JP2754431B2 - Machining fluid supply device for wire electric discharge machine - Google Patents
Machining fluid supply device for wire electric discharge machineInfo
- Publication number
- JP2754431B2 JP2754431B2 JP4029594A JP2959492A JP2754431B2 JP 2754431 B2 JP2754431 B2 JP 2754431B2 JP 4029594 A JP4029594 A JP 4029594A JP 2959492 A JP2959492 A JP 2959492A JP 2754431 B2 JP2754431 B2 JP 2754431B2
- Authority
- JP
- Japan
- Prior art keywords
- processing
- tank
- liquid
- liquid tank
- waste liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ワイヤ放電加工装置に
係り、さらに詳しくは、ワイヤ放電加工装置の加工部に
加工液を供給し、また加工後の加工液を濾過するワイヤ
放電加工装置の加工液供給装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wire electric discharge machine, and more particularly, to a wire electric discharge machine for supplying a machining fluid to a machining portion of the wire electric discharge machine and filtering the machining fluid after machining. The present invention relates to a processing liquid supply device.
【０００２】[0002]
【従来の技術】図１４は従来のワイヤ放電加工装置の一
例の構成図で、１は放電加工機、２０は加工液供給装置
である。放電加工機１において、２はベッドで、その上
部にはサドル３が配設されており、サドル３は駆動モー
タ（図示せず）に駆動されて図面の垂直方向（Ｙ方向）
に移動するようになってる。５はサドル３上に設けた駆
動モータ、６は駆動モータ５によって駆動されるねじ棒
である。2. Description of the Related Art FIG. 14 is a block diagram showing an example of a conventional wire electric discharge machine, wherein 1 is an electric discharge machine, and 20 is a machining fluid supply device. In the electric discharge machine 1, reference numeral 2 denotes a bed, on which a saddle 3 is disposed, and the saddle 3 is driven by a drive motor (not shown) to be driven in a vertical direction (Y direction) in the drawing.
It has come to move. 5 is a drive motor provided on the saddle 3, and 6 is a screw rod driven by the drive motor 5.
【０００３】４はねじ棒６に結合され、図の左右方向
（Ｘ方向）に移動するテーブルで、その上部には加工槽
７が取付けられており、加工槽７内には定盤８が設置さ
れている。９は定盤８上に取付けられた被加工物であ
る。１０は被加工物９の上方においてワイヤ電極１２を
支持する上部ワイヤガイド、１１は被加工物９の下方に
おいてワイヤ電極１２を支持する下部ワイヤガイドであ
る。A table 4 is connected to a screw rod 6 and moves in the left-right direction (X direction) in the figure. A processing tank 7 is mounted on the upper part of the table, and a platen 8 is installed in the processing tank 7. Have been. Reference numeral 9 denotes a workpiece mounted on the surface plate 8. An upper wire guide 10 supports the wire electrode 12 above the workpiece 9, and a lower wire guide 11 supports the wire electrode 12 below the workpiece 9.
【０００４】加工液供給装置２０において、２１は清液
槽２２と汚液槽２３とからなる加工液供給装置２０の本
体、２５は本体２１上に設けられた供給ポンプで、清液
槽２２に貯蔵された加工液１３を上部ワイヤガイド１０
及び下部ワイヤガイド１１の加工液供給孔に圧送する。
２７は清液槽２２上に設けられ、フィルタ装置２８が設
置される取付台である。フィルタ装置２８は通常紙、布
などの繊維質の材料からなる円筒状の内フィルタ２９と
その外側に配設された外フィルタ３０、及び両フィルタ
２９，３０の間と内フィルタ２９内に形成された流路３
１，３２とからなり、流路３１はその下部に設けたコネ
クタ３４を介して濾過ポンプ２６に接続されている。３
５は汚液槽２３から濾過ポンプ２６によって圧送された
汚液の流入口である。なお、３３はフィルタ装置２８の
蓋体、３６はフィルタ装置２８の周囲に設けられ、フィ
ルタ装置２８から落下する加工液の飛散を防止するため
のカバーである。[0004] In the processing liquid supply apparatus 20, reference numeral 21 denotes a main body of the processing liquid supply apparatus 20 comprising a cleaning liquid tank 22 and a waste liquid tank 23, and reference numeral 25 denotes a supply pump provided on the main body 21. The stored working fluid 13 is transferred to the upper wire guide 10.
And it feeds to the working fluid supply hole of the lower wire guide 11 by pressure.
Reference numeral 27 denotes a mount provided on the fresh liquid tank 22 and on which the filter device 28 is installed. The filter device 28 is generally formed of a cylindrical inner filter 29 made of a fibrous material such as paper and cloth, an outer filter 30 disposed outside the filter, and between the two filters 29, 30 and in the inner filter 29. Flow path 3
The flow path 31 is connected to the filtration pump 26 via a connector 34 provided below the flow path 31. 3
Reference numeral 5 denotes an inflow port for the waste liquid pumped from the waste liquid tank 23 by the filtration pump 26. Reference numeral 33 denotes a cover of the filter device 28, and reference numeral 36 denotes a cover provided around the filter device 28 for preventing scattering of the machining liquid falling from the filter device 28.
【０００５】上記のように構成したワイヤ放電加工装置
において、被加工物９を加工する場合は、上部ワイヤガ
イド１０と下部ワイヤガイド１１間にワイヤ電極１２を
架張して送給し、ワイヤ電極１２と被加工物９と互いに
接近させた状態で両者の間に電圧を印加する。つまり、
被加工物９をプラス電位に、またワイヤ電極１２をマイ
ナス電位として両者の間に電圧を印加し、加工間隙に放
電現象を発生させると共に、サドル３及びテーブル４を
ＮＣ装置等によってＸ−Ｙ方向に駆動し、ワイヤ放電加
工を行なう。[0005] In the wire electric discharge machine configured as described above, when the workpiece 9 is machined, the wire electrode 12 is stretched and fed between the upper wire guide 10 and the lower wire guide 11 and is fed. A voltage is applied between the workpiece 12 and the workpiece 9 in a state where they are brought close to each other. That is,
A voltage is applied between the workpiece 9 at a positive potential and the wire electrode 12 at a negative potential to generate a discharge phenomenon in the machining gap, and the saddle 3 and the table 4 are moved in the XY direction by an NC device or the like. To perform wire electric discharge machining.
【０００６】この放電加工中、加工部には上部ワイヤガ
イド１０と下部ワイヤガイド１１を介して供給ポンプ２
５により清液槽２２に貯蔵されている加工液１３が継続
的に供給され、加工部を加工液１３で浸して加工粉を除
去する。加工粉と共に加工部から流出した加工液１３は
加工槽７に回収され、汚液槽２３へ送られる。[0006] During the electric discharge machining, the supply pump 2 is connected to the machining section via the upper wire guide 10 and the lower wire guide 11.
