JP3083881B2 - Surge protection element - Google Patents

Surge protection element

Info

Publication number
JP3083881B2
JP3083881B2 JP03211318A JP21131891A JP3083881B2 JP 3083881 B2 JP3083881 B2 JP 3083881B2 JP 03211318 A JP03211318 A JP 03211318A JP 21131891 A JP21131891 A JP 21131891A JP 3083881 B2 JP3083881 B2 JP 3083881B2
Authority
JP
Japan
Prior art keywords
semiconductor layer
exposed
semiconductor
layer
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP03211318A
Other languages
Japanese (ja)
Other versions
JPH0536979A (en
Inventor
鋼一 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shindengen Electric Manufacturing Co Ltd
Original Assignee
Shindengen Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shindengen Electric Manufacturing Co Ltd filed Critical Shindengen Electric Manufacturing Co Ltd
Priority to JP03211318A priority Critical patent/JP3083881B2/en
Publication of JPH0536979A publication Critical patent/JPH0536979A/en
Application granted granted Critical
Publication of JP3083881B2 publication Critical patent/JP3083881B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は通信回路などの弱電回路
のサージ防護に好適するサージ防護素子に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surge protection device suitable for surge protection of a light electric circuit such as a communication circuit.

【0002】[0002]

【従来の技術】通信回路などの弱電回路を正,負サージ
から保護するための手段として、小型安価であって動作
が高速なサージ防護素子、例えば図3(a)のように、
1 1 PN2 3 の5層からなり、図3(b)に示す
如き特性をもつVBO点弧の両方向サイリスタ型サージ防
護素子が知られている。この素子Zは図3(c)のよう
に通信回路などの被保護回路Gの線路L間に接続して使
用され、線路Lに侵入した正または負のサージ電圧S1
2 が、素子Zの耐圧VBOを越えたときターンオンして
素子Zに電流を流して、被保護回路Gに耐圧VBO以上の
電圧が印加されないようにする。また素子Zに流れる電
流が減少して素子Zの保持電流H を下廻ったとき、直
流電源電圧Eと線路抵抗Rにもとづく続流を遮断して通
常状態に復旧する動作を行う。
2. Description of the Related Art As a means for protecting a weak electric circuit such as a communication circuit from positive and negative surges, a surge protector which is small and inexpensive and operates at high speed, for example, as shown in FIG.
2. Description of the Related Art A bidirectional thyristor-type surge protection element with a VBO firing characteristic comprising five layers of P 1 N 1 PN 2 P 3 and having characteristics as shown in FIG. 3B is known. The element Z is used to connect between the lines L of the protected circuit G such as a communication circuit as in FIG. 3 (c), the line L a positive or negative surge voltage entering the S 1
When S 2 exceeds the withstand voltage V BO of the element Z, it is turned on and a current flows through the element Z so that a voltage higher than the withstand voltage V BO is not applied to the protected circuit G. Further when the current flowing to the element Z is Shitamawa' the holding current I H of the reduced element Z, performs an operation to restore the normal state by blocking the connection flow based on the DC power supply voltage E and the line resistance R.

【0003】[0003]

