JP2776708B2 - Method of applying coating liquid on substrate surface - Google Patents

Method of applying coating liquid on substrate surface

Info

Publication number
JP2776708B2
JP2776708B2 JP30953992A JP30953992A JP2776708B2 JP 2776708 B2 JP2776708 B2 JP 2776708B2 JP 30953992 A JP30953992 A JP 30953992A JP 30953992 A JP30953992 A JP 30953992A JP 2776708 B2 JP2776708 B2 JP 2776708B2
Authority
JP
Japan
Prior art keywords
substrate
coating liquid
coating
applicator roll
applying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP30953992A
Other languages
Japanese (ja)
Other versions
JPH06138662A (en
Inventor
幸隆 葛川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP30953992A priority Critical patent/JP2776708B2/en
Publication of JPH06138662A publication Critical patent/JPH06138662A/en
Application granted granted Critical
Publication of JP2776708B2 publication Critical patent/JP2776708B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Coating Apparatus (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、フォトマスク用のガラ
ス基板、液晶表示装置用のガラス基板等の角型基板に対
して、フォトレジスト液とかポリイミド樹脂とかカラー
フィルタ材などの塗布液を塗布して均一な薄膜を形成す
るために、アプリケータロールの外周面に塗布液を供給
し、水平方向にアプリケータロールと相対的に移動され
る基板の表面にアプリケータロールを回転させて塗布液
を塗布する基板表面への塗布液塗布方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of applying a coating liquid such as a photoresist liquid, a polyimide resin or a color filter material to a square substrate such as a glass substrate for a photomask and a glass substrate for a liquid crystal display. In order to form a uniform thin film, the coating liquid is supplied to the outer peripheral surface of the applicator roll, and the coating liquid is rotated by rotating the applicator roll on the surface of the substrate which is moved relatively to the applicator roll in the horizontal direction. The present invention relates to a method for applying a coating liquid to a substrate surface on which is applied.

【0002】[0002]

【従来の技術】上述のような塗布液を塗布するものとし
ては、従来、実開平2−133470号公報に開示され
ているものが知られている。この公知例では、ドクター
ロールとコーティングロール(アプリケータロール)と
の間に塗布液を貯留する塗布液貯留部を形成し、コーテ
ィングロールを一定速度で回転することにより塗布液貯
留部からコーティングロールの外周面に膜状に塗布液を
付着させ、その下方で水平方向に搬送される基板に塗布
液を塗布するように構成されている。
2. Description of the Related Art As a method for applying a coating solution as described above, a method disclosed in Japanese Utility Model Laid-Open Publication No. 2-133470 is known. In this known example, a coating liquid storing section for storing a coating liquid is formed between a doctor roll and a coating roll (applicator roll), and the coating roll is rotated from the coating liquid storing section by rotating the coating roll at a constant speed. The coating liquid is applied to the outer peripheral surface in the form of a film, and the coating liquid is applied to a substrate conveyed horizontally below the coating liquid.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、従来例
の場合に、基板の搬送方向後端縁において、コーティン
グロールと基板とが離間して塗布液の塗布が終了すると
きに、コーティングロールに付着した塗布液と基板側に
塗布付着された塗布液とが引張り合い、その張力によっ
て切られ、その切れた部分が張力によって基板の搬送方
向後端縁側に戻され、その基板搬送方向後端縁における
塗布膜の膜厚が、例えば、基板の搬送方向中央部分に比
べて 1.5〜3倍程度にもなるといったように他の部分よ
りも厚くなる。そして、上述のように膜厚が厚くなる
と、塗布液としてフォトレジスト液を塗布するような場
合においては、塗布液塗布工程に続いて行われる密着焼
付け工程において、露光用マスクとの十分な密着性が得
られず、焼付け品質が低下する欠点があった。また、密
着焼付け工程後に行われる現像工程において、基板の搬
送方向後端縁で不要部位に現像残りを生じる欠点があっ
た。
However, in the case of the conventional example, when the coating roll is separated from the substrate at the trailing edge of the substrate in the transport direction and the application of the coating liquid is completed, the coating liquid adheres to the coating roll. The coating liquid and the coating liquid applied to and adhered to the substrate side are pulled and cut by the tension, and the cut portion is returned by the tension to the rear edge of the substrate in the transport direction of the substrate. The thickness of the film is larger than that of other portions, for example, about 1.5 to 3 times as large as that of the central portion in the transport direction of the substrate. When the film thickness is increased as described above, in a case where a photoresist liquid is applied as a coating liquid, sufficient adhesion with an exposure mask is performed in an adhesion baking step performed subsequent to the coating liquid coating step. Was not obtained, and there was a defect that baking quality deteriorated. In addition, in the developing step performed after the close-contact baking step, there is a drawback that an undeveloped portion is left at an unnecessary portion at a rear edge of the substrate in the transport direction.