The processing liquid 13 stored in the cleaning liquid tank 22 is continuously supplied by 5 and the processing portion is immersed in the processing liquid 13 to remove the processing powder. The processing liquid 13 flowing out of the processing section together with the processing powder is collected in the processing tank 7 and sent to the waste liquid tank 23.
【０００７】汚液槽２３に貯蔵された加工粉の混ってい
る加工液１３ａ（以下汚液という）は、濾過ポンプ２６
によりフィルタ装置２８に継続的に供給されて汚液流入
口３５から流路３１内に流入し、流路３１内を上昇して
内外フィルタ２９，３０に浸み込む。内外フィルタ２
９，３０によって濾過されて清液となった加工液１３
は、内フィルタ２９の内側の流路３２及び外フィルタ３
０の外側から落下し、通路２４を経て清液槽２２に貯蔵
される。このとき、汚液１３ａに含まれていた加工粉
は、内外フィルタ２９，３０の間、したがって流路３１
の下部に蓄積される。The processing fluid 13 a (hereinafter referred to as “filtration liquid”) containing the processing powder stored in the waste liquid tank 23 is supplied to a filtration pump 26.
, Is continuously supplied to the filter device 28, flows into the flow channel 31 from the waste liquid inlet 35, rises in the flow channel 31, and soaks into the internal and external filters 29 and 30. Inner / outer filter 2
Working fluid 13 that has been filtered by 9, 30 to become a clear liquid
Are the flow path 32 inside the inner filter 29 and the outer filter 3
The liquid drops from the outside of the container 0 and is stored in the fresh liquid tank 22 through the passage 24. At this time, the processing powder contained in the waste liquid 13a is located between the inner and outer filters 29, 30 and thus the flow path 31.
Accumulates at the bottom of
【０００８】そして、放電加工中にフィルタ装置２８を
通過する汚液１３ａの流量が少なくなった場合、つま
り、内外フィルタ２９，３０の間の流路３１に蓄積され
た加工粉が多くなった場合は、加工を停止して人手によ
りカバー３６及びコネクタ３４を取外し、フィルタ装置
２８を新品と交換する。When the flow rate of the waste liquid 13a passing through the filter device 28 during the electric discharge machining decreases, that is, when the machining powder accumulated in the flow path 31 between the inner and outer filters 29 and 30 increases. Stops the processing, manually removes the cover 36 and the connector 34, and replaces the filter device 28 with a new one.
【０００９】図１５は加工液供給装置２０の他の従来例
を示すもので、本例においては、フィルタ装置２８は中
心部に汚液槽２３からの汚液１３ａが供給される流路３
１ａを有し、その外周に円筒状のフィルタ３０ａを配設
したもので、その作用は図１４で説明した従来例とほぼ
同じである。FIG. 15 shows another conventional example of the working fluid supply device 20. In this embodiment, the filter device 28 is provided at the center thereof with a flow path 3 through which the waste fluid 13a from the waste fluid tank 23 is supplied.
1a, and a cylindrical filter 30a is arranged on the outer periphery thereof. The operation is almost the same as that of the conventional example described with reference to FIG.
【００１０】図１６は加工液供給装置のさらに他の従来
例を示すもので、本例においては、汚液槽２３にフロー
ト３７を設け、汚液槽２３内の汚液１３ａの量を目視に
より検出するようにしたものである。FIG. 16 shows a further conventional example of the processing liquid supply device. In this example, a float 37 is provided in the waste liquid tank 23, and the amount of the waste liquid 13a in the waste liquid tank 23 is visually observed. This is to detect.
【００１１】[0011]
【発明が解決しようとする課題】図１４及び図１５に示
した従来の加工液供給装置は上記のように構成されてい
るので、フィルタ装置２８を交換する場合は放電加工を
停止しなければならない。しかし、一度放電加工を停止
してまた再開することは、加工制度を悪化させる要因と
なるため、加工時間に合わせてフィルタ装置２８を寿命
の到来前に交換する必要がある。このため作業性が低下
するばかりでなく、コストアップを招いていた。また、
交換サイクルによっては連休中にフィルタ装置２８を交
換しなければならないこともあり、このため長期間の連
続無人運転が困難であった。Since the conventional machining fluid supply apparatus shown in FIGS. 14 and 15 is constructed as described above, the electric discharge machining must be stopped when the filter device 28 is replaced. . However, once the electric discharge machining is stopped and restarted, the machining accuracy is deteriorated. Therefore, it is necessary to replace the filter device 28 before the end of its life in accordance with the machining time. For this reason, not only the workability has been reduced, but also the cost has been increased. Also,
Depending on the replacement cycle, the filter device 28 may have to be replaced during consecutive holidays, which makes continuous unattended operation for a long period of time difficult.
【００１２】さらに、フィルタ装置２８の流路３１，３
１ａ、したがって汚液１３ａの流入口３５の付近は加工
粉が溜り易く、フィルタ装置２８の交換に際して目づま
りをおこした流入口３５から流路３１，３１ａ内の汚液
１３ａが排出されないため、フィルタ装置２８が大変重
くなってしまい運搬に不便である。また、運搬中に溜っ
た加工粉が流入口３５より突然排出され、衣服を汚して
しまうことがしばしばある。Further, the flow paths 31, 3 of the filter device 28
1a, therefore, the processing powder easily accumulates in the vicinity of the inflow port 35 of the waste liquid 13a. 28 becomes very heavy, which is inconvenient to transport. In addition, the processing powder accumulated during transportation is suddenly discharged from the inflow port 35, and often contaminates clothes.
【００１３】また、図１６に示した加工液供給装置にお
いては、加工時の発熱などにより、汚液１３ａが蒸発し
て汚液槽２３の液面が低下したにもかかわらず、フロー
ト３７の点検を怠ったため濾過ポンプ２６の汚液吸込口
より液面が低下し、濾過ポンプ２６が空運転状態になっ
て濾過ポンプ２６が故障してしまうことがある。さら
に、濾過されない一部の汚泥が汚液槽２３内に堆積して
いるため、定期的に汚液槽２３内の汚液１３ａを排出し
て汚泥を除去しなければならないが、保守点検に時間が
かかり、メンテナンスコストの増加原因になっていた。In the processing liquid supply apparatus shown in FIG. 16, the float 37 is inspected even though the waste liquid 13a evaporates due to heat generation during processing and the liquid level in the waste liquid tank 23 is lowered. Since the liquid level is lowered from the waste liquid suction port of the filtration pump 26, the filtration pump 26 becomes idle and the filtration pump 26 may break down. Further, some of the unfiltered sludge accumulates in the sludge tank 23, so the sludge 13a in the sludge tank 23 must be periodically discharged to remove the sludge. And increased maintenance costs.
