JP3180859B2 - Manufacturing method of planar optical waveguide - Google Patents
Manufacturing method of planar optical waveguideInfo
- Publication number
- JP3180859B2 JP3180859B2 JP14138493A JP14138493A JP3180859B2 JP 3180859 B2 JP3180859 B2 JP 3180859B2 JP 14138493 A JP14138493 A JP 14138493A JP 14138493 A JP14138493 A JP 14138493A JP 3180859 B2 JP3180859 B2 JP 3180859B2
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- Japan
- Prior art keywords
- solvent
- organic polymer
- substrate
- optical waveguide
- polymer material
- Prior art date
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Description
【０００１】[0001]
【産業上の利用分野】本発明は，光導波路材料として有
機重合体材料を積層することにより構成した，平面状光
導波路の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a planar optical waveguide formed by laminating an organic polymer material as an optical waveguide material.
【０００２】[0002]
【従来技術】従来，長距離光通信や光情報処理の分野に
おいては，高信頼性化，高速化，低損失化，小型化を実
現するために光回路素子の集積化が進められている。そ
して，その主要構成部品として平面状光導波路も種々検
討されている。従来，これらの分野では，主として，単
一モードの光伝送を前提としており，導波路の口径が１
０μｍ角以下で，比屈折率差も１％以下といった構成の
光導波路が作製されている。2. Description of the Related Art Conventionally, in the field of long-distance optical communication and optical information processing, integration of optical circuit elements has been promoted in order to realize high reliability, high speed, low loss, and miniaturization. Various planar optical waveguides have been studied as the main components. Conventionally, in these fields, single-mode optical transmission is mainly premised, and a waveguide having a diameter of 1
An optical waveguide having a configuration of 0 μm square or less and a relative refractive index difference of 1% or less has been manufactured.
【０００３】また，光導波路用の材料としても，酸化物
結晶，ガラス，半導体，有機材料といったあらゆる材料
が検討されている。この中でも有機材料は，材料コスト
が最も安く，量産性に優れていることから，短距離用途
を中心とする民生品への応用が期待されている。また，
基板上への有機材料による成膜は，通常スピンコーティ
ング法が用いられており，小面積であれば比較的良好に
膜厚の均一性が得られている。[0003] As materials for optical waveguides, various materials such as oxide crystals, glass, semiconductors, and organic materials have been studied. Among them, organic materials have the lowest material cost and are excellent in mass productivity, so that they are expected to be applied to consumer products mainly for short-distance use. Also,
In general, spin coating is used for film formation using an organic material on a substrate, and a relatively good uniformity of film thickness can be obtained in a small area.
【０００４】[0004]
【解決しようとする課題】上述したように，従来法によ
る有機材料を用いた平面状光導波路の作製法は，有機重
合体材料を溶媒に溶かし，スピンコーティングにより基
板上に成膜させる方法が一般的である。しかしながら，
この方法では厚さ１０μｍ以上で，且つ，面内で膜厚の
均一生の高い成膜は困難であった。As described above, a conventional method for manufacturing a planar optical waveguide using an organic material is to dissolve an organic polymer material in a solvent and form a film on a substrate by spin coating. It is a target. However,
With this method, it is difficult to form a film having a thickness of 10 μm or more and a uniform thickness in the plane.
【０００５】更に，厚膜を積層する場合は，一般に膜内
の溶媒が全て蒸発するまで長時間を要する。そのため，
既に塗布乾燥している下層の重合体膜が溶媒に接する時
間が必然的に長くなり，ソルベントストレスクラッキン
グという亀裂が発生する。或いは，境界面における再溶
解が徐々に進行し，その結果２種の有機重合体材料によ
る混合層を生じ，この混合層の厚みが使用波長に対して
無視できない大きさになるという問題点があった。Further, when a thick film is laminated, it generally takes a long time until all the solvent in the film evaporates. for that reason,
The time required for the lower polymer film, which has been coated and dried, to come into contact with the solvent is inevitably increased, and cracks called solvent stress cracking occur. Alternatively, there is a problem that the re-dissolution at the boundary surface gradually progresses, and as a result, a mixed layer of two organic polymer materials is formed, and the thickness of the mixed layer becomes nonnegligible with respect to the wavelength used. Was.
【０００６】ソルベントストレスクラッキングは，構造
的な光の散乱中心となり，混合層は屈折率のランダムな
揺らぎによる光の散乱を生じる。そのため，これら両者
は平面状光導波路の損失要因となる。また，上記混合層
に関しては，高分子材料と溶媒の溶解度パラメータとい
う概念を用いて，両者の組み合わせを規定する試みが提
案されている（特開昭６２−６２０２号公報）。[0006] Solvent stress cracking becomes a structural light scattering center, and the mixed layer causes light scattering due to random fluctuations in the refractive index. Therefore, these two factors cause a loss in the planar optical waveguide. With respect to the above-mentioned mixed layer, an attempt has been made to define a combination of both using the concept of solubility parameter of a polymer material and a solvent (JP-A-62-6202).
【０００７】しかし，この規定は溶解の容易性を図るも
のであり，混合層の発生の有無を表現するものではな
い。特に長時間にわたり溶媒に接していたり，高温乾燥
の場合においては，上記混合層の厚みは容易に使用波長
以上になってしまうという問題点があった。本発明は，
上記問題点に鑑み，有機重合体材料の厚膜積層に際し，
ソルベントストレスクラッキングや再溶解の発生がな
く，均一塗膜を有し，散乱損失の低い，平面状光導波路
の製造方法を提供しようとするものである。However, this rule is intended to facilitate the dissolution, and does not express whether or not a mixed layer is generated. In particular, there has been a problem that the thickness of the mixed layer easily exceeds the wavelength used in the case of being in contact with a solvent for a long time or drying at a high temperature. The present invention
In view of the above problems, when stacking thick organic polymer materials,
An object of the present invention is to provide a method for manufacturing a planar optical waveguide which has no solvent stress cracking or re-dissolution, has a uniform coating film, and has low scattering loss.
