JP3058799B2 - Glazing method - Google Patents
Glazing methodInfo
- Publication number
- JP3058799B2 JP3058799B2 JP6211943A JP21194394A JP3058799B2 JP 3058799 B2 JP3058799 B2 JP 3058799B2 JP 6211943 A JP6211943 A JP 6211943A JP 21194394 A JP21194394 A JP 21194394A JP 3058799 B2 JP3058799 B2 JP 3058799B2
- Authority
- JP
- Japan
- Prior art keywords
- glaze
- tile
- container
- nozzle
- chamfered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Devices For Post-Treatments, Processing, Supply, Discharge, And Other Processes (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明はタイルへの施釉方法に
関し、詳しくは幕掛けにより施釉する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for glazing tiles, and more particularly, to a method for glazing with curtains.
【0002】[0002]
【従来の技術】タイル表面への施釉方法として、容器内
部に液状の釉薬を収容し、そして容器の下端のスリット
状の開口より内部の釉薬を幕状に吐出してタイル表面に
施す幕掛施釉方法が広く実施されている。2. Description of the Related Art As a method for glazing a tile surface, a curtain glaze is applied to a tile surface by containing a liquid glaze inside a container and discharging the glaze inside from a slit-shaped opening at the lower end of the container in a curtain. The method is widely practiced.
【0003】ところで、タイルの一種に端部を面取りし
た面取タイルがあり、タイル施工に際して特定の個所に
用いられている。この面取タイルの場合、従来の幕掛施
釉によって釉薬を施した場合、良好に施釉することがで
きない問題があった。[0003] One type of tile is a chamfered tile having a chamfered end, which is used at a specific location during tile construction. In the case of this chamfered tile, there was a problem that it was not possible to satisfactorily apply the glaze when the glaze was applied by the conventional hanging glaze.
【0004】この種面取タイルに対して通常の幕掛施釉
を行った場合、面取部分において、施した釉薬が面取面
に沿って下方に流下してしまい、結果的に面取部におい
て釉薬の厚みが薄くなって、同部分が透けて見えてしま
うといった不都合を生ずるのである。[0004] In the case where ordinary seed glaze is applied to this kind of chamfered tile, the applied glaze flows down along the chamfered surface in the chamfered portion, and as a result, in the chamfered portion. The thickness of the glaze becomes thinner, which causes the inconvenience that the same part can be seen through.
【0005】そこでこの場合、幕掛施釉した後に再び面
取部に対し釉薬を霧状に吹き付けるスプレー施釉を部分
的に施すようにしている。Therefore, in this case, spray glaze for spraying glaze in a mist state on the chamfered portion after the glaze is applied is partially applied.
【0006】[0006]
【発明が解決しようとする課題】しかしながらこの場
合、幕掛施釉装置の他にスプレー施釉装置が別途に必要
であるとともに、幕掛用釉薬とスプレー用釉薬とで適し
た釉薬の組成が異なるために、幕掛用とスプレー用との
二つの釉薬を別々に調製することが必要となる。However, in this case, a separate spray glaze apparatus is required in addition to the glaze glaze apparatus, and the suitable glaze composition differs between the glaze glaze and the spray glaze. It is necessary to separately prepare two glazes, one for the curtain and the other for the spray.
【0007】加えて後においてスプレー施釉を部分的に
施した場合、釉薬はある範囲に亘って拡散しつつタイル
表面に塗布されるために、場合によって施釉の不均一が
生じる。[0007] In addition, when the spray glaze is partially applied later, the glaze spreads over a certain area and is applied to the tile surface, and in some cases, the glaze becomes uneven.
【0008】またスプレー施釉装置を用いる場合、集塵
装置,施釉ブース等の設備を必要とし、装置が複雑化す
るとともに多くのスペ−スを必要とする等の問題が生ず
る。When a spray glaze apparatus is used, equipment such as a dust collecting apparatus and a glaze booth is required, so that the apparatus becomes complicated and a lot of space is required.