【００１４】本発明は上記の課題を解決するためになさ
れたもので、フィルタ装置を寿命の到来前に交換すると
いう無駄をなくすと共に、放電加工中に自動的にフィル
タ装置を交換できるワイヤ放電加工装置の加工液供給装
置を得ることを目的としたものである。また、本発明の
他の目的は、フィルタ装置の交換に際して、フィルタ装
置内に溜った汚液を流入口より円滑に排出することので
きる加工液供給装置を得るにある。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problem, and eliminates the waste of replacing a filter device before the end of its life, and also enables wire filter EDM to automatically replace the filter device during EDM. An object of the present invention is to obtain a working fluid supply device. Another object of the present invention is to provide a processing liquid supply device capable of smoothly discharging waste liquid accumulated in the filter device from an inflow port when the filter device is replaced.
【００１５】さらに、本発明の他の目的は、濾過ポンプ
の空運転状態を可及的に減少させ、また、汚液槽内に堆
積した汚泥を一度に大量に排出できるように構成するこ
とにより、保守点検の回数を減らしてメンテナンスコス
トを低減することのできる加工液供給装置を得るにあ
る。Still another object of the present invention is to reduce the idling state of the filtration pump as much as possible and to discharge a large amount of sludge accumulated in the sewage tank at a time. Another object of the present invention is to provide a machining fluid supply device capable of reducing the number of maintenance inspections and reducing maintenance costs.
【００１６】[0016]
【課題を解決するための手段】本発明に係るワイヤ放電
加工装置の加工液供給装置は、 （１）清液槽に貯蔵された加工液を被加工物の加工部に
供給し、加工後の加工液が貯蔵された汚液槽内の加工液
を濾過ポンプによりフィルタ装置に送って濾過し、前記
清液槽に貯蔵して再使用する加工液供給装置において、
前記汚液槽内の加工液の少なくとも下限の液面を検出す
る液面検出器と、前記汚液槽内に配置された可動仕切板
と、前記液面検出器の検出結果に基いて前記可動仕切板
を汚液槽の液面高さが増す方向に移動する駆動手段とを
備えたものである。According to the present invention, there is provided a machining fluid supply apparatus for a wire electric discharge machining apparatus, which comprises: (1) supplying a machining fluid stored in a cleansing tank to a machining section of a workpiece, and In the working fluid supply device, the working fluid in the waste liquid tank in which the working liquid is stored is sent to a filter device by a filtration pump to be filtered, and is stored in the clear liquid tank and reused.
A liquid level detector that detects at least a lower limit liquid level of the processing liquid in the waste liquid tank, a movable partition plate disposed in the waste liquid tank, and the movable part based on a detection result of the liquid level detector. Drive means for moving the partition plate in a direction to increase the liquid level of the waste liquid tank.
【００１７】（２）清液槽に貯蔵された加工液を被加工
物の加工部に供給し、加工後の加工液が貯蔵された汚液
槽内の加工液を濾過ポンプによりフィルタ装置に送って
濾過し、前記清液槽に貯蔵して再使用する加工液供給装
置において、前記汚液槽内の加工液の少なくとも下限の
液面を検出する液面検出器と、該液面検出器の検出信号
を入力する制御器と、前記汚液槽内に配設された可動仕
切板と、前記制御器からの指令によって前記可動仕切板
を汚液槽の液面高さが増す方向に移動する駆動手段と、
前記汚液槽の底部に設けた開口部を開閉可能に閉塞する
底蓋と、前記開口部の外側において汚液槽に着脱可能に
取付けられる汚泥槽と、前記清液槽内の加工液を排出す
る開閉手段とを備えたものである。(2) The processing fluid stored in the cleaning fluid tank is supplied to the processing section of the workpiece, and the processing fluid in the waste liquid tank storing the processed processing fluid is sent to the filter device by a filtration pump. A processing liquid supply device for storing and reusing the cleaning liquid in the cleaning liquid tank, wherein a liquid level detector for detecting at least a lower limit liquid level of the processing liquid in the waste liquid tank; and A controller for inputting a detection signal, a movable partition disposed in the waste liquid tank, and moving the movable partition in a direction in which the liquid level of the waste liquid tank increases by a command from the controller. Driving means;
A bottom cover that opens and closes an opening provided at the bottom of the waste liquid tank, a sludge tank detachably attached to the waste liquid tank outside the opening, and discharges a processing liquid in the clear liquid tank And an opening / closing means.
【００１８】（３）前記可動仕切板の移動限界を検出す
る検出手段を設けたものである。(3) Detecting means for detecting the movement limit of the movable partition plate is provided.
【００１９】[0019]
【作用】ワイヤ放電加工装置の加工時の発熱などにより
加工液が蒸発して減少し、汚液槽内の加工液の液面が低
下すると、液面検出器がこれを検出して駆動手段を駆動
し、可動仕切板を汚液槽の液面高さが増す方向に移動さ
せて、加工液の液面を上昇させて濾過ポンプの空転を防
止する。[Function] When the machining fluid evaporates and decreases due to heat generated during machining of the wire electric discharge machine and the fluid level of the machining fluid in the waste liquid tank drops, the fluid level detector detects this and activates the driving means. When driven, the movable partition plate is moved in the direction in which the liquid level of the waste liquid tank increases, thereby raising the liquid level of the processing liquid to prevent the filtration pump from running idle.
【００２０】汚液槽内に汚泥が溜ったときは底蓋を外し
て汚液槽に汚泥槽を取付け、可動仕切板を移動して底部
に溜った汚泥を汚泥槽の中に掻き集める。そして、汚液
槽の開口部を底蓋で閉塞したのち汚泥槽を取外して溜っ
た汚泥を廃棄する。この間清液槽内の加工液を開閉手段
を介して適宜排出する。When the sludge accumulates in the sludge tank, the bottom cover is removed, the sludge tank is attached to the sludge tank, and the movable partition plate is moved to scrape the sludge collected at the bottom into the sludge tank. Then, after closing the opening of the waste liquid tank with the bottom lid, the sludge tank is removed and the accumulated sludge is discarded. During this time, the processing liquid in the cleaning liquid tank is appropriately discharged through the opening / closing means.