【０００８】[0008]
【課題の解決手段】本発明は，基板の表面に第１有機重
合体材料よりなるクラッド層及び第２有機重合体材料よ
りなるコア層を順次積層してなる平面状光導波路を製造
するに当たり，上記第１有機重合体材料又は第２有機重
合体材料を溶媒に溶解した原料溶液をそれぞれ準備し，
まずクラッド層用の原料溶液に基板を浸漬し，乾燥する
第１積層工程を行ない，次いで上記クラッド層を形成し
た基板をコア層用の原料溶液に浸漬し，乾燥する第２積
層工程を行う方法であって，上記第１積層工程及び第２
積層工程においては，それぞれ上記浸漬を複数回行うと
共に少なくとも１回は基板の上下方向の反転を行ない，
かつ上記乾燥時には基板における上記原料溶液の塗膜が
鉛直方向に平行な状態にあって，上記塗膜からの溶媒蒸
発量を抑制しながら乾燥を行ない，また上記浸漬に当っ
ては，基板面を鉛直方向に平行に配置したまま基板を原
料溶液中に浸漬することを特徴とする平面状光導波路の
製造方法にある。According to the present invention, there is provided a planar optical waveguide in which a cladding layer made of a first organic polymer material and a core layer made of a second organic polymer material are sequentially laminated on a surface of a substrate. A raw material solution prepared by dissolving the first organic polymer material or the second organic polymer material in a solvent is prepared,
First, a substrate is immersed in a raw material solution for a clad layer, and a first laminating step of drying is performed. Then, the substrate on which the clad layer is formed is immersed in a raw material solution for a core layer, and a second laminating step of drying is performed. Wherein the first laminating step and the second
In the laminating step, the above immersion is performed a plurality of times, and at least once, the substrate is turned upside down.
And during the drying In the coating film parallel to the vertical direction of the raw material solution in the substrate, no line drying while suppressing solvent evaporation from the coating film, also hit the said soaking
The board with the board surface parallel to the vertical direction.
A method for producing a planar optical waveguide, characterized by immersing the planar optical waveguide in a material solution .
【０００９】本発明において最も注目すべきことは，上
記第１積層工程及び第２積層工程の浸漬時には上記複数
回の浸漬及び基板の，少なくとも１回の上下反転を行う
こと，乾燥時には上記塗膜を鉛直方向になし，かつ塗膜
からの溶媒蒸発量を抑制しながら乾燥することである。It is most remarkable in the present invention that the immersion in the first and second laminating steps is performed a plurality of times and the substrate is turned upside down at least once. In the vertical direction, and drying while suppressing the amount of solvent evaporated from the coating film.
【００１０】即ち，上記第１積層工程においては，第１
有機重合体材料を溶媒により溶解した原料溶液を準備
し，この原料溶液中に基板を浸漬する。浸漬は複数回行
うが，この際少なくとも１回は，基板の上下位置を反転
させた浸漬を行う。これにより，基板上にほぼ均一な塗
膜を形成させることができる。That is, in the first laminating step, the first
A raw material solution in which an organic polymer material is dissolved by a solvent is prepared, and the substrate is immersed in this raw material solution. The immersion is performed a plurality of times. At this time, the immersion is performed at least once by reversing the vertical position of the substrate. Thereby, a substantially uniform coating film can be formed on the substrate.
【００１１】上記の上下反転を行わない場合には，基板
の下方における塗膜の厚みが上方よりも大きくなってし
まい，均一厚みとならない。上記複数回の浸漬は，所望
するクラッド層の塗膜厚みが得られるまで行う。その後
は，上記塗膜の乾燥を行う。これにより，基板上にクラ
ッド層が形成される。If the above-mentioned upside down is not performed, the thickness of the coating film below the substrate becomes larger than that above the substrate, and the thickness is not uniform. The plurality of immersions are performed until a desired clad layer coating thickness is obtained. Thereafter, the coating film is dried. Thereby, a clad layer is formed on the substrate.
【００１２】即ち，塗膜形成に当たっては，浸漬法を用
い，基板面を鉛直方向に平行に配置したまま原料溶液中
に浸漬し，引上げ後，例えば溶媒蒸気含有の乾燥ガスに
より塗膜面からの溶媒の蒸発速度を抑制しながら乾燥す
る。塗布された膜は乾燥が進むにつれてゲル化し，最終
的に粘度と乾燥時間で規定される膜厚となる。That is, in forming a coating film, the substrate surface is immersed in a raw material solution while being arranged in a vertical direction by using an immersion method. Drying while suppressing the evaporation rate of the solvent. The applied film gels as drying proceeds, and finally reaches a film thickness defined by viscosity and drying time.
【００１３】ここで，乾燥時間が溶液の流動による移動
時間に比べ十分長ければ，ゲル状膜の表面張力により膜
面内で平滑な膜面が得られ，余剰の溶液は下方に移動
し，基板から滴下される。また，複数回の浸漬におい
て，基板の向きが常に一定であると，鉛直下方ほど膜厚
が大きくなる。そこで，複数回にわたり浸漬し，且つ，
その途中において，少なくとも１回以上，基板の向きを
上下反転する。これにより，面内で均一な膜厚が得られ
る。Here, if the drying time is sufficiently longer than the moving time due to the flow of the solution, a smooth film surface can be obtained in the film surface due to the surface tension of the gel film, and the excess solution moves downward, and the substrate moves downward. It is dripped from. In addition, if the orientation of the substrate is always constant in a plurality of immersions, the film thickness increases vertically downward. So, immerse several times, and
On the way, the direction of the substrate is turned upside down at least once. As a result, a uniform film thickness can be obtained in the plane.
【００１４】クラッド層，コア層の厚膜化は，溶媒中に
有機重合体材料を高濃度で溶解した溶媒中に浸漬と乾燥
を繰り返すことにより得られる。この際複数回塗布する
と，既に乾燥もしくはゲル化している同一の有機重合体
材料を再び溶解し，ゲル状の膜を形成する。しかしなが
ら，このゲル状の膜は極端に流動性が悪くなるため容易
に厚膜化が達成される。上記乾燥に当たっては，基板上
の塗膜が鉛直方向となるように基板を垂下させ，塗膜か
らの溶媒蒸発量を抑制しながら乾燥を行う。The thickening of the cladding layer and the core layer can be obtained by repeating immersion and drying in a solvent in which an organic polymer material is dissolved in a solvent at a high concentration. At this time, when the coating is performed a plurality of times, the same organic polymer material that has already been dried or gelled is dissolved again to form a gel-like film. However, since the gel-like film has extremely poor fluidity, it can be easily thickened. In the drying, the substrate is hung so that the coating film on the substrate is in a vertical direction, and drying is performed while suppressing the amount of solvent evaporated from the coating film.
