JP2642556B2 - Thermal spray coating formation method - Google Patents

Thermal spray coating formation method

Info

Publication number
JP2642556B2
JP2642556B2 JP4020282A JP2028292A JP2642556B2 JP 2642556 B2 JP2642556 B2 JP 2642556B2 JP 4020282 A JP4020282 A JP 4020282A JP 2028292 A JP2028292 A JP 2028292A JP 2642556 B2 JP2642556 B2 JP 2642556B2
Authority
JP
Japan
Prior art keywords
spraying
thermal
spitting
sprayed
thermal spray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP4020282A
Other languages
Japanese (ja)
Other versions
JPH05214505A (en
Inventor
雅明 沢
潤二 大堀
信治 佐藤
和範 瀬尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP4020282A priority Critical patent/JP2642556B2/en
Publication of JPH05214505A publication Critical patent/JPH05214505A/en
Application granted granted Critical
Publication of JP2642556B2 publication Critical patent/JP2642556B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、溶射皮膜欠陥の一つで
あるスピッティング(未溶融粒子、溶射ガン付着粒子等
の溶射皮膜内への巻き込み)欠陥を防止し、同時に表面
粗さを任意に溶射工程でつくり込むことができ、表面仕
上げ機械加工費用低減等が図れ、品質安定化並びに廉価
な溶射方法を提供するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention prevents spitting (entrapment of unmelted particles and particles deposited on a spray gun into a sprayed coating), which is one of the defects of the sprayed coating, and at the same time allows the surface roughness to be arbitrary. The purpose of the present invention is to provide a thermal spraying method, which can reduce the cost of surface finishing machining, etc., stabilize the quality, and provide an inexpensive thermal spraying method.

【0002】[0002]

【従来の技術および発明が解決しようとする課題】表面
改質を目的に、セラミックス、サーメットおよび金属な
ど多様な材料を、JIS H8200に記載されるよう
なフレーム溶射、爆発溶射等のガス溶射法、またはアー
ク溶射、プラズマ溶射等の電気式溶射法により素地表面
に溶射することが行われている。しかしながら溶射は、
材料を溶融または半溶融状態にした材料粒子を素地に吹
き付け皮膜形成させる原理上から、未溶融粒子または溶
射ガン内部付着粒子の製品皮膜への巻き込み(スピッテ
ィング)による溶射品質低下が発生する問題があり、そ
の防止に細心の注意を図らねばならない。その理由は、
スピッティング欠陥が発生すると溶射皮膜硬度低下、溶
射皮膜密着力低下や溶射層の剥離、表面仕上げ加工後の
スピッティングによるピット欠陥等表面欠陥となり、こ
れらの欠陥は、補修困難であるため、再製作となるから
である。
2. Description of the Related Art For the purpose of surface modification, various materials such as ceramics, cermets and metals are sprayed by a gas spraying method such as flame spraying or explosive spraying as described in JIS H8200. Alternatively, thermal spraying is performed on a substrate surface by an electric spraying method such as arc spraying or plasma spraying. However, thermal spraying
Due to the principle of spraying the material particles in which the material is in a molten or semi-molten state onto the base material to form a film, the problem that the spraying quality of the unmelted particles or particles adhered to the inside of the spray gun falls due to entrainment (spitting) in the product film. Yes, and we must be very careful to prevent it. The reason is,
When spitting defects occur, surface defects such as a decrease in the hardness of the thermal spray coating, a decrease in the adhesion of the thermal spray coating, a peeling of the thermal spray layer, and pit defects due to spitting after the surface finishing process are difficult to repair. This is because

