JP2548665B2 - Adsorption treatment method - Google Patents
Adsorption treatment methodInfo
- Publication number
- JP2548665B2 JP2548665B2 JP4312663A JP31266392A JP2548665B2 JP 2548665 B2 JP2548665 B2 JP 2548665B2 JP 4312663 A JP4312663 A JP 4312663A JP 31266392 A JP31266392 A JP 31266392A JP 2548665 B2 JP2548665 B2 JP 2548665B2
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- JP
- Japan
- Prior art keywords
- gas
- adsorbent
- volatile organic
- adsorbed
- organic chlorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【０００１】[0001]
【産業上の利用分野】本発明は、揮発性有機塩素化合物
の吸着処理方法に係り、特に、ガス又は原水中に含まれ
るトリクロロエチレン、テトラクロロエチレン等の発ガ
ン性のある揮発性有機塩素化合物を、吸着処理する方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for adsorption treatment of volatile organochlorine compounds , and more particularly to a carcinogenic volatile organochlorine compound such as trichlorethylene or tetrachlorethylene contained in gas or raw water. The present invention relates to a method of adsorption treatment.
【０００２】[0002]
【従来の技術】近年、トリクロロエチレン、テトラクロ
ロエチレン等の発ガン性のある揮発性有機塩素化合物に
よる環境汚染が問題となっており、汚染源は、ドライク
リーニング用脱脂剤や、金属工業、電子産業等の洗浄廃
水に起因するといわれている。2. Description of the Related Art In recent years, environmental pollution due to carcinogenic volatile organic chlorine compounds such as trichlorethylene and tetrachloroethylene has become a problem. The sources of pollution are degreasing agents for dry cleaning, cleaning of the metal industry, electronics industry, etc. It is said to be caused by waste water.
【０００３】水中に含まれるこれら揮発性有機塩素化合
物は、ストリッピングを行うことによって水中から容易
に除去することができるが、ストリッピングで排気され
る排ガス中に揮発性有機塩素化合物が移行し、この排ガ
スを未処理のまま大気中に放散すると、再び新たな環境
汚染の原因となるところから、吸着剤によって排ガスを
吸着処理し、無害化することが一般的に考えられる。These volatile organochlorine compounds contained in water can be easily removed from the water by stripping, but the volatile organochlorine compounds migrate to the exhaust gas exhausted by stripping, If this exhaust gas is released into the atmosphere without being treated, it will cause a new environmental pollution again, so it is generally considered that the exhaust gas is adsorbed by an adsorbent to render it harmless.
【０００４】本発明者らは先に、吸着処理した吸着剤か
ら再生ガスで揮発性有機塩素化合物を脱着させ、脱着ガ
スを紫外線照射して揮発性有機化合物を分解する処理方
法（特公昭６３−４８５７３号公報、特公昭６３−４８
５７４号公報）を提案している。The inventors of the present invention have previously described a treatment method in which a volatile organic chlorine compound is desorbed from the adsorbent subjected to the adsorption treatment with a regenerating gas, and the desorbed gas is irradiated with ultraviolet rays to decompose the volatile organic compound (Japanese Patent Publication No. 63- No. 48573, Japanese Patent Publication No. 63-48
No. 574).
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、前記の
吸着処理した吸着剤から脱着させて、脱着ガスを紫外線
照射して揮発性有機化合物を分解処理する方法も、分解
効率が悪く、紫外線照射したガス中には揮発性有機化合
物がかなりの量残留するため、さらに該ガスを吸着処理
する必要があった。本発明は、上記の問題点を解決し、
吸着剤に吸着した揮発性有機塩素化合物を確実に脱着し
て、効率よく分解することのできる吸着剤の再生を併う
吸着処理方法を提供することを課題とする。However, the method of desorbing the adsorbent which has been subjected to the adsorption treatment and irradiating the desorbed gas with ultraviolet rays to decompose the volatile organic compounds is also poor in the decomposition efficiency, and the gas irradiated with the ultraviolet rays is also disadvantageous. Since a considerable amount of volatile organic compounds remain inside, it was necessary to further adsorb the gas. The present invention solves the above problems,
An object of the present invention is to provide an adsorption treatment method capable of surely desorbing a volatile organic chlorine compound adsorbed on an adsorbent and efficiently decomposing the adsorbent together with regeneration of the adsorbent.