【0009】[0009]
【課題を解決するための手段】本願の発明はこのような
課題を解決するためになされたものである。而して本願
の発明は、面取部を有するタイルへの施釉方法であっ
て、まずノズルの先端より液状の釉薬を連続的に吐出さ
せて前記面取部の頂部に沿って該釉薬を線状に施し、し
かる後該施した釉薬が乾かないうちに釉薬容器の下端の
スリット状開口から該容器内の液状の釉薬を幕状に吐出
してタイルの表面に全体的に幕掛施釉することを特徴と
する(請求項1)。The invention of the present application has been made to solve such a problem. Thus, the invention of the present application is a method for glazing a tile having a chamfered portion, in which a liquid glaze is first continuously discharged from the tip of a nozzle and the glaze is drawn along the top of the chamfered portion. Before the applied glaze does not dry out, discharge the liquid glaze in the container from the slit-shaped opening at the lower end of the glaze container in a curtain shape and apply the entire curtain surface to the tile. Features (Claim 1).
【0010】本願の別の発明は、請求項1の施釉方法に
おいて、前記釉薬容器への釉薬の供給源と、前記ノズル
への釉薬の供給源として共通の釉薬タンクを用い、該タ
ンクより所定の流路を通じて同一組成の釉薬を供給する
ことを特徴とする(請求項2)。According to another aspect of the present invention, there is provided a glaze method according to claim 1, wherein a common glaze tank is used as a glaze supply source to the glaze container and a glaze supply source to the nozzle. A glaze having the same composition is supplied through the flow path (claim 2).
【0011】本願の更に別の発明は、請求項1又は2の
施釉方法において、前記タイルを所定搬送路に沿ってコ
ンベヤにより搬送するとともに、該搬送路上に前記釉薬
容器と釉薬ノズルとを所定間隔離隔して配置し、該タイ
ルをそれら釉薬ノズル及び釉薬容器の下方を通過させる
過程で、該ノズルによる施釉と該釉薬容器による釉薬の
幕掛施釉とを所定時間間隔をあけて行うことを特徴とす
る(請求項3)。In another aspect of the present invention, in the glazing method according to claim 1 or 2, the tile is conveyed by a conveyor along a predetermined conveying path, and the glaze container and the glaze nozzle are arranged on the conveying path at a predetermined distance. In the process of arranging the tiles at a distance and passing the tiles below the glaze nozzle and the glaze container, the glaze by the nozzle and the glazing of the glaze by the glaze container are performed at a predetermined time interval. (Claim 3).
【0012】[0012]
【作用及び発明の効果】以上のように請求項1の発明に
おいては、先ずノズルより液状の釉薬を面取部の頂部に
沿って線状に施す。そしてその後幕掛けにより釉薬をタ
イル表面に全体的に施す。As described above, in the first aspect of the present invention, first, a liquid glaze is applied linearly from the nozzle along the top of the chamfer. Then, glaze is applied to the entire tile surface by curtaining.
【0013】このとき、予め線状に施してある釉薬の上
側の一部が、後に幕掛けした釉薬の流れとともに面取面
に沿って流れる一方、線状の釉薬の下側の残りの部分が
同部分に留まった状態となる。At this time, a part of the upper side of the glaze previously applied in a linear shape flows along the chamfered surface together with the flow of the glaze that has been hung later, while the remaining part of the lower side of the linear glaze is It will be in the same part.
【0014】この結果、面取面に対して釉薬が均一に且
つ他のタイル表面と同じ程度に施された状態となる。即
ちタイル表面,面取面ともに釉薬が均一に塗布される。As a result, the glaze is uniformly applied to the chamfered surface and to the same degree as the other tile surfaces. That is, the glaze is uniformly applied to both the tile surface and the chamfered surface.
【0015】尚ノズルによる施釉と幕掛施釉との順序を
逆にした場合、面取面に対して釉薬は良好に塗布されな
い。面取面が部分的に厚く施釉された状態となってしま
うのである。If the order of the glazing by the nozzle and the glazing with the curtain is reversed, the glaze is not applied well to the chamfered surface. The chamfered surface becomes partially glazed.