【0003】このスピッティング欠陥発生防止方法とし
ては、未溶融粒子の発生が少ない溶射条件の最適化と同
時に付着粒子除去を主目的とした溶射ガンの手入れが実
施されている。しかしながら頻繁な溶射ガンの手入れ、
清掃を実施しないとスピッティング発生防止は困難で、
品質の安定化や作業効率上問題となっている。本発明に
よる解決すべき課題は、このようなスピッティング欠陥
の発生しない溶射皮膜形成方法を見いだすことにある。
[0003] As a method of preventing the occurrence of spitting defects, care has been taken to optimize the spraying conditions in which the generation of unmelted particles is small and at the same time to maintain the spraying gun mainly for removing adhered particles. However, frequent maintenance of the spray gun,
Without cleaning, it is difficult to prevent spitting,
This is a problem in stabilizing quality and work efficiency. The problem to be solved by the present invention is to find a method for forming a thermal spray coating that does not cause such spitting defects.

【0004】[0004]

【課題を解決するための手段】本発明者は、これらの問
題を解決するために、種々の研究を行い、スピッティン
グ欠陥を防止し、同時に爆発溶射法のような間欠溶射等
で比較的溶射仕上がり表面粗さの大きい溶射に対して仕
上がり表面粗さを低減でき、表面仕上げ機械加工費用低
減等を図る、安定品質並びに廉価な溶射方法を見いだ
し、大幅な作業効率向上と同時に溶射製品の品質安定化
を達成したものである。
In order to solve these problems, the present inventor has conducted various studies to prevent spitting defects and at the same time relatively sprayed by intermittent spraying such as explosive spraying. We can find a stable quality and low-cost spraying method that can reduce the finished surface roughness for thermal spraying with large finished surface roughness, reduce the cost of surface finishing machining, etc., greatly improve work efficiency and simultaneously stabilize the quality of sprayed products. Is achieved.

【0005】本発明は、溶射工程内で課題を解決するも
ので、即ち本発明の要旨は、溶射と同時に、Ra 1μm
からRa 15μmの範囲で表面に乾式研磨又は研削加工
を施し、皮膜積層することを特徴とした皮膜欠陥のない
溶射皮膜形成方法にある。
The present invention solves the problem in the thermal spraying process. That is, the gist of the present invention is to provide a method of forming a film having a Ra 1 μm
And Ra is 15 μm in the range, and the surface is subjected to dry polishing or grinding , and the films are laminated to form a thermal sprayed coating free from coating defects.

【0006】本発明者らは、鋭意調査、実験を繰り返し
た結果、スピッティング粒子は皮膜吹き付け直後は密着
力が小さく除去可能である知見を得た。即ちスピッティ
ング欠陥は未溶融粒子または溶射ガン内部付着粒子の製
品皮膜への巻き込みであるが、その発生機構は付着スピ
ッティング異物粒子へのその後の溶射積層により内部欠
陥となるもので、付着直後に除去すればよく、また付着
直後のスピッティング粒子は密着力が極めて小さく除去
可能である実験結果を得た。スピッティングは偶発的に
発生することからスピッティング発生を検知しその都度
除去する方法は、困難でまた作業効率上も好ましくな
い。そこで溶射と同時に軽い表面加工を施し常に溶射積
層と軽研磨、研削加工を行う方法を発案したものであ
る。
As a result of repeated investigations and experiments, the present inventors have found that spitting particles have a small adhesion and can be removed immediately after spraying a film. In other words, the spitting defect is the entrainment of unmelted particles or particles adhered inside the spray gun into the product film, and the mechanism of its occurrence is an internal defect due to the subsequent thermal spray lamination to the adhered spitting foreign particles, and immediately after adhesion. An experimental result was obtained in which the spitting particles immediately after adhesion had very small adhesion and could be removed. Since spitting occurs accidentally, it is difficult to detect spitting occurrence and remove it each time, which is not preferable in terms of work efficiency. Therefore, a method was devised in which light surface processing was performed simultaneously with thermal spraying to constantly perform thermal spray lamination, light polishing and grinding.

