JP2953287B2 - Method for manufacturing magnetic recording medium having irregularities on its surface - Google Patents
Method for manufacturing magnetic recording medium having irregularities on its surfaceInfo
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- JP2953287B2 JP2953287B2 JP33541693A JP33541693A JP2953287B2 JP 2953287 B2 JP2953287 B2 JP 2953287B2 JP 33541693 A JP33541693 A JP 33541693A JP 33541693 A JP33541693 A JP 33541693A JP 2953287 B2 JP2953287 B2 JP 2953287B2
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- recording medium
- magnetic
- magnetic recording
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- substrate
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Description
【０００１】[0001]
【産業上の利用分野】本発明は磁気記録装置に用いられ
る磁気記録媒体の製造方法に関し、さらに詳述すると磁
気ヘッドとの摩擦摺動特性が向上した磁気記録媒体の製
造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magnetic recording medium used in a magnetic recording apparatus, and more particularly to a method of manufacturing a magnetic recording medium having improved frictional sliding characteristics with a magnetic head.
【０００２】[0002]
【従来の技術】現在コンピューター等の記録装置として
普及しているハードディスクドライブには，磁気記録媒
体（磁気ディスク）の停止時に磁気ヘッドが磁気ディス
クに接触し，起動初期に磁気ヘッドが磁気ディスク上を
摺動し，そののちに磁気ディスクを離れて浮上し，一定
距離で飛行するといういわゆるＣＳＳ（コンタクトース
タートーストップ）方式が多く採用されている。このと
きに磁気ヘッドと磁気ディスクの摩擦係数を下げるため
に、磁気ディスク表面に微細な凹凸を形成することが行
われている。この微細凹凸は摩擦係数を十分に下げると
共に、磁気ヘッドは飛行状態にあるとき、この凹凸にぶ
つからないことが要求される。従来、この微細凹凸の形
成には、回転する非磁性基板上に研磨砥粒等を押し当て
て円周方向にキズを形成する方法が行われていた。また
磁気ヘッドのより低浮上な飛行を要求される磁気ディス
クでは、例えば非磁性基板を加熱し、Ａｌ等の低融点金
属薄膜を島状構造を形成するように被覆することによ
り、表面凹凸を形成する方法が提案されている（特開平
３ー７３４１９号公報）。また、非磁性基板表面上に金
属薄膜を形成した後、加熱して微細凝集粒からなる膜に
して、表面凹凸を形成する方法が提案されている（特開
平５ー８５７７３号公報）。さらに融点が３５０℃以下
の低融点金属をその融点以上に加熱した基板上に、被覆
して液滴状の金属粒子とする方法が提案されている（特
開平５ー２８２６４８号公報）。2. Description of the Related Art In a hard disk drive which is now widely used as a recording device for a computer or the like, a magnetic head comes into contact with a magnetic disk when a magnetic recording medium (magnetic disk) is stopped, and the magnetic head moves over the magnetic disk in an early stage of startup. A so-called CSS (contact-start-stop) method of sliding, flying away from a magnetic disk, and flying at a certain distance is often used. At this time, in order to reduce the friction coefficient between the magnetic head and the magnetic disk, fine irregularities are formed on the surface of the magnetic disk. These fine irregularities are required to sufficiently lower the friction coefficient, and the magnetic head is required not to hit the irregularities when in a flying state. Conventionally, in order to form the fine unevenness, a method has been used in which abrasive grains or the like are pressed against a rotating non-magnetic substrate to form scratches in the circumferential direction. In the case of a magnetic disk that requires a lower flying height of the magnetic head, for example, a non-magnetic substrate is heated and a low-melting point metal thin film such as Al is coated so as to form an island structure, thereby forming surface irregularities. (Japanese Patent Laid-Open Publication No. 3-73419). Further, a method has been proposed in which a metal thin film is formed on the surface of a non-magnetic substrate and then heated to form a film made of fine aggregated particles to form surface irregularities (JP-A-5-85773). Further, a method has been proposed in which a low-melting-point metal having a melting point of 350 ° C. or lower is coated on a substrate heated to a temperature equal to or higher than the melting point to form droplet-shaped metal particles (Japanese Patent Laid-Open No. 5-282648).