【0016】一方、ノズルより線状に施した釉薬が乾い
た後において幕掛施釉した場合においても同様に釉薬が
良好に塗布されない。後において幕掛施釉したときに、
予め線状に施した釉薬の一部が幕掛施釉した釉薬ととも
に良好に流れず、面取部の頂部において釉薬が突状に残
ってしまって段差を生ぜしめてしまう。[0016] On the other hand, when the glaze applied linearly from the nozzle is dried and then glaze-coated, the glaze is not applied well. Later, when the glaze was applied,
A part of the glaze previously applied in a linear shape does not flow well together with the glaze applied with the curtain, and the glaze remains at the top of the chamfered portion, causing a step.
【0017】本発明の方法によれば、幕掛施釉装置と別
途にスプレー施釉装置を必要とせず、従って装置構成が
簡単且つ所要スペ−スも少なくて済むとともに、組成の
異なる二つの釉薬を別々に調製する必要もなくすことが
できる。According to the method of the present invention, a spray glaze apparatus is not required separately from a curtain glaze apparatus, so that the apparatus configuration is simple and the required space is small, and two glazes having different compositions are separated. Need not be prepared.
【0018】請求項2の発明は、共通の釉薬タンクより
釉薬容器及びノズルへの釉薬の供給を行うようにしたも
ので、本発明によれば装置構成を更に簡略化することが
できる。According to the second aspect of the present invention, the glaze is supplied to the glaze container and the nozzle from the common glaze tank. According to the present invention, the configuration of the apparatus can be further simplified.
【0019】また請求項3の発明によれば、タイルをコ
ンベヤによって所定搬送路に沿って搬送するだけで、ノ
ズル施釉と幕掛施釉とを時間をずらせて自動的に行うこ
とができ、簡単に面取タイルに対して良好に施釉をする
ことができる。Further, according to the third aspect of the present invention, the nozzle glaze and the curtain glaze can be automatically performed with a time lag simply by transporting the tiles along the predetermined transport path by the conveyor. The glaze can be satisfactorily applied to the chamfered tile.
【0020】[0020]
【実施例】次に本発明の実施例を図面に基づいて詳しく
説明する。図2において10は面取タイルであって、一
端部にR形状(湾曲形状)の面取部12が形成されてい
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, embodiments of the present invention will be described in detail with reference to the drawings. In FIG. 2, reference numeral 10 denotes a chamfer tile, and an R-shaped (curved) chamfered portion 12 is formed at one end.
【0021】図1はこのタイル10に対する施釉方法を
装置構成とともに示したものである。図において14は
ベルトコンベヤであって、タイル10を載せて所定搬送
路に沿って搬送するようになっている。FIG. 1 shows a method of glazing the tile 10 together with the apparatus configuration. In the figure, reference numeral 14 denotes a belt conveyor on which the tiles 10 are placed and transported along a predetermined transport path.
【0022】16はベルトコンベヤ14の上方に下向き
に配置されたノズルであって、下端より液状の釉薬20
を連続的に吐出するようになっている。Numeral 16 denotes a nozzle arranged downward above the belt conveyor 14, and a liquid glaze 20 from the lower end.
Are continuously discharged.
【0023】ノズル16の下流側には、ベルトコンベヤ
14の上方において釉薬容器18が配置されている。そ
してこの釉薬容器18の下端のスリット状の開口22よ
り、容器18内部に収容された液状の釉薬20が幕状に
吐出されるようになっている。On the downstream side of the nozzle 16, a glaze container 18 is arranged above the belt conveyor 14. A liquid glaze 20 contained in the interior of the container 18 is discharged in a curtain shape from a slit-shaped opening 22 at the lower end of the glaze container 18.
【0024】24はノズル16及び釉薬容器18に対す
る共通の釉薬20の供給源としての釉薬タンクであっ
て、内部に釉薬20が貯溜され、かかる釉薬20が流路
26及び28を通じてそれぞれノズル16又は容器18
へと供給されるようになっている。Reference numeral 24 denotes a glaze tank serving as a common glaze supply source for the nozzle 16 and the glaze container 18. The glaze 20 is stored inside the glaze tank 20, and the glaze 20 is supplied to the nozzle 16 or the container through flow paths 26 and 28, respectively. 18
To be supplied to
【0025】次に本例の施釉方法及び作用を図1及び図
3(A)の模式図に基づいて説明する。タイル10はベ
ルトコンベヤ14によりノズル16の下方まで搬送さ
れ、そこにおいてノズル16の下端より連続的に吐出さ
れた液状の釉薬20が面取部12の頂部に沿って線状に
塗布される(I)。Next, the glaze method and operation of this embodiment will be described with reference to the schematic diagrams of FIGS. 1 and 3A. The tile 10 is conveyed to below the nozzle 16 by the belt conveyor 14, where the liquid glaze 20 continuously discharged from the lower end of the nozzle 16 is applied linearly along the top of the chamfer 12 (I ).