【0007】溶射は、溶射途中の皮膜には一切手を加え
ぬことが、常識とされている。その理由は、溶射は、他
の表面処理技術に比べ密着力が低い欠点があり、また溶
射の密着機構が溶射粒子が素地または溶射皮膜を構成し
ている粗面に機械的にかみ合うことによって密着する投
びょう効果であるため、密着力低下に直接つながる行為
を行わないこと、例えば、素地表面や溶射途中の溶射皮
膜表面には、油脂付着の原因となるので、手で触れた
り、機械加工を加えたりしないこととされている。
[0007] It is common knowledge that spraying does not involve any modification to the coating during spraying. The reason is that thermal spraying has the drawback of lower adhesion than other surface treatment technologies, and the thermal spray adhesion mechanism is based on the fact that the thermal spray particles mechanically mesh with the base material or the rough surface that constitutes the thermal spray coating. An action that directly leads to a decrease in adhesion due to the casting effect
Do not perform, for example, the surface of the substrate or the surface of the thermal spray coating during thermal spraying may cause grease to adhere,
And do not add any mechanical processing.

【0008】しかしながら本発明者は、鋭意調査、実験
を繰り返した結果、乾式の表面加工方法で且つ、表面粗
さを適正に保てば密着力は低下しないことを確認した。
その適正範囲は、Ra 1μmからRa 15μmである。
表面粗さRa 1μm未満ではスピッティング除去効果は
問題ないものの、前述した溶射密着力低下が顕著で皮膜
密着力の安定的確保が困難である。またRa 15μmを
超えるとスピッティング除去効果および溶射密着力安定
確保は問題ないものの、溶射皮膜の生成歩留が悪化し、
経済的に好ましくない。
However, as a result of repeated studies and experiments, the present inventor has confirmed that the adhesion is not reduced by a dry surface processing method and by properly maintaining the surface roughness.
The appropriate range is from Ra 1 μm to Ra 15 μm.
If the surface roughness Ra is less than 1 μm, there is no problem in the effect of removing spitting, but the above-mentioned decrease in the thermal spray adhesion is remarkable, and it is difficult to secure a stable film adhesion. On the other hand, if Ra exceeds 15 μm, the spitting removal effect and the thermal spray adhesion stability are not problematic, but the production yield of the thermal spray coating deteriorates.
Not economically favorable.

【0009】表面加工方法としては、乾式研磨・研削方
法であれば特に問題なく、一例として図1に示す方法を
以下説明する。図1(a)は円筒研磨方式で、ロール2
を回転させながら溶射ガン1を溶射し同時に溶射直後に
円筒研磨砥石4で溶射層3に表面加工を施す方法であ
る。図1(b)は研磨材押し付けによる方式で、ロール
2を回転させながら溶射ガン1で溶射し同時に溶射直後
に研磨布押し付け治具6に装着された研磨布5により溶
射層3に表面加工を施す方法である。図1(a),
(b)いずれも研磨材料の砥粒の粒度選択により仕上げ
加工表面粗さが変えられるが、(a)により得られる表
面粗さは比較的小さい範囲が得られ、一方(b)により
得られる表面粗さは比較的大きい範囲が得られる。これ
らは、最終仕上げ仕様や目的に応じて選択すれば良い。
As the surface processing method, there is no particular problem as long as it is a dry polishing / grinding method, and the method shown in FIG. 1 will be described below as an example. FIG. 1A shows a cylindrical polishing method, in which a roll 2 is used.
In this method, the spraying gun 1 is sprayed while rotating, and the surface of the sprayed layer 3 is simultaneously processed with the cylindrical grinding wheel 4 immediately after the spraying. FIG. 1 (b) shows a method of pressing an abrasive, in which the spraying is performed by a spray gun 1 while rotating a roll 2, and at the same time, immediately after the spraying, the surface of the sprayed layer 3 is processed by a polishing cloth 5 mounted on a polishing cloth pressing jig 6. It is a method of applying. FIG. 1 (a),
(B) In any case, the finished surface roughness can be changed by selecting the particle size of the abrasive grains of the polishing material, but the surface roughness obtained by (a) can be obtained in a relatively small range, while the surface obtained by (b) A relatively large range of roughness is obtained. These may be selected according to the final finishing specifications and purpose.

