JP3189126B2 - Multi-layer X-ray slit - Google Patents
Multi-layer X-ray slitInfo
- Publication number
- JP3189126B2 JP3189126B2 JP26435891A JP26435891A JP3189126B2 JP 3189126 B2 JP3189126 B2 JP 3189126B2 JP 26435891 A JP26435891 A JP 26435891A JP 26435891 A JP26435891 A JP 26435891A JP 3189126 B2 JP3189126 B2 JP 3189126B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- slit
- multilayer
- rays
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Description
【０００１】[0001]
【産業上の利用分野】この発明は、Ｘ線発生源の前面に
配置し、非常に細かいＸ線ビームを作り出すことが可能
な多層膜Ｘ線スリットに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer X-ray slit which is arranged in front of an X-ray source and is capable of producing a very fine X-ray beam.
【０００２】[0002]
【従来の技術】近年、Ｘ線装置は種々の分野で利用され
ており、利用するＸ線ビームも微細なＸ線ビームを被加
工物に照射するものが増加しつつある。特に、干渉性軌
道放射光等従来より数桁大きい強度を持つ光源が開発さ
れるに伴い、数nmから数十nm領域の波長のＸ線を使用し
たＸ線光学の産業分野が開発されてきている。この分野
での応用としては軟Ｘ線を利用したＸ線顕微鏡・Ｘ線望
遠鏡等が既に開発され、また、一部ではＸ線ホログラフ
ィの利用分野も検討されている。このような特殊分野の
Ｘ線の干渉・回折効果を利用した種々の装置を製作する
に際して、Ｘ線発生源の前に開口スリットを配置して数
μ以下の空間的に非常に細かいＸ線ビームを作り出す必
要がある。ところがこのようなＸ線ビームを作り出すた
めの開口スリットとしては、従来は図３に示されるよう
なＸ線の吸収係数の大きいタングステン等の重金属元素
で構成されたスリット刃（５、６）を二枚上下に所定間
隔を設けて対向配設し、この両スリット刃５、６の間隙
を通してＸ線４が照射され、このスリット刃５，６のス
リット幅である間隔を制御することによりＸ線ビームの
太さが絞られていた。この両スリット刃５、６のスリッ
ト幅の調整は通常各スリット刃５、６を機械的に移動さ
せていた。また、小孔を穿設した一枚の鉛、タングステ
ン等の重金属の板をＸ線発生源のスリットとして用いら
れている。2. Description of the Related Art In recent years, X-ray apparatuses have been used in various fields, and the number of X-ray beams used for irradiating a workpiece with a fine X-ray beam is increasing. In particular, with the development of light sources having intensities several orders of magnitude higher than conventional light sources such as coherent orbital synchrotron radiation, the industrial field of X-ray optics using X-rays having wavelengths in the range of several nm to several tens of nm has been developed. I have. As applications in this field, X-ray microscopes, X-ray telescopes, and the like utilizing soft X-rays have already been developed, and applications of X-ray holography have been studied in some parts. When manufacturing various devices utilizing such X-ray interference / diffraction effects in a special field, an aperture slit is arranged in front of an X-ray source, and a spatially very fine X-ray beam of several μ or less is provided. Needs to be created. However, conventionally, as an opening slit for producing such an X-ray beam, a slit blade (5, 6) made of a heavy metal element such as tungsten having a large X-ray absorption coefficient as shown in FIG. 3 is used. X-rays 4 are radiated through the gap between the slit blades 5 and 6 at predetermined intervals above and below the sheets, and the X-ray beam is controlled by controlling the interval that is the slit width of the slit blades 5 and 6. Was narrowed down. Adjustment of the slit width of both slit blades 5 and 6 usually involves mechanically moving each slit blade 5 and 6. In addition, one sheet of heavy metal such as lead or tungsten having a small hole is used as a slit of an X-ray generation source.
