JP3099441B2 - Supply method of special material gas - Google Patents
Supply method of special material gasInfo
- Publication number
- JP3099441B2 JP3099441B2 JP03198996A JP19899691A JP3099441B2 JP 3099441 B2 JP3099441 B2 JP 3099441B2 JP 03198996 A JP03198996 A JP 03198996A JP 19899691 A JP19899691 A JP 19899691A JP 3099441 B2 JP3099441 B2 JP 3099441B2
- Authority
- JP
- Japan
- Prior art keywords
- special material
- material gas
- gas
- storage
- clean room
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Filling Of Jars Or Cans And Processes For Cleaning And Sealing Jars (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Pipeline Systems (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は特殊材料ガスの供給方法
に関し、特に装置間のわたり配管における特殊材料ガス
の供給方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for supplying a special material gas, and more particularly, to a method for supplying a special material gas in piping between devices.
【０００２】[0002]
【従来の技術】従来の特殊材料ガスの供給方法は、図３
に示すように屋外の貯蔵庫３内に設置されたガスシリン
ダー１とシリンダーキャビネット２と半導体素子製造設
備５とを１／４インチ又は３／８インチ等のステンレス
製の特殊材料ガス配管６で接続されている。特に、危険
ポテンシャルの高い特殊材料ガス配管６では屋外の貯蔵
庫３とクリーンルーム１０間の渡り配管部でのガス漏洩
・大気拡散を防止するため特殊材料ガス配管６を塩化ビ
ニール又はステンレス製の配管６′中に施工し、シリン
ダーキャビネット２側での筐体排気で常にシリンダーキ
ャビネット２側に排気を行なっていた。又同様に、特殊
材料ガス配管６の継手又は溶接部のみを二重化する場合
もあった。2. Description of the Related Art FIG.
As shown in the figure, the gas cylinder 1, the cylinder cabinet 2, and the semiconductor element manufacturing equipment 5 installed in the outdoor storage 3 are connected by a special material gas pipe 6 made of stainless steel such as 1/4 inch or 3/8 inch. ing. In particular, in the special material gas pipe 6 having a high danger potential, the special material gas pipe 6 is made of a vinyl chloride or stainless steel pipe 6 ′ in order to prevent gas leakage and diffusion into the atmosphere between the outdoor storage 3 and the clean room 10. The inside of the cylinder cabinet 2 was always exhausted to the cylinder cabinet 2 side by exhausting the casing on the cylinder cabinet 2 side. Similarly, only the joint or the welded portion of the special material gas pipe 6 may be duplicated.
【０００３】又、特殊な場合として、液体窒素等の極低
温流体を送気する場合には、その送気配管表面に大気中
の水分が凝縮・結露するのを防止するため真空二重配管
として、真空を用いて極低温流体と大気を遮断する場合
もあった。[0003] As a special case, when a cryogenic fluid such as liquid nitrogen is supplied, a vacuum double pipe is used to prevent the condensation and dew condensation of atmospheric moisture on the surface of the supply pipe. In some cases, the cryogenic fluid and the atmosphere are shut off using a vacuum.
【０００４】[0004]
【発明が解決しようとする課題】この従来の特殊材料ガ
スの供給方法では、屋外貯蔵所とクリーンルーム間の渡
りの特殊材料ガス配管において外気温度（特に低温）の
影響を受け、液化ガス及び蒸気圧の低い特殊材料ガスを
半導体素子製造装置に送気する場合、外気温度の影響を
受ける部分において気体が液化したり、分解や組成変化
をおこしたりして、安定にガスが供給できないといった
問題があった。In this conventional method of supplying a special material gas, the liquefied gas and the vapor pressure are affected by the outside air temperature (especially low temperature) in the special material gas pipe between the outdoor storage and the clean room. When a special material gas with a low temperature is supplied to a semiconductor device manufacturing apparatus, there is a problem that the gas is liquefied or decomposed or changes its composition in a portion affected by the outside air temperature, so that the gas cannot be supplied stably. Was.