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、ガラ
ス、セラミックス等の脆性がなく、硬度の大きな基板で
は、従来技術の研磨砥粒で円周方向にキズを形成する方
法では、基板が欠け易いという問題点があり、またその
表面凹凸形状を精密に制御することができず、ＣＳＳ特
性と磁気ヘッドの低浮上特性の両方を同時に満たすこと
は非常に難しいという問題点があった。However, in the case of a substrate which is not brittle and has high hardness, such as glass and ceramics, the conventional method of forming scratches in the circumferential direction with abrasive grains is problematic in that the substrate is easily chipped. There is a problem that the surface irregularities cannot be precisely controlled, and it is very difficult to satisfy both the CSS characteristics and the low flying characteristics of the magnetic head at the same time.
【０００４】また、前述した高温に加熱された基板上に
島状構造の凹凸形成物を形成する方法では、その表面凹
凸の大きさや周期が小さく、また凸部の高さの分布が揃
いすぎているために，摩擦係数がそれほど小さくなら
ず、ＣＳＳ特性は必ずしも満足なものではないという問
題点があった。またこのような島状構造を形成させるた
めには成膜時の基板温度をかなり高い温度に保持しなく
てはならず，特に生産性の高い基板搬送型の成膜装置に
おいては基板加熱ゾーンから成膜ゾーンに至るまでの基
板温度の低下、基板内の温度分布が悪くなるなどの問題
点があった。本発明はこのような問題点を解決するため
になされたものである。Further, in the above-described method for forming an uneven structure having an island structure on a substrate heated to a high temperature, the size and period of the surface unevenness are small, and the distribution of the heights of the protrusions is too uniform. Therefore, there is a problem that the friction coefficient is not so small and the CSS characteristics are not always satisfactory. In addition, in order to form such an island-like structure, the substrate temperature during film formation must be maintained at a relatively high temperature. There have been problems such as a decrease in the substrate temperature up to the film formation zone and a deterioration in the temperature distribution in the substrate. The present invention has been made to solve such a problem.
【０００５】[0005]
【課題を解決するための手段】本発明は、保護層表面に
凹凸を付与するための凹凸形成物を非磁性基板上に形成
し、その後下地層、磁性層、保護層を順次形成して磁気
記録媒体を製造する方法において、前記凹凸形成物を形
成するに先立ち、前記非磁性基板上に非磁性基板の表面
エネルギーを減少させる層を設け、次いで前記凹凸形成
物を、（ａ）共晶点を有する２種以上の金属からなる連
続薄膜を前記表面エネルギーを減少させる層の上に被覆
し、（ｂ）その後前記金属からなる連続薄膜を加熱によ
り分離凝集させる、ことにより形成することを特徴とす
る表面に凹凸形状を有する磁気記録媒体の製造方法であ
る。According to the present invention, a concavo-convex structure for providing concavities and convexities on the surface of a protective layer is formed on a non-magnetic substrate, and then an underlayer, a magnetic layer, and a protective layer are sequentially formed to form a magnetic layer. In the method for manufacturing a recording medium, the unevenness-formed product is formed.
Prior to forming the surface of the non-magnetic substrate on the non-magnetic substrate
Providing an energy-reducing layer, and then coating the unevenness-formed product with (a) a continuous thin film of two or more metals having a eutectic point on the surface energy-reducing layer ; A method for producing a magnetic recording medium having an uneven surface, wherein the continuous thin film made of a metal is separated and aggregated by heating.