【０００３】[0003]
【発明が解決しようとする課題】しかし、前記のように
スリット刃５、６間の間隔の調整移動は機械的に行うた
め、このスリット幅Ｌを５０μ以下にすることは困難で
あった。従って、５０μ以下のＸ線ビームを作ることが
できなかった。また、そのスリット幅の精度もせいぜい
１０μ程度にしかできなかった。そのためＸ線ビームの
太さに対する誤差が大きい結果となった。また、Ｘ線ビ
ームの波長が４００〜７００nmの範囲にある可視光線領
域内での使用の場合は問題とならないが、波長が数nm程
度のＸ線領域での利用は無理であり、また、小孔のスリ
ットの場合も微細なＸ線ビームを作製することは困難で
あった。この発明の目的は従来のスリット幅を数十nmの
非常に細いＸ線ビームを発生するＸ線スリットを提供す
ることである。特に、この発明の目的は簡単な方法によ
り非常に微細なＸ線ビームを照射できる多層膜Ｘ線スリ
ットを提供することである。However, since the adjustment movement of the interval between the slit blades 5 and 6 is performed mechanically as described above, it has been difficult to reduce the slit width L to 50 μm or less. Therefore, an X-ray beam of 50 μm or less could not be produced. Further, the accuracy of the slit width could be at most about 10 μm. As a result, an error with respect to the thickness of the X-ray beam was large. In addition, there is no problem in the case where the X-ray beam is used in the visible light region where the wavelength is in the range of 400 to 700 nm, but it is impossible to use the X-ray beam in the X-ray region where the wavelength is about several nm. It is difficult to produce a fine X-ray beam even in the case of a slit in a hole. SUMMARY OF THE INVENTION An object of the present invention is to provide a conventional X-ray slit which generates a very narrow X-ray beam having a slit width of several tens of nm. In particular, an object of the present invention is to provide a multilayer X-ray slit capable of irradiating a very fine X-ray beam by a simple method.
【０００４】[0004]
【課題を解決するための手段】この発明は前記目的を達
成するためになされたもので、Ｘ線吸収係数の異なる二
種類の材料を用い、Ｘ線吸収係数の小さい材料からなる
Ｘ線を通過させる透過層の両面に、Ｘ線吸収係数の大き
い材料の吸収層を被覆した多層膜からなり、前記多層膜
の側端面にＸ線を入射する入射面およびＸ線を出射する
出射面を備える多層膜Ｘ線スリットとして構成した。ま
た、前記入射面が前記多層膜の表面に対して傾斜した面
である前記多層膜Ｘ線スリットの構成とした。 The present invention achieves the above object.
It was made to forming, using two different kinds of materials X Sen吸 yield coefficients, consisting of a material having a small X-ray absorption coefficient
On both surfaces of the transparent layer that passes X-rays, Ri Do multilayer film coated with absorbent layer of material having a large X-ray absorption coefficients, the multilayer film
X-ray incident surface and X-ray exit to side end face of
Configured as a multilayer film X-ray slit Ru with the emission surface. Further, a plane in which the incident surface is inclined with respect to the surface of the multilayer film.
, The configuration of the multilayer X-ray slit.
【０００５】[0005]
【作用】この発明における多層膜Ｘ線スリットは、Ｘ線
光の吸収係数の大きい材料の吸収層の二層間にＸ線光吸
収係数の小さい、すなわち、Ｘ線を透過し易い材料から
なる透過層を配置して構成してあるから、この多層膜Ｘ
線スリットの端面側から照射されたＸ線は挟まれた透過
層内を通過して被加工物に照射される。このときこの透
過層の厚さはＸ線吸収係数の小さい材料（元素）を蒸着
などによって非常に薄く形成することができるから、微
細なＸ線ビームが作り出され、このＸ線を被加工物に照
射することができる。この発明の多層膜Ｘ線スリットを
構成するＸ線吸収係数の大きい物質としては、一般に知
られるタングステン、鉛、ビスマス金属、ガリウム、ま
たはこれらの合金等の重金属類が用いられる。また、Ｘ
線吸収係数の小さい物質としてはカーボン等軽金属類な
ど普通に知られる物質が用いられる。この発明の多層膜
Ｘ線スリットについて、図面に示す実施例に基づいて以
下に説明するが、この発明はこれに限定されるものでは
ない。The X-ray slit of the multilayer film according to the present invention is a transmission layer made of a material having a small X-ray absorption coefficient, that is, a material which easily transmits X-rays, between two absorption layers made of a material having a large X-ray absorption coefficient. Are arranged, so that the multilayer film X
The X-rays emitted from the end face side of the line slit pass through the interposed transmission layer and are applied to the workpiece. At this time, a material (element) having a small X-ray absorption coefficient can be formed very thin by vapor deposition or the like, so that a fine X-ray beam is produced, and this X-ray is applied to the workpiece. Can be irradiated. As the substance having a large X-ray absorption coefficient constituting the multilayer X-ray slit of the present invention, generally known heavy metals such as tungsten, lead, bismuth metal, gallium, and alloys thereof are used. Also, X
As the substance having a small linear absorption coefficient, a commonly known substance such as light metals such as carbon is used. The multilayer X-ray slit of the present invention will be described below based on an embodiment shown in the drawings, but the present invention is not limited to this.
