JP3298807B2 - Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank - Google Patents
Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tankInfo
- Publication number
- JP3298807B2 JP3298807B2 JP15170897A JP15170897A JP3298807B2 JP 3298807 B2 JP3298807 B2 JP 3298807B2 JP 15170897 A JP15170897 A JP 15170897A JP 15170897 A JP15170897 A JP 15170897A JP 3298807 B2 JP3298807 B2 JP 3298807B2
- Authority
- JP
- Japan
- Prior art keywords
- overflow weir
- tank
- baffle
- oxidation ditch
- aerator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/10—Biological treatment of water, waste water, or sewage
Landscapes
- Aeration Devices For Treatment Of Activated Polluted Sludge (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、下水処理施設に関し、
特にオキシデーションディッチ槽における越流堰の近傍
に設置するバッフルに関する。The present invention relates to a sewage treatment plant,
In particular, the present invention relates to a baffle installed near an overflow weir in an oxidation ditch tank.
【０００２】[0002]
【従来の技術】図６は下水をオキシデーションディッチ
法により処理する公知のオキシデーションディッチ槽で
あって、長楕円槽１の中央部分に長手方向に沿って隔壁
２が設置され、前記槽１の端部に隔壁２に近接して縦型
エアレータ３が設置されており、エアレータの回転運動
により槽１内に流入された被処理水を槽壁と隔壁で形成
される水路を還流させながら曝気処理を行い、浄化され
た水は槽１に設けた越流堰４から沈殿槽へと排出される
下水処理設備である。2. Description of the Prior Art FIG. 6 shows a known oxidation ditch tank for treating sewage by an oxidation ditch method. A vertical aerator 3 is installed at an end close to the partition 2, and aeration treatment is performed while the water to be treated that has flowed into the tank 1 due to the rotational movement of the aerator is returned to the water channel formed by the tank wall and the partition. The purified water is discharged from the overflow weir 4 provided in the tank 1 to the sedimentation tank.
【０００３】上記設備において縦型エアレータ３を運転
させると、エアレータ周辺部が波立っており、越流堰４
が施設のレイアウトの関係上エアレータの近くに設置さ
れた場合、波の影響により槽１内の曝気液が越流堰４か
ら過剰に流出し、槽内の水位が低下し沈殿槽への排出量
が不安定となっていた。[0003] When the vertical aerator 3 is operated in the above facility, the periphery of the aerator is wavy and the overflow weir 4
Is installed near the aerator due to the layout of the facility, the aerated liquid in the tank 1 overflows excessively from the overflow weir 4 due to the effect of waves, the water level in the tank drops, and the amount discharged to the settling tank Had become unstable.
【０００４】[0004]
【発明が解決しようとする課題】そこで、越流堰からの
排出量を安定させるためには越流堰の近辺に防波用のバ
ッフルを設置すればよいことを想起した。しかしなが
ら、バッフルを設置することにより波の影響を抑止でき
るがバッフルによって槽内に浮遊しているスカムを排出
することができなくなる。本発明は、エアレータの回転
運動によって発生する波により槽内の曝気液が越流堰か
ら過剰に流出することを防止するとともに、槽内液面に
浮遊しているスカムを沈殿槽へ簡単容易に排出させるこ
とを目的とする。Therefore, it has been recalled that a baffle for breaking a wave may be installed near the overflow weir in order to stabilize the discharge amount from the overflow weir. However, the effect of the waves can be suppressed by installing the baffle, but the scum floating in the tank cannot be discharged by the baffle. The present invention prevents the aerated liquid in the tank from excessively flowing out of the overflow weir due to the waves generated by the rotational movement of the aerator, and easily and easily transfers the scum floating on the liquid level in the tank to the settling tank. It is intended to be discharged.
【０００５】[0005]
【課題を解決するための手段】エアレータ３近傍に越流
堰４を配設したオキシデーションディッチ槽における前
記越流堰４に対向してスカム排出ゲート付バッフルを設
置したことを特徴とする。A baffle with a scum discharge gate is provided opposite to the overflow weir in the oxidation ditch tank in which the overflow weir is disposed near the aerator.