【発明が解決しようとする課題】ところでこのようなサ
ージ防護素子により、よりよいサージ防護を行うために
は、素子として次の条件を備えることが要求される。 耐圧VBOを直流電源電圧Eより大即ちVBO>Eの条
件を満足しながら、出来る限り小として防護能力の向上
を図る。 素子の保持電流IH を、IH >E/Rを満足しなが
らできる限り大として遮断能力の向上を図る。 サージ電流耐量が大きい。 被保護回路Gの通信性能を悪化を招かないようにす
るため、図3(c)のように線路L間に挿入される素子
のもつ静電容量Cを極力小にする。 素子Zの耐圧VBOは、図3(a)の接合J2 または
3 の逆方向耐圧をVB 、構成トランジスタN1 PN2
の電流増幅率をαとしたとき、耐圧V BO BO=VB (1−α)1 n ………(1) ただしn:2〜6 によって定まる。このためサージ電圧の立上り速度dV
/dtが大になると、サージ印加時の動作開始電圧が耐
圧VBOによって決定されず、VBOより高い電圧VCL外1
B となる。従ってよい防護能力をもたせるためVBO
CLに関係を満足させる。 ことが要求される。しかし例えば周知のように耐圧VBO
を小にすると、逆に素子Zのもつ静電容量Cは大になる
など、上記各条件の間に素子の設計上厳しいトレードオ
フの関係があり、従来の両方向サイリスタの構造によっ
ては上記の各条件を同時に満足させることは容易ではな
い。
The [0005] Incidentally Such surge protection device, in order to make better surge-proof protection is required to be provided with the following conditions as an element. The withstand voltage V BO is higher than the DC power supply voltage E, that is, while satisfying the condition of V BO > E, and the protection capability is improved as small as possible. The holding current I H of the element is made as large as possible while satisfying I H > E / R to improve the breaking capability. Large surge current capability. To avoid incurring deterioration communication performance of the protected circuit G, as much as possible the small capacitance C with the element to be inserted between the line L as shown in FIG. 3 (c). The breakdown voltage V BO of the element Z is such that the reverse breakdown voltage of the junction J 2 or J 3 in FIG. 3A is V B , and the constituent transistors N 1 PN 2
When the current amplification factor is α , the breakdown voltage V BO is determined by V BO = V B (1−α) 1 n (1) where n: 2 to 6. Therefore, the surge voltage rise speed dV
When / dt becomes large, the operation start voltage at the time of applying a surge is not determined by the breakdown voltage V BO , and the voltage outside the voltage V CL higher than V BO
The V B. Therefore, V BO =
Satisfy the relationship with V CL . Is required. However, for example, as is well known, the withstand voltage V BO
Is small, conversely, the capacitance C of the element Z is large, and there is a strict trade-off relationship in the design of the element between the above conditions, and depending on the structure of the conventional bidirectional thyristor, It is not easy to satisfy the conditions at the same time.

【外1】 [Outside 1]

【0004】[0004]

【発明の目的】本発明は上記〜の要求のうち、特に
耐圧(VBO)=動作電圧VCLの実現と、保持電流IH
増大の実現を図って防護能力と遮断能力を前記従来の両
方向サイリスタ型サージ防護素子より向上させた、サー
ジ防護素子の提示を目的とするものである。
It is an object of the present invention to improve the protection capability and the interruption capability by realizing the breakdown voltage (V BO ) = operating voltage V CL and realizing an increase in the holding current I H among the above requirements. It is an object of the present invention to provide a surge protection element which is improved over a two-way thyristor type surge protection element.

【0005】[0005]

【課題を解決するための手段】本発明の目的は次の手段
により達成される。即ち 図1(a)に示すように正
サージS1 に対してそれぞれ順方向となるダイオードD
1 と一方向サイリスタTとダイオードD2 の直列回路か
らなり、正サージによる電流を線路接続端子t1 からt
2 の一方向に流しうる回路と、負サージに対してそれぞ
れ順方向となるダイオードD3 と前記一方向サイリスタ
TとダイオードD4 の直列回路からなり、負サージによ
る電流を線路接続端子t2 からt1 の一方向に流す回路
構成とする。そしてこれにより正または負サージ印加時
一方向サイリスタTに常にD1 ,D2 およびD3 ,D4
のそれぞれ2個のダイオードが直列に入るようにして、
それぞれのダイオードの逆方向耐圧により一方向サイリ
スタTが、逆方向耐圧をもつのを不要とする。 ダイ
オードD1 ,D2 およびD3 ,D4 により逆方向耐圧を
負担させる上記の回路構成から、一方向サイリスタT
を、図1(b)のようにP1 2 34 の4層からな
り、そのN2 層とP3 層の一部がP1 層とN4 層を貫通
して表裏面に露呈し、かつこれらの露呈部分がP1 層と
4 層と共に、金属電極T1 ,T2 により短絡した逆導
通型構成とする。そして以下に説明する本発明一方向
サイリスタの作用説明から明らかなように、一方向サイ
リスタTの降伏が接合J2 の単なる降伏、即ち接合J2
の降伏電圧VB を越えたとき始まるようにして、前記従
来素子におけるVBO<VCLの関係を打破し、また逆方向
耐圧が不要であること、即ち逆導通でよいことから、表
裏面にショートゲート構造F,Hの形成を可能とし、こ
れにより保持電流の増大を図りうるようにして目的を達
成したものである。
The object of the present invention is achieved by the following means. Diode D That made respectively forward direction with respect to the positive surge S 1 as shown in FIG. 1 (a)
Consist of a series circuit of the one-way thyristor T and a diode D 2, t the current due to the positive surge from the line connecting terminal t 1
2, a circuit that can flow in one direction, a diode D 3 that becomes forward with respect to the negative surge, and a series circuit of the one-way thyristor T and the diode D 4 , and a current due to the negative surge is transmitted from the line connection terminal t 2. a circuit configuration to flow in one direction of t 1. Thus, when a positive or negative surge is applied, the one-way thyristor T always has D 1 , D 2 and D 3 , D 4
So that each two diodes are in series,
The reverse breakdown voltage of each diode eliminates the need for the unidirectional thyristor T to have a reverse breakdown voltage. From the above circuit configuration in which the diodes D 1 and D 2 and D 3 and D 4 bear the reverse breakdown voltage, the one-way thyristor T
Is composed of four layers of P 1 N 2 P 3 N 4 as shown in FIG. 1 (b), and the N 2 layer and a part of the P 3 layer penetrate the P 1 layer and the N 4 layer and are formed on the front and back surfaces. A reverse conduction type in which the exposed portions are short-circuited by the metal electrodes T 1 and T 2 together with the P 1 layer and the N 4 layer. And as is clear from the action description of one-way thyristor of the present invention described below, the yield of the one-way thyristor T is simply a breakdown of the junction J 2, i.e. the junction J 2
As starting when exceeding the breakdown voltage V B, the break down the relationship V BO <V CL in the conventional device, also possible reverse breakdown voltage is not necessary, i.e. since it is reverse conducting, on the front and back surfaces The object is achieved by enabling the formation of the short gate structures F and H, thereby increasing the holding current.