【0004】本発明は、このような事情に鑑みてなされ
たものであって、基板の搬送方向後端縁で膜厚が厚くな
ることを防止できるようにすることを目的とする。
The present invention has been made in view of such circumstances, and an object of the present invention is to prevent a film thickness from increasing at a trailing edge in a transport direction of a substrate.

【0005】[0005]

【課題を解決するための手段】本発明は、上述のような
目的を達成するために、アプリケータロールの外周面に
塗布液を供給し、水平方向にアプリケータロールと相対
的に移動される基板の表面にアプリケータロールを回転
させて塗布液を塗布する基板表面への塗布液塗布方法に
おいて、基板の移動方向後端側に、基板の後端面にその
全幅にわたるとともに基板の厚み以上で密着させて、基
板の移動方向に長さの有る塗布補助具を配置し、基板と
塗布補助具とを一体的に移動させて、それらの表面にア
プリケータロールで塗布液を塗布することを特徴として
いる。
According to the present invention, in order to achieve the above object, a coating liquid is supplied to an outer peripheral surface of an applicator roll, and the applicator roll is moved in a horizontal direction relative to the applicator roll. Rotating the applicator roll on the surface of the substrate to apply the coating liquid In the method of applying the coating liquid to the substrate surface, the rear end of the substrate in the moving direction is in close contact with the rear end of the substrate over its entire width and at least the thickness of the substrate Then, a coating aid having a length is arranged in the moving direction of the substrate, the substrate and the coating aid are moved integrally, and the coating liquid is applied to the surface thereof with an applicator roll. I have.

【0006】[0006]

【作用】本発明の基板表面への塗布液塗布方法の構成に
よれば、基板の後端面に塗布補助具を密着させることに
より、アプリケータロールによる塗布を終了する位置を
基板の後端縁からずらし、塗布補助具に対して塗布を終
了させ、塗布補助具上において膜厚を厚くならせ、最終
的に塗布補助具を取り外すことにより、基板表面で膜厚
の厚い部分が存在することを回避できる。
According to the structure of the method for applying a coating liquid to the substrate surface of the present invention, the position at which the application by the applicator roll is completed can be moved from the rear edge of the substrate by bringing the coating aid into close contact with the rear end surface of the substrate. Shift, finish the application to the coating aid, increase the film thickness on the coating aid, and finally remove the coating aid to avoid the existence of thick parts on the substrate surface it can.

【0007】[0007]

【実施例】次に、本発明の実施例を図面に基づいて詳細
に説明する。
Next, an embodiment of the present invention will be described in detail with reference to the drawings.

【0008】図1は、本発明に係る基板表面への塗布液
塗布方法の実施に用いるロールコータの実施例を示す一
部切欠全体側面図、図2はその全体平面図、図3は要部
の拡大側面図であり、基台1の上部に、水平方向に往復
移動可能に基板搬送ステージ2が設けられ、基台1に、
その基板搬送方向下手側の水平方向の第1の軸芯P1周
りで上下揺動可能に支持枠3が設けられるとともに、そ
の支持枠3に、前記第1の軸芯P1に近い箇所で水平方
向の第2の軸芯P2周りで上下揺動可能に上部支持枠4
が設けられている。
FIG. 1 is a partially cutaway side view showing an embodiment of a roll coater used for carrying out a method of applying a coating liquid to a substrate surface according to the present invention, FIG. 2 is an overall plan view thereof, and FIG. FIG. 2 is an enlarged side view of FIG. 1, wherein a substrate transfer stage 2 is provided on a top of a base 1 so as to be able to reciprocate in a horizontal direction.
A support frame 3 is provided so as to be able to swing up and down around a first shaft center P1 in the horizontal direction on the lower side in the substrate transfer direction, and the support frame 3 is provided with a horizontal direction at a position close to the first shaft center P1. Of the upper support frame 4 so as to be able to swing up and down around the second axis P2.
Is provided.