【0026】線状に釉薬20の塗布を受けたタイル10
は更に下流側へと搬送され、そして釉薬容器18の配置
された位置に到ると、未だ線状に塗布された釉薬20が
乾かないうちに、釉薬容器18の下端のスリット状開口
22より幕状に吐出した釉薬20が、タイル10表面全
面に亘って幕掛施釉される(II)。Tile 10 coated with glaze 20 in a linear manner
Is conveyed further downstream, and when it reaches the position where the glaze container 18 is arranged, before the glaze 20 applied in a linear shape has dried yet, the curtain is opened from the slit-shaped opening 22 at the lower end of the glaze container 18. The glaze 20 discharged in a shape is glazed over the entire surface of the tile 10 (II).
【0027】このとき予め頂部に線状に施釉された釉薬
20の一部は幕掛施釉による釉薬20とともに面取部1
2に沿って下方に流れる一方、線状に施した釉薬20の
残りの部分は同部分に留まった状態となる(III)。At this time, a part of the glaze 20 which has been previously glazed in a linear shape on the top is partly chamfered together with the glaze 20 with the glazed glaze.
While flowing downward along 2, the remaining portion of the glaze 20 applied linearly remains in the same portion (III).
【0028】この結果、面取部12の釉薬20の厚みが
薄くなることなく、面取部12に対しても他のタイル表
面と同じ程度に均一に釉薬20が施される(IV)。As a result, the glaze 20 on the chamfered portion 12 is applied uniformly to the same extent as the other tile surfaces without reducing the thickness of the glaze 20 on the chamfered portion 12 (IV).
【0029】以上のように本例によれば、幕掛施釉後に
面取部12に対して部分的に釉薬20をスプレー施釉し
なくても、面取部12,他のタイル表面ともに釉薬20
が均一に塗布される。これによりスプレー施釉装置が不
要となり、装置構成が簡単且つ所要スペ−スも少なくて
済むとともに、組成の異なる二つの釉薬を別々に調製す
る必要もなくなる。As described above, according to the present embodiment, the glaze 20 can be applied to both the chamfered portion 12 and other tile surfaces even if the glaze 20 is not partially sprayed on the chamfered portion 12 after the curtaining glaze.
Is uniformly applied. This eliminates the need for a spray glaze apparatus, simplifies the apparatus configuration and requires less space, and eliminates the need to separately prepare two glazes having different compositions.
【0030】また本例の方法は共通の釉薬タンク24よ
り釉薬容器18及びノズル16への釉薬20の供給を行
うようにしているため、装置構成を更に簡略化すること
ができる。更にタイル10をコンベヤ14によって所定
搬送路に沿って搬送するだけで、ノズル施釉と幕掛施釉
とを時間をずらせて自動的に行うことができ、簡単に面
取タイル10に対して施釉することができる。In the method of this embodiment, the glaze 20 is supplied to the glaze container 18 and the nozzle 16 from the common glaze tank 24, so that the configuration of the apparatus can be further simplified. Furthermore, simply by conveying the tile 10 along the predetermined conveying path by the conveyor 14, the nozzle glaze and the curtain glaze can be automatically performed with a time lag, and the glaze on the chamfered tile 10 can be easily performed. Can be.
