JP2725191B2 - Abrasive composition - Google Patents
Abrasive compositionInfo
- Publication number
- JP2725191B2 JP2725191B2 JP63311664A JP31166488A JP2725191B2 JP 2725191 B2 JP2725191 B2 JP 2725191B2 JP 63311664 A JP63311664 A JP 63311664A JP 31166488 A JP31166488 A JP 31166488A JP 2725191 B2 JP2725191 B2 JP 2725191B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- alumina
- water
- present
- boehmite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は研磨剤組成物に関するものである。詳しく
は、研磨能率がよく、すぐれた研磨表面を形成すること
ができる研磨剤組成物に関するものである。Description: TECHNICAL FIELD The present invention relates to an abrasive composition. More specifically, the present invention relates to a polishing composition having good polishing efficiency and capable of forming an excellent polishing surface.
従来、水とアルミナからなる研磨剤組成物は知られて
いる(例えば、特開昭54−89389号参照)が、研磨速度
が十分でなく、研磨速度を上げる目的でアルミナの粒径
を大きくすると、研磨表面に荒れが生ずるようになり、
研磨速度と表面状態を両方を満足するものとは言えなか
った。Conventionally, an abrasive composition comprising water and alumina has been known (for example, see Japanese Patent Application Laid-Open No. 54-89389), but the polishing rate is not sufficient, and when the particle size of alumina is increased for the purpose of increasing the polishing rate. , The polishing surface becomes rough,
It could not be said that both the polishing rate and the surface condition were satisfied.
過去10年間に於いて、工業的規模の生産が飛躍的に増
加したシリコン及び化合物半導体基板、各種の磁気メモ
リーハードディスク、レーザー部品等の材料の精密研磨
加工においては、特に加工面の平滑度、無欠陥性(スク
ラッチ、オレンジピール、ピット、ノジュール、クラッ
ク等の欠陥がない事)に対する要求水準が、過去の研磨
加工技術水準に比して遥かに高度化すると共に、他方、
生産、検査設備等に多額の投資が必要な為、生産スピー
ドの向上、不良欠陥ロスの低減に依るコストカットも重
要な課題となっている。In the past decade, the precision polishing of materials such as silicon and compound semiconductor substrates, various magnetic memory hard disks, and laser parts, for which the production on an industrial scale has increased dramatically, has been particularly demanded on the smoothness of the processed surface and the lack of smoothness. The required level of defectivity (the absence of defects such as scratches, orange peels, pits, nodules, cracks, etc.) has become much more advanced than the past polishing technology level,
Since a large amount of investment is required for production, inspection equipment, etc., it is also an important issue to improve production speed and cut costs by reducing loss of defective defects.
従って、これらの分野で使用される研磨剤に就いても
加工精度と共に研磨速度の向上に対する要望が極めて強
いものとなっている。Accordingly, there is an extremely strong demand for polishing agents used in these fields to improve the processing speed and the polishing rate.
本発明者らは、かかる要望を満足するよりすぐれた研
磨剤組成物を得るべく、鋭意研究を重ねた結果、水とα
−アルミナからなる研磨剤組成物に金属の亜硝酸塩を存
在させるときは、加工物加工面の平滑度、或は表面欠陥
(スクラッチ、オレンジピール等)発生防止等の研磨仕
上がり効果を低下させることなく、しかも研磨速度を大
幅に向上させることが出来ることを知得して本発明を完
成した。The present inventors have conducted intensive studies in order to obtain a better abrasive composition that satisfies such demands. As a result, water and α
-When metal nitrite is present in the abrasive composition comprising alumina, it does not decrease the polishing finish effect such as the smoothness of the processed surface of the workpiece or the prevention of surface defects (scratch, orange peel, etc.). In addition, the inventors have found that the polishing rate can be greatly improved, and have completed the present invention.