【0006】そして、本発明のサージ防護素子の具体的
な構成は、図2に示すように、第1の導電型を有する第
1半導体層と、第2の導電型を有する第2半導体層と、
第1の導電型を有する第3半導体層と、第2の導電型を
有する第4半導体層とが順次に積層された4層構造を有
し、前記第2半導体層の一部が前記第1半導体層を分離
することなく一体形成が維持されるように複数箇所にお
いて該第1半導体層を突き抜けて一方の面に露呈させる
と共に、前記第3半導体層の一部が前記第4半導体層を
分離することなく一体形成が維持されるように複数箇所
において該第4半導体層を突き抜けて他方の面に露呈さ
せ、前記一方の面に露呈された複数個の前記第2半導体
層と前記第1半導体層とを接続した一方の電極と、前記
他方の面に露呈された複数個の前記第3半導体層と前記
第4半導体層とを接続した一方の電極とを備え、かつ前
記一方の電極と接続された複数個の前記第2半導体層と
前記他方の電極と接続された複数個の前記第3半導体層
とは、前記一方の面と他方の面に直交する方向で相互に
重ならないように構成されたものである。
[0006] The specific example of the surge protection element of the present invention is as follows.
The configuration shown in FIG. 2 has a first conductivity type.
One semiconductor layer, a second semiconductor layer having a second conductivity type,
A third semiconductor layer having a first conductivity type;
Has a four-layer structure in which a fourth semiconductor layer is sequentially laminated.
And a part of the second semiconductor layer separates the first semiconductor layer.
At multiple locations so that the integral formation is maintained without
Through the first semiconductor layer to expose it on one surface
In addition, a part of the third semiconductor layer forms the fourth semiconductor layer.
Multiple locations to maintain unitary formation without separation
Pierces through the fourth semiconductor layer and is exposed on the other surface.
The plurality of second semiconductors exposed on the one surface.
One electrode connecting the layer and the first semiconductor layer,
A plurality of the third semiconductor layers exposed on the other surface;
And one electrode connected to the fourth semiconductor layer.
A plurality of the second semiconductor layers connected to the one electrode;
A plurality of the third semiconductor layers connected to the other electrode
Are mutually perpendicular in a direction perpendicular to the one surface and the other surface.
It is configured not to overlap.

