JP2769035B2 - Mold for optical element molding - Google Patents

Mold for optical element molding

Info

Publication number
JP2769035B2
JP2769035B2 JP2268855A JP26885590A JP2769035B2 JP 2769035 B2 JP2769035 B2 JP 2769035B2 JP 2268855 A JP2268855 A JP 2268855A JP 26885590 A JP26885590 A JP 26885590A JP 2769035 B2 JP2769035 B2 JP 2769035B2
Authority
JP
Japan
Prior art keywords
mold
optical element
molding
film
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2268855A
Other languages
Japanese (ja)
Other versions
JPH04144930A (en
Inventor
健 川俣
靖弘 米田
雅浩 片白
一 市川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optic Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optic Co Ltd filed Critical Olympus Optic Co Ltd
Priority to JP2268855A priority Critical patent/JP2769035B2/en
Publication of JPH04144930A publication Critical patent/JPH04144930A/en
Application granted granted Critical
Publication of JP2769035B2 publication Critical patent/JP2769035B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06—Construction of plunger or mould
    • C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/10—Die base materials
    • C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/26—Mixtures of materials covered by more than one of the groups C03B2215/16 - C03B2215/24, e.g. C-SiC, Cr-Cr2O3, SIALON
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光学素子成形用型に関する。Description: TECHNICAL FIELD The present invention relates to an optical element molding die.

〔従来の技術〕[Conventional technology]

一般に、光学ガラスを加熱プレスにより所望の形状に
成形して光学素子を得ることが知られている。ところ
で、この加熱プレス手段による場合は、成形用型の離型
性の良いことが必要である。Generally, it is known that optical glass is formed into a desired shape by a hot press to obtain an optical element. By the way, in the case of using the heating press means, it is necessary that the mold has good releasability.

従来、この離型性が良好なものとして、例えば特開昭
61−197430号公報に開示されるように、窒化アルミニウ
ム（AlN）により成形面を形成した光学素子成形用型が
提案されている。これは、十分な硬度を有し、濡れ角が
大きくて離型性が良く、高温での成形加工においても優
れた離型性を示す。Conventionally, as a mold having good releasability, for example,
As disclosed in Japanese Patent Application Laid-Open No. 61-197430, there has been proposed an optical element molding die having a molding surface formed of aluminum nitride (AlN). It has a sufficient hardness, a large wetting angle and good releasability, and shows excellent releasability even at high temperature forming.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

しかし、光学素子の成形は、熱間で行われるため、従
来のようなAlNにより成形面を成形した光学素子成形用
型であっても、最表層は酸化されて酸化アルミニウム
（Al2O3）となる。Al2O3となっても十分な離型性を維持
することはできるのだが、使用していくうちにAl2O3の
結晶粒が次第に大きくなることによって、面粗度が大き
くなる等、光学素子成形用型に要求される表面特性を長
期間維持することができなかった。また、酸素が膜中に
拡散していくことにより、膜がもろくなってクラックが
入り、膜が剥離しやすくなるという問題も生じた。However, since the molding of the optical element is performed hot, even in a conventional optical element molding mold in which the molding surface is molded with AlN, the outermost layer is oxidized and aluminum oxide (Al 2 O 3 ) is formed. Becomes I can maintain the Al 2 O 3 even if sufficient releasing property, but by the crystal grains of Al 2 O 3 is gradually increases As you use, the surface roughness becomes large and the like, The surface characteristics required for the optical element molding die could not be maintained for a long time. In addition, the diffusion of oxygen into the film also causes a problem that the film becomes brittle, cracks occur, and the film is easily peeled.

本発明は、かかる従来の問題点に鑑みてなされたもの
で、酸化雰囲気中で光学素子の成形を行う場合であって
も、最表層に形成されるAl2O3の結晶粒の成長を抑制
し、長期間成形に使用しても必要な表面特性を維持する
ことができ、膜剥離も生じにくい光学素子成形用型を提
供することを目的とする。The present invention has been made in view of such conventional problems, and suppresses the growth of crystal grains of Al 2 O 3 formed on the outermost layer even when molding an optical element in an oxidizing atmosphere. However, an object of the present invention is to provide a mold for molding an optical element, which can maintain required surface characteristics even when used for molding for a long period of time and in which film peeling does not easily occur.