【００１５】溶媒蒸発量の抑制方法としては，例えばク
ラッド層を形成させる場合には，上記第１有機重合体材
料の原料溶液を作成するに当たって用いた溶媒と同一の
溶媒蒸気を含むガス流を，塗膜の表面に流しながら，加
熱する。この加熱温度は溶媒の沸点よりも低い温度とす
ることが好ましい。沸点よりも高いと，生成されるクラ
ッド層の表面に凹凸を生じ，平面状光導波路の機能に障
害を生ずるおそれがある。As a method of suppressing the amount of solvent evaporation, for example, in the case of forming a clad layer, a gas stream containing the same solvent vapor as the solvent used in preparing the raw material solution of the first organic polymer material is used. Heat while flowing over the surface of the coating. The heating temperature is preferably lower than the boiling point of the solvent. If the boiling point is higher than the boiling point, the surface of the clad layer to be formed may have irregularities, which may impair the function of the planar optical waveguide.
【００１６】次に，第２積層工程においては，上記クラ
ッド層を形成した基板を，第２有機重合体材料を溶媒に
より溶解した原料溶液の中に複数回浸漬する。この際に
基板の上下反転を行うこと，乾燥に際して塗膜を鉛直方
向とすること，溶媒蒸発量を抑制すること，その手段な
どは，上記第１積層工程と同様である。これにより，基
板の表面にクラッド層，コア層が順次積層される。ま
た，このコア層の上には，必要に応じて上部クラッド層
を積層する。該上部クラッド層を積層する第３積層工程
は，後述する。Next, in the second laminating step, the substrate on which the clad layer is formed is immersed a plurality of times in a raw material solution obtained by dissolving the second organic polymer material in a solvent. At this time, the substrate is turned upside down, the coating film is oriented vertically during drying, the amount of solvent evaporation is suppressed, and the means thereof are the same as those in the first laminating step. Thus, the clad layer and the core layer are sequentially laminated on the surface of the substrate. Further, an upper clad layer is laminated on this core layer as necessary. A third laminating step of laminating the upper clad layer will be described later.
【００１７】また，上記基板としては，ガラス，樹脂，
半導体，酸化物結晶などの材料を用いる。クラッド層形
成用の第１有機重合体材料としては，フルオロアルキル
アクリレート，ポリメタクリル酸トリフルオロエチル，
シリコン樹脂などを用いる。コア層形成用の第２有機重
合体材料としては，ポリメチルメタクリレートなどを用
いる。Further, as the substrate, glass, resin,
Materials such as semiconductors and oxide crystals are used. As the first organic polymer material for forming the cladding layer, fluoroalkyl acrylate, polytrifluoroethyl methacrylate,
Silicon resin or the like is used. Polymethyl methacrylate or the like is used as the second organic polymer material for forming the core layer.
【００１８】上記原料溶液を準備するに当たって，第１
有機重合体材料を溶解する溶媒としては，メチルエチル
ケトン，酢酸エチル，アセトニトリル等の１種又は２種
以上の混合物を用いる。一方，第２有機重合体材料を溶
解する溶媒としては，メチルイソブチルケトン，酢酸ｎ
ブチル，トルエン，クロロベンゼンの１種又は２種以上
の混合物を用いる。In preparing the raw material solution, the first
As the solvent for dissolving the organic polymer material, one or a mixture of two or more of methyl ethyl ketone, ethyl acetate, acetonitrile and the like is used. On the other hand, as a solvent for dissolving the second organic polymer material, methyl isobutyl ketone, acetic acid n
One or a mixture of two or more of butyl, toluene and chlorobenzene is used.
【００１９】次に，上記第１積層工程の後に上記第２積
層工程を行うに際して，コア層用原料溶液中の溶媒が乾
燥するまでの乾燥時間をｔ，第２積層工程における乾燥
温度における上記溶媒に対する上記第１有機重合体材料
の溶解速度をＡ，製造される平面状光導波路の使用波長
をλとしたとき，これらの間には，「Ａ＜λ／ｔ」の条
件が満足されるよう，上記第１有機重合体材料と上記コ
ア層用原料溶液中の溶媒との組合せを選択することが好
ましい。Next, when the second laminating step is performed after the first laminating step, the drying time until the solvent in the core layer raw material solution dries is t, and the solvent at the drying temperature in the second laminating step is t. Assuming that the dissolution rate of the first organic polymer material is A and the wavelength used of the planar optical waveguide to be manufactured is λ, the condition “A <λ / t” is satisfied between them. Preferably, a combination of the first organic polymer material and a solvent in the core layer raw material solution is selected.
【００２０】即ち，クラッド層の上にコア層の原料溶液
を塗布してコア層を積層していく際には，既に成膜され
ているクラッド層の第１有機重合体材料が，コア層原料
溶液の溶媒と接触する時間が長くなる。そのため，クラ
ッド層とコア層との混合層が生じ，その厚みが光学的損
失を生じる使用波長λ程度に達する場合がある。そこ
で，上記「Ａ＜λ／ｔ」の関係を満足する条件で，コア
層の形成を行うことが好ましい。That is, when the core layer raw material solution is applied on the clad layer and the core layer is laminated, the first organic polymer material of the already formed clad layer is changed to the core layer raw material. The contact time of the solution with the solvent is prolonged. For this reason, a mixed layer of the clad layer and the core layer is formed, and the thickness of the mixed layer may reach about the used wavelength λ at which optical loss occurs. Therefore, it is preferable to form the core layer under a condition that satisfies the relationship of “A <λ / t”.
【００２１】上記乾燥時間「ｔ」の単位は時間（Ｈｒ）
を，溶解速度「Ａ」の単位はμｍ／Ｈｒを，使用波長
「λ」の単位はμｍを示す。また，「Ａ」は単位時間当
たりの溶解もしくは膨潤した第１有機重合体材料の厚み
を測定することにより得られる。The unit of the drying time "t" is time (Hr).
The unit of the dissolution rate “A” is μm / Hr, and the unit of the working wavelength “λ” is μm. “A” is obtained by measuring the thickness of the dissolved or swollen first organic polymer material per unit time.
【００２２】例えば，コア層用の第２有機重合体材料と
してポリメチルメタクリレートを用い，原料溶液作成用
の溶媒としてメチルイソブチルケトンを用い，第２積層
工程における乾燥温度を２５℃とする。一方，平面状光
導波路の使用波長「λ」を０．６６μｍとし，ｔ＝６Ｈ
ｒとする。そうするとλ／ｔ＝０．１１μｍ／Ｈｒであ
る。そのため，「Ａ＜０．１１μｍ／Ｈｒ」とするに
は，第１有機重合体材料として，上記乾燥温度における
上記溶媒に対する溶解速度が０．１μｍ／Ｈｒ未満のフ
ルオロアルキルアクリレートを用いることになる。For example, polymethyl methacrylate is used as the second organic polymer material for the core layer, methyl isobutyl ketone is used as the solvent for preparing the raw material solution, and the drying temperature in the second laminating step is 25 ° C. On the other hand, the used wavelength “λ” of the planar optical waveguide is 0.66 μm, and t = 6H
r. Then, λ / t = 0.11 μm / Hr. Therefore, in order to satisfy “A <0.11 μm / Hr”, a fluoroalkyl acrylate having a dissolution rate in the solvent at the above-mentioned drying temperature of less than 0.1 μm / Hr is used as the first organic polymer material.
