JP2590133B2 - Transparent plate having conductive anti-reflective coating - Google Patents
Transparent plate having conductive anti-reflective coatingInfo
- Publication number
- JP2590133B2 JP2590133B2 JP62226953A JP22695387A JP2590133B2 JP 2590133 B2 JP2590133 B2 JP 2590133B2 JP 62226953 A JP62226953 A JP 62226953A JP 22695387 A JP22695387 A JP 22695387A JP 2590133 B2 JP2590133 B2 JP 2590133B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- oxide
- refractive index
- transparent plate
- reflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、透明基板表面の光の反射を低減させるため
の導電性反射防止膜を有する透明板に関するもので、特
に高耐久性金属膜を用いて帯電防止機能を付与するに適
した導電性反射防止膜を有する透明板に関する。Description: TECHNICAL FIELD The present invention relates to a transparent plate having a conductive antireflection film for reducing the reflection of light on the surface of a transparent substrate, and particularly to a highly durable metal film. The present invention relates to a transparent plate having a conductive antireflection film suitable for providing an antistatic function by using the same.
多層膜中の一つの膜にITO膜（錫をドープしたインジ
ウム酸化物膜）を用いた反射防止膜を透明基板等の表面
に付着した導電性反射防止膜を有する透明板は特開昭59
−90801号及び特開昭60−168102号で公知である。この
ような導電性反射防止膜を有する透明板は陰極線管の表
面パネルに接着剤を介して接着し、該導電性反射防止膜
の少なくとも一ヶ所の接地電極を介して接地することに
より、陰極線管の内部に印加される高電圧によって発生
する陰極線管表面付近の強電界が導電性反射防止膜の導
電層であるITO膜を通して供給される電荷によって、該I
TO膜より外側にでるのを防ぐことができる。A transparent plate having a conductive anti-reflection film in which an anti-reflection film using an ITO film (tin-doped indium oxide film) as one of the multilayer films is adhered to the surface of a transparent substrate or the like is disclosed in
-90801 and JP-A-60-168102. A transparent plate having such a conductive anti-reflection film is adhered to a surface panel of a cathode ray tube via an adhesive, and grounded via at least one ground electrode of the conductive anti-reflection film, thereby forming a cathode ray tube. A strong electric field near the surface of the cathode ray tube generated by a high voltage applied to the inside of the substrate is charged by an electric charge supplied through the ITO film which is a conductive layer of the conductive anti-reflection film.
It can be prevented from going outside the TO film.
したがって、導電性反射防止膜を有する透明板は陰極
線管の画像を反射光なしに鮮明にみることができる外、
陰極線管により生じる強電界による悪影響、例えば人体
との間の放電や陰極線管の表面へのほこりの吸着などを
防ぐことができる利点がある。Therefore, the transparent plate having the conductive anti-reflection film can clearly see the image of the cathode ray tube without reflected light,
There is an advantage that it is possible to prevent adverse effects due to a strong electric field generated by the cathode ray tube, for example, discharge between a human body and adsorption of dust to the surface of the cathode ray tube.
また、眼鏡レンズの眼と反対側の面に指紋が付着して
も目立たない反射防止膜として、レンズ表面上に順次ニ
ッケル・クロム合金（Ni＋Cr）などの金属膜と酸化珪素
（SiO2）または弗化マグネシウム（MgF2）膜とを付着し
たものが特開昭51−95858号により公知である。In addition, a metal film such as a nickel-chromium alloy (Ni + Cr) and a silicon oxide (SiO 2 ) or fluorine film are sequentially formed on the lens surface as an anti-reflection film that is inconspicuous even when fingerprints adhere to the surface of the spectacle lens opposite to the eye. A coating with a magnesium oxide (MgF 2 ) film is known from JP-A-51-95858.
この眼鏡レンズの反射防止膜も導電性があり、その導
電性を利用することにより、反射防止作用と同時に前記
した強電界による悪影響を防止できる。The anti-reflection film of this spectacle lens is also conductive, and by utilizing the conductivity, it is possible to prevent the anti-reflection effect and at the same time prevent the adverse effects due to the strong electric field described above.