【0010】図2に従来方法と本発明方法の積層方法の
差異を示す。従来方法は溶射第1層7、溶射第2層8、
溶射第3層9と溶射積層が進むにつれ、10の溶射層へ
の付着または溶射層内巻き込みスピッティング欠陥が増
加し、溶射製品に多くの欠陥が含まれることになる。一
方本発明は、溶射直後の表面加工により、溶射第1層
7、溶射第2層8、溶射第3層9と積層が進んでも、た
えず同時表面加工にて11に示すようにスピッティング
欠陥は除去され、欠陥の無い溶射製品となる。また同一
溶射積層回数でも従来法溶射有効厚みt1 に比べ本発明
溶射有効厚みt2が大きくなり、経済的にも作業効率的
にも優れた結果を得ることができる。
FIG. 2 shows the difference between the conventional method and the lamination method of the present invention. In the conventional method, the first sprayed layer 7, the second sprayed layer 8,
As the thermal spray third layer 9 and the thermal spray lamination progress, the adhesion to the thermal spray layer 10 or the spitting defects involved in the thermal spray layer increase, and the thermal spray product contains many defects. On the other hand, according to the present invention, even if the lamination of the first sprayed layer 7, the second sprayed layer 8, and the third sprayed layer 9 is advanced by the surface processing immediately after the thermal spraying, the spitting defect is constantly shown in 11 by the simultaneous surface processing. Removed, resulting in a defect-free spray product. The same spraying also present invention spraying effective thickness t 2 becomes larger than the conventional method spraying effective thickness t 1 in a stacked number of times, it is possible to economically obtain excellent results in work efficiency.

【0011】以上述べた本発明溶射方法は、スピッティ
ング防止のみならず、同時に溶射仕上がり表面粗さを任
意に得ることができる。従来用途に応じて溶射製品の表
面粗さを要求される場合、溶射後に研磨あるいはショッ
トダル加工を施こして所定の表面粗さを得ているが、本
発明溶射方法によれば溶射工程で所定の表面粗さを得る
ことができ、もって工程省略によるコスト低減を図るこ
とができる。また爆発溶射法のような間欠溶射等でプラ
ズマ溶射等の連続溶射法に比べ溶射仕上がり表面粗さの
大きい溶射に対して仕上がり表面粗さを大幅に低減で
き、表面仕上げ機械加工費用低減等を図ることも可能で
ある。さらに本方法は、特に溶射方法や溶射膜厚に制限
のあるものではなく、溶射法すべてに適用可能である
が、特に溶射法の中でも燃焼チャンバーを有した溶射ガ
ンを用いる超音速ガス溶射(ジェットコートガン)や爆
発溶射ガン等のスピッティングの発生しやすい機種に対
して極めて有効な方法である。
The above-described thermal spraying method of the present invention can not only prevent spitting but also arbitrarily obtain a desired surface roughness after thermal spraying. Conventionally, when the surface roughness of a sprayed product is required depending on the application, a predetermined surface roughness is obtained by polishing or shot dulling after spraying, but according to the spraying method of the present invention, a predetermined surface roughness is obtained in the spraying process. Surface roughness can be obtained, and the cost can be reduced by omitting the steps. In addition, compared to continuous spraying such as plasma spraying, intermittent spraying such as explosive spraying can greatly reduce the finished surface roughness for thermal spraying with a large finished surface roughness, and reduce the cost of surface finishing machining. It is also possible. Further, the present method is not particularly limited in the thermal spraying method and the thermal spray film thickness, and is applicable to all thermal spraying methods. In particular, in the thermal spraying method, supersonic gas spraying using a thermal spray gun having a combustion chamber (jet This is an extremely effective method for models where spitting is likely to occur, such as a coat gun) or an explosive spray gun.