【００２３】次に，第１有機重合体材料はフルオロアル
キルアクリレートを用い，上記乾燥時における塗膜から
の溶媒蒸発量を抑制する手段として，上記原料溶液中の
溶媒と同一の溶媒の濃度σの蒸気を含むガス流により，
塗膜面積１ｃｍ2 当たり，ガス流速２σＣＣＭ／ｃｍ2
未満の雰囲気を用いることが好ましい。上記ガス流速の
単位「ＣＣＭ」は，「ｃｃ／分」を示す。Next, as the first organic polymer material, a fluoroalkyl acrylate is used, and as a means for suppressing the amount of solvent evaporation from the coating film during the drying, a solvent having the same concentration σ as the solvent in the raw material solution is used. Due to the gas stream containing steam,
Gas flow rate 2σCCM / cm 2 per 1 cm 2 of coating film area
It is preferable to use an atmosphere of less than. The unit “CCM” of the gas flow rate indicates “cc / min”.
【００２４】また，第２有機重合体材料としてポリメチ
ルメタクリレートを用い，その溶媒としてメチルイソブ
チルケトン，酢酸ｎブチル，トルエン，クロロベンゼン
の１種又は２種以上を用い，乾燥時においては乾燥用雰
囲気ガス流中に混入した溶媒蒸気濃度，及び乾燥用雰囲
気のガス流速により乾燥後の塗膜を制御することが好ま
しい。Further, polymethyl methacrylate is used as the second organic polymer material, and one or more of methyl isobutyl ketone, n-butyl acetate, toluene and chlorobenzene are used as the solvent, and an atmosphere gas for drying is used when drying. It is preferable to control the dried coating film by the concentration of the solvent vapor mixed in the flow and the gas flow rate of the drying atmosphere.
【００２５】次に，上記のごとく，クラッド層の上にコ
ア層を形成した後には，更に必要に応じて，上記コア層
を包みこむようにして上部クラッド層を形成する。この
場合には，例えば次の方法がある。即ち，上記基板の上
にクラッド層，コア層を順次積層し，更に該コア層の上
に第３有機重合体材料よりなる上部クラッド層を積層し
てなる平面状光導波路を製造するに当たり，上記第２積
層工程の後に上記第１積層工程と同様の操作の第３積層
工程を行う。また上記浸漬に当っては，基板面を鉛直方
向に平行に配置したまま基板を原料溶液中に浸漬する。 Next, as described above, after forming the core layer on the clad layer, if necessary, an upper clad layer is formed so as to surround the core layer. In this case, for example, there is the following method. That is, in manufacturing a planar optical waveguide in which a clad layer and a core layer are sequentially laminated on the substrate, and an upper clad layer made of a third organic polymer material is further laminated on the core layer, After the second laminating step, a third laminating step of the same operation as the first laminating step is performed. In the above immersion, the substrate surface should be vertical.
The substrate is immersed in the raw material solution while being arranged parallel to the direction.
【００２６】そして，上記第２積層工程の後に上記第３
積層工程を行うに際して，第３有機重合体材料用原料溶
液中の溶媒が乾燥するまでの乾燥時間をｔ，第３積層工
程における乾燥温度における上記溶媒に対する上記第２
有機重合体材料の溶解速度をＡ，製造される平面状光導
波路の使用波長をλとしたとき，これらの間には「Ａ＜
λ／ｔ」の条件が満足されるよう，上記第２有機重合体
材料と上記上部クラッド層用原料溶液中の溶媒との組み
合わせを選択する。After the second laminating step, the third
In performing the laminating step, the drying time until the solvent in the raw material solution for the third organic polymer material is dried is represented by t, and the second time with respect to the solvent at the drying temperature in the third laminating step.
Assuming that the dissolution rate of the organic polymer material is A and the used wavelength of the planar optical waveguide to be manufactured is λ, “A <
The combination of the second organic polymer material and the solvent in the raw material solution for the upper cladding layer is selected so as to satisfy the condition of λ / t ”.
【００２７】上記第３有機重合体材料としては，熱硬化
性シリコン樹脂，フッ素樹脂等がある。また，この第３
積層工程は前記第１積層工程と同様にして，原料溶液中
への浸漬，乾燥を行う。また，上記「Ａ＜λ／ｔ」の関
係も同様である。なお，何らかの方法により作製された
光導波路を有する平板を基板として用い，これに本発明
を適用することによっても，複数の導波層を有する平面
状光導波路が得られる。The third organic polymer material includes a thermosetting silicone resin, a fluororesin and the like. In addition, this third
In the laminating step, immersion in the raw material solution and drying are performed in the same manner as in the first laminating step. The same applies to the relationship of “A <λ / t”. It is to be noted that a flat optical waveguide having a plurality of waveguide layers can also be obtained by using a flat plate having an optical waveguide manufactured by any method as a substrate and applying the present invention thereto.
【００２８】[0028]
【作用及び効果】本発明においては，上記第１積層工程
及び第２積層工程を行ない，その際の浸漬，乾燥を上記
のごとく操作している。そのため，クラッド層とコア層
との界面に生成される混合層は，平面状光導波路におい
て使用する波長に比較して大きな厚みとならない。その
ため，上記界面の屈折率揺らぎに起因する散乱損失は殆
ど発生せず，低損失の平面状光導波路を得ることができ
る。In the present invention, the first laminating step and the second laminating step are performed, and immersion and drying are performed as described above. Therefore, the mixed layer formed at the interface between the cladding layer and the core layer does not have a large thickness compared to the wavelength used in the planar optical waveguide. Therefore, scattering loss due to the refractive index fluctuation at the interface hardly occurs, and a low-loss planar optical waveguide can be obtained.
【００２９】また，前述のソルベントストレスクラッキ
ングの発生機構は，塗膜表面に存在する微視的応力集中
源に発生したクレーズに溶媒が作用して分子鎖を切断す
るものである。しかし本発明によれば，上記微視的応力
集中源発生を極力押えることができるため有機重合体材
料を積層してもソルベントストレスクラッキングは発生
しない。それのみならず，本発明法によれば大面積の基
板上でも，均一，且つ，平滑に有機重合体材料をコーテ
ィング出来る。The mechanism of the above-described solvent stress cracking is such that a solvent acts on craze generated at a microscopic stress concentration source existing on the surface of a coating film to cut a molecular chain. However, according to the present invention, the generation of the microscopic stress concentration source can be suppressed as much as possible, so that the solvent stress cracking does not occur even when the organic polymer material is laminated. In addition, according to the method of the present invention, the organic polymer material can be uniformly and smoothly coated on a large-area substrate.