【０００６】[0006]
【課題を解決するための手段】上記課題を解決するため
に、本発明では、気体中に含まれる揮発性有機塩素化合
物を吸着剤に吸着させ、該吸着剤から吸着された吸着成
分を再生ガスで脱着してガス中に移行させて吸着剤を再
生する吸着処理方法において、移行したガス中の揮発性
有機塩素化合物を分解させてアルカリ中和したのち、該
分解中和ガスを吸着剤の再生ガスとして循環させること
としたものである。In order to solve the above problems, in the present invention, a volatile organic chlorinated compound contained in a gas is adsorbed by an adsorbent and adsorbed from the adsorbent. In an adsorption treatment method in which an adsorbed component is desorbed with a regeneration gas and transferred into a gas to regenerate an adsorbent, a volatile organic chlorine compound in the transferred gas is decomposed and alkali-neutralized , and then the decomposition is performed . The Japanese gas is circulated as a regeneration gas for the adsorbent.
【０００７】また、本発明では、原水中に含まれる揮発
性有機塩素化合物を吸着剤に吸着させるか、又は前記原
水をストリッピングして排気される揮発性有機塩素化合
物を吸着剤に吸着させ、該吸着剤から吸着された吸着成
分を再生ガスで脱着してガス中に移行させて吸着剤を再
生する吸着処理方法において、移行したガス中の揮発性
有機塩素化合物を分解させてアルカリ中和したのち、該
分解中和ガスを吸着剤の再生ガスとして循環させること
としたものである。In the present invention, a volatile organic chlorine compound contained in raw water is adsorbed on an adsorbent, or the volatile organic chlorine compound exhausted by stripping the raw water is provided. In an adsorption treatment method of adsorbing on an adsorbent, desorbing an adsorbed component adsorbed from the adsorbent with a regeneration gas and transferring the adsorbent to the gas to regenerate the adsorbent, a volatile organic chlorine compound in the transferred gas is removed. After decomposing and neutralizing with an alkali , the decomposing and neutralizing gas is circulated as a regeneration gas for the adsorbent.
【０００８】上記吸着処理方法において、ガス中の揮発
性有機塩素化合物の分解は、熱分解又は光分解によって
行うことができる。熱分解による方法は、熱分解装置で
空気等の酸素含有ガスの供給下に約６００〜１１００℃
に加熱して分解するものであり、また公知の酸化触媒、
例えば銀や白金などの金属、Ｖ２Ｏ５、ＭｏＯ３−Ｂ
１２Ｏ３のような金属酸化物を用いることにより分解温
度を低下させることができる。また、光分解による方法
では、例えば紫外線を用いた空気等の酸素含有ガスの共
存下の光分解装置で行うことができる。In the adsorption treatment method, the volatile organic chlorine compound in the gas can be decomposed by thermal decomposition or photolysis. The method by thermal decomposition is carried out at a temperature of about 600 to 1100 ° C. while supplying an oxygen-containing gas such as air in a thermal decomposition apparatus.
It decomposes when heated to a known oxidation catalyst,
For example, silver or a metal such as platinum, V 2 O 5, MoO 3 -B
The decomposition temperature can be lowered by using a metal oxide such as 12 O 3 . The photolysis method can be carried out in a photolysis apparatus in the presence of an oxygen-containing gas such as air using ultraviolet rays.
【０００９】また、上記のようにして揮発性有機塩素化
合物を分解処理したガスを吸着剤へ再生ガスとして循環
するには、熱分解法によるガスでは、冷却して８０〜３
００℃として循環し、また光分解法では、処理ガスは大
略８０〜３００℃になっているが、もし温度が低い場合
は加熱して循環するのがよい。また、脱着ガスには、揮
発性有機塩素化合物を高濃度に含むので、分解して分解
ガス中の酸性物質の濃度が上昇し、装置の腐蝕等が生ず
るため、分解装置の排出側に中和装置例えば消石灰（Ｃ
ａＣＯ３）等を用いた乾式アルカリ充填塔を設けて中和
処理してから再生ガスとして用いる。 In addition, volatile organic chlorination as described above
In order to circulate the gas obtained by decomposing the compound as a regeneration gas to the adsorbent, the gas obtained by the thermal decomposition method is cooled to 80 to 3
It is circulated as 00 ° C., and in the photolysis method, the processing gas has a temperature of about 80 to 300 ° C. However, if the temperature is low, it is preferable to circulate by heating. Further, the desorption gas because they contain volatile organic chlorine compounds in a high concentration, decompose to the concentration of the acidic substance in the decomposition gas increases and the corrosion or the like of the equipment occurs, medium to the discharge side of the cracker Japanese equipment such as slaked lime (C
ACO 3) or the like Ru used as regeneration gas since the neutralization process by providing a dry alkaline packed column was used.
