JP3057767B2 - Method for manufacturing semiconductor integrated circuit device - Google Patents
Method for manufacturing semiconductor integrated circuit deviceInfo
- Publication number
- JP3057767B2 JP3057767B2 JP3001819A JP181991A JP3057767B2 JP 3057767 B2 JP3057767 B2 JP 3057767B2 JP 3001819 A JP3001819 A JP 3001819A JP 181991 A JP181991 A JP 181991A JP 3057767 B2 JP3057767 B2 JP 3057767B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- chip
- semiconductor substrate
- reticle
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Semiconductor Integrated Circuits (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体集積回路チップ
(以下ICチップを記す)の配列方法に関し、特に異な
る大きさのICチップを半導体基板上に配列する方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of arranging semiconductor integrated circuit chips (hereinafter referred to as IC chips), and more particularly to a method of arranging IC chips of different sizes on a semiconductor substrate.
【0002】[0002]
【従来の技術】試作試験用の大きさの異なるICチップ
を複数種同じ半導体基板上に形成する場合がある。2. Description of the Related Art In some cases, a plurality of types of IC chips having different sizes for trial testing are formed on the same semiconductor substrate.
【0003】従来のICチップの第1の配列方法は、図
3に示すように、大きさの異なる第1のチップパターン
5と第2のチップパターン6を隣接して設け第1及び第
2のチップパターン2,3の周囲に遮光帯7を設けたレ
チクル4を作成し、図4に示すように、縮小投影露光法
によりレチクル4のチップパターン5,6を同時に半導
体基板1上に露光して配列し、ICチップ2,3を形成
する。しかしながら、この配列方法ではICチップ2の
数量に対してICチップ3の数量を半数以下に抑えたい
場合にもICチップ2,3の数量を変更できず、無駄が
多いという問題があった。As shown in FIG. 3, the first conventional method for arranging IC chips is to provide first and second chip patterns 5 and 6 having different sizes adjacent to each other. A reticle 4 having a light-shielding band 7 provided around the chip patterns 2 and 3 is prepared. As shown in FIG. 4, the chip patterns 5 and 6 of the reticle 4 are simultaneously exposed on the semiconductor substrate 1 by a reduced projection exposure method. They are arranged to form IC chips 2 and 3. However, this arrangement method has a problem that the number of IC chips 2 and 3 cannot be changed even when it is desired to reduce the number of IC chips 3 to half or less of the number of IC chips 2, resulting in a large waste.
【0004】それを改善するために、従来のICチップ
の第2の配列方法は、図5に示すように、第1のチップ
パターン5と第2のチップパターン6との間に露光時の
光の回り込みを防ぐ遮光帯3を設けたレチクル4bを使
用し、図6に示すように、縮小投影露光時にレチクル4
b上のチップパターン5又はチップパターン6の一方を
遮光して露光し、半導体基板1上にICチップ2,3を
形成する。なお、ICチップ3はレチクル4bのチップ
パターン5,6を同時に形成して、隣接するICチップ
2とICチップ3を同時に露光して形成することも可能
である。なお、この方法では、半導体基板1上にレチク
ル上の遮光帯3に対応する領域以外のチップ未形成領域
8が生じる。In order to improve the above problem, a second conventional method of arranging IC chips employs a light emitting method for exposing light between a first chip pattern 5 and a second chip pattern 6 as shown in FIG. As shown in FIG. 6, a reticle 4b provided with a light-shielding band 3 for preventing
IC chip 2 or 3 is formed on semiconductor substrate 1 by exposing one of chip pattern 5 and chip pattern 6 on b to light while exposing it to light. The IC chip 3 can be formed by simultaneously forming the chip patterns 5 and 6 of the reticle 4b and exposing the adjacent IC chip 2 and IC chip 3 at the same time. In this method, a chip unformed region 8 other than the region corresponding to the light-shielding band 3 on the reticle is formed on the semiconductor substrate 1.
【0005】[0005]
【発明が解決しようとする課題】この従来のICチップ
の第1の配列方法では、図4に示すように、大きさのI
Cチップ2,3は、それぞれ同数個ずつでしか半導体基
板上に形成できない。また、第2の方法では、図6に示
すように、異なる大きさのICチップ2,3を異なる数
量で半導体基板上に形成することはできるが、半導体基
板上にチップ未形成領域と生じさせることがある。この
ような場合、チップ未形成領域に近い領域と離れた領域
とで単位面積当たりのパターン密度に差が生じ、エッチ
ングにおけるエッチングレートの半導体基板面内でのば
らつきを引き起こす。パターン密度の低い前記領域に近
い領域ほどエッチングレートが高くなるためにパターン
の線幅が細くなり、半導体基板面内でパターン寸法のバ
ラつき、形状異常等の発生する問題があった。According to the first conventional method of arranging IC chips, as shown in FIG.
