JP2547717B2 - Two-stage pressure reducing valve device - Google Patents
Two-stage pressure reducing valve deviceInfo
- Publication number
- JP2547717B2 JP2547717B2 JP59081115A JP8111584A JP2547717B2 JP 2547717 B2 JP2547717 B2 JP 2547717B2 JP 59081115 A JP59081115 A JP 59081115A JP 8111584 A JP8111584 A JP 8111584A JP 2547717 B2 JP2547717 B2 JP 2547717B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure side
- gas
- pressure
- low
- valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/04—Control of fluid pressure without auxiliary power
- G05D16/0402—Control of fluid pressure without auxiliary power with two or more controllers mounted in series
Landscapes
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Control Of Fluid Pressure (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、高圧ガスを高圧側減圧弁と低圧側減圧弁と
により２段階に減圧する２段式減圧弁装置に関し、特に
ガス被供給機器のガス室内を減圧した所定圧力のガスで
充填するのに好適な２段式減圧弁装置に関するものであ
る。Description: TECHNICAL FIELD The present invention relates to a two-stage pressure reducing valve device for reducing high-pressure gas in two stages by a high-pressure reducing valve and a low-pressure reducing valve, and in particular to gas-supplied equipment. The present invention relates to a two-stage pressure reducing valve device suitable for filling the gas chamber with a reduced pressure gas of a predetermined pressure.
（従来の技術） 従来のこの種の２段式減圧弁装置は、第５図に示すよ
うに圧力の調節ができない高圧側減圧弁100と圧力の調
節ができる低圧側減圧弁110とが直列に接続され、高圧
側減圧弁100にガス流入導路120が接続され、低圧側減圧
弁110にガス流出導路130が接続され、ガス流出導路130
の途中には開閉弁140が接続された構造になっていた。
高圧側減圧弁100は内部に流路101が形成された高圧側弁
体102と、高圧側弁体102を弁座103から引き離す方向に
付勢する高圧側バネ104とを備えて構成され、ガス流入
導路120から流入するガスの圧力を減圧する。ガスの減
圧の上限は、高圧側バネ104の付勢力によって定まる。
低圧側減圧弁110は、低圧側弁体収納室111に収納された
低圧側弁体112と、この弁体112を弁座113に向かって付
勢する補助バネ114と、低圧側ガス調整室115内に配置さ
れた弁押し金116と、弁押し金116に固定されて低圧側ガ
ス調整室115の一つの壁部を構成するダイヤフラム117
と、弁押し金116と調整用の摘み部材118との間に配置さ
れた低圧側バネ119とを備えている。低圧側減圧弁110で
は、摘み部材118を調節して低圧側バネ119の付勢力を調
節することにより減圧の圧力調整を行うことができる。(Prior Art) In a conventional two-stage pressure reducing valve device of this type, as shown in FIG. 5, a high pressure side pressure reducing valve 100 in which pressure cannot be adjusted and a low pressure side pressure reducing valve 110 in which pressure can be adjusted are connected in series. The gas inlet conduit 120 is connected to the high pressure side pressure reducing valve 100, the gas outlet conduit 130 is connected to the low pressure side pressure reducing valve 110, and the gas outlet conduit 130 is connected.
There was a structure in which an on-off valve 140 was connected in the middle of.
The high pressure side pressure reducing valve 100 is configured to include a high pressure side valve body 102 in which a flow passage 101 is formed, and a high pressure side spring 104 that biases the high pressure side valve body 102 in a direction of separating the high pressure side valve body 102 from a valve seat 103, and a gas The pressure of the gas flowing in from the inflow conduit 120 is reduced. The upper limit of gas decompression is determined by the biasing force of the high-pressure side spring 104.
The low pressure side pressure reducing valve 110 includes a low pressure side valve body 112 housed in a low pressure side valve body storage chamber 111, an auxiliary spring 114 for urging the valve body 112 toward a valve seat 113, and a low pressure side gas adjusting chamber 115. A valve pusher 116 disposed inside, and a diaphragm 117 fixed to the valve pusher 116 and constituting one wall portion of the low pressure side gas adjustment chamber 115.
And a low pressure side spring 119 arranged between the valve pusher 116 and the adjusting knob member 118. In the low-pressure side pressure reducing valve 110, the pressure reduction can be adjusted by adjusting the knob member 118 and adjusting the biasing force of the low-pressure side spring 119.
この種の減圧弁装置を用いてガス被供給機器のガス室
に所定圧力P0のガスを充填する場合には、開閉弁140を
閉じた状態で摘み部材118を調節することにより、低圧
側ガス調整室115内の圧力を前記所定圧力P0とする。低
圧側ガス調整室115内の圧力を調整した後に、開閉弁140
を開くと、低圧側弁体112が弁座113から離れてガスが流
出し、低圧側ガス調整室115内及びガス流出導路130内の
圧力P1は設定した圧力P0よりも数十％低下する。ガスの
供給によりガス被供給機器のガス室内の圧力が圧力P0に
近付くと、これに伴って低圧側ガス調整室115内の圧力P
1も設定した圧力P0に近付き、低圧側ガス調整室115内の
圧力P1が設定した圧力P0に達すると、低圧側弁体112が
弁座113と接触してガスの供給が停止される。When the gas chamber of the gas supply device is filled with the gas of the predetermined pressure P 0 by using this type of pressure reducing valve device, by adjusting the knob member 118 with the on-off valve 140 closed, the low-pressure side gas The pressure inside the adjusting chamber 115 is set to the predetermined pressure P 0 . After adjusting the pressure in the low-pressure side gas adjustment chamber 115, open / close valve 140
When the valve is opened, the low-pressure side valve body 112 separates from the valve seat 113 and gas flows out, and the pressure P1 in the low-pressure side gas adjustment chamber 115 and the gas outflow conduit 130 is reduced by several tens of percent from the set pressure P 0. To do. When the pressure in the gas chamber of the gas-supplied equipment approaches the pressure P 0 due to the gas supply, the pressure P in the low-pressure side gas adjustment chamber 115 is accordingly increased.
When 1 also approaches the set pressure P 0 and the pressure P 1 in the low pressure side gas adjustment chamber 115 reaches the set pressure P 0 , the low pressure side valve body 112 comes into contact with the valve seat 113 and the gas supply is stopped. .
（発明が解決しようとする問題点） 従来の２段式減圧弁装置を用いてガス被供給機器のガ
ス室内を減圧した所定圧力のガスで充填する場合には、
前述の通り、開閉弁140を開いた時点でガス被供給機器
に供給されるガスの圧力（ガス流出導路130内の圧力）
は低下する。したがって従来の装置では、設定した圧力
P0よりも低いガス圧でガスの充填を開始することにな
り、このことがガス被供給機器のガス室を設定した圧力
P0のガスで充填することを遅らせる原因になっていた。(Problems to be Solved by the Invention) When a conventional two-stage pressure reducing valve device is used to fill a gas chamber of a gas supply device with a gas having a reduced pressure,
As described above, the pressure of the gas supplied to the gas supply device when the on-off valve 140 is opened (the pressure in the gas outflow conduit 130).
Will fall. Therefore, in the conventional device, the set pressure
Gas filling will be started at a gas pressure lower than P 0 , which means that the pressure set in the gas chamber of the gas-supplied equipment is
It was a cause of delaying filling with P 0 gas.
