JP3100086B2 - Spinner - Google Patents
SpinnerInfo
- Publication number
- JP3100086B2 JP3100086B2 JP03349384A JP34938491A JP3100086B2 JP 3100086 B2 JP3100086 B2 JP 3100086B2 JP 03349384 A JP03349384 A JP 03349384A JP 34938491 A JP34938491 A JP 34938491A JP 3100086 B2 JP3100086 B2 JP 3100086B2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- cover
- outer periphery
- tray
- drain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Coating Apparatus (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、液晶表示板などの基板
を高速で回転させながら処理液を塗布したり、基板を洗
浄したりするために用いるスピナーに関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spinner used for applying a processing liquid and cleaning a substrate while rotating a substrate such as a liquid crystal display panel at a high speed.
【０００２】[0002]
【従来の技術および発明の背景】液晶表示板などの表面
積の大きいガラス基板を回転盤の上に水平に保持しつつ
高速で回転し、回転中の基板の上表面に処理液を滴下
し、遠心力によって処理液を基板上面に拡散させること
により処理液を塗布するスピナーが公知である。ここに
処理液は、フォトエッチング用のフォトレジスト液等の
種々の塗布液だけでなく、洗浄液等であってもよい。2. Description of the Related Art A glass substrate having a large surface area, such as a liquid crystal display panel, is rotated at a high speed while being horizontally held on a turntable, and a processing liquid is dropped on the upper surface of the rotating substrate. 2. Description of the Related Art Spinners that apply a processing liquid by diffusing the processing liquid onto the upper surface of a substrate by force are known. Here, the processing liquid may be not only various coating liquids such as a photoresist liquid for photo etching, but also a cleaning liquid.
【０００３】従来のスピナーは、回転盤の上方を除き外
周および下方をカバーで覆い、このカバーの周縁下部付
近に環状の溝からなる集液路を形成し、この集液路に遠
心力で飛散する処理液を集めて排出している。またこの
カバーに排気口を設け、基板から蒸発あるいは飛散する
処理液をこの排気口から排気設備に吸引させている。[0003] In a conventional spinner, the outer periphery and lower part of the spinning disk are covered with a cover except for the upper part, and a liquid collecting path formed of an annular groove is formed near the lower edge of the cover, and the liquid collecting path is scattered by centrifugal force. The collected processing liquid is collected and discharged. Further, an exhaust port is provided in the cover, and the processing liquid evaporated or scattered from the substrate is sucked from the exhaust port to the exhaust equipment.
【０００４】ここに従来の装置は、排液口に接続された
排液管と、排気口に接続された排気管とを別々にカバー
に接続していた。一方処理液の変更時などにおいては、
カバーの内面を洗浄したりカバーを交換することが必要
になる。しかし従来のカバーには排液管や排気管が直接
接続されていたため、これらを着脱する必要があり、作
業性が悪いという問題があった。Here, in the conventional apparatus, a drain pipe connected to a drain port and an exhaust pipe connected to an exhaust port are separately connected to a cover. On the other hand, when changing the processing solution,
It is necessary to clean the inner surface of the cover or replace the cover. However, since the drain pipe and the exhaust pipe are directly connected to the conventional cover, they need to be attached and detached, and there is a problem that workability is poor.
【０００５】[0005]
【発明の目的】本発明はこのような事情に鑑みなされた
ものであり、処理液の変更などに伴って必要となるカバ
ーの着脱作業が容易になり、作業性を向上させることが
できるスピナーを提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and a spinner capable of improving the workability by facilitating the attachment and detachment work of a cover required when the processing solution is changed. The purpose is to provide.