【０００６】本発明は、低い共晶点を有する共晶系の多
成分金属の薄膜が、その融点や共晶点近傍またはそれ以
上に加熱された場合、その原子間の結合がルーズな溶融
状態となり、容易にその形状が変化できる状態で相分離
を起こさせ、全体の状態エネルギーの中で界面及び表面
エネルギーの割合が大きい平坦な薄膜から、より界面及
び表面エネルギーの割合が小さな液滴状に凝集させるこ
とを特徴としている。そして、非磁性基板の表面と平行
な方向に連続した金属薄膜を加熱する前の初期段階の薄
膜は、その膜厚が薄ければ薄いほど，全体の中での界面
及び表面エネルギーの割合が大きいため、溶融状態及び
凝集過程は、バルクの状態での融点あるいは共晶点より
かなり低い温度（具体的にはバルクの融点のその絶対温
度で１／２〜２／３程度の温度）で起こり得る。また、
この表面及び界面エネルギーの割合を大きくする観点か
ら，初期の薄膜はいわゆる島状構造とならない連続膜で
ある方が望ましい。このような連続金属膜は、低い基板
温度で成膜する、たとえば強制的に加熱しない室温度で
成膜することによって得ることができる。According to the present invention, when a thin film of a eutectic multi-component metal having a low eutectic point is heated to a temperature near or above its melting point or eutectic point, the bonds between its atoms are loose. Causes phase separation in a state where its shape can be easily changed, and from a flat thin film with a large ratio of interface and surface energy to the whole state energy, to a droplet with a smaller ratio of interface and surface energy It is characterized by aggregation. The thin film in the initial stage before heating a metal thin film continuous in a direction parallel to the surface of the nonmagnetic substrate has a larger interface and surface energy ratio in the whole as the film thickness is smaller. Therefore, the melting state and the aggregation process can occur at a temperature considerably lower than the melting point or the eutectic point in the bulk state (specifically, about 1/2 to 2/3 of the absolute melting point of the bulk). . Also,
From the viewpoint of increasing the ratio of the surface and interface energy, it is preferable that the initial thin film is a continuous film that does not have a so-called island structure. Such a continuous metal film can be obtained by forming a film at a low substrate temperature, for example, by forming a film at a room temperature that is not forcibly heated.
【０００７】用いる金属膜としては、バルク状態での融
点が６６０℃であるＡｌを室温のソーダライムガラス基
板に５〜１０ｎｍほど成膜し、これを４５０℃まで加熱
したが、磁気ディスクの表面凹凸を形成するのに必要な
表面形状を有する凹凸形成物（テクスチャー）は形成で
きなかった。これ以上の加熱温度はガラス基板の変形を
伴う危険性があり，また基板表面からのガス放出が多く
なるため実用生産の観点からして好ましくない。As a metal film to be used, Al having a melting point of 660 ° C. in a bulk state is formed on a soda lime glass substrate at room temperature to a thickness of 5 to 10 nm and heated to 450 ° C. A textured article having a surface shape required to form a film could not be formed. If the heating temperature is higher than this, there is a risk that the glass substrate is deformed, and more gas is released from the substrate surface, which is not preferable from the viewpoint of practical production.
【０００８】一方、共晶点を有する２成分系または３成
分以上の系の合金においては、その共晶点組成近傍であ
れば，その融点は各成分の金属単体の融点よりもはるか
に低くなることはよく知られている。例えばＡｌ、Ｇｅ
の各単体のバルクでの融点はそれぞれ６６０℃、９３６
℃であるが、その共晶点（Ａｌ：Ｇｅ＝７１．６：２
８．４、原子％比）では、その融点は４２０℃程度まで
低くなる。そこでこのような共晶点近傍の組成を有する
各成分が微視的に十分混じり合った、例えば非晶質のよ
うな連続膜を形成し，これを加熱すれば溶融、凝集が起
きる。そしてこの場合、凝集過程と同時に各共晶系成分
の相分離が同時に起きる。On the other hand, in an alloy of a two-component system or a system of three or more components having an eutectic point, the melting point is much lower than the melting point of a single metal of each component if the composition is near the eutectic point composition. It is well known. For example, Al, Ge
The melting point of each element in bulk was 660 ° C. and 936
° C, but its eutectic point (Al: Ge = 71.6: 2
8.4 (atomic% ratio), the melting point decreases to about 420 ° C. Thus, a continuous film such as an amorphous film in which the components having such a composition near the eutectic point are sufficiently mixed microscopically, for example, is formed, and when heated, melting and aggregation occur. In this case, phase separation of each eutectic component occurs simultaneously with the aggregation process.