【0012】[0012]

【実施例】 (実施例1)各種溶射機種にて従来方法と本発明溶射方
法でスピッティング欠陥発生量の評価試験を実施した。
試験方法は溶射ガンの清掃・手入れなしで所定時間連続
運転後、所定の面積範囲(100cm2 )の試験片に溶射
し、スピッティング欠陥の数量を評価した。試験条件は
以下の通りである。
EXAMPLES (Example 1) An evaluation test of the amount of spitting defects generated was performed with various methods of thermal spraying by the conventional method and the thermal spraying method of the present invention.
The test method was such that after continuous operation for a predetermined period of time without cleaning and maintenance of the spraying gun, a test piece in a predetermined area range (100 cm 2 ) was sprayed to evaluate the number of spitting defects. The test conditions are as follows.

【0013】試験片仕様 試験片サイズ:φ50mm,長さ200mm 基材材質:SS41 溶射材料:WC−Co 溶射膜厚:100μm 試験条件 試験片溶射前連続運転時間:30分,60分,120分 溶射方法 プラズマ溶射:型式 プラズマダインSG−100 モード 80kWMII プラズマガス 150 psi/Ar,200 psi/He 溶射距離 80mm フレーム溶射:型式 メテコHVOF式DJガン 燃料ガス 150 psi/O2 ,100 psi/C3 6 溶射距離 180mm 爆発溶射 :型式 ソ連造船工業省 ADK 燃料ガス 混合比O2 /C2 2 =1.1 爆発サイクル 毎秒4ショット 溶射距離 200mm 表1に試験結果を示す。本発明法の溶射法は、比較例と
比べて優れたスピッティング欠陥防止効果が確認されて
いる。尚、本発明に用いた同時乾式表面加工方法は、実
施例2で示すFタイプで実施した。
Test piece specifications Test piece size: φ50 mm, length 200 mm Base material: SS41 Sprayed material: WC-Co Sprayed film thickness: 100 μm Test conditions Continuous operation time before test piece spraying: 30, 60, 120 minutes Spraying how plasma spraying: type plasma dyne SG-100 mode 80kWMII plasma gas 150 psi / Ar, 200 psi / He spray distance 80mm flame spraying: type Meteko HVOF type DJ gun fuel gas 150 psi / O 2, 100 psi / C 3 H 6 spraying distance 180mm detonation: the test results to the type Soviet shipbuilding MOI ADK fuel gas mixing ratio O 2 / C 2 H 2 = 1.1 explosion cycles per second four shots spraying distance 200mm table 1. It has been confirmed that the thermal spraying method of the present invention has an excellent effect of preventing spitting defects as compared with the comparative example. In addition, the simultaneous dry-type surface processing method used in the present invention was performed with the F type shown in Example 2.

【0014】[0014]

【表1】 [Table 1]

【0015】(実施例2)実施例1の溶射機種溶射条件
で溶射後の溶射皮膜表面粗さおよび溶射皮膜密着力を評
価した。本発明に用いた同時表面加工条件は以下の通り
である。 タイプ A:円筒研削法 ダイヤモンド砥石粒度:#400番 B: 同 上 同 上 :#220番 C: 同 上 同 上 :# 80番 D:研磨布押し付け 研磨布WA粒度 :#180番、押し付け荷重5kg E: 同 上 同 上 :#100番、 同 上 F: 同 上 同 上 :# 80番、 同 上 G: 同 上 同 上 :# 60番、 同 上 表2に試験結果を示す。本発明の溶射方法は溶射工程で
所定の表面粗さを得ることができ、且つ剥離など有害な
溶射皮膜密着力低下がない。
(Example 2) The surface roughness of the sprayed coating and the adhesion of the sprayed coating after thermal spraying were evaluated under the thermal spraying conditions of the thermal spraying machine of Example 1. The simultaneous surface processing conditions used in the present invention are as follows. Type A: Cylindrical grinding method Diamond grindstone grain size: # 400 B: Same as above Same as above: # 220 C: Same as above Same as above: # 80 D: Polishing cloth pressing Polishing cloth WA particle size: # 180, pressing load 5 kg E: Ditto Ditto: # 100, Ditto F: Ditto Ditto: # 80, Ditto G: Ditto Ditto: # 60, Ditto Table 2 shows the test results. According to the thermal spraying method of the present invention, a predetermined surface roughness can be obtained in the thermal spraying step, and there is no harmful decrease in adhesion of the thermal sprayed coating such as peeling.