【００２１】なお、移動限界を検出する検出手段を設け
た場合は、可動仕切板がこれに当ると駆動手段が停止
し、可動仕切板はその位置に保持される。When a detecting means for detecting the movement limit is provided, the driving means stops when the movable partition plate hits the movable partition plate, and the movable partition plate is held at that position.
【００２２】[0022]
【実施例】実施例１． 図１は本発明の第１の実施例の構成図である。なお、図
１４の従来例と同じ部分には同じ符号を付し、説明を省
略する。２７ａは加工液供給装置２０の清液槽２２上に
おいて本体２１に取付けられた第１の取付台、２７ｂは
同じく第２の取付台で、両取付台２７ａ，２７ｂ上には
それぞれ第１のフィルタ装置２８ａ及び第２のフィルタ
装置２８ｂが設置されており、それぞれ第１，第２のカ
バー３６ａ，３６ｂによって被覆されている。３７は清
液槽２２内において取付板３８に支持されたフロートス
イッチである。[Embodiment 1] FIG. 1 is a configuration diagram of a first embodiment of the present invention. The same parts as those in the conventional example of FIG. 14 are denoted by the same reference numerals, and description thereof will be omitted. Reference numeral 27a denotes a first mounting base mounted on the main body 21 on the clear liquid tank 22 of the processing liquid supply device 20, and 27b denotes a second mounting base similarly, and a first filter is mounted on both mounting bases 27a and 27b. A device 28a and a second filter device 28b are provided, and are covered by first and second covers 36a and 36b, respectively. Reference numeral 37 denotes a float switch supported by the mounting plate 38 in the fresh liquid tank 22.
【００２３】４１ａは第１の電磁弁、４１ｂは第２の電
磁弁で、その入力側はそれぞれ濾過ポンプ２６の出力側
に接続されており、第１の電磁弁４１ａの出力側はコネ
クタ３４ａを介して第１のフィルタ装置２８ａに、ま
た、第２の電磁弁４１ｂの出力側はコネクタ３４ｂを介
して第２のフィルタ装置２８ｂにそれぞれ接続されてい
る。４２は濾過ポンプ２６の吐出側に設けられ、第１，
第２のフィルタ装置２８ａ，２８ｂ内の圧力を表示する
圧力計である。４３は制御器で、フロートスイッチ３７
の出力信号が加えられ、第１、第２の電磁弁４１ａ，４
１ｂを制御する。Reference numeral 41a denotes a first solenoid valve, 41b denotes a second solenoid valve, the input side of which is connected to the output side of the filtration pump 26, and the output side of the first solenoid valve 41a is connected to the connector 34a. The output side of the second solenoid valve 41b is connected to the second filter unit 28b via a connector 34b. 42 is provided on the discharge side of the filtration pump 26,
This is a pressure gauge that indicates the pressure in the second filter devices 28a and 28b. 43 is a controller, a float switch 37
Is output, and the first and second solenoid valves 41a, 41a, 4
1b.
【００２４】次に、上記のように構成した第１の実施例
の作用を、図２、図３を参照して説明する。なお、放電
加工機１において被加工物９を放電加工する作用は従来
と同じなので説明を省略する。Next, the operation of the first embodiment configured as described above will be described with reference to FIGS. The operation of the electric discharge machine 1 for electric discharge machining of the workpiece 9 is the same as that of the conventional electric discharge machine, and the description is omitted.
【００２５】図２において、第１のフィルタ装置２８ａ
は稼動中であり、第２のフィルタ装置は未使用であると
する。したがって、第１の電磁弁４１ａは導通状態、第
２の電磁弁４１ｂは非導通常態にあり、汚液槽２３に貯
蔵された加工粉の混入した汚液１３ａは、濾過ポンプ２
６から第１の電磁弁４１ａを通り、第１のフィルタ装置
２８ａに継続的に送られる。第１のフィルタ装置２８ａ
に送られた汚液１３ａは、流路に加工粉を蓄積して純粋
な加工液１３のみがフィルタ装置を通過し、清液槽２２
に貯蔵される。そして加工液１３は清液槽２２内に満た
され、オーバーフローした加工液１３は汚液槽２３へ流
出する。In FIG. 2, the first filter device 28a
Is operating, and the second filter device is unused. Therefore, the first solenoid valve 41a is in the conducting state, the second solenoid valve 41b is in the non-conducting normal state, and the waste liquid 13a mixed with the processing powder stored in the waste liquid tank 23
From 6 through the first solenoid valve 41a, it is continuously sent to the first filter device 28a. First filter device 28a
Liquid 13a sent to the tank accumulates processing powder in the flow path, and only the pure processing liquid 13 passes through the filter device,
Stored in Then, the processing liquid 13 is filled in the clear liquid tank 22, and the overflowing processing liquid 13 flows out to the waste liquid tank 23.
【００２６】さらに放電加工が進行して第１のフィルタ
装置２８ａ内に加工粉が蓄積され、第１のフィルタ装置
２８ａを通過する加工液１３の流量が少なくなると、図
３に示すように清液槽２２内の加工液１３が減少し、汚
液槽２３内の汚液１３ａが増加する。そしてこの状態が
続くと、汚液１３ａがオーバーフローして清液槽２２に
流入し、加工液１３を汚染する。When the electric discharge machining further proceeds and machining powder accumulates in the first filter device 28a, and the flow rate of the machining fluid 13 passing through the first filter device 28a decreases, as shown in FIG. The processing liquid 13 in the tank 22 decreases, and the waste liquid 13a in the waste liquid tank 23 increases. If this state continues, the waste liquid 13a overflows and flows into the clearing liquid tank 22 to contaminate the working liquid 13.
【００２７】本実施例においては、上記のような現象が
発生する前に濾過ポンプ２６の吐出圧力が上昇し、交換
時期が到来したことを示す。また、フロートスイッチ３
７により清液槽２２の液面が低下したこと、即ち、限界
液面に達したことを検出し、その出力信号を制御器４３
に加える。制御器４３はこれ基いて電気信号を出力し、
第１の電磁弁４１ａを非導通に、第２の電磁弁４１ｂを
導通に切換え、第１のフィルタ装置２８ｂによる汚液１
３ａの濾過を停止し、第２のフィルタ装置２８ｂによる
汚液１３ａの濾過を開始する。In this embodiment, it is indicated that the discharge pressure of the filtration pump 26 has increased before the above-mentioned phenomenon has occurred, and that the time for replacement has come. Also, float switch 3
7 detects that the liquid level in the fresh liquid tank 22 has dropped, that is, has reached the limit liquid level, and outputs the output signal to the controller 43.