【0009】上部支持枠4に、周面が平滑な金属製のメ
タルロール5と、塗布液剪断用の段差部6,6によって
周面がほぼ円弧状に形成されたメタルドクタ7とが水平
方向の軸芯周りで回転可能に並設されている。
A metal roll 5 made of a metal having a smooth peripheral surface and a metal doctor 7 having a peripheral surface formed in a substantially arc shape by step portions 6 and 6 for shearing a coating liquid are provided on an upper support frame 4 in a horizontal direction. They are arranged side by side so as to be rotatable around the axis.

【0010】メタルロール5の外周面とメタルドクタ7
の外周面とが所定の隙間を介して近接配置され、この両
外周面によって塗布液を貯留する塗布液貯留部8が形成
されている。そして、メタルロール5に対してメタルド
クタ7を水平方向に相対移動させることによってメタル
ロール5の外周面とメタルドクタ7の外周面との間に形
成される隙間の大きさを調整することができ、塗布液貯
留部8に貯留される塗布液の粘度等に応じてその隙間を
調整するように構成されている。
The outer peripheral surface of the metal roll 5 and the metal doctor 7
Are arranged close to each other with a predetermined gap therebetween, and a coating liquid storing section 8 for storing the coating liquid is formed by the two outer peripheral surfaces. By moving the metal doctor 7 relative to the metal roll 5 in the horizontal direction, the size of the gap formed between the outer peripheral surface of the metal roll 5 and the outer peripheral surface of the metal doctor 7 can be adjusted. The gap is adjusted according to the viscosity of the coating liquid stored in the liquid storing section 8.

【0011】塗布液貯留部8には、その先端が塗布液中
に浸入する状態で攪拌手段兼用の塗布液供給ノズル9が
設けられるとともに、この塗布液供給ノズル9が、メタ
ルロール5の長手方向と平行な姿勢で架設されたロッド
レスシリンダ(図示せず)によって移動可能に設けら
れ、その移動に伴って塗布液貯留部8に貯留された塗布
液を攪拌するとともに、塗布液貯留部8に塗布液を供給
できるように構成されている。
The coating liquid storage section 8 is provided with a coating liquid supply nozzle 9 which also serves as a stirring means with its tip penetrating into the coating liquid. Is provided so as to be movable by a rodless cylinder (not shown) erected in a posture parallel to the above, and agitates the application liquid stored in the application liquid storage unit 8 with the movement thereof, and It is configured to be able to supply a coating liquid.

【0012】メタルロール5の横側方には、スクレーパ
10とトレイ11とが設けられ、塗布液貯留部8に貯留
されて一旦メタルロール5の外周面に付着しつつも角型
基板Wに塗布されずにメタルロール5の外周面に残存付
着したままの残留塗布液を回収するように構成されてい
る。
A scraper 10 and a tray 11 are provided on the lateral side of the metal roll 5. The scraper 10 and the tray 11 are stored in a coating liquid storage section 8 and temporarily adhere to the outer peripheral surface of the metal roll 5 while being applied to the square substrate W. Instead, it is configured to collect the remaining coating liquid remaining and adhered to the outer peripheral surface of the metal roll 5.

【0013】支持枠3の基板搬送方向上手側箇所に、外
周面の表層部分が平滑で弾性を有するブチル系ゴム製の
アプリケータロール12が水平方向の軸芯周りで回転可
能に取り付けられ、メタルロール5がアプリケータロー
ル12に対して相対的に遠近するとともに両者の近接箇
所では近接する面が互いに逆方向に移動するよう両ロー
ル5,12は同方向に回転し、メタルロール5の外周面
に付着して塗布液貯留部8から供給されてくる塗布液を
アプリケータロール12に転写するように構成されてい
る。
An applicator roll 12 made of butyl rubber having a smooth outer peripheral surface and elasticity is rotatably mounted on the support frame 3 at a position on the upper side in the substrate transport direction so as to be rotatable about a horizontal axis. The rolls 5 and 12 rotate in the same direction so that the rolls 5 are relatively far from and away from the applicator roll 12 and the surfaces that are close to each other move in opposite directions in the vicinity of the two. The coating liquid supplied from the coating liquid storage unit 8 is transferred to the applicator roll 12.