【０００９】合金の共晶点が５００℃以下となるように
合金系を選ぶことは、たとえばソーダライムシリカ組成
のフロートガラスの非磁性基板が軟化変形しない温度で
溶融、凝集を起こさせるので好ましい。なかでも、主成
分金属をＡｌとするＡｌーＧｅ、ＡｌーＭｇの２成分系
またはそれらを含む多成分系の金属系は、共晶点の温度
が室温度以上５００℃以下であり、しかもそれらの金属
の連続膜を加熱することにより生ずる凝集が組成的な相
分離を伴って起きるので好ましい。本発明においては、
Ａｌを主成分とし、ＧｅまたはＭｇを副成分とする系が
好ましく、主成分のＡｌが６０〜８０原子％、副成分が
２０〜４０原子％含む連続膜を被覆するのが好ましい。It is preferable to select an alloy system such that the eutectic point of the alloy is 500 ° C. or lower, since a nonmagnetic substrate of, for example, a float glass having a soda lime silica composition is melted and agglomerated at a temperature at which softening deformation does not occur. Among them, the binary system of Al-Ge or Al-Mg containing Al as the main component metal or the multi-component system containing them has a eutectic point temperature of room temperature or higher and 500 ° C. or lower. Aggregation caused by heating the continuous film of metal is preferred because it involves compositional phase separation. In the present invention,
A system containing Al as a main component and Ge or Mg as a subcomponent is preferable, and it is preferable to coat a continuous film containing 60 to 80 at% of the main component Al and 20 to 40 at% of the subcomponent.
【００１０】本発明にかかる連続薄膜の加熱温度は、共
晶点の温度である共晶温度よりも１５０℃低い温度より
も高くすることが、短時間に凝集をおこさせる上で好ま
しい。本発明においては、金属薄膜の厚みを４〜２０ｎ
ｍとし、その後加熱により凹凸形成物の高さを２５〜１
００ｎｍとするのが好ましい。The heating temperature of the continuous thin film according to the present invention is preferably higher than a temperature lower by 150 ° C. than the eutectic temperature which is the temperature of the eutectic point, in order to cause aggregation in a short time. In the present invention, the thickness of the metal thin film is set to 4 to 20 n.
m, and then the height of the unevenness formed by heating is 25 to 1
It is preferably set to 00 nm.
【００１１】さらに、非磁性基板がガラス基板であると
き、凹凸形成物を形成するに先立ち、凹凸形成物の凝集
状態を調整するために、基板の表面エネルギーを減少さ
せる層を設けることが必要である。かかる表面エネルギ
ーを減少させる層としては、ＴｉやＴｉ−Ｃｒ合金の層
が好ましく用いられる。Further, when the nonmagnetic substrate is a glass substrate, it is necessary to provide a layer for reducing the surface energy of the substrate in order to adjust the cohesion state of the unevenness forming material before forming the unevenness forming material. There is . As the layer for reducing the surface energy, a layer of Ti or a Ti—Cr alloy is preferably used.
【００１２】[0012]
【作用】本発明にかかる２成分以上の金属からなる基板
面方向に連続した金属被膜は、その系の共晶点以上に加
熱され冷却されることにより相分離を伴って凝集し、連
続膜から離散的に基板上に配置された形状の凹凸形成物
になる。この凹凸形成物の表面形状に影響を受けて磁気
記録媒体の保護層表面は凹凸が形成される。According to the present invention, a continuous metal film composed of two or more metals in the direction of the substrate surface is heated and cooled to a temperature higher than the eutectic point of the system, and aggregates with phase separation to form a continuous film. It becomes a concavo-convex formed product having a shape discretely arranged on the substrate. Irregularities are formed on the surface of the protective layer of the magnetic recording medium under the influence of the surface shape of the irregularities.