Add to The controller 43 outputs an electric signal based on this,
The first solenoid valve 41a is turned off and the second solenoid valve 41b is turned on.
The filtration of 3a is stopped, and the filtration of the filth 13a by the second filter device 28b is started.
【００２８】次に、人手により第１のカバー３６ａ及び
コネクタ３４ａを取外し、フィルタ装置２８ａを新品と
交換してコネクタ３４ａを接続し、第１のカバー３６ａ
を取付ける。以下、上記のように第１、第２のフィルタ
装置２８ａ，２８ｂを交互に交換して連続的に放電加工
を行なう。Next, the first cover 36a and the connector 34a are manually removed, the filter device 28a is replaced with a new one, and the connector 34a is connected.
Install. Hereinafter, the first and second filter devices 28a and 28b are alternately exchanged as described above to continuously perform electric discharge machining.
【００２９】実施例２． 図４、図５は本発明の第２の実施例の作用説明図であ
る。本実施例は第１のフロートスイッチ３７に代えて、
第１、第２のフィルタ装置２８ａ、２８ｂで濾過されて
清液槽２２に流出する加工液１３の流量を検出する流量
検出器４５ａ、４５ｂを設け、その検出信号を制御器４
３に加えるようにしたものである。Embodiment 2 FIG. FIGS. 4 and 5 are explanatory diagrams of the operation of the second embodiment of the present invention. In the present embodiment, instead of the first float switch 37,
Flow rate detectors 45a and 45b are provided for detecting the flow rate of the processing liquid 13 which is filtered by the first and second filter devices 28a and 28b and flows out to the fresh liquid tank 22, and the detection signals are sent to the controller 4
3 is added.
【００３０】上記のように構成した第２の実施例におい
ては、第１のフィルタ装置２８ａ内に加工粉が堆積して
濾過される加工液１３の流量が減少すると、流量検出器
４５ａがこれを検出してその出力信号を制御器４３へ送
り、その流量がある値以下になると制御器４３は第１、
第２の電磁弁４１ａ、４１ｂへ制御信号を送り、第１の
電磁弁４１ａを非導通、第２の電磁弁４１ｂを導通に切
換える。以下の作用は第１の実施例の場合と同様であ
る。In the second embodiment constructed as described above, when the flow rate of the machining fluid 13 to be filtered is reduced by accumulation of machining powder in the first filter device 28a, the flow rate detector 45a detects this. The controller 43 detects and sends the output signal to the controller 43, and when the flow rate becomes lower than a certain value, the controller 43
A control signal is sent to the second electromagnetic valves 41a and 41b to switch the first electromagnetic valve 41a to non-conductive and the second electromagnetic valve 41b to conductive. The following operation is the same as that of the first embodiment.
【００３１】実施例３． 第１、第２の実施例では清液槽２２内の加工液１３の液
面又は濾過された加工液１３の流量によって第１、第２
の電磁弁４１ａ、４１ｂを切換制御する例を示したが、
濾過ポンプ２６の吐出側に設けた圧力計４２の出力信号
を制御器４３に加え、第１、第２のフィルタ装置２８
ａ、２８ｂの加工粉の堆積による圧力の上昇に基いて第
１、第２の電磁弁４１ａ、４１ｂを切換えるようにして
もよい。Embodiment 3 FIG. In the first and second embodiments, the first and second flow rates are determined according to the level of the processing liquid 13 in the cleaning liquid tank 22 or the flow rate of the filtered processing liquid 13.
Of switching control of the solenoid valves 41a and 41b of
An output signal of a pressure gauge 42 provided on the discharge side of the filtration pump 26 is applied to a controller 43, and the first and second filter devices 28
The first and second solenoid valves 41a and 41b may be switched based on an increase in pressure due to the accumulation of the processing powders a and 28b.
【００３２】実施例４． 図６は本発明の第４の実施例の構成図である。本実施例
はフィルタ装置２８の流路３１ａの頂部に開口部４６を
設け、この開口部４６に着脱自在のキャップ４７を設け
たものである。Embodiment 4 FIG. FIG. 6 is a configuration diagram of a fourth embodiment of the present invention. In the present embodiment, an opening 46 is provided at the top of the flow path 31a of the filter device 28, and a detachable cap 47 is provided in the opening 46.
【００３３】上記のように構成した本実施例において
は、放電加工機１の稼動時にはフィルタ装置２８の流路
３１ａの開口部４６はキャップ４７で閉塞されており、
汚液槽２３から送られた汚液１３ａを濾過する。フィル
タ装置２８を交換する際はカバー３６を取外し、コネク
タ３４を分離する。しかし、この状態では流路３１ａの
下部に加工粉が溜っているため流路３１ａ内の汚液１３
ａは流入口から排出されない。そこで、キャップ４７を
取外して流路３１ａの開口部４６を開放し、ここから流
路４６内に大気を導入すれば、流路３１ａ内に溜ってい
た汚液１３ａを汚液の流入口３５より排出することがで
きる。In the embodiment constructed as described above, the opening 46 of the flow path 31a of the filter device 28 is closed by the cap 47 when the electric discharge machine 1 is operated.
The waste liquid 13a sent from the waste liquid tank 23 is filtered. When replacing the filter device 28, the cover 36 is removed and the connector 34 is separated. However, in this state, since the processing powder is accumulated in the lower part of the flow path 31a, the waste liquid 13 in the flow path 31a
a is not discharged from the inlet. Then, the cap 47 is removed, the opening 46 of the flow channel 31a is opened, and if the atmosphere is introduced into the flow channel 46 from this, the waste liquid 13a accumulated in the flow channel 31a is discharged from the waste liquid inlet 35. Can be discharged.
【００３４】実施例５． 図７は本発明の第５の実施例を示すもので、本実施例に
おいてはフィルタ装置２８の流路３１ａの上部に設けた
開口部４６の周囲にフランジを設け、流路３１ａに内か
らフランジに例えば合成樹脂シートの如きシート材４８
を接着剤で貼着し、開口部４６を閉塞したものである。Embodiment 5 FIG. FIG. 7 shows a fifth embodiment of the present invention. In this embodiment, a flange is provided around an opening 46 provided above a flow channel 31a of a filter device 28, and a flange is formed in the flow channel 31a from inside. Sheet material 48 such as a synthetic resin sheet
Is adhered with an adhesive, and the opening 46 is closed.