本発明の要旨は、水、α−アルミナ及び金属の亜硝酸
塩を含有してなる研磨剤組成物に存する。The gist of the present invention resides in an abrasive composition containing water, α-alumina and a metal nitrite.
以下、本発明を更に詳細に説明する。 Hereinafter, the present invention will be described in more detail.
本発明で使用するα−アルミナとしては、特に限定さ
れないがバイヤライト、ジプサイト、ハイドラージライ
ト、ベーマイト、γ−アルミナ、θ−アルミナのような
α−アルミナ以外のアルミナを、常法に従い1100℃以上
の温度で焼成して得たアルミナが挙げられる。此の焼成
温度は高い程研磨速度が大きくなる傾向があるので1200
℃以上、1200〜1500℃で焼成して得られたα−アルミナ
が好ましい。As the α-alumina used in the present invention, although not particularly limited, alumina other than α-alumina such as bayerite, gypsite, hydrazirite, boehmite, γ-alumina, and θ-alumina, 1100 ° C. or more according to a conventional method Alumina obtained by calcining at a temperature of 0.1 wt. The higher the firing temperature, the higher the polishing rate tends to be.
Α-Alumina obtained by firing at 1200 ° C. or higher and 1200 ° C. to 1500 ° C. is preferable.
加工精度及び研磨速度を考慮すると本発明で使用され
るα−アルミナは平均粒径で0.1〜10μ、好ましくは0.1
〜3μであり、又最大粒径で30μ以下、好ましくは20μ
以下の微粉体である。従って、焼成して得られたα−ア
ルミナは通常の微粉砕装置即ち湿式スラリ方式ではボー
ルミル、振動ミル等で粉砕した粗大粒子は重力沈降、遠
心沈降等の装置で分級するか、或は乾式方式即ちジェッ
ト気流に依る粉砕分級処理により所望の粒度に整粒す
る。Considering processing accuracy and polishing rate, α-alumina used in the present invention has an average particle size of 0.1 to 10 μm, preferably 0.1 to 10 μm.
~ 3μ, and the maximum particle size is 30μ or less, preferably 20μ
It is the following fine powder. Therefore, α-alumina obtained by calcination is classified into coarse particles pulverized by a ball mill, a vibration mill or the like in an ordinary fine pulverizing apparatus, that is, a wet slurry method, by means of gravity sedimentation, centrifugal sedimentation, or a dry method. That is, the particles are sized to a desired particle size by a pulverizing and classification process using a jet stream.
α−アルミナの含有量は、組成物全量に対して1〜30
重量%、好ましくは2〜15重量%である。あまりに少な
いと研磨速度が小さくなり、逆にあまりに多いと均一分
散が保てなくなり、かつ、スラリー粘度が過大となって
取扱いが困難となる。The content of α-alumina is 1 to 30 with respect to the total amount of the composition.
% By weight, preferably 2 to 15% by weight. If the amount is too small, the polishing rate will decrease. Conversely, if the amount is too large, uniform dispersion cannot be maintained, and the viscosity of the slurry will be excessive, making handling difficult.
金属の亜硝酸塩としては、種々の金属の塩が挙げられ
るが、周期律表第I〜III族の金属の塩が好ましい。具
体的には、ナトリウム、カリウム、カルシウム、マグネ
シウム、バリウム、亜鉛、アルミニウムなどの亜硝酸塩
が挙げられる。Examples of the metal nitrite include salts of various metals, and salts of metals belonging to Groups I to III of the periodic table are preferable. Specific examples include nitrites such as sodium, potassium, calcium, magnesium, barium, zinc, and aluminum.
これらの中では、アルミナ−水スラリー系に対する分
散又は凝集作用が高い点で亜硝酸カルシウム、亜硝酸カ
リウム、亜硝酸ナトリウムなどが好ましい。Among these, calcium nitrite, potassium nitrite, sodium nitrite and the like are preferable in that they have a high dispersing or aggregating effect on the alumina-water slurry system.
