JP3131037B2 - Method for measuring refractive index of soft X-ray transparent material - Google Patents
Method for measuring refractive index of soft X-ray transparent materialInfo
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- JP3131037B2 JP3131037B2 JP04179868A JP17986892A JP3131037B2 JP 3131037 B2 JP3131037 B2 JP 3131037B2 JP 04179868 A JP04179868 A JP 04179868A JP 17986892 A JP17986892 A JP 17986892A JP 3131037 B2 JP3131037 B2 JP 3131037B2
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- pattern
- soft
- ray
- refractive index
- thin film
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Description
【０００１】[0001]
【産業上の利用分野】本発明は、波長１〜２００Åの軟
Ｘ線領域で使用されるＸ線光学材料の、軟Ｘ線透過性材
料屈折率測定方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for measuring a refractive index of a soft X-ray transmitting material of an X-ray optical material used in a soft X-ray region having a wavelength of 1 to 200 DEG.
【０００２】[0002]
【従来の技術】波長０．１〜２０ｎｍの軟Ｘ線は、Ｘ線
リソグラフィや材料分析等に使用されている。しかし、
上記波長の軟Ｘ線を容易に透過できる固体や液体は存在
せず、大気中であっても数ｍｍ〜数１０ｍｍの厚さで、
その強度が１％以下に減衰してしまう。2. Description of the Related Art Soft X-rays having a wavelength of 0.1 to 20 nm are used for X-ray lithography and material analysis. But,
There are no solids or liquids that can easily transmit soft X-rays of the above wavelength, and even in the air, with a thickness of several mm to several tens of mm,
The intensity is reduced to 1% or less.
【０００３】このような状況下で、軽元素単体、、例え
ば炭素、ベリリウム、シリコン等や、二酸化シリコン、
窒化シリコン、窒化ほう素、アルミナ、マイラ、ポリイ
ミド等の軽元素化合物からなる厚さ数μｍ以下の薄膜
は、数１０％以上の軟Ｘ線透過率が得られることから軟
Ｘ線透過性材料と呼ばれる。そしてこれらの薄膜は、Ｘ
線リソグラフィ用のＸ線マスクメンブレンや軟Ｘ線を透
過させる真空隔壁材料として使われている。Under these circumstances, light elements such as carbon, beryllium, silicon, etc., silicon dioxide,
A thin film having a thickness of several μm or less made of a light element compound such as silicon nitride, boron nitride, alumina, mylar, or polyimide can provide a soft X-ray transmittance of several tens of percent or more. Called. And these thin films are X
It is used as an X-ray mask membrane for X-ray lithography or as a vacuum partition wall material for transmitting soft X-rays.
【０００４】また、特願平２−１２０５５２に開示され
ているように、軟Ｘ線位相を反転させるパタンを有する
Ｘ線マスクを製作したり、発明者の先願による軟Ｘ線を
反転させて遮光部を得るＸ線マスク遮光体重金属パタン
欠落欠陥修正を行うためには、これらの軟Ｘ線透過性材
料が不可欠である。Further, as disclosed in Japanese Patent Application No. 2-120552, an X-ray mask having a pattern for inverting the soft X-ray phase is manufactured, or the soft X-ray according to the prior application of the inventor is inverted. These soft X-ray transmissive materials are indispensable for correcting the defect of the X-ray mask to obtain the light-shielding portion and the light-shielding metal pattern.
【０００５】また、上記波長帯の軟Ｘ線を用いて光学系
を作る場合には、位相を所定量変化させるために、１／
２波長板、１／４波長板等も必要になる。When an optical system is produced using soft X-rays in the above-mentioned wavelength band, 1 /
A two-wave plate, a quarter-wave plate and the like are also required.
【０００６】このように、上記波長帯の軟Ｘ線に対する
軟Ｘ線透過性材料は、極めて重要な用途を有している。
にもかかわらず、上記波長帯の軟Ｘ線に対する軟Ｘ線透
過性材料の屈折率を測定した結果の発表例は、従来非常
に少なく、H. J. Hagemann,W. Gudat, C. Kunz のディ
・イー・エス・ワイ−レポート、エス・アール−７４／
７（DESY-Report, SR-74／7）（１９７４）に掲載され
た論文に、炭素、マグネシウム、アルミニウム等につい
ての値が示されている等、極めて僅かにすぎない。As described above, the soft X-ray transmitting material for soft X-rays in the above wavelength band has a very important use.
Nevertheless, there have been very few published examples of the results of measuring the refractive index of a soft X-ray transmitting material for soft X-rays in the above-mentioned wavelength band, and DJ of HJ Hagemann, W. Gudat, C. Kunz・ S-Y Report, S-R 74 /
7 (DESY-Report, SR-74 / 7) (1974) shows only very small values, such as the values for carbon, magnesium, and aluminum.
【０００７】呼称として、軟Ｘ線透過性材料とはいって
も、僅か数μｍの厚さで透過率が数１０％〜数％になっ
てしまうような透過性であり、また、測定したい当該屈
折率は１に非常に近い値である。そのため、屈折量を直
接測定することは非常に難しく、これら軟Ｘ線透過性材
料の重要な光学定数である屈折率については、正確かつ
簡便に測定する方法がこれまで存在しなかった。As a name, even though a soft X-ray transmissive material is used, it has a transmittance such that the transmittance becomes several tens to several percent with a thickness of only a few μm. The rate is very close to unity. Therefore, it is very difficult to directly measure the amount of refraction, and there has been no method for accurately and simply measuring the refractive index, which is an important optical constant of these soft X-ray transmitting materials.
【０００８】可視ないしは遠紫外線領域の波長を有する
光に対しての光学材料の屈折率ｎを測定するには、従
来、図７に示すような方法が用いられていた。すなわ
ち、屈折率ｎ0が既知でｎより大きい光学材料１０上
に、屈折率ｎを測定したい光学材料１１を置き、入射光
１２を上記屈折率を測定した光学材料１１に対し水平に
照射して、上記屈折率ｎ0が既知でｎより大きい光学材
料１０からの出射光１３が観測される角度ｉを測定し、 ｎ＝√（ｎ0 2−sin2ｉ） なる関係式より、測定したい屈折率ｎを求める。これ
は、全反射の臨界角を利用することによって屈折率を測
定するものである。Conventionally, a method as shown in FIG. 7 has been used to measure the refractive index n of an optical material with respect to light having a wavelength in the visible or far ultraviolet range. That is, the optical material 11 whose refractive index n is to be measured is placed on the optical material 10 whose refractive index n 0 is known and is larger than n, and the incident light 12 is horizontally irradiated on the optical material 11 whose refractive index is measured. The angle i at which the emitted light 13 from the optical material 10 whose refractive index n 0 is known and is larger than n is measured, and the refraction to be measured is obtained from the relational expression of n = √ (n 0 2 −sin 2 i). Find the rate n. This measures the refractive index by utilizing the critical angle of total reflection.