【0014】基台1の角型基板Wの搬送方向両端の一方
側に基板搬入装置13が、そして、他方側に基板搬出装
置14がそれぞれ設けられている。基板搬入装置13お
よび基板搬出装置14それぞれは、角型基板Wを載置し
て搬送する基板搬送ローラ15…と、角型基板Wを真空
吸引によって吸着保持し基台1に対して遠近する方向に
移動可能でかつ昇降可能な基板吸着アーム16とから構
成されている。
A substrate carrying-in device 13 is provided on one side of both ends of the rectangular substrate W in the carrying direction of the base 1, and a substrate carrying-out device 14 is provided on the other side. The substrate carrying-in device 13 and the substrate carrying-out device 14 each include a substrate transport roller 15 for mounting and transporting the rectangular substrate W, and a direction in which the rectangular substrate W is sucked and held by vacuum suction and moved toward and away from the base 1. And a substrate suction arm 16 that can move up and down.

【0015】基板搬送ローラ15…それぞれにおいて、
角型基板Wの搬送方向に直交する方向での幅を規制する
鍔17が付設され、一方、基板搬入装置13において、
その搬送方向後端にストッパー18,18が設けられ、
基板搬送ローラ15…によって搬送されてきた角型基板
Wを搬送方向前端で所定の姿勢に維持させ、その角型基
板Wを基板吸着アーム16で吸着保持して上昇させ、基
板搬送ステージ2に搬入するように構成されている。
Each of the substrate transport rollers 15...
A flange 17 for regulating the width of the rectangular substrate W in a direction perpendicular to the transport direction is provided.
Stoppers 18, 18 are provided at the rear end in the transport direction,
The rectangular substrate W transported by the substrate transport rollers 15 is maintained in a predetermined posture at the front end in the transport direction, the rectangular substrate W is sucked and held by the substrate suction arm 16, lifted up, and loaded into the substrate transport stage 2. It is configured to be.

【0016】基板搬送ステージ2は、一対のガイド1
9,19によって搬送方向に水平移動可能に案内される
基板載置ステージ22を有し、この基板載置ステージ2
2はその上面に角型基板Wを載置するため、角型基板W
に比して、その搬送方向および搬送方向と直交する方向
において、より大きな寸法を有している。さらに、基板
載置ステージ22は、零点検出器付の正逆転可能な電動
モータ20によって回転させられるネジ21により、搬
送方向に水平移動させられるように構成されている。
The substrate transfer stage 2 includes a pair of guides 1.
A substrate mounting stage 22 which is guided by the substrates 9 and 19 so as to be horizontally movable in the transport direction;
2 is for mounting the rectangular substrate W on the upper surface thereof.
Has a larger dimension in the transport direction and a direction orthogonal to the transport direction. Furthermore, the substrate mounting stage 22 is configured to be horizontally moved in the transport direction by a screw 21 rotated by a forward / reverse rotatable electric motor 20 having a zero point detector.

【0017】次に、上述のように構成されたロールコー
タを用いて行う本発明に係る基板表面への塗布液塗布方
法について説明する。先ず、この方法に用いる塗布補助
具23について説明すれば、図4に示されるように、角
型基板Wと等しい厚みを有するとともにその移動方向に
所定の長さを有し、かつ、その長手方向長さが角型基板
Wの幅よりも長くなるように塗布補助具23が構成され
ている。
Next, a method of applying a coating liquid to a substrate surface according to the present invention, using a roll coater configured as described above, will be described. First, the coating aid 23 used in this method will be described. As shown in FIG. 4, it has a thickness equal to that of the rectangular substrate W, a predetermined length in the moving direction thereof, and The coating aid 23 is configured so that the length is longer than the width of the rectangular substrate W.