金属の亜硝酸塩の含有量は、組成物全量に対して0.1
〜20重量%、好ましくは0.1〜10重量%である。この量
があまりに少ないと本発明の効果が期待出来なくなる。
逆にあまりに多くても、添加効果が向上する事もなく、
冬季低温時に塩の結晶が析出するとか、排水浄化処理の
負担を増す等の不都合を生じるようになる。The content of metal nitrite is 0.1% with respect to the total amount of the composition.
-20% by weight, preferably 0.1-10% by weight. If the amount is too small, the effect of the present invention cannot be expected.
Conversely, even if it is too large, the addition effect does not improve,
Problems such as precipitation of salt crystals at a low temperature in winter and an increase in the burden of wastewater purification treatment occur.
本発明の研磨剤組成物が優れた研磨効果を有すること
の詳細は不明であるが、金属の亜硝酸塩の存在が研磨剤
組成物中のα−アルミナの分散状態に何等からの影響を
及ぼし、かかる分散状態が研磨加工に有利に作用すると
思われる。Although the details of the abrasive composition of the present invention having an excellent polishing effect are unknown, the presence of metal nitrite has any effect on the dispersion state of α-alumina in the abrasive composition, It is thought that such a dispersed state works advantageously for polishing.
また、本発明の研磨剤組成物にベーマイトを存在させ
ると、更にすぐれた効果を得ることができる。Further, when boehmite is present in the abrasive composition of the present invention, more excellent effects can be obtained.
ベーマイトは、アルミナ水和物の一種であり、ジプサ
イト等を250℃程度で加圧水熱処理するか、或はチーグ
ラー法で合成されるアルミニウム有機化合物〔Al(OR)
3〕(但し、Rはアルキル基である)の加水分解に依っ
て製造する方法で一般的に生産されており、アルミナゾ
ル、セラミックバインダー、繊維製品カーペットの帯電
防止処理、水の浄化処理、化粧品、軟こうの増粘剤、ア
ルミナ系触媒又は触媒担体等の原料として広く利用され
ている工業材料である。Boehmite is a type of alumina hydrate, and is obtained by subjecting gypsite or the like to pressurized hydrothermal treatment at about 250 ° C. or an aluminum organic compound [Al (OR) synthesized by the Ziegler method.
3 ] (where R is an alkyl group), which is generally produced by a method of producing by hydrolysis, and comprises alumina sol, ceramic binder, antistatic treatment of textile carpet, water purification treatment, cosmetics, It is an industrial material widely used as a raw material for ointment thickeners, alumina-based catalysts or catalyst carriers.
ベーマイトは、AlOOH又はAl2O3・H2Oの化学式で表示
される物質で、粉体製品としては、例えば、KAISER(米
国)、VISTA Chemical(米国)、Condea Chemie(ドイ
ツ)等から市販されている。例えば200μ以下95%、45
μ以下50%の粒子からなる粉体を水中又は酸性の水中で
撹拌、分散させると、一部繊維状、大部分は粒状で、且
つそのサイズが0.01μ以下の超微細粒子の形で分散し、
コロイド状のゾルを形成する性質を有する。ベーマイト
のゾルは等電点9.4であり、粒子自身が陽性に帯電して
いる事が電気泳動法により観測される。Boehmite, a material represented by Formula a AlOOH or Al 2 O 3 · H 2 O , as the powder product, for example, KAISER (USA), VISTA Chemical (USA), available from Condea Chemie (Germany), etc. ing. For example, 95%, 45%
When a powder consisting of particles of 50% or less is stirred and dispersed in water or acidic water, it is dispersed in the form of ultrafine particles, which are partially fibrous, mostly granular, and have a size of 0.01μ or less. ,
It has the property of forming a colloidal sol. The boehmite sol has an isoelectric point of 9.4, and it is observed by electrophoresis that the particles themselves are positively charged.