【００３０】したがって，本発明によれば，有機重合体
材料の積層に際してソルベントストレスクラッキングや
再溶解の発生がなく，均一塗膜を有し，散乱損失の低
い，平面状光導波路の製造方法を提供することができ
る。Therefore, according to the present invention, there is provided a method for manufacturing a planar optical waveguide having a uniform coating film, low scattering loss and no solvent stress cracking or re-dissolution during lamination of an organic polymer material. can do.
【００３１】[0031]
実施例１ 本発明の実施例にかかる，平面状光導波路の製造方法に
つき，図１，図２を用いて説明する。本例は，図１
（Ｇ）に示すごとく，基本的には，基板４の表面に第１
有機重合体材料よりなるクラッド層１及び，第２有機重
合体材料よりなるコア層２を順次積層してなる平面状光
導波路を製造しようとするものである。Embodiment 1 A method for manufacturing a planar optical waveguide according to an embodiment of the present invention will be described with reference to FIGS. This example is shown in FIG.
Basically, as shown in FIG.
This is to manufacture a planar optical waveguide in which a cladding layer 1 made of an organic polymer material and a core layer 2 made of a second organic polymer material are sequentially laminated.
【００３２】また，最終的には，この平面状光導波路
は，図２（Ｄ）に示すごとく，上記コア層２の周囲にこ
れを包み込むように上部クラッド層１５が形成され，更
に上部クラッド層１５の上に上部基板４５が設けられ
る。上記平面状光導波路の製造に当たっては，まず図１
に示すように，第１有機重合体材料を溶媒に溶解したク
ラッド層用原料溶液１０（図１Ａ）と，第２有機重合体
材料を溶媒に溶解したコア層用原料溶液２０（図１Ｆ）
を準備する。Finally, in the planar optical waveguide, as shown in FIG. 2D, an upper clad layer 15 is formed so as to wrap the core layer 2 around the core layer 2. An upper substrate 45 is provided on 15. In manufacturing the planar optical waveguide, first, FIG.
As shown in FIG. 1, a clad layer raw material solution 10 in which a first organic polymer material is dissolved in a solvent (FIG. 1A) and a core layer raw material solution 20 in which a second organic polymer material is dissolved in a solvent (FIG. 1F)
Prepare
【００３３】そして，まず，図１（Ａ），（Ｂ）に示す
ごとく，クラッド層用原料溶液１０に基板４を，その基
板面を鉛直方向に平行に配置したまま，浸漬し，次いで
これを引き上げ乾燥する（図１Ｃ）という第１積層工程
を行う。該第１積層工程は，図１（Ａ）〜（Ｅ）に示す
ごとく，複数回行う。そして，その間に，次回の浸漬に
先立って少なくとも１回は，基板４の下端４１と上端４
２との上下方向の反転を行う（図１Ｂ〜Ｄ）。[0033] Then, first, FIG. 1 (A), the as (B), the substrate 4 in the cladding layer for raw material solution 10, the group
A first laminating step is performed in which the plate is immersed while the plate surface is arranged parallel to the vertical direction, and is then pulled up and dried (FIG. 1C). The first lamination step is performed a plurality of times as shown in FIGS. In the meantime, the lower end 41 and the upper end 4 of the substrate 4 are at least once before the next immersion.
2 is inverted in the vertical direction (FIGS. 1B to 1D).
【００３４】また，乾燥時（図１Ｃ，Ｅ）には，基板に
おける上記原料溶液１０の塗膜１１が鉛直方向に平行と
なる状態において，上記塗膜１１からの溶媒蒸発量を抑
制しながら，乾燥を行う。溶媒蒸発量の抑制は，例えば
塗膜１１の表面にクラッド層用原料溶液に用いた溶媒の
蒸気のガス流を当てながら行う。At the time of drying (FIGS. 1C and 1E), while the coating 11 of the raw material solution 10 on the substrate is parallel to the vertical direction, the amount of solvent evaporated from the coating 11 is suppressed. Perform drying. The suppression of the amount of solvent evaporation is performed, for example, while applying a vapor stream of the solvent vapor used for the cladding layer raw material solution to the surface of the coating film 11.
【００３５】次に，基板４の表面にクラッド層１を形成
した後は，図１（Ｆ）に示すごとく，基板４をコア層用
原料溶液２０の中に浸漬する。次いで，クラッド層形成
の場合と同様に，複数回浸漬，上下反転，鉛直状態での
溶媒蒸発量抑制下の乾燥を行う。これにより，図１
（Ｇ）に示すごとく，基板４の表面に，クラッド層１，
コア層２が順次積層された中間体４０が得られる。Next, after the cladding layer 1 is formed on the surface of the substrate 4, the substrate 4 is immersed in the core layer raw material solution 20, as shown in FIG. Next, as in the case of the formation of the clad layer, immersion, upside down, and drying are performed in a vertical state while suppressing the amount of solvent evaporation. As a result, FIG.
As shown in (G), the cladding layers 1 and
An intermediate 40 in which the core layers 2 are sequentially laminated is obtained.
【００３６】次に，図２（Ａ）〜（Ｄ）に示すごとく，
上記中間体４０において，コア層２の上面にエッチング
マスク３をフォトリソグラフィーにより形成し，ドライ
エッチングによりエッチングを行ないチャンネル型光導
波路２２を作製した（図２Ａ〜Ｃ）。更に，上記光導波
路２２の周囲に，必要に応じて，第１積層工程と同様に
して上部クラッド層１５を形成し，更にその上に上部基
板４５を設けた。これにより，チャンネル型光導波路を
有する平面状光導波路が製造される。Next, as shown in FIGS. 2A to 2D,
In the intermediate 40, the etching mask 3 was formed on the upper surface of the core layer 2 by photolithography, and etching was performed by dry etching to produce the channel type optical waveguide 22 (FIGS. 2A to 2C). Further, an upper cladding layer 15 was formed around the optical waveguide 22 as necessary in the same manner as in the first laminating step, and an upper substrate 45 was further provided thereon. Thus, a planar optical waveguide having a channel-type optical waveguide is manufactured.