Only the same number of C chips 2 and 3 can be formed on a semiconductor substrate. Further, in the second method, as shown in FIG. 6, IC chips 2 and 3 having different sizes can be formed in different numbers on the semiconductor substrate, but the chip unformed areas are formed on the semiconductor substrate. Sometimes. In such a case, a difference occurs in the pattern density per unit area between a region near the chip unformed region and a region distant from the region where the chip is not formed, causing a variation in the etching rate in the etching of the semiconductor substrate in the etching. A region closer to the region having a lower pattern density has a higher etching rate, so that the line width of the pattern becomes narrower, and there has been a problem that variations in pattern dimensions, abnormal shapes, and the like occur in the semiconductor substrate surface.
【0006】[0006]
【課題を解決するための手段】本発明の特徴は、互いの
大きさが異なる第1および第2のパターンが形成された
レチクルを用意し、前記レチクルの前記第1のパターン
を遮光した状態で半導体基板に対する前記第2のパター
ンの縮小投影露光を行うことにより前記半導体基板上
に、未露光領域を残した状態で、前記第2のパターンを
配列して設け、前記レチクルの前記第2のパターンを遮
光した状態で前記半導体基板上の前記未露光領域に対す
る前記第1のパターンの縮小投影露光を行うことにより
前記未露光領域に前記第1のパターンを設けることにあ
る。The features of the present invention relate to each other.
First and second patterns having different sizes are formed.
Preparing a reticle, the first pattern of the reticle;
The second pattern with respect to the semiconductor substrate in a state where light is shielded.
The semiconductor substrate by performing reduced projection exposure of the
Then, while leaving the unexposed area, the second pattern
Provided in an array to block the second pattern of the reticle.
In the lighted state, the unexposed area on the semiconductor substrate is
Performing the reduced projection exposure of the first pattern
The present invention is to provide the first pattern in the unexposed area .
【0007】[0007]
【実施例】次に、本発明について図面を参照して説明す
る。Next, the present invention will be described with reference to the drawings.
【0008】図1は本発明の一実施例を説明するための
レイアウト図、図2は図1の実施例を構成するために使
用するレチクルの平面図である。FIG. 1 is a layout diagram for explaining an embodiment of the present invention, and FIG. 2 is a plan view of a reticle used to constitute the embodiment of FIG.
【0009】図1及び図2に示すように、第1のチップ
パターン5と第2のチップパターン6との間及び周囲に
遮光帯7を設けて配置したレチクル4を用い、まず、レ
チクル4のチップパターン6を遮光した状態でチップパ
ターン5の縮小投影露光を行い半導体基板1の上にIC
チップ2を選択的に配列して設ける。この際に所定の位
置に未露光領域を設けておく。次に、レチクルのチップ
パターン5を遮光した状態で未露光領域に露光し、IC
チップ3を形成する。As shown in FIGS. 1 and 2, a reticle 4 having a light-shielding band 7 provided between and around a first chip pattern 5 and a second chip pattern 6 is used. In a state where the chip pattern 6 is shielded from light, reduction projection exposure of the chip pattern 5 is performed, and an IC is formed on the semiconductor substrate 1.
The chips 2 are selectively arranged. At this time, an unexposed area is provided at a predetermined position. Next, an unexposed area is exposed in a state where the chip pattern 5 of the reticle is shielded from light,
The chip 3 is formed.
【0010】ここで、チップパターン6の縦方向の長さ
Bはチップパターン5の縦方向の長さAの整数分の1の
大きさに設定されているのでICチップ3はチップ未形
成領域を残すことなく形成できる。Here, the length B of the chip pattern 6 in the vertical direction is set to a value which is a fraction of the length A of the chip pattern 5 in the vertical direction. Can be formed without leaving.
【0011】なお、ICチップ領域の寸法は2種類に限
らず、ICチップ領域の1辺の寸法が整数倍又は整数分
の1にある3種以上のICチップ領域を組合わせて形成
することも可能である。The dimensions of the IC chip area are not limited to two types, and three or more types of IC chip areas in which the dimension of one side of the IC chip area is an integral multiple or a fraction of an integer may be formed in combination. It is possible.
【0012】[0012]
【発明の効果】以上説明したように本発明は、複数の大
きさの異なるICチップを組合わせて半導体基板上に形
成し、且つチップ未形成領域を生じさせずに効率よくチ
ップ配列ができるため、エッチング等の後工程で生ずる
チップ間のパターン寸法のばらつき、形状異常等の発生
を防止できるという効果を有する。As described above, according to the present invention, a plurality of IC chips having different sizes are combined and formed on a semiconductor substrate, and a chip arrangement can be efficiently performed without generating a chip unformed area. This has the effect of preventing the occurrence of variations in pattern dimensions between chips, abnormalities in shape, etc., which occur in later steps such as etching.
【図1】本発明の一実施例を説明するためのレイアウト
図である。FIG. 1 is a layout diagram for explaining an embodiment of the present invention.
【図2】図1の実施例を構成するために使用するレチク
ルの平面図である。FIG. 2 is a plan view of a reticle used to construct the embodiment of FIG.
【図3】従来のICチップの第1の配列方法を構成する
ために使用するレチクルの平面図である。FIG. 3 is a plan view of a reticle used to configure a first conventional method for arranging IC chips.
【図4】従来のICチップの第1の配列方法を示すレイ
アウト図である。FIG. 4 is a layout diagram showing a first arrangement method of a conventional IC chip.
【図5】従来のICチップの第2の配列方法を構成する
ために使用するレチクルの平面図である。FIG. 5 is a plan view of a reticle used for configuring a second conventional method for arranging IC chips.
【図6】従来のICチップの第2の配列方法を示すレイ
アウト図である。FIG. 6 is a layout diagram showing a second method of arranging conventional IC chips.
1 半導体基板 2,3 ICチップ 4 レチクル 5,6 チップパターン 7 遮光帯 8 チップ未形成領域 DESCRIPTION OF SYMBOLS 1 Semiconductor substrate 2, 3 IC chip 4 Reticle 5, 6 Chip pattern 7 Shielding band 8 Chip unformed area
フロントページの続き (56)参考文献 特開 平2−306611(JP,A) 特開 昭55−132039(JP,A)Continuation of front page (56) References JP-A-2-306611 (JP, A) JP-A-55-132039 (JP, A)
Claims (3)
ターンが形成されたレチクルを用意し、前記レチクルの
前記第1のパターンを遮光した状態で半導体基板に対す
る前記第2のパターンの縮小投影露光を行うことにより
前記半導体基板上に、未露光領域を残した状態で、前記
第2のパターンを配列して設け、前記レチクルの前記第
2のパターンを遮光した状態で前記半導体基板上の前記
未露光領域に対する前記第1のパターンの縮小投影露光
を行うことにより前記未露光領域に前記第1のパターン
を設けることを特徴とする半導体集積回路装置の製造方
法。 1. A first and a second package having different sizes from each other.
Prepare a reticle with a turn formed, and
When the first pattern is shielded from light with respect to the semiconductor substrate,
By performing reduced projection exposure of the second pattern
On the semiconductor substrate, while leaving an unexposed area,
A second pattern is provided in an array, and the second pattern of the reticle is provided.
2 on the semiconductor substrate in a state where the pattern 2 is shielded from light.
Reduced projection exposure of the first pattern to unexposed areas
The first pattern in the unexposed area
The method of manufacturing a semiconductor integrated circuit device characterized by providing a.
の長さが前記第1のパターンの整数倍であることを特徴
とする請求項1記載の半導体集積回路装置の製造方法。 2. A vertical or horizontal direction of the second pattern.
The process according to claim 1, the semiconductor integrated circuit device according to the length of the is equal to or an integer multiple of the first pattern.
ターンと前記第2のパターンとの間及び周囲に遮光帯を
設けたことを特徴とする請求項1または2記載の半導体
集積回路装置の製造方法。3. The first package formed on the reticle.
A light-shielding band between and around the turn and the second pattern
The method of manufacturing a semiconductor integrated circuit device according to claim 1 or 2, wherein the provided.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3001819A JP3057767B2 (en) | 1991-01-11 | 1991-01-11 | Method for manufacturing semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3001819A JP3057767B2 (en) | 1991-01-11 | 1991-01-11 | Method for manufacturing semiconductor integrated circuit device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04239147A JPH04239147A (en) | 1992-08-27 |
JP3057767B2 true JP3057767B2 (en) | 2000-07-04 |
Family
ID=11512174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3001819A Expired - Fee Related JP3057767B2 (en) | 1991-01-11 | 1991-01-11 | Method for manufacturing semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3057767B2 (en) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55132039A (en) * | 1979-04-02 | 1980-10-14 | Mitsubishi Electric Corp | Forming method for repeated figure |
JP2766857B2 (en) * | 1989-05-22 | 1998-06-18 | 日本電信電話株式会社 | Semiconductor integrated circuit device forming wafer |
-
1991
- 1991-01-11 JP JP3001819A patent/JP3057767B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH04239147A (en) | 1992-08-27 |
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