また従来の装置で高圧側減圧弁100による減圧量は、
高圧側バネ104の付勢力によって定まるため、低圧側減
圧弁110の調整範囲は高圧側減圧弁100で減圧したガス圧
によって制限される。低圧側減圧弁110により調節する
ガス圧を大きくすると低圧側減圧弁110の高圧側と低圧
側との圧力差が小さくなり、弁動作が不安定となる。そ
のため低圧側減圧弁110の調整範囲を広くするために
は、高圧側減圧弁100の高圧側バネ104のバネ力を大きく
して、高圧側減圧弁100により減圧したガス圧を大きく
する必要がある。しかしながら従来の装置で、高圧側減
圧弁100の低圧側（減圧側減圧弁の高圧側）のガス圧を
大きくするためには、大きな高圧側バネを用いる必要が
あり、装置の小型化を図り難い問題があった。In the conventional device, the pressure reduction amount by the high pressure side pressure reducing valve 100 is
Since it is determined by the urging force of the high pressure side spring 104, the adjustment range of the low pressure side pressure reducing valve 110 is limited by the gas pressure reduced by the high pressure side pressure reducing valve 100. When the gas pressure adjusted by the low pressure side pressure reducing valve 110 is increased, the pressure difference between the high pressure side and the low pressure side of the low pressure side pressure reducing valve 110 becomes small, and the valve operation becomes unstable. Therefore, in order to widen the adjustment range of the low pressure side pressure reducing valve 110, it is necessary to increase the spring force of the high pressure side pressure reducing valve 100 to increase the gas pressure reduced by the high pressure side pressure reducing valve 100. . However, in the conventional device, in order to increase the gas pressure on the low pressure side of the high pressure side pressure reducing valve 100 (the high pressure side of the pressure reducing side pressure reducing valve), it is necessary to use a large high pressure side spring, and it is difficult to downsize the device. There was a problem.
（発明の目的） 本発明の目的は、開閉弁を開いた際にガス流出導路内
の圧力が低下することのない２段式減圧弁装置を提供す
ることにある。(Object of the Invention) An object of the present invention is to provide a two-stage pressure reducing valve device in which the pressure in the gas outflow conduit does not drop when the on-off valve is opened.
本発明の他の目的は、開閉弁を開いた際にガス流出導
路内の圧力が低下することがなく、しかも高圧側減圧弁
の高圧側バネとして小型のバネを用いても低圧側減圧弁
の調整範囲を大きくすることができる２段式減圧弁装置
を提供することにある。Another object of the present invention is that the pressure in the gas outflow conduit does not drop when the on-off valve is opened, and the low pressure side pressure reducing valve is used even if a small spring is used as the high pressure side spring of the high pressure side pressure reducing valve. It is an object of the present invention to provide a two-stage pressure reducing valve device capable of increasing the adjustment range of.
（問題点を解決するための手段） 理解を容易にするために、図面に示した実施例に付し
た符号を用いて説明すると、本出願の第１の発明及び第
２の発明が改良の対象とする２段式減圧弁装置は、ガス
被供給機器のガス室内を減圧した所定圧力のガスで充填
するために用いられるもので、高圧側弁体６を高圧側弁
座４から離す方向に高圧側弁体６を付勢する高圧側バネ
12を有する高圧側減圧弁16と、低圧側弁体20を低圧側弁
座19から離す方向の付勢力を調節自在として低圧側弁体
20を付勢する低圧側バネ41を有して流出ガスの圧力を減
圧する低圧側減圧弁53とがガス導路18で直列に接続され
ている。また高圧側減圧弁16にガス流入導路２が接続さ
れ、低圧側減圧弁53にガス流出導路72が接続され、且つ
ガス流出導路72に開閉弁58が接続されている。(Means for Solving Problems) To facilitate understanding, the description will be made with reference to the reference numerals attached to the embodiments shown in the drawings, and the first invention and the second invention of the present application are objects of improvement. The two-stage pressure reducing valve device is used to fill the gas chamber of the gas supply device with a depressurized gas of a predetermined pressure, and the high pressure side valve body 6 becomes high pressure in the direction of separating from the high pressure side valve seat 4. High pressure side spring for urging the side valve body 6
The high pressure side pressure reducing valve 16 having 12 and the low pressure side valve body can be freely adjusted in the direction of separating the low pressure side valve body 20 from the low pressure side valve seat 19.
A low pressure side pressure reducing valve 53 having a low pressure side spring 41 for urging 20 and reducing the pressure of the outflow gas is connected in series by a gas conduit 18. The high pressure side pressure reducing valve 16 is connected to the gas inflow conduit 2, the low pressure side pressure reducing valve 53 is connected to the gas outflow conduit 72, and the gas outflow conduit 72 is connected to the open / close valve 58.
そして第１の発明では、ガス流出導路72を流れる流出
ガスの流量に応じた力を、低圧側弁体20を弁座19から離
す方向に低圧側弁体20に付与する低圧側圧力付加手段52
（27,28,32,36,49,50）を設ける。In the first aspect of the invention, the low pressure side pressure applying means for applying a force corresponding to the flow rate of the outflow gas flowing through the gas outflow guide passage 72 to the low pressure side valve body 20 in the direction of separating the low pressure side valve body 20 from the valve seat 19. 52
(27,28,32,36,49,50) are provided.
また第２の発明では、第１の発明の低圧側圧力付加手
段52の他に、ガス流出導路72内のガスの圧力を高圧側減
圧弁16の高圧側弁体６に該高圧側弁体６を高圧側弁座４
から離す方向に付与する高圧側圧力付加手段48（47,46,
14）を設ける。Further, in the second invention, in addition to the low pressure side pressure applying means 52 of the first invention, the pressure of the gas in the gas outflow conduit 72 is applied to the high pressure side valve body 6 of the high pressure side pressure reducing valve 16 by the high pressure side valve body 6. 6 is the high pressure side valve seat 4
High pressure side pressure applying means 48 (47,46,
14) is provided.
（発明の作用） 上記本願の第１の発明の２段式減圧弁装置において、
ガス被供給機器のガス室内を所定の圧力P0のガスで充填
する場合には、先ず開閉弁を閉じて低圧側減圧弁の低圧
側バネの付勢力を調節することにより、ガス流出導路内
の圧力を所定の圧力P0に設定する。ガス被供給機器にガ
スを供給するために開閉弁が開かれると、ガス流出導路
内の圧力が下がり低圧側バネの付勢力によって低圧側弁
体が低圧側弁座から離されて、ガスが流出する。ガス流
出道路をガスが流れると、低圧側圧力付加手段は流出ガ
スの流量に応じた力を低圧側弁体を低圧側弁座から離す
方向に付加する。その結果、低圧側弁体は低圧側弁座か
ら更に離れて、流出ガスの流出量が増加する。言いかえ
ると流出ガスの圧力が高くなる。しかがってガス被供給
機器のガス室を従来よりも早く充填することができる。
ガスの充填が進んで、ガス被供給機器のガス室内の圧力
が上昇してくると流出ガスの流量は低下し始める。その
結果低圧側圧力付加手段が低圧側弁体に加える力も徐々
に小さくなり、最終的に低圧側圧力付加手段が低圧側弁
体に加える力はゼロになる。このときは、ガス被供給機
器のガス室内の圧力すなわちガス流出導路内の圧力が、
低圧側バネの付勢力と釣り合っているときであり、ガス
被供給機器のガス室は設定した圧力P0のガスで充填され
ている。(Operation of the Invention) In the two-stage pressure reducing valve device according to the first invention of the present application,
When the gas chamber of the gas-supplied equipment is filled with gas at a predetermined pressure P 0 , first the on-off valve is closed and the urging force of the low-pressure side spring of the low-pressure side pressure reducing valve is adjusted so that the gas outflow conduit Is set to a predetermined pressure P 0 . When the on-off valve is opened to supply gas to the gas-supplied equipment, the pressure in the gas outflow conduit decreases and the low-pressure side spring pushes the low-pressure side valve element away from the low-pressure side valve seat, causing the gas to flow. leak. When the gas flows through the gas outflow road, the low pressure side pressure applying means applies a force corresponding to the flow rate of the outflow gas in the direction in which the low pressure side valve body is separated from the low pressure side valve seat. As a result, the low pressure side valve element is further separated from the low pressure side valve seat, and the outflow amount of outflow gas increases. In other words, the pressure of the outflow gas becomes high. Therefore, the gas chamber of the gas supply device can be filled earlier than in the conventional case.