【０００６】[0006]
【発明の実施の形態】本発明方法および本発明方法を実
施する装置の実施の形態について図１〜５により説明す
る。図１は本発明にかかるスカム排出ゲート付バッフル
５を越流堰４近辺に設置したオキシデーションディッチ
槽の全体平面図である。オキシデーションディッチ槽そ
のものは図６に示す公知のものと同一構造であって、長
楕円槽１の中央部分に長手方向に沿って隔壁２が設置さ
れ、前記槽１の端部に隔壁２に近接して縦型エアレータ
３が設置されており、エアレータの運転により槽１内に
流入された被処理水を槽壁と隔壁で形成される水路を還
流させながら曝気処理を行い、浄化された水は槽１に設
けた越流堰４から沈殿槽へと排出される構造である。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the method of the present invention and an apparatus for implementing the method of the present invention will be described with reference to FIGS. FIG. 1 is an overall plan view of an oxidation ditch tank in which a baffle 5 with a scum discharge gate according to the present invention is installed near an overflow weir 4. The oxidation ditch tank itself has the same structure as the known one shown in FIG. 6, and a partition wall 2 is installed along the longitudinal direction at a central portion of the oblong tank 1, and is close to the partition wall 2 at an end of the tank 1. A vertical aerator 3 is installed, and aeration treatment is performed while the water to be treated that has flowed into the tank 1 by the operation of the aerator is returned to the water channel formed by the tank wall and the partition walls. In this structure, the water is discharged from the overflow weir 4 provided in the tank 1 to the settling tank.
【０００７】図２はスカム排出ゲート付バッフル５の全
体構造を示す斜視図、図３は図１のＡ−Ａ方向からみた
前記バッフル５の正面図、図４は図３のＢーＢ線断面図
であって、本発明にかかるスカム排出ゲート付バッフル
５は長方形のバッフル基板６の中央部にスカム排出口７
が穿設されており、該排出口７を囲んで上部に挿入口を
有する保持枠８が設置されている。保持枠８は図５に示
すシャッタ９を該シャッタ９の両側部が上下方向にスラ
イドでき、シャッタ９の下面を支承する構造となってお
り、基板６を打ち抜いて一体的に形成されてもよく、チ
ャンネルまたはアングル材を基板に溶接してもよい。FIG. 2 is a perspective view showing the entire structure of the baffle 5 with a scum discharge gate, FIG. 3 is a front view of the baffle 5 as seen from the direction of AA in FIG. 1, and FIG. In the figure, a baffle 5 with a scum discharge gate according to the present invention has a scum discharge port 7 at the center of a rectangular baffle substrate 6.
And a holding frame 8 having an insertion port at an upper portion surrounding the discharge port 7 is provided. The holding frame 8 has a structure in which the shutter 9 shown in FIG. 5 can slide vertically on both sides of the shutter 9 and supports the lower surface of the shutter 9, and may be integrally formed by punching the substrate 6. , Channels or angles may be welded to the substrate.
【０００８】バッフル基板６の高さＨは該基板を越流堰
４の前面に設置したとき、槽内の波が基板の上縁を越え
ない程度の高さがあればよく、バッフル基板６の幅Ｌは
越流堰４を包み込める長さがあればよい。バッフル基板
６を槽１に設置したとき、シャッタ面が槽１の壁面と適
当な間隔となるように該基板６の両側を折曲し両端部を
槽１への取付け部１０、１０´としている。１１は、槽
１の適当な箇所に固定されているシャッタ９の吊り上げ
チェーンである。The height H of the baffle substrate 6 may be such that the wave in the tank does not exceed the upper edge of the substrate when the substrate is installed in front of the overflow weir 4. The width L only needs to be long enough to cover the overflow weir 4. When the baffle substrate 6 is installed in the tank 1, both sides of the substrate 6 are bent so that the shutter surface is at an appropriate distance from the wall surface of the tank 1, and both ends are provided as attachment portions 10, 10 ′ to the tank 1. . Reference numeral 11 denotes a lifting chain of the shutter 9 fixed to an appropriate portion of the tank 1.
【０００９】上記構造からなるスカム排出ゲート付バッ
フル５を縦型エアレータ３近傍に配置されている越流堰
４に対向して槽１壁面に設置することによりエアレータ
３の回転運動により発生する波はスカム排出ゲート付バ
ッフル５で遮られて越流堰４からの曝気液の過剰流出を
防止できる。そして、槽１内にスカムが発生し、液面を
浮遊し出せばシャッタ吊り上げチェーン１１を引き上げ
てシャッタ９を上昇させることによりバッフルのゲート
となる排出口７が開口し、スカムは排出口７から越流堰
４へと排出される。When the baffle 5 with the scum discharge gate having the above structure is installed on the wall of the tank 1 so as to face the overflow weir 4 arranged near the vertical aerator 3, the wave generated by the rotational movement of the aerator 3 is reduced. Excessive outflow of the aerated liquid from the overflow weir 4 which is blocked by the baffle 5 with the scum discharge gate can be prevented. When scum is generated in the tank 1 and the liquid surface floats, the shutter lifting chain 11 is pulled up and the shutter 9 is raised to open a discharge port 7 serving as a baffle gate, and the scum is discharged from the discharge port 7. It is discharged to the overflow weir 4.