【０００６】[0006]
【実施例】図１はこの発明に係る多層膜Ｘ線スリットの
一実施例を示す拡大斜視図、図２は図１の実施例の拡大
部分断面図、図３は従来のＸ線スリットの説明概略図、
図４はこの発明の多層膜Ｘ線スリットの第２の実施例の
拡大部分断面図である。 実施例１ 図１において比較的Ｘ線を透過しにくいガリウム砒素合
金からなる基板９の表面にタングステンを０．１μの厚
さに蒸着した後、その表面にカーボンを０．１μ蒸着
し、その表面に再びタングステンを１μの厚さに蒸着し
て多層膜Ｘ線スリットを製造した。このタングステンは
Ｘ線を殆んど通過しないＸ線吸収係数の大きい重金属で
あり、吸収層２、３を形成する。カーボンはＸ線を良く
透過し、Ｘ線の吸収係数の小さい物質であり、透過層１
とする。実施例１の多層膜Ｘ線スリットの図２右側より
入射Ｘ線７を照射すると、タングステンから構成される
吸収層２、３においてはＸ線は殆ど吸収され、中間のカ
ーボンからなる透過層１内では通過して、微細な０．１
μのＸ線ビームが出射Ｘ線８となって対象物に照射する
ことになる。また、入射Ｘ線７のうち入射角αとなって
入射されるＸ線はＸ線臨界角以下に設定すると透過層１
と吸収層２および吸収層３との境界面で反射されて透過
層１内を通過することになるから、透過層１に入射した
Ｘ線は大部分透過して出射Ｘ線となるからＸ線の強度が
大きくなる。FIG. 1 is an enlarged perspective view showing one embodiment of a multilayer X-ray slit according to the present invention, FIG. 2 is an enlarged partial sectional view of the embodiment of FIG. 1, and FIG. Schematic,
FIG. 4 is an enlarged partial sectional view of a second embodiment of the multilayer X-ray slit of the present invention. Example 1 In FIG. 1, after depositing tungsten to a thickness of 0.1 μm on the surface of a substrate 9 made of a gallium arsenide alloy which is relatively hard to transmit X-rays, 0.1 μm of carbon was deposited on the surface, and Was again evaporated to a thickness of 1 μm to produce a multilayer X-ray slit. This tungsten is a heavy metal having a large X-ray absorption coefficient that hardly transmits X-rays, and forms the absorption layers 2 and 3. Carbon is a substance that transmits X-rays well and has a small X-ray absorption coefficient.
And When the incident X-ray 7 is irradiated from the right side in FIG. 2 of the multilayer X-ray slit of the first embodiment, the X-rays are almost absorbed in the absorption layers 2 and 3 made of tungsten, and the transmission layer 1 made of carbon in the middle is absorbed. Let's go through the fine 0.1
The X-ray beam of μ becomes the output X-ray 8 and irradiates the object. When the incident X-ray 7 out of the incident X-rays 7 is set at an X-ray critical angle or less, the transmission layer 1
X-rays that are reflected at the boundary between the light-absorbing layer 2 and the absorbing layer 3 and pass through the transmission layer 1 are transmitted through the transmission layer 1 and are mostly transmitted to become output X-rays. The strength of is increased.