しかしながら、多層膜中の一つの膜にITO膜を用いた
導電性反射防止膜は酸化度と膜密度の一定のITO膜が形
成し難いため安定した屈折率のものが得難く、反射防止
膜の性能を低下したり、またITO膜を真空蒸着法で形成
する場合には蒸発源のITOが局部的に昇華するため、一
定の膜厚のものを形成することが困難であるという製造
上の不利がある。However, a conductive anti-reflection film using an ITO film as one of the multilayer films is difficult to form an ITO film having a constant degree of oxidation and film density, so that it is difficult to obtain a stable anti-reflection film. When the ITO film is formed by a vacuum evaporation method, the performance is lowered, and since the ITO of the evaporation source is locally sublimated, it is difficult to form a film having a constant thickness. There is.
一方、透明基板上に順次付着したニッケル・クロム合
金などの金属膜と酸化珪素、または弗化マグネシウム膜
とは陰極線管に用いる反射防止膜としては不充分な反射
防止効果しか得られない。On the other hand, a metal film such as a nickel-chromium alloy and a silicon oxide or magnesium fluoride film which are sequentially deposited on a transparent substrate can only provide an insufficient antireflection effect as an antireflection film used for a cathode ray tube.
本発明は透明基板上に、膜厚が20Å〜60Åのチタン，
クロム，ジルコニウム，モリブデン，ニッケル・クロム
合金及びステンレス（Ni＋Cr＋Fe）のいずれか一つの金
属膜と、屈折率が1.90〜2.50で、且つ膜厚が200Å〜400
Åの高屈折率誘電体膜と、屈折率が1.35〜1.50で、且つ
膜厚が700Å〜1200Åの低屈折率誘電体膜とを順次形成
し、可視域での透過率特性をフラットにした導電性反射
防止膜を有する透明板である。The present invention provides a titanium substrate having a thickness of 20-60 mm on a transparent substrate.
Any one of chromium, zirconium, molybdenum, nickel-chromium alloy, and stainless steel (Ni + Cr + Fe), with a refractive index of 1.90 to 2.50 and a thickness of 200 to 400
A high refractive index dielectric film of Å and a low refractive index dielectric film having a refractive index of 1.35 to 1.50 and a film thickness of 700 Å to 1200 順次 are sequentially formed to make the conductivity flat in the visible region. It is a transparent plate having a conductive antireflection film.
また第２の発明は透明基板上に、膜厚が10Å〜40Åの
チタン，クロム，ジルコニウム，モリブデン，ニッケル
・クロム合金及びステンレス（Ni＋Cr＋Fe）のいずれか
一つの金属膜と、屈折率が1.90〜2.50で、且つ膜厚が10
00Å〜1400Åの高屈折率誘電体膜と、屈折率が1.35〜1.
50で、且つ膜厚が700Å〜1200Åの低屈折率誘電体膜と
を順次形成し、可視域での透過率特性をフラットにした
導電性反射防止膜を有する透明板である。According to a second aspect of the present invention, a metal film of any one of titanium, chromium, zirconium, molybdenum, nickel-chromium alloy and stainless steel (Ni + Cr + Fe) having a film thickness of 10 to 40 mm and a refractive index of 1.90 to 2.50 are formed on a transparent substrate. And the film thickness is 10
A high-refractive-index dielectric film of 00 ° to 1400 ° and a refractive index of 1.35 to 1.
This is a transparent plate having a conductive antireflection film having a low refractive index dielectric film having a thickness of 700 ° to 1200 ° and a flat transmittance characteristic in the visible region.
本発明による導電性反射防止膜を有する透明板は導電
性反射防止膜の層を３層にして、その１層にチタン，ク
ロム，ジルコニウム，モリブデン，ニッケル・クロム合
金及びステンレス（Ni＋Cr＋Fe）のいずれか一つの金属
膜を用いて導電性を付与し、しかもこれらの金属膜は真
空蒸着法により安定して形成でき、反射防止膜の特性を
安定したものにすることができる。The transparent plate having the conductive anti-reflection film according to the present invention has three layers of the conductive anti-reflection film, one of which is selected from titanium, chromium, zirconium, molybdenum, nickel-chromium alloy and stainless steel (Ni + Cr + Fe). One metal film is used to impart conductivity, and furthermore, these metal films can be formed stably by a vacuum deposition method, and the characteristics of the antireflection film can be stabilized.