【００１０】更に、本発明に使用される吸着剤として
は、粒状又は繊維状、ハニカム状等の活性炭、ゼオライ
ト、モレキュラシーブ等の天然、合成樹脂吸着剤を使用
することができる。また、処理できる揮発性有機塩素化
合物としては、トリクロロエチレン、テトラクロロエチ
レン等に有効に適用できる。Further, as the adsorbent used in the present invention, granular or fibrous or honeycomb-like activated carbon, natural or synthetic resin adsorbent such as zeolite or molecular sieve can be used. As the volatile organic chlorine compounds that can be processed, trichlorethylene, can be effectively applied to tetrachlorethylene or the like.
【００１１】[0011]
【作用】上記のように、本発明によれば、まず吸着剤に
吸着した有機物を脱着するが、該有機物は低沸点（揮発
性）のものを対象としているので、約８０〜３００℃に
熱した脱着ガスで、例えばトリクロロエチレン、テトラ
クロロエチレン等を脱着する。そして、前記の脱着に要
する熱源は、脱着ガスの分解操作で発生する熱を利用し
ており、更に、分解処理ガスは再生ガスとして循環して
いるため、クローズドシステムを構成し、光分解法のよ
うに、一回の通過による分解効率が低い場合でも、何回
も循環することにより、循環ガス中の有機分の低下と共
に吸着剤の再生ができるのである。また、吸着塔を複数
設けることにより、吸着脱着を交互に行い、継続的に吸
着処理することができる。As described above, according to the present invention, the organic substance adsorbed on the adsorbent is first desorbed. Since the organic substance has a low boiling point (volatile), it is heated to about 80 to 300 ° C. The desorbed gas is used to desorb, for example, trichloroethylene, tetrachloroethylene or the like. The heat source required for the desorption utilizes the heat generated by the decomposition operation of the desorption gas, and further, since the decomposition treatment gas circulates as a regenerated gas, a closed system is constituted, As described above, even when the decomposition efficiency by one passage is low, the adsorbent can be regenerated while the organic content in the circulating gas is reduced by repeating the circulation many times. Further, by providing a plurality of adsorption towers, adsorption / desorption can be alternately performed and adsorption can be continuously performed.
【００１２】[0012]
【実施例】以下、本発明を実施例により具体的に説明す
るが、本発明はこれらに限定されない。 実施例１ 図１に本発明の吸着処理方法の概略工程図を示す。図１
において、トリクロロエチレン、テトラクロロエチレン
等の揮発性有機塩素化合物を含有する原水１は、ストリ
ッピング装置２に導かれて上方から充填物３に散布さ
れ、下方から送風機４によって吹き込まれるストリッピ
ングガス（空気など）５により水中の揮発性有機塩素化
合物が除去され、処理水４となって流出する。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited thereto. Example 1 FIG. 1 shows a schematic process diagram of the adsorption treatment method of the present invention. FIG.
In the above, raw water 1 containing a volatile organic chlorine compound such as trichlorethylene or tetrachloroethylene is guided to a stripping device 2, sprayed on a filler 3 from above, and stripping gas (air or the like) blown from below by a blower 4. The volatile organic chlorine compound in the water is removed by 5 and the treated water 4 is discharged.
【００１３】一方、ストリッピング装置２から排気され
る排ガス６中には、水中から追い出された揮発性有機塩
素化合物が含まれており、この排ガス６を吸着剤を充填
した吸着装置７に導入して吸着剤と接触させることによ
り、排ガス６中の揮発性有機塩素化合物は吸着剤に吸着
され、無害化された処理ガス１２となって排出される。
また、図２に概略工程図を示すように、原水１を直接吸
着剤を充填した吸着装置７に導入して、原水中から直接
揮発性有機塩素化合物を吸着することもできる。On the other hand, the exhaust gas 6 exhausted from the stripping device 2 contains a volatile organic chlorine compound expelled from water, and this exhaust gas 6 is introduced into an adsorption device 7 filled with an adsorbent. By contacting the adsorbent with the adsorbent, the volatile organic chlorine compound in the exhaust gas 6 is adsorbed by the adsorbent and discharged as a detoxified processing gas 12.
