JP3027118B2 - Vertical electroplating apparatus and electrochrome plating method - Google Patents
Vertical electroplating apparatus and electrochrome plating methodInfo
- Publication number
- JP3027118B2 JP3027118B2 JP8102549A JP10254996A JP3027118B2 JP 3027118 B2 JP3027118 B2 JP 3027118B2 JP 8102549 A JP8102549 A JP 8102549A JP 10254996 A JP10254996 A JP 10254996A JP 3027118 B2 JP3027118 B2 JP 3027118B2
- Authority
- JP
- Japan
- Prior art keywords
- strip
- plate
- electroplating apparatus
- width direction
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、電解によって鋼帯
などの金属ストリップ（以下ストリップと記す）にめっ
きを施す電気めっき装置およびめっき方法に関し、特に
ストリップの板幅方向のめっき付着量を均一にすること
が可能な竪型電気めっき装置および該装置を用いた電気
クロムめっき方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroplating apparatus and a plating method for plating a metal strip (hereinafter, referred to as a strip) such as a steel strip by electrolysis, and more particularly to a method for uniformly depositing a strip in the width direction of the strip. The present invention relates to a vertical electroplating apparatus capable of performing electroplating and an electrochromic plating method using the apparatus.
【０００２】[0002]
【従来の技術】めっき液に鋼帯などのストリップを浸漬
させ、ストリップを挟んで一対の電極を配置し、電解す
ることによって、めっきを施す装置において、ストリッ
プ板幅方向に均一なめっき付着量を得る方法としては、
下記〜の方法または装置が知られている。2. Description of the Related Art In a plating apparatus, a strip of steel strip or the like is immersed in a plating solution, and a pair of electrodes are arranged with the strip interposed therebetween. The way to get
The following methods or devices are known.
【０００３】電極部に複数の穴を設け、めっき液の流
入を促進させる方法。 電流効率を向上させるために、電解槽内にめっき液の
噴流ノズルを設置する方法。 電極を長手方向に複数個分割し、境界部に絶縁物から
成る突起を設けることによって液の更新を促進する方
法。[0003] A method in which a plurality of holes are provided in an electrode portion to promote inflow of a plating solution. A method in which a plating solution jet nozzle is installed in an electrolytic cell to improve current efficiency. A method of promoting renewal of a liquid by dividing a plurality of electrodes in a longitudinal direction and providing a protrusion made of an insulator at a boundary portion.
【０００４】鋼帯の板幅より広幅の電極を有するめっ
き槽内に、鋼帯の板端部を遮蔽するよう膨縮可能な遮蔽
体を配設することにより鋼帯端部へのオーバーコートを
防止する方法（特開昭60−258496号公報）。 ストリップ面に向かって開口するめっき液噴出口を備
えた相対する一対の静圧パッドとストリップの側端部を
覆う電気絶縁性エッジマスクを備えた電気めっき設備
（特開昭61−190094号公報）。[0004] In a plating tank having an electrode wider than the width of the steel strip, a shield that can be expanded and contracted so as to shield the end of the steel strip is disposed to overcoat the end of the steel strip. Prevention method (JP-A-60-258496). Electroplating equipment having a pair of opposing static pressure pads provided with a plating solution jet opening opening toward the strip surface and an electrically insulating edge mask covering a side end of the strip (Japanese Patent Application Laid-Open No. 61-199004) .
【０００５】前記〜の方法は、ストリップ表面近傍
におけるめっき液の更新を活発にし、特に、の方法
はめっき液の更新を板幅方向に均一に行うことによっ
て、高効率かつ均一なめっきを得ることを狙いとしてい
る。しかし、の方法は、ストリップの両サイドからの
随伴流が電極部の穴からの流れより強いため、ストリッ
プ板幅方向の液の更新が不均一となりめっき付着量に影
響するといった問題があった。The above methods (1) to (5) activate the renewal of the plating solution in the vicinity of the strip surface, and in particular, the method (3) obtains highly efficient and uniform plating by uniformly renewing the plating solution in the width direction of the plate. Is aimed at. However, this method has a problem that the accompanying flow from both sides of the strip is stronger than the flow from the hole in the electrode portion, so that the renewal of the liquid in the width direction of the strip plate becomes non-uniform, which affects the plating adhesion amount.
【０００６】、の方法は、設備が複雑になる問題が
あり、また従来の設備を改造するための費用がかかりす
ぎるといった問題があった。、の方法は、ストリッ
プ板幅両端部を遮蔽体で遮蔽するため、特にラインスピ
ード増加時に、遮蔽体にストリップ端部が接触し、安定
通板できないという問題があった。However, the above method has a problem that the equipment is complicated, and there is a problem that the cost for modifying the conventional equipment is too high. In the methods of (1) and (2), since both end portions of the strip plate are shielded by the shields, there is a problem that the strip ends come into contact with the shields particularly when the line speed is increased, so that the sheet cannot be stably passed.