【００１３】[0013]
【実施例】以下、実施例により本発明を詳細に説明す
る。図２は本発明の実施例の一部断面図（模式的に表現
されている）である。図２は、ガラス基板１上に表面エ
ネルギーを減少させるための層７が形成されており、そ
の上にＡｌとＧｅからなる凹凸形成物２が形成され、そ
の上にＴｉ下地層４、Ｃｒ下地層５、磁性層６、保護層
３が形成され、保護層３の表面には凹凸形成物２に基因
する凹凸が形成されている。The present invention will be described below in detail with reference to examples. FIG. 2 is a partial cross-sectional view (schematically represented) of an embodiment of the present invention. FIG. 2 shows a structure in which a layer 7 for reducing surface energy is formed on a glass substrate 1, a concavo-convex structure 2 made of Al and Ge is formed thereon, and a Ti underlayer 4 and a Cr underlayer are formed thereon. The ground layer 5, the magnetic layer 6, and the protective layer 3 are formed, and the surface of the protective layer 3 is formed with unevenness due to the unevenness forming material 2.
【００１４】実施例１ 良く洗浄された室温状態のソーダライムシリカ組成のガ
ラス基板（円盤状に加工され化学強化されたもの）１に
４５原子％のＣｒを含むＴｉ膜を２０ｎｍ形成し、その
上にＡｌ71.6Ｇｅ28.4（原子％）をスパッタリングター
ゲットとし、アルゴンを用いたＤＣマグネトロンスパッ
タ法により連続してＡｌＧｅ膜２を約１０ｎｍ成膜し
た。次にこの基板を３００℃に保持されたヒーター直前
に３分間保持し、この後Ｔｉ膜を同様な方法で約３０ｎ
ｍ成膜し、さらに３５０℃に保持さ れたヒーター前に３
分間保持し、この後、Ｃｒ膜、ＣｏＮｉＣｒ膜、カーボ
ン膜をそれぞれ１２０ｎｍ、５６ｎｍ、２０ｎｍの厚さ
で順次成膜した。以上のプロセスは、すべて同一の真空
槽内で真空を破らずに行った。次にこの基板を取り出
し、液体潤滑剤を約３ｎｍ塗布し、磁気ディスクを得
た。この磁気ディスクの一部断面図を図２に示す。この
磁気ディスクの表面凹凸を走査トンネル顕微鏡で測定し
たところ、その平均粗さで約６．０ｎｍとなっていた。
上で述べたような膜構成で、ただ、Ｃｒを含むＴｉ膜及
びＡｌＧｅ膜を形成しなかった場合の値（２．０ｎｍ）
に比べ、確実に表面凹凸が形成されていることが確認さ
れた。次に磁気ヘッドのこの基板上での浮上特性を調べ
たところ、７０ｎｍまでは磁気ヘッドが磁気ディスク上
の突起物に衝突することなく安定に浮上走行することが
わかった。最後にこの磁気ディスクをヘッド荷重を６．
５ｇとしたマイクロスライダーを用いてＣＳＳ試験にか
けたところ、２万回での静止摩擦係数が０．４、動摩擦
係数０．３程度ときわめて良好な摩擦摺動特性を示し
た。 Example 1 A well-cleaned glass substrate 1 of a soda lime silica composition at room temperature (which is processed into a disk shape and chemically strengthened) 1 is prepared.
A Ti film containing 45 atomic% of Cr is formed to a thickness of 20 nm.
Using Al 71.6 Ge 28.4 (atomic%) as a sputtering target, an AlGe film 2 was continuously formed to a thickness of about 10 nm by a DC magnetron sputtering method using argon. Next, the substrate was held for 3 minutes immediately before the heater held at 300 ° C., and thereafter the Ti film was formed for about 30 n in the same manner.
m, and before heating at 350 ° C. , 3
After that, the Cr film, CoNiCr film,
Thicknesses of 120 nm, 56 nm and 20 nm, respectively.
Were sequentially formed. All of the above processes use the same vacuum
Performed without breaking vacuum in the tank. Then take out this board
And apply a liquid lubricant of about 3 nm to obtain a magnetic disk.
Was. FIG. 2 shows a partial cross-sectional view of this magnetic disk. this
Measure the surface irregularities of the magnetic disk with a scanning tunneling microscope.
As a result, the average roughness was about 6.0 nm.
With the film configuration as described above, only the Ti film containing Cr and
When no Al and AlGe films are formed (2.0 nm)
It was confirmed that surface irregularities were formed more reliably than
Was. Next, check the flying characteristics of the magnetic head on this substrate
Up to 70nm, the magnetic head is on the magnetic disk
Floats stably without colliding with other projections
all right. Finally, the magnetic disk was loaded with a head load of 6.