〔課題を解決するための手段〕[Means for solving the problem]

上記目的を達成するために、本発明は、成形用型の型
表面における結晶粒の成長を抑制するように、成形用型
の型表面に白金、イリジウム、オスミウム、パラジウ
ム、ロジウム、ルテリウム、金、銀又は銅の中から選択
された少なくとも一つの物質を分散して少なくとも光学
素子成形用型の成形面を形成した。具体的には、アルミ
ニウム（Al）及び窒素（Ｎ）を主成分とし、かつ白金
（Pt），イリジウム（Ir），オスミウム（Os），パラジ
ウム（Pd），ロジウム（Rh），金（Au），銀（Ag）又は
銅（Cu）の中から選択された少なくとも一つの物質を分
散した材料により光学素子成形用型の少なくとも成形面
を形成した。In order to achieve the above object, the present invention provides platinum, iridium, osmium, palladium, rhodium, ruthenium, gold, on the surface of a mold so as to suppress the growth of crystal grains on the surface of the mold. At least one material selected from silver or copper was dispersed to form at least a molding surface of an optical element molding die. Specifically, aluminum (Al) and nitrogen (N) are the main components, and platinum (Pt), iridium (Ir), osmium (Os), palladium (Pd), rhodium (Rh), gold (Au), At least the molding surface of the optical element molding die was formed of a material in which at least one substance selected from silver (Ag) or copper (Cu) was dispersed.

この光学素子成形用型の型表面は、熱間での光学ガラ
スの成形によって、酸化アルミニウムの中に上記物質を
分散して表面特性を維持する成形面を形成することにな
る。The mold surface of the mold for forming an optical element forms a molding surface which maintains the surface characteristics by dispersing the above-described substance in aluminum oxide by hot molding of the optical glass.

〔作 用〕(Operation)

既に述べたように、光学素子の成形は熱間で行われる
ため型表面は酸化される。その際、Pt,Ir,Os,Pd,Rh,Ru,
Au,Ag,Cuは極めて酸化されにくいため、Alが優先的に酸
化され、型表面はAl2O3で覆われることになる。Al2O3は
ガラスとの離型性が良く、ガラスを着色する等の問題を
生じることもないが、もし、Al2O3の結晶粒が成長して
大きくなると、前述のように面粗度悪化等の問題が生じ
る。As described above, since the molding of the optical element is performed hot, the mold surface is oxidized. At that time, Pt, Ir, Os, Pd, Rh, Ru,
Since Au, Ag, and Cu are extremely hard to be oxidized, Al is preferentially oxidized, and the mold surface is covered with Al 2 O 3 . Al 2 O 3 has good mold releasability from glass and does not cause problems such as coloring the glass.However, if Al 2 O 3 crystal grains grow and become large, Problems such as deterioration of the degree occur.

しかし、本発明では、Pt,Ir,Os,Pd,Rh,Ru,Au,Ag,Cuの
中から選択された少なくとも一つの物質が分散混合して
いるため、これらの元素が型表面具体的にはAl2O3の結
晶粒の成長を抑制、阻止する。また、これらの元素は極
めて酸化されにくいため、酸素が膜中に拡散して膜が劣
化し、剥離しやすくなるのを防止する効果も持つ。However, in the present invention, since at least one substance selected from Pt, Ir, Os, Pd, Rh, Ru, Au, Ag, and Cu is dispersed and mixed, these elements have a specific mold surface. Suppresses and prevents the growth of Al 2 O 3 crystal grains. In addition, since these elements are extremely hard to be oxidized, it also has an effect of preventing oxygen from diffusing into the film to cause deterioration of the film and easy peeling.

