JP3239385B2 - Manufacturing method of vapor-deposited film - Google Patents
Manufacturing method of vapor-deposited filmInfo
- Publication number
- JP3239385B2 JP3239385B2 JP24723291A JP24723291A JP3239385B2 JP 3239385 B2 JP3239385 B2 JP 3239385B2 JP 24723291 A JP24723291 A JP 24723291A JP 24723291 A JP24723291 A JP 24723291A JP 3239385 B2 JP3239385 B2 JP 3239385B2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- electron beam
- vapor
- vapor deposition
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Physical Vapour Deposition (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、電子ビーム蒸着装置を
用い、表面に酸化珪素などのセラミック透明膜を蒸着し
た蒸着フィルムの製造する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a vapor-deposited film in which a ceramic transparent film such as silicon oxide is vapor-deposited on the surface using an electron beam vapor deposition apparatus.
【０００２】[0002]
【従来の技術】今日、プラスチックフィルムは、その強
度や透明性に優れた材料として各種包装材料として多く
使用されている。2. Description of the Related Art Today, plastic films are widely used as various packaging materials as materials having excellent strength and transparency.
【０００３】特に食品や医療品などの用途には、ガスバ
リヤー性や防湿性が要求され、現在では巻取式真空蒸着
法によるアルミニウムなどの金属薄膜が使用される。さ
らに内容物が透過視出来る機能を持ったフィルムとし
て、酸化珪素などのセラミック透明膜を蒸着した蒸着フ
ィルムが使用されている。[0003] In particular, gas barrier properties and moisture proof properties are required for applications such as food and medical products, and at present, metal thin films such as aluminum by a roll-to-roll vacuum evaporation method are used. Further, as a film having a function of allowing the contents to be seen through, a deposited film on which a ceramic transparent film such as silicon oxide is deposited is used.
【０００４】セラミック蒸着材料（以下単に蒸着材料と
言う）は、高い蒸発温度を必要とし、熱伝導率が低いた
め、電子ビーム加熱法をもちいて成膜されることが多
い。図１は電子ビーム蒸着装置を使用した蒸着例の説明
図である。蒸発固形物の蒸着材料１を回転ハース２内に
設置した後、電子ビーム蒸着装置内の空気を排気ポンプ
８により吸引する。そして電子銃３より数ｋ〜数十ｋｅ
Ｖの高いエネルギーの電子ビーム４を照射して蒸着材料
を加熱する。基材フィルムは巻出しロール６から供給さ
れ、冷却ロール９を摺動しながら蒸着材料から発生する
蒸気を蒸着する。その後、巻取りロール５に巻取られ
る。[0004] Ceramic vapor deposition materials (hereinafter simply referred to as vapor deposition materials) require a high evaporation temperature and have low thermal conductivity, and thus are often formed using an electron beam heating method. FIG. 1 is an explanatory diagram of an example of vapor deposition using an electron beam vapor deposition apparatus. After the evaporation material 1 of the evaporation solid is placed in the rotary hearth 2, the air in the electron beam evaporation apparatus is sucked by the exhaust pump 8. And several k to several tens ke from the electron gun 3
The deposition material is heated by irradiating the electron beam 4 with a high energy of V. The base film is supplied from the unwinding roll 6 and slides on the cooling roll 9 to deposit vapor generated from the deposition material. Thereafter, it is wound on a winding roll 5.
【０００５】ここで用いられる蒸着材料のセラミック
は、酸化珪素，アルミナ，マグネシアなど、無害，透明
性，ガスバリヤー性に優れたものである。[0005] The ceramic of the vapor deposition material used here is harmless, transparent, and excellent in gas barrier properties, such as silicon oxide, alumina, and magnesia.
【０００６】また、基材フィルムとしては、ポリエチレ
ン、ポリプロピレン、ポリエチレンテレフタレートなど
今日広く使用されている透明プラスチックフィルムが使
用出来る。フィルム膜厚は特に制限するものでは無い
が、巻取式の蒸着装置内で使用するには、その安定走行
性を得るため５〜２００μが適当である。As the base film, a transparent plastic film widely used today such as polyethylene, polypropylene, polyethylene terephthalate and the like can be used. The film thickness is not particularly limited, but for use in a roll-up type vapor deposition apparatus, a film thickness of 5 to 200 μ is appropriate for obtaining stable running properties.
【０００７】[0007]
【発明が解決しようとする課題】ところで、セラミック
を蒸発させる場合、高い蒸発温度が必要とされるため、
出来るだけ熱効率の良い蒸発条件が望まれる。しかし、
上述したように、電子ビームによりセラミックを蒸発さ
せる場合、蒸着材料は加熱最高温度となる電子ビームの
照射面近辺が蒸発する。When evaporating ceramics, a high evaporation temperature is required.