Using a 5g micro slider for CSS testing
The coefficient of static friction at 20,000 times is 0.4, the dynamic friction
Very good frictional sliding characteristics with coefficient of about 0.3
Was.
【００１５】[0015]
比較例１Comparative Example 1
良く洗浄された室温状態のソーダライムシリカ組成のガClean and clean soda lime silica at room temperature
ラス基板（円盤状に加工された化学強化されたもの）１Lath substrate (disk-shaped, chemically strengthened) 1
にＡｌTo Al
71.671.6
ＧｅGe
28.428.4
（原子％）をスパッタリングターゲ(Atomic%) sputtering target
ットとし、アルゴンガスを用いＤＣスパッタリング法にAnd DC sputtering using argon gas
よりＡｌＧｅ膜２を約５ｎｍ成膜した。次に同じ真空槽Then, an AlGe film 2 was formed to a thickness of about 5 nm. Next, the same vacuum chamber
内でこの基板を３５０℃に保持されたヒーター前に３分Within 3 minutes before heating the substrate maintained at 350 ° C.
間保持し、この後Ｔｉ膜を同様な方法でチタンターゲッAfter that, the Ti film is titanium-targeted in the same manner.
トを用いて３０ｎｍ成膜し、さらに３５０℃に保持されFilm is formed to a thickness of 30 nm, and further maintained at 350 ° C.
たヒーター前に３分間保持し、この後、Ｃｒ膜，ＣｏＮThe heater is held for 3 minutes before heating.
ｉＣｒ膜，カーボン膜をそれぞれ１２０ｎｍ、５６ｎiCr film and carbon film are 120 nm and 56 n respectively.
ｍ、２０ｎｍの厚さに、クロム、コバルトニッケルクロChromium, cobalt nickel chloride
ム合金、カーボンをターゲットに用いて順次成膜した。Films were sequentially formed using a metal alloy and carbon as targets.
以上のプロセスはすべて同一の真空槽内で真空を破らずAll of the above processes do not break the vacuum in the same vacuum chamber
に行った。次にこの基板を取り出し、液体潤滑剤を約３I went to. Next, the substrate is taken out, and about 3 liquid lubricant is applied.
ｎｍ塗布し、磁気ディスクを得た。この磁気ディスクのnm to obtain a magnetic disk. This magnetic disk
断面構造の模式図を図１に示す。この磁気ディスクの表FIG. 1 shows a schematic diagram of the cross-sectional structure. Table of this magnetic disk
面凹凸を走査トンネル顕微鏡で測定したところ、その平When the surface roughness was measured with a scanning tunneling microscope,
均粗さで約４．５ｎｍ程度となっており、上で述べたよThe average roughness is about 4.5 nm, as described above.
うな膜構成で、ただＡｌＧｅ膜を形成しなかった場合のIn the case where the AlGe film is not formed
値（２．０ｎｍ）に比べ、表面凹凸は形成されていた。The surface irregularities were formed as compared with the value (2.0 nm).
次にこのThen this
磁気ディスクをヘッド荷重を６．５ｇとしたマA magnetic disk with a head load of 6.5 g was used.
イクロスライダーを用いてＣＳＳ試験にかけたところ、When I went through a CSS test using a micro slider,
２万回での静止摩擦係数が０．６、動摩擦係数０．５程Static friction coefficient at 20,000 times is about 0.6, dynamic friction coefficient is about 0.5
度の摩擦摺動特性を示した。Degree of friction sliding characteristics.
【００１６】[0016]
比較例２Comparative Example 2
良く洗浄された室温状態のソーダライムシリカ組成のガClean and clean soda lime silica at room temperature
ラス基板（円盤状に加工された化学強化されたもの）にFor lath substrates (disk-shaped, chemically reinforced)
ＡｌAl
3333
ＺｎZn
6767
（原子％）をスパッタリングターゲットと(Atomic%) with the sputtering target
し、アルゴンガスを用いたＤＣマグネトロンスパッタ法Magnetron sputtering using argon gas
によりＡｌＺｎ膜を約５ｎｍ成膜した。次に同じ真空槽As a result, an AlZn film of about 5 nm was formed. Next, the same vacuum chamber
内でこの基板を３５０℃に保持されたヒーター前に３分Within 3 minutes before heating the substrate maintained at 350 ° C.