【０００７】また、本発明に係わる一対の電極が相対向
して上下方向に配列された竪型電気めっき装置は、水平
セル型電気めっき装置に対して、発生ガスのガス抜け性
や設備スペースのコンパクト化の面で優れているが、後
記のように、電解液の流れで形成される流線の不均一分
布により、ストリップ板幅方向のめっき付着量に分布が
生じ、その解決が必要となった。In addition, the vertical electroplating apparatus according to the present invention, in which a pair of electrodes are vertically opposed to each other, is different from the horizontal cell type electroplating apparatus in terms of gas release of generated gas and space for equipment. Although excellent in terms of compactness, as described later, due to the uneven distribution of streamlines formed by the flow of the electrolyte, the amount of plating applied in the width direction of the strip plate has a distribution, which must be resolved. Was.
【０００８】[0008]
【発明が解決しようとする課題】本発明は、前記従来技
術の問題を解決し、簡易な装置により、鋼帯など金属ス
トリップの板幅方向において均一なめっきが可能で、し
かも電流効率が高い竪型電気めっき装置およびめっき方
法を提供することを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention, the conventionally solve the technical problems, a simple device, allows uniform plating in the plate width direction of the metal strip such as a steel strip, moreover high current efficiency vertical It is an object of the present invention to provide a type electroplating apparatus and a plating method.
【０００９】[0009]
【課題を解決するための手段】第１の発明は、金属スト
リップを、電解液を満たした竪型電解めっき槽に浸漬
し、前記ストリップを挟んで該ストリップの表面（おも
て面）、裏面のそれぞれに相対して対称位置に一対の板
状電極を配置し、電解によってめっきを施す竪型電気め
っき装置において、相対する板状電極の前記ストリップ
板幅方向の両側部を電気絶縁物で覆い、該電極の両側部
からの電解液の流入を阻止したことを特徴とする竪型電
気めっき装置である。According to a first aspect of the present invention, a metal strip is immersed in a vertical electrolytic plating tank filled with an electrolytic solution, and the strip is sandwiched between the front surface (front surface) and the back surface. In a vertical electroplating apparatus in which a pair of plate electrodes are arranged at symmetrical positions relative to each other and plating is performed by electrolysis, both sides of the opposite plate electrodes in the strip plate width direction are covered with an electrical insulator. A vertical electroplating apparatus characterized in that inflow of electrolyte from both sides of the electrode is prevented.
【００１０】前記第１の発明においては、前記板状電極
の板面に、前記ストリップの板幅方向に、さらに好まし
くは、前記ストリップの進行方向と直交する直線上に、
複数個の電解液流入口を設けることが好ましい。この場
合のめっき液流入口の形態としては、穴状流入口、スト
リップの進行方向に平行に設けられたスリット状流入口
が例示される。In the first aspect of the present invention, on the plate surface of the plate-like electrode, in the width direction of the strip, more preferably, on a straight line perpendicular to the traveling direction of the strip.
Preferably, a plurality of electrolyte inlets are provided. Examples of the form of the plating solution inlet in this case include a hole-like inlet and a slit-like inlet provided in parallel with the traveling direction of the strip.
【００１１】また、上記スリット状流入口を形成する手
段としては、前記板状電極が、ストリップの板幅方向に
複数個分割され、これらの電極間に隙間を有する電極か
ら構成された板状電極であってもよい。また、本発明
は、より好ましくは、前記板状電極が不溶性陽極である
竪型電気めっき装置に好ましく適用される。As means for forming the slit-shaped inflow port, the plate-like electrode is formed by dividing the plate-like electrode into a plurality of pieces in the width direction of the strip and having a gap between these electrodes. It may be. Further, the present invention is more preferably applied to a vertical electroplating apparatus in which the plate electrode is an insoluble anode.
【００１２】さらに、本発明は、前記板状電極と前記電
気絶縁物で囲まれる電解液流路の断面形状が、矩形、す
なわち長方形または正方形であることが好ましい。ま
た、第２の発明は、前記第１の発明の竪型電気めっき装
置を用いて、クロムメッキを行うことを特徴とする電気
クロムめっき方法である。本第２の発明は、より好まし
くは、電解液組成がCrO3濃度：10〜100g/l、H2SO 4 濃
度： 0.1〜１g/l 、ライン速度：50〜600m.p.m. の電気
クロムめっき方法に好ましく適用される。Further, the present invention provides the above-mentioned plate-shaped electrode and the electrode.
The cross-sectional shape of the electrolyte flow path surrounded by the gas insulator is rectangular or square.