Evaporation conditions with as high a thermal efficiency as possible are desired. But,
As described above, when the ceramic is evaporated by the electron beam, the evaporation material evaporates in the vicinity of the irradiation surface of the electron beam where the heating temperature is the highest.
【０００８】図２に従来のハース２１内の蒸着材料２０
を示す。蒸着材料は塊状のセラミック固形物であり、回
転ハースに設置され、電子ビーム２２の照射を受けて蒸
発部がくぼみとなっていく。従って、一様な蒸発状態を
得るために、蒸着材料をハース内に一様に設置しなくて
はならないが、蒸発部に隣接する蒸発温度に達っしない
部分の熱は熱伝導により周囲の蒸着材料に伝わり、ハー
スへの熱拡散として逃げてしまう。FIG. 2 shows a conventional evaporation material 20 in a hearth 21.
Is shown. The vapor deposition material is a massive ceramic solid substance, which is placed on a rotating hearth, and is irradiated with the electron beam 22 so that the evaporating portion becomes concave. Therefore, in order to obtain a uniform evaporation state, the evaporation material must be uniformly placed in the hearth, but the heat of the part that does not reach the evaporation temperature adjacent to the evaporation part does not reach the evaporation temperature due to heat conduction. It is transmitted to the material and escapes as heat diffusion to the hearth.
【０００９】そしてまた、電子ビームが照射される表面
層が蒸発されていくと、配置した蒸着材料の形が蒸発と
ともに変化していくことになる。このため、形の不揃い
による蒸発性の安定化への影響が生じる。Further, as the surface layer irradiated with the electron beam evaporates, the shape of the deposited evaporation material changes with the evaporation. For this reason, the irregular shape has an effect on the stabilization of the evaporability.
【００１０】以上のような事情から、従来、蒸着材料を
単にハース内へ敷き詰めるだけでは、蒸発部以外への熱
拡散により電子ビーム入射エネルギーから変換される熱
量の蒸着量への変換効率が低かった。また、蒸着材料の
一様な蒸発形状変化が困難であり、蒸発一様性も得られ
ないので、蒸着フィルムの透明膜の品質も満足がいくも
のではなかった。[0010] In view of the above circumstances, conventionally, simply laying the evaporation material in the hearth has reduced the efficiency of conversion of the amount of heat converted from the incident energy of the electron beam into the amount of evaporation by thermal diffusion to portions other than the evaporation portion. . Further, it is difficult to uniformly change the evaporation shape of the evaporation material, and the evaporation uniformity cannot be obtained, so that the quality of the transparent film of the evaporation film is not satisfactory.
【００１１】本発明は、上述のような問題点を解決する
ために成されたもので、蒸着材料の効率良い一様な蒸発
状態を得ることにより、熱量の蒸着量への変換効率が高
く、かつ膜の品質のよい蒸着フィルムの製造を目的とし
ている。SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems. By obtaining an efficient and uniform evaporation state of a vapor deposition material, the conversion efficiency of heat into a vapor deposition amount is high, The purpose is to produce a vapor-deposited film with good film quality.
【００１２】[0012]
【課題を解決するための手段】本発明は上述の課題に鑑
みてなされたものであって、電子ビームを照射してセラ
ミック蒸着材料を加熱し、セラミック蒸着材料から発生
する蒸気を基材フィルム上に蒸着する蒸着フィルムの製
造方法において、前記セラミック蒸着材料が、入射電子
ビームの照射面に於ける径より小さい円柱様である単位
体を電子ビームの入射面方向に束ねた集合体であること
を特徴とする蒸着フィルムの製造方法である。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and heats a ceramic vapor deposition material by irradiating an electron beam to generate vapor generated from the ceramic vapor deposition material on a base film. In the method for producing a vapor-deposited film to be vapor-deposited, the ceramic vapor-deposited material is an aggregate obtained by bundling unit bodies each having a columnar shape smaller than the diameter on the irradiation surface of the incident electron beam in the direction of the electron beam incident surface. This is a method for producing a vapor-deposited film as a feature.