【０００９】しかし、上記波長帯の軟Ｘ線に関しては、
測定したい軟Ｘ線透過性材料の屈折率ｎが、１よりわず
かに小さく１に非常に近い値であり、真空中や軽元素の
気体中等のように軟Ｘ線が減衰しにくい媒質の屈折率よ
り僅かに小さいだけの値であるため、全反射が起こる臨
界角はほとんど９０度に近い。また、可視光から遠紫外
光のように、上記波長帯の軟Ｘ線を透過する固体材料の
ブロックは存在しない。したがって、上記のような従来
の可視光から遠紫外光の波長の光に対して行われる方法
により、屈折率を測定することはできない。However, regarding soft X-rays in the above wavelength band,
The refractive index n of the soft X-ray transmitting material to be measured is a value slightly smaller than 1 and very close to 1, and the refractive index of a medium in which soft X-rays are hardly attenuated, such as in a vacuum or in a light element gas. Since it is only slightly smaller, the critical angle at which total reflection occurs is almost 90 degrees. Further, there is no block of a solid material that transmits soft X-rays in the above wavelength band, such as visible light to far ultraviolet light. Therefore, it is not possible to measure the refractive index by the above-described conventional method performed on light having a wavelength from visible light to far ultraviolet light.
【００１０】このように、軟Ｘ線に対する軟Ｘ線透過性
材料の屈折率を直接測定することが非常に困難であるた
め、上記の発表論文では、測定しやすい透過率や反射率
の測定値から、Kramers-Kronig の関係式を用いて屈折
率の値を算出している。As described above, it is very difficult to directly measure the refractive index of a soft X-ray transmitting material with respect to soft X-rays. Then, the value of the refractive index is calculated using the Kramers-Kronig relational expression.
【００１１】[0011]
【発明が解決しようとする課題】しかしながら従来技術
は、上記論文のように、透過率や反射率の値から屈折率
を算定する方法で間接的な測定であり、複雑な計算プロ
セスを経て屈折率を算定するため、確度、精度も低い。
例えば上記論文によると、炭素に対し、エネルギが５０
０ｅＶから８００ｅＶ（波長２．４１〜１．５５ｎｍ）
の軟Ｘ線屈折率は０．９９９、エネルギが１ＫｅＶから
３ＫｅＶまで（波長１．２４〜０．４１３ｎｍ）の軟Ｘ
線屈折率は１．０００である。特願平２−１２０５５２
に開示されているように、軟Ｘ線位相を反転させるパタ
ンを有するＸ線マスクを作る場合は、軟Ｘ線波長をλと
するとき、 （１−ｎ）ｄ＝ｍλπ （ｍは奇数の整数） となる軟Ｘ線透過性材料の厚さｄを求める必要がある
が、軟Ｘ線の波長に対し必要とする（１−ｎ）の値が、
上記のように有効数字１桁以下の精度でしか判らないの
では、軟Ｘ線透過性材料の厚さｄの決めようがない。However, in the prior art, as described in the above-mentioned paper, indirect measurement is performed by calculating the refractive index from the values of transmittance and reflectance, and the refractive index is calculated through a complicated calculation process. , The accuracy and precision are low.
For example, according to the above paper, energy is 50
0 eV to 800 eV (wavelength 2.41 to 1.55 nm)
Has a soft X-ray refractive index of 0.999 and an energy of 1 KeV to 3 KeV (wavelength 1.24 to 0.413 nm).
The linear refractive index is 1.000. Japanese Patent Application No. 2-120552
In the case of producing an X-ray mask having a pattern for inverting the soft X-ray phase, assuming that the soft X-ray wavelength is λ, (1-n) d = mλπ (m is an odd integer) It is necessary to find the thickness d of the soft X-ray transmitting material that satisfies the following equation.
As described above, the thickness d of the soft X-ray transmissive material cannot be determined without knowing the precision with one or less significant figures.
【００１２】本発明は、軟Ｘ線透過性材料の屈折率を、
直接かつ簡便にしかも高精度で求められる、軟Ｘ線透過
性材料の屈折率測定方法を得ることを目的とする。According to the present invention, the refractive index of the soft X-ray transmitting material is
It is an object of the present invention to provide a method for measuring the refractive index of a soft X-ray transparent material, which is required directly, simply and with high accuracy.
【００１３】[0013]
【課題を解決するための手段】上記目的は、軟Ｘ線透過
性材料の薄膜に、屈折率を測定したい軟Ｘ線透過性材料
の第１パタンを形成し、上記薄膜に近接または密着させ
て、軟Ｘ線に対して感光性を有する材料を付着した被露
光基板を配置し、上記被露光基板を露光したのち現像す
るとき、上記第１パタンの輪郭境界に相当する位置に、
上記軟Ｘ線に対して感光性を有する材料が感光されにく
いためにできる第２のパタンが、最も顕著に形成される
上記第１パタンの厚さまたは深さを求め、上記第１パタ
ンの厚さまたは深さと照射Ｘ線波長とから、屈折率を算
出することにより達成される。An object of the present invention is to form a first pattern of a soft X-ray permeable material whose refractive index is to be measured on a thin film of the soft X-ray permeable material, and bring the first pattern into close or close contact with the thin film. A substrate to be exposed to which a material having photosensitivity to soft X-rays is attached, and when the substrate to be exposed is exposed and then developed, at a position corresponding to a contour boundary of the first pattern,
The second pattern formed because the material having photosensitivity to the soft X-rays is hardly exposed is used to determine the thickness or depth of the first pattern that is most prominently formed, and the thickness of the first pattern is determined. This is achieved by calculating the refractive index from the depth or the depth and the irradiation X-ray wavelength.
【００１４】[0014]
【作用】本発明では、Ｘ線リソグラフィに使用されるＸ
線マスクメンブレンのような軟Ｘ線透過薄膜上に、屈折
率を測定したい軟Ｘ線透過性材料でパタンを形成する。
あるいは屈折率を測定したい軟Ｘ線透過性材料自体で、
上記Ｘ線マスクメンブレンのような軟Ｘ線透過薄膜を作
り、上記軟Ｘ線透過性薄膜上に上記軟Ｘ線透過性材料の
段差パタンを形成する。つぎに、ウェハ等の基板に軟Ｘ
線に対し感光性を有する材料を付着させて、上記基板と
上記軟Ｘ線透過薄膜または屈折率を測定したい軟Ｘ線透
過性材料自体の薄膜とを、近接または密着させ、単色ま
たは単色に近い特定波長の軟Ｘ線を照射する。According to the present invention, the X-ray used in X-ray lithography is used.
A pattern is formed on a soft X-ray transmitting thin film such as a line mask membrane using a soft X-ray transmitting material whose refractive index is to be measured.
Alternatively, the soft X-ray transmitting material itself whose refractive index is to be measured,
A soft X-ray transmitting thin film such as the X-ray mask membrane is formed, and a step pattern of the soft X-ray transmitting material is formed on the soft X-ray transmitting thin film. Next, a soft X is applied to a substrate such as a wafer.
A material having photosensitivity to light is adhered, and the substrate and the soft X-ray transmitting thin film or the thin film of the soft X-ray transmitting material itself whose refractive index is to be measured are brought into close or close contact with each other, so that the color is close to monochromatic or monochromatic. Irradiate soft X-rays of a specific wavelength.