【００３５】上記のように構成した本実施例において
は、フィルタ装置２８を交換する際、シート材４８を破
れば流路３１ａ内に大気が導入され、流路３１ａ内の汚
液を排出することができる。なお、上記の説明では、図
６、図７に示したフィルタ装置２８に第４、第５の実施
例を実施し場合を示したが、図１４に示すような構成の
フィルタ装置２８やさらに他の構成のフィルタ装置にも
本発明を実施することができる。In this embodiment constructed as described above, when replacing the filter device 28, if the sheet material 48 is broken, the air is introduced into the flow path 31a and the waste liquid in the flow path 31a is discharged. Can be. In the above description, the fourth and fifth embodiments are applied to the filter device 28 shown in FIGS. 6 and 7, but the filter device 28 having the configuration shown in FIG. The present invention can also be implemented in a filter device having the above configuration.
【００３６】実施例６． 図８は本発明の第６の実施例の構成図である。なお、図
１６で説明した従来例と同じ部分には同じ符号を付し、
説明を省略する。図において、５１は本体２１上に設け
られたモータ、５２はモータ５１に回転駆動されるねじ
棒である。５３は汚液槽５３内に配設された可動仕切板
で、ねじ棒５２に結合され、ねじ棒５２の回転に対応し
て汚液槽２３内を左右に移動する。５４は汚液槽２３の
下限液面を検出するフロートスイッチの如き液面検出
器、５５は同じく上限液面を検出する液面検出器で、両
液面検出器５４、５５の出力信号は、制御器５６に加え
られ、制御器５６の出力信号はモータ５１に加えられ
る。５７は汚液槽２３の最小容積を検出するリミットス
イッチで、その出力信号は制御器５６に加えられる。Embodiment 6 FIG. FIG. 8 is a configuration diagram of a sixth embodiment of the present invention. The same parts as those of the conventional example described with reference to FIG.
Description is omitted. In the figure, reference numeral 51 denotes a motor provided on the main body 21, and 52 denotes a screw rod driven to rotate by the motor 51. Reference numeral 53 denotes a movable partition disposed in the waste liquid tank 53, which is connected to the screw rod 52 and moves left and right in the waste liquid tank 23 in response to the rotation of the screw rod 52. Reference numeral 54 denotes a liquid level detector such as a float switch for detecting the lower limit liquid level of the waste liquid tank 23, and 55 denotes a liquid level detector for similarly detecting the upper limit liquid level. The output signals of both liquid level detectors 54 and 55 are as follows. The output signal of the controller 56 is applied to the motor 51. Reference numeral 57 denotes a limit switch for detecting the minimum volume of the waste liquid tank 23, and its output signal is applied to the controller 56.
【００３７】上記のように構成した本実施例において、
放電加工機１の稼動中に汚液槽２３内の汚液１３ａが蒸
発等により減少して液面が低下すると、下限液面検出器
５４がこれを検出してその出力信号を制御器５６に送
る。これにより制御器５６はモータ５１に信号を送って
これを駆動し、ねじ棒５２を回転させてこれと結合する
可動仕切板５３を図の右方に移動させる。これにより、
汚液槽２３の容積が図９に示すように縮小されて汚液１
３ａの液面が上昇するので、濾過ポンプ２６には汚液１
３ａが供給され、空転することはない。上昇した汚液１
３ａの液面を上限液面検出器５５が検出し、又はリミッ
トスイッチ５７が可動仕切板５３を検出したときは制御
器５６に信号が送られ、制御器５６からの指令によって
モータ５１を停止し、可動仕切板５３はその位置に保持
される。In this embodiment configured as described above,
When the waste liquid 13a in the waste liquid tank 23 decreases due to evaporation or the like during operation of the electric discharge machine 1 and the liquid level drops, the lower limit liquid level detector 54 detects this and sends an output signal to the controller 56. send. Accordingly, the controller 56 sends a signal to the motor 51 to drive it, and rotates the screw rod 52 to move the movable partition plate 53 connected thereto to the right in the drawing. This allows
The volume of the waste liquid tank 23 is reduced as shown in FIG.
Since the liquid level of the liquid 3a rises, the filtration pump 26
3a is supplied and does not run idle. Sewage 1 which rose
When the upper limit liquid level detector 55 detects the liquid level 3a or when the limit switch 57 detects the movable partition plate 53, a signal is sent to the controller 56, and the motor 51 is stopped by a command from the controller 56. The movable partition plate 53 is held at that position.
【００３８】実施例７． 図１０は本発明の第７の実施例の構成図である。なお、
第６の実施例と同じ部分にはこれと同じ符号を付し、説
明を省略する。５９は本体２１の底部の清液槽２２に近
接して設けた開口部５８に着脱可能に装着した底蓋、６
０は本体２１の底部の外側において、開口部５８の外周
に着脱可能に装着された汚泥槽である。また、６１は清
液槽２２の底部に設けられた排液部で、制御器５６から
の指令によって開閉する電磁弁６２を備えている。Embodiment 7 FIG. FIG. 10 is a configuration diagram of a seventh embodiment of the present invention. In addition,
The same parts as those in the sixth embodiment are denoted by the same reference numerals, and description thereof will be omitted. Reference numeral 59 denotes a bottom cover detachably attached to an opening 58 provided in the bottom of the main body 21 in the vicinity of the fresh liquid tank 22.
Reference numeral 0 denotes a sludge tank detachably mounted on the outer periphery of the opening 58 outside the bottom of the main body 21. Reference numeral 61 denotes a drainage unit provided at the bottom of the fresh liquid tank 22, which is provided with an electromagnetic valve 62 that opens and closes according to a command from the controller 56.
【００３９】上記のように構成した本実施例において、
放電加工機１の可動中は底蓋５９は閉じられており、電
磁弁６２は閉止している。このときのフィルタ装置２０
の動作は第６の実施例の場合とほぼ同じであるが本実施
例では上限液面検出器は省略してあり、可動仕切板５３
の停止位置はリミットスイッチ５７によって規制され
る。In this embodiment constructed as described above,
While the electric discharge machine 1 is moving, the bottom cover 59 is closed, and the solenoid valve 62 is closed. Filter device 20 at this time
Is almost the same as that of the sixth embodiment, but the upper limit liquid level detector is omitted in this embodiment, and the movable partition plate 53
Is stopped by the limit switch 57.
【００４０】汚液槽２３の底部に溜った汚泥を除去する
場合は、可動仕切板５３を図１１に示すように汚液槽２
３の左端に位置させ、底蓋５９を除去する。このとき、
汚液槽２３内の汚液１３ａの液面が高いときは、濾過ポ
ンプ２６を駆動して汚液１３ａをフィルタ装置２８に送
って濾過し、電磁弁６２を開放して清液槽２２内の加工
液１３を槽外へ排出する。In order to remove the sludge accumulated at the bottom of the waste tank 23, the movable partition plate 53 is moved to the waste tank 2 as shown in FIG.
3 and the bottom cover 59 is removed. At this time,
When the liquid level of the waste liquid 13a in the waste liquid tank 23 is high, the filtration pump 26 is driven to send the waste liquid 13a to the filter device 28 for filtration. The processing liquid 13 is discharged out of the tank.
【００４１】そして、制御器５６の指令によりモータ５
１、ねじ棒５２を駆動し、図１２に示すようにこれに結
合された可動仕切板５３を右方に移動させ、汚液槽２１
の底部に溜った汚泥を掻いて汚泥槽６０内に集積させ
る。この間、汚液１３ａは濾過ポンプ２６によりフィル
タ装置２８に送られ、濾過された加工液１３は清液槽２
２から電磁弁６２を介して排出される。可動仕切板５３
が右方に移動してリミットスイッチ５７に当接すると、
制御器５６の指令によりモータ５７が停止し、電磁弁６
２は閉成する。このときの状態を図１２に示す。The motor 5 is controlled by a command from the controller 56.
1. The screw rod 52 is driven to move the movable partition plate 53 connected thereto to the right as shown in FIG.
The sludge collected at the bottom of the tank is scraped and accumulated in the sludge tank 60. During this time, the waste liquid 13a is sent to the filter device 28 by the filtration pump 26, and the filtered working fluid 13 is
2 through a solenoid valve 62. Movable partition plate 53
Moves to the right and contacts the limit switch 57,
The motor 57 is stopped by a command from the controller 56 and the solenoid valve 6 is stopped.
2 closes. FIG. 12 shows the state at this time.
【００４２】ついで、図１０に示すように開口部５８を
底蓋５９で閉鎖し、図１３に示すように汚泥槽６０を本
体２１から取外して中に集積された汚泥を廃棄する。Next, as shown in FIG. 10, the opening 58 is closed with a bottom lid 59, and as shown in FIG. 13, the sludge tank 60 is removed from the main body 21 and the sludge accumulated therein is discarded.
【００４３】以上本発明の実施例について説明したが、
本発明はこれに限定するものではなく、フィルタ装置そ
の他各部の構造は適宜変更することができる。The embodiment of the present invention has been described above.
The present invention is not limited to this, and the structures of the filter device and other components can be appropriately changed.
【００４４】[0044]
【発明の効果】以上の説明から明らかなように、本発明
は、汚液槽内の汚液が減少したときは可動仕切板を汚液
槽の液面高さが増す方向に移動させて、汚液の液面を上
昇させるようにしたので、濾過ポンプが空転して故障を
生じるのを防止できる。As is apparent from the above description, according to the present invention, when the waste liquid in the waste liquid tank decreases, the movable partition plate is moved in the direction in which the liquid level of the waste liquid tank increases, Since the liquid level of the waste liquid is raised, it is possible to prevent the filter pump from running idle and causing a failure.
【００４５】また、汚液槽に開閉可能な底蓋を有する開
口部を設けると共に、この開口部に着脱可能に汚泥槽を
取付けるようにし、可動仕切板を汚液槽の液面高さが増
す方向に移動させて汚液槽内の汚液を汚泥槽内に集める
ようにしたので、汚泥の除去をきわめて容易かつ短時間
で行なうことができ、メンテナンスコストを低減するこ
とができる。In addition, an opening having a bottom cover that can be opened and closed is provided in the waste liquid tank, and a sludge tank is detachably attached to this opening, so that the movable partition plate can increase the liquid level of the waste liquid tank. Since the sludge is moved in the direction to collect the sludge in the sludge tank in the sludge tank, the sludge can be removed very easily and in a short time, and the maintenance cost can be reduced.
【００４６】また、前記可動仕切板は、平行移動する限
界を検出する検出手段が設けられて、これに当ると移動
する駆動手段が停止し、その位置に保持されるので、破
損等の事故を防止できる。Further, the movable partition plate is provided with a detecting means for detecting a limit of parallel movement, and when it hits the movable partition plate, the moving driving means stops and is held at that position, so that an accident such as breakage can occur. Can be prevented.
【図１】本発明の第１の実施例の構成図である。FIG. 1 is a configuration diagram of a first embodiment of the present invention.
【図２】第１の実施例の作用説明図である。FIG. 2 is an operation explanatory view of the first embodiment.
【図３】第１の実施例の作用説明図である。FIG. 3 is an operation explanatory view of the first embodiment.
【図４】本発明の第２の実施例の構成図である。FIG. 4 is a configuration diagram of a second embodiment of the present invention.
【図５】第２の実施例の作用説明図である。FIG. 5 is an operation explanatory view of the second embodiment.
【図６】本発明の第４の実施例の模式図である。FIG. 6 is a schematic diagram of a fourth embodiment of the present invention.
【図７】本発明の第５の実施例の要部模式図である。FIG. 7 is a schematic diagram of a main part of a fifth embodiment of the present invention.
【図８】本発明の第６の実施例の模式図である。FIG. 8 is a schematic diagram of a sixth embodiment of the present invention.
【図９】第６の実施例の作用説明図である。FIG. 9 is an operation explanatory view of the sixth embodiment.
【図１０】本発明の第７の実施例の模式図である。FIG. 10 is a schematic diagram of a seventh embodiment of the present invention.
【図１１】第７の実施例の作用説明図である。FIG. 11 is an operation explanatory view of the seventh embodiment.
【図１２】第７の実施例の作用説明図である。FIG. 12 is an operation explanatory view of the seventh embodiment.
【図１３】第７の実施例の作用説明図である。FIG. 13 is an operation explanatory view of the seventh embodiment.
【図１４】従来のワイヤ放電加工装置の一例の構成図で
ある。FIG. 14 is a configuration diagram of an example of a conventional wire electric discharge machine.
【図１５】従来のワイヤ放電加工装置における加工液供
給装置の一例の模式図である。FIG. 15 is a schematic view of an example of a machining fluid supply device in a conventional wire electric discharge machine.
【図１６】従来のワイヤ放電加工装置の他の例の模式図
である。FIG. 16 is a schematic view of another example of a conventional wire electric discharge machine.
