JP2571819B2 - Manufacturing method of information recording medium - Google Patents
Manufacturing method of information recording mediumInfo
- Publication number
- JP2571819B2 JP2571819B2 JP12064888A JP12064888A JP2571819B2 JP 2571819 B2 JP2571819 B2 JP 2571819B2 JP 12064888 A JP12064888 A JP 12064888A JP 12064888 A JP12064888 A JP 12064888A JP 2571819 B2 JP2571819 B2 JP 2571819B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- information recording
- recording medium
- magneto
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、プラスチック基板を用いた情報記録媒体の
製造方法に関する。Description: TECHNICAL FIELD The present invention relates to a method for manufacturing an information recording medium using a plastic substrate.
従来、プラスチック基板を用いた情報記録媒体を製造
する際には、成形したプラスチック基板を無変形状態で
保持し、これの上に情報記録機能を有する膜構造体を蒸
着法やスパッタリング法、スピンコート法等によって、
成膜していた。Conventionally, when manufacturing an information recording medium using a plastic substrate, a molded plastic substrate is held in an undeformed state, and a film structure having an information recording function is formed thereon by vapor deposition, sputtering, spin coating, or the like. By law
A film was formed.
ところが、蒸着法やスパッタリング法、スピンコート
法等によって形成した膜は、一般に内部応力が発生す
る。このため、基板上に膜構造体を形成すると、膜中に
発生した内部応力により膜形成後にプラスチック基板が
変形して、反りを生じたり、基板の弾性変形に伴い発生
する復元力と平衡状態をとって残留する膜の内部応力の
ために、膜割れや膜はがれが起こる等の問題があった。However, a film formed by an evaporation method, a sputtering method, a spin coating method, or the like generally generates internal stress. For this reason, when a film structure is formed on a substrate, the plastic substrate is deformed after the film is formed due to the internal stress generated in the film, causing a warp or an equilibrium state with a restoring force generated by elastic deformation of the substrate. Due to the remaining internal stress of the film, there are problems such as film cracking and film peeling.
本発明は、上記問題点を解決するために成されたもの
であり、その目的は、基板の変形および膜構造中の残留
内部応力が少なく、信頼性の高い情報記録媒体の製造方
法を提供することにある。The present invention has been made in order to solve the above problems, and an object of the present invention is to provide a method for manufacturing a highly reliable information recording medium, which has a small deformation of a substrate and a residual internal stress in a film structure. It is in.
上記の目的は、プラスチック基板上に情報記録機能を
有する膜構造体を設けることにより情報記録媒体を製造
する方法において、膜構造体中に発生する内部応力を緩
和する方向に復元作用が働くようプラスチック基板に外
力を加えて弾性変形状態に保持し、かかる弾性変形状態
のプラスチック基板の上に膜構造体を形成した後、外力
を除去し、プラスチック基板を復元させることにより達
成できる。An object of the present invention is to provide a method of manufacturing an information recording medium by providing a film structure having an information recording function on a plastic substrate, wherein a plastic material is provided so that a restoring action acts in a direction to reduce internal stress generated in the film structure. This can be achieved by holding the substrate in an elastically deformed state by applying an external force, forming a film structure on the plastic substrate in the elastically deformed state, removing the external force, and restoring the plastic substrate.
上記外力を加えるには、平板状の基板を保持するディ
スクホルダーとして、表面が凹状または凸状のものを用
いること等の方法により、なしうる。The external force can be applied by a method such as using a disk holder having a concave or convex surface as a disk holder for holding a flat substrate.
以下、本発明を実施例によって、さらに詳細に説明す
る。Hereinafter, the present invention will be described in more detail with reference to examples.
実施例１ 第３図に示すような光磁気ディスクを以下に述べる方
法で作製した。Example 1 A magneto-optical disk as shown in FIG. 3 was produced by the method described below.
射出成形したφ130mmの平板状のポリカーボネート基
板１上に、下地保護層２、光磁気記録層３、上地保護層
４を順次スパッタリング法により、成膜した。このと
き、上、下地保護層２、４は、材料として窒化シリコン
を用い、これを0.1PaのArガス雰囲気中で成膜して、各
々1000Åの膜厚とした。An undercoating protective layer 2, a magneto-optical recording layer 3, and an upper protective layer 4 were sequentially formed on an injection-molded flat-plated polycarbonate substrate 1 having a diameter of 130 mm by a sputtering method. At this time, the upper and lower protective layers 2 and 4 were formed using silicon nitride as a material in an atmosphere of 0.1 Pa of Ar gas to have a thickness of 1000 各 々.
光磁気記録層３は、材料としてTb−Fe非晶質合金薄膜
を用い、二次元同時スパッタ法により成膜し、800Åの
膜厚とした。The magneto-optical recording layer 3 was formed by a two-dimensional simultaneous sputtering method using a Tb-Fe amorphous alloy thin film as a material to have a thickness of 800 Å.