【0018】そして、図5の(a)および(b)の概略
側面図に示すように、基板搬入装置13側の基板吸着ア
ーム16によって基板載置ステージ22上に角型基板W
を搬入した後に、角型基板Wの移動方向後端側に、図5
の(c)の概略側面図、および、図4の概略斜視図に示
すように、角型基板Wの端面に側面を密着させるととも
に長手方向両端それぞれが角型基板Wの幅方向両端より
も突出する状態で塗布補助具23を配置し、その後に、
図5の(d)の概略側面図に示すように、角型基板Wと
塗布補助具23とを一体的に移動させて、それらの表面
にアプリケータロール12で塗布液を塗布する。
As shown in the schematic side views of FIGS. 5A and 5B, the rectangular substrate W is placed on the substrate mounting stage 22 by the substrate suction arm 16 of the substrate carrying-in device 13.
5 is moved to the rear end side of the rectangular substrate W in the moving direction.
As shown in the schematic side view of (c) and the schematic perspective view of FIG. 4, the side surface is brought into close contact with the end surface of the rectangular substrate W, and both ends in the longitudinal direction project from both ends in the width direction of the rectangular substrate W. The application aid 23 is arranged in a state where
As shown in the schematic side view of FIG. 5D, the rectangular substrate W and the coating aid 23 are moved integrally, and the coating liquid is applied to the surfaces thereof by the applicator roll 12.

【0019】塗布補助具23上にも塗布液を塗布して、
基板搬出装置14に対する受け渡し位置に移動した後、
塗布補助具23を取り外し、塗布液の塗布された角型基
板Wを基板搬出装置14側の基板吸着アーム16によっ
て搬出する。取り外された塗布補助具23は、塗布され
た塗布液を溶剤などによって洗浄除去して乾燥した後に
再使用される。
A coating solution is also applied on the coating aid 23,
After moving to the transfer position for the substrate unloading device 14,
The coating aid 23 is removed, and the rectangular substrate W coated with the coating liquid is unloaded by the substrate suction arm 16 on the substrate unloading device 14 side. The removed application aid 23 is reused after the applied application liquid is washed away with a solvent or the like and dried, and then reused.

【0020】以上の構成により、塗布液の膜厚が厚くな
った部分を有する塗布補助具23が取り外され、移動方
向後端縁まで均一な厚みで塗布液が塗られた状態の角型
基板Wを得ることができるのである。
With the above configuration, the coating aid 23 having the thickened portion of the coating liquid is removed, and the rectangular substrate W is coated with the coating liquid with a uniform thickness to the rear edge in the moving direction. Can be obtained.

【0021】図6は、本発明の基板表面への塗布液塗布
方法の別の実施例を示す概略側面図であり、基板載置ス
テージ22上に、角型基板Wの移動方向後端のみなら
ず、同じ構成の塗布補助具23aを移動方向前端にも配
置し、塗布液の塗布をその移動方向前端に配置した塗布
補助具23a上から開始するように構成されている。こ
の塗布補助具23aも塗布液の塗布終了に伴って取り外
し、洗浄処理後に再使用される。
FIG. 6 is a schematic side view showing another embodiment of the method of applying a coating liquid to the substrate surface according to the present invention. If only the rear end of the rectangular substrate W in the moving direction on the substrate mounting stage 22 is shown. Instead, the application assisting tool 23a having the same configuration is also arranged at the front end in the movement direction, and the application of the application liquid is started from the application assisting tool 23a arranged at the front end in the movement direction. The application aid 23a is also removed after the application of the application liquid is completed, and is reused after the cleaning process.

【0022】この別の実施例によれば、塗布液の塗布を
開始するためにアプリケータロール12を下降するとき
に、その下降位置を塗布補助具23a上にできるため、
開始初期に膜厚が変動することを回避するためにその下
降速度を精度良く制御するといったことが不用になる利
点がある。また、基板載置ステージ22を往復移動させ
て重ね塗りし、最初の移動方向とは逆方向に角型基板W
を移動させて塗布液の塗布を終了する場合にも対応でき
る利点がある。
According to this embodiment, when the applicator roll 12 is lowered to start the application of the coating liquid, the lowering position can be set on the coating aid 23a.
There is an advantage that it is not necessary to precisely control the descending speed in order to avoid the film thickness from changing at the beginning of the start. In addition, the substrate mounting stage 22 is reciprocated and re-applied, and the rectangular substrate W is moved in the direction opposite to the initial moving direction.
Is moved to complete the application of the application liquid.