したがって、本発明の光学素子成形用型は、長寿命で
あり、結果として、ガラス成形レンズのコストを大幅に
低減することができる。Therefore, the mold for molding an optical element of the present invention has a long life, and as a result, the cost of the glass molded lens can be significantly reduced.

〔実 施 例〕〔Example〕

（第１実施例） 第１図に示すように、SiCセラミックスからなる基材
１を所望の最終製品に対応した形状と概略近い形状に加
工した後、CVDにより厚さ0.5mmのSiC被膜２を形成して
型基材３とした。そして、ダイヤモンド砥石を用いた研
削加工により所望の最終製品に対応した形状に加工し、
さらに光学的要求の生じる成形基礎面3aに鏡面研磨を施
した。First Embodiment As shown in FIG. 1, a substrate 1 made of SiC ceramics is processed into a shape substantially similar to a shape corresponding to a desired final product, and then a 0.5 mm-thick SiC film 2 is formed by CVD. It was formed as a mold substrate 3. And processed into a shape corresponding to the desired end product by grinding using a diamond whetstone,
Furthermore, the mirror surface was applied to the molding base surface 3a where optical requirements arise.

その成形基礎面3aに対し、AlNとIrの混合層からなる
成形面層４をRFスパッタリングにより形成した。これ
は、ターゲットとしてAlとIrとが90:10の割合で混合さ
れたものを使用し、窒化ガス雰囲気中でスパッタリング
をして作成した。この結果、形成面層４中には、Alが50
atm/％,Irが9atm/％,Nが35atm/％,Oが6atm/％存在し、A
lNの結晶が存在していることが確認された。A forming surface layer 4 composed of a mixed layer of AlN and Ir was formed on the forming base surface 3a by RF sputtering. This was prepared by using a target in which Al and Ir were mixed at a ratio of 90:10 as a target and performing sputtering in a nitriding gas atmosphere. As a result, in the formation surface layer 4, 50
Atm /%, Ir 9atm /%, N 35atm /%, O 6atm /%, A
It was confirmed that 1N crystals were present.

上記のようにして得られた本実施例の光学素子成形用
型、およびIr無添加のAlN膜をRFスパッタリングにより
形成した従来の光学素子成形用型を用いて、LaSF系硝材
の成形を行ったところ、従来の成形用型では5000ショッ
ト前後から膜剥離が生じてきて、使用不能となってしま
ったのに対し、本実施例の成形用型では10000ショット
成形後も剥離はほとんど生じてなく、十分使用可能な状
態であった。また、面粗度の劣化は、次表に示すよう
に、従来の成形用型の方が本実施例の型よりも早かっ
た。Using the optical element molding die of the present example obtained as described above, and the conventional optical element molding die in which an Ir-free AlN film was formed by RF sputtering, a LaSF-based glass material was molded. However, in the conventional molding die, film peeling occurred from around 5,000 shots, and became unusable, whereas in the molding die of this example, peeling hardly occurred even after 10,000 shots molding, It was fully usable. As shown in the following table, the surface roughness deteriorated earlier in the conventional molding die than in the die of the present example.

本実施例によれば、AlNにIrを含有した薄膜により成
形面を形成したので、Irにより、Alが酸化されてAl2O3
の結晶粒が成長するのを抑制することができる。また、
Irにより膜の内部に酸素が侵入するのを抑制することが
でき、膜が酸化してもろくなりクラックが発生して剥離
しやすくなるのを防止できる。 According to the present embodiment, since the formed surface was formed by a thin film containing Ir in AlN, Al was oxidized by Ir and Al 2 O 3
Can be prevented from growing. Also,
Ir can prevent oxygen from entering the inside of the film, and can prevent the film from becoming brittle and susceptible to cracks due to oxidation, thereby making it easy to peel off.