Further, as shown in the schematic process diagram in FIG. 2, the raw water 1 may be directly introduced into the adsorption device 7 filled with an adsorbent to directly adsorb the volatile organic chlorine compound from the raw water.
【００１４】このような吸着操作において、吸着剤７は
吸着の進行に伴って吸着能力を失い、破過に達した時点
で排ガスあるいは原水の通気停止あるいは予備吸着装置
への切り換えを行い、吸着剤７の吸着成分の脱着、再生
を行う。吸着剤を再生するためには再生ガスとして加熱
空気（約８０〜３００℃）を導入し、脱着ガス１０中に
吸着剤から揮発性有機塩素化合物を移行させる。次いで
該脱着ガス１０は揮発性有機塩素化合物を分解するため
に分解装置８に導入される。分解装置８として熱分解装
置を用いた場合の概略断面図を図３に示す。In such an adsorption operation, the adsorbent 7 loses its adsorbing ability as the adsorption progresses, and when it reaches the breakthrough, the ventilation of the exhaust gas or raw water is stopped or the adsorbent is switched to the pre-adsorption device. Desorption and regeneration of the adsorbed component of 7. To regenerate the adsorbent, heated air (about 80 to 300 ° C.) is introduced as a regeneration gas, and the volatile organic chlorine compound is transferred from the adsorbent into the desorption gas 10. The desorbed gas 10 is then introduced into the decomposer 8 to decompose the volatile organochlorine compounds. FIG. 3 shows a schematic cross-sectional view when a thermal decomposition device is used as the decomposition device 8.
【００１５】図３において、熱分解装置１３は、排ガス
流入管１４、窒素源と連絡されたＮ２注入口１５、酸素
源と連絡された酸素源注入口１６、三層ノズル１７を備
えたガス導入部１８、外筒１９と内筒２０の間にセラミ
ックヒーター２１を供えた反応槽２２及び冷却水源と連
絡されたスプレーノズル２３、排気管２４、Ｕ−トラッ
プ付排水管２５を備えた水洗部２６からなる。In FIG. 3, the thermal decomposition apparatus 13 is a gas equipped with an exhaust gas inflow pipe 14, an N 2 inlet 15 connected to a nitrogen source, an oxygen source inlet 16 connected to an oxygen source, and a three-layer nozzle 17. A water washing unit including an introducing unit 18, a reaction tank 22 provided with a ceramic heater 21 between an outer cylinder 19 and an inner cylinder 20, a spray nozzle 23 connected to a cooling water source, an exhaust pipe 24, and a drain pipe 25 with a U-trap. It consists of 26.
【００１６】処理される排ガスは、流入管１４から入り
三層ノズル１７にてＮ２ガスでシールされ、酸素源との
接触、混合が調整された後、反応槽２２に入り、反応槽
２２内でセラミックヒーター２１による熱と酸素源によ
り排ガス中の可燃性ガスは酸化分解され、排気管２４か
ら排出される。その際、水洗部２６を設け冷却水により
処理排ガスの冷却と排ガス中の加水分解性ガス、水溶性
ガスを除去することもできる。排水は水洗部２６からＵ
−トラップ２５を経てポックス外に排出される。The exhaust gas to be treated enters through the inflow pipe 14 and is sealed with N 2 gas at the three-layer nozzle 17 to adjust its contact with and mixing with an oxygen source, and then enters the reaction tank 22 and the inside of the reaction tank 22. The combustible gas in the exhaust gas is oxidatively decomposed by the heat and the oxygen source from the ceramic heater 21 and is exhausted from the exhaust pipe 24. At that time, a water washing unit 26 may be provided to cool the treated exhaust gas and remove hydrolyzable gas and water-soluble gas from the exhaust gas with cooling water. The drainage is from the washing section 26 to U
-It is discharged out of the pox via the trap 25.