ここで、成膜時のポリカーボネート基板は、第１図に
示すような形状に弾性変形させて保持しておいた。即
ち、ディスク支持テーブル６、センターマスク７、およ
び外周マスク８を主構成部品とするディスクホルダー５
により、平板状のポリカーボネート基板１を、基板中心
部での接平面に対する、基板端部（ｒ＝65mm）における
変位量で定義した反り量が5mmになるように基板の成膜
面側に凹型の反りをもたせた固定しておいた。この状態
で、上記したように各膜を成膜し積層すると、膜中に強
い圧縮応力が生じる。この内部応力は、基板に対して、
膜構造体が膨張しようとする方向、即ち、基板を成膜面
側に凸型に変形させようとする方向に作用する。また、
膜中の圧縮応力は、膜自体が膨張すると、膨張に伴なっ
て減少し緩和される。Here, the polycarbonate substrate at the time of film formation was elastically deformed and held in a shape as shown in FIG. That is, the disk holder 5 having the disk support table 6, the center mask 7, and the outer peripheral mask 8 as main components.
Thus, the flat polycarbonate substrate 1 is formed into a concave shape on the film-forming surface side of the substrate such that the amount of warpage defined by the amount of displacement at the substrate end (r = 65 mm) with respect to the tangent plane at the center of the substrate becomes 5 mm. It was fixed warped. In this state, when each film is formed and laminated as described above, a strong compressive stress is generated in the film. This internal stress is
It acts in a direction in which the film structure tends to expand, that is, in a direction in which the substrate is deformed in a convex shape toward the film formation surface. Also,
When the film itself expands, the compressive stress in the film is reduced and reduced with the expansion.
さて、上記の方法で成膜された光磁気ディスクをディ
スクホルダー５から解放し復元させると、膜構造体は成
膜直後の状態に比して膨張し、内部応力が緩和される。Now, when the magneto-optical disk formed by the above method is released from the disk holder 5 and restored, the film structure expands compared to the state immediately after the film formation, and the internal stress is reduced.
こうして製造された光磁気ディスク単板の、前述した
定義による反り量を測定すると、10μｍほど膜面側に凸
型に反っていた。When the warpage of the single magneto-optical disk manufactured in this manner was measured according to the above definition, it was found that the warp was convex to the film surface side by about 10 μm.
比較例１ 比較用に、ポリカーボネート基板１を無変形状態で保
持して各膜を成膜した他は、実施例１と同様の材料、方
法で同様の構成の光磁気ディスクを製造したところ、反
り量は膜面側凸型に150μｍであった。Comparative Example 1 For the purpose of comparison, a magneto-optical disk having the same configuration as in Example 1 was manufactured using the same material and method except that the polycarbonate substrate 1 was held in an undeformed state and each film was formed. The amount was 150 μm in the convex shape on the film surface side.
（耐久試験） 更に、実施例１および比較例１の光磁気ディスクを60
℃、相対湿度90％の恒温恒湿槽に投入し、1000時間の耐
久試験を行なったところ、比較例１の光磁気ディスク
は、膜面全体に膜割れが発生したが、実施例１の光磁気
ディスクは外観上全く変化が見られなかった。(Durability test) Further, the magneto-optical disks of Example 1 and Comparative Example 1 were
When placed in a thermo-hygrostat at 90 ° C. and a relative humidity of 90% and subjected to an endurance test for 1000 hours, the magneto-optical disk of Comparative Example 1 had a film crack on the entire film surface. The magnetic disk had no change in appearance.
実施例２ 実施例１で作製した光磁気ディスクを、紫外線硬化型
樹脂で以下のように保護コートした。Example 2 The magneto-optical disk manufactured in Example 1 was protectively coated with an ultraviolet curable resin as follows.
光磁気ディスクの成膜面側に未硬化樹脂を通常の方法
でスピンコートした後、この光磁気ディスク９を第２図
に示すような形状に弾性変形させて保持した。即ち、デ
ィスクホルダー５により、基板の成膜面側に凸型に10μ
ｍほどの反りをもった実施例１のディスクを、更に、3m
m程度の反りをもたせた状態に弾性変形させて排気孔10
による真空チャックで固定した。この状態で、塗布済み
の紫外線硬化型樹脂を紫外線11で硬化させると、保護コ
ート層の硬化収縮により保護コート層中に収縮しようと
する引張応力が発生する。この内部応力は保護コート層
の収縮に伴なって、減少し緩和される。After the uncured resin was spin-coated on the film forming surface side of the magneto-optical disk by a usual method, the magneto-optical disk 9 was elastically deformed and held in a shape as shown in FIG. That is, the disk holder 5 projects 10 μm in a convex shape on the film forming surface side of the substrate.
The disk of Example 1 having a warp of about m
m by elastically deforming it with a warp of about 10 m.
And fixed with a vacuum chuck. In this state, when the applied ultraviolet-curable resin is cured with ultraviolet rays 11, a tensile stress that tends to shrink in the protective coat layer is generated due to the curing shrinkage of the protective coat layer. The internal stress is reduced and reduced as the protective coat layer shrinks.