〔実施例１〕 以下、本発明の実施例を図面を引用して説明する。Embodiment 1 Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
第１図において11はガラス基板、12は11の上に形成さ
れた多層導電性反射防止膜であり、ガラス基板11として
は屈折率1.52のフロートガラス板を通常用いるが、屈折
率1.45〜1.60の範囲の透過性を有する他の種類のガラス
板、各種プラスチック板、特にハードコートを施したプ
ラスチック板又はプラスチックフィルムを用いてもよ
く、多層導電性反射防止膜12は金属膜13と高屈折率誘電
体膜14と低屈折率誘電体膜15とからなる。In FIG. 1, 11 is a glass substrate, 12 is a multilayer conductive anti-reflection film formed on 11, and a float glass plate with a refractive index of 1.52 is usually used as the glass substrate 11, but a refractive index of 1.45 to 1.60 is used. Other types of glass plates having various transmittances, various types of plastic plates, especially plastic plates or plastic films having a hard coat may be used, and the multilayer conductive antireflection film 12 is made of a metal film 13 and a high refractive index dielectric. It comprises a body film 14 and a low-refractive-index dielectric film 15.
金属膜13としては可視波長全域にわたって透過率がほ
ぼ一定で、且つ薄い連続膜に形成が容易な高耐性のもの
が良く、チタン（Ti），クロム（Cr），ジルコニウム
（Zr），モリブデン（Mo），ニッケル・クロム合金（Ni
＋Cr），ステンレス（Ni＋Cr＋Fe）を用いることができ
る。The metal film 13 preferably has a high transmittance that is substantially constant over the entire visible wavelength range and is easily formed into a thin continuous film. The metal film 13 may be made of titanium (Ti), chromium (Cr), zirconium (Zr), or molybdenum (Mo). ), Nickel-chromium alloy (Ni
+ Cr) and stainless steel (Ni + Cr + Fe).
また、高屈折率誘電体膜14としては酸化チタン（TiO2
屈折率2.4），酸化タンタル（Ta2O5,屈折率2.1），酸化
ジルコニウム（ZrO2,屈折率2.05），酸化ハフニウム（H
fO2,屈折率1.9），酸化ジルコニウムと酸化チタンの混
合物（ZrO2＋TiO2,屈折率2.1〜2.2）、酸化プラセオジ
ウムと酸化チタンの混合物（Pr6O11＋TiO2,屈折率2.1〜
2.3）が適している。更にまた低屈折率誘電体膜15とし
ては酸化珪素（SiO2,屈折率1.46）及び弗化マグネシウ
ム（MgF2,屈折率1.38）を用いることができる。Further, as the high refractive index dielectric film 14, titanium oxide (TiO 2
Refractive index 2.4), tantalum oxide (Ta 2 O 5 , refractive index 2.1), zirconium oxide (ZrO 2 , refractive index 2.05), hafnium oxide (H
fO 2 , refractive index 1.9), mixture of zirconium oxide and titanium oxide (ZrO 2 + TiO 2 , refractive index 2.1-2.2), mixture of praseodymium oxide and titanium oxide (Pr 6 O 11 + TiO 2 , refractive index 2.1-
2.3) is suitable. Further, as the low refractive index dielectric film 15, silicon oxide (SiO 2 , refractive index 1.46) and magnesium fluoride (MgF 2 , refractive index 1.38) can be used.
金属膜13、高屈折率誘電体膜14、及び低屈折率誘電体
膜15は真空蒸着法によって容易にガラス基板上に形成で
きる。また、これらの物質のうち弗化マグネシウム（Mg
F2）を除く他の前記物質はスパッタリングによって容易
に形成できる。The metal film 13, the high-refractive-index dielectric film 14, and the low-refractive-index dielectric film 15 can be easily formed on a glass substrate by a vacuum deposition method. In addition, magnesium fluoride (Mg
The above-mentioned substances other than F 2 ) can be easily formed by sputtering.