なお、本実施例において、Irに代えて、Pt,Ir,Os,Pd,
Rh,Ru,Au,Ag,Cuのいずれか１つを用いても、あるいはこ
れらを組合わせて用いても本実施例と同様の効果が得ら
れる。In the present embodiment, Pt, Ir, Os, Pd,
The same effect as in the present embodiment can be obtained by using any one of Rh, Ru, Au, Ag, and Cu, or by using a combination of these.

（第２実施例） 第１実施例と同様の型基材上に、中間層として、スパ
ッタリング法によりTiCを成膜し（膜厚2000Å）、次い
で、最表層として、AlNとPtの混合層を成膜した（膜厚2
000Å／組成比Al＝42atm％,N＝31atm％,Pt＝22atm％,O
＝5atm％）。次に、上記の型を大気中で1000℃に加熱
し、１時間保持した後、自然放冷した。(Second Embodiment) On the same mold base as in the first embodiment, a TiC film is formed as an intermediate layer by a sputtering method (film thickness: 2000 Å), and then a mixed layer of AlN and Pt is formed as the outermost layer. Film formed (film thickness 2
000Å / composition ratio Al = 42atm%, N = 31atm%, Pt = 22atm%, O
= 5 atm%). Next, the above-mentioned mold was heated to 1000 ° C. in the air, kept for 1 hour, and then allowed to cool naturally.

この型を、XPSにより深さ方向分析した結果を第２図
に示す。第２図は縦軸に組成比を、横軸に膜の表面から
の深さをとったもので、加熱後は、Ti及びＮが膜中に拡
散しているのがわかる。また、最表層は酸化されてAl2O
3になっていると推定される。FIG. 2 shows the results of XPS analysis of this mold in the depth direction. FIG. 2 shows the composition ratio on the vertical axis and the depth from the surface of the film on the horizontal axis. It can be seen that Ti and N are diffused into the film after heating. Also, the outermost layer is oxidized to Al 2 O
It is estimated to have become 3.

本実施例の成形用型を用いて、第１実施例と同様にLa
SF硝材の成形を行ったところ、10000ショット成形後も
膜剥離は全く無く、面粗度の劣化もなかった。Using the molding die of this embodiment, La
When the SF glass material was molded, no film peeling occurred even after 10,000 shot molding, and there was no deterioration in surface roughness.

本実施例によれば、基材と膜の両方に親和性が高く、
拡散しやすいTiCを中間層として用いたため、膜の付着
強度が一層高まっている。また、中間層のTiCも酸化が
進むともろくなってクラックが入り剥離しやすくなる
が、最表層のAl2O3とPtにより酸素が侵入するのを防止
するため、TiCの酸化を防ぐことができ、この結果、膜
の長寿命化が図れる。According to this embodiment, the affinity is high for both the substrate and the film,
The use of TiC, which easily diffuses, was used as the intermediate layer, so that the adhesion strength of the film was further increased. Although TiC intermediate layer becomes easily peeled off to be cracked is brittle when the oxidation proceeds, in order to prevent the oxygen by the outermost layer of Al 2 O 3 and Pt from entering, is possible to prevent oxidation of the TiC As a result, the life of the film can be prolonged.

〔発明の効果〕〔The invention's effect〕

以上のように、本発明の光学素子成形用型によれば、
面粗度の劣化や膜剥離等がなく、長期間使用可能であ
り、その結果、ガラス成形レンズのコストを下げること
が可能である。As described above, according to the optical element molding die of the present invention,
It can be used for a long period of time without deterioration of surface roughness or film peeling, and as a result, the cost of the glass molded lens can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