【００３７】実施例２ 次に，上記実施例１に示した平面状光導波路の製造につ
き，その具体例を，上記図２，更に図３〜図６を用いて
説明する。即ち，図２（Ａ）に示すように，全長７６ｍ
ｍのガラス材料よりなる基板４上に浸漬法を用い，クラ
ッド層１用の第１有機重合体材料としてフルオロアルキ
ルアクリレート（ダイキン工業（株）製：ＯＰ−１０
０；屈折率１．３９）を成膜する。Embodiment 2 Next, a specific example of the manufacture of the planar optical waveguide shown in Embodiment 1 will be described with reference to FIGS. 2 and 3 to 6. That is, as shown in FIG.
A fluoroalkyl acrylate (OP-10, manufactured by Daikin Industries, Ltd.) is used as the first organic polymer material for the cladding layer 1 by using an immersion method on a substrate 4 made of a glass material of m.
0; refractive index 1.39).
【００３８】第１有機重合体材料を溶解する溶媒として
はメチルエチルケトンを用いたが，他の溶媒として，酢
酸エチル，アセトニトリル等，もしくはこれらの混合溶
媒も可能である。乾燥後，続いてコア層用の第２有機重
合体材料として，ポリメチルメタクリレート（屈折率；
１．４９）を用いて成膜する。溶媒としては，メチルイ
ソブチルケトンとモノクロロベンゼンの混合溶媒を用い
た。Although methyl ethyl ketone was used as the solvent for dissolving the first organic polymer material, other solvents such as ethyl acetate, acetonitrile and the like, or a mixed solvent thereof are also possible. After drying, subsequently, as a second organic polymer material for the core layer, polymethyl methacrylate (refractive index;
1.49). As a solvent, a mixed solvent of methyl isobutyl ketone and monochlorobenzene was used.
【００３９】しかし，溶媒としては，この他に，上記第
１有機重合体材料のフルオロアルキルアクリレートに対
して１０時間以上接触しても，クラッド層とコア層の混
合層を形成しない溶媒として，酢酸ｎブチル，トルエ
ン，及びこれらの混合溶媒がある。これらの溶媒の２５
℃における前記フルオロアルキルアクリレートに対する
溶解速度は，全て１時間当たり０．１μｍ未満であっ
た。これらの成膜条件を表１に示す。However, other solvents that do not form a mixed layer of the clad layer and the core layer even when they are in contact with the fluoroalkyl acrylate of the first organic polymer material for 10 hours or more are acetic acid. There are n-butyl, toluene, and a mixed solvent thereof. 25 of these solvents
All dissolution rates for the fluoroalkyl acrylate at 0 ° C. were less than 0.1 μm per hour. Table 1 shows these film forming conditions.
【００４０】また，上記図２（Ｂ）〜（Ｄ）に示すエッ
チング，上部クラッド層１５，上部基板４５の形成等は
公知の方法を採用した。上部クラッド層１５としては，
シリコン樹脂等の非溶剤系の低屈折率樹脂を用いた。上
部基板４５としては，ガラスを用いた。The etching shown in FIGS. 2B to 2D and the formation of the upper cladding layer 15 and the upper substrate 45 are performed by a known method. As the upper cladding layer 15,
A non-solvent low refractive index resin such as a silicone resin was used. Glass was used as the upper substrate 45.
【００４１】[0041]
【表１】 [Table 1]
【００４２】上記方法において，第１有機重合体材料の
乾燥は，溶媒と同じメチルエチルケトンの飽和蒸気を，
Ｎ2 ガス等の不活性ガスにより２０％（すなわち，飽和
蒸気濃度σ＝０．２）に希釈したものを乾燥ガスとして
用いた。塗膜１ｃｍ2 当たりの，単位流路断面積を通過
するガス流量（ｃｃ／分／ｃｍ2 ／ｃｍ2 ＝ＣＣＭ／ｃ
ｍ4 ）をパラメータとして，乾燥後の膜厚分布を図３に
示した。同図の横軸は基板の下端から上端までの位置
（ｙｍｍ）を，縦軸は第１有機重合体材料の膜厚Ｔμｍ
を示している。In the above method, the first organic polymer material is dried by using the same saturated vapor of methyl ethyl ketone as the solvent.
A gas diluted to 20% (ie, saturated vapor concentration σ = 0.2) with an inert gas such as N 2 gas was used as a dry gas. Gas flow rate (cc / min / cm 2 / cm 2 = CCM / c) passing through the unit channel cross-sectional area per 1 cm 2 of coating film
The film thickness distribution after drying is shown in FIG. 3 using m 4 ) as a parameter. The horizontal axis in the figure is the position (ymm) from the lower end to the upper end of the substrate, and the vertical axis is the film thickness Tμm of the first organic polymer material.
Is shown.
【００４３】同図より知られるごとく，流量が０．４Ｃ
ＣＭ／ｃｍ4 未満では，溶媒の蒸発速度が低くなり，溶
液の下方への移動が容易になるため，溶液が表面張力で
規定される膜厚に収束し，面内での膜厚もほぼ均一化す
ることが分かる。ここで，飽和蒸気の濃度σと流量は比
例関係にあるため，流量は２σＣＣＭ／ｃｍ4 未満であ
れば，常に一様な膜が得られる。As can be seen from FIG.
At less than CM / cm 4 , the evaporation rate of the solvent is low and the solution can easily move downward, so that the solution converges to the film thickness specified by the surface tension and the film thickness in the plane is almost uniform. It turns out that it becomes. Here, since the concentration σ of the saturated vapor and the flow rate are in a proportional relationship, if the flow rate is less than 2σCCM / cm 4 , a uniform film is always obtained.
【００４４】次に，上記表１の条件において，第１有機
重合体材料の濃度を１２ｗｔ％とした場合の成膜後の膜
厚分布を図３と同様にして，図４に示す。同図中，黒点
は２回とも同一方向にディップしたものであり，白点は
上下反転をした結果である。上下反転により膜厚の面内
均一性が向上していることが分かる。Next, FIG. 4 shows the film thickness distribution after film formation when the concentration of the first organic polymer material is 12 wt% under the conditions shown in Table 1 in the same manner as in FIG. In the figure, the black point is the result of dipping in the same direction twice, and the white point is the result of upside down. It can be seen that the in-plane uniformity of the film thickness is improved by the upside down.