【００１７】分解装置８から排出されたガスは、温度８
０〜３００℃に調整されて再生ガス１１として吸着装置
７に循環し、吸着剤の再生に使用される。光分解装置を
用いた場合は、再生ガスを加熱するためのヒーターを設
けてもよい。また、排出管２４からのガスは、ＨＣｌ、
Ｃｌ２等の酸性ガスを含むので、再生ガスとして用いる
前に中和装置９を設ける。 The gas discharged from the decomposer 8 has a temperature of 8
It is adjusted to 0 to 300 ° C., circulates as the regeneration gas 11 to the adsorption device 7, and is used for regeneration of the adsorbent. When a photolysis device is used, a heater for heating the regeneration gas may be provided. Further, the gas from the exhaust pipe 24 is HCl,
Because it contains acid gas 2 such as Cl, Ru neutralizing device 9 provided in the front used as regeneration gas.
【００１８】実施例２ 次に、前記の装置で熱分解装置を用いて、某工場洗浄廃
水を対象として、実施した場合の処理条件及び処理効果
は次の通りであった。 ストリッピング装置 方式：テラレット充填塔（５ｍ充填） 通気量（空気）／通水量：３０ 通水速度：６０ｍ／ｈExample 2 Next, the treatment conditions and the treatment effects in the case where the above-mentioned apparatus was applied to a certain factory cleaning wastewater using the thermal decomposition apparatus were as follows. Stripping device Method: Terralet packed tower (5 m packed) Aeration rate (air) / Water flow rate: 30 Water flow rate: 60 m / h
【００１９】 水質 原水１中トリクロロエチレン：３５０〜６００μｇ／リットル 原水１中テトラクロロエチレン：１３０〜２００μｇ／リットル 処理水４中トリクロロエチレン：＜１０μｇ／リットル 処理水４中テトラクロロエチレン：＜５μｇ／リットルWater quality Trichlorethylene in raw water 1: 350 to 600 μg / liter Tetrachloroethylene in raw water 1: 130 to 200 μg / liter Trichlorethylene in treated water 4: <10 μg / liter Tetrachloroethylene in treated water 4: <5 μg / liter
【００２０】 吸着装置７ 方式：繊維状活性炭吸着 入口６（排ガス）トリクロロエチレン：１０〜２０ｍｇ／Ｎｍ３ 入口６（排ガス）テトラクロロエチレン：４〜６ｍｇ／Ｎｍ３ 出口１２（処理ガス）トリクロロエチレン：＜０．１ｍｇ／Ｎｍ３ 出口１２（処理ガス）テトラクロロエチレン：＜０．１ｍｇ／Ｎｍ３ Adsorption device 7 method: Fibrous activated carbon adsorption Inlet 6 (exhaust gas) trichlorethylene: 10 to 20 mg / Nm3 Inlet 6 (exhaust gas) tetrachloroethylene: 4-6 mg / Nm3 Outlet 12 (process gas) trichlorethylene: <0.1 mg / Nm3 Outlet 12 (process gas) tetrachloroethylene: <0.1 mg / Nm3
【００２１】 再生ガス：加熱空気及び循環ガス（１００℃）、ＳＶ：２０ｈ−１ 脱着ガス１０中トリクロロエチレン：５００〜１０００ｍｇ／Ｎｍ３ 脱着ガス１０中テトラクロロエチレン：５００〜１０００ｍｇ／Ｎｍ３ 熱分解装置 滞留時間：６秒 温度 ：９００℃Regeneration gas: heated air and circulating gas (100 ° C.), SV: 20 h-1 Trichlorethylene in desorption gas 10: 500 to 1000 mg / Nm3 Tetrachlorethylene in desorption gas 10: 500 to 1000 mg / Nm3 Pyrolysis device Residence time: 6 seconds Temperature: 900 ° C
【００２２】その結果を図４に示す。図４は排ガス中の
トリクロロエチレン濃度と経過時間の関係を示すグラフ
である。図４において、Ａは脱着ガス１０中のトリクロ
ロエチレン濃度であり、Ｂは循環再生ガス１１中のトリ
クロロエチレン濃度である。熱分解方式では、約２０時
間の循環再生で、脱着ガス中のトリクロロエチレン濃度
は約１ｍｇ／Ｎｍ３となり、吸着剤がほぼ再生されたこ
とが分かり、十分次の吸着に使用できる。The results are shown in FIG. FIG. 4 is a graph showing the relationship between the concentration of trichlorethylene in exhaust gas and the elapsed time. In FIG. 4, A is the concentration of trichlorethylene in the desorption gas 10, and B is the concentration of trichlorethylene in the circulation regeneration gas 11. In the thermal decomposition method, the trichloroethylene concentration in the desorbed gas was about 1 mg / Nm 3 after the circulation was regenerated for about 20 hours, and it was found that the adsorbent was almost regenerated, and it can be sufficiently used for the next adsorption.