【0007】[0007]

【作用】本発明一方向サイリスタは次のように動作す
る。即ち図1(a)においてダイオードD1 ,D2 を介
して一方向サイリスタTの金属電極T1 からT2 の方向
に電圧が印加されると、図1(b)に示す一方向サイリ
スタTの正方向接合J2は逆バイアスとなり、電圧が接
合J2 の降伏電圧VB に達すると電流I1 ,I2が流れ
始める。これらの電流成分はエミッタ直下のN2 層とP
3 層の実効横方向抵抗RN P により、N2 層とP3
にそれぞれRN 1 ,RP 2 の電圧降下を生じさせ、
これらの電圧降下は接合J1 を左端に行くに従い正バイ
アスし、また接合J3 の右端に行くに従い正バイアスす
る。そしてこのバイアス電圧が接合J2 3 の正方向立
上り電圧VD 程度になると、接合J1 とJ3 からそれぞ
れ正孔と電子の注入が行われてオン状態に移行する。一
方図1(a)においてダイオードD3 4 を介して一方
向サイリスタTの金属電極T2 からT1 の方向の電圧が
印加されると、図1(b)の一方向サイリスタTは接合
2 の正方向特性を示すのみである。また更にオン状態
からオフ状態に移行する場合には、電流I1 ,I2 が減
少して接合J1 ,J3 の注入が停止することによりター
ンオフする。従ってこの一方向サイリスタの特性は図1
(c)のようになる。以上から本発明の一方向サイリス
タTの降伏は単に、PN接合J2 の降伏電圧VB によっ
て定まるため、前記した従来の素子のように耐圧VBO
動作電圧VCLとの間に差を生ずることがなくなり、前記
BO<VCLの問題は解決される。またターンオフは電流
1 ,I2
The one-way thyristor of the present invention operates as follows. That is, when a voltage is applied in the direction from the metal electrode T 1 to T 2 of the one-way thyristor T via the diodes D 1 and D 2 in FIG. 1A, the one-way thyristor T shown in FIG. forward junction J 2 becomes reverse biased, current I 1 when the voltage reaches the breakdown voltage V B of the junction J 2, I 2 starts to flow. These current components are caused by the N 2 layer just below the emitter and the P 2
The three layers of effective lateral resistance R N R P cause a voltage drop of R NI 1 and R P I 2 in the N 2 layer and the P 3 layer, respectively.
These voltage drops are positively biased as it goes the junction J 1 to the left end, and also a positive bias as it goes to the right end of the joint J 3. When the bias voltage becomes about the positive rise voltage V D of the junction J 2 J 3 , holes and electrons are injected from the junctions J 1 and J 3 , respectively, and the junction is turned on. On the other hand, if FIGS. 1 (a) direction of the voltage of the diode D 3 D 4 T 1 from the metal electrode T 2 of the unidirectional thyristor T via the in is applied, one-way thyristor T is bonded J shown in FIG. 1 (b) It only shows a positive direction characteristic of 2 . When the state further shifts from the on state to the off state, the currents I 1 and I 2 decrease, and the injection of the junctions J 1 and J 3 is stopped, thereby turning off. Therefore, the characteristics of this one-way thyristor are shown in FIG.
(C). Simply yield unidirectional thyristors T of the present invention from above, because determined by the breakdown voltage V B of the PN junction J 2, occurs a difference between the breakdown voltage V BO and the operating voltage V CL as in the conventional device described above And the problem of V BO <V CL is solved. In turn-off, current 1 1 and I 2

【数1】 程度以下になったとき、接合J1 ,J3 から正孔および
電子の注入が止むので、本発明で保持電流H を増加す
ることができ、しかも本発明一方向サイリスタでは両
面ショートゲート構造であるので、保持電流IH の増大
効果は大きい。またサージ電流耐量はショートゲート部
以外の有効面積できまるから、ショートゲート部の面積
を小さくすればサージ電流耐量に対する影響はない。次
に本発明の一方向サイリスタの実施例について説明す
る。
(Equation 1) When the temperature falls below the threshold, injection of holes and electrons from the junctions J 1 and J 3 stops, so that the holding current I H can be increased in the present invention, and the unidirectional thyristor of the present invention has a double-sided short gate structure. Therefore, the effect of increasing the holding current I H is large. Also, the surge current tolerance is determined by the effective area other than the short gate portion. Therefore, if the area of the short gate portion is reduced, the surge current tolerance is not affected. Next, an embodiment of the one-way thyristor of the present invention will be described.