That is, it is preferably rectangular or square. Ma
A second invention is directed to the vertical electroplating apparatus according to the first invention.
Characterized by performing chrome plating using a device
This is a chrome plating method. This second invention is more preferable.
In other words, the electrolyte composition is CrOThreeConcentration: 10-100g / l, HTwoSO FourDark
Degree: 0.1-1g / l, line speed: 50-600m.p.m. Electricity
It is preferably applied to a chromium plating method.
【００１３】[0013]
【発明の実施の形態】以下、本発明をさらに詳細に説明
する。本発明は、一対の電極が相対向して上下方向に配
列された竪型電気めっき装置に好ましく適用される。本
発明者らは、竪型電気めっき装置におけるストリップの
板幅方向のめっき付着量の均一化に関して、電解液のス
トリップ表面上の流れ、すなわち電解液の流線に着目し
て鋭意検討を行った結果、本発明に到った。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail. The present invention is preferably applied to a vertical electroplating apparatus in which a pair of electrodes are arranged vertically opposite to each other. Means for Solving the Problems The inventors of the present invention have conducted intensive studies on the uniformization of the coating weight of the strip in the width direction of the strip in the vertical electroplating apparatus, focusing on the flow of the electrolytic solution on the strip surface, that is, the streamline of the electrolytic solution. As a result, the present invention has been achieved.
【００１４】図６に、従来の竪型浸漬型の電解槽の側面
図を、図７に電極部の断面図を示す。図６、図７におい
て、１は通電ロール、２はシンクロール、３はストリッ
プ（鋼帯）、４、4a、4b、4c、4dは電極、５は電解槽、
６は電解液、10はストリップ進行方向を示す。FIG. 6 is a side view of a conventional vertical immersion type electrolytic cell, and FIG. 7 is a sectional view of an electrode portion. 6 and 7, 1 is an energizing roll, 2 is a sink roll, 3 is a strip (steel strip), 4, 4a, 4b, 4c, 4d are electrodes, 5 is an electrolytic cell,
Reference numeral 6 denotes an electrolytic solution, and reference numeral 10 denotes a strip traveling direction.
【００１５】ストリップ３は、通電ロール１とシンクロ
ール２を介し、電解液６が満たされた電解槽５の中を搬
送され、電極4a、4b間および電極4c、4d間で電気めっき
が施される。このとき、電極4a、4b間および電極4c、4d
間におけるストリップ３近傍の電解液６の流れは、走行
するストリップ３に引き寄せられ、図８に示すように、
電極外部より新しい電解液6fがストリップ３の板幅方向
Ｗの両側から電極4a、4b間および電極4c、4d間の各々へ
流線Ｆで示される方向で流入する。The strip 3 is conveyed through the electrolytic roll 5 filled with the electrolytic solution 6 via the energizing roll 1 and the sink roll 2, and is subjected to electroplating between the electrodes 4a and 4b and between the electrodes 4c and 4d. You. At this time, between the electrodes 4a and 4b and between the electrodes 4c and 4d
The flow of the electrolytic solution 6 in the vicinity of the strip 3 between the strips 3 is drawn to the traveling strip 3, and as shown in FIG.
A new electrolytic solution 6f flows from both sides of the strip 3 in the width direction W of the strip 3 into the space between the electrodes 4a and 4b and between the electrodes 4c and 4d in the direction indicated by the stream line F from the outside of the electrodes.
【００１６】この結果、ストリップ３の板幅方向中央部
近傍の電解液6c中の種々のイオンが、ストリップ３の板
幅方向両側部において消費され、電解液中のイオン濃度
が、ストリップ３の板幅方向において不均一となり、ス
トリップ３の中央部の電流効率が低くなる。これは、電
流効率がイオン供給量に依存するためである。As a result, various ions in the electrolytic solution 6c near the center of the strip 3 in the plate width direction are consumed on both sides in the plate width direction of the strip 3, and the ion concentration in the electrolytic solution is reduced. It becomes uneven in the width direction, and the current efficiency at the center of the strip 3 decreases. This is because the current efficiency depends on the ion supply amount.
【００１７】また、この現象は、めっき槽の電極間めっ
き液流路にめっき液供給ノズル、めっき液循環装置を有
しない竪型電気めっき装置、すなわち、電極間のめっき
液の更新がストリップの高速通板により行われる竪型電
気めっき装置において問題となる。また、電極4a、4b、
4c、4dとして不溶性陽極を用いた場合、めっき成分であ
る金属のイオンおよび助剤のイオンが液流によって運ば
れるため、液流の不均一分布によってストリップ３の板
幅方向において、めっき付着量の不均一が生じ、問題と
なる。Also, this phenomenon is caused by a vertical type electroplating apparatus which does not have a plating solution supply nozzle and a plating solution circulating device in the plating solution flow path between the electrodes of the plating tank. This poses a problem in a vertical electroplating apparatus performed by passing a sheet. Also, the electrodes 4a, 4b,
When insoluble anodes are used as 4c and 4d, metal ions as plating components and ions of auxiliary agents are carried by the liquid flow. Non-uniformity occurs and becomes a problem.