【０００５】又、真空二重配管は特殊材料ガス配管に対
して一対一の対応のために配管施工が難しく、真空設備
等が膨大で又コスト的にも高くなるといった問題があっ
た。[0005] In addition, the vacuum double piping has a problem in that it is difficult to construct the piping because of one-to-one correspondence with the special material gas piping, and the vacuum equipment and the like are enormous and the cost is high.
【０００６】[0006]
【課題を解決するための手段】本発明の特殊材料ガスの
供給方法は、屋外貯蔵庫とクリーンルーム間の渡りの数
本の特殊材料ガス配管を保温処置を施したステンレス製
ダクト内に貫通させかつ屋外貯蔵庫とクリーンルームは
それぞれ防火ダンパーにて区画し、クリーンルーム側よ
り差圧で温度が調節された（２５±４℃程度）空気をス
テンレス製ダクト内を通し、屋外貯蔵庫に供給する又屋
外貯蔵庫も空調機にて温度調節するが、この温度調節は
クリーンルーム室温よりも低く設定される。According to the present invention, there is provided a method for supplying a special material gas, wherein several special material gas pipes extending between an outdoor storage and a clean room are penetrated into a stainless steel duct which has been subjected to a heat treatment, and the special material gas is supplied outside. The storage room and the clean room are each separated by a fire damper, and the air whose temperature has been adjusted by the differential pressure from the clean room side (about 25 ± 4 ° C) passes through a stainless steel duct and is supplied to the outdoor storage room. The temperature is adjusted at a temperature lower than the room temperature of the clean room.
【０００７】温度設定はクリーンルームの温度に対し
て、屋外貯蔵庫は０〜５℃低い温度設定し、かつステン
レス製ダクト内もこの間の温度となる様に排気バランス
をとり風速を設定する。The temperature of the outdoor storage is set to be lower by 0 to 5 ° C. than the temperature of the clean room, and the air velocity is set by balancing the exhaust air so that the temperature in the stainless steel duct is also in the range.
【０００８】[0008]
【実施例】次に本発明について図面を参照して説明す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.
【０００９】図１は本発明の一実施例の断面図である。
この特殊材料ガスの供給では、まず、供給する特殊材料
ガスシリンダー１は、ガス供給性能（減圧弁、自動弁及
び各種インターロック）を備えたシリンダーキャビネッ
ト２内に装着される。このシリンダーキャビネット２
は、空調機で温調された屋外貯蔵庫３内に設置されてお
り、シリンダーキャビネット２は下方より屋外貯蔵庫３
内の空気を吸気し排気ダクトを通してスクラバー等の排
ガス処置装置内で処置される。FIG. 1 is a sectional view of one embodiment of the present invention.
In the supply of the special material gas, first, the special material gas cylinder 1 to be supplied is mounted in a cylinder cabinet 2 provided with gas supply performance (a pressure reducing valve, an automatic valve, and various interlocks). This cylinder cabinet 2
Is installed in an outdoor storage 3 controlled by an air conditioner.
The inside air is taken in and treated through an exhaust duct in an exhaust gas treatment device such as a scrubber.
【００１０】特殊材料ガスはガスシリンダー１から半導
体素子製造設備５へ特殊材料ガス配管６で送気される
が、この特殊材料ガス配管は保温ダクト４にて接続され
ている。この保温ダクトはそれぞれ防火ダンパー７が設
けられており、貯蔵庫３とクリーンルーム１０は区画で
きる様な構造である。通常は、クリーンルーム１０側よ
り差圧でクリーンルーム１０側の防火ダンパー７を介し
てクリーンルーム１０内の空調された空気（２５℃±４
℃）が保温ダクト４を通り貯蔵庫３へ供給される。尚貯
蔵庫３はクリーンルーム１０より低い温度で空調されて
いて、若干の温度勾配を持つ。The special material gas is sent from the gas cylinder 1 to the semiconductor device manufacturing equipment 5 by a special material gas pipe 6, which is connected by a heat retaining duct 4. Each of the heat retaining ducts is provided with a fire damper 7, and has a structure in which the storage 3 and the clean room 10 can be partitioned. Normally, the air conditioned in the clean room 10 (25 ° C. ± 4
° C) is supplied to the storage 3 through the heat retaining duct 4. The storage 3 is air-conditioned at a lower temperature than the clean room 10 and has a slight temperature gradient.