When the gas filling progresses and the pressure in the gas chamber of the gas-supplied device rises, the flow rate of the outflow gas begins to decrease. As a result, the force applied by the low-pressure side pressure applying means to the low-pressure side valve element also gradually decreases, and finally the force applied by the low-pressure side pressure applying means to the low-pressure side valve element becomes zero. At this time, the pressure in the gas chamber of the gas supply device, that is, the pressure in the gas outflow conduit,
When it is in equilibrium with the urging force of the low-pressure side spring, the gas chamber of the gas supply device is filled with the gas at the set pressure P 0 .
本願発明によれば、開閉弁が開かれると流出ガスの流
出量を増加させて流出ガスの圧力を高めるため、迅速に
ガス被供給機器のガス室を充填することができる。According to the present invention, when the on-off valve is opened, the outflow amount of the outflow gas is increased and the pressure of the outflow gas is increased, so that the gas chamber of the gas supply target device can be quickly filled.
低圧側減圧弁の調整範囲を拡げるためには、高圧側減
圧弁の高圧側バネの付勢力を大きくして低圧側減圧弁の
高圧側（高圧側減圧弁の低圧側）のガス圧を高める必要
がある。本出願の第２の発明では、高圧側圧力付加手段
がガス流出導路内のガスの圧力を高圧側弁体に高圧側弁
体を高圧側弁座から離す方向に付与するため、見掛け上
高圧側バネの付勢力はガス流出導路内のガス圧力分だけ
大きくなる。したがって本発明によれば、高圧側バネを
大型化することな、低圧側減圧弁の調整範囲を大きくす
ることができる。In order to expand the adjustment range of the low pressure side pressure reducing valve, it is necessary to increase the biasing force of the high pressure side spring of the high pressure side pressure reducing valve to increase the gas pressure of the high pressure side of the low pressure side pressure reducing valve (low pressure side of the high pressure side reducing valve). There is. In the second invention of the present application, since the high pressure side pressure applying means applies the pressure of the gas in the gas outflow conduit to the high pressure side valve body in the direction of separating the high pressure side valve body from the high pressure side valve seat, apparently high pressure The biasing force of the side spring increases by the amount of gas pressure in the gas outflow conduit. Therefore, according to the present invention, the adjustment range of the low pressure side pressure reducing valve can be increased without increasing the size of the high pressure side spring.
（実施例） 以下第１図乃至第４図に示す実施例により本発明を詳
細に説明する。(Examples) The present invention will be described in detail below with reference to the examples shown in FIGS. 1 to 4.
本発明の２段式減圧弁装置は、基体１を有し、この基
体１にはガス流入導路２が形成されている。ガス流入導
路２の一端には図示しないガス供給源が接続され、他端
には基体１に形成された高圧側弁体収納室３が接続され
ている。高圧側弁体収納室３内のガス流入導路２の開口
部周縁には高圧側弁座４が形成されており、高圧側弁座
４に頭部５を対向させて高圧側弁体６が配置されてい
る。高圧側弁体６は頭部５の他に第１のピストン部７と
第２のピストン部８とを有しており、第１のピストン部
７が高圧側弁体収納室３に気密を保持して摺動自在に嵌
合されている。高圧側弁体６は頭部５とは反対側部分に
形成された凹部９を有しており、この凹部９には一端が
高圧側弁体収納室３内に開口する第１のガス連通導路10
の他端が開口している。基体１の高圧側弁体収納室３の
周囲には距離をおいて同心状に環状凹部11が形成され、
この環状凹部11の底部11aと高圧側弁体６の第２ピスト
ン部８との間には高圧側バネ12が介在されている。高圧
側バネ12は高圧側弁体６を高圧側弁座４から離す方向に
付勢するものである。基体１の環状凹部11の外側外周に
は高圧側弁体６及び高圧側バネ12を覆う高圧側弁カバー
13の開口部が螺着されている。高圧側弁カバー13の内壁
には高圧側弁体６の第２のピストン部８が摺動自在に接
しており、この第２のピストン部８により高圧側弁カバ
ー13内はバネ室14と圧力室15とに気密に２分割されてい
る。これらの高圧側弁体収納室３、高圧側弁座４、高圧
側弁体６、高圧側バネ12及び高圧側弁カバー13により高
圧側減圧弁16が構成されている。The two-stage pressure reducing valve device of the present invention has a base 1, and a gas inflow passage 2 is formed in the base 1. A gas supply source (not shown) is connected to one end of the gas inflow passage 2, and the high pressure side valve body storage chamber 3 formed in the base body 1 is connected to the other end. A high pressure side valve seat 4 is formed on the periphery of the opening of the gas inflow passage 2 in the high pressure side valve body storage chamber 3, and the high pressure side valve body 6 is formed by making the head 5 face the high pressure side valve seat 4. It is arranged. The high-pressure side valve body 6 has a first piston portion 7 and a second piston portion 8 in addition to the head portion 5, and the first piston portion 7 keeps the high-pressure side valve body storage chamber 3 airtight. And is slidably fitted. The high-pressure valve body 6 has a recess 9 formed in a portion opposite to the head portion 5, and the recess 9 has a first gas communication conduit whose one end opens into the high-pressure valve storage chamber 3. Road 10
The other end of is open. Around the high pressure side valve body accommodating chamber 3 of the base body 1, annular recesses 11 are formed concentrically at a distance.
A high pressure side spring 12 is interposed between the bottom portion 11a of the annular recess 11 and the second piston portion 8 of the high pressure side valve body 6. The high-pressure side spring 12 biases the high-pressure side valve body 6 in a direction away from the high-pressure side valve seat 4. A high pressure side valve cover for covering the high pressure side valve body 6 and the high pressure side spring 12 on the outer periphery of the annular recess 11 of the base body 1
Thirteen openings are screwed on. The second piston portion 8 of the high pressure side valve body 6 is slidably in contact with the inner wall of the high pressure side valve cover 13, and the inside of the high pressure side valve cover 13 is pressurized by the second piston portion 8 with the spring chamber 14. It is airtightly divided into two parts. The high pressure side valve body storage chamber 3, the high pressure side valve seat 4, the high pressure side valve body 6, the high pressure side spring 12, and the high pressure side valve cover 13 constitute a high pressure side pressure reducing valve 16.