【０００６】[0006]
【発明の構成】本発明によればこの目的は、上面に基板
を保持しつつ垂直な回転軸を中心として回転する回転盤
と、前記回転盤の上方を除く外周および下方を覆いその
内面がその周縁下部付近に形成した環状集液路に向って
傾斜する回転盤カバーと、前記回転盤カバーの少くとも
外周付近の下方を覆う受皿と、この受皿に設けられ前記
環状集液路の排液口から流下する排液を受けて外部へ排
出する排液受口と、前記受皿に設けられた排気受口と、
前記回転盤カバーの外周付近の排気口を前記排気受口に
気密かつ着脱可能に接続する排気接続管とを備えること
を特徴とするスピナーにより達成される。According to the present invention, it is an object of the present invention to provide a rotating disk which rotates around a vertical rotation axis while holding a substrate on an upper surface, and covers an outer periphery and a lower portion of the rotating disk except for an upper portion thereof, and has an inner surface thereof. A turntable cover inclined toward an annular liquid collecting passage formed near the lower peripheral edge, a receiving tray for covering at least a lower part near the outer periphery of the turntable cover, and a drain port of the annular liquid collecting passage provided in the receiving tray A drain receiving port for receiving the drain liquid flowing down from and discharging the liquid to the outside, and an exhaust receiving port provided in the tray,
The spinner is provided with an exhaust connection pipe that connects an exhaust port near the outer periphery of the turntable cover to the exhaust port in an airtight and detachable manner.
【０００７】[0007]
【実施例】図１は本発明の一実施例の側断面図、図２は
その平面図、図３は受皿の斜視図である。図１において
符号１０はベースフレーム、１２は電動モータである。
モータ１２はその軸１４が垂直となるようにベースフレ
ーム１０に保持されている。１６はこの軸１４に上方か
ら嵌挿された回転軸であり、この回転軸１６は軸受１８
を介して軸受支持フレーム２０に保持されている。1 is a side sectional view of an embodiment of the present invention, FIG. 2 is a plan view thereof, and FIG. 3 is a perspective view of a receiving tray. In FIG. 1, reference numeral 10 denotes a base frame, and 12 denotes an electric motor.
The motor 12 is held on the base frame 10 so that its axis 14 is vertical. Reference numeral 16 denotes a rotating shaft fitted into the shaft 14 from above.
And is held by the bearing support frame 20 via the
【０００８】回転軸１６の上端には回転盤２２が水平に
固定されている。この回転盤２２は図２に示すように四
角形に作られ、その四隅には、ガラス基板２４の隅付近
の下面に当接して支持する支持ピン２６と、基板２４の
四隅に係合する位置決めピン２８とが突設されている。A rotating disk 22 is horizontally fixed to the upper end of the rotating shaft 16. As shown in FIG. 2, the rotary disk 22 is formed in a quadrangular shape, and at four corners, a support pin 26 that contacts and supports a lower surface near a corner of the glass substrate 24 and a positioning pin that engages with the four corners of the substrate 24 28 are protruded.
【０００９】３６は回転盤２２を覆うカバーであり、図
示しないブラケットによりベースフレーム１０に保持さ
れている。このカバー３６は回転盤２２の下方および外
周を囲む下カバー３８と、この下カバー３８に上から取
付けられる上カバー４０とを有する。下カバー３８は中
心から外周に向ってなだらかに下降する傾斜面を持ち、
この傾斜面は周縁下部付近に位置する環状集液路４２に
つながっている。上カバー３８は中央部分に回転盤２２
よりも十分に大きい開口部４４を持ち、回転盤２２より
高い位置から外周に向って滑らかに下降して環状集液路
４２の上方に延出する。A cover 36 covers the turntable 22 and is held on the base frame 10 by a bracket (not shown). The cover 36 has a lower cover 38 surrounding the lower part and the outer periphery of the turntable 22, and an upper cover 40 attached to the lower cover 38 from above. The lower cover 38 has an inclined surface gently descending from the center toward the outer periphery,
This inclined surface is connected to an annular liquid collecting channel 42 located near the lower part of the peripheral edge. The upper cover 38 is provided at the center of the turntable 22.
It has an opening 44 that is sufficiently larger than that of the rotating disk 22 and smoothly descends toward the outer periphery from a position higher than the turntable 22 to extend above the annular liquid collecting passage 42.
【００１０】４６はベースフレーム１０に保持された受
皿である。この受皿４６は図３に示すように、中央の窓
および外周縁に上方へ向って起立するフランジを持ち、
ほぼ環状の皿型に作られている。この受皿４６には排液
受口４８が４カ所に設けられ、また排気受口５０が６カ
所に設けられている。Reference numeral 46 denotes a receiving tray held on the base frame 10. As shown in FIG. 3, the tray 46 has a central window and a flange that stands upward at the outer peripheral edge.