間保持し、この後Ｔｉ膜を同様な方法で約３０ｎｍ成膜After that, a Ti film is formed to a thickness of about 30 nm by the same method.
し、さらに３５０℃に保持されたヒーター前に３分間保And then hold for 3 minutes before heating at 350 ° C.
持し、この後、Ｃｒ膜，ＣｏＮｉＣｒ膜，カーボン膜をThen, a Cr film, a CoNiCr film, and a carbon film are formed.
それぞれ１２０ｎｍ、５６ｎｍ、２０ｎｍの厚さで順次120nm, 56nm, 20nm thickness respectively
成膜した。以上のプロセスはすべて同一の真空槽内で真A film was formed. All of the above processes are performed in the same vacuum chamber.
空を破らずに行った。次にこの基板を取り出し、液体潤I went without breaking the sky. Next, take out the substrate and remove the liquid
滑剤を約３ｎｍ塗布し、磁気ディスクを得た。この磁気About 3 nm of a lubricant was applied to obtain a magnetic disk. This magnet
ディスクの表面凹凸を走査トンネル顕微鏡で測定したとThe surface roughness of the disk was measured with a scanning tunneling microscope.
ころ、その平均粗さで約４．５ｎｍとなっていた。次にAt this time, the average roughness was about 4.5 nm. next
この磁気ディスクをヘッド荷重を６．５ｇとしたマイクMicrophone with a head load of 6.5 g for this magnetic disk
ロスライダーを用いてＣＳＳ試験にかけたところ、２万The result of the CSS test using Rossrider was 20,000
回での静止摩擦係数が０．７、動摩擦係数０．６程度のCoefficient of static friction at the time of 0.7, dynamic friction coefficient of about 0.6
摩擦摺動特性を示した。It showed friction sliding characteristics.
【００１７】[0017]
【発明の効果】本発明によれば、磁気ヘッドとの摩擦摺
動特性及び低浮上特性に優れた磁気記録媒体を得るのに
必要な磁気記録媒体の表面の凹凸形状を、非磁性基板表
面に表面エネルギーを減少させる層を形成し、次にその
上に薄膜形成及び加熱というプロセスにより、その後に
行う下地層、磁性層、保護層の形成と連続して行うこと
ができる。According to the present invention, the unevenness of the surface of the magnetic recording medium required to obtain a magnetic recording medium having excellent friction sliding characteristics with the magnetic head and low flying characteristics is formed on the non-magnetic substrate surface. Form a layer that reduces surface energy and then
The process of forming a thin film and heated to above may be carried out subsequent to the base layer for the magnetic layer, continuously with the formation of the protective layer.
【図１】本発明と異なる膜構成である磁気ディスクの比
較例の一部断面図である。FIG. 1 shows the ratio of a magnetic disk having a film configuration different from that of the present invention .
It is a partial sectional view of a comparative example.
【図２】本発明により得られた磁気ディスクの一実施例
の一部断面図である。FIG. 2 is a partial sectional view of one embodiment of a magnetic disk obtained by the present invention.