【００２３】実施例３ この例では分解装置として光分解装置を用いて、その他
は実施例２と全く同じに行った。光分解装置は次の条件
で操作した。 滞留時間：６秒 照射方式：４００Ｗ紫外線ランプによる直接照射Example 3 In this example, a photolytic device was used as the decomposing device, and otherwise the same as in Example 2. The photolysis device was operated under the following conditions. Residence time: 6 seconds Irradiation method: Direct irradiation with 400W ultraviolet lamp
【００２４】その結果を実施例２と共に図４に示す。図
４において、Ｃは脱着ガス１０中のトリクロロエチル濃
度であり、Ｄは循環再生ガス１１中のトリクロロエチレ
ン濃度である。このグラフからも分かるように、光分解
方式では分解効率がわるいため、再生に長時間かかり、
しかもトリクロロエチレン濃度も数ｍｇ／Ｎｍ３以下に
はならないが、この程度でも、初期濃度の１０００ｍｇ
／Ｎｍ３に位べれば格段に再生されており、吸着剤とし
て十分使用できる。The results are shown in FIG. 4 together with Example 2. In FIG. 4, C is the concentration of trichloroethyl in the desorption gas 10, and D is the concentration of trichlorethylene in the circulating regeneration gas 11. As you can see from this graph, the decomposition efficiency is poor in the photolysis method, so it takes a long time to reproduce,
Moreover, the concentration of trichlorethylene does not fall below several mg / Nm 3 , but even at this level, the initial concentration of 1000 mg
If it is / Nm 3 , it is regenerated remarkably and can be sufficiently used as an adsorbent.
【００２５】[0025]
【発明の効果】以上述べたように本発明によれば、排ガ
ス中の揮発性有機塩素化合物、例えば揮発性有機塩素化
合物で濃度規制が厳しい場合や対象排ガス濃度が高い場
合にも、該化合物を効果的に分解、無害化することがで
き、また再生設備のコンパクト化を図ることができ、現
場で、しかも低コストで吸着剤の再生と環境汚染防止が
可能になる。According to the present invention as described above, according to the present invention, volatile organic chlorine compounds in the exhaust gas, for example, even if the high or the target exhaust gas concentration levels restricting severe volatile organic chlorine compounds, the compound Can be effectively decomposed and made harmless, and the regeneration equipment can be made compact, and it is possible to regenerate the adsorbent and prevent environmental pollution at the site and at low cost.
【図面の簡単な説明】[Brief description of drawings]
【図１】本発明の吸着処理方法の概略工程図。FIG. 1 is a schematic process diagram of an adsorption treatment method of the present invention.
【図２】本発明のもう一つの吸着処理方法の概略工程
図。FIG. 2 is a schematic process diagram of another adsorption treatment method of the present invention.
【図３】本発明に使用する熱分解装置の一例を示す概略
断面図。FIG. 3 is a schematic sectional view showing an example of a thermal decomposition apparatus used in the present invention.
【図４】排ガス中のトリクロロエチレン濃度と経過時間
の関係を示すグラフ。FIG. 4 is a graph showing the relationship between the concentration of trichlorethylene in exhaust gas and the elapsed time.
