JP3265166B2 - Electrostatic deflector - Google Patents
Electrostatic deflectorInfo
- Publication number
- JP3265166B2 JP3265166B2 JP26983395A JP26983395A JP3265166B2 JP 3265166 B2 JP3265166 B2 JP 3265166B2 JP 26983395 A JP26983395 A JP 26983395A JP 26983395 A JP26983395 A JP 26983395A JP 3265166 B2 JP3265166 B2 JP 3265166B2
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic deflector
- voltage
- electrode
- electrodes
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Description
【０００１】[0001]
【発明の属する技術分野】この発明は、例えば癌治療装
置や半導体製造時に用いられる高エネルギー重粒子もし
くは電子などを加速する静電偏向器に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrostatic deflector for accelerating high energy heavy particles or electrons used in, for example, a cancer treatment apparatus or semiconductor manufacturing.
【０００２】[0002]
【従来の技術】図１０は、例えば、シーエィチ・スタイ
ンバック、「欧州原子力研究機関における新採収システ
ム」、粒子加速器国際会議会報、ワシントン、１９９３
年、３３９頁（Ｃｈ．Ｓｔｅｉｎｂａｃｈ，“Ｔｈｅ
Ｎｅｗ Ｓｌｏｗ Ｅｘｔｒａｃｔｉｏｎ ｓｙｓｔｅ
ｍ ｏｆ ｔｈｅ ＣＥＲＮ ＰＳ”，Ｐｒｏｃ． ｏ
ｆ Ｉｎｔ．Ｃｏｎｆ． ｏｎ Ｐａｒｔｉｃｌｅ Ａ
ｃｃｅｌｅｒａｔｏｒｓ． Ｗａｓｈｉｎｇｔｏｎ Ｄ
Ｃ，１９９３．ｐ．３３９）に示される静電偏向器の構
造を示す模式図である。図において、１は高圧電源、２
は陰極、３は陽極、４は陰極２の表面に形成されたアル
マイト、５はイオンである。2. Description of the Related Art FIG. 10 shows, for example, C. Steinbach, "New Harvesting System at the European Atomic Energy Research Institute", Bulletin of the International Conference on Particle Accelerators, Washington, 1993.
Year 339, Ch. Steinbach, "The
New Slow Extraction system
m of the CERN PS ", Proc. o
f Int. Conf. on Particle A
ccelerators. Washington D
C, 1993. p. FIG. 339) is a schematic view showing the structure of the electrostatic deflector shown in 339). In the figure, 1 is a high voltage power supply, 2
Is a cathode, 3 is an anode, 4 is an alumite formed on the surface of the cathode 2, and 5 is an ion.
【０００３】この静電偏向器では、高圧電源１において
発生した高電圧が陰極２に印加され、陽極３との間に高
電界を発生させる。この際、アルミで作成した陰極２の
表面にアルマイト４が形成されていると、より高電界を
形成できる。この理由は、電極の表面がアルマイトなど
の絶縁物で覆われることで、電極間放電の種となる電極
表面からの電子の電界放出が抑えられて電極間の放電が
抑制されるために、電極間に高電圧を印加できるからで
ある。なお、このような構成を有した通常の静電偏向器
（印加電圧、数１０ｋＶ）では、絶縁被覆上に荷電粒子
がチャージアップして被加速粒子の軌道に悪影響を与え
るため、絶縁被覆を設けることはできない。しかし、１
００ｋＶ程度の高電圧印加型においては、絶縁被覆に印
加される高電界のため、絶縁被覆を通して微小な電流が
流れ、チャージアップが生じない。このような高電圧が
印加できる場合には高速のイオンを短い偏向距離で偏向
できるため静電偏向器として有利である。In this electrostatic deflector, a high voltage generated in a high voltage power supply 1 is applied to a cathode 2 to generate a high electric field between the cathode 3 and an anode 3. At this time, if the alumite 4 is formed on the surface of the cathode 2 made of aluminum, a higher electric field can be formed. This is because the surface of the electrode is covered with an insulator such as alumite, which suppresses the electric field emission of electrons from the electrode surface, which is a source of interelectrode discharge, and suppresses the discharge between the electrodes. This is because a high voltage can be applied in between. In a normal electrostatic deflector having such a configuration (applied voltage: several tens of kV), the charged particles are charged up on the insulating coating and adversely affect the trajectory of the accelerated particles. It is not possible. However, 1
In a high voltage application type of about 00 kV, a small electric current flows through the insulating coating due to a high electric field applied to the insulating coating, and no charge-up occurs. When such a high voltage can be applied, high-speed ions can be deflected with a short deflection distance, which is advantageous as an electrostatic deflector.
【０００４】[0004]
【発明が解決しようとする課題】従来の静電偏向器は以
上のように構成されているので、陰極２をアルミで構成
してより高電界を形成するためにアルマイト加工する必
要がある一方、アルマイト加工を施した陰極２は温度が
１００℃を越えると急速に絶縁耐圧が低下する課題があ
った。これは、アルマイト表面の細孔を封じるための封
孔処理（沸騰水中にアルマイトを浸し、アルマイトを膨
潤させて細孔を封じる処理）に用いられる水が抜けるた
めにアルマイト表面に細孔が生じ、この孔から電子が放
出され、放電が開始するためと考えられ、陰極を１００
℃以上に加熱できず、静電偏向器の設置されている真空
チェンバーを十分にベーキングできない。このため、１
００ｋＶ程度の高電圧印加型では陰極温度が１００℃以
上に上昇するとチェンバー内の圧力が上がりガスとイオ
ンとの衝突によりイオンが失われるため、効率的なイオ
ンの輸送が困難になる課題があった。Since the conventional electrostatic deflector is configured as described above, it is necessary to form the cathode 2 from aluminum and perform alumite processing to form a higher electric field. When the temperature exceeds 100 ° C., the anodized cathode 2 has a problem that the withstand voltage rapidly decreases. This is because pores are formed on the surface of the alumite because the water used in the pore-sealing treatment (the process of immersing the alumite in boiling water and swelling the alumite to seal the pores) for sealing the pores on the surface of the alumite is removed. Electrons are emitted from these holes, and it is considered that discharge starts.
It cannot be heated above ℃ and the vacuum chamber in which the electrostatic deflector is installed cannot be baked sufficiently. Therefore, 1
In a high voltage application type of about 00 kV, when the cathode temperature rises to 100 ° C. or higher, the pressure in the chamber increases, and ions are lost due to collision between gas and ions, so that there is a problem that efficient ion transport becomes difficult. .
【０００５】また、陽極を電圧印加前に真空中で高温
（数１００℃）で加熱処理した後、高電圧を印加する
と、絶縁耐圧が上がる傾向がある。この傾向は、充分な
加熱が可能な陰極にも見られる。この原因についての定
説はないが、電極の吸蔵ガスの脱ガスによって放電の種
となる電極からのガスの発生を抑えるなどのメカニズム
が考えられている。このため、電極間の絶縁耐圧を向上
させる目的で、陽極もしくは陰極を加熱することが考え
られるが、アルマイト加工された陰極では前記理由によ
り陽極加熱処理時にも陰極の温度を１００℃以下に抑え
なければならないため、陽極の充分な加熱処理が行えな
いという課題もあった。[0005] In addition, if a high voltage is applied after heating the anode at a high temperature (several hundreds of degrees Celsius) in a vacuum before applying a voltage, the withstand voltage tends to increase. This tendency is also observed in a cathode that can be sufficiently heated. Although there is no established theory for this cause, a mechanism has been conceived, such as suppressing generation of gas from the electrode, which is a seed for electric discharge, by degassing the occluded gas of the electrode. For this reason, it is conceivable to heat the anode or the cathode for the purpose of improving the dielectric strength between the electrodes. However, in the case of the anodized cathode, the temperature of the cathode must be suppressed to 100 ° C. or less even during the anode heating treatment for the above-described reason. Therefore, there is also a problem that a sufficient heat treatment of the anode cannot be performed.
【０００６】また、高電圧印加時には、陰極と陽極との
間で小さな放電が発生し、それが大きな放電に成長する
現象が見られる。このため、長時間の無人運転時に小さ
な放電が大きな放電にまで成長し、陰極の絶縁被覆が破
損し、高電圧を印加できなくなるという課題もあった。When a high voltage is applied, a small discharge is generated between the cathode and the anode, and a phenomenon is seen in which the small discharge grows into a large discharge. For this reason, there is also a problem that a small discharge grows into a large discharge during a long unmanned operation, the insulating coating of the cathode is damaged, and a high voltage cannot be applied.
【０００７】この発明は、上記のような課題を解決する
ためになされたもので、耐熱性の高い絶縁被覆を備えた
電極を用いることにより前記電極の充分な加熱処理を可
能にするとともに、電圧の印加される一対の電極に対す
る加熱処理を可能とし、さらに、絶縁耐圧を高めて放電
による絶縁被覆の破壊を防止できる、安全性および信頼
性を向上させた静電偏向器を得ることを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and by using an electrode provided with an insulating coating having high heat resistance, it is possible to sufficiently heat the electrode, It is an object of the present invention to provide an electrostatic deflector with improved safety and reliability, which can perform a heat treatment on a pair of electrodes to which a voltage is applied, and can further increase breakdown voltage to prevent breakdown of an insulating coating due to electric discharge. I do.