【００１０】[0010]
【発明の効果】本発明はスカム排出ゲート付バッフルを
越流堰に対向して設置したことによりエアレータの回転
運動により発生する波によって越流堰からの曝気液の過
度の流出を防止できるとともに、槽内に発生したスカム
はバッフルのゲートを開口することにより槽外へ排出で
きる効果を奏する。According to the present invention, by installing the baffle with a scum discharge gate opposite to the overflow weir, it is possible to prevent an excessive outflow of the aerated liquid from the overflow weir due to waves generated by the rotational movement of the aerator. The scum generated in the tank has an effect of being able to be discharged out of the tank by opening the gate of the baffle.
【図１】本発明方法を実施する装置の１実施態様の説明
図。FIG. 1 is an explanatory view of one embodiment of an apparatus for performing the method of the present invention.
【図２】本発明にかかるスカム排出ゲート付バッフルの
１実施態様を示す斜視図。FIG. 2 is a perspective view showing one embodiment of a baffle with a scum discharge gate according to the present invention.
【図３】図１におけるＡ−Ａ方向からみた正面図。FIG. 3 is a front view as seen from the AA direction in FIG. 1;
【図４】図３におけるＢ−Ｂ断面図。FIG. 4 is a sectional view taken along line BB in FIG. 3;
【図５】本発明にかかるシャッタの説明図。FIG. 5 is an explanatory diagram of a shutter according to the present invention.
【図６】従来からのオキシデーションディッチ槽の説明
図。FIG. 6 is an explanatory view of a conventional oxidation ditch tank.
１ 長楕円槽 ２ 隔壁 ３ 縦型エアレータ ４ 越流堰 ５ スカム排出ゲート付バッフル ６ バッフル基板 ７ スカム排出口 ８ 保持枠 ９ シャッタ １０、１０´ 取付け部 １１ シャッタ吊り上げチェーン DESCRIPTION OF SYMBOLS 1 Oblong tank 2 Partition wall 3 Vertical aerator 4 Overflow weir 5 Baffle with scum discharge gate 6 Baffle board 7 Scum discharge port 8 Holding frame 9 Shutter 10, 10 'Mounting part 11 Shutter lifting chain
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) C02F 3/14 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) C02F 3/14
Claims (3)
設したオキシデーションディッチ槽における前記越流堰
（４）に対向してバッフルを設置することにより越流堰
から曝気液の過度の流出を防止する方法。A baffle is installed in the oxidation ditch tank, in which an overflow weir (4) is disposed in the vicinity of an aerator (3), in opposition to the overflow weir (4), so that aeration liquid can be removed from the overflow weir. How to prevent excessive spills.
設したオキシデーションディッチ槽における前記越流堰
（４）に対向してスカム排出ゲート付バッフル（５）を
設置したことを特徴とする越流堰から曝気液の過度の流
出を防止する装置。2. A baffle (5) with a scum discharge gate is provided opposite to the overflow weir (4) in an oxidation ditch tank having an overflow weir (4) disposed near an aerator (3). A device that prevents the aeration liquid from flowing out of the overflow weir.
基板（６）に設けた排出口（７）を上下方向にスライド
するシャッタ（９）で開閉する構造であることを特徴と
する請求項２記載の越流堰から曝気液の過度の流出を防
止する装置。3. A baffle with a scum discharge gate having a structure in which a discharge port (7) provided in a baffle substrate (6) is opened and closed by a shutter (9) that slides in a vertical direction. To prevent excessive outflow of aerated liquid from the overflow weir.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15170897A JP3298807B2 (en) | 1997-05-27 | 1997-05-27 | Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15170897A JP3298807B2 (en) | 1997-05-27 | 1997-05-27 | Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10323686A JPH10323686A (en) | 1998-12-08 |
| JP3298807B2 true JP3298807B2 (en) | 2002-07-08 |
Family
ID=15524542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15170897A Expired - Fee Related JP3298807B2 (en) | 1997-05-27 | 1997-05-27 | Method and apparatus for preventing excessive outflow of aerated liquid from overflow weir of oxidation ditch tank |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3298807B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4067952B2 (en) * | 2002-12-09 | 2008-03-26 | 株式会社日立プラントテクノロジー | Oxidation ditch |
| JP2007326030A (en) * | 2006-06-07 | 2007-12-20 | Maezawa Ind Inc | Operation method of oxidation ditch |
-
1997
- 1997-05-27 JP JP15170897A patent/JP3298807B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10323686A (en) | 1998-12-08 |
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