【0016】[0016]

【表2】 [Table 2]

【0017】[0017]

【発明の効果】以上のように、本発明によれば、溶射皮
膜欠陥の一つである極めて有害なスピッティング欠陥を
防止し、品質安定化が図れ、同時に表面粗さを任意に溶
射工程でつくり込むことができ、表面仕上げ等の機械加
工費用を低減する等廉価な溶射方法を実現するものであ
る。
As described above, according to the present invention, extremely harmful spitting defects, which are one of the thermal spray coating defects, can be prevented, and the quality can be stabilized. The present invention realizes an inexpensive thermal spraying method which can be formed and reduces machining costs such as surface finishing.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明実施例1,2に使用した溶射と同時表面
加工方法の概略図である。
FIG. 1 is a schematic view of a thermal spraying and simultaneous surface processing method used in Examples 1 and 2 of the present invention.

【図2】溶射積層方法比較の概略図である。FIG. 2 is a schematic view showing a comparison of thermal spray lamination methods.

【符号の説明】[Explanation of symbols]

1 溶射ガン 2 被溶射物 3 溶射層 4 円筒研磨砥石 5 研磨布 6 研磨布押し付け治具 7 溶射第1層 8 溶射第2層 9 溶射第3層 10 溶射層への付着、又は溶射層内巻き込みス
ピッティング欠陥 11 同時表面加工にて除去されたスピッティン
グ欠陥 t1 ,t2 溶射有効膜厚
REFERENCE SIGNS LIST 1 spraying gun 2 sprayed object 3 sprayed layer 4 cylindrical polishing grindstone 5 polishing cloth 6 polishing cloth pressing jig 7 sprayed first layer 8 sprayed second layer 9 sprayed third layer 10 adhesion to sprayed layer or entrainment in sprayed layer Spitting defect 11 Spitting defect removed by simultaneous surface processing t 1 , t 2 Effective sprayed film thickness

───────────────────────────────────────────────────── フロントページの続き (72)発明者 瀬尾 和範 愛知県東海市東海町5−3 新日本製鐵 株式会社 名古屋製鐵所内 (56)参考文献 特開 昭62−47470(JP,A) 特開 昭58−3965(JP,A) 特開 平2−141565(JP,A) 実開 平4−650(JP,U) ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kazunori Seo 5-3 Tokai-cho, Tokai-shi, Aichi Prefecture Nippon Steel Corporation Nagoya Works (56) References JP-A-62-47470 (JP, A) JP-A-58-3965 (JP, A) JP-A-2-141565 (JP, A) JP-A-4-650 (JP, U)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 溶射と同時に、Ra 1μmからRa 15
μmの範囲で表面に乾式研磨又は研削加工を施し、皮膜
積層することを特徴とした皮膜欠陥のない溶射皮膜形成
方法。
1. Simultaneously with spraying, Ra 1 μm to Ra 15
A method for forming a thermal sprayed coating free of coating defects, characterized in that the surface is subjected to dry polishing or grinding in the range of μm and the coating is laminated.
JP4020282A 1992-02-05 1992-02-05 Thermal spray coating formation method Expired - Lifetime JP2642556B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4020282A JP2642556B2 (en) 1992-02-05 1992-02-05 Thermal spray coating formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4020282A JP2642556B2 (en) 1992-02-05 1992-02-05 Thermal spray coating formation method

Publications (2)

Publication Number Publication Date
JPH05214505A JPH05214505A (en) 1993-08-24
JP2642556B2 true JP2642556B2 (en) 1997-08-20