１ 放電加工機 １３ 加工液 ２０ 加工液供給装置 ２２ 清液槽 ２３ 汚液槽 ２５ 供給ポンプ ２６ 濾過ポンプ ２７ａ，２７ｂ 取付台 ２８ａ，２８ｂ フィルタ装置 ３４ａ，３４ｂ コネクタ ３６ａ，３６ｂ カバー ３７，５４，５５ 液面検出器 ４１ａ，４１ｂ，６２ 電磁弁 ４２ 圧力計 ４３，５６ 制御器 ４５ａ，４５ｂ 流量計 ４６ 開口部 ４７ キャップ ４８ シール材 ５１ モータ ５２ ねじ棒 ５３ 可動仕切板 ５７ リミットスイッチ ５８ 開口部 ５９ 底蓋 ６０ 汚泥槽 DESCRIPTION OF SYMBOLS 1 Electric discharge machine 13 Machining fluid 20 Machining fluid supply device 22 Clean liquid tank 23 Dirty liquid tank 25 Supply pump 26 Filtration pump 27a, 27b Mounting base 28a, 28b Filter device 34a, 34b Connector 36a, 36b Cover 37, 54, 55 Liquid Surface detector 41a, 41b, 62 Solenoid valve 42 Pressure gauge 43, 56 Controller 45a, 45b Flow meter 46 Opening 47 Cap 48 Sealing material 51 Motor 52 Screw bar 53 Movable partition plate 57 Limit switch 58 Opening 59 Bottom cover 60 Sludge tank
フロントページの続き (56)参考文献 特開 平２−152723（ＪＰ，Ａ) 特開 昭59−73235（ＪＰ，Ａ) 特開 平４−201125（ＪＰ，Ａ) 特開 昭59−152027（ＪＰ，Ａ) 特開 平４−122525（ＪＰ，Ａ) 実開 昭59−193637（ＪＰ，Ｕ)Continuation of the front page (56) References JP-A-2-152723 (JP, A) JP-A-59-73235 (JP, A) JP-A-4-201125 (JP, A) JP-A-59-152027 (JP) JP-A-4-122525 (JP, A) JP-A-59-193637 (JP, U)
Claims (3)
加工部に供給し、加工後の加工液が貯蔵された汚液槽内
の加工液を濾過ポンプによりフィルタ装置に送って濾過
し、前記清液槽に貯蔵して再使用する加工液供給装置に
おいて、前記汚液槽内の加工液の少なくとも下限の液面
を検出する液面検出器と、前記汚液槽内に配置された可
動仕切板と、前記液面検出器の検出結果に基いて前記可
動仕切板を汚液槽の液面高さが増す方向に移動する駆動
手段とを備えたことを特徴とするワイヤ放電加工装置の
加工液供給装置。1. A processing liquid stored in a clear liquid tank is supplied to a processing section of a workpiece, and a processing liquid in a waste liquid tank storing the processed processing liquid is sent to a filter device by a filtration pump. In a processing fluid supply device that is filtered, stored in the cleaning fluid tank and reused, a liquid level detector that detects at least a lower limit liquid level of the processing fluid in the waste liquid tank, and disposed in the waste liquid tank. And a driving means for moving the movable partition plate in a direction in which the liquid level of the waste liquid tank increases based on the detection result of the liquid level detector. Processing fluid supply device for processing equipment.
加工部に供給し、加工後の加工液が貯蔵された汚液槽内
の加工液を濾過ポンプによりフィルタ装置に送って濾過
し、前記清液槽に貯蔵して再使用する加工液供給装置に
おいて、前記汚液槽内の加工液の少なくとも下限の液面
を検出する液面検出器と、該液面検出器の検出信号を入
力する制御器と、前記汚液槽内に配設された可動仕切板
と、前記制御器からの指令によって前記可動仕切板を汚
液槽の液面高さが増す方向に移動する駆動手段と、前記
汚液槽の底部に設けた開口部を開閉可能に閉塞する底蓋
と、前記開口部の外側において汚液槽に着脱可能に取付
けられる汚泥槽と、前記清液槽内の加工液を排出する開
閉手段とを備えたことを特徴とするワイヤ放電加工装置
の加工液供給装置。2. The processing liquid stored in the clearing liquid tank is supplied to a processing portion of the workpiece, and the processing liquid in the dirty liquid tank storing the processed processing liquid is sent to a filter device by a filtration pump. In a working fluid supply device that is filtered, stored in the cleaning fluid tank, and reused, a liquid level detector that detects at least a lower limit liquid level of the processing liquid in the waste liquid tank, and detection of the liquid level detector. A controller for inputting a signal, a movable partition plate disposed in the waste liquid tank, and a drive for moving the movable partition plate in a direction in which the liquid level of the waste liquid tank increases by a command from the controller. Means, a bottom cover for opening and closing an opening provided at the bottom of the waste liquid tank, a sludge tank detachably attached to the waste liquid tank outside the opening, and processing in the clear liquid tank. A machining fluid supply device for a wire electric discharge machine, comprising: an opening / closing means for discharging a fluid.
出手段を設けたことを特徴とする請求項２又は３記載の
ワイヤ放電加工装置の加工液供給装置。3. A machining fluid supply device for a wire electric discharge machine according to claim 2, further comprising a detection means for detecting a movement limit of said movable partition plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4029594A JP2754431B2 (en) | 1992-02-17 | 1992-02-17 | Machining fluid supply device for wire electric discharge machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4029594A JP2754431B2 (en) | 1992-02-17 | 1992-02-17 | Machining fluid supply device for wire electric discharge machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05228735A JPH05228735A (en) | 1993-09-07 |
| JP2754431B2 true JP2754431B2 (en) | 1998-05-20 |
Family
ID=12280406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4029594A Expired - Fee Related JP2754431B2 (en) | 1992-02-17 | 1992-02-17 | Machining fluid supply device for wire electric discharge machine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2754431B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5892705B2 (en) * | 2013-10-16 | 2016-03-23 | 株式会社ソディック | Machine tool machining fluid tank |
| CN103752964B (en) * | 2013-12-25 | 2015-12-09 | 青岛科技大学 | Electric spark machining working solution circular treatment recovery system and process recovery method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63107710A (en) * | 1986-10-24 | 1988-05-12 | Asahi Chem Ind Co Ltd | Continuous filter |
| JPS63123638A (en) * | 1986-11-13 | 1988-05-27 | Sodeitsuku:Kk | Filter device of electric discharge machine |
| JPH0230433A (en) * | 1988-07-21 | 1990-01-31 | Mitsubishi Electric Corp | Wire discharge processing unit |
| JPH02152723A (en) * | 1988-12-06 | 1990-06-12 | Shizuoka Seiki Co Ltd | Electrolyte processor for electrolytic finishing machine |
| JPH0379045A (en) * | 1989-08-22 | 1991-04-04 | Fujitsu Ltd | Manufacture of resin-sealed semiconductor device |
-
1992
- 1992-02-17 JP JP4029594A patent/JP2754431B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05228735A (en) | 1993-09-07 |
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