【００４５】次に，図５は，クラッド層形成後に，第２
有機重合体材料に４回浸漬した後の膜厚分布を，図３と
同様に示したものである。上記浸漬は，２回同一方向に
浸漬したのち，上下反転して２回浸漬した。これによ
り，良好な均一性を示す厚膜が得られた。また，図６に
は，７６×２６ｍｍ2 の基板を用いて表１の条件でポリ
メチルメタクリレートを成膜し，その際溶媒蒸気のガス
流量を変えた場合の膜厚変化を示す。同図より知られる
ごとく，乾燥時の溶媒蒸気のガス流量を変えることによ
り，広い範囲で膜厚の調整が可能となる。Next, FIG. 5 shows that the second
The film thickness distribution after immersion in the organic polymer material four times is shown in the same manner as in FIG. In the above immersion, immersion was performed twice in the same direction, and then inverted upside down and immersed twice. As a result, a thick film exhibiting good uniformity was obtained. FIG. 6 shows a change in film thickness when a polymethyl methacrylate film is formed on a 76 × 26 mm 2 substrate under the conditions shown in Table 1 and the gas flow rate of the solvent vapor is changed. As is known from the figure, the film thickness can be adjusted over a wide range by changing the gas flow rate of the solvent vapor during drying.
【００４６】また，表１に示したようにコア層形成時の
乾燥時間が６時間であっても，前記混合層の厚みが使用
波長である０．６６μｍに達しない。そのため，これを
２次元光導波路として用いた場合，そのクラッド層とコ
ア層の境界面での散乱は観測されず，伝播損失も０．２
ｄＢ／ｃｍと低かった。上記のごとく，本発明によれ
ば，有機重合体材料の積層に際して，ソルベントストレ
スクラッキングや再溶解の発生がなく，均一塗膜を有
し，散乱損失の低い平面状光導波路を得ることができ
る。As shown in Table 1, even when the drying time for forming the core layer is 6 hours, the thickness of the mixed layer does not reach the working wavelength of 0.66 μm. Therefore, when this is used as a two-dimensional optical waveguide, scattering at the interface between the cladding layer and the core layer is not observed, and the propagation loss is 0.2%.
It was as low as dB / cm. As described above, according to the present invention, it is possible to obtain a planar optical waveguide having a uniform coating film and low scattering loss, without the occurrence of solvent stress cracking and re-dissolution when laminating an organic polymer material.
【図１】実施例１における平面状光導波路の製造方法を
示す説明図。FIG. 1 is an explanatory diagram illustrating a method for manufacturing a planar optical waveguide according to a first embodiment.
【図２】図１に続く，平面状光導波路の製造方法を示す
説明図。FIG. 2 is an explanatory view following FIG. 1 showing the method for manufacturing the planar optical waveguide.
【図３】実施例２における，フルオロアルキルアクリレ
ートを成膜した場合の，乾燥ガス流量と，基板位置及び
膜厚の関係を示す線図。FIG. 3 is a diagram showing a relationship between a flow rate of a dry gas, a substrate position, and a film thickness when a fluoroalkyl acrylate is formed in Example 2.
【図４】実施例２における，フルオロアルキルアクリレ
ートを成膜した場合の，基板の上下反転と，基板位置及
び膜厚の関係を示す線図。FIG. 4 is a diagram showing the relationship between the upside down of the substrate, the substrate position, and the film thickness when a fluoroalkyl acrylate is formed in Example 2;
【図５】実施例２における，基板の上下反転を行って，
ポリメチルメタクリレートを成膜した場合の，基板位置
及び膜厚の関係を示す線図。FIG. 5 is a view showing a state where the substrate is turned upside down in the second embodiment;
FIG. 4 is a diagram showing a relationship between a substrate position and a film thickness when polymethyl methacrylate is formed.
【図６】実施例２における，ポリメチルメタクリレート
を成膜した場合の，乾燥ガス流量と膜厚との関係を示す
線図。FIG. 6 is a diagram showing a relationship between a flow rate of a dry gas and a film thickness when polymethyl methacrylate is formed in Example 2.
１．．．クラッド層， １０．．．第１有機重合体材料の原料溶液， １５．．．上部クラッド層， ２．．．コア層， ２０．．．第２有機重合体材料の原料溶液， ２２．．．チャンネル型光導波路， ３．．．エッチングマスク， ４．．．基板， ４１．．．下端， ４２．．．上端， ４５．．．上部基板， 1. . . 9. cladding layer, . . 14. a raw material solution of the first organic polymer material; . . 1. upper cladding layer; . . Core layer, 20. . . 21. a raw material solution of a second organic polymer material; . . 2. channel-type optical waveguide; . . 3. etching mask; . . Substrate, 41. . . Lower end, 42. . . Upper end, 45. . . Upper substrate,
───────────────────────────────────────────────────── フロントページの続き (72)発明者 加藤 覚 愛知県愛知郡長久手町大字長湫字横道41 番地の１ 株式会社豊田中央研究所内 (72)発明者 市川 正 愛知県愛知郡長久手町大字長湫字横道41 番地の１ 株式会社豊田中央研究所内 (56)参考文献 特開 昭62−150302（ＪＰ，Ａ) 特開 平１−129206（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) G02B 6/12 - 6/14 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Satoru Kato 41, Chukumi Yokomichi, Nagakute-cho, Aichi-gun, Aichi Prefecture Inside Toyota Central Research Laboratory, Inc. (72) Inventor Tadashi Ichikawa, Nagakute-cho, Aichi-gun, Aichi, Japan 41, Yokomichi 1 Inside Toyota Central Research Laboratory Co., Ltd. (56) References JP-A-62-150302 (JP, A) JP-A-1-129206 (JP, A) (58) Fields investigated (Int. Cl. 7) , DB name) G02B 6/12-6/14
Claims (5)
るクラッド層及び第２有機重合体材料よりなるコア層を
順次積層してなる平面状光導波路を製造するに当たり， 上記第１有機重合体材料又は第２有機重合体材料を溶媒
に溶解した原料溶液をそれぞれ準備し，まずクラッド層
用の原料溶液に基板を浸漬し，乾燥する第１積層工程を
行ない，次いで上記クラッド層を形成した基板をコア層
用の原料溶液に浸漬し，乾燥する第２積層工程を行う方
法であって， 上記第１積層工程及び第２積層工程においては，それぞ
れ上記浸漬を複数回行うと共に少なくとも１回は基板の
上下方向の反転を行ない，かつ上記乾燥時には基板にお
ける上記原料溶液の塗膜が鉛直方向に平行な状態にあっ
て，上記塗膜からの溶媒蒸発量を抑制しながら乾燥を行
ない， また上記浸漬に当っては，基板面を鉛直方向に平行に配
置したまま基板を原料溶液中に浸漬する ことを特徴とす
る平面状光導波路の製造方法。1. A method for manufacturing a planar optical waveguide, comprising: laminating a clad layer made of a first organic polymer material and a core layer made of a second organic polymer material on a surface of a substrate in order. A raw material solution prepared by dissolving a coalescing material or a second organic polymer material in a solvent was prepared, and a first laminating step of immersing the substrate in a raw material solution for a cladding layer and drying was performed, and then the cladding layer was formed. A method of performing a second laminating step of immersing a substrate in a raw material solution for a core layer and drying, wherein in the first laminating step and the second laminating step, the immersion is performed a plurality of times and at least once. The substrate is turned upside down, and at the time of drying, the coating of the raw material solution on the substrate is parallel to the vertical direction, and drying is performed while suppressing the amount of solvent evaporated from the coating.