【００１１】万一の火災、ガス漏洩の場合は図示しない
センサーにて事故を検知し防火ダンパー７をそれぞれ動
作させ各々の部屋を遮断する。In the event of a fire or gas leak, an accident is detected by a sensor (not shown) and the fire dampers 7 are operated to shut off each room.
【００１２】尚、渡りのダクト４の他の例として図２に
示すように、防火ダンパー７をダクト４の主管部に設け
ても良い。As another example of the transition duct 4, as shown in FIG. 2, a fire damper 7 may be provided in the main pipe of the duct 4.
【００１３】[0013]
【発明の効果】以上説明したように、本発明は特殊材料
ガスの受け側から空調された空気を供給側へ送風するた
め、特殊材料ガスは常時一定温度に保たれ、かつ若干の
温度勾配を持つ様にしたので、特殊材料ガスは常に安定
に供給できるという結果を有する。As described above, according to the present invention, the conditioned air is blown from the receiving side of the special material gas to the supply side, so that the special material gas is always kept at a constant temperature and has a slight temperature gradient. As a result, the special material gas can always be supplied stably.
【図１】本発明の一実施例を示す断面図。FIG. 1 is a sectional view showing an embodiment of the present invention.
【図２】本発明の変更例を示す断面図。FIG. 2 is a sectional view showing a modification of the present invention.
【図３】従来の例を示す断面図。FIG. 3 is a sectional view showing a conventional example.
１ ガスシリンダー ２ シリンダーキャビネット ３ 貯蔵庫 ４ 保温ダクト ５ 半導体素子製造設備 ６ 特殊材料ガス配管 ７ 防火ダンパー １０ クリーンルーム DESCRIPTION OF SYMBOLS 1 Gas cylinder 2 Cylinder cabinet 3 Storage 4 Heat insulation duct 5 Semiconductor device manufacturing equipment 6 Special material gas piping 7 Fire damper 10 Clean room
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平２−156527（ＪＰ，Ａ) 特開 平２−122619（ＪＰ，Ａ) 特開 昭63−319291（ＪＰ，Ａ) 特開 平１−15373（ＪＰ，Ａ) 実開 平１−132900（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) B67C 3/00 - 3/34 F17C 13/00 - 13/12 F17D 1/02 - 1/075 H01L 21/205 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-2-156527 (JP, A) JP-A-2-122719 (JP, A) JP-A-63-319291 (JP, A) JP-A-1- 15373 (JP, A) JP-A 1-132900 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) B67C 3/00-3/34 F17C 13/00-13/12 F17D 1/02-1/075 H01L 21/205
Claims (4)
るガスシリンダーからクリーンルーム内に設けられた半
導体素子製造設備へ特殊材料ガス配管を介して特殊材料
ガスを供給するガス供給方法であって、前記特殊材料ガ
ス配管は一端が前記ガスシリンダーに接続され他端が前
記半導体素子製造設備に接続され、周囲を保温ダクトに
より覆われており、前記保温ダクトは前記貯蔵庫内部の
位置に設けられた第１の防火ダンパーと前記クリーンル
ーム内部の位置に設けられた第２の防火ダンパーとを有
し、前記特殊材料ガスを前記ガスシリンダーから前記ガ
ス配管を介して前記半導体素子製造装置に供給し、前記
クリーンルーム内の空気を前記第２の防火ダンパーを介
して前記保温ダクトを通し、前記第１の防火ダンパーを
介して前記貯蔵庫へ供給することを特徴とするガス供給
方法。1. A gas supply method for supplying a special material gas from a gas cylinder provided in a storage and storing a special material gas to a semiconductor device manufacturing facility provided in a clean room via a special material gas pipe. One end of the special material gas pipe is connected to the gas cylinder and the other end is connected to the semiconductor device manufacturing equipment, and the periphery is covered with a heat retaining duct, and the heat retaining duct is provided at a position inside the storage. And a second fire damper provided at a position inside the clean room, wherein the special material gas is supplied from the gas cylinder to the semiconductor device manufacturing apparatus via the gas pipe, and the clean room The air inside the storage tank is passed through the heat insulation duct through the second fire damper, and is stored in the storage via the first fire damper. Gas supply method and supplying.