【0031】以上本発明の実施例を詳述したが、本発明
はR形状の面取面を有する面取タイル10だけでなく、
図3(B)に示しているような平坦な傾斜形状の面取部
30を有する面取タイル10及び他の種々の形状の面取
タイルにも適用可能である等、本発明はその主旨を逸脱
しない範囲において、当業者の知識に基づき様々な変更
を加えた形態で実施可能である。Although the embodiment of the present invention has been described in detail, the present invention is not limited to the chamfered tile 10 having the R-shaped chamfered surface,
The present invention is applicable to the chamfered tile 10 having the chamfered portion 30 having a flat inclined shape as shown in FIG. 3B and other various shapes. The present invention can be implemented in various modified forms based on the knowledge of those skilled in the art without departing from the scope of the present invention.
【図1】本発明の一実施例である面取タイルの施釉方法
を示す図である。FIG. 1 is a view showing a method for glazing a chamfered tile according to one embodiment of the present invention.
【図2】本発明の適用対象である面取タイルの一例を示
す図である。FIG. 2 is a diagram illustrating an example of a chamfer tile to which the present invention is applied;
【図3】同実施例方法の作用を説明するための説明図で
ある。FIG. 3 is an explanatory diagram for explaining an operation of the method of the embodiment.
10 タイル 12 面取部 14 ベルトコンベヤ 16 ノズル 18 釉薬容器 20 釉薬 22 スリット状開口 24 釉薬タンク 26,28 流路 DESCRIPTION OF SYMBOLS 10 Tile 12 Chamfer part 14 Belt conveyor 16 Nozzle 18 Glaze container 20 Glaze 22 Slit-shaped opening 24 Glaze tank 26, 28 Channel
Claims (3)
って、まずノズルの先端より液状の釉薬を連続的に吐出
させて前記面取部の頂部に沿って該釉薬を線状に施し、
しかる後該施した釉薬が乾かないうちに釉薬容器の下端
のスリット状開口から該容器内の液状の釉薬を幕状に吐
出してタイルの表面に全体的に幕掛施釉することを特徴
とする施釉方法。1. A method for glazing a tile having a chamfered portion, wherein a liquid glaze is first continuously discharged from a tip of a nozzle and the glaze is linearly applied along the top of the chamfered portion. ,
Thereafter, before the applied glaze does not dry, the liquid glaze in the container is discharged in a curtain form from the slit-shaped opening at the lower end of the glaze container, so that the entire surface of the tile is covered with the glaze. Method.
容器への釉薬の供給源と、前記ノズルへの釉薬の供給源
として共通の釉薬タンクを用い、該タンクより所定の流
路を通じて同一組成の釉薬を供給することを特徴とする
施釉方法。2. A glaze method according to claim 1, wherein a common glaze tank is used as a glaze supply source for the glaze container and a glaze supply source for the nozzles, and the same composition is passed from the tank through a predetermined flow path. A glaze method characterized by supplying a glaze.
記タイルを所定搬送路に沿ってコンベヤにより搬送する
とともに、該搬送路上に前記釉薬容器と釉薬ノズルとを
所定間隔離隔して配置し、該タイルをそれら釉薬ノズル
及び釉薬容器の下方を通過させる過程で、該ノズルによ
る施釉と該釉薬容器による釉薬の幕掛施釉とを所定時間
間隔をあけて行うことを特徴とする施釉方法。3. The glaze method according to claim 1, wherein the tile is conveyed by a conveyor along a predetermined conveyance path, and the glaze container and the glaze nozzle are arranged on the conveyance path at a predetermined interval. A glaze method characterized in that, in the process of passing the tile below the glaze nozzle and the glaze container, the glaze by the nozzle and the glazing of the glaze by the glaze container are performed at predetermined time intervals.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6211943A JP3058799B2 (en) | 1994-08-11 | 1994-08-11 | Glazing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6211943A JP3058799B2 (en) | 1994-08-11 | 1994-08-11 | Glazing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0859371A JPH0859371A (en) | 1996-03-05 |
JP3058799B2 true JP3058799B2 (en) | 2000-07-04 |
Family
ID=16614267
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6211943A Expired - Fee Related JP3058799B2 (en) | 1994-08-11 | 1994-08-11 | Glazing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3058799B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100386218C (en) * | 2003-10-03 | 2008-05-07 | 李兴兵 | Technique for manufacturing ceramic glazed tile with natural stone texture |
-
1994
- 1994-08-11 JP JP6211943A patent/JP3058799B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0859371A (en) | 1996-03-05 |
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