【０００８】[0008]
【課題を解決するための手段】請求項１記載の発明に係
る静電偏向器は、電圧印加手段により電圧の印加される
対向する一対の電極のうちの少なくとも一方の電極表面
に耐熱温度が２００℃を越える絶縁被覆を形成した構成
を備えたものである。According to a first aspect of the present invention, there is provided an electrostatic deflector according to the first aspect of the present invention, wherein at least one of a pair of opposed electrodes to which a voltage is applied by a voltage applying means has a heat resistant temperature of 200. It has a configuration in which an insulating coating over 100 ° C. is formed.
【０００９】請求項２記載の発明に係る静電偏向器は、
絶縁被覆としてポリイミドを用いる構成を備えたもので
ある。According to a second aspect of the present invention, there is provided an electrostatic deflector comprising:
It has a configuration using polyimide as the insulating coating.
【００１０】請求項３記載の発明に係る静電偏向器は、
絶縁被覆としてガラスを用いる構成を備えたものであ
る。According to a third aspect of the present invention, there is provided an electrostatic deflector comprising:
It has a configuration using glass as an insulating coating.
【００１１】請求項４記載の発明に係る静電偏向器は、
対向する電極の少なくとも一方の電極をアルミにより構
成したものである。According to a fourth aspect of the present invention, there is provided an electrostatic deflector comprising:
At least one of the opposed electrodes is made of aluminum.
【００１２】請求項５記載の発明に係る静電偏向器は、
一対の電極を加熱する加熱手段を備えたものである。According to a fifth aspect of the present invention, there is provided an electrostatic deflector comprising:
It is provided with a heating means for heating the pair of electrodes.
【００１３】請求項６記載の発明に係る静電偏向器は、
電子衝撃加熱を用いた加熱手段を備えたものである。[0013] The electrostatic deflector according to claim 6 of the present invention,
A heating means using electron impact heating is provided.
【００１４】請求項７記載の発明に係る静電偏向器は、
被加熱電極と加熱手段との距離を可変する距離調整機構
を備えたものである。[0014] The electrostatic deflector according to the invention of claim 7 is:
It is provided with a distance adjusting mechanism for varying the distance between the electrode to be heated and the heating means.
【００１５】請求項８記載の発明に係る静電偏向器は、
電子線放射用のフィラメントおよび、該フィラメントと
被加熱電極との間に電圧を印加するための回路を遮断す
る接点を有した加熱手段と、前記フィラメントと前記被
加熱電極との距離を調整すると共に、前記回路を遮断す
る接点間の距離を調整する距離調整機構とを備えたもの
である。The electrostatic deflector according to the invention of claim 8 is:
A filament for electron beam emission, and heating means having a contact for interrupting a circuit for applying a voltage between the filament and the electrode to be heated, and adjusting a distance between the filament and the electrode to be heated. And a distance adjusting mechanism for adjusting the distance between the contacts for interrupting the circuit.
【００１６】請求項９記載の発明に係る静電偏向器は、
輻射加熱を用いた加熱手段を備えたものである。According to a ninth aspect of the present invention, there is provided an electrostatic deflector comprising:
It is provided with a heating means using radiant heating.
【００１７】請求項１０記載の発明に係る静電偏向器
は、赤外線による加熱を行うための赤外線ランプと、該
赤外線ランプへ通電を行うためのランプ電源と、前記赤
外線ランプから輻射された赤外線を電極表面で吸収する
ことで前記電極の温度を上昇させる吸熱被膜とを輻射加
熱を用いた加熱手段として備えたものである。According to a tenth aspect of the present invention, there is provided an electrostatic deflector comprising: an infrared lamp for heating by infrared rays; a lamp power supply for energizing the infrared lamp; and an infrared ray radiated from the infrared lamp. An endothermic coating for increasing the temperature of the electrode by absorbing it on the electrode surface is provided as heating means using radiant heating.
【００１８】請求項１１記載の発明に係る静電偏向器
は、電極の少なくとも他方の電極に対向している面に絶
縁被覆を施し、かつ、絶縁被覆の施されていない表面箇
所を設けた構成を備えたものである。According to the eleventh aspect of the present invention, in the electrostatic deflector, at least a surface of the electrode facing the other electrode is coated with an insulating material, and a surface portion not provided with the insulating material is provided. It is provided with.
【００１９】請求項１２記載の発明に係る静電偏向器
は、電極内に配置されたヒータおよび該ヒータへ通電を
行うためのヒータ用電源により前記電極を加熱する加熱
手段を備えたものである。According to a twelfth aspect of the present invention, there is provided an electrostatic deflector comprising a heater disposed in an electrode and a heating means for heating the electrode by a heater power supply for supplying electricity to the heater. .
【００２０】請求項１３記載の発明に係る静電偏向器
は、ヒータとヒータ用電源との間の回路を遮断するため
の接点、および該接点間の距離を調整する距離調整機構
を備えたものである。According to a thirteenth aspect of the present invention, there is provided an electrostatic deflector comprising a contact for interrupting a circuit between a heater and a heater power supply, and a distance adjusting mechanism for adjusting a distance between the contacts. It is.
【００２１】請求項１４記載の発明に係る静電偏向器
は、電極間に流れる電流を計測する電流計測手段と、一
定時間毎の前記電流の積算値を測定する電流積算値測定
手段と、該電流積算値測定手段により測定した前記電流
の積算値を所定値と比較し、前記電流の積算値が前記所
定値を越えることのないように、電圧印加手段により前
記電極間に印加される電圧を調整する制御手段とを備え
たものである。According to a fourteenth aspect of the present invention, there is provided an electrostatic deflector comprising: a current measuring means for measuring a current flowing between the electrodes; a current integrated value measuring means for measuring an integrated value of the current at predetermined time intervals; The integrated value of the current measured by the integrated current value measuring means is compared with a predetermined value, and the voltage applied between the electrodes by the voltage applying means is determined so that the integrated value of the current does not exceed the predetermined value. Control means for adjusting.
【００２２】請求項１５記載の発明に係る静電偏向器
は、真空チェンバー内の圧力を計測する圧力測定手段
と、該圧力測定手段により測定した前記圧力を所定値と
比較し、前記圧力が前記所定値を越えることのないよう
に、電圧印加手段により電極間に印加される電圧を調整
する制御手段とを備えたものである。According to a fifteenth aspect of the present invention, in the electrostatic deflector, a pressure measuring means for measuring a pressure in the vacuum chamber, and the pressure measured by the pressure measuring means are compared with a predetermined value. Control means for adjusting the voltage applied between the electrodes by the voltage applying means so as not to exceed a predetermined value.
【００２３】[0023]
【発明の実施の形態】以下、この発明の実施の一形態に
ついて説明する。 実施の形態１．図１は、この発明の実施の形態１の静電
偏向器の構成を示す模式図である。図において、１は高
圧電源（電圧印加手段）、２は陰極（電極）、３は陽極
（電極）である。６は陽極３に対向する側の陰極２の表
面に形成したポリイミド被膜（絶縁被覆）、７は陰極２
を加熱するためのフィラメント（加熱手段）、８はフィ
ラメント７を加熱するためのフィラメント加熱電源（加
熱手段）、９は電子衝撃電源（加熱手段）、１１は接点
１０およびフィラメント７を移動するための距離調整機
構である。１２は陽極３に内蔵されたヒータ（加熱手
段）、１３はヒータ１２を加熱するためのヒータ加熱用
電源である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below. Embodiment 1 FIG. FIG. 1 is a schematic diagram illustrating a configuration of an electrostatic deflector according to Embodiment 1 of the present invention. In the figure, 1 is a high voltage power supply (voltage applying means), 2 is a cathode (electrode), and 3 is an anode (electrode). 6 is a polyimide coating (insulating coating) formed on the surface of the cathode 2 on the side opposite to the anode 3, and 7 is the cathode 2
(Heating means) for heating the filament 7, a filament heating power supply (heating means) for heating the filament 7, an electron impact power supply (heating means) 9, and a contact 11 for moving the contact 10 and the filament 7. This is a distance adjustment mechanism. Reference numeral 12 denotes a heater (heating means) built in the anode 3, and reference numeral 13 denotes a heater heating power supply for heating the heater 12.
【００２４】次に動作について説明する。この静電偏向
器では、陰極２と陽極３との間の絶縁耐圧を向上させる
ために陰極２の表面にはポリイミド被膜６が形成されて
いる。このように陰極２の表面を絶縁被覆であるポリイ
ミド被膜６により覆うことで、アルマイト被膜と同様に
電極からの電子放出が抑制され、電極間の絶縁耐圧が向
上するばかりでなく、ベーキングのために陰極２を加熱
しても電極間の耐圧性能は変化せず、ポリイミド被膜の
耐熱温度は４００℃程度であることから２００℃から３
５０℃程度に加熱処理を行うベーキングによる劣化は少
ない。Next, the operation will be described. In this electrostatic deflector, a polyimide film 6 is formed on the surface of the cathode 2 in order to improve the dielectric strength between the cathode 2 and the anode 3. By covering the surface of the cathode 2 with the polyimide coating 6 which is an insulating coating in this manner, the emission of electrons from the electrodes is suppressed as in the case of the alumite coating, and not only the withstand voltage between the electrodes is improved, but also baking is performed. Even if the cathode 2 is heated, the pressure resistance between the electrodes does not change, and the heat-resistant temperature of the polyimide film is about 400 ° C.
Deterioration due to baking in which heat treatment is performed at about 50 ° C. is small.
【００２５】さらに、陰極２は、全面をポリイミド被膜
で覆うのではなく、陽極３と対向する電界強度の高い電
極の下面だけを覆う構造にしてある。これは、陰極２を
電子衝撃加熱するために、陰極２の上面を金属面にし、
電子が陰極に流入するようにするためと陰極の位置精度
を向上させるためである。この状態で電極の耐電圧特性
を向上させるために真空中に設置した陰極２と陽極３と
を電圧を印加しない状態で加熱する。Further, the cathode 2 is structured so as not to cover the entire surface with a polyimide film, but to cover only the lower surface of the electrode having a high electric field strength facing the anode 3. This is to make the upper surface of the cathode 2 a metal surface in order to heat the cathode 2 by electron impact heating.
This is because the electrons flow into the cathode and the positional accuracy of the cathode is improved. In this state, in order to improve the withstand voltage characteristics of the electrode, the cathode 2 and the anode 3 installed in a vacuum are heated without applying a voltage.
【００２６】陰極２側は高電圧に保持されるので直接、
陰極２に加熱処理のための配線を行うことは困難であ
り、この実施の形態では、フィラメント加熱電源８を用
いて通電加熱したフィラメント７から引き出した電子を
電子衝撃電源９を用いて加速し、陰極２の加熱を行って
いる。その際、充分な陰極２の加熱を行うためには、陰
極２とフィラメント７との距離が小さくなくてはなら
ず、フィラメント７から陰極２に流れ込んだ電流の帰還
用回路も用意する必要がある。陰極２の高電圧印加時に
は、フィラメント７を陰極２に対し遠ざけておき、また
前記帰還用回路を遮断するために接点１０を開いておく
必要があるが、陰極２の高電圧印加時に陰極２とフィラ
メント７との間、もしくは接点１０の対向する接続接点
間で絶縁破壊が起こらないように、距離調整機構１１を
用いて前記フィラメントおよび前記接続接点の一方を充
分な絶縁耐圧を有する距離まで遠ざける。また、陽極３
はほぼ接地電位にあるため、ヒータ加熱用電源１３を用
いてヒータ１２を通電加熱する。Since the cathode 2 side is maintained at a high voltage,
It is difficult to perform wiring for heat treatment on the cathode 2. In this embodiment, electrons drawn from the filament 7 that has been energized and heated using the filament heating power supply 8 are accelerated using the electron impact power supply 9. The cathode 2 is being heated. At that time, in order to sufficiently heat the cathode 2, the distance between the cathode 2 and the filament 7 must be small, and it is necessary to provide a feedback circuit for the current flowing from the filament 7 into the cathode 2. . When a high voltage is applied to the cathode 2, it is necessary to keep the filament 7 away from the cathode 2 and open the contact 10 to cut off the feedback circuit. Using a distance adjusting mechanism 11, one of the filament and one of the connection contacts is moved away from the filament 7 or one of the connection contacts to a distance having a sufficient withstand voltage so that insulation breakdown does not occur between the connection contacts facing the contact 10. The anode 3
Is almost at the ground potential, the heater 12 is energized and heated using the heater heating power supply 13.
【００２７】このように真空中に設置した陰極２と陽極
３とに対し充分な電極の加熱処理を行った後、陰極２、
陽極３間に徐々に電圧を印加し、静電偏向に必要な電界
強度を得るようにする。この結果、静電偏向器内部の圧
力の上昇が回避され、電極間を通過する荷電粒子の通過
効率を上げることが可能となる。この際、急速に電圧を
印加すると電極間に大きな放電が生じてこの放電によっ
てポリイミド被膜６が破損する可能性が生じるため、こ
れを避けながら電圧印加を行う。なお、以上の説明にお
いてポリイミド被膜は、陰極２表面に形成するものとし
たが、陽極３表面にも形成するように構成してもよい。After the cathode 2 and the anode 3 placed in a vacuum are sufficiently heated as described above,
A voltage is gradually applied between the anodes 3 so as to obtain an electric field intensity required for electrostatic deflection. As a result, an increase in the pressure inside the electrostatic deflector is avoided, and the passage efficiency of charged particles passing between the electrodes can be increased. At this time, if a voltage is rapidly applied, a large discharge is generated between the electrodes, and this discharge may damage the polyimide film 6, so that the voltage is applied while avoiding this. In the above description, the polyimide film is formed on the surface of the cathode 2, but may be formed on the surface of the anode 3.
【００２８】実施の形態２．この実施の形態では、陰極
２と陽極３との間の絶縁耐圧を向上させるために陰極２
の表面には前記実施の形態１におけるポリイミド被膜６
の代わりにガラス被膜（絶縁被覆）が形成されている。
このように陰極２の表面を絶縁被覆であるガラス被膜に
より覆うことで、前記実施の形態１と同様に電極からの
電子放出が抑制され、電極間の絶縁耐圧が向上するばか
りでなく、ベーキングのために陰極２を加熱しても電極
間の耐圧性能は変化せず、ガラス被膜の耐熱温度は８０
０℃程度であることから２００℃から３５０℃程度に加
熱処理を行うベーキングによる劣化は極めて少ない。Embodiment 2 In this embodiment, in order to improve the dielectric strength between the cathode 2 and the anode 3, the cathode 2
On the surface of the polyimide coating 6 of the first embodiment.
Instead, a glass coating (insulating coating) is formed.
By covering the surface of the cathode 2 with the glass coating which is an insulating coating in this manner, electron emission from the electrodes is suppressed as in the first embodiment, and not only the withstand voltage between the electrodes is improved, but also the baking Therefore, even if the cathode 2 is heated, the pressure resistance between the electrodes does not change, and the heat-resistant temperature of the glass coating is 80.
Since the temperature is about 0 ° C., deterioration due to baking in which heat treatment is performed from 200 ° C. to about 350 ° C. is extremely small.
【００２９】実施の形態３．この実施の形態では、陰極
２と陽極３との間の絶縁耐圧を向上させるために、陰極
２あるいは陽極３、または前記電極の両方をアルミによ
り構成する。通常、高電圧用の静電偏向器の電極は、ス
テンレス、チタン、銅などで構成することが多い。これ
は、一般に強度が高く、高融点のものほど絶縁耐圧が高
い傾向があると考えられているためであるが、実証テス
トの結果、ステンレスやチタンを用いた陰極のタングス
テン陽極に対する耐電圧は、１３ｋＶ／ｍｍ程度であっ
たのに対し、アルミを用いた陰極の場合、３０ｋＶ／ｍ
ｍであった。従って、陰極２の材質をアルミにすること
でステンレスやチタンを用いた場合以上の耐電圧が得ら
れる。Embodiment 3 In this embodiment, in order to improve the withstand voltage between the cathode 2 and the anode 3, the cathode 2 or the anode 3 or both of the electrodes are made of aluminum. Usually, the electrodes of a high-voltage electrostatic deflector are often made of stainless steel, titanium, copper, or the like. This is because it is generally considered that the higher the melting point, the higher the melting point, the higher the withstand voltage tends to be.However, as a result of the verification test, the withstand voltage of the cathode using stainless steel or titanium with respect to the tungsten anode is as follows: While it was about 13 kV / mm, in the case of a cathode using aluminum, it was 30 kV / m.
m. Accordingly, by using aluminum as the material of the cathode 2, a higher withstand voltage than when stainless steel or titanium is used can be obtained.
【００３０】実施の形態４．図２は、この発明の実施の
形態４の静電偏向器の構成を示す模式図である。図２に
おいて図１と同一または相当の部分については同一の符
号を付し説明を省略する。図において、１４は赤外線ラ
ンプ（加熱手段）、１５はランプ電源（加熱手段）、１
６は吸熱被膜である。この実施の形態では、陰極２の加
熱手段として、赤外線ランプ１４を用いる。赤外線の吸
収効率を上げるため、陰極２の上面にはカーボンブラッ
クなどの輻射吸収率の高い吸熱被膜を形成してある。Embodiment 4 FIG. 2 is a schematic diagram illustrating a configuration of an electrostatic deflector according to Embodiment 4 of the present invention. 2, the same or corresponding parts as those in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. In the figure, 14 is an infrared lamp (heating means), 15 is a lamp power supply (heating means), 1
6 is an endothermic coating. In this embodiment, an infrared lamp 14 is used as a heating means for the cathode 2. In order to increase the absorption efficiency of infrared rays, a heat absorbing film such as carbon black having a high radiation absorptivity is formed on the upper surface of the cathode 2.
【００３１】この実施の形態では、赤外線ランプ１４の
出力を大きくすることで陰極２と赤外線ランプ１４との
距離を大きくして、陰極２の広い面積に対し短時間で加
熱処理を行うことができ、さらに赤外線ランプ１４を駆
動する回路を静電偏向器の回路に対し絶縁した状態で独
立させることが容易であり、実施の形態１のように距離
調整機構１１を設ける必要がなくなり、構造を簡略化す
ることが可能となる。In this embodiment, by increasing the output of the infrared lamp 14, the distance between the cathode 2 and the infrared lamp 14 is increased, so that a large area of the cathode 2 can be heated in a short time. Further, it is easy to make the circuit for driving the infrared lamp 14 independent from the circuit of the electrostatic deflector in a state insulated from the circuit of the electrostatic deflector, and it is not necessary to provide the distance adjusting mechanism 11 as in the first embodiment, thus simplifying the structure. Can be realized.
【００３２】実施の形態５．図３は、この発明の実施の
形態５の静電偏向器の構成を示す模式図である。図３に
おいて図１と同一または相当の部分については同一の符
号を付し説明を省略する。図において、１７は陰極２に
埋め込まれたヒータ（加熱手段）、１８は接点、１９は
接点１８間の距離を調整するための距離調整機構、Ｅは
ヒータ用電源（加熱手段）である。Embodiment 5 FIG. 3 is a schematic diagram showing a configuration of an electrostatic deflector according to Embodiment 5 of the present invention. 3, the same or corresponding parts as those in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. In the drawing, 17 is a heater (heating means) embedded in the cathode 2, 18 is a contact, 19 is a distance adjusting mechanism for adjusting the distance between the contacts 18, and E is a heater power supply (heating means).
【００３３】この実施の形態では、陰極２の加熱手段と
してヒータ１７を使用し、陰極の加熱処理時には接点１
８を距離調整機構１９により接続し、ヒータ１７を通電
加熱することにより陰極２の加熱を行う。この場合の陰
極２に形成されている絶縁被覆は耐熱性の高いポリイミ
ド被膜あるいはガラス被膜であり、ヒータ１７による加
熱温度を短時間のうちに２００℃から３５０℃程度のベ
ーキング温度まで上昇させることが可能であり、高電圧
印加時には接点１８の可動側接点を距離調整機構１９を
用いて陰極２側の接点に対し十分な絶縁耐圧を有する距
離まで離す。In this embodiment, the heater 17 is used as a heating means for the cathode 2, and the contact 1
8 is connected by a distance adjusting mechanism 19, and the heater 17 is energized and heated to heat the cathode 2. In this case, the insulating coating formed on the cathode 2 is a polyimide film or a glass film having high heat resistance, and the heating temperature by the heater 17 can be raised from 200 ° C. to a baking temperature of about 350 ° C. in a short time. When the high voltage is applied, the movable contact of the contact 18 is separated from the contact on the cathode 2 side by a distance adjusting mechanism 19 to a distance having a sufficient withstand voltage.
【００３４】この実施の形態では、ヒータが電極内に埋
め込まれているので電極を短時間のうちにベーキング温
度まで上昇させることができ、また効率良く加熱するこ
とが可能となる。In this embodiment, since the heater is embedded in the electrode, the temperature of the electrode can be raised to the baking temperature in a short time, and the electrode can be efficiently heated.
【００３５】実施の形態６．図４は、この発明の実施の
形態６の静電偏向器の構成を示す模式図である。図４に
おいて図１と同一または相当の部分については同一の符
号を付し説明を省略する。図において、２０は陽極３か
ら陰極２へ流れ込む電流を検出する電流計（電流計測手
段）、２１は高圧電源１から陰極２に印加されている電
圧を検出する電圧計である。２２は電流計２０で検出し
た電流値と電圧計２１で検出した陰極２に印加されてい
る電圧とに応じて高圧電源１を制御する制御手段およ
び、電流計２０で検出した電流の一定時間毎の積算値を
測定する図示していない電流積算値測定手段を兼ねる制
御電源である。Embodiment 6 FIG. FIG. 4 is a schematic diagram illustrating a configuration of an electrostatic deflector according to Embodiment 6 of the present invention. 4, the same or corresponding parts as in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. In the figure, reference numeral 20 denotes an ammeter (current measuring means) for detecting a current flowing from the anode 3 to the cathode 2, and 21 denotes a voltmeter for detecting a voltage applied to the cathode 2 from the high-voltage power supply 1. 22 is a control means for controlling the high-voltage power supply 1 in accordance with the current value detected by the ammeter 20 and the voltage applied to the cathode 2 detected by the voltmeter 21, and at regular intervals of the current detected by the ammeter 20 This is a control power supply that also serves as a current integrated value measuring unit (not shown) for measuring the integrated value of (1).
【００３６】次に動作について説明する。陰極２と陽極
３との間に高電圧を印加すると、陰極２と陽極３との間
に微小な電流が流れる。この電流を陽極電流としてモニ
タする電流計２０で検出した電流値により、陰極２と陽
極３との間で生じる放電の大きさを想定することができ
る。Next, the operation will be described. When a high voltage is applied between the cathode 2 and the anode 3, a minute current flows between the cathode 2 and the anode 3. The magnitude of the discharge generated between the cathode 2 and the anode 3 can be estimated from the current value detected by the ammeter 20 that monitors this current as the anode current.
【００３７】陰極２と陽極３との間で大きな放電が起き
ると、電極表面もしくは絶縁被覆が放電により破損し高
電圧が印加できなくなる。陽極電流をモニタして放電の
大きさを観測すると、大きな放電が突然起こって陰極２
が破損することもあるが、小さな放電を繰り返す間に大
きな放電へ成長して電極の破損に至ることも多い。この
実施の形態では、このような小さな放電が大きな放電に
成長する前に印加電圧を下げ、電極や電極の絶縁被覆の
破損を最小限度に抑える。When a large discharge occurs between the cathode 2 and the anode 3, the surface of the electrode or the insulating coating is damaged by the discharge, so that a high voltage cannot be applied. When monitoring the anode current and observing the magnitude of the discharge, a large discharge suddenly occurred and the cathode 2
May be damaged, but it often grows into a large discharge while repeating a small discharge, leading to electrode damage. In this embodiment, before such a small discharge grows into a large discharge, the applied voltage is reduced to minimize damage to the electrodes and the insulating coating of the electrodes.
【００３８】このような小さな放電を繰り返す間に大き
な放電へ成長して電極の破損に至る現象は、電圧を一定
にして使用する場合にも、あるいは設定電圧へ印加電圧
を徐々に上昇させる場合にも観測される。このため、上
述した印加電圧の制御は電源電圧を上昇させる場合も、
また定常状態の場合にも動作するように構成する必要が
ある。The phenomenon of growing into a large discharge while repeating such a small discharge and leading to breakage of the electrode occurs when the voltage is kept constant or when the applied voltage is gradually increased to the set voltage. Is also observed. For this reason, the above-described control of the applied voltage also increases the power supply voltage,
In addition, it is necessary to be configured to operate even in a steady state.
【００３９】このような制御を行うためのフローチャー
トを図５に示す。このフローチャートによれば、電圧計
２１により検出した高圧電源１により陰極２に印加され
ている現在の電源電圧Ｖと目標電圧Ｖｔとを比較し、電
源電圧Ｖが目標電圧Ｖｔより小さい状態であるかを判定
する（ステップＳＴ１）。電源電圧Ｖが目標電圧Ｖｔに
達していない状態であれば、ステップＳＴ２へ進み、電
流計２０で検出した陽極電流の所定時間（ΔＴ）内の積
算電流値Ｉｓを基準電流値Ｉ2 （陰極２と陽極３との間
で生じる放電が許容できる範囲内にあるときの陽極電流
の第１の上限を示す電流値）と比較する。この結果、積
算電流値Ｉｓが基準電流値Ｉ2 に達していない、すなわ
ち放電が許容できる範囲内にあると判定したときにはス
テップＳＴ３へ進み、高圧電源１による電源電圧Ｖを所
定量（ΔＶ）上昇させ、ステップＳＴ４へ進む。一方、
ステップＳＴ１において、電源電圧Ｖが目標電圧Ｖｔに
達している状態、あるいはステップＳＴ２において積算
電流値Ｉｓが基準電流値Ｉ2 に達している状態であると
判定したときにはステップＳＴ４へ進む。FIG. 5 shows a flowchart for performing such control. According to this flowchart, the current power supply voltage V applied to the cathode 2 by the high-voltage power supply 1 detected by the voltmeter 21 is compared with the target voltage Vt, and whether the power supply voltage V is smaller than the target voltage Vt is determined. Is determined (step ST1). If the power supply voltage V has not reached the target voltage Vt, the process proceeds to step ST2, where the integrated current value Is within a predetermined time (ΔT) of the anode current detected by the ammeter 20 is compared with the reference current value I 2 (cathode 2 (A current value indicating the first upper limit of the anode current when the discharge occurring between the anode and the anode 3 is within an allowable range). As a result, the integrated current value Is does not reach the reference current value I 2, i.e. the discharge proceeds to step ST3 when it is determined to be within the allowable range, a predetermined amount of power supply voltage V by a high voltage power source 1 ([Delta] V) increases The process proceeds to step ST4. on the other hand,
In step ST1, the process proceeds to step ST4 when the power supply voltage V is determined to be state state has reached the target voltage Vt, or the integrated current value Is in step ST2 reaches the reference current value I 2.
【００４０】ステップＳＴ４では、電流計２０で検出し
た陽極電流値を読み込み、さらにステップＳＴ５で所定
時間（ΔＴ）内の積算電流値Ｉｓを求める。続いて、積
算電流値Ｉｓを基準電流値Ｉ1 （陰極２と陽極３との間
で生じる放電が許容できる範囲内であるときの陽極電流
の第２の上限を示す電流値）と比較し、積算電流値Ｉｓ
が基準電流値Ｉ1 を越えているか判定を行い（ステップ
ＳＴ６）、積算電流値Ｉｓが基準電流値Ｉ1 を越えてい
るときには、陰極２と陽極３との間で生じた小さな放電
が許容できない大きな放電へ成長する過程であると想定
できることから、ステップＳＴ７において高圧電源１に
よる電源電圧Ｖを所定量（ΔＶ）だけ下げ、ステップＳ
Ｔ４以降の処理を繰り返し、前記放電の発生およびその
成長を抑制する。この結果、前記発生した放電が抑制さ
れると電流計２０で検出される陽極電流値は少なくな
り、またその積算電流値Ｉｓも小さくなることから、ス
テップＳＴ６で積算電流値Ｉｓが基準電流値Ｉ1 を越え
ていないと判定されるようになり、ステップＳＴ１へ戻
り、ステップＳＴ１以降の処理を繰り返す。In step ST4, the anode current value detected by the ammeter 20 is read, and in step ST5, the integrated current value Is within a predetermined time (ΔT) is obtained. Subsequently, the integrated current value Is is compared with a reference current value I 1 (a current value indicating a second upper limit of the anode current when the discharge occurring between the cathode 2 and the anode 3 is within an allowable range), Integrated current value Is
There a judgment whether exceeds the reference current value I 1 (step ST6), when the integrated current value Is exceeds a reference current value I 1 is a small discharge occurs between the cathode 2 and the anode 3 is not acceptable Since it can be assumed that this is a process of growing into a large discharge, the power supply voltage V from the high-voltage power supply 1 is reduced by a predetermined amount (ΔV) in step ST7,
The processing after T4 is repeated to suppress the generation and growth of the discharge. As a result, when the generated discharge is suppressed, the anode current value detected by the ammeter 20 decreases and the integrated current value Is also decreases. Therefore, in step ST6, the integrated current value Is is reduced to the reference current value I. It is determined that the value does not exceed 1, and the process returns to step ST1 and repeats the processing after step ST1.
【００４１】つまり、電源電圧Ｖを上昇させる場合に
は、電源電圧Ｖと陽極電流の積算値である積算電流値Ｉ
ｓとを基に、高圧電源１の電源電圧を上昇させてよい状
態であるか否かを判定し、これら電圧値、電流値がステ
ップＳＴ１とステップＳＴ２との条件を満足していると
きに限り電源電圧Ｖを上昇させる制御を行い、ステップ
ＳＴ６において放電が見られた場合には電源電圧Ｖを下
降させる制御を行うことで、発生した小さな放電の成長
を事前に抑止して、電極や電極の絶縁被覆の破壊などを
未然に防止しながら電源電圧Ｖを目標電圧Ｖｔまで上昇
させることができる。従って、最初に目標電圧Ｖｔをセ
ットしておけば、電源電圧Ｖが目標電圧Ｖｔに達してい
ない過渡的状態における急速な電圧印加による電極の破
損を回避しながら、電源電圧Ｖを目標電圧Ｖｔまで安全
に印加することができる。That is, when increasing the power supply voltage V, the integrated current value I which is the integrated value of the power supply voltage V and the anode current is calculated.
s, it is determined whether the power supply voltage of the high-voltage power supply 1 is in a state in which the power supply voltage can be increased, and only when these voltage values and current values satisfy the conditions of step ST1 and step ST2. By performing control to increase the power supply voltage V and performing control to decrease the power supply voltage V when a discharge is observed in step ST6, the growth of the small discharge that has occurred is suppressed in advance, and the electrodes and the electrodes are prevented from growing. The power supply voltage V can be increased to the target voltage Vt while preventing the insulation coating from being broken. Therefore, if the target voltage Vt is set first, the power supply voltage V is reduced to the target voltage Vt while avoiding electrode damage due to rapid voltage application in a transient state in which the power supply voltage V does not reach the target voltage Vt. It can be applied safely.
【００４２】また、一旦、目標電圧Ｖｔに達すれば、何
らかの要因で発生した小さな放電が大きな放電に成長す
る前に、基準電流値Ｉ1 と積算電流値Ｉｓとの比較結果
を基に電圧を落とすことによって電極の破損を防ぐこと
が可能となり、その後自動的に目標電圧Ｖｔまで戻すこ
とができる。Further, once the target voltage Vt is reached, the voltage is dropped based on the result of comparison between the reference current value I 1 and the integrated current value Is before a small discharge generated for some reason grows into a large discharge. This makes it possible to prevent the electrodes from being damaged, and thereafter automatically returns to the target voltage Vt.
【００４３】図６は、以上の動作を示す説明図である。
この図では、図５に示すフローチャートに従って、最初
に設定した目標電圧Ｖｔに達するまでの高圧電源１によ
る電源電圧Ｖの上昇過程を示している。FIG. 6 is an explanatory diagram showing the above operation.
This figure shows a process of increasing the power supply voltage V by the high-voltage power supply 1 until reaching the initially set target voltage Vt according to the flowchart shown in FIG.
【００４４】実施の形態７．図７は、この発明の実施の
形態７の静電偏向器の構成を示す模式図である。図７に
おいて図４と同一または相当の部分については同一の符
号を付し説明を省略する。図において、２３は真空チェ
ンバー内の真空度（圧力）を検出する真空計（圧力測定
手段）、２４は真空計２３が検出した真空度と電圧計２
１が検出した陰極２に印加されている電圧値に応じて高
圧電源１が発生する電源電圧Ｖを制御する制御手段を備
えている制御電源である。Embodiment 7 FIG. FIG. 7 is a schematic diagram showing a configuration of an electrostatic deflector according to Embodiment 7 of the present invention. 7, parts that are the same as or correspond to those in FIG. 4 are given the same reference numerals, and descriptions thereof will be omitted. In the figure, 23 is a vacuum gauge (pressure measuring means) for detecting the degree of vacuum (pressure) in the vacuum chamber, and 24 is the degree of vacuum detected by the vacuum gauge 23 and the voltmeter 2.
Reference numeral 1 denotes a control power supply including control means for controlling a power supply voltage V generated by the high-voltage power supply 1 in accordance with a detected voltage value applied to the cathode 2.
【００４５】次に動作について説明する。陰極２と陽極
３との間に放電が起きると、放電の大きさにほぼ比例し
て電極表面からガスが放出される。このため、真空計２
３で真空チェンバー内の圧力をモニタすることにより、
電極間の放電の大きさを想定することができる。この実
施の形態では前記圧力の変化を基に、前記実施の形態６
と同様に高圧電源１による電源電圧を制御し、電極や電
極の絶縁被覆の破損を最小限度に抑える。Next, the operation will be described. When a discharge occurs between the cathode 2 and the anode 3, gas is released from the electrode surface almost in proportion to the magnitude of the discharge. Therefore, vacuum gauge 2
By monitoring the pressure in the vacuum chamber at 3,
The magnitude of the discharge between the electrodes can be assumed. In this embodiment, based on the change of the pressure, the sixth embodiment is used.
In the same manner as described above, the power supply voltage of the high-voltage power supply 1 is controlled to minimize damage to the electrodes and the insulating coating of the electrodes.
【００４６】図８は、この実施の形態の静電偏向器の動
作を示すフローチャートである。このフローチャートに
よれば、先ず、電圧計２１が検出した陰極２に印加され
ている現在の電源電圧Ｖと設定された目標電圧Ｖｔとの
比較を行う（ステップＳＴ１１）。この結果、電源電圧
Ｖが目標電圧Ｖｔに達していなければ、続くステップＳ
Ｔ１２において真空チェンバー内の現在の圧力Ｐと基準
圧力Ｐ2 （陰極２と陽極３との間で生じる放電が許容で
きる範囲内であるときの真空チェンバー内の第１の上限
圧力値）との比較を行う。この結果、真空チェンバー内
の現在の圧力Ｐが基準圧力Ｐ2 以下であれば、放電は許
容できる範囲内にあり真空チェンバー内の圧力は放電に
より発生するガスにより上昇していないと看做して電源
電圧Ｖを所定量（ΔＶ）上昇させ（ステップＳＴ１
３）、ステップＳＴ１４へ進む。FIG. 8 is a flowchart showing the operation of the electrostatic deflector of this embodiment. According to this flowchart, first, the current power supply voltage V applied to the cathode 2 detected by the voltmeter 21 is compared with the set target voltage Vt (step ST11). As a result, if the power supply voltage V has not reached the target voltage Vt, the subsequent step S
Comparison of the current pressure P in the vacuum chamber at T12 with a reference pressure P 2 (a first upper limit pressure value in the vacuum chamber when the discharge occurring between the cathode 2 and the anode 3 is within an allowable range). I do. As a result, if the current pressure P is the reference pressure P 2 less in the vacuum chamber, the discharge pressure in the located vacuum chamber within an acceptable range is regarded as not increased by gas generated by the discharge The power supply voltage V is increased by a predetermined amount (ΔV) (step ST1).