【００１５】この時、上記軟Ｘ線透過性材料で形成した
パタンがある所とない所とで、透過した軟Ｘ線の位相が
丁度反転するようになった場合、上記軟Ｘ線透過性材料
で形成したパタンの境界では、上記パタンの内側と外側
で常に位相が逆なので、両側の軟Ｘ線が互いに打ち消し
合い、透過軟Ｘ線強度が非常に低くなる。屈折率を測定
したい軟Ｘ線透過性材料自体の薄膜上に段差パタンを形
成した場合も、上記段差パタンの深さによって、透過し
た軟Ｘ線の位相が丁度反転するようにした場合、段差パ
タンの境界では上記パタンの内側と外側とで常に位相が
逆なので、両側の軟Ｘ線が互いに打ち消し合い、透過軟
Ｘ線強度が非常に低くなる。このため、上記屈折率を測
定したい軟Ｘ線透過性材料で形成したパタンの境界、ま
たは屈折率を測定したい軟Ｘ線透過性材料自体の薄膜上
の段差パタンの境界には、上記軟Ｘ線の照射時に感光さ
れにくい部分を生じる。At this time, if the phase of the transmitted soft X-ray is just reversed between the place where the pattern made of the soft X-ray transparent material and the place where the pattern is formed, the soft X-ray transparent material Since the phases are always opposite between the inside and outside of the pattern at the boundary of the pattern formed by the above, the soft X-rays on both sides cancel each other, and the transmitted soft X-ray intensity becomes extremely low. Even when a step pattern is formed on the thin film of the soft X-ray transmitting material itself whose refractive index is to be measured, if the phase of the transmitted soft X-ray is just inverted by the depth of the step pattern, the step pattern Since the phases are always opposite between the inside and the outside of the above pattern at the boundary, soft X-rays on both sides cancel each other, and the transmitted soft X-ray intensity becomes extremely low. For this reason, the boundary of the pattern formed of the soft X-ray transmitting material whose refractive index is to be measured or the boundary of the step pattern on the thin film of the soft X-ray transmitting material itself whose refractive index is to be measured is When exposed to light, there is a portion that is hardly exposed.
【００１６】屈折率ｎを測定したい軟Ｘ線透過性材料で
形成したパタンの厚さ、または屈折率を測定したい軟Ｘ
線透過性材料自体の薄膜上の段差パタンの深さをｔ、屈
折率ｎ′の雰囲気中で照射する軟Ｘ線の波長をλとすれ
ば、上記屈折率ｎを測定したい軟Ｘ線透過性材料で形成
したパタンの厚さ、または屈折率を測定したい軟Ｘ線透
過性材料自体の薄膜上の段差パタンの深さによって生じ
る軟Ｘ線の位相変化φは、 φ＝２π（ｎ′−ｎ）ｔ／λ である。The thickness of a pattern formed of a soft X-ray transmitting material whose refractive index n is to be measured, or the soft X-ray whose refractive index is to be measured
Assuming that the depth of the step pattern on the thin film of the X-ray transmitting material itself is t and the wavelength of the soft X-ray irradiated in the atmosphere with the refractive index n 'is λ, the soft X-ray transmission The phase change φ of the soft X-ray caused by the thickness of the pattern formed of the material or the depth of the step pattern on the thin film of the soft X-ray transmitting material itself whose refractive index is to be measured is: φ = 2π (n′−n) ) T / λ.
【００１７】したがって、φ＝πとなる条件は、 ２（ｎ′−ｎ）ｔ＝λ になる。そのため、軟Ｘ線が減衰しにくい、例えば真空
中（ｎ′＝１）やヘリウム、水素等の軽元素気体中で、
任意の波長λの軟Ｘ線に対し上記ｔを変えて実験を行
い、上記屈折率を測定したい軟Ｘ線透過性材料で形成し
たパタンの境界、または屈折率を測定したい軟Ｘ線透過
性材料自体の薄膜上の段差パタンの境界に対応する位置
に、上記軟Ｘ線を照射した場合に感光されにくい部分を
最も顕著に生じるｔの値を求めれば、上式から測定した
い屈折率ｎを得ることができる。Therefore, the condition that φ = π is 2 (n′−n) t = λ. Therefore, soft X-rays are hardly attenuated, for example, in a vacuum (n '= 1) or in a light element gas such as helium or hydrogen.
An experiment is performed by changing the above-mentioned t for a soft X-ray having an arbitrary wavelength λ, and a boundary of a pattern formed of the soft X-ray transparent material whose refractive index is to be measured, or a soft X-ray transparent material whose refractive index is to be measured If the value of t that most remarkably generates a portion that is hardly exposed when the soft X-ray is irradiated at the position corresponding to the boundary of the step pattern on the thin film of itself is obtained, the refractive index n to be measured is obtained from the above equation. be able to.
【００１８】すなわち、屈折率ｎは透過率や反射率の値
を求めることもなく、実験で得られる屈折率ｎを、測定
した軟Ｘ線透過性材料で形成したパタンの厚さ、または
屈折率を測定したい軟Ｘ線透過性材料自体の薄膜上の段
差パタンの深さの特徴的な値ｔと照射軟Ｘ線の波長λと
から、上記のように簡単に算定することができる。That is, the refractive index n is obtained by measuring the refractive index n obtained in the experiment by the thickness of the pattern formed of the soft X-ray transparent material or the refractive index without calculating the values of the transmittance and the reflectance. Can be easily calculated from the characteristic value t of the depth of the step pattern on the thin film of the soft X-ray transmitting material itself, and the wavelength λ of the irradiated soft X-ray, as described above.
【００１９】[0019]
【実施例】つぎに本発明の実施例を図面とともに説明す
る。図１は本発明による軟Ｘ線透過性材料の屈折率測定
法の一実施例を示す原理説明図、図２は上記実施例の屈
折率測定のために、軟Ｘ線位相がπ変化する条件を求め
る方法の説明図、図３は上記屈折率測定のために、Ｘ線
透過性薄膜上に厚さを変えて形成した軟Ｘ線透過性材料
のパタンを有する試料の部分的拡大図、図４は上記屈折
率測定のために、Ｘ線透過性薄膜上に軟Ｘ線透過性材料
の段差パタンを形成した試料の部分的拡大図、図５は上
記屈折率測定のために、屈折率を測定したい軟Ｘ線透過
性材料で形成した自立する薄膜上に段差パタンを設けた
試料の部分的拡大図、図６は上記屈折率測定のために、
軟Ｘ線透過性材料の薄膜上に段差パタンを設けた試料の
部分的拡大図である。Next, an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a diagram illustrating the principle of an embodiment of a method for measuring the refractive index of a soft X-ray transmitting material according to the present invention. FIG. 2 is a graph showing the conditions under which the soft X-ray phase changes by π for the refractive index measurement in the above embodiment. FIG. 3 is a partially enlarged view of a sample having a pattern of a soft X-ray transmitting material formed by changing the thickness on an X-ray transmitting thin film for the above-mentioned refractive index measurement. 4 is a partially enlarged view of a sample in which a step pattern of a soft X-ray permeable material is formed on an X-ray permeable thin film for the above-mentioned refractive index measurement, and FIG. 5 shows the refractive index for the above-mentioned refractive index measurement. FIG. 6 is a partially enlarged view of a sample in which a step pattern is provided on a self-supporting thin film formed of a soft X-ray transmitting material to be measured, and FIG.
FIG. 4 is a partially enlarged view of a sample in which a step pattern is provided on a thin film of a soft X-ray transmitting material.
【００２０】図１に示すように、Ｘ線リソグラフィに使
用するＸ線マスクと同様に、基板１に軟Ｘ線透過性薄膜
２を張る。上記構造を形成するには、基板１の各面に上
記軟Ｘ線透過性薄膜２と上記基板１をエッチングする際
の保護膜となる薄膜３を堆積したのち、上記薄膜３の一
部をエッチングで除去し、残った薄膜３をエッチングマ
スクとして基板１の一部をエッチング除去して、軟Ｘ線
透過性薄膜２だけを残せばよい。４は上記基板１に付け
たフレームである。As shown in FIG. 1, a soft X-ray transparent thin film 2 is provided on a substrate 1 in the same manner as an X-ray mask used for X-ray lithography. In order to form the above structure, the soft X-ray transparent thin film 2 and the thin film 3 serving as a protective film for etching the substrate 1 are deposited on each surface of the substrate 1, and then a part of the thin film 3 is etched. Then, a part of the substrate 1 is removed by etching using the remaining thin film 3 as an etching mask to leave only the soft X-ray transparent thin film 2. Reference numeral 4 denotes a frame attached to the substrate 1.
【００２１】上記軟Ｘ線透過性薄膜２の上に、屈折率を
測定したい軟Ｘ線透過材料のパタン５を第１パタンとし
て形成しておく。軟Ｘ線透過材料の上記パタン５を形成
するには、あらかじめ上記軟Ｘ線透過材料を軟Ｘ線透過
性薄膜２上全面に堆積し、その上にリソグラフィ手段に
よってレジストでパタンを作り、上記レジストパタンを
エッチングマスクとして上記全面に堆積した軟Ｘ線透過
材料をエッチングすればよい。また、屈折率を測定した
い軟Ｘ線透過材料がレジストの場合には、直接上記レジ
ストのパタンをリソグラフィ手段によって作ることがで
きる。On the soft X-ray transmitting thin film 2, a pattern 5 of a soft X-ray transmitting material whose refractive index is to be measured is formed as a first pattern. In order to form the pattern 5 of the soft X-ray transmitting material, the soft X-ray transmitting material is previously deposited on the entire surface of the soft X-ray transmitting thin film 2, and a pattern is formed on the soft X-ray transmitting material by lithography using a resist. The soft X-ray transmitting material deposited on the entire surface may be etched using the pattern as an etching mask. If the soft X-ray transmitting material whose refractive index is to be measured is a resist, the pattern of the resist can be directly formed by lithography.
【００２２】上記のように形成した軟Ｘ線透過材料のパ
タン５に近接または密着させて、レジスト６を塗布した
被露光基板７を配置し、真空中または減圧したヘリウム
等の気体中で、波長λの軟Ｘ線８を上記パタン５を通し
て照射する。The exposed substrate 7 coated with the resist 6 is placed in close proximity or close contact with the pattern 5 of the soft X-ray transmitting material formed as described above, and the wavelength is set in a vacuum or a gas such as helium under reduced pressure. A soft X-ray 8 of λ is irradiated through the pattern 5.
【００２３】軟Ｘ線透過材料のパタン５の厚さをｔとし
屈折率をｎとするとき、上記のように ２（ｎ′−ｎ）ｔ＝λ の条件下では、軟Ｘ線透過材料のパタン５の境界に相当
する部分において、軟Ｘ線透過材料のパタン５の外部を
通過した軟Ｘ線と内部を透過した軟Ｘ線とが、軟Ｘ線透
過率に相当する強度比で位相が反転した状態で重なり打
ち消し合うため、軟Ｘ線８が照射されるにもかかわらず
強度が常に低くなり、上記レジスト６が他の部分に比し
て感光されにくい部分の第２のパタンを形成する。すな
わち、上記関係式を満たす条件下では、レジスト６に到
達する軟Ｘ線強度は図１（ｂ）に示すようになる。した
がって、適当な露光時間だけ露光して現像すると、レジ
スト６がポジレジストの場合は、図１（ｃ）に示される
ような断面形状の第２のパタンが転写される。Assuming that the thickness of the pattern 5 of the soft X-ray transmitting material is t and the refractive index is n, under the condition of 2 (n'-n) t = λ, the soft X-ray transmitting material In a portion corresponding to the boundary of the pattern 5, the soft X-rays that have passed through the outside of the pattern 5 of the soft X-ray transmitting material and the soft X-rays that have passed through the inside have a phase at an intensity ratio corresponding to the soft X-ray transmittance. Since they are overlapped and cancel each other in the inverted state, the intensity is always low despite the irradiation of the soft X-rays 8, and the resist 6 forms a second pattern of a portion that is less exposed to light than other portions. . That is, under the condition satisfying the above relational expression, the soft X-ray intensity reaching the resist 6 becomes as shown in FIG. Therefore, when the resist 6 is exposed and developed for an appropriate exposure time, when the resist 6 is a positive resist, a second pattern having a sectional shape as shown in FIG. 1C is transferred.
【００２４】軟Ｘ線透過材料のパタン５の厚さが上記条
件からずれるにしたがい、その輪郭境界に対応する位置
の軟Ｘ線強度は他の場所と同じ値に近づき、レジスト６
に転写される第２のパタンの断面形状は、典型的に図２
（ｃ）に示すようにそれぞれイ〜ホのごとく変化する。
したがって、軟Ｘ線透過材料のパタン５の厚さを各種類
に変えた試料を用意して、それぞれ露光現像し、図２に
おけるハに対応する、軟Ｘ線透過材料のパタン５の境界
に相当する所に、最も顕著な軟Ｘ線遮光部を生じたと見
られる条件を探せば、上記式を変形して屈折率ｎを ｎ＝ｎ′−λ／（２ｔ） より求めることができる。As the thickness of the pattern 5 of the soft X-ray transmitting material deviates from the above condition, the soft X-ray intensity at the position corresponding to the contour boundary approaches the same value as the other places, and the resist 6
The cross-sectional shape of the second pattern transferred to
As shown in (c), each of them changes like a to e.
Therefore, a sample in which the thickness of the pattern 5 of the soft X-ray transmitting material is changed to each type is prepared, exposed and developed, and corresponds to the boundary of the pattern 5 of the soft X-ray transmitting material corresponding to c in FIG. In this case, if the condition under which the most prominent soft X-ray light shielding portion appears is found, the above equation can be modified to find the refractive index n from n = n′−λ / (2t).
【００２５】真空雰囲気の中で露光を行えばｎ′＝１で
ある。したがって ｎ＝１−λ／（２ｔ） より屈折率ｎを求めればよい。If exposure is performed in a vacuum atmosphere, n '= 1. Therefore, the refractive index n may be obtained from n = 1−λ / (2t).
【００２６】直接測定するのは、屈折率ｎを測定したい
軟Ｘ線透過材料のパタン５の厚さｔだけであり、屈折率
ｎの測定精度は、上記軟Ｘ線透過材料のパタン５の厚さ
ｔの測定精度と、上記厚さｔの相違が上記レジスト６に
転写されるパタン形状の相違として検知できる限界とに
依存する。軟Ｘ線透過材料のパタン５の厚さｔがいくら
の時に、レジスト６のその輪郭境界に相当する所に最も
顕著なＸ線遮光部を生じたと見なすかは、光学顕微鏡や
電子顕微鏡によってレジスト６に転写されたパタンを上
方から観察すれば、比較的容易に判別できる。また、細
長い軟Ｘ線透過材料のパタン５を形成しておき、レジス
ト６のその輪郭境界に相当する所に、上記輪郭境界が転
写されたパタンを有する被露光基板７を、上記パタンの
長手方向に対して垂直に割り、断面の形状を電子顕微鏡
等によって観察すれば、より詳細で、かつ精確に判断す
ることができる。図３に示すように、厚さが色々に変化
した軟Ｘ線透過材料のパタン５を有する試料を用いれ
ば、少ない回数の露光や現像によって、位相反転条件を
見出すことも可能である。What is directly measured is only the thickness t of the pattern 5 of the soft X-ray transmitting material whose refractive index n is to be measured. The accuracy of the measurement of the refractive index n depends on the thickness of the pattern 5 of the soft X-ray transmitting material. The accuracy of the measurement of the thickness t depends on the limit of the difference in the thickness t that can be detected as the difference in the pattern shape transferred to the resist 6. When the thickness t of the pattern 5 of the soft X-ray transmitting material is considered to have caused the most prominent X-ray shielding portion at a position corresponding to the contour boundary of the resist 6, it is determined by an optical microscope or an electron microscope. Observing the pattern transferred to the above from above can be relatively easily discriminated. Further, a pattern 5 of an elongated soft X-ray transmitting material is formed, and a substrate to be exposed 7 having a pattern on which the contour boundary is transferred is placed in a position corresponding to the contour boundary of the resist 6 in the longitudinal direction of the pattern. If the cross section is cut perpendicularly and the shape of the cross section is observed with an electron microscope or the like, a more detailed and accurate determination can be made. As shown in FIG. 3, if a sample having a pattern 5 of a soft X-ray transmitting material having various thicknesses is used, a phase inversion condition can be found by a small number of exposures and developments.
【００２７】レジスト６に転写される上記第２のパタン
の寸法は、試料と上記被露光基板７との近接間隙によっ
て異なるので、最も顕著な軟Ｘ線遮光部を生じる軟Ｘ線
透過材料のパタン５の厚さ条件を見いだすには、上記軟
Ｘ線透過材料のパタン５の厚さをそれぞれ変えた各試料
について、同じ近接間隔を保証することが必要である
が、同じ試料上に厚さを各種類に変えた軟Ｘ線透過材料
のパタン５があれば、同じ近接間隙であることを保証し
やすい。Since the size of the second pattern to be transferred to the resist 6 varies depending on the close gap between the sample and the substrate 7 to be exposed, the pattern of the soft X-ray transmitting material that produces the most prominent soft X-ray shielding portion. In order to find the thickness condition of 5, it is necessary to guarantee the same close interval for each sample in which the thickness of the pattern 5 of the soft X-ray transmitting material is changed. If there is a pattern 5 of a soft X-ray transmitting material changed for each type, it is easy to guarantee that the gaps are the same.
【００２８】上記のように、同じ試料上に種々厚さを変
えた軟Ｘ線透過材料のパタン５を作るには、例えば軟Ｘ
線透過材料の膜上にレジストを塗布し、線幅を順次変化
させたパタンを光リソグラフィ等で形成して、レジスト
の残膜厚がパタンの線幅に応じて変化するようにし、上
記残膜厚が順次変化したレジストをエッチングマスクと
して、軟Ｘ線透過材料の膜を選択比が比較的小さい条件
でエッチングし、出来上りの軟Ｘ線透過材料のパタン５
の厚さが、エッチングマスクにしたレジストの残膜厚に
依存して順次変化するようにすればよい。As described above, to form a pattern 5 of a soft X-ray transmitting material having various thicknesses on the same sample, for example,
A resist is applied on the film of the line transmitting material, and a pattern in which the line width is sequentially changed is formed by photolithography or the like so that the remaining film thickness of the resist changes according to the line width of the pattern. The soft X-ray transmitting material film is etched under the condition that the selectivity is relatively small using the resist having the thickness that has been changed sequentially as an etching mask, and the completed soft X-ray transmitting material pattern 5 is formed.
May be sequentially changed depending on the remaining film thickness of the resist used as the etching mask.
【００２９】また、軟Ｘ線透過性材料の膜上にレジスト
を塗布し、紫外線レンズ縮小投影露光でパタンを形成す
る際に、焦点位置を色々に変化させてパタンを形成して
も、レジストの残膜厚を変化させることができる。上記
残膜厚が順次変化したレジストをエッチングマスクとし
て、軟Ｘ線透過性材料の膜を選択比が比較的小さい条件
でエッチングし、出来上りの軟Ｘ線透過材料のパタン５
の厚さが、エッチングマスクにしたレジストの残膜厚に
依存して、順次変化するようにすればよいことは明らか
である。Further, when a resist is applied on a film of a soft X-ray transmitting material and a pattern is formed by reducing projection exposure with an ultraviolet lens, the pattern is formed by changing the focal position in various ways, The remaining film thickness can be changed. The film of the soft X-ray transmissive material is etched under the condition that the selectivity is relatively small using the resist whose remaining film thickness is sequentially changed as an etching mask.
It is clear that the thickness may be changed sequentially depending on the remaining film thickness of the resist used as the etching mask.
【００３０】屈折率を測定したい軟Ｘ線透過性材料がレ
ジストの場合には、上記残膜厚が順次変化したレジスト
パタンを、そのまま軟Ｘ線透過材料のパタン５として用
いればよい。なお、屈折率ｎを測定したい軟Ｘ線透過材
料のパタン５は、図１〜図３に示すような残しパタンで
はなく、図４（ａ）に示すような抜きパタン、または図
４（ｂ）に示すような段差パタンでもよい。When the soft X-ray transmissive material whose refractive index is to be measured is a resist, the resist pattern whose remaining film thickness is sequentially changed may be used as it is as the pattern 5 of the soft X-ray transmissive material. The pattern 5 of the soft X-ray transmitting material whose refractive index n is to be measured is not a remaining pattern as shown in FIGS. 1 to 3 but a punching pattern as shown in FIG. 4 (a) or FIG. 4 (b). The step pattern shown in FIG.
【００３１】上記パタン５の厚さまたは深さを非常に細
かい間隔で変化させて、上記パタン５の境界に相当する
所に、最も顕著な軟Ｘ線遮光部を生じたと見られる条件
を探さなくても、上記パタン５の厚さまたは深さを適度
に変えて露光し、その時にできるパタンの厚さまたは深
さを測定して、パタン５の厚さと露光・現像によってで
きるパタンの厚さまたは深さとの関係を調べれば、最も
顕著に軟Ｘ線遮光部を生じるであろうと思えるパタン５
の厚さまたは深さを、推測することも可能である。By changing the thickness or depth of the pattern 5 at very small intervals, a condition that seems to have produced the most remarkable soft X-ray light shielding portion at a position corresponding to the boundary of the pattern 5 is not found. However, the exposure is performed by appropriately changing the thickness or depth of the pattern 5, and the thickness or depth of the pattern formed at that time is measured, and the thickness of the pattern 5 and the thickness or The pattern 5 that seems to produce the soft X-ray shielding part most remarkably when the relation with the depth is examined.
It is also possible to estimate the thickness or depth of the
【００３２】ところで以上の方法は、屈折率ｎを測定し
たい軟Ｘ線透過性材料自体で、図１の軟Ｘ線透過性薄膜
２のように、基板１に自立した薄膜を張ることができな
い任意の材料に対して適用できる。一方、屈折率ｎを測
定したい軟Ｘ線透過性材料自体で、図１に示す軟Ｘ線透
過性薄膜２のように基板１に自立した薄膜を形成できる
材料については、上記屈折率ｎを測定したい軟Ｘ線透過
性材料で基板１に張った薄膜９に、図５（ａ）、（ｂ）
や図６（ａ）、（ｂ）に示すような段差パタンを形成し
てもよい。また、図６（ａ）、（ｂ）の場合には、軟Ｘ
線透過性材料で基板１に張った薄膜を貫通するパタンを
設けることも可能である。図５および図６に示した場合
も、図１〜図４に示した実施例と同様に、段差境界部で
上記段差の深さｔが前に記した関係を満たす時に軟Ｘ線
が遮光され、レジスト６には段差境界部に対応した第２
のパタンを生じることが明らかである。By the way, the above-mentioned method is an arbitrary method in which the soft X-ray transmitting material itself whose refractive index n is to be measured cannot form a free-standing thin film on the substrate 1 like the soft X-ray transmitting thin film 2 in FIG. It can be applied to any material. On the other hand, for a soft X-ray permeable material itself whose refractive index n is to be measured, a material capable of forming a self-supporting thin film on the substrate 1 like the soft X-ray permeable thin film 2 shown in FIG. 5 (a) and 5 (b) are applied to a thin film 9 stretched on the substrate 1 with a soft X-ray transmitting material to be used.
Alternatively, a step pattern as shown in FIGS. 6A and 6B may be formed. 6 (a) and 6 (b), the soft X
It is also possible to provide a pattern penetrating a thin film stretched on the substrate 1 with a line transmitting material. In the case shown in FIGS. 5 and 6, similarly to the embodiment shown in FIGS. 1 to 4, when the depth t of the step satisfies the above-described relationship at the step boundary, the soft X-ray is shielded. The resist 6 has a second portion corresponding to the step boundary.
It is clear that the following pattern is produced.
【００３３】屈折率ｎを測定したい軟Ｘ線透過性材料の
薄膜９に形成した段差パタンの厚さまたは深さを、非常
に細かい間隔で変化させて、上記段差パタンの境界に相
当する所に、最も顕著な軟Ｘ線遮光部を生じたと見られ
る条件を探せば、その時の段差パタンの厚さまたは深さ
と軟Ｘ線の波長とから、屈折率ｎを求めることができ
る。The thickness or the depth of the step pattern formed on the thin film 9 of the soft X-ray transmitting material whose refractive index n is to be measured is changed at very small intervals so that it corresponds to the boundary of the step pattern. By searching for the condition that seems to have produced the most prominent soft X-ray light shielding portion, the refractive index n can be obtained from the thickness or depth of the step pattern at that time and the wavelength of the soft X-ray.
【００３４】また、上記薄膜９に形成した段差パタンの
厚さまたは深さを適度の間隔で変えて、露光・現像のの
ち上記境界に相当する位置にできる第２のパタンの厚さ
または深さを測定し、上記段差パタンの厚さまたは深さ
と露光・現像によってできる第２のパタンの厚さまたは
深さとの関係を調べれば、最も顕著に軟Ｘ線遮光部を生
じるであろうと思える段差パタンの厚さまたは深さを推
測することもできる。The thickness or depth of the second pattern formed at a position corresponding to the boundary after exposure and development by changing the thickness or depth of the step pattern formed on the thin film 9 at appropriate intervals. Is measured and the relationship between the thickness or depth of the step pattern and the thickness or depth of the second pattern formed by exposure / development is examined. Can be inferred.
【００３５】また、上記各実施例とも、屈折率ｎを測定
したい軟Ｘ線透過性材料のパタン５または上記軟Ｘ線透
過性材料の薄膜９上に設けた段差パタンは、Ｘ線透過性
薄膜２または上記軟Ｘ線透過性材料で基板１に張った薄
膜９の反対側の面に、形成してもよいことは言うまでも
ない。In each of the above embodiments, the step pattern provided on the pattern 5 of the soft X-ray transmitting material or the thin film 9 of the soft X-ray transmitting material whose refractive index n is to be measured is an X-ray transmitting thin film. Needless to say, it may be formed on the surface on the opposite side of the thin film 9 stretched on the substrate 1 with the soft X-ray transmitting material 2 or the soft X-ray transmitting material.
【００３６】屈折率ｎを測定したい軟Ｘ線透過材料のパ
タン５、または屈折率ｎを測定したい軟Ｘ線透過性材料
の薄膜９上に設けた段差パタンの大きさは任意でよい。
図１では屈折率ｎを測定したい軟Ｘ線透過材料のパタン
５の大きさが、軟Ｘ線透過性薄膜２の部分の大きさの数
分の１ないし１０分の１程度に描かれているが、説明図
としての見易さを考慮したに過ぎず、軟Ｘ線透過材料の
パタン５の大きさは任意でよい。The size of the pattern 5 of the soft X-ray transmitting material whose refractive index n is to be measured or the step pattern provided on the thin film 9 of the soft X-ray transmitting material whose refractive index n is to be measured may be arbitrary.
In FIG. 1, the size of the pattern 5 of the soft X-ray transmitting material whose refractive index n is to be measured is drawn to be about several tenths to one tenth of the size of the portion of the soft X-ray transmitting thin film 2. However, the size of the pattern 5 of the soft X-ray transmitting material may be arbitrarily set only in consideration of the legibility as an explanatory diagram.
【００３７】また、図３、図４（ｂ）、図５（ｂ）、図
６（ｂ）では、厚さまたは深さが異なるパタンを、ほぼ
等間隔でしかもパタンの大きさと同程度の間隔で並べて
描いてあるが、これらのパタン間隔も任意でよく、必ず
しも等間隔にする必要がないことは明らかである。In FIG. 3, FIG. 4 (b), FIG. 5 (b), and FIG. 6 (b), patterns having different thicknesses or depths are arranged at substantially equal intervals and at approximately the same size as the size of the pattern. Although these patterns are arranged side by side, it is clear that the pattern intervals may be arbitrarily set and need not always be equal.