基体１にはまた低圧側弁体収納室17が形成され、この
低圧側弁体収納室17は基体１に形成された第２のガス連
通導路18により高圧側弁体収納室３と連通されている。
低圧側弁体収納室17内の第２のガス連通導路18の開口部
とは反対側の部分には低圧側弁座19が設けられている。
低圧側弁体収納室17内には低圧側弁座19に対向して低圧
側弁体20が摺動自在に配設されている。この低圧側弁体
20の低圧側弁体収納室17の内壁に接する周壁部には第３
のガス連通導路21が形成されている。低圧側弁体収納室
17内にはまた低圧側弁体20を低圧側弁座19に向けて付勢
する補助バネ22が配置されている。基体１はその低圧側
弁体収納室17が位置する部分を含めて外方に突出する突
出部23を有し、この突出部23には一端が低圧側弁座19内
に開口し他端が突出部23の外面に開口する第１の孔24と
第１の孔24の軸線に対して直交し第１の孔24から放射状
に延びて突出部23の外面に開口する複数の第２の孔25と
が形成されている。これらの第１の孔24と複数の第２の
孔25とにより第４のガス連通導路26が構成され、この第
４のガス連通導路26は後記するガス圧調整室に連通して
いる。基体１にはまた突出部23の外周側に環状空間を形
成するシリンダ部27が一体に形成されており、このシリ
ンダ部27にはその内壁に気密を保持して摺動自在に接す
るピストン28が装填されている。ピストン28は第４のガ
ス連通導路26の第１の孔24を貫通して低圧側弁体20に当
接する弁体突き棒29を有し、この弁体突き棒29とは反対
側のピストン28の外面に球面状突起30が設けられてい
る。これらのピストン28、シリンダ27及び突出部23によ
って低圧側ガス圧調整室31が区画形成されている。基体
１のシリンダ部27はベローズ32に覆われ、ベローズ32の
一端部はベローズ支え具33を介して基体１に固定されて
いる。ベローズ32の他端部にはピストン28の球面状突起
30が係合し得る円錐状凹部34を有する押圧具35が取付け
られている。これらのベローズ32、ベローズ支え具33及
び押圧具35と基体１のシリンダ部27及びピストン28との
間に圧力室36が形成されている。ベローズ32の外側には
円筒状部37が基体１から突設され、この円筒状部37の開
口部にはベローズ32を覆う低圧側弁カバー38が螺着され
ている。低圧側弁カバー38は大径のベローズ収納部39と
小径のバネ収納部40とで構成されている。低圧側弁カバ
ー38のバネ収納部40内には低圧側バネ41がその一端をベ
ローズ32の外側面に当接して配置され、この低圧側バネ
41の他端はバネ座42により保持されている。バネ座42に
は低圧側弁カバー38に螺合されたネジ杆43の一端部が当
接され、このネジ杆43の他端部は低圧側弁カバー38をネ
ジ結合で貫通して外部に突出されている。ネジ杆43の他
端部には摘み44が取付けられており、この摘み44を適宜
に回すことにより低圧側バネ41の撓み量を所望の量に設
定できるようになっている。低圧側弁カバー38のベロー
ズ収納部39とバネ収納部40との境には孔45が形成されて
おり、この孔45は低圧側弁カバー38内の空気抜き或いは
外気をカバー38内に導入する作用をするものである。基
体１にはまた低圧側ガス圧調整室31に一端が開口する第
１のガス流出孔46が略Ｌ字状に形成されている。この第
１のガス流出孔46の折曲部付近と高圧側減圧弁16のバネ
室14との間には双方を連通する第５のガス連通導路47が
配設されており、この第５のガス連通導路47、第１のガ
ス流出孔46及びバネ室14により、第１のガス流出孔46の
ガス圧力を高圧側バネ12の付勢力に付加する高圧側圧力
付加手段48が構成されている。第１のガス流出孔46の末
端部付近の外側には環状空間よりなる低圧側ガス室49が
形成されている。この低圧側ガス室49とベローズ32内の
圧力室36との間には双方を連通する細孔50が形成され、
この細孔50は低圧側ガス室49内を流れるガスの流量の増
減に伴う圧力変化を圧力室36に伝達する圧力検出用の導
路として作用する。低圧側ガス室49の第１の流出孔46と
は反対側の部分には基体１に形成された第２のガス流出
孔51が接続されている。以上のように形成されたシリン
ダ部27、ピストン28、ベローズ32、低圧側ガス室49及び
細孔50により、低圧側ガス室49またはガス流出導路を流
れるガスの流量に応じた力を低圧側弁体を弁座から離す
方向に低圧側弁体に付与する低圧側圧力付加手段52が構
成されている。また第２のガス連通導路18と第５のガス
連通導路47とを除いた符号17乃至50であらわした構成部
材により低圧側減圧弁53が構成されている。A low pressure side valve body storage chamber 17 is also formed in the base body 1, and the low pressure side valve body storage chamber 17 is connected to the high pressure side valve body storage chamber 3 by a second gas communication conduit 18 formed in the base body 1. ing.
A low pressure side valve seat 19 is provided in a portion of the low pressure side valve body storage chamber 17 opposite to the opening of the second gas communication channel 18.
A low pressure side valve body 20 is slidably arranged in the low pressure side valve body storage chamber 17 so as to face the low pressure side valve seat 19. This low pressure side valve body
A third wall is provided on the peripheral wall portion in contact with the inner wall of the low pressure side valve body storage chamber 17 of 20.
The gas communication channel 21 is formed. Low pressure side valve body storage chamber
An auxiliary spring 22 for urging the low pressure side valve body 20 toward the low pressure side valve seat 19 is also disposed inside the valve 17. The base 1 has a protruding portion 23 that protrudes outward, including the portion where the low pressure side valve body storage chamber 17 is located, and one end of this protruding portion 23 is opened into the low pressure side valve seat 19 and the other end is A first hole 24 opening to the outer surface of the projecting portion 23 and a plurality of second holes orthogonal to the axis of the first hole 24 and extending radially from the first hole 24 and opening to the outer surface of the projecting portion 23. And 25 are formed. The first hole 24 and the plurality of second holes 25 form a fourth gas communication channel 26, and the fourth gas communication channel 26 communicates with a gas pressure adjusting chamber described later. . A cylinder portion 27 forming an annular space is integrally formed on the outer peripheral side of the protruding portion 23 in the base body 1, and a piston 28 slidably contacting the inner wall of the cylinder portion 27 while keeping airtightness. It is loaded. The piston 28 has a valve body thrusting rod 29 that penetrates the first hole 24 of the fourth gas communication passageway 26 and abuts against the low pressure side valve body 20, and the piston on the side opposite to the valve body thrusting rod 29. A spherical projection 30 is provided on the outer surface of 28. A low pressure side gas pressure adjusting chamber 31 is defined by the piston 28, the cylinder 27 and the protrusion 23. The cylinder portion 27 of the base 1 is covered with a bellows 32, and one end of the bellows 32 is fixed to the base 1 via a bellows support 33. At the other end of the bellows 32, a spherical projection of the piston 28
Attached is a pusher 35 having a conical recess 34 into which 30 can engage. A pressure chamber 36 is formed between the bellows 32, the bellows supporting member 33 and the pressing member 35 and the cylinder portion 27 and the piston 28 of the base 1. A cylindrical portion 37 is provided on the outside of the bellows 32 so as to project from the base body 1, and a low-pressure side valve cover 38 that covers the bellows 32 is screwed into an opening portion of the cylindrical portion 37. The low pressure side valve cover 38 is composed of a large diameter bellows storage portion 39 and a small diameter spring storage portion 40. A low-pressure side spring 41 is arranged in the spring accommodating portion 40 of the low-pressure side valve cover 38 such that one end of the low-pressure side spring 41 abuts on the outer surface of the bellows 32.
The other end of 41 is held by a spring seat 42. One end of a screw rod 43 screwed to the low-pressure side valve cover 38 is brought into contact with the spring seat 42, and the other end of the screw rod 43 penetrates the low-pressure side valve cover 38 by a screw connection and protrudes to the outside. Has been done. A knob 44 is attached to the other end of the screw rod 43, and the amount of bending of the low pressure side spring 41 can be set to a desired amount by appropriately turning the knob 44. A hole 45 is formed at the boundary between the bellows storage portion 39 and the spring storage portion 40 of the low pressure side valve cover 38, and this hole 45 serves to remove air from the low pressure side valve cover 38 or introduce outside air into the cover 38. Is what you do. The substrate 1 is also formed with a first gas outflow hole 46 having one end opened to the low pressure side gas pressure adjusting chamber 31 in a substantially L shape. A fifth gas communication passage 47 is provided between the bent portion of the first gas outflow hole 46 and the spring chamber 14 of the high pressure side pressure reducing valve 16 so as to communicate them with each other. The gas communication conduit 47, the first gas outflow hole 46 and the spring chamber 14 constitute a high pressure side pressure adding means 48 for adding the gas pressure of the first gas outflow hole 46 to the urging force of the high pressure side spring 12. ing. A low-pressure gas chamber 49 formed of an annular space is formed outside the first gas outflow hole 46 near the end thereof. Between the low pressure side gas chamber 49 and the pressure chamber 36 in the bellows 32, there are formed pores 50 communicating with each other.