3), proceed to step ST14.
【００４７】一方、ステップＳＴ１１において電源電圧
Ｖが目標電圧Ｖｔに達していると判断し、あるいはステ
ップＳＴ１２において真空チェンバー内の現在の圧力Ｐ
が基準圧力Ｐ2 を超えていると判断したときには、ステ
ップＳＴ１４へ進む。On the other hand, in step ST11, it is determined that the power supply voltage V has reached the target voltage Vt, or in step ST12, the current pressure P in the vacuum chamber is
There when determined to exceed the reference pressure P 2, the process proceeds to step ST14.
【００４８】ステップＳＴ１４では、真空計２３により
測定した真空チェンバー内の圧力Ｐを読み込む。次に、
圧力Ｐと基準圧力Ｐ1 とを比較する（ステップＳＴ１
６）。この結果、圧力Ｐが基準圧力Ｐ1 （陰極２と陽極
３との間で生じる放電が許容できる範囲内であるときの
真空チェンバー内の第２の上限圧力値）を越えていると
判断したときには、高圧電源１による電源電圧Ｖを所定
量（ΔＶ）下げ（ステップＳＴ１７）、ステップＳＴ１
４へ戻り、ステップＳＴ１４からステップＳＴ１７まで
の処理を、ステップＳＴ１６において真空計２３により
測定した真空チェンバー内の圧力Ｐが基準圧力Ｐ1 を越
えていない状態になったと判断するまで繰り返す。ステ
ップＳＴ１６において、圧力値Ｐが基準圧力Ｐ1 を越え
ていない状態になったと判断したときにはステップＳＴ
１１へ戻り、ステップＳＴ１１以降の処理を繰り返す。In step ST14, the pressure P in the vacuum chamber measured by the vacuum gauge 23 is read. next,
Comparing the pressure P and the reference pressure P 1 (step ST1
6). As a result, when it is determined that the pressure P exceeds the reference pressure P 1 (the second upper limit pressure value in the vacuum chamber when the discharge occurring between the cathode 2 and the anode 3 is within an allowable range) Then, the power supply voltage V by the high-voltage power supply 1 is reduced by a predetermined amount (ΔV) (step ST17), and step ST1 is performed.
Returns to 4, repeated from step ST14 the process of steps ST17, until it is determined that the pressure P in the vacuum chamber measured by the vacuum gauge 23 is ready it does not exceed the reference pressure P 1 in step ST16. In step ST16, step ST when it is determined that a state in which the pressure value P does not exceed the reference pressure P 1
Then, the process returns to step S11, and the processes after step ST11 are repeated.
【００４９】従って、電極に電圧を印加する場合に、最
初に目標電圧Ｖｔをセットしておけば電源電圧Ｖが目標
電圧Ｖｔに到達するまでの過渡的な状態における電圧印
加による電極間に発生する放電を真空チェンバー内の圧
力の上昇として検出し電源電圧Ｖを下げ、電極や電極の
絶縁被覆の破損を回避することが可能となり、高圧電源
１により電源電圧Ｖを安全に目標電圧Ｖｔまで印加でき
る。また、一旦、目標電圧Ｖｔに達すれば、何らかの要
因で発生した小さな放電が大きな放電に成長する前に、
真空チェンバー内の圧力の上昇として放電の発生を知り
電源電圧Ｖを落とすことによって電極や電極の絶縁被覆
の破損を防ぎ、その後、自動的に目標電圧Ｖｔまで戻す
ことが可能である。Therefore, when a voltage is applied to the electrodes, if the target voltage Vt is set first, a voltage is generated between the electrodes due to the voltage application in a transient state until the power supply voltage V reaches the target voltage Vt. The discharge is detected as an increase in the pressure in the vacuum chamber, and the power supply voltage V is reduced, so that damage to the electrodes and the insulating coating of the electrodes can be avoided. The high-voltage power supply 1 can safely apply the power supply voltage V to the target voltage Vt. . Further, once the voltage reaches the target voltage Vt, before a small discharge generated for some reason grows into a large discharge,
It is possible to prevent the electrodes and the insulating coating of the electrodes from being damaged by lowering the power supply voltage V by knowing the occurrence of discharge as a rise in the pressure in the vacuum chamber, and thereafter automatically returning the voltage to the target voltage Vt.
【００５０】図９は、図８に示すフローチャートに従っ
て制御される電源電圧の上昇過程を示す説明図である。FIG. 9 is an explanatory diagram showing a process of increasing the power supply voltage controlled according to the flowchart shown in FIG.
【００５１】[0051]
【発明の効果】以上のように、請求項１記載の発明によ
れば、対向する一対の電極のうちの少なくとも一方の電
極表面に耐熱温度が２００℃を越える絶縁被覆を形成す
るように構成したので、絶縁耐圧を劣化させることなく
電極に対し充分な加熱処理を行うことができる効果があ
る。As described above, according to the first aspect of the present invention, an insulating coating having a heat-resistant temperature exceeding 200 ° C. is formed on at least one electrode surface of a pair of opposed electrodes. Therefore, there is an effect that a sufficient heat treatment can be performed on the electrode without deteriorating the withstand voltage.
【００５２】請求項２記載の発明によれば、絶縁被覆と
してポリイミドを用いるように構成したので、絶縁耐圧
を劣化させることなく、ポリイミドの耐熱温度特性に応
じた高い温度による充分な加熱処理を電極に対し行うこ
とができる効果がある。According to the second aspect of the present invention, since the polyimide is used as the insulating coating, sufficient heat treatment at a high temperature according to the heat-resistant temperature characteristics of the polyimide can be performed without deteriorating the dielectric strength. There is an effect that can be performed for.
【００５３】請求項３記載の発明によれば、絶縁被覆と
してガラスを用いるように構成したので、絶縁耐圧を劣
化させることなく、ガラスの耐熱温度特性に応じた充分
高い温度による加熱処理を電極に対し行うことができる
効果がある。According to the third aspect of the invention, since the glass is used as the insulating coating, the electrode is subjected to a heat treatment at a sufficiently high temperature in accordance with the heat-resistant temperature characteristics of the glass without deteriorating the withstand voltage. There is an effect that can be performed.
【００５４】請求項４記載の発明によれば、電極の少な
くとも一方をアルミを用いるように構成したので、ステ
ンレスやチタンにより構成した電極に比べ絶縁耐圧を高
くすることができ、電極の加工が容易になると共にコス
ト的にも有利な静電偏向器が得られる効果がある。According to the fourth aspect of the invention, since at least one of the electrodes is made of aluminum, the withstand voltage can be made higher than that of an electrode made of stainless steel or titanium, and the electrode can be easily processed. In addition, there is an effect that an electrostatic deflector advantageous in cost can be obtained.
【００５５】請求項５記載の発明によれば、一対の電極
を加熱する加熱手段を備えるように構成したので、電極
の加熱を容易かつ効率的に行える効果がある。According to the fifth aspect of the present invention, since the heating means for heating the pair of electrodes is provided, there is an effect that the electrodes can be heated easily and efficiently.
【００５６】請求項６記載の発明によれば、電子衝撃加
熱を用いた加熱手段を備えるように構成したので、効率
良く電極を加熱できる効果がある。According to the sixth aspect of the present invention, since the heating means using the electron impact heating is provided, the electrode can be efficiently heated.
【００５７】請求項７記載の発明によれば、被加熱電極
と加熱手段との距離を可変する距離調整機構を備えるよ
うに構成したので、高電圧の印加される被加熱電極と加
熱手段との間での放電を有効に防止できる効果がある。According to the seventh aspect of the present invention, since the distance adjusting mechanism for varying the distance between the electrode to be heated and the heating means is provided, the distance between the electrode to be heated to which a high voltage is applied and the heating means is adjusted. This has the effect of effectively preventing inter-electrode discharge.