【００３８】[0038]
【発明の効果】上記のように本発明による軟Ｘ線透過性
材料の屈折率測定方法は、軟Ｘ線透過性材料の薄膜に、
屈折率を測定したい軟Ｘ線透過性材料の第１パタンを形
成し、上記薄膜に近接または密着させて、軟Ｘ線に対し
て感光性を有する材料を付着した被露光基板を配置し、
上記被露光基板を露光したのち現像するとき、上記第１
パタンの輪郭境界に相当する位置に、上記軟Ｘ線に対し
て感光性を有する材料が感光されにくいためにできる第
２のパタンが、最も顕著に形成される上記第１パタンの
厚さまたは深さを求め、上記第１パタンの厚さまたは深
さと照射Ｘ線波長とから、屈折率を算出するものであっ
て、屈折率を測定したい軟Ｘ線透過性材料からなる任意
のパタンの厚さがいくらの時に、上記感光性を有する材
料の転写パタンが最も顕著にできるかを調べることで、
軟Ｘ線透過性材料の種類を問わず、透過率や反射率等か
ら間接的に求めるのではなく、簡便な方法で高精度に軟
Ｘ線透過性材料の屈折率を直接得ることができる。As described above, the method for measuring the refractive index of a soft X-ray permeable material according to the present invention can be applied to a thin film of a soft X-ray permeable material.
A first pattern of a soft X-ray transmitting material whose refractive index is to be measured is formed, and a substrate to be exposed to which a material having photosensitivity to soft X-rays is disposed in close proximity or close contact with the thin film,
When the exposed substrate is exposed and then developed, the first substrate is exposed.
At a position corresponding to the contour boundary of the pattern, a second pattern formed because the material having photosensitivity to the soft X-ray is hardly exposed is formed in the thickness or depth of the first pattern, which is most prominently formed. The refractive index is calculated from the thickness or depth of the first pattern and the irradiation X-ray wavelength, and the thickness of an arbitrary pattern made of a soft X-ray transmitting material whose refractive index is to be measured. By examining how much the transfer pattern of the photosensitive material can be most remarkable,
Regardless of the type of soft X-ray transmissive material, the refractive index of the soft X-ray transmissive material can be directly obtained with high accuracy by a simple method, rather than indirectly determining the refractive index of the soft X-ray transmissive material.
【００３９】また本発明を用いれば、上記特願平２−１
２０５５２に示されたＸ線透過材料の輪郭境界を遮光部
とするＸ線マスクのパタンや、あるいはＸ線マスク遮光
体重金属パタンの欠落欠陥を補修するための、上記Ｘ線
透過材料の欠陥補修パタンの厚さ、深さを、最適に調整
することができ、さらに、Ｘ線光学用として、１／４波
長板や１／２波長板等の位相制御部品を製作することが
可能である。According to the present invention, the above-mentioned Japanese Patent Application No.
The defect repair pattern of the X-ray transmitting material for repairing a defect of the X-ray mask pattern or the X-ray mask light shielding weight metal pattern shown in 20552 as a light-shielding portion with the contour boundary of the X-ray transmitting material. Can be optimally adjusted, and a phase control component such as a quarter-wave plate or a half-wave plate can be manufactured for X-ray optics.
【図１】本発明による軟Ｘ線透過性材料の屈折率測定方
法の一実施例を示す説明図で、（ａ）は測定方法の構成
を示す断面図、（ｂ）はＸ線透過材料の輪郭境界の軟Ｘ
線強度を示す図、（ｃ）は転写パタンの断面形状を示す
図である。FIG. 1 is an explanatory view showing one embodiment of a method for measuring the refractive index of a soft X-ray transmitting material according to the present invention, wherein (a) is a cross-sectional view showing the configuration of the measuring method, and (b) is a sectional view of the X-ray transmitting material. Soft X of contour boundary
FIG. 4C is a diagram illustrating a line intensity, and FIG. 5C is a diagram illustrating a cross-sectional shape of a transfer pattern.
【図２】屈折率測定のために軟Ｘ線位相がπ変化する条
件を求める方法の説明図で、（ａ）は軟Ｘ線透過性材料
のパタン厚さが異なる状態を示す図、（ｂ）は上記パタ
ン厚さに伴い輪郭境界の対応位置における軟Ｘ線強度を
示す図、（ｃ）はレジストに転写されたパタンの断面形
状をそれぞれ示す図である。FIGS. 2A and 2B are explanatory diagrams of a method of obtaining a condition in which a soft X-ray phase changes by π for measuring a refractive index; FIG. 2A is a diagram showing a state in which the pattern thickness of a soft X-ray transparent material is different; () Is a diagram showing the soft X-ray intensity at a position corresponding to the contour boundary according to the pattern thickness, and (c) is a diagram showing the cross-sectional shape of the pattern transferred to the resist.
【図３】軟Ｘ線透過性薄膜上に厚さを変えて形成した軟
Ｘ線透過材料のパタンを有する試料の部分的拡大図であ
る。FIG. 3 is a partially enlarged view of a sample having a pattern of a soft X-ray transmitting material formed on a soft X-ray transmitting thin film at a varied thickness.
【図４】軟Ｘ線透過性薄膜上の軟Ｘ線透過性材料の段差
パタンを形成した試料の部分的拡大図で、（ａ）は抜き
パタンを示す図、（ｂ）は段差パタンを示す図である。FIGS. 4A and 4B are partially enlarged views of a sample in which a step pattern of a soft X-ray permeable material is formed on a soft X-ray permeable thin film, where FIG. 4A shows a punch pattern and FIG. 4B shows a step pattern. FIG.
【図５】屈折率を測定したい軟Ｘ線透過性材料の薄膜上
に段差パタンを設けた試料の部分的拡大図で、（ａ）は
独立パタンを示す図、（ｂ）は段差パタンを示す図であ
る。5A and 5B are partially enlarged views of a sample in which a step pattern is provided on a thin film of a soft X-ray transmitting material whose refractive index is to be measured, wherein FIG. 5A shows an independent pattern and FIG. 5B shows a step pattern. FIG.
【図６】屈折率を測定したい軟Ｘ線透過性材料の薄膜に
段差パタンを設けた試料の部分的拡大図で、（ａ）は独
立パタンを示す図、（ｂ）は段差パタンを示す図であ
る。FIGS. 6A and 6B are partially enlarged views of a sample in which a step pattern is provided on a thin film of a soft X-ray transmitting material whose refractive index is to be measured, where FIG. 6A shows an independent pattern and FIG. 6B shows a step pattern; It is.
【図７】可視光から遠紫外線に対して用いてきた従来の
屈折率を求める方法を示す説明図である。FIG. 7 is an explanatory diagram showing a conventional method for obtaining a refractive index used for visible light to far ultraviolet light.