The fine pores 50 act as pressure guiding paths for transmitting pressure changes to the pressure chambers 36 due to changes in the flow rate of the gas flowing in the low pressure side gas chamber 49. A second gas outflow hole 51 formed in the base body 1 is connected to a portion of the low pressure side gas chamber 49 opposite to the first outflow hole 46. Due to the cylinder portion 27, the piston 28, the bellows 32, the low pressure side gas chamber 49 and the pores 50 formed as described above, a force corresponding to the flow rate of the gas flowing through the low pressure side gas chamber 49 or the gas outflow conduit is applied to the low pressure side. A low pressure side pressure applying means 52 for applying the low pressure side valve body in the direction of separating the valve body from the valve seat is configured. Further, the low pressure side pressure reducing valve 53 is constituted by the constituent members denoted by reference numerals 17 to 50 excluding the second gas communication conduit 18 and the fifth gas communication conduit 47.
第２のガス流出孔51の末端に対応して基体１には開閉
弁用弁座54が形成されている。基体１の弁座54に対向す
る部分には弁体収納室55が形成され、この弁体収納室55
内には弁体56が配置されている。弁体56は基体１にネジ
結合で支持されていて弁座54側とは反対側の端部に取付
けられた摘み57を操作することにより開閉動作が行える
ようになっている。これらの弁座54、弁体収納室55、弁
体56及び摘み57により開閉弁58が構成されている。基体
１の開閉弁58の取付位置付近には第２のガス流出孔51に
軸線が直交する柱状突出部59が一体成形されている。柱
状突出部59の軸芯部には一端が弁体収納室55に接続され
た第３のガス流出孔60が形成されており、第３のガス流
出孔60の他端には柱状突出部59に形成されていてこの孔
より大径のフロート収納部61が連続して形成されてい
る。柱状突出部59にはフロート収納部61内を覗き見るた
めの表示窓62が２箇所に設けられており、各表示窓62に
はフロート収納部61内の気密を保持するための透明板63
が嵌め込まれている。柱状突出部59のフロート収納部61
の開閉弁58側とは反対側の部分にバネ収納凹部64が形成
され、このバネ収納凹部64は柱状突出部59に形成された
第４のガス流出孔65に接続されている。フロート収納部
61内にはフロート66が収納され、このフロート66は有底
の円筒状基部67と基部67の底部に形成された複数のガス
流通孔68と底部に支持されていて円錐状の頭部が第３の
ガス流出孔60に嵌合し得るように形成された嵌子69とに
より構成されている。フロート66とバネ収納凹部64との
間にはバネ70が配置され、このバネ70によってフロート
66が第３のガス流出孔60に向かって付勢されている。こ
れらの第３のガス流出孔60、フロート収納部61、表示窓
62、フロート66及びバネ70によってガスの流れを検出す
る検流機構71が構成されている。以上のように基体１に
形成された第１のガス流出孔46、低圧側ガス室49、第２
のガス流出孔51、弁体収納室55、第３のガス流出孔60、
フロート収納部61、バネ収納凹部64及び第４のガス流出
孔65によりガス流出導路72が構成されている。A valve seat 54 for an on-off valve is formed on the base body 1 so as to correspond to the end of the second gas outflow hole 51. A valve body storage chamber 55 is formed in a portion of the base body 1 facing the valve seat 54.
A valve body 56 is arranged inside. The valve body 56 is supported on the base body 1 by screw connection and can be opened and closed by operating a knob 57 attached to the end opposite to the valve seat 54 side. The valve seat 54, the valve body storage chamber 55, the valve body 56 and the knob 57 constitute an on-off valve 58. A columnar protrusion 59 whose axis is orthogonal to the second gas outflow hole 51 is integrally formed near the mounting position of the on-off valve 58 of the base 1. A third gas outflow hole 60, one end of which is connected to the valve body storage chamber 55, is formed at the axial center of the columnar projection 59, and the columnar projection 59 is provided at the other end of the third gas outflow hole 60. The float accommodating portion 61 having a diameter larger than that of the hole is continuously formed. The columnar protrusion 59 is provided with two display windows 62 for peeping into the float storage 61, and each display window 62 has a transparent plate 63 for keeping the float storage 61 airtight.
Is fitted. Float storage part 61 of columnar protrusion 59
A spring accommodating recess 64 is formed in a portion opposite to the opening / closing valve 58 side, and the spring accommodating recess 64 is connected to a fourth gas outflow hole 65 formed in the columnar protrusion 59. Float storage
A float 66 is accommodated in the 61, and the float 66 is supported by the cylindrical base portion 67 having a bottom and a plurality of gas flow holes 68 formed in the bottom portion of the base 67 and the conical head portion. 3 and a fitting 69 formed so as to be fitted into the gas outflow hole 60. A spring 70 is arranged between the float 66 and the spring accommodating recess 64, and the spring 70 allows the float 70 to
66 is biased towards the third gas outlet 60. These third gas outflow hole 60, float storage 61, display window
A flow detecting mechanism 71 for detecting the flow of gas is constituted by 62, the float 66 and the spring 70. The first gas outflow hole 46, the low pressure side gas chamber 49, and the second gas outflow hole 46 formed in the base body 1 as described above.
Gas outflow hole 51, valve body storage chamber 55, third gas outflow hole 60,
The float housing portion 61, the spring housing recess 64, and the fourth gas outlet hole 65 constitute a gas outlet conduit 72.
次に上記実施例の操作及び動作について第２図乃至第
４図を参照して説明する。先ず基体１のガス流入導路２
にガスボンベ等の図示しないガス供給源を接続し、基体
１のガス流出導路72には通信ケーブル等の図示しないガ
ス被供給機器のガス室を接続する。この状態で第２図に
示すように本発明の２段式減圧弁装置の開閉弁58を閉
じ、低圧側減圧弁52も閉じておく。高圧側減圧弁16はガ
スが供給されない状態では高圧側バネ12の高圧側弁体６
に対する付勢力により常時開いている。次いでガス供給
源からガス流入導路２にガスを第２図に示す矢印の如く
供給すると、高圧側弁体収納室３に供給されたガスが第
２のガス連通導路18を通って低圧側弁体収納室17に送給
されるとともに高圧側弁体６に形成された第１のガス連
通導路10を通って圧力室15に送給される。ガスが圧力室
15に供給され続けると、圧力室15内の圧力が高まり、こ
の圧力が高圧側バネ12の高圧側弁体６に対する付勢力に
抗して作用し、最終的には高圧側減圧弁16を閉じる。こ
の状態では、開閉弁58と高圧側減圧弁16と低圧側減圧弁
53とが閉じている。次にガス流出導路72の第２のガス流
出孔51内のガス圧力を計測する図示しない圧力計を見な
がら低圧側減圧弁53の摘み44を操作して低圧側弁体20を
その弁座19から離しつつ第２のガス流出孔51内のガス圧
力を、所望の圧力（ガス被供給機器のガス室を満たすガ
スの圧力）に設定する。このとき、第１のガス流出孔46
内のガスが第５のガス連通導路47を通って高圧側減圧弁
16のバネ室14に送給される。そのためバネ室14内のガス
圧力が高圧側弁体６を高圧側弁座４から離す方向に働
き、見掛上高圧側バネ12の付勢力が大きくなる。このこ
とは言い替えれば、高圧側減圧弁16の低圧側（低圧側弁
体収納室17内）のガス圧が増加したこと、即ち低圧側減
圧弁53のガス圧調整範囲が広がったことを意味する。Next, the operation and operation of the above embodiment will be described with reference to FIGS. First, the gas inflow passage 2 of the substrate 1
A gas supply source (not shown) such as a gas cylinder is connected to, and a gas chamber of a gas supply device (not shown) such as a communication cable is connected to the gas outflow conduit 72 of the base 1. In this state, as shown in FIG. 2, the on-off valve 58 of the two-stage pressure reducing valve device of the present invention is closed, and the low pressure side pressure reducing valve 52 is also closed. The high pressure side pressure reducing valve 16 is the high pressure side valve body 6 of the high pressure side spring 12 when gas is not supplied.