It is made in an almost circular dish shape. The receiving tray 46 is provided with drain outlets 48 at four locations and exhaust outlets 50 at six locations.
【００１１】排液受口４８は図１に示すように略ロート
状に作られ、ここには下カバー３８の環状集液路４２の
底に設けた排液口５２が臨んでいる。この排液受口４８
に流下した排液は排液槽５４に導かれる。As shown in FIG. 1, the drainage port 48 is formed in a substantially funnel shape, and a drainage port 52 provided at the bottom of the annular liquid collecting passage 42 of the lower cover 38 faces this. This drainage port 48
The drained liquid flowing down to the drain is led to a drain tank 54.
【００１２】排気受口５０はカバー３６の外径よりも外
側に位置し、下カバー３８の外周と排気接続管５６によ
り着脱可能に接続されている。すなわちこの排気接続管
５６は直角に折曲され、その一端が下カバー３８の外周
壁の排気口５８に固定され、その他端は接続締具６０を
手動操作することにより排気受口５０に気密に接続でき
るように作られている。この排気受口５０は図示しない
ダクトによって排気装置に吸引される。The exhaust port 50 is located outside the outer diameter of the cover 36 and is detachably connected to the outer periphery of the lower cover 38 by an exhaust connection pipe 56. That is, the exhaust connection pipe 56 is bent at a right angle, one end thereof is fixed to the exhaust port 58 on the outer peripheral wall of the lower cover 38, and the other end is airtightly connected to the exhaust port 50 by manually operating the connection fastener 60. It is made to be able to connect. The exhaust port 50 is sucked into an exhaust device by a duct (not shown).
【００１３】従ってロボットにより搬送された基板２４
を回転盤２２に載せて高速で回転させつつ、その回転中
心付近に処理液を滴下すれば、この処理液は遠心力によ
り基板２４の表面に速やかに拡散し、余分の処理液は基
板２４の外周方向に飛散する。この飛散した処理液はカ
バー３６によって環状集液路４２に集まり、さらに排液
口５２から受皿４６側の排液受口４８に流下し、排液槽
５４に導かれる。また一部の処理液は空気中に霧状に飛
散するが、この霧状の処理液は排気口５８から排気され
る。Therefore, the substrate 24 transferred by the robot
Is placed on the turntable 22 and rotated at a high speed, and the processing liquid is dropped near the center of rotation, the processing liquid is quickly diffused to the surface of the substrate 24 by centrifugal force, and the excess processing liquid is Scatters in the outer circumferential direction. The scattered processing liquid is collected by the cover 36 in the annular liquid collecting path 42, further flows down from the liquid discharging port 52 to the liquid discharging port 48 on the receiving tray 46 side, and is guided to the liquid discharging tank 54. A part of the processing liquid is scattered in the air in the form of mist, and the mist processing liquid is exhausted from the exhaust port 58.
【００１４】処理液交換時などにカバー３６を洗浄する
ためには、まず開口部４４から工具を入れて回転盤２２
を回転軸１６から上方へ取外す。そして排気接続管５６
の接続締具６０を緩めて排気受口５０から切り離し、さ
らにフレーム１０への固定を解放すれば、カバー３６は
全体を上方へ引き揚げて取外すことができる。カバー３
６の洗浄後は逆の順に取付ければよい。In order to clean the cover 36 at the time of exchanging the processing liquid or the like, first, a tool is inserted through the opening 44 and the rotating disk 22 is rotated.
Is removed from the rotating shaft 16 upward. And the exhaust connection pipe 56
If the connection fastener 60 is loosened and disconnected from the exhaust port 50, and the fixing to the frame 10 is released, the cover 36 can be pulled up entirely and removed. Cover 3
After the washing of No. 6, it may be installed in the reverse order.
【００１５】[0015]
【発明の効果】本発明は以上のように、回転盤の少くと
も下方および外周を覆うカバーの下方に受皿を配設し、
この受皿に設けた排液受口にカバー側の排液口が臨むよ
うに、また排気受口に排気接続管を着脱可能に接続する
ものであるから、洗浄などのためにカバーを取外す際に
排液系および排気系の配管の断続作業が不用あるいは極
めて簡単になり、カバーの着脱作業性が向上する効果が
得られる。As described above, according to the present invention, the saucer is disposed at least below the turntable and below the cover covering the outer periphery.