【0008】[0008]

【実施例】図2(a)(b)は拡散法により製造された
本発明一方向サイリスタの一実施例を示す平面図およ
びそのA−A’部断面図である。この例は表面の中心部
と外周4角との5箇所においてN2 層の一部をP1 層を
貫通させて表面に露呈させ、この露呈N2 層とP1 層と
を金属電極T1 により短絡し、裏面の外周辺の4箇所
おいてP3 層の1部をN4 層を貫通させて裏面に露呈さ
せ、P3 層の露呈部とN4 層とを金属電極T2 により短
絡したものである。この場合表裏面におけるショートゲ
ート構造F,Hの数が多い程保持電流IHが大になるこ
とは明らかであり、また表裏面におけるショートゲート
構造間の距離が小さい程保持電流IH の増大効果が大に
なることも明らかである。また安定なターンオンを実現
するためには、最初中央部でターンオンが行われ、これ
が次第に周辺全面に拡がるようにすることが望まれしい
が、それには図2(a)中の距離L1 とL2 2 ≧2
1 にするのがよい。また以上ではP1 2 3 4
導電型について説明したが、導電型を逆にしてもよいこ
とは云うまでもない。
DETAILED DESCRIPTION FIG. 2 (a) (b) is a plan view and a A-A 'sectional view showing an embodiment of a one-way thyristor of the present invention produced by diffusion. This example is in the center of the surface
A portion of N 2 layer is exposed on the surface by penetrating the P 1 layer, and the exposed N 2 layer and the P 1 layer shorted by metal electrodes T 1 in the five points between the outer square and the back surface outside that a portion of <br/> Oite P 3 layers at four positions near by penetrating the N 4 layer is exposed on the back surface was a exposed portion of the P 3 layer and N 4 layer and short-circuited by the metal electrode T 2 It is. In this case, it is clear that the larger the number of the short gate structures F and H on the front and back surfaces, the larger the holding current I H , and the shorter the distance between the short gate structures on the front and back surfaces, the larger the holding current I H. It is also clear that is large. In order to realize a stable turn-on, turn-on is performed by the first central part, which gradually Shi is desirable to make spreads around the entire surface bur, it is a distance L 1 in FIG. 2 (a) L 2 is L 2 ≧ 2
It is preferable to L 1. In the above, P 1 N 2 P 3 N 4
Although the conductivity type has been described, it goes without saying that the conductivity type may be reversed.

【0009】[0009]

【発明の効果】以上の説明から明らかなように本発明に
よれば、防護能力が高くしかも遮断能力の高いVBO点弧
のサージ防護素子を提供できるもので、通信回路などこ
の種弱電回路のサージ防護に用いて大きな効果を発揮す
る。
According to apparent the present invention from the above description, as it can provide a surge protection device of high V BO firing of higher Moreover blocking capability protection capability, this type of light electrical circuit such as a communication circuit It is very effective for surge protection.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のサージ防護素子の説明図である。FIG. 1 is an explanatory view of a surge protection element of the present invention.

【図2】本発明の一実施例の説明図である。FIG. 2 is an explanatory diagram of one embodiment of the present invention.

【図3】従来のサージ防護素子の説明図である。 FIG. 3 is an explanatory diagram of a conventional surge protection element.

【符号の説明】[Explanation of symbols]

Z サージ防護素子 L 線路 G 被保護回路 E 直流電源 R 線路抵抗 D1 ,D2 ,D3 ,D4 ダイオード T 一方向サイリスタ F,H ショートゲート構造Z surge protection element L line G the protected circuit E DC power supply R line resistance D 1, D 2, D 3 , D 4 diodes T unidirectional thyristors F, H Short gate structure