It is always open due to the urging force against. Next, when gas is supplied from the gas supply source to the gas inflow conduit 2 as shown by the arrow in FIG. 2, the gas supplied to the high pressure side valve body storage chamber 3 passes through the second gas communication conduit 18 and to the low pressure side. It is fed to the valve body storage chamber 17 and is fed to the pressure chamber 15 through the first gas communication passage 10 formed in the high pressure side valve body 6. Gas pressure chamber
When the pressure is continuously supplied to 15, the pressure in the pressure chamber 15 increases, and this pressure acts against the biasing force of the high pressure side spring 12 against the high pressure side valve body 6, and finally closes the high pressure side pressure reducing valve 16. . In this state, the on-off valve 58, the high pressure side pressure reducing valve 16 and the low pressure side pressure reducing valve
53 and are closed. Next, while operating the knob 44 of the low pressure side pressure reducing valve 53 while observing the pressure gauge (not shown) for measuring the gas pressure in the second gas outflow hole 51 of the gas outflow conduit 72, the low pressure side valve body 20 is moved to its valve seat. The gas pressure in the second gas outflow hole 51 is set to a desired pressure (the pressure of the gas filling the gas chamber of the gas supply device) while being separated from 19. At this time, the first gas outlet hole 46
The gas inside passes through the fifth gas communication conduit 47 and the high pressure side pressure reducing valve
It is fed to 16 spring chambers 14. Therefore, the gas pressure in the spring chamber 14 acts in the direction in which the high pressure side valve body 6 is separated from the high pressure side valve seat 4, and the biasing force of the high pressure side spring 12 apparently increases. In other words, this means that the gas pressure on the low pressure side of the high pressure side pressure reducing valve 16 (in the low pressure side valve body storage chamber 17) has increased, that is, the gas pressure adjustment range of the low pressure side pressure reducing valve 53 has expanded. .
またこの際、第２のガス流出孔51内のガス圧力が細孔
50を通ってベローズ32内の圧力室36に伝達され（細孔50
を通ってガスがベローズ内に入り）、ベローズ32が伸び
て低圧側バネ41が撓まされる。このときベローズ32の伸
びが低圧側バネ41のピストン28に対する付勢力を減少す
るように作用し、低圧側バネ41の撓み量とベローズ32の
伸びとによりピストン28を低圧側弁体20側に付勢する付
勢力が生起される。こピストン28を低圧側弁体20側に付
勢する付勢力と第２のガス流出孔51内のガス圧力とがバ
ランスすると、低圧側弁体20が低圧側弁座19に当接して
低圧側減圧弁53が閉じ、次いで高圧側減圧弁16も閉じ
る。これでガス被供給機器に供給するガスに対する圧力
の設定操作が終了する。At this time, the gas pressure in the second gas outlet hole 51 is
It is transmitted to the pressure chamber 36 in the bellows 32 through 50 (pore 50
Gas enters the bellows through), the bellows 32 extends, and the low-pressure side spring 41 is bent. At this time, the expansion of the bellows 32 acts so as to reduce the urging force of the low pressure side spring 41 on the piston 28, and the piston 28 is attached to the low pressure side valve body 20 side by the deflection amount of the low pressure side spring 41 and the expansion of the bellows 32. Biasing force is generated. When the urging force for urging the piston 28 toward the low pressure side valve body 20 side and the gas pressure in the second gas outflow hole 51 are balanced, the low pressure side valve body 20 contacts the low pressure side valve seat 19 and the low pressure side. The pressure reducing valve 53 is closed, and then the high pressure side pressure reducing valve 16 is also closed. This completes the pressure setting operation for the gas supplied to the gas supply device.
次いで、第３図に示すようにガス被供給機器にガスを
供給するために開閉弁58を開く。開閉弁58を開くと、第
１のガス流出孔46及び第２のガス流出孔51内のガスが開
閉弁58ぽ通ってガス被供給機器側に流れる。ガスがガス
流出導路72を流れると、低圧側ガズ圧調整室31内のガス
圧力が低下して低圧側バネ41のピストン28に対する付勢
力が低圧側ガス圧調整室31内のガス圧力より勝り、ピス
トン28が低圧側弁体20側に移動して低圧側減圧弁53が開
く。またこの時ガス流出導路72を流れるガス流によって
低圧側ガス室49、細孔50が負圧となり、圧力室36内のガ
スが流出してこの負圧がベローズ32内の圧力室36に作用
してベローズ32が低圧側弁体20側に縮むように変形す
る。ベローズ32が低圧側弁体20側に縮むと、このベロー
ズ32の縮む力が低圧側バネ41のピストン28に対する付勢
力を見掛け上増加するように作用して、言い替えればベ
ローズ32の縮む力が低圧側バネ41の付勢力とは別に低圧
側弁体20がその弁座19から離れる方向にピストン28に作
用して、底圧側弁体20は弁座19から更に遠く離れる（低
圧側減圧弁53が更に大きく開く）。即ち底圧側圧力付加
手段52が動作して低圧側減圧弁53が大きく開く。低圧側
減圧弁53の開きが大きくなるほど（底圧側弁体20が弁座
19から離れれば離れるほど）、流出ガスの流量は大きく
なる（低圧側ガス調整室31内のガス圧が増加する）。例
えば、実際に製造したある装置の例では、開閉弁58を開
く前の低圧側ガス調整室31内のガス圧は1kgf/cm2であっ
たが、低圧側減圧弁53が開いた後の低圧側ガス調整室31
内のガス圧は1.47〜1.48kgf/cm2まで上昇した。ちなみ
に低圧側圧力付加手段52を設けない従来の構造の装置で
は、低圧側ガス調整室内のガス圧を1kgf/cm2としたとき
に、低圧側減圧弁が開いた後の低圧側ガス調整室内のガ
ス圧は0.77〜0.78kgf/cm2まで下がった。低圧側減圧弁5
3が開いてガスが流れ出すと、高圧側圧力室15内のガス
も流出し、高圧側バネ12の高圧側弁体６に対する付勢力
とガス室14内のガス圧力とを加えた力が高圧側の圧力室
15内のガスより勝って、高圧弁体６が弁座４から離れて
高圧側減圧弁16が開かれる。このようにしてガス供給減
からのガス高圧側減圧弁16と低圧側減圧弁53とでその圧
力を２段階に減圧してガス被供給機器に供給するが、ガ
ス流出導路72をガスが流れているか否かを検流機構71に
よって検出している。即ちこの検流機構71は、従来の流
量計とは異なりフロート66の嵌子69が第３のガス流出孔
60に嵌合して嵌子69と第３のガス流出孔60との間の隙間
からガスが流出するようなガスの流量が極めて小量の場
合と、嵌子69が第３のガス流出孔60から離脱してフロー
ト66が収納部61内に浮遊するようなガスの流量が極めて
大量の場合との双方間で動作するものである。この検流
機構71は、例えば最大のガス流量に対して1/1000〜1/10
0程度の最小のガス流量についてガスが流れているか否
かを検出することができる。また検流機構71により検出
されるガスが流れているか否かについては表示窓62内に
位置する円筒状基部67によって表示される。この検流機
構71によりガスの流量が所定値以下となったことが検出
された場合、低圧側減圧弁53の摘み44を回してネジ杆を
緩めて低圧側減圧弁53を閉じる。Next, as shown in FIG. 3, the on-off valve 58 is opened to supply the gas to the gas supply device. When the open / close valve 58 is opened, the gas in the first gas outflow hole 46 and the second gas outflow hole 51 flows through the open / close valve 58 to the gas supply device side. When the gas flows through the gas outflow conduit 72, the gas pressure in the low pressure side gas pressure adjusting chamber 31 decreases, and the biasing force of the low pressure side spring 41 against the piston 28 exceeds the gas pressure in the low pressure side gas pressure adjusting chamber 31. The piston 28 moves to the low pressure side valve body 20 side and the low pressure side pressure reducing valve 53 opens. Further, at this time, the low pressure side gas chamber 49 and the pores 50 have a negative pressure due to the gas flow flowing through the gas outflow conduit 72, and the gas in the pressure chamber 36 flows out, and this negative pressure acts on the pressure chamber 36 in the bellows 32. Then, the bellows 32 is deformed so as to contract toward the low pressure side valve body 20 side. When the bellows 32 contracts toward the low pressure side valve body 20, the contracting force of the bellows 32 acts to apparently increase the urging force of the low pressure side spring 41 to the piston 28. In other words, the contracting force of the bellows 32 is low. Apart from the urging force of the side spring 41, the low pressure side valve body 20 acts on the piston 28 in the direction away from the valve seat 19, and the bottom pressure side valve body 20 moves further away from the valve seat 19 (the low pressure side pressure reducing valve 53 Open further). That is, the bottom pressure side pressure applying means 52 operates to open the low pressure side pressure reducing valve 53 greatly. The larger the opening of the low pressure side pressure reducing valve 53 (the bottom pressure side valve body 20 is