本発明で水に分散されるベーマイトは粉体でもベーマ
イトゾルでも使用可能であるが、いずれの場合も、水に
分散させた場合に粒子径が0.01μ以下のゾルを形成する
ものを使用する。ベーマイトの含有量は組成物全量に対
し0.1〜20重量%、好ましくは0.5〜10重量%である。ベ
ーマイト含有量が余りに少ないと研磨速度向上の効果が
期待出来ず、逆に余りに多いと見掛粘度、チキソトロピ
ー性が増大し、α−アルミナの均一分散性を損なう事と
なると同時に研磨剤組成物の容器からの取出しが困難と
なる等ハンドリング上不適な物性となる。The boehmite dispersed in water in the present invention may be a powder or a boehmite sol. In any case, a sol having a particle diameter of 0.01 μm or less when dispersed in water is used. The boehmite content is 0.1 to 20% by weight, preferably 0.5 to 10% by weight, based on the total amount of the composition. When the boehmite content is too small, the effect of improving the polishing rate cannot be expected.On the contrary, when the boehmite content is too large, the apparent viscosity, thixotropy increases, and the uniform dispersibility of α-alumina is impaired. Physical properties unsuitable for handling, such as difficulty in taking out from the container.
水、α−アルミナ及び金属の亜硝酸塩を含有してなる本
発明研磨剤組成物に更にベーマイトを含有することによ
る作用の詳細は不明であるが、以下の如く推定される。
即ち、前述のα−アルミナ粒子は、これを水中又は酸性
の水中で撹拌し分散させると、個々の粒子は陽性を電荷
を保有し、水又は電解質の陰イオンを吸着し電気的二重
層を形成する。かかる微粒子の分散系にあってはファン
デルワールス引力に依る凝集と電気的斥力に依る反発作
用力とで或る種の平衡状態を形成させるのであるが、こ
ゝにベーマイトを共存させると、ベーマイトは該水中で
陽性に帯電するため、全体の分散系としては電気的斥力
に依る粒子相互間の分散効果が強まる事となる。かかる
スラリー状研磨剤による精密研磨加工に於ては遊離砥粒
であるα−アルミナ粒子が単分散又は凝集状態で研磨パ
ッドに保持され、或る加工圧で被加工物表面を摺動する
につれて、砥粒(α−アルミナ粒子)がころがりつゝ或
は滑りつゝ研削作用を及ぼしている事になり、砥粒が被
加工物表面を研削する作用点の数が多く且つ各作用点で
の研削作用力が均一である程、加工時の単位摺動量、単
位時間当りの研磨量が大きく且つ加工表面精度が高くな
る筈である。しかしながら、研磨パッドと被加工物表面
の接触面では砥粒(α−アルミナ)と被加工物が研削さ
れて発生した微細粒子(削りかす)が水に懸濁したスラ
リ状態で存在するため、個々の粒子の分散又は凝集状態
が研磨量、研磨仕上り性に強く影響を及ぼすであろう事
が推定されるが、本発明の如く水、α−アルミナ及び金
属の亜硝酸塩、場合によっては更にベーマイトを含有し
てなる研磨剤に於ては金属の亜硝酸塩及びベーマイトが
各粒子の分散又は凝集状態に影響し、研磨性能の向上を
もたらすと思われる。The details of the action of further containing boehmite in the polishing composition of the present invention containing water, α-alumina and metal nitrite are unknown, but are presumed as follows.
