水洗ノズルを具えた開閉式扉と、その上部を
被う空間部、とを含むことを特徴とする一槽式処理装
置。 1. A storage unit including: (a) a tank for storing a treatment chemical; a pump for supplying, collecting, and circulating the treatment chemical; and a filtration liquid sending unit having a filter and a control valve, and (b). A hot air generating unit provided with a hot air generating device, and (c) being connected to the storage unit via a supply line and a recovery line of the processing chemical, and being supplied with hot air from the hot air generating unit. A treatment section including a treatment tank provided with a dry air supply duct; and supplying the treatment chemicals from the storage section to the treatment section, performing circulation filtration, and performing chemical liquid treatment in the treatment section, and In the one-tank processing apparatus that performs chemical liquid processing and drying in the same processing tank by supplying warm air to the processing section by a warm air generation unit , the processing section includes the processing tank, an exhaust duct, and a drain port.
And a drain pan surrounding the treatment tank, and an upper portion of the treatment tank
Open and close the door with a flush nozzle to close the opening and the top
A one-tank type processing apparatus characterized by including a space to be covered
Place
処理薬品の供給、回収及び循環を行うポンプ、フィルタ
及び制御バルブを備える濾過送液ユニット、とを含む貯
蔵部と、 （ｂ）温風発生装置を備えた温風発生ユニットと、 （ｃ）該処理薬品の供給ライン及び回収ラインを介して
該貯蔵部に接続されると共に、該温風発生ユニットから
の温風が供給される乾燥エアー供給ダクトを備える処理
槽を含む処理部、とを有し、 該貯蔵部より該処理薬品を該処理部へ供給、循環濾過を
行って、該処理部における薬液処理を行い、且つ、該温
風発生ユニットによって該処理部へ温風を供給すること
により、薬品処理及び乾燥を同一処理槽で行う一槽式処
理装置において、 前記貯蔵部と前記温風発生ユニットと前記処理部とを、
それぞれユニット化し、分離レイアウト及び一体レイア
ウトの選択が可能であることを特徴とする 一槽式処理装
置。2. (a) A tank for storing a treatment chemical;
Pumps and filters that supply, collect and circulate processing chemicals
And a filtration liquid delivery unit having a control valve,
Via a warehouse, (b) a warm air generating unit equipped with a warm air generating device, and (c) a supply line and a recovery line for the treatment chemicals.
The hot air generating unit is connected to the storage unit and
Treatment with a dry air supply duct to which hot air is supplied
A treatment section including a tank, and supplies the treatment chemicals from the storage section to the treatment section for circulation filtration.
To perform the chemical solution treatment in the treatment section, and
Supplying warm air to the processing section by a wind generation unit
The one-tank type treatment that performs chemical treatment and drying in the same treatment tank
In the processing device, the storage unit, the warm air generation unit and the processing unit,
Unitized separately, separated layout and integrated layer
A single-tank processing device characterized by the ability to select the unit.
ットと前記処理部を一体にした装置を、複数備えてなる
ことを特徴とする請求項１又は２に記載の一槽式処理装
置。3. The storage unit and / or the warm air generating unit.
The apparatus integrally Tsu bets and the processor, single-vessel processing apparatus according to claim 1 or 2, characterized in plurality with a by Rukoto.
の供給、回収及び循環を行うポンプ、フィルタ及び制御
バルブを備える濾過再生ユニット、とを含む貯蔵部と、 （ｂ）温風発生装置を備えた温風発生ユニットと、 （ｃ）該水の供給、回収ラインを介して該貯蔵部に接続
されると共に、該温風発生ユニットからの温風が供給さ
れる乾燥エアー供給ダクトを備える処理槽を含む処理
部、とを有し、 該貯蔵部より該水を該処理部へ供給、循環濾過を行って
水洗処理を行い、回収して、貯蔵部内循環濾過再生を行
い貯蔵し、且つ、該温風発生ユニットより該処理部へ温
風を供給し乾燥させることにより水洗を必要とする被洗
浄物の水洗、乾燥を同一処理槽で行う一槽式処理装置に
おいて、 前記濾過再生ユニットは、更に、イオン交換物質フィル
タ、温度調節ユニット及び紫外線殺菌灯を備えるもので
あり、また前記温風発生ユニットは、更に、ＨＥＰＡフ
ィルターを備え ることを特徴とする一槽式処理装置。4. (a) A tank capable of storing water, and the water
Pumps, filters and controls that supply, recover and circulate
A storage unit including a filtration and regeneration unit including a valve; (b) a warm air generation unit including a warm air generation device; (c) connection to the storage unit via a water supply / recovery line
At the same time, the warm air from the warm air generating unit is supplied.