Family

ID=12022818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4020282A Expired - Lifetime JP2642556B2 (en) 1992-02-05 1992-02-05 Thermal spray coating formation method

Country Status (1)

Country Link
JP (1) JP2642556B2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3228644B2 (en) * 1993-11-05 2001-11-12 東京エレクトロン株式会社 Material for vacuum processing apparatus and method for producing the same
JP3011076B2 (en) * 1995-10-31 2000-02-21 トヨタ自動車株式会社 Cylinder head of internal combustion engine
DE60139406D1 (en) 2000-11-17 2009-09-10 Nippon Mining Co SPUTTERING TARGET PRODUCING LITTLE PARTICLES, CARRIER PLATE WITH THE TARGET AND METHOD OF MANUFACTURING THE TARGET
TWI262905B (en) * 2001-11-13 2006-10-01 Tosoh Corp Quartz glass parts, ceramic parts and process of producing those
TW200307652A (en) * 2002-04-04 2003-12-16 Tosoh Corp Quartz glass thermal sprayed parts and method for producing the same
EP2019151B1 (en) 2007-07-27 2012-09-12 Nissan Motor Co., Ltd. Thermally sprayed film forming method and device
JP5266851B2 (en) * 2007-07-27 2013-08-21 日産自動車株式会社 Thermal spray coating forming method and thermal spray coating forming apparatus
CN114559676B (en) * 2022-03-15 2022-08-23 广东富盛新材料股份有限公司 Artificial stone plate production equipment and use method thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583965A (en) * 1981-06-30 1983-01-10 Mitsubishi Heavy Ind Ltd Formation of melt-sprayed layer
JPS6247470A (en) * 1985-08-23 1987-03-02 Toshiba Corp Formation of thermally sprayed coating on inside surface of cylinder

Also Published As

Publication number Publication date
JPH05214505A (en) 1993-08-24

Similar Documents

Publication Publication Date Title
BE485463A (en)
CN1904124B (en) Method and apparatus for the application of twin wire arc spray coatings
US20170022595A1 (en) Plasma-Resistant Component, Method For Manufacturing The Plasma-Resistant Component, And Film Deposition Apparatus Used For Manufacturing The Plasma-Resistant Component
JP5215192B2 (en) Sputtering target
JP5379010B2 (en) Ytterbium sputtering target and method for producing the same.
EP1198609B2 (en) Process for producing a hard-material-coated component
JP2642556B2 (en) Thermal spray coating formation method
JP2006176882A (en) Component restoration process using cold spray
JPH06297331A (en) Device and method for blasting metal surface
KR20100011576A (en) Plasma-resistant ceramic coated substrate
WO2009123055A1 (en) Low particulate-generating sputtering target
WO2010027073A1 (en) Semiconductor fabrication device component and semiconductor fabrication device
CN112899605A (en) Preparation method and application of tungsten carbide coating
CN110815057A (en) Treatment method of acid-free phosphatized metal plate
JP2007332462A (en) Method for regenerating plasma treatment container, member inside the plasma treatment container, method for manufacturing the member inside the plasma treatment container and apparatus for plasma treatment
CN1608145A (en) Method of applying coatings
JP3076768B2 (en) Method for manufacturing member for thin film forming apparatus
JP3996039B2 (en) Method for manufacturing ceramic base material with metal spray coating
GB2295400A (en) Blade and manufacture thereof using high velocity flame spraying
JP2006316912A (en) Piston ring having ion plating film
KR102084841B1 (en) Surface treating method for controlling surface roughness of carbon material
CN113316659B (en) Method for cleaning target, method for producing target, and method for producing circulating ingot
RU2806254C1 (en) Method for polishing cylindrical surface of polycrystalline diamond coating of components
JP2610562B2 (en) Jig for thermal spray molding production
JP3024095B2 (en) Sandblasting surface treatment method

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 19970318