Since the drain port on the cover faces the drain port provided on this pan, and the exhaust connection pipe is detachably connected to the exhaust port, when removing the cover for cleaning etc. Intermittent work of drainage and exhaust system piping is unnecessary or extremely simple, and the effect of improving the workability of attaching and detaching the cover is obtained.
【図１】本発明の一実施例の側断面図FIG. 1 is a side sectional view of one embodiment of the present invention.
【図２】その平面図FIG. 2 is a plan view thereof.
【図３】受皿の斜視図FIG. 3 is a perspective view of a saucer.
１０ ベースフレーム １２ モータ １６ 回転軸 ２２ 回転盤 ２４ 基板 ３６ カバー ４２ 環状集液路 ４６ 受皿 ４８ 排液受口 ５０ 排気受口 ５２ 排液口 ５６ 排気接続管 ５８ 排気口 DESCRIPTION OF SYMBOLS 10 Base frame 12 Motor 16 Rotating shaft 22 Turntable 24 Substrate 36 Cover 42 Annular liquid collecting channel 46 Receiving tray 48 Drainage receiving port 50 Exhaust receiving port 52 Drainage port 56 Exhaust connection pipe 58 Exhaust port
フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) B05C 11/08 G09F 9/35 H01L 21/027 G03F 7/16 502 Continuation of the front page (58) Field surveyed (Int.Cl. 7 , DB name) B05C 11/08 G09F 9/35 H01L 21/027 G03F 7/16 502
Claims (1)
中心として回転する回転盤と、前記回転盤の上方を除く
外周および下方を覆いその内面がその周縁下部付近に形
成した環状集液路に向って傾斜する回転盤カバーと、前
記回転盤カバーの少くとも外周付近の下方を覆う受皿
と、この受皿に設けられ前記環状集液路の排液口から流
下する排液を受けて外部へ排出する排液受口と、前記受
皿に設けられた排気受口と、前記回転盤カバーの外周付
近の排気口を前記排気受口に気密かつ着脱可能に接続す
る排気接続管とを備えることを特徴とするスピナー。1. A rotating disk that rotates around a vertical rotation axis while holding a substrate on an upper surface, and an annular liquid collector that covers an outer periphery and a lower portion of the rotating disk except above and has an inner surface formed near a lower portion of a peripheral edge thereof. A turntable cover inclined toward a path, a tray for covering at least a portion near the outer periphery of the turntable cover, and a drain provided on the tray and flowing down from a drainage port of the annular liquid collecting passage to receive an external liquid. A drain outlet for discharging to the exhaust pan, an exhaust outlet provided in the tray, and an exhaust connection pipe for airtightly and detachably connecting an exhaust outlet near the outer periphery of the turntable cover to the exhaust outlet. A spinner characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03349384A JP3100086B2 (en) | 1991-12-09 | 1991-12-09 | Spinner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03349384A JP3100086B2 (en) | 1991-12-09 | 1991-12-09 | Spinner |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05154430A JPH05154430A (en) | 1993-06-22 |
| JP3100086B2 true JP3100086B2 (en) | 2000-10-16 |
Family
ID=18403395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03349384A Expired - Fee Related JP3100086B2 (en) | 1991-12-09 | 1991-12-09 | Spinner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3100086B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4543617B2 (en) | 2002-04-22 | 2010-09-15 | セイコーエプソン株式会社 | Active matrix substrate manufacturing method, electro-optical device manufacturing method, electronic device manufacturing method, active matrix substrate manufacturing device, electro-optical device manufacturing device, and electric device manufacturing device |
| JP3988676B2 (en) | 2003-05-01 | 2007-10-10 | セイコーエプソン株式会社 | Coating apparatus, thin film forming method, thin film forming apparatus, and semiconductor device manufacturing method |
-
1991
- 1991-12-09 JP JP03349384A patent/JP3100086B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05154430A (en) | 1993-06-22 |
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