１：原水、２：ストリッピング装置、３：充填物、４：
処理水、５：空気、６：排気、７：吸着装置、８：分解
装置、９：中和装置、１０：吸着ガス、１１：循環再生
ガス、１２：処理ガス、１３：熱分解装置、１４：排ガ
ス流入管、１５：窒素注入口、１６：酸素源注入口、１
７：ガスノズル、１８：ガス導入部、１９：反応槽外
筒、２０：反応槽内筒、２１：セラミックヒータ、２
２：反応槽、２３：スプレーノズル、２４：排ガス流出
管、２５：Ｕ−トラップ付排水管、２６：水洗部1: Raw water, 2: Stripping device, 3: Filling material, 4:
Treated water, 5: Air, 6: Exhaust, 7: Adsorption device, 8: Decomposition device, 9: Neutralization device, 10: Adsorption gas, 11: Recycled gas, 12: Process gas, 13: Pyrolysis device, 14 : Exhaust gas inflow pipe, 15: Nitrogen inlet, 16: Oxygen source inlet, 1
7: Gas nozzle, 18: Gas introduction part, 19: Reaction tank outer cylinder, 20: Reaction tank inner cylinder, 21: Ceramic heater, 2
2: Reaction tank, 23: Spray nozzle, 24: Exhaust gas outflow pipe, 25: Drain pipe with U-trap, 26: Water washing part
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ０２Ｆ 1/28 ＺＡＢ Ｃ０２Ｆ 1/58 ＺＡＢ 1/58 ＣＤＶ Ｂ０１Ｄ 53/34 ＺＡＢ ＺＡＢ １３４Ｅ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Internal reference number FI Technical indication C02F 1/28 ZAB C02F 1/58 ZAB 1/58 CDV B01D 53/34 ZAB ZAB 134E
Claims (2)
を吸着剤に吸着させ、該吸着剤から吸着された吸着成分
を再生ガスで脱着してガス中に移行させて吸着剤を再生
する吸着処理方法において、移行したガス中の揮発性有
機塩素化合物を分解させてアルカリ中和したのち、該分
解中和ガスを吸着剤の再生ガスとして循環させることを
特徴とする吸着処理方法。1. A volatile organic chlorine compound contained in a gas is adsorbed on an adsorbent, and an adsorbed component adsorbed from the adsorbent is desorbed by a regeneration gas and transferred into the gas to regenerate the adsorbent. In the adsorption treatment method, the volatile organic chlorine compound in the transferred gas is decomposed to neutralize the alkali , and then the decomposed neutralization gas is circulated as a regeneration gas for the adsorbent.
を吸着剤に吸着させるか、又は前記原水をストリッピン
グして排気される揮発性有機塩素化合物を吸着剤に吸着
させ、該吸着剤から吸着された吸着成分を再生ガスで脱
着してガス中に移行させて吸着剤を再生する吸着処理方
法において、移行したガス中の揮発性有機塩素化合物を
分解させてアルカリ中和したのち、該分解中和ガスを吸
着剤の再生ガスとして循環させることを特徴とする吸着
処理方法。2. A volatile organic chlorine compound contained in raw water is adsorbed on an adsorbent, or a volatile organic chlorine compound exhausted by stripping the raw water is adsorbed on an adsorbent, and the adsorption is performed. In the adsorption treatment method in which the adsorbed component adsorbed from the agent is desorbed with a regeneration gas and transferred into the gas to regenerate the adsorbent, the volatile organic chlorine compound in the transferred gas is decomposed and alkali-neutralized . later, adsorption treatment method characterized by circulating the decomposition neutralizing gas as regeneration gas adsorbent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4312663A JP2548665B2 (en) | 1992-10-29 | 1992-10-29 | Adsorption treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4312663A JP2548665B2 (en) | 1992-10-29 | 1992-10-29 | Adsorption treatment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06134241A JPH06134241A (en) | 1994-05-17 |
| JP2548665B2 true JP2548665B2 (en) | 1996-10-30 |
Family
ID=18031930
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4312663A Expired - Fee Related JP2548665B2 (en) | 1992-10-29 | 1992-10-29 | Adsorption treatment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2548665B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100424507B1 (en) * | 2000-05-27 | 2004-03-26 | (주)백년기술 | Apparatus for destruction of volatile organic compounds |
| US6814875B2 (en) | 2000-10-06 | 2004-11-09 | Yamaha Corporation | Method and device for treating waste liquid, solvent separator, and cleaning device using thereof |
| KR20020033355A (en) * | 2000-10-31 | 2002-05-06 | 김동현 | Activated carbon absorbing apparatus |
| KR20010016158A (en) * | 2000-11-15 | 2001-03-05 | 김성근 | Photolysis and pyrolysis complex air purification apparatus and a purification method thereof |
| ES2307458B2 (en) * | 2008-05-07 | 2009-06-22 | Universidad De Oviedo | METHOD FOR THE ELIMINATION ORGANOCLORED COMPOUNDS IN GASEOUS EMISSIONS BY ADSORTION AND REDUCTIVE REGENERATION OF THE ADSORBENT. |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56150620A (en) * | 1980-04-25 | 1981-11-21 | Fuji Electric Co Ltd | Vertical shaft rotary electric machine |
| JPH02290217A (en) * | 1990-02-09 | 1990-11-30 | Taikisha Ltd | Adsorbing and desorbing apparatus |
-
1992
- 1992-10-29 JP JP4312663A patent/JP2548665B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06134241A (en) | 1994-05-17 |
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