【０００７】この発明の多層膜Ｘ線スリットの吸収層
２、３にタングステン重金属を使用し、透過層１にカー
ボンを使用した多層膜Ｘ線スリットの長さＬと各層の厚
さとの相対関係について表１に示す。この場合、波長
０．０７nmのＸ線を使用したときの透過率である。この
表から明らかなように、この多層膜Ｘ線スリットでは入
射Ｘ線７はカーボンからなる透過層１のみを通過し、吸
収層２．３では殆ど通過していない。ガリウム砒素を用
いた基板９においては長さが０．１mmであれば数％は透
過しているが、それ以上長い多層膜Ｘ線スリットでは基
板９においても殆ど透過しない。また、透過層１の長さ
が１mm程度であればほぼ９０％近い透過率を得ることが
できる。しかしこの発明の多層膜Ｘ線スリットの長さを
この程度加工することは容易である。The relative relationship between the length L of the multilayer X-ray slit and the thickness of each layer using tungsten heavy metal for the absorption layers 2 and 3 of the multilayer X-ray slit and carbon for the transmission layer 1 of the present invention. It is shown in Table 1. In this case, it is the transmittance when X-rays having a wavelength of 0.07 nm are used. As is clear from this table, in this multilayer X-ray slit, the incident X-ray 7 passes only through the transmission layer 1 made of carbon, and hardly passes through the absorption layer 2.3. In the case of the substrate 9 using gallium arsenide, if the length is 0.1 mm, several percent of the light is transmitted, but if the multilayer X-ray slit is longer than that, almost no light is transmitted through the substrate 9. If the length of the transmission layer 1 is about 1 mm, a transmittance of almost 90% can be obtained. However, it is easy to process the length of the multilayer X-ray slit of the present invention to this extent.
【０００８】[0008]
【表１】 [Table 1]
【０００９】この発明の多層膜Ｘ線スリットのスリット
幅は吸収層２と吸収層３とで挟まれた透過層１の厚さで
決定され、この程度の厚さのものはそれほど困難なく、
現在の多層膜製作技術によって透過層１の膜厚を１μか
ら１００μの範囲で、０．１μ程度の精度で調整しなが
ら製造することができる。従って、透過層１の膜厚を１
０μに設定すれば１０μ幅のスリットを備えた多層膜Ｘ
線スリットを作製することができる。この多層膜Ｘ線ス
リットを使用してＸ線ホログラフィ等の実験に十分使用
することができる微細なＸ線ビームを作ることができ
る。従来の機械的なスリットと比較すると数桁以上の細
かいＸ線ビームを取り出すことが可能である。[0009] The slit width of the multilayer X-ray slit of the present invention is determined by the thickness of the transmission layer 1 sandwiched between the absorption layer 2 and the absorption layer 3.
According to the current multilayer film manufacturing technology, the transmission layer 1 can be manufactured in a range of 1 μm to 100 μm while adjusting with an accuracy of about 0.1 μm. Therefore, the thickness of the transmission layer 1 is set to 1
If set to 0μ, multilayer film X with 10μ slits
Line slits can be made. Using this multilayer X-ray slit, a fine X-ray beam that can be used sufficiently for experiments such as X-ray holography can be produced. Compared to a conventional mechanical slit, it is possible to extract a fine X-ray beam of several orders of magnitude or more.