【００１８】さらには、缶用材料などとして使用される
電気クロムめっき鋼板の製造におけるCrO3、H2SO4 含有
めっき浴では、該電解液の液流分布の均一化が重要とな
る。これは、この場合、電解液中のCrとH2SO4 とのイオ
ン濃度比によって電流効率が大きく異なり、液流分布が
不均一であると、該イオン濃度比の位置的不均一化が生
じ、その結果、ストリップ３の板幅方向においてCr析出
量に大きなばらつきが生じるためと考えられる。Further, in a plating bath containing CrO 3 and H 2 SO 4 used in the production of an electrochromic steel sheet used as a material for cans, it is important to make the distribution of the electrolytic solution uniform. This is because, in this case, the current efficiency greatly differs depending on the ion concentration ratio of Cr and H 2 SO 4 in the electrolytic solution, and if the liquid flow distribution is uneven, the position unevenness of the ion concentration ratio occurs. As a result, it is considered that a large variation occurs in the amount of Cr precipitated in the width direction of the strip 3.
【００１９】本発明は、前記問題点を解決するために、
竪型電気めっき装置の相対向する一対の板状電極の前記
ストリップ板幅方向の両側部を電気絶縁物で覆い、該電
極の両側部からの電解液の流入を阻止した竪型電気めっ
き装置および該装置を用いた電気クロムめっき方法であ
る。また、本発明においては、板状電極の板面に、スト
リップの板幅方向に、複数個の電解液流入口を設けるこ
とが好ましい。The present invention has been made in order to solve the above problems.
A vertical electroplating apparatus in which a pair of opposed plate-like electrodes of a vertical electroplating apparatus are covered with an electrical insulator on both sides in the strip plate width direction to prevent inflow of electrolyte from both sides of the electrodes; and This is an electrochromic plating method using the apparatus. In the present invention, it is preferable to provide a plurality of electrolyte inlets on the plate surface of the plate-like electrode in the width direction of the strip.
【００２０】また、この場合、より好ましくは、板状電
極の板面に、ストリップの進行方向10と交差する直線上
に、さらに好ましくは、ストリップの進行方向10と直交
する直線上に、複数個の電解液流入口を設けることが好
ましい。これは、本構成とすることにより、ストリップ
の板幅方向における電解液の液流分布（液の流れ方向お
よび流速分布）がストリップの進行方向10に平行かつ均
一となるためである。In this case, more preferably, a plurality of strips are formed on the plate surface of the plate-like electrode on a straight line intersecting with the traveling direction 10 of the strip, and more preferably on a straight line orthogonal to the traveling direction 10 of the strip. Is preferably provided. This is because, with this configuration, the liquid flow distribution (liquid flow direction and flow velocity distribution) of the electrolytic solution in the strip width direction becomes parallel and uniform to the strip traveling direction 10.
【００２１】本発明の電気めっき装置に用いられる電極
の一例を、図１および図２に断面図で示す。なお、図１
は電解液流入口が存在しない箇所で切断した断面図を示
し、図２は、電解液流入口が存在する箇所で切断した断
面図を示す。図１および図２において、７は電気絶縁
物、８は電解液流入口を示し、他の符号は図６、図７と
同一の内容を示す。One example of an electrode used in the electroplating apparatus of the present invention is shown in a sectional view in FIGS. FIG.
Shows a cross-sectional view cut at a location where no electrolyte inlet exists, and FIG. 2 shows a cross-sectional view cut at a location where an electrolyte inlet exists. 1 and 2, reference numeral 7 denotes an electric insulator, 8 denotes an electrolyte inlet, and other reference numerals denote the same contents as in FIGS.
【００２２】なお、図１および図２においては、ストリ
ップ３の進行方向と直交する直線上に、３個の円形の電
解液流入口８が設けられている。図１および図２に示さ
れるように、本発明においては、相対向する電極4a、4
b、および電極4c、4dの電極板の両側の側面を、電気絶
縁物７で覆い、好ましくは、該電極板の板面に、ストリ
ップ板幅方向に複数個のめっき液流入口８を設け、スト
リップ３の走行する電極部の電解液流路の断面形状を矩
形とすることが好ましい。In FIGS. 1 and 2, three circular electrolyte inlets 8 are provided on a straight line perpendicular to the traveling direction of the strip 3. As shown in FIGS. 1 and 2, in the present invention, opposed electrodes 4 a and 4
b, and the side surfaces on both sides of the electrode plates of the electrodes 4c and 4d are covered with an electric insulator 7, and preferably, a plurality of plating solution inlets 8 are provided on the plate surface of the electrode plate in the width direction of the strip plate. It is preferable that the cross-sectional shape of the electrolytic solution flow path of the electrode portion on which the strip 3 runs is rectangular.