第１図は本発明の光学素子成形用型の第１実施例を示す
縦断面図、第２図は本発明の第２実施例の光学素子成形
用型における組成分布を示すグラフである。 ３……型基材 ４……成形面層FIG. 1 is a longitudinal sectional view showing a first embodiment of the optical element molding die of the present invention, and FIG. 2 is a graph showing a composition distribution in the optical element molding die of the second embodiment of the present invention. 3 ... mold base 4 ... molding surface layer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 市川 一 東京都渋谷区幡ケ谷２丁目43番２号 オ リンパス光学工業株式会社内 (56)参考文献 特開 平３−159927（ＪＰ，Ａ) 特開 平３−83825（ＪＰ，Ａ) 特開 平２−51433（ＪＰ，Ａ) 特開 平１−313337（ＪＰ，Ａ) 特開 昭61−197430（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) C03B 11/00──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Kazuki Ichikawa 2-43-2 Hatagaya, Shibuya-ku, Tokyo Inside Olympus Optical Co., Ltd. (56) References JP-A-3-159927 (JP, A) JP JP-A-3-83825 (JP, A) JP-A-2-51433 (JP, A) JP-A-1-313337 (JP, A) JP-A-61-197430 (JP, A) (58) Fields studied (Int .Cl. 6 , DB name) C03B 11/00

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項１】成形用型の型表面に、この型表面の結晶粒
の成長を抑制する白金、イリジウム、オスミウム、パラ
ジウム、ロジウム、ルテリウム、金、銀又は銅の中から
選択された少なくとも一つの物質を分散して少なくとも
成形面を形成したことを特徴とする光学素子成形用型。1. The method according to claim 1, wherein at least one selected from the group consisting of platinum, iridium, osmium, palladium, rhodium, ruthenium, gold, silver and copper, which suppresses the growth of crystal grains on the surface of the mold. A mold for molding an optical element, characterized in that at least a molding surface is formed by dispersing a substance. 【請求項２】アルミニウム及び窒素を主成分とし、かつ
白金，イリジウム，オスミウム，パラジウム，ロジウ
ム，ルテニウム，金，銀又は銅の中から選択された少な
くとも一つの物質を分散した材料により、少なくとも成
形面を形成したことを特徴とする光学素子成形用型。2. A molding surface made of a material containing aluminum and nitrogen as main components and at least one substance selected from platinum, iridium, osmium, palladium, rhodium, ruthenium, gold, silver or copper dispersed therein. A mold for molding an optical element, characterized in that a mold is formed. 【請求項３】型表面の酸化アルミニウムの中に、白金，
イリジウム，オスミウム，パラジウム，ロジウム，ルテ
ニウム，金，銀又は銅の中から選択された少なくとも一
つの物質を分散して少なくとも成形面を形成したことを
特徴とする光学素子成形用型。3. The method according to claim 1, wherein the aluminum oxide on the surface of the mold contains platinum,
What is claimed is: 1. A mold for molding an optical element, comprising at least a molding surface formed by dispersing at least one substance selected from iridium, osmium, palladium, rhodium, ruthenium, gold, silver and copper.
JP2268855A 1990-10-05 1990-10-05 Mold for optical element molding Expired - Fee Related JP2769035B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2268855A JP2769035B2 (en) 1990-10-05 1990-10-05 Mold for optical element molding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2268855A JP2769035B2 (en) 1990-10-05 1990-10-05 Mold for optical element molding

Publications (2)

Publication Number Publication Date
JPH04144930A JPH04144930A (en) 1992-05-19
JP2769035B2 true JP2769035B2 (en) 1998-06-25

Family

ID=17464204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2268855A Expired - Fee Related JP2769035B2 (en) 1990-10-05 1990-10-05 Mold for optical element molding

Country Status (1)

Country Link
JP (1) JP2769035B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6673462B2 (en) * 2001-04-27 2004-01-06 Central Glass Company, Limited Frequency selective plate and method for producing same
JP4371690B2 (en) * 2003-04-11 2009-11-25 セントラル硝子株式会社 Radio wave transmissive wavelength selective plate and method for producing the same
CN108468029B (en) * 2018-02-12 2020-01-21 中国科学院国家天文台南京天文光学技术研究所 Magnetron sputtering scanning method for silicon carbide optical mirror surface modification and surface shape lifting

Also Published As

Publication number Publication date
JPH04144930A (en) 1992-05-19

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