【００１０】実施例２ この発明の多層膜Ｘ線スリットの第２の実施例を図４に
示す。吸収層２，３および透過層１は前記実施例１と同
様にタングステンおよびカーボンで構成する。この多層
膜Ｘ線スリットのＸ線の入射側を斜めに切削して研磨面
を形成する。斜めに傾斜面を形成してあるから入射面の
表面積は拡大されることになる。図４に点線で示したよ
うな端面処理を施した多層膜Ｘ線スリットの場合、入射
Ｘ線７は領域Ａのみに入射したＸ線のみが透過層１を通
過して、吸収層２，３に入射したＸ線は完全に吸収され
る。これに対して表面が斜めに切削された透過層１に入
射すると、領域Ａおよび領域Ｂに入射したＸ線の両方が
透過層１に入射することになる。ここで領域Ｂに入射し
たＸ線の一部は吸収層２と透過層１との界面で反射さ
れ、透過層１内を進行して透過する。この結果多層膜Ｘ
線スリットを斜めに切削して傾斜角Θを有する実施例２
の多層膜Ｘ線スリットは実施例１の多層膜Ｘ線スリット
に比較して領域Ｂの部分から入射するＸ線成分をも透過
することができるから、出射Ｘ線８は領域Ａと領域Ｂと
から入射するＸ線であるから、実施例１の多層膜Ｘ線ス
リットに比較してＸ線強度が増加することになる。Embodiment 2 FIG. 4 shows a second embodiment of the multilayer X-ray slit of the present invention. The absorption layers 2 and 3 and the transmission layer 1 are made of tungsten and carbon as in the first embodiment. The X-ray incidence side of the multilayer X-ray slit is cut obliquely to form a polished surface. Since the inclined surface is formed obliquely, the surface area of the incident surface is enlarged. In the case of the multilayer X-ray slit subjected to the end surface treatment as shown by the dotted line in FIG. 4, only the X-rays incident on the region A pass through the transmission layer 1 and the absorption layers 2 and 3 are incident X-rays 7. X-rays incident on are completely absorbed. On the other hand, when the light enters the transmission layer 1 whose surface is obliquely cut, both the X-rays incident on the region A and the region B enter the transmission layer 1. Here, a part of the X-rays incident on the region B is reflected at the interface between the absorption layer 2 and the transmission layer 1 and travels through the transmission layer 1 to be transmitted. As a result, the multilayer film X
Example 2 in which a line slit is cut obliquely and has an inclination angle Θ
Since the multilayer X-ray slit of the first embodiment can transmit the X-ray component incident from the portion of the region B as compared with the multilayer X-ray slit of the first embodiment, the output X-rays 8 Since the X-rays are incident from above, the X-ray intensity increases as compared with the multilayer X-ray slit of the first embodiment.
【００１１】実施例２の切削面の傾斜角Θと透過率の関
係を、入射角１．０度でＣｒＫ特性Ｘ線を入射した場合
について、透過Ｘ線強度をＸ線反射率比で表２に示す。
多層膜Ｘ線スリットの膜厚は実施例１と同様にして製造
した。また、この時の切削面の角度Θが０度のときの反
射率比を１としている。この表から明らかなように、実
施例２の多層膜Ｘ線スリットのように入射側の端面を処
理することにより、実施例１の多層膜Ｘ線スリットに比
較して数倍のビーム強度を図ることが出来る。Table 2 shows the relationship between the transmission angle and the inclination angle Θ of the cut surface in Example 2 when the X-rays with CrK characteristics were incident at an incident angle of 1.0 °. Shown in
The film thickness of the multilayer X-ray slit was manufactured in the same manner as in Example 1. In addition, the reflectance ratio when the angle の of the cut surface at this time is 0 degrees is 1. As is clear from this table, by treating the end face on the incident side like the multilayer X-ray slit of the second embodiment, the beam intensity is several times higher than that of the multilayer X-ray slit of the first embodiment. I can do it.
【００１２】[0012]
【表２】 [Table 2]
【００１３】[0013]
【発明の効果】この発明の多層膜Ｘ線スリットは、従来
と比較すると一桁以上細かいＸ線ビームを作り出すこと
ができる。また、この発明の多層膜Ｘ線スリットは、Ｘ
線の入射面が多層膜の表面に対して傾斜した面を備える
ことにより、対象物に照射するＸ線ビームの強度を増大
させることが可能であるばかりでなく、従来のＸ線発生
装置に用いることにより、微細なＸ線ビームを作り出す
ことができるから、従来に比較して数桁小さな試料や、
試料の微小部等の分析や構造評価が可能になる。従っ
て、Ｘ線を利用した光学系の精密な構築を簡便に行うこ
とができるという産業上の優れた効果がある。また、こ
のような多層膜Ｘ線スリットを二個使用することにより
Ｘ線ホログラフィが可能である。The multilayer X-ray slit of the present invention can produce an X-ray beam finer by one digit or more as compared with the conventional one. In addition , the multilayer X-ray slit of the invention
By <br/> the incident surface of the line comprises an inclined surface with respect to the surface of the multilayer film, not only it is possible to increase the intensity of the X-ray beam for irradiating the object, a conventional X-ray By using it for a generator, a fine X-ray beam can be created .