【００５８】請求項８記載の発明によれば、電子線放射
用のフィラメントおよび、該フィラメントと被加熱電極
との間に電圧を印加するための回路を遮断する接点を有
した加熱手段と、フィラメントと被加熱電極との距離を
調整すると共に、回路の接点間の距離を調整する距離調
整機構とを備えるように構成したので、被加熱電極に対
する加熱処理を効率的に行うことができると共に、被加
熱電極に対する高電圧印加時には加熱手段を被加熱電極
から充分離して、被加熱電極と加熱手段との間の放電を
回避することができ、被加熱電極に対する効率的な加熱
と安全性を両立させた静電偏向器が得られる効果があ
る。According to the present invention, a heating means having a filament for emitting an electron beam, a contact for cutting off a circuit for applying a voltage between the filament and the electrode to be heated, and a filament And a distance adjustment mechanism that adjusts the distance between the contacts of the circuit, while adjusting the distance between the electrode and the electrode to be heated. When a high voltage is applied to the heating electrode, the heating means can be charged and separated from the heated electrode to avoid discharge between the heated electrode and the heating means, thereby achieving both efficient heating of the heated electrode and safety. This has the effect of obtaining an improved electrostatic deflector.
【００５９】請求項９記載の発明によれば、輻射加熱を
用いた加熱手段を備えるように構成したので、電極に対
し充分な距離から電極表面に形成された絶縁被覆を含む
広範囲の電極表面に対し輻射による加熱を効率的に行う
ことができると共に、輻射加熱を用いた加熱手段の電源
回路を電極へ高電圧を印加する回路に対し電気的に独立
して構成することができるため、電極の加熱を有効に行
えると共に高電圧印加時の電極と加熱手段との間の放電
のおそれのない静電偏向器が得られる効果がある。According to the ninth aspect of the present invention, since the heating means using radiant heating is provided, a wide range of the electrode surface including the insulating coating formed on the electrode surface from a sufficient distance to the electrode is provided. On the other hand, heating by radiation can be performed efficiently, and the power supply circuit of the heating means using radiant heating can be configured electrically independent of the circuit that applies a high voltage to the electrodes. There is an effect that an electrostatic deflector that can effectively perform heating and that does not cause a discharge between the electrode and the heating means when a high voltage is applied is obtained.
【００６０】請求項１０記載の発明によれば、赤外線に
よる加熱を行うための赤外線ランプと、該赤外線ランプ
へ通電を行うためのランプ電源と、赤外線ランプから輻
射された赤外線を電極表面で吸収することで電極の温度
を上昇させる吸熱被膜とを輻射加熱を用いた加熱手段と
して備えるように構成したので、電極表面の吸熱被膜に
対し充分な距離から赤外線ランプにより加熱処理を行う
ことができ、電極へ高電圧を印加する回路に対しランプ
電源を電気的に独立して構成することができ、電極と赤
外線ランプとの間の距離調整機構などを必要としないた
め、簡略な構造で電極の加熱を有効に行えると共に高電
圧印加時の電極と加熱手段との間の放電のおそれのない
静電偏向器が得られる効果がある。According to the tenth aspect of the present invention, an infrared lamp for heating by infrared rays, a lamp power supply for energizing the infrared lamp, and infrared rays radiated from the infrared lamp are absorbed on the electrode surface. Since the endothermic coating that raises the temperature of the electrode is provided as a heating means using radiant heating, the heat treatment can be performed by an infrared lamp from a sufficient distance to the endothermic coating on the electrode surface. Since the lamp power supply can be configured electrically independent of the circuit that applies high voltage to the circuit and does not require a mechanism for adjusting the distance between the electrode and the infrared lamp, heating the electrode with a simple structure There is an effect that an electrostatic deflector that can be effectively performed and has no fear of discharging between the electrode and the heating means when a high voltage is applied can be obtained.
【００６１】請求項１１記載の発明によれば、少なくと
も他方の電極に対向する面に絶縁被覆を施すと共に絶縁
被覆の施されていない表面箇所を設けた電極を備えるよ
うに構成したので、絶縁被覆の施されていない表面箇所
に対し例えば電子衝撃加熱を行い、あるいは吸熱被膜を
形成することが可能となり、電極間の絶縁耐圧を向上さ
せると共に電極に対する加熱処理を効率よく行うことを
可能にする効果がある。According to the eleventh aspect of the present invention, at least the surface facing the other electrode is provided with an insulating coating, and the electrode provided with the surface portion where the insulating coating is not provided is provided. It is possible to perform, for example, electron impact heating or to form an endothermic coating on the surface portion that is not subjected to heat treatment, thereby improving the withstand voltage between the electrodes and efficiently performing the heat treatment on the electrodes. There is.
【００６２】請求項１２記載の発明によれば、電極内に
配置されたヒータおよび該ヒータへ通電を行うためのヒ
ータ用電源を輻射加熱を用いた加熱手段として備えるよ
うに構成したので、電極を短時間に効率良く加熱できる
効果がある。According to the twelfth aspect of the present invention, since the heater disposed in the electrode and the heater power supply for energizing the heater are provided as heating means using radiant heating, the electrode can be used. There is an effect that heating can be efficiently performed in a short time.
【００６３】請求項１３記載の発明によれば、電極内に
配置されたヒータとヒータ用電源との間の回路を遮断す
るための接点、および該接点間の距離を調整する距離調
整機構を備えるように構成したので、効率良く電極を加
熱できると共に、電極へ高電圧が印加されるときには電
極とヒータ用電源との間の絶縁を確実に行うことが可能
となり、電極とヒータ用電源側との間で発生する放電を
有効に防止できる効果がある。According to the thirteenth aspect of the present invention, there are provided a contact for interrupting a circuit between a heater arranged in the electrode and a power supply for the heater, and a distance adjusting mechanism for adjusting a distance between the contacts. With such a configuration, the electrode can be efficiently heated, and when a high voltage is applied to the electrode, insulation between the electrode and the heater power supply can be reliably performed. This has the effect of effectively preventing discharges occurring between them.
【００６４】請求項１４記載の発明によれば、電極間に
流れる電流を計測する電流計測手段と、一定時間毎の電
流の積算値を測定する電流積算値測定手段と、該電流積
算値測定手段により測定した電流の積算値を所定値と比
較し、電流の積算値が所定値を越えることのないよう
に、電圧印加手段により電極間に印加される電圧を調整
する制御手段とを備えるように構成したので、電極に形
成された絶縁被覆の破壊を招来する放電の成長を電極間
に流れる電流を基に精度良く回避できる効果がある。According to the fourteenth aspect of the present invention, the current measuring means for measuring the current flowing between the electrodes, the current integrated value measuring means for measuring the integrated value of the current at regular time intervals, and the current integrated value measuring means Control means for adjusting the voltage applied between the electrodes by the voltage applying means so that the integrated value of the current measured by the method is compared with a predetermined value, and the integrated value of the current does not exceed the predetermined value. With such a configuration, there is an effect that the growth of electric discharge which causes the destruction of the insulating coating formed on the electrodes can be accurately avoided based on the current flowing between the electrodes.
【００６５】請求項１５記載の発明によれば、真空チェ
ンバー内の圧力を計測する圧力測定手段と、該圧力測定
手段により測定した圧力を所定値と比較し、圧力が所定
値を越えることのないように、電圧印加手段により電極
間に印加される電圧を調整する制御手段とを備えるよう
に構成したので、電極に形成された絶縁被覆の破壊を招
来する放電の成長を真空チェンバー内の圧力を基に精度
良く回避できる効果がある。According to the present invention, the pressure measuring means for measuring the pressure in the vacuum chamber and the pressure measured by the pressure measuring means are compared with a predetermined value so that the pressure does not exceed the predetermined value. As described above, the control device for controlling the voltage applied between the electrodes by the voltage application device is provided, so that the growth of the discharge that causes the destruction of the insulating coating formed on the electrodes is reduced by the pressure in the vacuum chamber. There is an effect that can be avoided with high accuracy.
【図１】 この発明の実施の形態１による静電偏向器の
構成を示す模式図である。FIG. 1 is a schematic diagram showing a configuration of an electrostatic deflector according to Embodiment 1 of the present invention.
【図２】 この発明の実施の形態４による静電偏向器の
構成を示す模式図である。FIG. 2 is a schematic diagram showing a configuration of an electrostatic deflector according to a fourth embodiment of the present invention.
【図３】 この発明の実施の形態５による静電偏向器の
構成を示す模式図である。FIG. 3 is a schematic diagram showing a configuration of an electrostatic deflector according to a fifth embodiment of the present invention.
【図４】 この発明の実施の形態６による静電偏向器の
構成を示す模式図である。FIG. 4 is a schematic diagram showing a configuration of an electrostatic deflector according to a sixth embodiment of the present invention.
【図５】 この発明の実施の形態６の静電偏向器の動作
を示すフローチャートである。FIG. 5 is a flowchart showing an operation of the electrostatic deflector according to the sixth embodiment of the present invention.
【図６】 この発明の実施の形態６の静電偏向器の動作
の説明図である。FIG. 6 is an explanatory diagram of an operation of the electrostatic deflector according to the sixth embodiment of the present invention.
【図７】 この発明の実施の形態７による静電偏向器の
構成を示す模式図である。FIG. 7 is a schematic diagram showing a configuration of an electrostatic deflector according to a seventh embodiment of the present invention.
【図８】 この発明の実施の形態７の静電偏向器の動作
を示すフローチャートである。FIG. 8 is a flowchart showing an operation of the electrostatic deflector according to the seventh embodiment of the present invention.