Processing including a processing tank having a dry air supply duct
Part, and supplies the water from the storage part to the treatment part and performs circulation filtration.
It is washed with water, collected, and recycled and circulated in the storage unit.
And store it in the hot air generation unit
Washing that requires washing by supplying air and drying
A single-tank type processing device that performs washing and drying of pure water in the same processing tank
In addition, the filtration regeneration unit further comprises an ion exchange material filter.
Equipped with a temperature control unit, temperature control unit and UV germicidal lamp
And the hot air generating unit is further
A one-tank processing device characterized by having a filter .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33794393A JP3363557B2 (en) | 1993-12-28 | 1993-12-28 | Single tank processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33794393A JP3363557B2 (en) | 1993-12-28 | 1993-12-28 | Single tank processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07185483A JPH07185483A (en) | 1995-07-25 |
| JP3363557B2 true JP3363557B2 (en) | 2003-01-08 |
Family
ID=18313467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33794393A Expired - Lifetime JP3363557B2 (en) | 1993-12-28 | 1993-12-28 | Single tank processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3363557B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3377610B2 (en) * | 1994-08-10 | 2003-02-17 | 三菱重工業株式会社 | Method and apparatus for cleaning machined parts |
| JP2001149870A (en) * | 1999-12-01 | 2001-06-05 | Mitsubishi Materials Silicon Corp | Cleaner for clean room |
| JP2006093334A (en) * | 2004-09-22 | 2006-04-06 | Ses Co Ltd | Substrate processing device |
-
1993
- 1993-12-28 JP JP33794393A patent/JP3363557B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07185483A (en) | 1995-07-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3598131A (en) | Steam collection system for dishwashing machines | |
| JP5006860B2 (en) | Desk cleaning device for medical instrument and method for cleaning medical instrument | |
| US4615744A (en) | Method of rinsing eating utensils | |
| JPH1094586A (en) | Washing steriization unit | |
| JP2010115223A5 (en) | ||
| KR20080104971A (en) | Cleaning and drying apparatus | |
| JP4363951B2 (en) | Drum washing machine | |
| JP3363557B2 (en) | Single tank processing equipment | |
| US4776891A (en) | Method and means of rinsing eating utensils | |
| CN114392979B (en) | Dispensing frame cleaning machine | |
| JP3379816B2 (en) | Component cleaning method and cleaning device | |
| JPH11319039A (en) | Sterilization method and device for hospital | |
| JPH0684872A (en) | Clean cleaning device | |
| JP3321636B2 (en) | Precision cleaning equipment | |
| JPH05136116A (en) | Semiconductor wafer washing device | |
| DE102019131932A1 (en) | Dishwasher with heat pump | |
| JPH08308416A (en) | Cleaner for animal breeding cage | |
| KR102598124B1 (en) | Apparatus for cleaning substrate | |
| JPH06192865A (en) | Washing and drying device | |
| WO2005033398A1 (en) | Ultrasonic washing method for cloths | |
| JP2003273061A (en) | Treating method and treating system | |
| JP4037178B2 (en) | Cleaning apparatus and cleaning method | |
| JPH03112533A (en) | Washing machine | |
| JP3144036B2 (en) | Chemical treatment apparatus and chemical treatment method | |
| JPH06327604A (en) | Water supply method for dishwasher |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20020917 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071025 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081025 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081025 Year of fee payment: 6 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081025 Year of fee payment: 6 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081025 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091025 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091025 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101025 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101025 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111025 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111025 Year of fee payment: 9 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111025 Year of fee payment: 9 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111025 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121025 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121025 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131025 Year of fee payment: 11 |
|
| EXPY | Cancellation because of completion of term |