It becomes possible to analyze and evaluate the structure of the minute part of the sample. Therefore, there is an industrially superior effect that the precise construction of the optical system using X-rays can be easily performed. X-ray holography is possible by using two such multilayer X-ray slits.
【図１】この発明に係る多層膜Ｘ線スリットの第１の実
施例を示す拡大斜視図である。FIG. 1 is an enlarged perspective view showing a first embodiment of a multilayer X-ray slit according to the present invention.
【図２】第１の実施例の拡大断面図である。FIG. 2 is an enlarged sectional view of the first embodiment.
【図３】従来のＸ線スリットの説明概略図である。FIG. 3 is an explanatory schematic view of a conventional X-ray slit.
【図４】この発明の多層膜Ｘ線スリットの第２の実施例
の拡大断面図である。FIG. 4 is an enlarged sectional view of a second embodiment of the multilayer X-ray slit of the present invention.
１ …透過層 ２ …吸収層 ３ …吸収層 ４ …Ｘ線 ５ …スリット刃 ６ …スリット刃 ７ …入射Ｘ線 ８ …出射Ｘ線 ９ …基板 DESCRIPTION OF SYMBOLS 1 ... Transmissive layer 2 ... Absorbing layer 3 ... Absorbing layer 4 ... X-ray 5 ... Slit blade 6 ... Slit blade 7 ... Incoming X-ray 8 ... Outgoing X-ray 9 ... Substrate
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭58−36534（ＪＰ，Ａ) 特開 昭62−115400（ＪＰ，Ａ) 実開 平２−48897（ＪＰ，Ｕ) 特表 平２−501338（ＪＰ，Ａ) 国際公開92／8235（ＷＯ，Ａ１) (58)調査した分野(Int.Cl.7，ＤＢ名) G21K 1/06 G21K 1/02 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-58-36534 (JP, A) JP-A-62-115400 (JP, A) JP-A-2-48897 (JP, U) 501338 (JP, A) International publication 92/8235 (WO, A1) (58) Fields investigated (Int. Cl. 7 , DB name) G21K 1/06 G21K 1/02
Claims (2)
い、Ｘ線吸収係数の小さい材料からなるＸ線を通過させ
る透過層の両面に、Ｘ線吸収係数の大きい材料の吸収層
を被覆した多層膜からなり、前記多層膜の側端面にＸ線
を入射する入射面およびＸ線を出射する出射面を備える
ことを特徴とする多層膜Ｘ線スリット。[Claim 1] with X Sen吸 yield coefficient of two kinds of materials, is passed through the X-ray formed of a material having a small X-ray absorption coefficient
That on both sides of the transparent layer, Ri Do multilayer film coated with absorbent layer of material having a large X-ray absorption coefficient, X-ray to a side end surface of the multilayer film
Multilayer film X-ray slit, wherein Rukoto with an emission surface that emits the incident surface and the X-rays incident.
傾斜した面であることを特徴とする請求項１に記載の多
層膜Ｘ線スリット。2. The method according to claim 1, wherein the light incident surface is located on a surface of the multilayer film.
2. The multilayer X-ray slit according to claim 1 , wherein the slit is an inclined surface .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26435891A JP3189126B2 (en) | 1991-10-14 | 1991-10-14 | Multi-layer X-ray slit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26435891A JP3189126B2 (en) | 1991-10-14 | 1991-10-14 | Multi-layer X-ray slit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05100092A JPH05100092A (en) | 1993-04-23 |
| JP3189126B2 true JP3189126B2 (en) | 2001-07-16 |
Family
ID=17402050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26435891A Expired - Lifetime JP3189126B2 (en) | 1991-10-14 | 1991-10-14 | Multi-layer X-ray slit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3189126B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2731501B2 (en) * | 1993-04-07 | 1998-03-25 | 理学電機工業株式会社 | X-ray focusing element |
| JP5440481B2 (en) * | 2010-12-03 | 2014-03-12 | 株式会社島津製作所 | Slitting device |
-
1991
- 1991-10-14 JP JP26435891A patent/JP3189126B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05100092A (en) | 1993-04-23 |
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