１・・・ガラス基板、２・・・凹凸形成物、３・・・保
護層、４・・・Ｔｉ層、５・・・下地層、６・・・磁性
層、７・・・表面エネルギーを減少させる層DESCRIPTION OF SYMBOLS 1 ... Glass substrate, 2 ... Unevenness formation thing, 3 ... Protective layer, 4 ... Ti layer, 5 ... Underlayer, 6 ... Magnetic layer, 7 ... Surface energy Layers to reduce
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) G11B 5/84 G11B 5/72 G11B 5/82 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) G11B 5/84 G11B 5/72 G11B 5/82
Claims (5)
形成物を非磁性基板上に形成し、その後下地層、磁性
層、保護層を順次形成して磁気記録媒体を製造する方法
において、前記凹凸形成物を形成するに先立ち、前記非
磁性基板上に非磁性基板の表面エネルギーを減少させる
層を設け、次いで前記凹凸形成物を、（ａ）共晶点を有
する２種以上の金属からなる連続薄膜を前記表面エネル
ギーを減少させる層の上に被覆し、（ｂ）その後前記金
属からなる連続薄膜を加熱により分離凝集させる、こと
により形成することを特徴とする表面に凹凸形状を有す
る磁気記録媒体の製造方法。1. A method for manufacturing a magnetic recording medium, comprising: forming a concavo-convex forming material for providing concavities and convexities on a surface of a protective layer on a non-magnetic substrate, and then sequentially forming an underlayer, a magnetic layer, and a protective layer; Prior to forming the irregularities, the non-
Reduce surface energy of non-magnetic substrate on magnetic substrate
A layer is provided, and then the above-mentioned unevenness-formed product is subjected to (a) a continuous thin film comprising two or more metals having a eutectic point by the surface energy
A method for producing a magnetic recording medium having an uneven surface, wherein the method comprises: (b) coating a continuous thin film of the metal by heating to separate and agglomerate the thin film.
上５００℃以下の温度である請求項１に記載の表面に凹
凸形状を有する磁気記録媒体の製造方法。2. The eutectic point created by the metal system is below room temperature.
2. The method according to claim 1, wherein the temperature is 500 ° C. or less.
タニウムとクロムの合金層とする請求項１または請求項
２に記載の表面に凹凸形状を有する磁気記録媒体の製造
方法。 3. The method of claim 2, wherein the surface energy reducing layer is
2. The method according to claim 1, wherein the alloy layer comprises a titanium and chromium alloy layer.
2. Manufacture of a magnetic recording medium having an uneven shape on the surface according to 2.
Method.
分がＧｅおよびＭｇからなる金属群から選ばれた少なく
とも１種である請求項１乃至請求項３のいずれかの項に
記載の表面に凹凸形状を有する磁気記録媒体の製造方
法。Wherein the main component of said metal is Al, according to any one of claims 1 to claim 3 is at least one other component selected from a metal group consisting of Ge and Mg A method for manufacturing a magnetic recording medium having an uneven surface.
が２０〜４０原子％含まれる請求項１乃至請求項４のい
ずれかの項に記載の表面に凹凸形状を有する磁気記録媒
体の製造方法。5. The method according to claim 1, wherein the metal comprises Al and Ge.
There method of manufacturing a magnetic recording medium having a concavo-convex shape on a surface thereof according to any one of claims 1 to claim 4 contained 20-40 atomic%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33541693A JP2953287B2 (en) | 1993-12-28 | 1993-12-28 | Method for manufacturing magnetic recording medium having irregularities on its surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33541693A JP2953287B2 (en) | 1993-12-28 | 1993-12-28 | Method for manufacturing magnetic recording medium having irregularities on its surface |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07192260A JPH07192260A (en) | 1995-07-28 |
| JP2953287B2 true JP2953287B2 (en) | 1999-09-27 |
Family
ID=18288312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33541693A Expired - Lifetime JP2953287B2 (en) | 1993-12-28 | 1993-12-28 | Method for manufacturing magnetic recording medium having irregularities on its surface |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998012698A1 (en) * | 1996-09-20 | 1998-03-26 | Hitachi, Ltd. | Magnetic disk medium, magnetic head, magnetic disk apparatus using them, and production method of the disk apparatus |
| JP2004152466A (en) | 2002-10-07 | 2004-05-27 | Sharp Corp | Magnetic recording medium and magnetic recording device using the same |
| JP5894780B2 (en) * | 2011-12-13 | 2016-03-30 | 昭和電工株式会社 | Method for manufacturing magnetic recording medium |
| JP5665785B2 (en) * | 2012-03-22 | 2015-02-04 | 株式会社東芝 | Perpendicular magnetic recording medium and magnetic recording / reproducing apparatus |
| JP6109655B2 (en) | 2013-06-27 | 2017-04-05 | 株式会社東芝 | Magnetic recording medium and magnetic recording / reproducing apparatus |
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1993
- 1993-12-28 JP JP33541693A patent/JP2953287B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07192260A (en) | 1995-07-28 |
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