【００２３】これは、本構成とすることにより、ストリ
ップ３の板幅方向両端部近傍の電解液の流れの方向が、
ストリップ３の進行方向と平行となり、また電解液の流
速がストリップ３の板幅方向において均一となるためで
ある。本発明における前記電気絶縁物としては、ブチル
ゴム、クロロスルホン化ポリエチレンゴム、フッ素ゴム
などの耐酸性のゴム、塩化ビニル樹脂などの耐酸性の樹
脂、セラミックなどの電気絶縁性材料から構成される電
気絶縁物が例示され、耐酸性の電気絶縁性材料から構成
される電気絶縁物が好ましい。With this configuration, the flow direction of the electrolyte near the both ends in the width direction of the strip 3 is
This is because the direction becomes parallel to the traveling direction of the strip 3 and the flow rate of the electrolyte becomes uniform in the width direction of the strip 3. As the electric insulator in the present invention, butyl rubber, chlorosulfonated polyethylene rubber, acid-resistant rubber such as fluorine rubber, acid-resistant resin such as vinyl chloride resin, electric insulating material such as ceramics and the like. An electric insulator composed of an acid-resistant electric insulating material is preferable.
【００２４】本発明の電気めっき装置は、前記した構成
とすることによって、ストリップ板幅方向の両側からの
電解液の流入を阻止し、図１、図２に例示される電極4
a、4b、4c、4dに設けられた電解液の流入口８から、電
解液６が、図２に示す方向にしたがって電極4a、4bとス
トリップ３で形成される各々の電解液流路および電極4
c、4dとストリップ３で形成される各々の電解液流路に
流れ込む。The electroplating apparatus according to the present invention, having the above-described configuration, prevents the inflow of the electrolyte from both sides in the width direction of the strip plate, and allows the electrode 4 illustrated in FIGS.
From the electrolyte inlets 8 provided in the a, 4b, 4c, 4d, the electrolyte 6 is formed by the electrodes 4a, 4b and the strip 3 in the direction shown in FIG. Four
The electrolyte flows into each of the electrolyte channels formed by c, 4d and strip 3.
【００２５】各々の電解液流路に流れ込んだ電解液は、
電極4a、4b間および電極4c、4d間のストリップ３近傍に
おいて、図３に示すように、ストリップ３の進行方向10
にほぼ平行に流れ、ストリップ板幅方向Ｗにおいて均一
な流速の流れとなる。これに伴い、従来の、ストリップ
の板幅方向の両側からめっき液が流入した場合の、スト
リップ板幅方向中心部の電解液の更新が板幅両側部に比
べて不足する現象が解消され、ストリップ板幅方向にお
いて均一なめっき液の更新、すなわちイオンの供給が可
能となった。The electrolyte flowing into each of the electrolyte channels is:
In the vicinity of the strip 3 between the electrodes 4a and 4b and between the electrodes 4c and 4d, as shown in FIG.
And flows at a uniform velocity in the strip plate width direction W. Along with this, the conventional phenomenon that when the plating solution flows in from both sides in the width direction of the strip, the renewal of the electrolyte in the center portion in the width direction of the strip is insufficient compared with the both sides of the width of the strip, is solved. This makes it possible to uniformly update the plating solution in the width direction of the plate, that is, to supply ions.
【００２６】この結果、本発明の電気めっき装置によれ
ば、電流効率がストリップ板幅方向で均一となり、板幅
方向で均一なめっき付着量を得ることが可能となった。
さらに、本発明によれば、ストリップの板幅方向中央部
の電流効率が向上するため、電力使用量を削減できる。
また、本発明の装置は、前記板状電極が不溶性陽極であ
る竪型電気めっき装置に好ましく適用される。As a result, according to the electroplating apparatus of the present invention, the current efficiency becomes uniform in the strip plate width direction, and it is possible to obtain a uniform plating adhesion amount in the plate width direction.
Further, according to the present invention, the current efficiency at the center in the width direction of the strip is improved, so that the power consumption can be reduced.
The apparatus of the present invention is preferably applied to a vertical electroplating apparatus in which the plate-like electrode is an insoluble anode.
【００２７】これは、ストリップ板幅方向における電解
液の液流の方向がストリップの進行方向にほぼ平行とな
り、電解液のストリップ板幅方向における流量分布が均
一となり、めっき成分である金属のイオンの濃度が板幅
方向に均一となるためと考えられる。本発明における不
溶性陽極としては、Ti、Ta、Nb、Zr、Hf、V 、Mo、W ま
たはそれらの合金などの導電性基体の表面上にIr、Pt、
Ruなどの白金族金属やIrO2などそれらの酸化物を被覆し
た電極が好ましく例示される。This is because the direction of the flow of the electrolytic solution in the width direction of the strip plate is substantially parallel to the traveling direction of the strip, the distribution of the flow rate of the electrolytic solution in the width direction of the strip plate becomes uniform, It is considered that the density becomes uniform in the plate width direction. As the insoluble anode in the present invention, on the surface of a conductive substrate such as Ti, Ta, Nb, Zr, Hf, V, Mo, W or an alloy thereof, Ir, Pt,
An electrode coated with a platinum group metal such as Ru or an oxide thereof such as IrO 2 is preferably exemplified.
【００２８】さらに本発明の装置は、電気クロムめっき
に好ましく適用される。これは、本発明の装置を用いる
ことにより、電解液中のCrとH2SO4 とのイオン濃度比
が、ストリップ板幅方向において均一となり、イオン濃
度比に依存する電流効率が板幅方向に均一となるためと
考えられる。本発明の装置は、より好ましくは、電解液
組成がCrO3濃度：10〜100g/l、H2SO 4 濃度： 0.1〜１g/
l 、ライン速度：50〜600m.p.m. の電気クロムめっきに
好ましく適用される。Further, the apparatus according to the present invention can be used for electrochromic plating.
It is preferably applied to It uses the device of the present invention
As a result, Cr and HTwoSOFourIon concentration ratio with
Is uniform in the width direction of the strip
Current efficiency depending on the power ratio becomes uniform in the plate width direction.
Conceivable. The device of the present invention is more preferably an electrolytic solution
The composition is CrOThreeConcentration: 10-100g / l, HTwoSO FourConcentration: 0.1-1g /
l, Line speed: 50-600m.p.m. for electrochrome plating
It is preferably applied.
【００２９】[0029]
【実施例】以下、本発明を実施例により具体的に説明す
る。冷延鋼帯をアルカリ脱脂、硫酸電解酸洗を行った
後、図４に示す竪型電気めっき装置を用い、下記めっき
条件下で連続電気クロムめっきを行った。なお、図４に
示す竪型電気めっき装置において、電極4a、4bおよび電
極4c、4dで構成される電解液６の流路はいずれも、図
１、図２に示される電極4a（4c）、4b（4d）、電気絶縁
物７から構成される流路とした。The present invention will be described below in more detail with reference to examples. After the cold-rolled steel strip was subjected to alkali degreasing and sulfuric acid electrolytic pickling, continuous electrochromic plating was performed using the vertical electroplating apparatus shown in FIG. 4 under the following plating conditions. In the vertical electroplating apparatus shown in FIG. 4, the flow paths of the electrolyte 6 composed of the electrodes 4a and 4b and the electrodes 4c and 4d are all the electrodes 4a (4c) shown in FIGS. 4b (4d), a flow path composed of the electric insulator 7.
【００３０】また、各電極4a〜4dとしては、Tiを導電性
基体とする不溶性電極を使用し、電気絶縁物の材質とし
ては、塩化ビニル樹脂を使用した。 めっき浴組成：CrO3 50g/l、H2SO4 0.4g/l めっき浴温度：40℃ 電流密度 ：40A/dm2 ライン速度 ：400m.p.m. 得られたクロムめっき鋼帯の鋼帯板幅方向の金属Cr析出
効率を図５に示す。Further, as each of the electrodes 4a to 4d, an insoluble electrode having Ti as a conductive base was used, and as a material of the electric insulator, a vinyl chloride resin was used. Plating bath composition: CrO 3 50 g / l, H 2 SO 4 0.4 g / l Plating bath temperature: 40 ° C. Current density: 40 A / dm 2 Line speed: 400 m.pm Width direction of the obtained chrome-plated steel strip FIG. 5 shows the metal Cr deposition efficiency.
【００３１】また、従来の図７に示す電極を用いた場合
の金属Cr析出効率を図５に併せて示す。なお、図５に示
す金属Cr析出効率ηは、下記式(1) から求めた。 η＝〔（Ｓ・ｔ）／（Ｊ・Ｌ）〕×１８６（％）・・・・・(1) ここで、Ｓ：ライン速度〔 m/min〕、ｔ：鋼帯片面当た
りのめっき付着量〔g/m2 〕、Ｊ：電流密度〔 A/d
m2〕、Ｌ：通電されためっきパス長さ〔ｍ〕を示す。FIG. 5 also shows the metal Cr deposition efficiency when the conventional electrode shown in FIG. 7 is used. The metal Cr deposition efficiency η shown in FIG. 5 was obtained from the following equation (1). η = [(St) / (JL)] × 186 (%) (1) where, S: line speed [m / min], t: plating adhesion per one side of steel strip Amount [g / m 2 ], J: Current density [A / d
m 2 ], L: The length [m] of the energized plating path.
【００３２】図５に示されるように、本発明をクロムメ
ッキに適用することにより、金属Crの析出効率が鋼帯板
幅方向で均一になることが分かる。As shown in FIG. 5, it can be seen that by applying the present invention to chromium plating, the precipitation efficiency of metallic Cr becomes uniform in the width direction of the steel strip.
【００３３】[0033]
【発明の効果】電解液流路における電解液の流れに着目
して達成された本発明によれば、竪型電解槽を用いて電
気めっきを施す場合に、電極間の電解液の流れを金属ス
トリップ板幅方向に均一化でき、これによりストリップ
板幅方向において、電流効率が均一化され、めっき付着
量を均一化することが可能となった。According to the present invention achieved by paying attention to the flow of the electrolytic solution in the electrolytic solution flow path, when electroplating is performed using a vertical electrolytic cell, the flow of the electrolytic solution between the electrodes is made of metal. It was possible to make uniform in the width direction of the strip plate, whereby the current efficiency was made uniform in the width direction of the strip plate, and it became possible to make the amount of plating applied uniform.
【００３４】また、ストリップの板幅方向中央部の電流
効率が上昇したため、結果的に電力使用量を削減できる
といった効果も有する。In addition, since the current efficiency at the center of the strip in the plate width direction is increased, there is an effect that the power consumption can be reduced as a result.
【図１】本発明の竪型電気めっき装置に用いられる電極
の一例を示す断面図である。FIG. 1 is a sectional view showing an example of an electrode used in a vertical electroplating apparatus of the present invention.
【図２】本発明の竪型電気めっき装置に用いられる電極
の電極間断面における電解液の流れを示す模式図であ
る。FIG. 2 is a schematic diagram showing a flow of an electrolytic solution in a cross section between electrodes of an electrode used in a vertical electroplating apparatus of the present invention.
【図３】本発明の竪型電気めっき装置に用いられる電極
の電極表面における電解液の流れを示す模式図である。FIG. 3 is a schematic diagram showing a flow of an electrolytic solution on an electrode surface of an electrode used in the vertical electroplating apparatus of the present invention.
【図４】本発明の竪型電気めっき装置の一例を示す側面
図である。FIG. 4 is a side view showing an example of the vertical electroplating apparatus of the present invention.
【図５】クロムめっき鋼帯の鋼帯板幅方向の金属Cr析出
効率を示すグラフである。FIG. 5 is a graph showing the metal Cr precipitation efficiency of a chromium-plated steel strip in the width direction of the steel strip.
【図６】従来の竪型電気めっき装置を示す側面図であ
る。FIG. 6 is a side view showing a conventional vertical electroplating apparatus.
【図７】従来の竪型電気めっき装置に用いられる電極を
示す側面図である。FIG. 7 is a side view showing an electrode used in a conventional vertical electroplating apparatus.
【図８】従来の竪型電気めっき装置の電極表面における
電解液の流れを示す模式図である。FIG. 8 is a schematic diagram showing a flow of an electrolytic solution on an electrode surface of a conventional vertical electroplating apparatus.
１ 通電ロール ２ シンクロール ３ 鋼帯 ４、4a、4b、4c、4d 電極 ５ 電解槽 ６ 電解液 ７ 電気絶縁体 ８ めっき液流入口 10 ストリップ進行方向 6f 新しい電解液 6c ストリップの板幅方向中央部近傍の電解液 Ｆ 電解液流線 Ｗ ストリップの板幅方向 DESCRIPTION OF SYMBOLS 1 Current supply roll 2 Sink roll 3 Steel strip 4, 4a, 4b, 4c, 4d Electrode 5 Electrolyzer 6 Electrolyte 7 Electric insulator 8 Plating solution inlet 10 Strip traveling direction 6f New electrolyte 6c Central part of strip width direction Nearby electrolyte F Electrolyte streamline W Strip width direction
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平７−90684（ＪＰ，Ａ) 特開 平３−97895（ＪＰ，Ａ) 実開 平３−96353（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) C25D 5/00 - 7/12 C25D 17/12,21/10 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-7-90684 (JP, A) JP-A-3-97895 (JP, A) JP-A-3-96353 (JP, U) (58) Survey Field (Int.Cl. 7 , DB name) C25D 5/00-7/12 C25D 17 / 12,21 / 10
Claims (5)
型電気めっき槽に浸漬し、前記ストリップを挟んで該ス
トリップの表面、裏面のそれぞれに相対して対称位置に
一対の板状電極を配置し、電解によってめっきを施す竪
型電気めっき装置において、相対する板状電極の前記ス
トリップ板幅方向の両側部を電気絶縁物で覆い、該電極
の両側部からの電解液の流入を阻止したことを特徴とす
る竪型電気めっき装置。1. A metal strip is immersed in a vertical electroplating tank filled with an electrolytic solution, and a pair of plate-like electrodes are arranged at symmetrical positions with respect to the front and back surfaces of the strip with the strip interposed therebetween. Then, in the vertical electroplating apparatus for performing plating by electrolysis, both sides of the opposite plate-shaped electrode in the width direction of the strip plate are covered with an electric insulator to prevent the inflow of the electrolyte from both sides of the electrode. A vertical electroplating apparatus characterized by the following.
の板幅方向に、複数個の電解液流入口を設けた請求項１
記載の竪型電気めっき装置。2. A plurality of electrolyte inlets are provided on a plate surface of the plate-like electrode in a plate width direction of the strip.
The vertical type electroplating apparatus as described in the above.
１または２記載の竪型電気めっき装置。3. The vertical electroplating apparatus according to claim 1, wherein the plate-like electrode is an insoluble anode.
る電解液流路の断面形状が矩形である請求項１〜３いず
れかに記載の竪型電気めっき装置。4. The vertical electroplating apparatus according to claim 1, wherein a cross-sectional shape of the electrolytic solution flow path surrounded by the plate-shaped electrode and the electric insulator is rectangular.
めっき装置を用いて、クロムメッキを行うことを特徴と
する電気クロムめっき方法。5. An electrochromic plating method, wherein chromium plating is performed using the vertical electroplating apparatus according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8102549A JP3027118B2 (en) | 1996-04-24 | 1996-04-24 | Vertical electroplating apparatus and electrochrome plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8102549A JP3027118B2 (en) | 1996-04-24 | 1996-04-24 | Vertical electroplating apparatus and electrochrome plating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09291396A JPH09291396A (en) | 1997-11-11 |
| JP3027118B2 true JP3027118B2 (en) | 2000-03-27 |
Family
ID=14330337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8102549A Expired - Fee Related JP3027118B2 (en) | 1996-04-24 | 1996-04-24 | Vertical electroplating apparatus and electrochrome plating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3027118B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114686955B (en) * | 2020-12-29 | 2024-02-27 | 矽磐微电子(重庆)有限公司 | Anode assembly, electroplating device and manufacturing method of anode assembly |
-
1996
- 1996-04-24 JP JP8102549A patent/JP3027118B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09291396A (en) | 1997-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6979391B1 (en) | Method and device for the electrolytic treatment of electrically conducting structures which are insulated from each other and positioned on the surface of electrically insulating film materials and use of the method | |
| KR100729973B1 (en) | Method and device for the electrolytic treatment of electrically conducting surfaces of mutually isolated sheet and foil material pieces | |
| JP3027118B2 (en) | Vertical electroplating apparatus and electrochrome plating method | |
| JPH10310900A (en) | Apparatus for electrodepositing metallic layer on band plate | |
| JP3467954B2 (en) | Continuous electroplating method for metal strip | |
| JPH0338352B2 (en) | ||
| KR101421783B1 (en) | Electro plating equipment using virtual cathode | |
| JPH07228992A (en) | Plating method and device therefor | |
| US3856653A (en) | Platinum clad tantalum anode assembly | |
| JP2938358B2 (en) | Electrolytic pickling equipment | |
| JP3178373B2 (en) | Continuous electroplating method and equipment | |
| JPH0730690Y2 (en) | Split type insoluble electrode for electroplating | |
| JPS5915997B2 (en) | Strip proximity electrolyzer | |
| JP3411762B2 (en) | Electroplating equipment | |
| JP3855336B2 (en) | Continuous electrolytic etching equipment | |
| JP2812648B2 (en) | Electroplating equipment | |
| JPH036394A (en) | Horizontal plating bath | |
| JP2000290800A (en) | Electrolytic cleaning method and device for steel strip | |
| JPH04157198A (en) | Method for power feeding to continuous coloring device | |
| JPH07173695A (en) | Electroplating device using gas diffusion electrode | |
| JPS6145719B2 (en) | ||
| JPS59123797A (en) | Electrode used for surface treatment of band sheet | |
| JPS61295400A (en) | Electric plating method for metallic strip | |
| JPH03503069A (en) | How to remove fern patterns during electroplating of metal strips | |
| JPH06264288A (en) | Electroplating device for metallic strip using electrolyte jet |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080128 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090128 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090128 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100128 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110128 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120128 Year of fee payment: 12 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130128 Year of fee payment: 13 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130128 Year of fee payment: 13 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140128 Year of fee payment: 14 |
|
| LAPS | Cancellation because of no payment of annual fees |