JP3298807B2 - Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank - Google Patents
Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tankInfo
- Publication number
- JP3298807B2 JP3298807B2 JP15170897A JP15170897A JP3298807B2 JP 3298807 B2 JP3298807 B2 JP 3298807B2 JP 15170897 A JP15170897 A JP 15170897A JP 15170897 A JP15170897 A JP 15170897A JP 3298807 B2 JP3298807 B2 JP 3298807B2
- Authority
- JP
- Japan
- Prior art keywords
- overflow weir
- tank
- baffle
- oxidation ditch
- aerator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/10—Biological treatment of water, waste water, or sewage
Landscapes
- Aeration Devices For Treatment Of Activated Polluted Sludge (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、下水処理施設に関し、
特にオキシデーションディッチ槽における越流堰の近傍
に設置するバッフルに関する。The present invention relates to a sewage treatment plant,
In particular, the present invention relates to a baffle installed near an overflow weir in an oxidation ditch tank.
【0002】[0002]
【従来の技術】図6は下水をオキシデーションディッチ
法により処理する公知のオキシデーションディッチ槽で
あって、長楕円槽1の中央部分に長手方向に沿って隔壁
2が設置され、前記槽1の端部に隔壁2に近接して縦型
エアレータ3が設置されており、エアレータの回転運動
により槽1内に流入された被処理水を槽壁と隔壁で形成
される水路を還流させながら曝気処理を行い、浄化され
た水は槽1に設けた越流堰4から沈殿槽へと排出される
下水処理設備である。2. Description of the Prior Art FIG. 6 shows a known oxidation ditch tank for treating sewage by an oxidation ditch method. A vertical aerator 3 is installed at an end close to the partition 2, and aeration treatment is performed while the water to be treated that has flowed into the tank 1 due to the rotational movement of the aerator is returned to the water channel formed by the tank wall and the partition. The purified water is discharged from the overflow weir 4 provided in the tank 1 to the sedimentation tank.
【0003】上記設備において縦型エアレータ3を運転
させると、エアレータ周辺部が波立っており、越流堰4
が施設のレイアウトの関係上エアレータの近くに設置さ
れた場合、波の影響により槽1内の曝気液が越流堰4か
ら過剰に流出し、槽内の水位が低下し沈殿槽への排出量
が不安定となっていた。[0003] When the vertical aerator 3 is operated in the above facility, the periphery of the aerator is wavy and the overflow weir 4
Is installed near the aerator due to the layout of the facility, the aerated liquid in the tank 1 overflows excessively from the overflow weir 4 due to the effect of waves, the water level in the tank drops, and the amount discharged to the settling tank Had become unstable.
【0004】[0004]
【発明が解決しようとする課題】そこで、越流堰からの
排出量を安定させるためには越流堰の近辺に防波用のバ
ッフルを設置すればよいことを想起した。しかしなが
ら、バッフルを設置することにより波の影響を抑止でき
るがバッフルによって槽内に浮遊しているスカムを排出
することができなくなる。本発明は、エアレータの回転
運動によって発生する波により槽内の曝気液が越流堰か
ら過剰に流出することを防止するとともに、槽内液面に
浮遊しているスカムを沈殿槽へ簡単容易に排出させるこ
とを目的とする。Therefore, it has been recalled that a baffle for breaking a wave may be installed near the overflow weir in order to stabilize the discharge amount from the overflow weir. However, the effect of the waves can be suppressed by installing the baffle, but the scum floating in the tank cannot be discharged by the baffle. The present invention prevents the aerated liquid in the tank from excessively flowing out of the overflow weir due to the waves generated by the rotational movement of the aerator, and easily and easily transfers the scum floating on the liquid level in the tank to the settling tank. It is intended to be discharged.
【0005】[0005]
【課題を解決するための手段】エアレータ3近傍に越流
堰4を配設したオキシデーションディッチ槽における前
記越流堰4に対向してスカム排出ゲート付バッフルを設
置したことを特徴とする。A baffle with a scum discharge gate is provided opposite to the overflow weir in the oxidation ditch tank in which the overflow weir is disposed near the aerator.
【0006】[0006]
【発明の実施の形態】本発明方法および本発明方法を実
施する装置の実施の形態について図1〜5により説明す
る。図1は本発明にかかるスカム排出ゲート付バッフル
5を越流堰4近辺に設置したオキシデーションディッチ
槽の全体平面図である。オキシデーションディッチ槽そ
のものは図6に示す公知のものと同一構造であって、長
楕円槽1の中央部分に長手方向に沿って隔壁2が設置さ
れ、前記槽1の端部に隔壁2に近接して縦型エアレータ
3が設置されており、エアレータの運転により槽1内に
流入された被処理水を槽壁と隔壁で形成される水路を還
流させながら曝気処理を行い、浄化された水は槽1に設
けた越流堰4から沈殿槽へと排出される構造である。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the method of the present invention and an apparatus for implementing the method of the present invention will be described with reference to FIGS. FIG. 1 is an overall plan view of an oxidation ditch tank in which a baffle 5 with a scum discharge gate according to the present invention is installed near an overflow weir 4. The oxidation ditch tank itself has the same structure as the known one shown in FIG. 6, and a partition wall 2 is installed along the longitudinal direction at a central portion of the oblong tank 1, and is close to the partition wall 2 at an end of the tank 1. A vertical aerator 3 is installed, and aeration treatment is performed while the water to be treated that has flowed into the tank 1 by the operation of the aerator is returned to the water channel formed by the tank wall and the partition walls. In this structure, the water is discharged from the overflow weir 4 provided in the tank 1 to the settling tank.
【0007】図2はスカム排出ゲート付バッフル5の全
体構造を示す斜視図、図3は図1のA−A方向からみた
前記バッフル5の正面図、図4は図3のBーB線断面図
であって、本発明にかかるスカム排出ゲート付バッフル
5は長方形のバッフル基板6の中央部にスカム排出口7
が穿設されており、該排出口7を囲んで上部に挿入口を
有する保持枠8が設置されている。保持枠8は図5に示
すシャッタ9を該シャッタ9の両側部が上下方向にスラ
イドでき、シャッタ9の下面を支承する構造となってお
り、基板6を打ち抜いて一体的に形成されてもよく、チ
ャンネルまたはアングル材を基板に溶接してもよい。FIG. 2 is a perspective view showing the entire structure of the baffle 5 with a scum discharge gate, FIG. 3 is a front view of the baffle 5 as seen from the direction of AA in FIG. 1, and FIG. In the figure, a baffle 5 with a scum discharge gate according to the present invention has a scum discharge port 7 at the center of a rectangular baffle substrate 6.
And a holding frame 8 having an insertion port at an upper portion surrounding the discharge port 7 is provided. The holding frame 8 has a structure in which the shutter 9 shown in FIG. 5 can slide vertically on both sides of the shutter 9 and supports the lower surface of the shutter 9, and may be integrally formed by punching the substrate 6. , Channels or angles may be welded to the substrate.
【0008】バッフル基板6の高さHは該基板を越流堰
4の前面に設置したとき、槽内の波が基板の上縁を越え
ない程度の高さがあればよく、バッフル基板6の幅Lは
越流堰4を包み込める長さがあればよい。バッフル基板
6を槽1に設置したとき、シャッタ面が槽1の壁面と適
当な間隔となるように該基板6の両側を折曲し両端部を
槽1への取付け部10、10´としている。11は、槽
1の適当な箇所に固定されているシャッタ9の吊り上げ
チェーンである。The height H of the baffle substrate 6 may be such that the wave in the tank does not exceed the upper edge of the substrate when the substrate is installed in front of the overflow weir 4. The width L only needs to be long enough to cover the overflow weir 4. When the baffle substrate 6 is installed in the tank 1, both sides of the substrate 6 are bent so that the shutter surface is at an appropriate distance from the wall surface of the tank 1, and both ends are provided as attachment portions 10, 10 ′ to the tank 1. . Reference numeral 11 denotes a lifting chain of the shutter 9 fixed to an appropriate portion of the tank 1.
【0009】上記構造からなるスカム排出ゲート付バッ
フル5を縦型エアレータ3近傍に配置されている越流堰
4に対向して槽1壁面に設置することによりエアレータ
3の回転運動により発生する波はスカム排出ゲート付バ
ッフル5で遮られて越流堰4からの曝気液の過剰流出を
防止できる。そして、槽1内にスカムが発生し、液面を
浮遊し出せばシャッタ吊り上げチェーン11を引き上げ
てシャッタ9を上昇させることによりバッフルのゲート
となる排出口7が開口し、スカムは排出口7から越流堰
4へと排出される。When the baffle 5 with the scum discharge gate having the above structure is installed on the wall of the tank 1 so as to face the overflow weir 4 arranged near the vertical aerator 3, the wave generated by the rotational movement of the aerator 3 is reduced. Excessive outflow of the aerated liquid from the overflow weir 4 which is blocked by the baffle 5 with the scum discharge gate can be prevented. When scum is generated in the tank 1 and the liquid surface floats, the shutter lifting chain 11 is pulled up and the shutter 9 is raised to open a discharge port 7 serving as a baffle gate, and the scum is discharged from the discharge port 7. It is discharged to the overflow weir 4.
【0010】[0010]
【発明の効果】本発明はスカム排出ゲート付バッフルを
越流堰に対向して設置したことによりエアレータの回転
運動により発生する波によって越流堰からの曝気液の過
度の流出を防止できるとともに、槽内に発生したスカム
はバッフルのゲートを開口することにより槽外へ排出で
きる効果を奏する。According to the present invention, by installing the baffle with a scum discharge gate opposite to the overflow weir, it is possible to prevent an excessive outflow of the aerated liquid from the overflow weir due to waves generated by the rotational movement of the aerator. The scum generated in the tank has an effect of being able to be discharged out of the tank by opening the gate of the baffle.
【図1】本発明方法を実施する装置の1実施態様の説明
図。FIG. 1 is an explanatory view of one embodiment of an apparatus for performing the method of the present invention.
【図2】本発明にかかるスカム排出ゲート付バッフルの
1実施態様を示す斜視図。FIG. 2 is a perspective view showing one embodiment of a baffle with a scum discharge gate according to the present invention.
【図3】図1におけるA−A方向からみた正面図。FIG. 3 is a front view as seen from the AA direction in FIG. 1;
【図4】図3におけるB−B断面図。FIG. 4 is a sectional view taken along line BB in FIG. 3;
【図5】本発明にかかるシャッタの説明図。FIG. 5 is an explanatory diagram of a shutter according to the present invention.
【図6】従来からのオキシデーションディッチ槽の説明
図。FIG. 6 is an explanatory view of a conventional oxidation ditch tank.
1 長楕円槽 2 隔壁 3 縦型エアレータ 4 越流堰 5 スカム排出ゲート付バッフル 6 バッフル基板 7 スカム排出口 8 保持枠 9 シャッタ 10、10´ 取付け部 11 シャッタ吊り上げチェーン DESCRIPTION OF SYMBOLS 1 Oblong tank 2 Partition wall 3 Vertical aerator 4 Overflow weir 5 Baffle with scum discharge gate 6 Baffle board 7 Scum discharge port 8 Holding frame 9 Shutter 10, 10 'Mounting part 11 Shutter lifting chain
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C02F 3/14 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) C02F 3/14
Claims (3)
設したオキシデーションディッチ槽における前記越流堰
(4)に対向してバッフルを設置することにより越流堰
から曝気液の過度の流出を防止する方法。A baffle is installed in the oxidation ditch tank, in which an overflow weir (4) is disposed in the vicinity of an aerator (3), in opposition to the overflow weir (4), so that aeration liquid can be removed from the overflow weir. How to prevent excessive spills.
設したオキシデーションディッチ槽における前記越流堰
(4)に対向してスカム排出ゲート付バッフル(5)を
設置したことを特徴とする越流堰から曝気液の過度の流
出を防止する装置。2. A baffle (5) with a scum discharge gate is provided opposite to the overflow weir (4) in an oxidation ditch tank having an overflow weir (4) disposed near an aerator (3). A device that prevents the aeration liquid from flowing out of the overflow weir.
基板(6)に設けた排出口(7)を上下方向にスライド
するシャッタ(9)で開閉する構造であることを特徴と
する請求項2記載の越流堰から曝気液の過度の流出を防
止する装置。3. A baffle with a scum discharge gate having a structure in which a discharge port (7) provided in a baffle substrate (6) is opened and closed by a shutter (9) that slides in a vertical direction. To prevent excessive outflow of aerated liquid from the overflow weir.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15170897A JP3298807B2 (en) | 1997-05-27 | 1997-05-27 | Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15170897A JP3298807B2 (en) | 1997-05-27 | 1997-05-27 | Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10323686A JPH10323686A (en) | 1998-12-08 |
JP3298807B2 true JP3298807B2 (en) | 2002-07-08 |
Family
ID=15524542
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15170897A Expired - Fee Related JP3298807B2 (en) | 1997-05-27 | 1997-05-27 | Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3298807B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4067952B2 (en) * | 2002-12-09 | 2008-03-26 | 株式会社日立プラントテクノロジー | Oxidation ditch |
JP2007326030A (en) * | 2006-06-07 | 2007-12-20 | Maezawa Ind Inc | Operation method of oxidation ditch |
-
1997
- 1997-05-27 JP JP15170897A patent/JP3298807B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH10323686A (en) | 1998-12-08 |
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