【００１３】[0013]
【作用】本発明では、電子ビーム蒸着材料の形状を円柱
様の単位体よりなる集合体とする。これにより、隣接す
る単位体間への接触面が小さく設定されるため、熱伝導
による熱の拡散が抑えられる。そして、熱の伝導方向を
蒸発方向すなわち単位体の軸長方向にそろえられ、電子
ビームの照射面を蒸発面とすることができる。従って、
電子ビームからの熱変換効率良い蒸発性と蒸発形状の一
様化を実現することができる。According to the present invention, the electron beam vapor deposition material is formed into an aggregate composed of cylindrical units. Thereby, the contact surface between the adjacent unit bodies is set small, so that heat diffusion due to heat conduction is suppressed. Then, the direction of heat conduction is aligned with the evaporation direction, that is, the axial direction of the unit body, and the electron beam irradiation surface can be used as the evaporation surface. Therefore,
Evaporation with good heat conversion efficiency from electron beams and uniform evaporation shape can be realized.
【００１４】[0014]
【実施例】以下、上記のような考え方に基づいた本発明
の一実施例について、図面を参照して説明する。図３
は、本発明による蒸着材料の形態とその使用例を示す概
略説明図である。An embodiment of the present invention based on the above concept will be described below with reference to the drawings. FIG.
FIG. 1 is a schematic explanatory view showing a form of a vapor deposition material according to the present invention and an example of its use.
【００１５】まず約２００μのマグネシア粉体を成形し
て、直径２ｍｍ、長さ４０ｍｍの円筒に加工後、窒素雰
囲気下の１５００℃で焼成固体とした。さらに軸の片端
部を錐面に尖らした。この固体を蒸着材料の単位体とし
て、図１の蒸着装置内に、図３の状態でハースに縦方向
をそろえて、約２０×３０ｍｍの面積に配置し、集合体
とした。なお、本実施例では円筒を用いたが、本明細書
中の円柱様とは、楕円柱及び四角柱、六角柱等の多角形
の柱も含む。First, magnesia powder having a size of about 200 μm was formed into a cylinder having a diameter of 2 mm and a length of 40 mm, and then fired at 1500 ° C. in a nitrogen atmosphere. Further, one end of the shaft was pointed to a conical surface. This solid was used as a unit of the vapor deposition material and arranged in an area of about 20 × 30 mm in the vapor deposition apparatus shown in FIG. Although a cylinder is used in this embodiment, a column in the present specification includes an elliptical cylinder, a polygonal pillar such as a square pillar, and a hexagonal pillar.
【００１６】次に装置内を２×１０-3Ｐａまで減圧した
後、回転ハース３１内に束ねられた蒸着材料３０の断面
軸方向に５ｍｍビーム束径の５ｋＶに加速した電子ビー
ム３２を走査照射した。単位体の径は電子ビーム束径よ
り大きいと照射面の温度が一様となりにくいため、電子
ビーム束径より小さく設定する。電子ビームの照射面範
囲に含まれる円柱様の単位体は、その照射面を最高温度
として加熱される。非照射部への伝導加熱は抑えられる
ため、照射部の単位体が選択的に効率良く蒸発し減少し
ていく。なお、ハースを１０ｍｍ／ｍｉｎの速度で移動
した。Next, after the pressure in the apparatus is reduced to 2 × 10 −3 Pa, an electron beam 32 accelerated to 5 kV with a beam bundle diameter of 5 mm is scanned and irradiated in the direction of the sectional axis of the vapor deposition material 30 bundled in the rotary hearth 31. did. If the diameter of the unit body is larger than the electron beam bundle diameter, the temperature of the irradiation surface is difficult to be uniform, so the unit body is set smaller than the electron beam bundle diameter. The columnar unit included in the irradiation surface range of the electron beam is heated with the irradiation surface at the highest temperature. Since the conduction heating to the non-irradiated portion is suppressed, the unit body of the irradiated portion is selectively and efficiently evaporated and reduced. The hearth was moved at a speed of 10 mm / min.
【００１７】蒸発が安定した段階で、巻出しロールに、
厚さ１２μｍのポリエチレンテレフタレートフィルムを
セットし、１ｍ／ｍｉｎの速度で走行させ、蒸着フィル
ムを製造した。When the evaporation is stabilized, the unwinding roll
A 12 μm-thick polyethylene terephthalate film was set and run at a speed of 1 m / min to produce a vapor-deposited film.
【００１８】蒸発後のハース内の蒸着材料の減少形状
は、照射部と非照射部との単位体の減少量に明確な段差
状態を示していた。すなわち、照射部での一様な減少状
態から安定な蒸発が、また隣接する非照射部での蒸発が
殆ど抑えられていることから伝導による熱拡散の少ない
ことがわかった。The reduced shape of the evaporation material in the hearth after the evaporation showed a clear step in the amount of reduction of the unit between the irradiated part and the non-irradiated part. In other words, it was found that stable evaporation from the uniformly reduced state in the irradiated portion and that evaporation in the adjacent non-irradiated portion was substantially suppressed resulted in little heat diffusion due to conduction.