金属膜13をガラス基板上に形成する際金属膜13の表面
が酸化する傾向があり、酸化した部分により、導電性や
光学特性の寄与が低下する場合には金属膜13を形成する
際には酸化する部分の厚さをあらかじめ見込んで、設計
した金属層の膜厚よりも、その分だけ厚い膜を形成する
とよい。例えばステンレス膜を真空蒸着で作成する場合
には厚さ15Åの酸化層が形成されることがあり、これを
見込んでおけば設計通りの導電性と光学特性を持った多
層反射防止膜が得られる。When the metal film 13 is formed on a glass substrate, the surface of the metal film 13 tends to be oxidized, and when the oxidized portion reduces the contribution of conductivity or optical characteristics, when forming the metal film 13, It is preferable to form a film thicker than the designed thickness of the metal layer by considering the thickness of the portion to be oxidized in advance. For example, when a stainless steel film is formed by vacuum deposition, an oxide layer having a thickness of 15 mm may be formed, and if this is taken into consideration, a multilayer antireflection film having the designed conductivity and optical characteristics can be obtained. .
第１表に本実施例の膜構成の屈折率と膜厚の設計例を
掲げた。Table 1 shows design examples of the refractive index and the film thickness of the film configuration of this example.
酸化珪素と酸化チタンの光学定数は消衰係数が零でま
た波長依存性が弱いので、屈折率も第１表に示した近似
値をとるが、インコネルと呼ばれるステンレス（NCが72
重量％、Crが16重量％、Feが８重量％、残部が不純物）
の光学定数は消衰係数が零でなく、また波長依存性が強
いので、その屈折率と消衰係数とは第２表の如くなる。Since the optical constants of silicon oxide and titanium oxide have an extinction coefficient of zero and a weak wavelength dependence, the refractive index also takes the approximate value shown in Table 1, but the stainless steel called Inconel (NC is 72
Weight%, Cr 16% by weight, Fe 8% by weight, the balance is impurities)
Since the optical constant has an extinction coefficient other than zero and a strong wavelength dependence, its refractive index and extinction coefficient are as shown in Table 2.
第１図及び第１表に示された、本発明の導電性反射防
止膜を有する透明板を膜側が外側になるように陰極線管
の表示パネルにガラス基板および表示パネルの屈折率に
近い屈折率をもつ接着剤で貼付ける。そして導電性反射
防止膜12の少なくとも１点の接地電極を陰極線管装置本
体の接地点に接続する。 The transparent plate having the conductive anti-reflection film of the present invention shown in FIG. 1 and Table 1 is applied to the display panel of the cathode ray tube so that the film side is on the outside, and the refractive index is close to the refractive index of the glass substrate and the display panel. Attach with an adhesive with. Then, at least one ground electrode of the conductive antireflection film 12 is connected to a ground point of the cathode ray tube device main body.
このように陰極線管に貼付けられた導電性反射防止膜
を有する透明板の反射特性を第２図に示す。第２図から
明らかなように該透明板は充分な反射防止効果を持って
いる。またこの透明板の透過率は第３図に示され陰極線
管表示面のコントラストを向上させるに適した透過率60
％〜70％の範囲でフラットである。FIG. 2 shows the reflection characteristics of the transparent plate having the conductive antireflection film attached to the cathode ray tube as described above. As is clear from FIG. 2, the transparent plate has a sufficient antireflection effect. The transmittance of this transparent plate is shown in FIG. 3 and is suitable for improving the contrast of the display surface of the cathode ray tube.
It is flat in the range of% to 70%.