【図９】 この発明の実施の形態７の静電偏向器の動作
の説明図である。FIG. 9 is an explanatory diagram of an operation of the electrostatic deflector according to the seventh embodiment of the present invention.
【図１０】 従来の静電偏向器の構成を示す模式図であ
る。FIG. 10 is a schematic diagram showing a configuration of a conventional electrostatic deflector.
１ 高圧電源（電圧印加手段）、２ 陰極（電極）、３
陽極（電極）、６ポリイミド被膜（絶縁被覆）、７
フィラメント（加熱手段）、８ フィラメント加熱電源
（加熱手段）、９ 電子衝撃電源（加熱手段）、１０，
１８ 接点、１１，１９ 距離調整機構、１２，１７
ヒータ（加熱手段）、１４ 赤外線ランプ（加熱手
段）、１５ ランプ電源（加熱手段）、１６ 吸熱被
膜、２０ 電流計（電流計測手段）、２２ 制御電源
（電流積算値測定手段，制御手段）、２３真空計（圧力
測定手段）、２４ 制御電源（制御手段）、Ｅ ヒータ
用電源（加熱手段）。1 high voltage power supply (voltage applying means), 2 cathode (electrode), 3
Anode (electrode), 6 polyimide coating (insulating coating), 7
Filament (heating means), 8 filament heating power supply (heating means), 9 electron impact power supply (heating means), 10,
18 contacts, 11, 19 Distance adjustment mechanism, 12, 17
Heater (heating means), 14 infrared lamp (heating means), 15 lamp power supply (heating means), 16 endothermic coating, 20 ammeter (current measuring means), 22 control power supply (current integrated value measuring means, control means), 23 Vacuum gauge (pressure measurement means), 24 control power supply (control means), E heater power supply (heating means).
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) H01J 37/147 H05H 7/00 - 7/22 H01J 37/248 H01J 37/30 - 37/317 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01J 37/147 H05H 7/ 00-7/22 H01J 37/248 H01J 37/30-37/317
Claims (15)
調整して前記電極間に印加する電圧を目標電圧値まで上
昇させ、前記電極間に電界を発生させる電圧印加手段を
備え、前記電極間に発生した電界により荷電粒子を偏向
させる静電偏向器において、前記電極のうちの少なくと
も一方の電極表面に耐熱温度が２００℃を越える絶縁被
覆を形成したことを特徴とする静電偏向器。A voltage application unit that adjusts a voltage applied between a pair of electrodes facing each other, increases a voltage applied between the electrodes to a target voltage value, and generates an electric field between the electrodes. An electrostatic deflector for deflecting charged particles by an electric field generated therebetween, wherein an insulating coating having a heat-resistant temperature exceeding 200 ° C. is formed on at least one of the electrodes.
を特徴とする請求項１記載の静電偏向器。2. The electrostatic deflector according to claim 1, wherein polyimide is used as the insulating coating.
徴とする請求項１記載の静電偏向器。3. The electrostatic deflector according to claim 1, wherein glass is used as the insulating coating.
ることを特徴とする請求項１から請求項３のうちのいず
れか１項記載の静電偏向器。4. The electrostatic deflector according to claim 1, wherein at least one of the electrodes is made of aluminum.
いることを特徴とする請求項１から請求項４のうちのい
ずれか１項記載の静電偏向器。5. The electrostatic deflector according to claim 1, further comprising heating means for heating the pair of electrodes.
いることを特徴とする請求項５記載の静電偏向器。6. The electrostatic deflector according to claim 5, further comprising heating means using electron impact heating.
る距離調整機構を備えていることを特徴とする請求項６
記載の静電偏向器。7. A distance adjusting mechanism for varying a distance between an electrode to be heated and a heating means.
An electrostatic deflector as described.
トおよび、該フィラメントと被加熱電極との間に電圧を
印加するための回路を遮断する接点を有し、距離調整機
構は前記フィラメントと前記被加熱電極との距離を調整
すると共に、前記回路の接点間の距離を調整することを
特徴とする請求項７記載の静電偏向器。8. The heating means has a filament for emitting an electron beam, and a contact for cutting off a circuit for applying a voltage between the filament and the electrode to be heated. The electrostatic deflector according to claim 7, wherein the distance between the electrode to be heated and the distance between the contacts of the circuit are adjusted.
ことを特徴とする請求項５記載の静電偏向器。9. The electrostatic deflector according to claim 5, further comprising heating means using radiation heating.
による加熱を行うための赤外線ランプと、該赤外線ラン
プへ通電を行うためのランプ電源と、前記赤外線ランプ
から輻射された赤外線を電極表面で吸収することで前記
電極の温度を上昇させる吸熱被膜とを備えていることを
特徴とする請求項９記載の静電偏向器。10. A heating means using radiant heating includes: an infrared lamp for heating by infrared rays; a lamp power supply for energizing the infrared lamp; and infrared rays radiated from the infrared lamp on an electrode surface. The electrostatic deflector according to claim 9, further comprising a heat absorbing film that increases the temperature of the electrode by absorbing the heat.
している面に絶縁被覆が施されており、かつ、絶縁被覆
の施されていない表面箇所を有していることを特徴とす
る請求項１から請求項１０のうちのいずれか１項記載の
静電偏向器。11. The electrode according to claim 1, wherein an insulating coating is applied to at least a surface facing the other electrode, and the electrode has a surface portion where the insulating coating is not applied. The electrostatic deflector according to any one of claims 1 to 10.
タおよび該ヒータへ通電を行うためのヒータ用電源を備
えていることを特徴とする請求項５記載の静電偏向器。12. The electrostatic deflector according to claim 5, wherein the heating means includes a heater disposed in the electrode and a heater power supply for energizing the heater.
遮断するための接点、および該接点間の距離を調整する
距離調整機構を備えていることを特徴とする請求項１２
記載の静電偏向器。13. A device according to claim 12, further comprising a contact for interrupting a circuit between the heater and a power supply for the heater, and a distance adjusting mechanism for adjusting a distance between the contacts.
An electrostatic deflector as described.
測手段と、一定時間毎の前記電流の積算値を測定する電
流積算値測定手段と、該電流積算値測定手段により測定
した前記電流の積算値を所定値と比較し、前記電流の積
算値が前記所定値を越えることのないように、電圧印加
手段により前記電極間に印加される電圧を調整する制御
手段とを備えたことを特徴とする請求項１から請求項１
３のうちのいずれか１項記載の静電偏向器。14. A current measuring means for measuring a current flowing between the electrodes, a current integrated value measuring means for measuring an integrated value of the current at fixed time intervals, and an integration of the current measured by the current integrated value measuring means. Control means for comparing a value with a predetermined value and adjusting a voltage applied between the electrodes by voltage applying means so that the integrated value of the current does not exceed the predetermined value. Claim 1 to Claim 1
4. The electrostatic deflector according to claim 3, wherein:
力測定手段と、該圧力測定手段により測定した前記圧力
を所定値と比較し、前記圧力が前記所定値を越えること
のないように、電圧印加手段により電極間に印加される
電圧を調整する制御手段とを備えたことを特徴とする請
求項１から請求項１３のうちのいずれか１項記載の静電
偏向器。15. A pressure measuring means for measuring the pressure in the vacuum chamber, and comparing the pressure measured by the pressure measuring means with a predetermined value, and applying a voltage so that the pressure does not exceed the predetermined value. 14. The electrostatic deflector according to claim 1, further comprising control means for adjusting a voltage applied between the electrodes by the means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26983395A JP3265166B2 (en) | 1995-10-18 | 1995-10-18 | Electrostatic deflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26983395A JP3265166B2 (en) | 1995-10-18 | 1995-10-18 | Electrostatic deflector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09115470A JPH09115470A (en) | 1997-05-02 |
| JP3265166B2 true JP3265166B2 (en) | 2002-03-11 |
Family
ID=17477822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26983395A Expired - Lifetime JP3265166B2 (en) | 1995-10-18 | 1995-10-18 | Electrostatic deflector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3265166B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006153751A (en) * | 2004-11-30 | 2006-06-15 | Kyoto Univ | Ion beam analyzer |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5520161B2 (en) * | 2010-08-05 | 2014-06-11 | 株式会社ニューフレアテクノロジー | Electron gun conditioning method and electron beam drawing apparatus |
| JP2013235706A (en) * | 2012-05-08 | 2013-11-21 | Toshiba Corp | Device of controlling accelerator, and method of controlling accelerator |
| JP6071330B2 (en) * | 2012-08-27 | 2017-02-01 | 川崎重工業株式会社 | Heat recovery heat exchanger, heat recovery unit and combustion plant |
| KR102155512B1 (en) * | 2017-05-22 | 2020-09-14 | (주)코미코 | Method for Reducing Arcing Electrostatic Chuck |
| JP7034752B2 (en) * | 2018-02-15 | 2022-03-14 | 株式会社荏原製作所 | Boost method, boost system, booster and boost program |
-
1995
- 1995-10-18 JP JP26983395A patent/JP3265166B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006153751A (en) * | 2004-11-30 | 2006-06-15 | Kyoto Univ | Ion beam analyzer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09115470A (en) | 1997-05-02 |
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