ダンパーは、前記保温ダクトの主管部に設けられている
ことを特徴とする請求項１記載のガス供給方法。2. The gas supply method according to claim 1, wherein the first fire damper and the second fire damper are provided in a main pipe portion of the heat retaining duct.
よりも０乃至５℃低い温度に設定されていることを特徴
とする請求項１記載のガス供給方法。3. The gas supply method according to claim 1, wherein the temperature of the storage is set to 0 to 5 ° C. lower than the temperature of the clean room.
るガスシリンダーからクリーンルーム内に設けられた半
導体素子製造設備へ特殊材料ガス配管を介して特殊材料
ガスを供給するガス供給設備であって、前記特殊材料ガ
ス配管は一端が前記ガスシリンダーに接続され他端が前
記半導体素子製造設備に接続され、周囲を保温ダクトに
より覆われており、前記保温ダクトは前記貯蔵庫内部の
位置に設けられた第１の防火ダンパーと前記クリーンル
ーム内部の位置に設けられた第２の防火ダンパーとを有
することを特徴とするガス供給方法。4. A gas supply facility for supplying a special material gas via a special material gas pipe from a gas cylinder provided in a storage for storing a special material gas to a semiconductor device manufacturing facility provided in a clean room, One end of the special material gas pipe is connected to the gas cylinder and the other end is connected to the semiconductor device manufacturing equipment, and the periphery is covered with a heat retaining duct, and the heat retaining duct is provided at a position inside the storage. A gas supply method, comprising: a first fire damper and a second fire damper provided at a position inside the clean room.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03198996A JP3099441B2 (en) | 1991-08-08 | 1991-08-08 | Supply method of special material gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03198996A JP3099441B2 (en) | 1991-08-08 | 1991-08-08 | Supply method of special material gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0542990A JPH0542990A (en) | 1993-02-23 |
| JP3099441B2 true JP3099441B2 (en) | 2000-10-16 |
Family
ID=16400371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03198996A Expired - Fee Related JP3099441B2 (en) | 1991-08-08 | 1991-08-08 | Supply method of special material gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3099441B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6076359A (en) * | 1996-11-25 | 2000-06-20 | American Air Liquide Inc. | System and method for controlled delivery of liquified gases |
| JP5030615B2 (en) * | 2007-02-23 | 2012-09-19 | パナソニック株式会社 | Method and apparatus for detecting liquid leakage in double piping |
| JP6630649B2 (en) | 2016-09-16 | 2020-01-15 | 株式会社日立ハイテクノロジーズ | Plasma processing method |
| WO2021260869A1 (en) | 2020-06-25 | 2021-12-30 | 株式会社日立ハイテク | Vacuum process method |
| US20240047179A1 (en) * | 2021-05-27 | 2024-02-08 | Hitachi High-Tech Corporation | Plasma treatment apparatus |
-
1991
- 1991-08-08 JP JP03198996A patent/JP3099441B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0542990A (en) | 1993-02-23 |
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