No, and in the above immersion, arrange the substrate surface parallel to the vertical direction.
A method for manufacturing a planar optical waveguide, wherein a substrate is immersed in a raw material solution while being placed .
後に上記第２積層工程を行うに際して，コア層用原料溶
液中の溶媒が乾燥するまでの乾燥時間をｔ，第２積層工
程における乾燥温度における上記溶媒に対する上記第１
有機重合体材料の溶解速度をＡ，製造される平面状光導
波路の使用波長をλとしたとき，これらの間には，「Ａ
＜λ／ｔ」の条件が満足されるよう，上記第１有機重合
体材料と上記コア層用原料溶液中の溶媒との組合せを選
択することを特徴とする平面状光導波路の製造方法。2. The method according to claim 1, wherein when the second laminating step is performed after the first laminating step, the drying time until the solvent in the core layer raw material solution is dried is t, and the drying time in the second laminating step is The first for the solvent at temperature
When the dissolution rate of the organic polymer material is A and the used wavelength of the planar optical waveguide to be manufactured is λ, “A
A method for manufacturing a planar optical waveguide, comprising selecting a combination of the first organic polymer material and a solvent in the core layer raw material solution such that the condition of <λ / t ”is satisfied.
はフルオロアルキルアクリレートを用い，上記乾燥時に
おける塗膜からの溶媒蒸発量を抑制する手段として，上
記原料溶液中の溶媒と同一の溶媒の濃度σの蒸気を含む
ガス流により，塗膜面積１ｃｍ2当たり，ガス流速２σ
ＣＣＭ／ｃｍ2未満の雰囲気を用いることを特徴とする
平面状光導波路の製造方法。3. The method according to claim 1, wherein the first organic polymer material is a fluoroalkyl acrylate, and the same organic solvent as the solvent in the raw material solution is used as means for suppressing the evaporation of the solvent from the coating film during the drying. Gas flow rate of 2σ per 1 cm 2 of coating film area
A method for manufacturing a planar optical waveguide, comprising using an atmosphere of less than CCM / cm 2 .
体材料としてポリメチルメタクリレートを用い，その溶
媒としてメチルイソブチルケトン，酢酸ｎブチル，トル
エン，クロロベンゼンの１種又は２種以上を用い，乾燥
時においては乾燥用雰囲気ガス流中に混入した溶媒蒸気
濃度，及び乾燥用雰囲気のガス流速により乾燥後の膜厚
を制御することを特徴とする平面状光導波路の製造方
法。4. The method according to claim 1, wherein polymethyl methacrylate is used as the second organic polymer material, and one or more of methyl isobutyl ketone, n-butyl acetate, toluene and chlorobenzene are used as the solvent. A method of manufacturing a planar optical waveguide, wherein the thickness of a dried optical film is controlled by the concentration of a solvent vapor mixed into a gas flow for drying and the gas flow rate of the gas for drying.
ッド層，コア層を順次積層し，更に該コア層の上に第３
有機重合体材料よりなる上部クラッド層を積層してなる
平面状光導波路を製造するに当たり，上記第２積層工程
の後に上記第１積層工程と同様の操作の第３積層工程を
行う方法であって， 上記第２積層工程の後に上記第３積層工程を行うに際し
て，第３有機重合体材料用原料溶液中の溶媒が乾燥する
までの乾燥時間をｔ，第３積層工程における乾燥温度に
おける上記溶媒に対する上記第２有機重合体材料の溶解
速度をＡ，製造される平面状光導波路の使用波長をλと
したとき，これらの間には「Ａ＜λ／ｔ」の条件が満足
されるよう，上記第２有機重合体材料と上記上部クラッ
ド層用原料溶液中の溶媒との組み合わせを選択し， また上記浸漬に当っては，基板面を鉛直方向に平行に配
置したまま基板を原料溶液中に浸漬 することを特徴とす
る平面状光導波路の製造方法。5. The method according to claim 1, wherein a clad layer and a core layer are sequentially laminated on the substrate, and a third layer is formed on the core layer.
In producing a planar optical waveguide formed by laminating an upper clad layer made of an organic polymer material, a method of performing a third laminating step of the same operation as the first laminating step after the second laminating step is provided. When performing the third laminating step after the second laminating step, the drying time until the solvent in the raw material solution for the third organic polymer material dries is t, Assuming that the dissolution rate of the second organic polymer material is A and the wavelength used of the planar optical waveguide to be manufactured is λ, the above condition is satisfied so that “A <λ / t” is satisfied. selects a combination of a solvent for the raw material solution in the second organic polymeric material and the upper cladding layer, also hitting the above immersion, distribution parallel to the substrate surface in a vertical direction
A method for manufacturing a planar optical waveguide, wherein a substrate is immersed in a raw material solution while being placed .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14138493A JP3180859B2 (en) | 1993-05-19 | 1993-05-19 | Manufacturing method of planar optical waveguide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14138493A JP3180859B2 (en) | 1993-05-19 | 1993-05-19 | Manufacturing method of planar optical waveguide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06331845A JPH06331845A (en) | 1994-12-02 |
| JP3180859B2 true JP3180859B2 (en) | 2001-06-25 |
Family
ID=15290747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14138493A Expired - Fee Related JP3180859B2 (en) | 1993-05-19 | 1993-05-19 | Manufacturing method of planar optical waveguide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3180859B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003056371A1 (en) | 2001-12-26 | 2003-07-10 | Hitachi Chemical Co.,Ltd. | Method for manufacturing optical waveguide device and optical waveguide device |
| JP4004480B2 (en) * | 2003-03-12 | 2007-11-07 | 三洋電機株式会社 | Optical waveguide |
| US7561774B2 (en) | 2003-03-12 | 2009-07-14 | Sanyo Electric Co., Ltd. | Optical waveguide |
-
1993
- 1993-05-19 JP JP14138493A patent/JP3180859B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06331845A (en) | 1994-12-02 |
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