That is, when the above-mentioned α-alumina particles are stirred and dispersed in water or acidic water, the individual particles retain a positive charge and adsorb water or electrolyte anions to form an electric double layer. I do. In such a dispersion of fine particles, a certain equilibrium state is formed by agglomeration due to van der Waals attractive force and repulsive action force due to electric repulsion, but when boehmite coexists here, boehmite Is positively charged in the water, and as a whole dispersion system, the dispersion effect between particles due to electric repulsion is enhanced. In precision polishing with such a slurry-type abrasive, α-alumina particles, which are free abrasive grains, are held on a polishing pad in a monodispersed or aggregated state, and as the workpiece slides at a certain processing pressure, The abrasive grains (α-alumina particles) exert a rolling or sliding grinding action, and the number of action points at which the abrasive grains grind the surface of the workpiece is large, and grinding at each action point is performed. The more uniform the acting force, the larger the unit sliding amount during processing and the polishing amount per unit time, and the higher the processing surface accuracy. However, at the contact surface between the polishing pad and the surface of the workpiece, the abrasive grains (α-alumina) and the fine particles (shavings) generated by grinding the workpiece are present in a slurry state suspended in water. It is estimated that the state of dispersion or aggregation of the particles will strongly affect the polishing amount and the polishing finish, but as in the present invention, water, α-alumina and metal nitrite, and in some cases, further add boehmite. In the abrasive contained, it is considered that the metal nitrite and boehmite affect the dispersion or aggregation state of each particle, thereby improving the polishing performance.
本発明の研磨剤組成物の調製は、前記各成分を混合撹
拌すればよく、混合順序等も特に制限されるものではな
い。The abrasive composition of the present invention may be prepared by mixing and stirring the above components, and the mixing order and the like are not particularly limited.
又、この研磨剤組成物の調製に際しては、被加工物の
種類、加工条件等の研磨加工上の必要条件に応じて、下
記の如き各種の公知の添加剤を加えてもよい。In addition, in preparing the abrasive composition, various known additives as described below may be added according to the necessary conditions for polishing, such as the type of the workpiece and the processing conditions.
添加剤としては、例えば、エタノール、プロパノー
ル、エチレングリコールの様な水溶性アルコール類、ア
ルキルベンゼンスルホン酸ソーダ、ナフタリンスルホン
酸のホルマリン縮合物の様な界面活性剤、硫酸、塩酸、
硝酸、酢酸の様な酸類、リグニンスルホン酸塩、カルボ
キシメチルセルロース塩、ポリアクリル酸塩の様な有機
ポリアニオン系物質、セルロース、カルボキシメチルセ
ルロース、ヒドロキシエチルセルロースの様なセルロー
ス類、硫酸アンモニウム、塩化アンモニウム、酢酸アン
モニウムの様な無機塩類等があげられる。Examples of the additive include water-soluble alcohols such as ethanol, propanol and ethylene glycol, surfactants such as formalin condensate of sodium alkylbenzene sulfonate and naphthalenesulfonic acid, sulfuric acid, hydrochloric acid,
Organic acids such as nitric acid and acetic acid, lignin sulfonate, carboxymethyl cellulose salt, organic polyanionic substances such as polyacrylate, celluloses such as cellulose, carboxymethyl cellulose and hydroxyethyl cellulose, ammonium sulfate, ammonium chloride, ammonium acetate And the like inorganic salts.
尚、本発明の研磨剤組成物のpHとしては、3〜8、好
ましくは4〜7である。pHは、塩の糖類、添加量等に依
って変動するものであるが、一般に、水−アルミナ系研
磨剤でpHをアルカリサイドに偏倚させると、高粘度とな
り、多孔質網状組織からなる研磨パッドの目詰まり劣
化、被加工物表面へのスクラッチ発生トラブル等を起こ
し易くなるので、研磨剤組成物のpHを酸性サイドに調整
するのが通例であって、かかる目的で酸類を少量添加す
る場合がある。The pH of the polishing composition of the present invention is 3 to 8, preferably 4 to 7. The pH varies depending on the sugars and the amount of salt added. Generally, when the pH is shifted to the alkali side with a water-alumina abrasive, the viscosity becomes high and the polishing pad is made of a porous network. Deterioration of clogging and scratches on the surface of the workpiece tend to occur, so it is customary to adjust the pH of the polishing composition to the acidic side, and a small amount of acids may be added for this purpose. is there.
本発明の研磨剤組成物は、金属、ガラス、プラスチッ
ク等の研磨に使用されるが、欠陥のない研磨表面が得ら
れることから、メモリーハードディスク等の研磨に特に
好適である。The polishing composition of the present invention is used for polishing metals, glass, plastics and the like, but is particularly suitable for polishing memory hard disks and the like because a polishing surface free from defects can be obtained.
以下、実施例によって本発明を具体的に説明するが、
本発明はその要旨を超えない限り以下の実施例に限定さ
れるものではない。Hereinafter, the present invention will be described specifically with reference to Examples.
The present invention is not limited to the following examples unless it exceeds the gist.
実施例1〜8、及び比較例1 〔研磨剤組成物の調整〕 水酸化アルミニウムを1300℃、5時間の条件で焼成
し、乾式方法で粉砕整粒したα−アルミナ(平均粒子径
0.54μ、最大粒子径8μ)を、高速ミキサーを用いて水
に分散させてα−アルミナ濃度8重量%のスラリーを調
製した。Examples 1 to 8 and Comparative Example 1 [Preparation of Abrasive Composition] α-Alumina, which was obtained by calcining aluminum hydroxide at 1300 ° C. for 5 hours and pulverizing and sizing with a dry method (average particle diameter)
0.54 μm and a maximum particle diameter of 8 μm) were dispersed in water using a high-speed mixer to prepare a slurry having an α-alumina concentration of 8% by weight.
これに金属の亜硝酸塩を第1表に記載の割合で添加分
散させて研磨剤組成物を調製した。To this was added and dispersed metal nitrite in the proportions shown in Table 1 to prepare an abrasive composition.
被加工物としてアルミニウム基板にニッケル・リンの
無電解メッキ(ニッケル90〜92%、リン10〜8%の合金
メッキ層)を施した3.5インチメモリハードディスク
(外径約95m/m)の基板を使用した。3.5 inch memory hard disk (outer diameter about 95m / m) with electroless plating of nickel and phosphorus (alloy plating layer of nickel 90-92%, phosphorus 10-8%) on aluminum substrate did.
此のディスクを両面研磨機に装填して研磨する。研磨
機の上下定盤に、夫々、スエードタイプのポリウレタン
基質研磨パッドが装着してある両面研磨機に該ディスク
に装填し、ディスクと両研磨パッドを相対的に摺動させ
て5分間研磨を行なった。This disc is loaded into a double-side polishing machine and polished. The disc was loaded into a double-sided polishing machine in which a suede-type polyurethane substrate polishing pad was mounted on the upper and lower platens of the polishing machine, respectively, and the disc and both polishing pads were relatively slid to perform polishing for 5 minutes. Was.
研磨はディスクと両研磨パッドの間に上記研磨剤試料
を毎分当り300c.c.の割合で供給し、加工圧100g/cm2で
行なった。Polishing was performed at a processing pressure of 100 g / cm 2 by supplying the above-mentioned abrasive sample at a rate of 300 c.c./min. Between the disk and both polishing pads.
研磨の後、ディスクを両面研磨機より取出し、超音波
洗浄をくり返し、ディスク加工面を清浄にして、目視検
査に依り、表面欠陥の有無程度を評価した。After polishing, the disk was taken out from the double-side polishing machine, and ultrasonic cleaning was repeated to clean the processed surface of the disk, and the degree of surface defects was evaluated by visual inspection.
次にディスクの厚さの計測を行ない厚さの減少量から
毎分当りの平均研磨速度を算出した。Next, the thickness of the disk was measured, and the average polishing rate per minute was calculated from the amount of decrease in the thickness.
此の試験結果は第1表に示す通りである。 The test results are as shown in Table 1.
実施例9〜38、及び比較例2 水酸化アルミニウムを1300℃、5時間の条件で焼成
し、乾式方法で粉砕整粒したα−アルミナ(平均粒子径
0.54μ、最大粒子径8μ)を、高速ミキサーを用いて水
に分散させてα−アルミナ濃度6重量%のスラリーを調
製した。 Examples 9 to 38 and Comparative Example 2 Aluminum hydroxide was fired at 1300 ° C. for 5 hours, and α-alumina (average particle diameter) pulverized and sized by a dry method was used.
0.54 μm and a maximum particle diameter of 8 μm) were dispersed in water using a high-speed mixer to prepare a slurry having an α-alumina concentration of 6% by weight.
これに第2表に示す金属の亜硝酸塩およびベーマイト
を添加分散させて研磨剤組成物を調製した。The metal nitrite and boehmite shown in Table 2 were added and dispersed to prepare an abrasive composition.
なお、ベーマイトとしてはCondea Chemie社製Pural
(商標名)SCF(平均粒子径約20μ)を使用した。As boehmite, Pural manufactured by Condea Chemie
(Trade name) SCF (average particle diameter of about 20 μ) was used.
実施例1におけると同様にして研磨試験を行なった結
果は下記第2表に示す通りである。The results of a polishing test performed in the same manner as in Example 1 are as shown in Table 2 below.
〔発明の効果〕 本発明に従いα−アルミナ−水分散系に金属の亜硝酸
塩を添加して研磨組成物は、研磨加工面に表面欠陥を発
生する事なく、より高い研磨速度を発現し、研磨加工能
率を高めることができる。しかも、本発明の研磨剤組成
物は研磨速度が高いため、研磨加工時間の短縮、研磨剤
消費量の低減、高価なる研磨パッドの損耗、劣化の減少
等による加工コストの低下をもたらし、極めて有用であ
る。 [Effects of the Invention] The polishing composition in which a metal nitrite is added to an α-alumina-water dispersion system according to the present invention expresses a higher polishing rate without generating surface defects on the polished surface, and is polished. Processing efficiency can be increased. Moreover, since the polishing composition of the present invention has a high polishing rate, the polishing cost is reduced due to a reduction in polishing processing time, a reduction in consumption of the polishing agent, abrasion of expensive polishing pads, a reduction in deterioration, and the like, and is extremely useful. It is.
Claims (1)
有してなる研磨剤組成物。An abrasive composition comprising water, α-alumina and a metal nitrite.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63311664A JP2725191B2 (en) | 1988-12-09 | 1988-12-09 | Abrasive composition |
MYPI89000734A MY104445A (en) | 1988-12-09 | 1989-05-30 | Polishing composition. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63311664A JP2725191B2 (en) | 1988-12-09 | 1988-12-09 | Abrasive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02158682A JPH02158682A (en) | 1990-06-19 |
JP2725191B2 true JP2725191B2 (en) | 1998-03-09 |
Family
ID=18019999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63311664A Expired - Lifetime JP2725191B2 (en) | 1988-12-09 | 1988-12-09 | Abrasive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2725191B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106283059A (en) * | 2016-08-10 | 2017-01-04 | 惠州市米特仑科技有限公司 | A kind of metal surface alumina polishing solution and preparation method thereof |
CN107717636A (en) * | 2017-09-12 | 2018-02-23 | 潘汉祥 | A kind of novel metal high speed polishing method |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6007592A (en) * | 1996-11-14 | 1999-12-28 | Nissan Chemical Industries, Ltd. | Polishing composition for aluminum disk and polishing process therewith |
TW555696B (en) | 1998-01-08 | 2003-10-01 | Nissan Chemical Ind Ltd | Alumina powder, process for producing the same and polishing composition |
-
1988
- 1988-12-09 JP JP63311664A patent/JP2725191B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106283059A (en) * | 2016-08-10 | 2017-01-04 | 惠州市米特仑科技有限公司 | A kind of metal surface alumina polishing solution and preparation method thereof |
CN107717636A (en) * | 2017-09-12 | 2018-02-23 | 潘汉祥 | A kind of novel metal high speed polishing method |
Also Published As
Publication number | Publication date |
---|---|
JPH02158682A (en) | 1990-06-19 |
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