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 第1の導電型を有する第1半導体層と、
第2の導電型を有する第2半導体層と、第1の導電型を
有する第3半導体層と、第2の導電型を有する第4半導
体層とが順次に積層された4層構造を有し、 前記第2半導体層の一部が前記第1半導体層を分離する
ことなく一体形成が維持されるように複数箇所において
該第1半導体層を突き抜けて一方の面に露呈させると共
に、前記第3半導体層の一部が前記第4半導体層を分離
することなく一体形成が維持されるように複数箇所にお
いて該第4半導体層を突き抜けて他方の面に露呈させ、 前記一方の面に露呈された複数個の前記第2半導体層と
前記第1半導体層とを接続した一方の電極と、前記他方
の面に露呈された複数個の前記第3半導体層と前記第4
半導体層とを接続した一方の電極とを備え、 かつ前記一方の電極と接続された複数個の前記第2半導
体層と前記他方の電極と接続された複数個の前記第3半
導体層とは、前記一方の面と他方の面に直交する方向で
相互に重ならないように構成された サージ防護素子。
A first semiconductor layer having a first conductivity type;
A second semiconductor layer having a second conductivity type;
Having a third semiconductor layer and a fourth semiconductor having a second conductivity type
A four-layer structure in which body layers are sequentially stacked, and a part of the second semiconductor layer separates the first semiconductor layer
At multiple locations so that the integral formation is maintained without
When penetrating through the first semiconductor layer and exposing it to one surface,
A part of the third semiconductor layer separates the fourth semiconductor layer;
At multiple locations so that the integral formation is maintained without
And exposing the second semiconductor layer through the fourth semiconductor layer and exposing the second semiconductor layer to the other surface.
One electrode connected to the first semiconductor layer and the other electrode
A plurality of the third semiconductor layers exposed on the surface of
A second electrode connected to the semiconductor layer; and a plurality of the second semiconductors connected to the one electrode.
A plurality of third halves connected to a body layer and the other electrode;
The conductor layer is a direction perpendicular to the one surface and the other surface.
Surge protection elements configured not to overlap each other .
【請求項2】 前記一方の面に露呈する複数個の前記第
2半導体層は前記第1半導体層のほぼ中心に1個と該第
1半導体層の外周辺に複数個露呈させると共に、前記他
方の面に露呈する複数個の前記第3半導体層は前記第4
半導体層の外周辺に複数個露呈させ、 かつ前記一方の面から前記他方の面を透視した状態で、
前記一方の面のほぼ中心部に露呈する前記第2半導体層
の中心部から前記他方の面の外周辺に露呈する各複数個
の前記第3半導体層の中心部までの距離が、該他方の面
の外周辺に露呈する各複数個の前記第3半導体層の中心
部から前記第4半導体層の外周縁までの距離の2倍以上
になるようにそれぞれ露呈せしめた請求項1に記載のサ
ージ防護素子。
2. The method according to claim 1 , wherein the plurality of first surfaces are exposed on the one surface.
The two semiconductor layers are substantially one at the center of the first semiconductor layer and the first semiconductor layer.
A plurality of semiconductor devices are exposed around the outer periphery of one semiconductor layer,
The plurality of third semiconductor layers exposed on one side are the fourth semiconductor layers.
In a state where a plurality of the semiconductor layers are exposed to the outer periphery, and the other surface is seen through from the one surface,
The second semiconductor layer exposed substantially at the center of the one surface;
A plurality of each exposed from the center of the outer periphery of the other surface
The distance to the center of the third semiconductor layer is the other surface.
Center of each of the plurality of third semiconductor layers exposed to the outer periphery
At least twice the distance from the portion to the outer peripheral edge of the fourth semiconductor layer
2. The service according to claim 1, which is exposed so that
Protection element.
JP03211318A 1991-07-30 1991-07-30 Surge protection element Expired - Fee Related JP3083881B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03211318A JP3083881B2 (en) 1991-07-30 1991-07-30 Surge protection element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03211318A JP3083881B2 (en) 1991-07-30 1991-07-30 Surge protection element

Publications (2)

Publication Number Publication Date
JPH0536979A JPH0536979A (en) 1993-02-12
JP3083881B2 true JP3083881B2 (en) 2000-09-04

Family

ID=16603967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03211318A Expired - Fee Related JP3083881B2 (en) 1991-07-30 1991-07-30 Surge protection element

Country Status (1)

Country Link
JP (1) JP3083881B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8378545B2 (en) 2005-08-26 2013-02-19 Hoganas Ab (Publ) Electrical rotary machine assembly with stator core sections

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003041236A1 (en) * 2001-11-07 2003-05-15 Shindengen Electric Manufacturing Co., Ltd. Surge protecting semiconductor device
EP1453094A4 (en) * 2001-11-07 2006-08-23 Shindengen Electric Mfg Surge protection semiconductor device
KR100559938B1 (en) * 2004-01-28 2006-03-13 광전자 주식회사 transient voltage suppressor diode
JP5532538B2 (en) 2008-02-04 2014-06-25 三菱電機株式会社 Protection circuit
JP5658960B2 (en) * 2010-09-28 2015-01-28 新電元工業株式会社 Semiconductor device
CN104412339B (en) * 2012-07-05 2017-10-17 保险丝公司 Crow bar device for voltage transient circuit protection

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8378545B2 (en) 2005-08-26 2013-02-19 Hoganas Ab (Publ) Electrical rotary machine assembly with stator core sections

Also Published As

Publication number Publication date
JPH0536979A (en) 1993-02-12

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