【0023】図7は、本発明の基板表面への塗布液塗布
方法の更に別の実施例を示す概略側面図であり、角型基
板Wの複数個をベルト式搬送装置24などにより連続的
に搬送できるように構成し、隣合う角型基板W,W間そ
れぞれに塗布補助具23bを配置し、アプリケータロー
ル12の昇降回数を少なくして多数の角型基板Wに塗布
液を塗布できるようになっている。
FIG. 7 is a schematic side view showing still another embodiment of the method for applying a coating liquid to the substrate surface according to the present invention, in which a plurality of square substrates W are continuously transferred by a belt-type transfer device 24 or the like. It is configured to be able to be conveyed, and the coating aid 23b is arranged between each of the adjacent rectangular substrates W, so that the application liquid can be applied to a large number of square substrates W by reducing the number of times the applicator roll 12 moves up and down. It has become.

【0024】塗布補助具としては、図8の(a)の概略
側面図に示すように、その上面の移動方向後端側を下方
に向く傾斜面F1に構成した塗布補助具23cとか、あ
るいは、逆に、図8の(b)の概略側面図に示すよう
に、その上面の移動方向後端側を上方に向く傾斜面F2
に構成した塗布補助具23dなど、各種の構成のものが
使用できる。なお、塗布補助具の角型基板の移動方向後
端と接する部分の厚みは、角型基板の側面へ塗布液が流
れることを防止するために角型基板の厚みよりもわずか
に大きくした方がよい。
As shown in the schematic side view of FIG. 8 (a), the application aid is an application aid 23c having an inclined surface F1 with the rear end side of the upper surface in the moving direction facing downward, or Conversely, as shown in the schematic side view of FIG. 8B, the inclined surface F2 whose upper end faces the rear end side in the moving direction upward.
Various configurations such as the coating aid 23d configured as described above can be used. The thickness of the portion of the coating aid that is in contact with the rear end in the moving direction of the rectangular substrate should be slightly larger than the thickness of the rectangular substrate in order to prevent the coating liquid from flowing to the side surface of the rectangular substrate. Good.

【0025】本発明としては、上述実施例のロールコー
タに限らず、例えば、グラビアメタルロールによって塗
布液を供給するように構成したタイプのロールコータな
ど各種構成のロールコータを使用できる。
The present invention is not limited to the roll coater of the above-described embodiment, but may be any other type of roll coater such as a roll coater of a type configured to supply a coating liquid by a gravure metal roll.

【0026】[0026]

【発明の効果】以上説明したように、本発明の基板表面
への塗布液塗布方法によれば、塗布補助具上において膜
厚が厚くなるようにして、基板の後端縁で膜厚が厚くな
ることを回避するから、厚い膜厚に起因する焼付け品質
の低下や現像残りの発生を防止できて品質を向上でき
る。また、基板の後端縁で膜厚が厚くなることを回避す
るために、例えば、基板の移動速度を基板の後端縁側で
速くするとか、あるいは、アプリケータロールの回転速
度を速くし、基板の後端縁に対する塗布液供給量を少な
くして実質的に膜厚が厚くならないように構成する場合
であると、基板の後端縁が塗布位置に達したことを検出
するセンサや精度の良い速度制御が必要になるが、本発
明によれば、それらのセンサや制御が不用で構成が簡単
かつ安価にできる利点がある。
As described above, according to the method for applying a coating liquid to a substrate surface according to the present invention, the film thickness is increased on the coating aid at the rear edge of the substrate. Therefore, it is possible to prevent the deterioration of the printing quality and the generation of the undeveloped portion due to the thick film thickness, thereby improving the quality. Further, in order to avoid the film thickness increasing at the rear edge of the substrate, for example, the moving speed of the substrate is increased at the rear edge side of the substrate, or the rotation speed of the applicator roll is increased to increase the substrate speed. If the configuration is such that the coating liquid supply amount to the rear edge of the substrate is reduced so that the film thickness does not substantially increase, a sensor for detecting that the rear edge of the substrate has reached the coating position or a sensor with high accuracy Although speed control is required, according to the present invention, there is an advantage that these sensors and control are unnecessary, and the configuration can be simplified and inexpensive.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る基板表面への塗布液塗布方法の実
施に用いるロールコータの実施例を示す一部切欠全体側
面図である。
FIG. 1 is a partially cutaway overall side view showing an embodiment of a roll coater used for carrying out a method of applying a coating liquid to a substrate surface according to the present invention.