The farther away from 19), the larger the flow rate of the outflow gas (the gas pressure in the low-pressure side gas adjustment chamber 31 increases). For example, in an example of a device actually manufactured, the gas pressure in the low pressure side gas adjustment chamber 31 before opening the on-off valve 58 was 1 kgf / cm 2 , but the low pressure after the low pressure side pressure reducing valve 53 was opened. Side gas adjustment room 31
The gas pressure inside rose to 1.47 to 1.48 kgf / cm 2 . By the way, in the device of the conventional structure which does not have the low pressure side pressure applying means 52, when the gas pressure in the low pressure side gas adjustment chamber is set to 1 kgf / cm 2 , the low pressure side gas adjustment chamber is opened after the low pressure side pressure reducing valve is opened. The gas pressure dropped to 0.77 to 0.78 kgf / cm 2 . Low pressure reducing valve 5
When 3 is opened and gas flows out, the gas in the high pressure side pressure chamber 15 also flows out, and the force that adds the biasing force of the high pressure side spring 12 to the high pressure side valve body 6 and the gas pressure in the gas chamber 14 is the high pressure side. Pressure chamber
The high pressure valve body 6 is separated from the valve seat 4 by overcoming the gas in 15, and the high pressure side pressure reducing valve 16 is opened. In this way, the gas pressure reduction valve 16 and the low pressure side pressure reduction valve 53 from the gas supply reduction reduce the pressure in two stages and supply them to the gas supply device, but the gas flows through the gas outflow conduit 72. It is detected by the galvanizing mechanism 71. That is, in this flow detecting mechanism 71, unlike the conventional flowmeter, the fitting 69 of the float 66 has the third gas outlet hole.
When the flow rate of the gas is such that the gas flows out from the gap between the fitter 69 and the third gas outflow hole 60 when fitted into the 60, and when the fitter 69 is the third gas outflow hole. It operates both when it is separated from 60 and when the flow rate of gas in which the float 66 floats in the storage section 61 is extremely large. This flow detection mechanism 71 is, for example, 1/1000 to 1/10 of the maximum gas flow rate.
It is possible to detect whether or not gas is flowing for a minimum gas flow rate of about 0. Further, whether or not the gas detected by the flow detecting mechanism 71 is flowing is displayed by the cylindrical base 67 located in the display window 62. When it is detected by the flow detecting mechanism 71 that the flow rate of the gas is equal to or less than the predetermined value, the knob 44 of the low pressure side pressure reducing valve 53 is turned to loosen the screw rod and the low pressure side pressure reducing valve 53 is closed.
尚、上記実施例において、開閉弁58を閉じてガスを高
圧側減圧弁16と低圧側減圧弁53とを通して第１のガス流
出孔46と第２のガス流出孔51とに充満した際にベローズ
32の伸びる力によりピストン28が作用する圧力と、開閉
弁58を開いてガス流出導路72内を流れている際にベロー
ズ32の縮む力によりピストン28が作用する圧力との差
を、従来の２段式減圧弁装置における開閉弁を開いてガ
スがガス流出導路を流れた時のガスの圧力とガスの設定
圧力との差と等しくするようにベローズ32と細孔50とを
設定すれば、自動的にガスの設定圧力とガス流出導路72
を流れるガスの供給圧力とを同一にすることができる。In the above embodiment, the bellows is closed when the on-off valve 58 is closed and the gas is filled in the first gas outflow hole 46 and the second gas outflow hole 51 through the high pressure side pressure reducing valve 16 and the low pressure side pressure reducing valve 53.
The difference between the pressure exerted by the piston 28 due to the expanding force of 32 and the pressure exerted by the piston 28 due to the contracting force of the bellows 32 when the on-off valve 58 is opened and flowing in the gas outflow conduit 72 is calculated as follows. If the on-off valve of the two-stage pressure reducing valve device is opened and the bellows 32 and the pore 50 are set so as to be equal to the difference between the gas pressure when the gas flows through the gas outflow conduit and the gas set pressure. Automatically set gas pressure and gas outlet conduit 72
The supply pressure of the gas flowing through can be the same.
また低圧側圧力付加手段52はベローズ32の代りにダイ
アフラムを有するケースを用い、ダイアフラムの変位量
を低圧側バネ41に付加するような構造としてもよい。Further, the low-pressure side pressure applying means 52 may use a case having a diaphragm instead of the bellows 32, and may have a structure in which the displacement amount of the diaphragm is added to the low-pressure side spring 41.
更に高圧側圧力付加手段48は、上記実施例のように第
５のガス連通導路47を第１のガス流出孔46に接続したも
のに限定されるものではなく、ガス流出導路72と高圧側
減圧弁16のバネ室14とを連通するものであれば如何なる
ものでもよい。Furthermore, the high-pressure side pressure applying means 48 is not limited to the one in which the fifth gas communication guide path 47 is connected to the first gas outflow hole 46 as in the above-mentioned embodiment, and the gas outflow guide path 72 and the high pressure side. Any element may be used as long as it communicates with the spring chamber 14 of the side pressure reducing valve 16.
（発明の効果） 以上のように本出願の第１の発明によれば、開閉弁が
開かれてガス被供給機器にガスが供給されると、低圧側
圧力付加手段が流出ガスの流量に応じた力を低圧側弁体
を低圧側弁座から離す方向に付加して低圧側弁体を底圧
側弁座さら更に離すた、流出ガスの流出量または流出ガ
スの圧力を増加させることができ、ガス被供給機器のガ
ス室を従来よりも早く充填することができる。(Effect of the invention) As described above, according to the first invention of the present application, when the on-off valve is opened and the gas is supplied to the gas supply device, the low pressure side pressure applying means responds to the flow rate of the outflow gas. Applied force in the direction of separating the low pressure side valve body from the low pressure side valve seat to further separate the low pressure side valve body from the bottom pressure side valve seat, the outflow gas outflow amount or the outflow gas pressure can be increased, It is possible to fill the gas chamber of the gas supply device earlier than before.
また本出願の第２の発明によれば、高圧側圧力付加手
段がガス流出導路内のガスの圧力を高圧側弁体に高圧側
弁体を高圧側弁座から離す方向に付与するため、高圧側
バネの付勢力を見掛け上ガス流出導路内のガスの圧力分
だけ大きくすることができ、高圧側バネを大型化するこ
となく、低圧側減圧弁の調整範囲を大きくすることがで
きる。Further, according to the second invention of the present application, since the high-pressure side pressure applying means applies the pressure of the gas in the gas outflow conduit to the high-pressure side valve body in the direction of separating the high-pressure side valve body from the high-pressure side valve seat, The urging force of the high-pressure side spring can be apparently increased by the pressure of the gas in the gas outflow conduit, and the adjustment range of the low-pressure side pressure reducing valve can be increased without increasing the size of the high-pressure side spring.