【００１９】また、製造された蒸着フィルムの物性の計
測の結果、良好であり、かつ、膜厚、光透過率等ばらつ
きがないものであった。Measurement of the physical properties of the manufactured vapor-deposited film showed that the film was good and had no variation in film thickness, light transmittance and the like.
【００２０】[0020]
【発明の効果】以上説明したように本発明に係わる蒸着
フィルムの製造方法によれば、セラミック蒸着材料が、
入射電子ビームの照射面に於ける径より小さい円柱様で
ある単位体を電子ビームの入射面方向に束ねた集合体で
あるので、蒸着材料の効率良い一様な蒸発状態を得るこ
とができる。As described above, according to the method for producing a vapor-deposited film according to the present invention, the ceramic vapor-deposited material is
Since the unit is formed by bundling unit bodies each having a columnar shape smaller than the diameter on the irradiation surface of the incident electron beam in the direction of the incident surface of the electron beam, an efficient and uniform evaporation state of the vapor deposition material can be obtained.
【００２１】よって、熱量の蒸着量への変換効率が高
く、かつ膜の品質のよい蒸着フィルムの製造が可能とな
る。Accordingly, it is possible to produce a vapor-deposited film having high conversion efficiency of heat quantity to vapor deposition amount and high quality of the film.
【００２２】[0022]
【図１】電子ビーム蒸着装置の説明図である。FIG. 1 is an explanatory diagram of an electron beam evaporation apparatus.
【図２】従来の蒸着材料の設置例を示す説明図である。FIG. 2 is an explanatory view showing an example of installation of a conventional evaporation material.
【図３】同実施例における蒸着材料の設置例を示す説明
図である。FIG. 3 is an explanatory diagram showing an example of setting a vapor deposition material in the embodiment.
１ 蒸着材料 ２ 回転ハース ３ 電子銃 ４ 電子ビーム ５ 巻取りロール ６ 巻出しロール ７ 基材フィルム ８ 排気ポンプ ９ 冷却ロール ２０ 蒸着材料（従来例、塊状） ２１ ハース ２２ 電子ビーム ３０ 蒸着材料（本発明） ３１ ハース ３２ 電子ビーム DESCRIPTION OF SYMBOLS 1 Deposition material 2 Rotating hearth 3 Electron gun 4 Electron beam 5 Take-up roll 6 Unwind roll 7 Base film 8 Exhaust pump 9 Cooling roll 20 Deposition material (conventional example, lump) 21 Hearth 22 Electron beam 30 Deposition material (the present invention) ) 31 Haas 32 electron beam
Claims (1)
を加熱し、セラミック蒸着材料から発生する蒸気を基材
フィルム上に蒸着する蒸着フィルムの製造方法におい
て、前記セラミック蒸着材料が、入射電子ビームの照射
面に於ける径より小さい円柱様である単位体を電子ビー
ムの入射面方向に軸長方向にそろえて束ねた集合体であ
ることを特徴とする蒸着フィルムの製造方法。1. A method for producing a vapor deposition film, comprising irradiating an electron beam to heat a ceramic vapor deposition material and vaporizing a vapor generated from the ceramic vapor deposition material onto a base film, wherein the ceramic vapor deposition material comprises an incident electron beam. A method for producing a vapor-deposited film, characterized in that it is an assembly in which cylindrical units smaller than the diameter on the irradiation surface are bundled aligned in the axial direction in the direction of the electron beam incident surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24723291A JP3239385B2 (en) | 1991-09-26 | 1991-09-26 | Manufacturing method of vapor-deposited film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24723291A JP3239385B2 (en) | 1991-09-26 | 1991-09-26 | Manufacturing method of vapor-deposited film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0578842A JPH0578842A (en) | 1993-03-30 |
| JP3239385B2 true JP3239385B2 (en) | 2001-12-17 |
Family
ID=17160421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24723291A Expired - Fee Related JP3239385B2 (en) | 1991-09-26 | 1991-09-26 | Manufacturing method of vapor-deposited film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3239385B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5311026B2 (en) * | 2009-01-29 | 2013-10-09 | 凸版印刷株式会社 | Winding type electron beam evaporation system |
| JP5637120B2 (en) * | 2011-11-15 | 2014-12-10 | 三菱電機株式会社 | Vapor deposition equipment |
-
1991
- 1991-09-26 JP JP24723291A patent/JP3239385B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0578842A (en) | 1993-03-30 |
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