【図2】全体平面図である。FIG. 2 is an overall plan view.

【図3】要部の拡大側面図である。FIG. 3 is an enlarged side view of a main part.

【図4】本発明に用いられる塗布補助具の一実施例の要
部を示す斜視図である。
FIG. 4 is a perspective view showing a main part of one embodiment of a coating aid used in the present invention.

【図5】図4図示の塗布補助具を用いる、本発明に係る
基板表面への塗布液塗布方法の実施例を説明する要部の
概略側面図である。
5 is a schematic side view of an essential part for explaining an embodiment of a method for applying a coating liquid to a substrate surface according to the present invention using the coating aid shown in FIG. 4;

【図6】本発明に係る基板表面への塗布液塗布方法の別
の実施例を説明する要部の概略側面図である。
FIG. 6 is a schematic side view of an essential part for explaining another embodiment of the method for applying a coating liquid to a substrate surface according to the present invention.

【図7】本発明に係る基板表面への塗布液塗布方法の更
に別の実施例を説明する要部の概略側面図である。
FIG. 7 is a schematic side view of a main part for explaining still another embodiment of a method for applying a coating liquid to a substrate surface according to the present invention.

【図8】塗布補助具の変形例を示す概略側面図である。FIG. 8 is a schematic side view showing a modification of the application aid.

【符号の説明】[Explanation of symbols]

12…アプリケータロール 23…塗布補助具 W…角型基板 12: applicator roll 23: coating aid W: square substrate

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アプリケータロールの外周面に塗布液を
供給し、水平方向に前記アプリケータロールと相対的に
移動される基板の表面に前記アプリケータロールを回転
させて塗布液を塗布する基板表面への塗布液塗布方法に
おいて、 前記基板の移動方向後端側に、前記基板の後端面にその
全幅にわたるとともに基板の厚み以上で密着させて、前
記基板の移動方向に長さの有る塗布補助具を配置し、前
記基板と前記塗布補助具とを一体的に移動させて、それ
らの表面に前記アプリケータロールで塗布液を塗布する
ことを特徴とする基板表面への塗布液塗布方法。
1. A substrate for supplying a coating liquid to an outer peripheral surface of an applicator roll and applying the coating liquid by rotating the applicator roll on a surface of the substrate which is moved relatively to the applicator roll in a horizontal direction. In the method of applying a coating solution to a surface, a coating auxiliary having a length in the moving direction of the substrate is attached to the rear end of the substrate in the moving direction of the substrate by adhering to the rear end surface of the substrate over its entire width and not less than the thickness of the substrate. A coating solution is applied to the surface of the substrate by disposing a tool and integrally moving the substrate and the application assisting tool, and applying the coating solution to the surfaces thereof with the applicator roll.
JP30953992A 1992-10-22 1992-10-22 Method of applying coating liquid on substrate surface Expired - Lifetime JP2776708B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30953992A JP2776708B2 (en) 1992-10-22 1992-10-22 Method of applying coating liquid on substrate surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30953992A JP2776708B2 (en) 1992-10-22 1992-10-22 Method of applying coating liquid on substrate surface

Publications (2)

Publication Number Publication Date
JPH06138662A JPH06138662A (en) 1994-05-20
JP2776708B2 true JP2776708B2 (en) 1998-07-16

Family

ID=17994236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30953992A Expired - Lifetime JP2776708B2 (en) 1992-10-22 1992-10-22 Method of applying coating liquid on substrate surface

Country Status (1)

Country Link
JP (1) JP2776708B2 (en)

Also Published As

Publication number Publication date
JPH06138662A (en) 1994-05-20

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