２ 軟Ｘ線透過性材料薄膜 ５ 第１パタン ６ レジスト ７ 被露光基板 ８ 軟Ｘ線 ９ 屈折率を測定したい軟Ｘ線透過材料の自立薄膜 2 Thin film of soft X-ray transmitting material 5 First pattern 6 Resist 7 Substrate to be exposed 8 Soft X-ray 9 Self-supporting thin film of soft X-ray transmitting material whose refractive index is to be measured
Claims (4)
したい軟Ｘ線透過性材料の第１パタンを形成し、上記薄
膜に近接または密着させて、軟Ｘ線に対して感光性を有
する材料を付着した被露光基板を配置し、上記被露光基
板を露光したのち現像するとき、上記第１パタンの輪郭
境界に相当する位置に、上記軟Ｘ線に対して感光性を有
する材料が感光されにくいためにできる第２のパタン
が、最も顕著に形成される上記第１パタンの厚さまたは
深さを求め、上記第１パタンの厚さまたは深さと照射Ｘ
線波長とから、屈折率を算出する軟Ｘ線透過性材料の屈
折率測定方法。A first pattern of a soft X-ray permeable material whose refractive index is to be measured is formed on a thin film of the soft X-ray permeable material, and the first pattern of the soft X-ray permeable material is brought into close proximity or close contact with the thin film to be exposed to soft X-rays When a substrate to be exposed to which a material having a property is adhered is disposed, and the substrate to be exposed is exposed and then developed, the substrate has photosensitivity to the soft X-ray at a position corresponding to a contour boundary of the first pattern. The second pattern formed because the material is hardly exposed to light determines the thickness or depth of the first pattern that is most prominently formed, and determines the thickness or depth of the first pattern and the irradiation X.
A method for measuring the refractive index of a soft X-ray transparent material, which calculates the refractive index from the line wavelength.
したい軟Ｘ線透過性材料の第１パタンを形成し、上記薄
膜に近接または密着させて、軟Ｘ線に対して感光性を有
する材料を付着した被露光基板を配置し、上記薄膜と上
記第１パタンを通し軟Ｘ線を照射して上記被露光基板を
露光現像し、上記第１パタンの輪郭境界に相当する位置
に、上記軟Ｘ線に対して感光性を有する材料が感光され
にくいためにできる第２パタンを得る第１工程と、上記
第２パタンの深さまたは高さを求める第２工程とによ
り、異なる膜厚の上記第１パタンに対応する上記第２パ
タンの高さまたは深さを求め、上記第１パタンの厚さま
たは深さおよび上記第２パタンの高さまたは深さの関係
と、上記照射Ｘ線波長とから、屈折率を算出する軟Ｘ線
透過性材料の屈折率測定方法。2. A method for forming a first pattern of a soft X-ray permeable material whose refractive index is to be measured on a thin film of the soft X-ray permeable material, and bringing the first pattern close to or in close contact with the thin film to expose the film to a soft X-ray. A substrate to be exposed to which a material having a property is attached is arranged, and the substrate to be exposed is exposed and developed by irradiating soft X-rays through the thin film and the first pattern, and a position corresponding to a contour boundary of the first pattern. In addition, the first step of obtaining a second pattern formed because the material having photosensitivity to the soft X-ray is hardly exposed to light is different from the second step of obtaining the depth or height of the second pattern. The height or depth of the second pattern corresponding to the first pattern of the film thickness is determined, the relationship between the thickness or depth of the first pattern and the height or depth of the second pattern, and the irradiation Calculate the refractive index from the X-ray wavelength Constant method.
膜に段差パタンを形成し、上記薄膜に近接または密接さ
せて、軟Ｘ線に対して感光性を有する材料を付着した被
露光基板を配置し、上記被露光基板を露光したのち現像
するとき、上記段差パタンの輪郭境界に相当する位置
に、上記軟Ｘ線に対して感光性を有する材料が感光され
にくいためにできるパタンが、最も顕著に形成される上
記段差パタンの厚さまたは深さを求め、上記段差パタン
の厚さまたは深さと照射Ｘ線波長とから、屈折率を算出
する軟Ｘ線透過性材料の屈折率測定方法。3. A light exposure method wherein a step pattern is formed on a thin film of a soft X-ray transmitting material whose refractive index is to be measured, and a material having photosensitivity to soft X-ray is adhered to the thin film close to or close to the thin film. When a substrate is arranged and the exposed substrate is exposed and then developed, a pattern formed at a position corresponding to the contour boundary of the step pattern because the material having photosensitivity to the soft X-ray is difficult to be exposed. Determining the thickness or depth of the most prominently formed step pattern and calculating the refractive index from the thickness or depth of the step pattern and the irradiation X-ray wavelength. Method.
膜に段差パタンを形成し、上記薄膜に近接または密接さ
せて、軟Ｘ線に対して感光性を有する材料を付着した被
露光基板を配置し、上記段差パタンを通して軟Ｘ線を照
射し、上記被露光基板を露光現像して、上記段差パタン
の輪郭境界に相当する位置に、上記軟Ｘ線に対して感光
性を有する材料が感光されにくいためにできるパタンを
得る第１工程と、上記パタンの深さまたは高さを求める
第２工程とにより、異なる膜厚の上記段差パタンに対応
する上記パタンの高さまたは深さを求め、上記段差パタ
ンの厚さまたは深さおよび上記パタンの高さまたは深さ
の関係と、上記照射Ｘ線波長とから、屈折率を算出する
軟Ｘ線透過性材料の屈折率測定方法。4. A light exposure method wherein a step pattern is formed on a thin film of a soft X-ray transmitting material whose refractive index is to be measured, and a material having photosensitivity to soft X-ray is adhered to the thin film in close proximity or close contact with the thin film. A substrate is arranged, soft X-rays are irradiated through the step pattern, the substrate to be exposed is exposed and developed, and a material having photosensitivity to the soft X-ray is provided at a position corresponding to a contour boundary of the step pattern. The first step of obtaining a pattern formed because the pattern is difficult to be exposed, and the second step of obtaining the depth or height of the pattern, the height or depth of the pattern corresponding to the step pattern of different film thickness A method for measuring the refractive index of a soft X-ray transmitting material, wherein the refractive index is calculated from the relationship between the thickness or depth of the step pattern and the height or depth of the pattern and the irradiation X-ray wavelength.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04179868A JP3131037B2 (en) | 1992-07-07 | 1992-07-07 | Method for measuring refractive index of soft X-ray transparent material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04179868A JP3131037B2 (en) | 1992-07-07 | 1992-07-07 | Method for measuring refractive index of soft X-ray transparent material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0627053A JPH0627053A (en) | 1994-02-04 |
| JP3131037B2 true JP3131037B2 (en) | 2001-01-31 |
Family
ID=16073318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04179868A Expired - Fee Related JP3131037B2 (en) | 1992-07-07 | 1992-07-07 | Method for measuring refractive index of soft X-ray transparent material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3131037B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7239058B2 (en) | 2020-03-17 | 2023-03-14 | 三菱電機株式会社 | Bearing retainer and air circuit breaker with this bearing retainer |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6434217B1 (en) * | 2000-10-10 | 2002-08-13 | Advanced Micro Devices, Inc. | System and method for analyzing layers using x-ray transmission |
-
1992
- 1992-07-07 JP JP04179868A patent/JP3131037B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7239058B2 (en) | 2020-03-17 | 2023-03-14 | 三菱電機株式会社 | Bearing retainer and air circuit breaker with this bearing retainer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0627053A (en) | 1994-02-04 |
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