【図面の簡単な説明】 第１図は本発明の減圧弁装置の縦断面図、第２図及び第
３図はそれぞれ各弁の動作を示す動作説明図、第４図は
本発明の検流機構の外観図、第５図は従来の減圧弁装置
の概略縦断面図である。 ２……ガス流入導路、６……高圧側弁体、12……高圧側
バネ、16……高圧側減圧弁、18……第２のガス連通導
路、20……低圧側弁体、41……低圧側バネ、48…高圧側
圧力付加手段、52……低圧側圧力付加手段、53……低圧
側減圧弁、72…ガス流出導路。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a longitudinal sectional view of a pressure reducing valve device of the present invention, FIGS. 2 and 3 are operation explanatory views showing the operation of each valve, and FIG. FIG. 5 is an external view of the mechanism, and FIG. 5 is a schematic vertical sectional view of a conventional pressure reducing valve device. 2 ... Gas inflow conduit, 6 ... High pressure side valve body, 12 ... High pressure side spring, 16 ... High pressure side pressure reducing valve, 18 ... Second gas communication conduit, 20 ... Low pressure side valve body, 41 ... Low pressure side spring, 48 ... High pressure side pressure applying means, 52 ... Low pressure side pressure applying means, 53 ... Low pressure side pressure reducing valve, 72 ... Gas outflow conduit.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 若月 健治 東京都千代田区内幸町１丁目１番６号 日本電信電話公社内 (72)発明者 佐藤 六郎 横浜市戸塚区上矢部町2391―１ 株式会 社角丸精機製作所内 (56)参考文献 実開 昭55−78205（ＪＰ，Ｕ) 実開 昭56−88314（ＪＰ，Ｕ) 実開 昭57−10013（ＪＰ，Ｕ) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Kenji Wakatsuki 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo Nippon Telegraph and Telephone Public Corporation (72) Inventor Rokuro Sato 2391-1, Kamiyabe-cho, Totsuka-ku, Yokohama-shi Stock Association Kakudomaru Seiki Seisakusho (56) References: Actually open 55-78205 (JP, U) Actually open 56-88314 (JP, U) Actually open 57-10013 (JP, U)
Claims (2)
記高圧側弁体を付勢する高圧側バネを有する高圧側減圧
弁と、 低圧側弁体を低圧側弁座から離す方向の付勢力を調節自
在として前記低圧側弁体を付勢する低圧側バネを有して
流出ガスの圧力を減圧する低圧側減圧弁とがガス導路で
直列に接続され、 前記高圧側減圧弁にガス流入導路が接続され、 前記低圧側減圧弁にザス流出導路が接続され、 且つ前記ガス流出導路に開閉弁が接続されて、 ガス被供給機器のガス室内を減圧した所定圧力のガスで
充填するために用いられる２段式減圧弁装置において、 前記ガス流出導路を流れる前記流出ガスの流量に応じた
力を前記低圧側弁体を前記弁座から離す方向に前記低圧
側弁体に付与する低圧側圧力付加手段を設けたことを特
徴とする２段式減圧弁装置。1. A high-pressure side pressure reducing valve having a high-pressure side spring for urging the high-pressure side valve body in a direction of separating the high-pressure side valve body from the high-pressure side valve seat, and a direction of separating the low-pressure side valve body from the low-pressure side valve seat. A low-pressure side pressure reducing valve for reducing the pressure of the outflow gas having a low-pressure side spring for biasing the low-pressure side valve body so that the urging force of the high-pressure side pressure reducing valve can be adjusted. A gas inflow conduit is connected to the low pressure side pressure reducing valve, a gas discharge conduit is connected to the low pressure side pressure reducing valve, and an on-off valve is connected to the gas outflow conduit to reduce the pressure in the gas chamber of the gas supply device to a predetermined pressure. In a two-stage pressure reducing valve device used for filling with gas, the low pressure side valve applies a force corresponding to a flow rate of the outflow gas flowing through the gas outflow conduit in a direction of separating the low pressure side valve body from the valve seat. Two-stage type characterized in that low pressure side pressure applying means for applying to the body is provided Valve apparatus.
記高圧側弁体を付勢する高圧側バネを有する高圧側減圧
と、 低圧側弁体を低圧側弁座から離す方向の付勢力を調節自
在として前記低圧側弁体を付勢する低圧側バネを有して
流出ガスの圧力を減圧する低圧側減圧弁とガス導路で直
列に接続され、 前記高圧側減圧弁にガス流入導路が接続され、 前記低圧側減圧弁にガス流出導路が接続され、 且つ前記ガス流出導路に開閉弁が接続されて、 ガス被供給機器のガス室内を減圧した所定圧力のガスで
充填するために用いられる２段式減圧弁装置において、 前記ガス流出導路を流れる前記流出ガスの流量に応じた
力を前記低圧側弁体を前記弁座から離す方向に前記低圧
側弁体に付与する低圧側圧力付加手段と、 前記ガス流出導路内のガスの圧力を前記高圧側減圧弁の
前記高圧側弁体に該高圧側弁体を前記高圧側弁体から離
す方向に付与する高圧側圧力付加手段とを設けたことを
特徴とする２段式減圧弁装置。2. A high pressure decompression having a high pressure side spring for urging the high pressure side valve body in a direction of separating the high pressure side valve body from the high pressure side valve seat, and a direction of separating the low pressure side valve body from the low pressure side valve seat. It is connected in series with a low pressure side pressure reducing valve for reducing the pressure of the outflow gas by having a low pressure side spring for biasing the low pressure side valve element with an adjustable urging force, and a gas is connected to the high pressure side pressure reducing valve. An inflow conduit is connected, a gas outflow conduit is connected to the low-pressure side pressure reducing valve, and an opening / closing valve is connected to the gas outflow conduit, so that the gas in the gas chamber of the gas-supplied device is decompressed with a predetermined pressure of gas. In a two-stage pressure reducing valve device used for filling, a force corresponding to a flow rate of the outflow gas flowing through the gas outflow conduit is applied to the low pressure side valve body in a direction of separating the low pressure side valve body from the valve seat. Low pressure side pressure applying means for applying, and pressure of gas in the gas outflow conduit And a high pressure side pressure applying means for applying the high pressure side valve body to the high pressure side valve body of the high pressure side pressure reducing valve in a direction of separating the high pressure side valve body from the high pressure side valve body. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59081115A JP2547717B2 (en) | 1984-04-24 | 1984-04-24 | Two-stage pressure reducing valve device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59081115A JP2547717B2 (en) | 1984-04-24 | 1984-04-24 | Two-stage pressure reducing valve device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60225212A JPS60225212A (en) | 1985-11-09 |
| JP2547717B2 true JP2547717B2 (en) | 1996-10-23 |
Family
ID=13737373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59081115A Expired - Lifetime JP2547717B2 (en) | 1984-04-24 | 1984-04-24 | Two-stage pressure reducing valve device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2547717B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2575057Y2 (en) * | 1993-03-24 | 1998-06-25 | 株式会社ユタカ | Pressure regulator |
| JPH06324747A (en) * | 1993-05-14 | 1994-11-25 | Chugai Ro Co Ltd | Flow rate control method |
| JP2001304499A (en) * | 2000-02-18 | 2001-10-31 | Neriki:Kk | Valve device for gas cylinder |
| CN112747156B (en) * | 2021-01-12 | 2022-10-14 | 北京卫星制造厂有限公司 | High-precision large-pressure-reduction-ratio automatic pressure-regulating gas pressure-stabilizing pressure-reducing combined valve |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6022406Y2 (en) * | 1978-11-20 | 1985-07-03 | 株式会社オ−ケ−製作所 | Carbon dioxide pressure reducing valve for draft beer |
| JPS5688314U (en) * | 1979-12-03 | 1981-07-15 | ||
| JPS5710013U (en) * | 1980-06-20 | 1982-01-19 |
-
1984
- 1984-04-24 JP JP59081115A patent/JP2547717B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60225212A (en) | 1985-11-09 |
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| EXPY | Cancellation because of completion of term |