一方、帯電防止作用は前記金属膜15の導電性により得
られる。この金属層13の厚味は最低でも10Åあり、第４
図に示す通り100KΩ・S4未満であり帯電防止の目的が達
せられる。陰極線管の内部に印加される高電圧により表
示パネルの前方に発生する強い電界は接地電極および前
記金属層３を通して供給される電荷によって遮蔽される
ため、人体との間での放電などの不快な現象は発生しな
い。On the other hand, the antistatic effect is obtained by the conductivity of the metal film 15. The thickness of this metal layer 13 is at least 10 mm,
As shown in the figure, it is less than 100 KΩ · S4, and the purpose of antistatic is achieved. A strong electric field generated in front of the display panel due to a high voltage applied to the inside of the cathode ray tube is shielded by the ground electrode and the electric charge supplied through the metal layer 3, so that an unpleasant electric discharge between the human body and the like is caused. No symptoms occur.
なお、接地電極は多層反射防止膜２の最表面層５の上
から金属片や導電加工を施したプラスチックケースなど
を接触させるだけで充分な導通が得られ、必ずしも前記
金属膜３に直接接触させる必要はない。In addition, sufficient electrical continuity can be obtained only by contacting a metal piece or a plastic case which has been subjected to conductive processing from above the outermost surface layer 5 of the multilayer anti-reflection film 2, and the ground electrode is always brought into direct contact with the metal film 3. No need.
〔実施例２〕 実施例１と同様に、第５図及び第３表に示した他の態
様の導電性反射防止膜を有する透明板を製造した。本実
施例においては多層導電性防止膜52を構成するガラス基
板51上の金属膜53と、高屈折率誘電体膜54と低屈折率誘
電体膜55との厚みが実施例１と第３表の如く異なるのみ
である。特に高屈折率誘電体膜54が1000Å〜1400Åの範
囲の値をとり、実施例１のものと大幅に異なる。この高
屈折率誘電体膜54を400Å〜1000Åの範囲の膜厚は良い
反射防止効果を得ることができない。Example 2 In the same manner as in Example 1, a transparent plate having a conductive anti-reflection film of another embodiment shown in FIG. 5 and Table 3 was produced. In this embodiment, the thicknesses of the metal film 53, the high refractive index dielectric film 54, and the low refractive index dielectric film 55 on the glass substrate 51 constituting the multilayered conductive prevention film 52 are different from those of the first and third embodiments. Only different. In particular, the high-refractive-index dielectric film 54 has a value in the range of 1000 ° to 1400 °, which is significantly different from that of the first embodiment. If the high-refractive-index dielectric film 54 has a thickness in the range of 400 ° to 1000 °, a good antireflection effect cannot be obtained.
そして高屈折率誘電体膜54の膜厚が1000Å〜1400Åの
範囲をとることによって、金属膜53及び低屈折率誘電体
膜55の膜厚が10Å〜40Å、及び700Å〜1200Åとされ
る。By setting the thickness of the high-refractive-index dielectric film 54 in the range of 1000 ° to 1400 °, the thicknesses of the metal film 53 and the low-refractive-index dielectric film 55 are set to 10 ° to 40 ° and 700 ° to 1200 °.
第６図及び第７図に第３表で示した導電性反射防止膜
を有する透明板の反射率及び透過率を示した。6 and 7 show the reflectance and transmittance of the transparent plate having the conductive antireflection film shown in Table 3.
このような導電性反射防止膜を有する透明板は実施例
１と同様に陰極線管表面に貼付けて使用すると高透過度
の反射防止板として有用である。 The transparent plate having such a conductive anti-reflection film is useful as a high transmittance anti-reflection plate when used by sticking it to the surface of a cathode ray tube as in Example 1.
以上のように本発明による導電性反射防止膜を有する
透明板は透明板は導電性反射防止膜を３層構造にし、そ
の１層にチタン、クロム、ジルコニウム，モリブデン，
ニッケル・クロム合金及びステンレス（Ni＋Cr＋Fe）の
いずれか一つの金属膜を用いてたものであるから、多層
膜の光の干渉により透明板表面での光の反射を低下をさ
せ、且つ前記金属層により導電性を付与して帯電防止を
することができる。As described above, the transparent plate having the conductive anti-reflection film according to the present invention has a three-layer structure of the conductive anti-reflection film, and titanium, chromium, zirconium, molybdenum,
Since any one of nickel-chromium alloy and stainless steel (Ni + Cr + Fe) metal film is used, the reflection of light on the transparent plate surface is reduced by the interference of light of the multilayer film, and the metal layer The antistatic property can be provided by imparting conductivity.
このような導電性反射防止膜を有する透明板を陰極線
管表面に適用すると、外側から入射する光の反射を大幅
に低減して陰極線管表示面の視認性を高めると共に陰極
線管内部の高電圧によって発生する陰極線管表面付近で
の放電等の不快な現象を防ぐことができ、またこの導電
性反射防止膜に所定の透過率低減効果を持たせることが
できる。When a transparent plate having such a conductive anti-reflection film is applied to the surface of the cathode ray tube, the reflection of light incident from the outside is greatly reduced, the visibility of the display surface of the cathode ray tube is increased, and the high voltage inside the cathode ray tube increases. An unpleasant phenomenon such as discharge near the surface of the cathode ray tube that occurs can be prevented, and the conductive antireflection film can have a predetermined transmittance reducing effect.
図面は本発明の実施例を示すもの、第１図及び第５図は
導電性反射防止膜を有する透明体の断面図、第２図及び
第６図は反射特性図、第３図及び第７図は透過特性図、
第４図は金属膜の面積抵抗を示す特性図である。 11,51:ガラス基板、12,52:多層導電性反射防止膜、13,5
3:金属膜、14,54:高屈折率誘電体膜、15,55:低屈折率誘
電体膜The drawings show an embodiment of the present invention. FIGS. 1 and 5 are cross-sectional views of a transparent body having a conductive anti-reflection film, FIGS. 2 and 6 are reflection characteristic diagrams, FIGS. The figure is a transmission characteristic diagram,
FIG. 4 is a characteristic diagram showing the sheet resistance of the metal film. 11,51: glass substrate, 12,52: multilayer conductive anti-reflective coating, 13,5
3: Metal film, 14, 54: High refractive index dielectric film, 15, 55: Low refractive index dielectric film
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中井 日出海 大阪府大阪市東区道修町４丁目８番地 日本板硝子株式会社内 (56)参考文献 特開 昭57−139702（ＪＰ，Ａ) 特開 昭62−98301（ＪＰ，Ａ) 特開 昭58−25601（ＪＰ，Ａ) 特開 昭51−95858（ＪＰ，Ａ) 特開 昭62−112101（ＪＰ，Ａ) 特開 昭62−58202（ＪＰ，Ａ) 特開 昭61−51101（ＪＰ，Ａ) ──────────────────────────────────────────────────続 き Continuation of front page (72) Inventor Nakai Hidemi 4-8 Doshomachi, Higashi-ku, Osaka-shi, Osaka Inside Nippon Sheet Glass Co., Ltd. (56) References JP-A-57-139702 (JP, A) JP-A-62 JP-A-98301 (JP, A) JP-A-58-25601 (JP, A) JP-A-51-95858 (JP, A) JP-A-62-112101 (JP, A) JP-A-62-58202 (JP, A) ) JP-A-61-51101 (JP, A)
Claims (6)
の反射防止膜を有する透明板において、屈折率が1.45〜
1.60の透明基板と、該透明基板上に形成される、膜厚が
20A〜60Aのチタン、クロム、ジルコニウム、モリブデ
ン、ニッケル・クロム合金及びステンレス（Ni＋Cr＋F
e）のいずれか一つの金属膜と、該金属膜上に形成され
る屈折率が1.90〜2.50で、且つ膜厚が200A〜400Aの高屈
折率誘電体膜と、該高屈折率誘電体膜上に形成される、
屈折率が1.35〜1.50で、且つ膜厚が700A〜1200Aの低屈
折率誘電体膜とからなり、可視域での透過率特性をフラ
ットにした導電性反射防止膜を有する透明板。1. A transparent plate having an antireflection film for reducing reflection of light on the surface of a transparent substrate, wherein the refractive index is 1.45 to 1.
1.60 transparent substrate, the film thickness formed on the transparent substrate,
20A-60A titanium, chromium, zirconium, molybdenum, nickel-chromium alloy and stainless steel (Ni + Cr + F
e) any one of the metal films, a high-refractive-index dielectric film having a refractive index formed on the metal film of 1.90 to 2.50 and a film thickness of 200 A to 400 A, and the high-refractive-index dielectric film Formed on,
A transparent plate comprising a low-refractive-index dielectric film having a refractive index of 1.35 to 1.50 and a film thickness of 700 A to 1200 A, and having a conductive anti-reflection film having a flat transmittance characteristic in a visible region.
O2）、酸化タンタル（Ta2O5）、酸化ジルコニウム（ZrO
2）、酸化ハフニウム（HfO2）、酸化ジルコニウムと酸
化チタンとの混合物（ZrO2＋TiO2）、及び酸化プラセオ
ジムと酸化チタンとの混合物（Pr6O11＋TiO2）のいずれ
かからなる特許請求の範囲第１項に記載の導電性反射防
止膜を有する透明板。2. The high-refractive-index dielectric film is made of titanium oxide (Ti).
O 2 ), tantalum oxide (Ta 2 O 5 ), zirconium oxide (ZrO
2 ), hafnium oxide (HfO 2 ), a mixture of zirconium oxide and titanium oxide (ZrO 2 + TiO 2 ), and a mixture of praseodymium oxide and titanium oxide (Pr 6 O 11 + TiO 2 ). A transparent plate having the conductive anti-reflection film according to claim 1.
及び弗化マグネシウム（MgF2）のいずれかである特許請
求の範囲第１項及び第２項のいずれかに記載の導電性反
射防止膜を有する透明板。3. The low refractive index dielectric film is made of silicon oxide (SiO 2 ).
3. A transparent plate having a conductive anti-reflection film according to claim 1, wherein the transparent anti-reflection film is selected from the group consisting of magnesium fluoride and magnesium fluoride (MgF 2 ).
の反射防止膜を有する透明板において、屈折率が1.45〜
1.60の透明基板と、該透明基板上に形成される、膜厚が
10A〜40Aのチタン、クロム、ジルコニウム、モリブデ
ン、ニッケル・クロム合金及びステンレス（Ni＋Cr＋F
e）のいずれか一つの金属膜と、該金属膜上に形成され
る、屈折率が1.90〜2.50で、且つ膜厚が1000A〜1400Aの
高屈折率誘電体膜と、該高屈折率誘電体膜上に形成され
る、屈折率が1.35〜1.50で、且つ膜厚が700A〜1200Aの
低屈折率誘電体膜とからなり、可視域での透過率特性を
フラットにした導電性反射防止膜を有する透明板。4. A transparent plate having an antireflection film for reducing reflection of light on the surface of a transparent substrate, wherein the refractive index of the transparent plate is 1.45 to
1.60 transparent substrate, the film thickness formed on the transparent substrate,
10A to 40A titanium, chromium, zirconium, molybdenum, nickel-chromium alloy and stainless steel (Ni + Cr + F
e) one of the metal films, a high-refractive-index dielectric film formed on the metal film and having a refractive index of 1.90 to 2.50 and a thickness of 1000 A to 1400 A; A conductive anti-reflection film having a refractive index of 1.35 to 1.50 and a low refractive index dielectric film having a thickness of 700 A to 1200 A formed on the film and having a flat transmittance characteristic in the visible region. Having a transparent plate.
O2）、酸化タンタル（Ta2O5）、酸化ジルコニウム（ZrO
2）、酸化ハフニウム（HfO2）、酸化ジルコニウムと酸
化チタンとの混合物（ZrO2＋TiO2）、及び酸化プラセオ
ジムと酸化チタンとの混合物（Pr6O11＋TiO2）のいずれ
かからなる特許請求の範囲第４項に記載の導電性反射防
止膜を有する透明板。5. The high-refractive-index dielectric film is made of titanium oxide (Ti).
O 2 ), tantalum oxide (Ta 2 O 5 ), zirconium oxide (ZrO
2 ), hafnium oxide (HfO 2 ), a mixture of zirconium oxide and titanium oxide (ZrO 2 + TiO 2 ), and a mixture of praseodymium oxide and titanium oxide (Pr 6 O 11 + TiO 2 ) A transparent plate having the conductive antireflection film according to claim 4.
及び弗化マグネシウム（MgF2）のいずれかである特許請
求の範囲第４項及び第５項のいずれかに記載の導電性反
射防止膜を有する透明板。6. The low refractive index dielectric film is made of silicon oxide (SiO 2 ).
6. A transparent plate having a conductive anti-reflection film according to claim 4, wherein said transparent anti-reflection film is selected from the group consisting of magnesium fluoride and magnesium fluoride (MgF 2 ).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62226953A JP2590133B2 (en) | 1987-09-10 | 1987-09-10 | Transparent plate having conductive anti-reflective coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62226953A JP2590133B2 (en) | 1987-09-10 | 1987-09-10 | Transparent plate having conductive anti-reflective coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6470701A JPS6470701A (en) | 1989-03-16 |
| JP2590133B2 true JP2590133B2 (en) | 1997-03-12 |
Family
ID=16853204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62226953A Expired - Lifetime JP2590133B2 (en) | 1987-09-10 | 1987-09-10 | Transparent plate having conductive anti-reflective coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2590133B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8693099B2 (en) | 2006-07-28 | 2014-04-08 | Japan Display West Inc. | Antireflection film |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5318830A (en) * | 1991-05-29 | 1994-06-07 | Central Glass Company, Limited | Glass pane with reflectance reducing coating |
| JPH07201700A (en) * | 1993-12-28 | 1995-08-04 | Mitsubishi Electric Corp | Method of manufacturing semiconductor device |
| JPH0836101A (en) * | 1994-07-22 | 1996-02-06 | Victor Co Of Japan Ltd | Antireflection film of optical parts made of synthetic resin |
| JPH08268732A (en) * | 1995-03-30 | 1996-10-15 | Central Glass Co Ltd | Heat ray reflecting glass |
| JP2001242302A (en) * | 1999-12-22 | 2001-09-07 | Sony Corp | Light-absorbing antireflection film, display device and method of manufacturing thereof |
| JP2001322833A (en) | 2000-05-09 | 2001-11-20 | Central Glass Co Ltd | Low-reflection glass for vehicle |
| CN100388013C (en) * | 2005-01-14 | 2008-05-14 | 索尼株式会社 | Optical device, transmission lens, image pickup device and electronic device |
| CN113651545A (en) * | 2021-08-13 | 2021-11-16 | 福建福特科光电股份有限公司 | Neutral density tablet and preparation method thereof |
| JP2023067161A (en) * | 2021-10-29 | 2023-05-16 | ニデック株式会社 | Plastic lens and lens unit |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5195858A (en) * | 1975-01-14 | 1976-08-23 | ****** *** *ku***chi*se*ku*******ka*****************chi***ne******** | |
| JPS57139702A (en) * | 1981-02-25 | 1982-08-28 | Fuji Photo Optical Co Ltd | Reflection preventing film of plastic optical member |
| JPS5825601A (en) * | 1981-08-08 | 1983-02-15 | Minolta Camera Co Ltd | Photographic lens |
| JPS6151101A (en) * | 1984-08-21 | 1986-03-13 | Toray Ind Inc | Coated transparent conductive panel |
| JPS6258202A (en) * | 1985-09-09 | 1987-03-13 | Mitsubishi Shindo Kk | Filter for crt |
| JPS6298301A (en) * | 1985-10-25 | 1987-05-07 | Seiko Epson Corp | Anti-reflection coating |
| JPS62112101A (en) * | 1985-11-11 | 1987-05-23 | Sumitomo Chem Co Ltd | Optical parts and its production |
-
1987
- 1987-09-10 JP JP62226953A patent/JP2590133B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8693099B2 (en) | 2006-07-28 | 2014-04-08 | Japan Display West Inc. | Antireflection film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6470701A (en) | 1989-03-16 |
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