上記の方法で保護コート層を形成した光磁気ディスク
をディスクホルダー５から開放し復元させると保護コー
ト層は、形成直後の状態に比して収縮し、内部応力が緩
和される。When the magneto-optical disk on which the protective coat layer is formed by the above-described method is released from the disk holder 5 and restored, the protective coat layer contracts compared to the state immediately after formation, and internal stress is reduced.
こうして製造された、保護コート層で膜面が被覆され
た光磁気ディスクの反り量を測定したが、測定精度内で
反りは測定されなかった。The amount of warpage of the thus manufactured magneto-optical disk whose film surface was covered with the protective coating layer was measured, but the warpage was not measured within the measurement accuracy.
比較例２ 比較用に、実施例１の光磁気ディスクに未硬化樹脂を
塗布した後、外力を加えずに、そのままの状態で硬化さ
せた保護コート層付き光磁気ディスクを製造したとこ
ろ、反り量はコート面側に凹型に100μｍであった。Comparative Example 2 For comparison, an uncured resin was applied to the magneto-optical disk of Example 1, and a magneto-optical disk with a protective coat layer was cured without applying any external force. Was 100 μm concave on the coated surface side.
以上詳細に説明したように、本発明の情報記録媒体の
製造方法によれば、プラスチック基板上に形成された膜
構造体の内部応力を低減させることができ、情報記録媒
体の耐環境性を向上させることができるばかりでなく、
基板の反りを低下させることができる。As described in detail above, according to the method for manufacturing an information recording medium of the present invention, the internal stress of a film structure formed on a plastic substrate can be reduced, and the environmental resistance of the information recording medium can be improved. Not only can you
The warpage of the substrate can be reduced.
第１図は本発明の実施例１を実施する場合の成膜時にお
ける、基板の保持状態を示す略断面図、第２図は本発明
の実施例２を実施する場合の紫外線照射時における、デ
ィスクの保持状態を示す略断面図、第３図は本発明の一
実施例により製造された情報記録媒体の模式断面図であ
る。 1:基板、2:下地保護層 3:光磁気記録層、4:上地保護層 5:ディスクホルダー 6:ディスク支持テーブル 7:センターマスク、8:外周マスク 9:未硬化樹脂を塗布した状態の光磁気ディスク 10:真空チャック用排気孔 11:照射紫外線FIG. 1 is a schematic cross-sectional view showing a holding state of a substrate at the time of film formation when carrying out Example 1 of the present invention. FIG. 2 is at the time of ultraviolet irradiation when carrying out Example 2 of the present invention. FIG. 3 is a schematic sectional view showing a holding state of a disk, and FIG. 3 is a schematic sectional view of an information recording medium manufactured according to an embodiment of the present invention. 1: Substrate, 2: Underlayer protective layer 3: Magneto-optical recording layer, 4: Upper layer protective layer 5: Disk holder 6: Disk support table 7: Center mask, 8: Peripheral mask 9: Uncured resin applied Magneto-optical disk 10: Vacuum chuck exhaust hole 11: Irradiated ultraviolet light
Claims (1)
る膜構造体を設けることにより情報記録媒体を製造する
方法において、膜構造体中に発生する内部応力を緩和す
る方向に復元作用が働くようプラスチック基板に外力を
加えて弾性変形状態に保持し、かかる弾性変形状態のプ
ラスチック基板の上に膜構造体を形成した後、外力を除
去し、プラスチック基板を復元させることを特徴とする
情報記録媒体の製造方法。In a method of manufacturing an information recording medium by providing a film structure having an information recording function on a plastic substrate, a plastic material is provided so that a restoring action works in a direction to reduce internal stress generated in the film structure. An information recording medium comprising: applying an external force to a substrate to hold the substrate in an elastic deformation state; forming a film structure on the plastic substrate in the elastic deformation state; removing the external force; and restoring the plastic substrate. Production method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12064888A JP2571819B2 (en) | 1988-05-19 | 1988-05-19 | Manufacturing method of information recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12064888A JP2571819B2 (en) | 1988-05-19 | 1988-05-19 | Manufacturing method of information recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01292645A JPH01292645A (en) | 1989-11-24 |
| JP2571819B2 true JP2571819B2 (en) | 1997-01-16 |
Family
ID=14791428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12064888A Expired - Fee Related JP2571819B2 (en) | 1988-05-19 | 1988-05-19 | Manufacturing method of information recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2571819B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH692000A5 (en) * | 1995-11-13 | 2001-12-31 | Unaxis Balzers Ag | Coating chamber, substrate carrier therefor, method of vacuum deposition and coating methods. |
| US6184157B1 (en) * | 1998-06-01 | 2001-02-06 | Sharp Laboratories Of America, Inc. | Stress-loaded film and method for same |
| CN107498896A (en) * | 2017-08-15 | 2017-12-22 | 珠海市春生五金工业有限公司 | The internal stress minimizing technology and method for paint spraying of plastic product |
-
1988
- 1988-05-19 JP JP12064888A patent/JP2571819B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01292645A (en) | 1989-11-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |