JP2546825B2 - Chemical circulation device - Google Patents
Chemical circulation deviceInfo
- Publication number
- JP2546825B2 JP2546825B2 JP61101386A JP10138686A JP2546825B2 JP 2546825 B2 JP2546825 B2 JP 2546825B2 JP 61101386 A JP61101386 A JP 61101386A JP 10138686 A JP10138686 A JP 10138686A JP 2546825 B2 JP2546825 B2 JP 2546825B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- chemical
- chemical liquid
- chemical solution
- recovery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/002—Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Weting (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は複数枚の半導体基板を薬液等で浸漬処理を行
う半導体基板処理装置に関する。TECHNICAL FIELD The present invention relates to a semiconductor substrate processing apparatus for dipping a plurality of semiconductor substrates in a chemical solution or the like.
従来、この種の半導体基板処理装置は薬液槽から回収
した薬液を過器に通して浄化し、うず巻ポンプ、ダイ
アフラムポンプ、ベローズポンプ等により浄化薬液を再
び薬液槽に戻すことにより薬液処理を行うようになって
いる。Conventionally, this type of semiconductor substrate processing apparatus performs chemical solution treatment by passing a chemical solution recovered from a chemical solution tank through an evaporator to purify it, and returning the purified chemical solution to the chemical solution tank again by means of a spiral pump, a diaphragm pump, a bellows pump, etc. It is like this.
上述した従来の処理装置は回転を支持する軸や軸受を
有するうず巻ポンプや膜や蛇腹の変化を利用するダイア
フラムポンプ、ベローズポンプ等を用いているため、ポ
ンプの軸受や蛇腹等の摺動部分から半導体装置製造上最
も障害となる汚染源を発生させたり、また摩耗部分があ
るから薬液の循環装置としての寿命が短命であるという
欠点があった。Since the above-described conventional processing device uses a spiral pump having a shaft or bearing for supporting rotation, a diaphragm pump or a bellows pump that utilizes changes in the membrane or bellows, sliding parts such as bearings or bellows of the pump are used. Therefore, there is a drawback that a pollution source, which is the most obstacle in manufacturing a semiconductor device, is generated, and a wear portion causes a short life of the chemical liquid circulating device.
本発明の目的は機械的な摩耗部分をなくし発塵や薬液
への汚染を防止した薬液循環装置を提供することにあ
る。An object of the present invention is to provide a chemical liquid circulation device which eliminates mechanical wear parts and prevents dust generation and contamination of the chemical liquid.
前記目的を達成するため、本発明に係る薬液循環装置
は、薬液槽と密閉回収槽との組と、配管と、気体圧送器
とを有し、複数の半導体基板を収納した半導体収納箱を
薬液槽内に浸漬して半導体基板の薬液処理を行なう装置
に用いる薬液循環装置であって、 組をなす薬液槽と密閉回収槽とは、薬液槽を上方に、
密閉回収槽を下方に配置し高さ位置を異ならせて設置さ
れたものであり、 配管は、上下に高さの異なる薬液槽と密閉回収槽との
間に並列に設置され、開閉制御による薬液の給排を行な
う薬液回収用配管と薬液供給用配管とからなり、 前記薬液供給用配管は、薬液を瀘過する瀘過器を有し
ており、 気体圧送器は、前記回収槽内に高圧気体を送り込み、
該槽内の薬液を前記薬液供給用配管内に押し出すもので
あり、 薬液槽から密閉回収槽への薬液回収は、薬液回収用配
管に通して薬液を自然落下させて回収することにより行
なわれるものであり、 密閉回収槽から薬液槽への薬液供給は、気体圧送器か
ら密閉回収槽内に高圧気体を送り込み、その高圧気体に
より薬液を薬液供給用配管に通して圧送供給することに
より行なわれるものである。In order to achieve the above object, the chemical liquid circulation device according to the present invention has a semiconductor storage box having a set of a chemical liquid tank and a closed recovery tank, a pipe, and a gas pressure feeder, and a plurality of semiconductor substrates. A chemical liquid circulating device for use in a device for performing chemical liquid treatment on a semiconductor substrate by immersing it in a tank, wherein the chemical liquid tank and the sealed recovery tank are a set,
The closed recovery tank is placed below and installed at different heights.The pipes are installed in parallel between the chemical solution tanks with different heights and the closed recovery tank. Consisting of a chemical liquid recovery pipe for supplying and discharging the chemical liquid and a chemical liquid supply pipe, the chemical liquid supply pipe has a filter for filtering the chemical liquid, and the gas pump is a high pressure inside the recovery tank. Inject gas,
The chemical solution in the tank is pushed out into the chemical solution supply pipe, and the chemical solution is collected from the chemical solution tank to the closed recovery tank by allowing the chemical solution to naturally fall through the chemical solution recovery pipe to collect the chemical solution. The chemical solution is supplied from the closed recovery tank to the chemical solution tank by sending a high-pressure gas from the gas pressure feeder into the closed recovery tank, and the high-pressure gas feeds the chemical solution through the chemical solution supply pipe under pressure. Is.
以下、本発明の一実施例を図により説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第１図において、薬液槽２と２つの密閉回収槽A,Bと
を上下に異なる高さ位置にそれぞれ設置し、薬液槽２の
底部流出口４から薬液回収配管L1を導出し、これを２つ
に分岐させてそれぞれを開閉弁8a,8bを介して下段の各
々の回収槽A,Bに開口する。一方、薬液供給配管L2,L3の
一部を回収槽A,Bの底部付近に開口し、それぞれ開閉弁7
a,7bを介して一本にまとめてこれを過器３の入口側に
接続し、過器３の出口側を上段の薬液槽２に開口す
る。さらに回収槽A,B内に高圧気体を圧送する気体圧送
器５を備え、気体圧送器５を開閉弁5a,5bに通して各回
収槽A,Bに配管L5,L6により接続する。L7,L8は回収槽A,B
を大気に開放する配管であり、各配管L7,L8には開閉弁4
a,4bが設けてある。また各回収槽A,B内には配管L1の開
口高さ位置で上限の薬液液面を検出する液面検出器9a,9
bと、配管L2,L3の開口高さ位置で下限の薬液液面を検出
する液面検出器10a,10bとを設置してある。また、本発
明の薬液循環装置１から気体圧送器５を切り離してそれ
ぞれ別途雰囲気中に設置する。In FIG. 1, the chemical liquid tank 2 and the two closed recovery tanks A and B are installed at different height positions, respectively, and the chemical liquid recovery pipe L 1 is led out from the bottom outlet 4 of the chemical liquid tank 2 and It is branched into two and opened to the lower recovery tanks A and B through the on-off valves 8a and 8b. On the other hand, open part of the chemical liquid supply pipes L 2 and L 3 near the bottom of the recovery tanks A and B, and open and close the open / close valves 7 and 7, respectively.
These are integrated into one via a and 7b and are connected to the inlet side of the excess vessel 3, and the outlet side of the excess vessel 3 is opened to the upper chemical solution tank 2. Further, a gas pressure feeder 5 for pressure-feeding the high pressure gas is provided in the recovery tanks A and B, and the gas pressure feeder 5 is connected to the respective recovery tanks A and B by pipes L 5 and L 6 through the opening / closing valves 5a and 5b. L 7 and L 8 are collection tanks A and B
The is a pipe open to the atmosphere, each pipe L 7, L 8 off valve 4
a and 4b are provided. Also the recovery tank A, is in the B to detect the chemical liquid surface of the upper at the opening height of the pipe L 1 liquid level detector 9a, 9
b and liquid level detectors 10a and 10b for detecting the lower limit of the chemical liquid level at the opening height positions of the pipes L 2 and L 3 are installed. Further, the gas pressure feeder 5 is separated from the chemical liquid circulation device 1 of the present invention and separately installed in an atmosphere.
実施例において、薬液槽２の底部に設けた流出口４か
ら薬液を薬液循環装置１へ自然落下により供給し、同時
回収した薬液を気体で加圧して、過及び温度調節等の
薬液管理を行う過器３を通して吐出口６より薬液槽２
へ戻す動作を連続的に行う。すなわち、先ず回収槽Ａで
弁7aを閉じて弁8aを開け、配管L1の導入口2aより薬液を
導入して薬液を貯める。このとき、弁5aを閉じて弁4aを
開け、貯液により排除される気体を気体給排口3aより排
気口6aへ排出し、貯液動作を行う。回収槽Ａにて上述の
動作を行っている間、他方の回収槽Ｂで満杯となった薬
液の吐出動作を行う。すなわち弁4bを閉じて弁5bを開
け、清浄な気体を気体圧送器５より気体給排口3bを通し
て回収槽Ｂに導入する。このとき、弁8bを閉じて弁7bを
開け、圧送気体により回収槽Ｂ内の気体を圧縮し、その
圧縮気体により加圧された薬液を排出口1bより排出し、
吐出動作を行う。In the embodiment, the chemical liquid is supplied to the chemical liquid circulation device 1 from the outlet 4 provided at the bottom of the chemical liquid tank 2 by natural fall, and the chemical liquids simultaneously recovered are pressurized with a gas to control the chemical liquid such as excess and temperature control. Chemical solution tank 2 from discharge port 6 through filter 3
The operation of returning to is continuously performed. That is, first, in the recovery tank A, the valve 7a is closed and the valve 8a is opened, and the chemical liquid is introduced from the introduction port 2a of the pipe L 1 to store the chemical liquid. At this time, the valve 5a is closed and the valve 4a is opened, the gas removed by the stored liquid is discharged from the gas supply / discharge port 3a to the exhaust port 6a, and the liquid storage operation is performed. While the above-described operation is performed in the recovery tank A, the discharge operation of the full-filled chemical solution in the other recovery tank B is performed. That is, the valve 4b is closed and the valve 5b is opened, and clean gas is introduced into the recovery tank B from the gas pressure feeder 5 through the gas supply / discharge port 3b. At this time, the valve 8b is closed and the valve 7b is opened, the gas in the recovery tank B is compressed by the pressure-fed gas, and the chemical liquid pressurized by the compressed gas is discharged from the discharge port 1b,
Perform ejection operation.
回収槽Ａ及び回収槽Ｂに設けた液面検出器9aにより回
収槽Ａの上限を、また一方回収槽Ｂの下限を液面検出器
10bでそれぞれ検出したときに、前述した貯液動作を回
収槽Ｂに行わせ、吐出動作を回収槽Ａが交替して行うよ
うに切替える。The liquid level detectors 9a provided in the recovery tanks A and B set the upper limit of the recovery tank A and the lower limit of the recovery tank B on the other hand.
When each is detected in 10b, the above-described liquid storage operation is performed in the recovery tank B, and the discharge operation is switched to the recovery tank A in turn.
このようにして液面検出器にてそれぞれの回収槽の液
面状態を検出し、交互に貯液動作と吐出動作をくりかえ
すことにより連続的に薬液循環を行う。In this way, the liquid level detector detects the liquid level of each of the recovery tanks, and the liquid storage operation and the discharge operation are alternately repeated to continuously circulate the chemical liquid.
以上説明したように本発明は回収槽への貯液を自然落
下により行っていること及び、薬液の加圧を清浄化した
圧縮気体により行うため、発塵や薬液への汚染がなく、
機械動作が少ないため、装置の長寿命化が実現できる効
果がある。As described above, according to the present invention, the liquid is stored in the recovery tank by natural dropping, and since the pressurized liquid is performed by the compressed compressed gas, there is no dust or contamination to the liquid.
Since there are few mechanical operations, there is an effect that the life of the device can be extended.
第１図は本発明の半導体基板処理槽薬液循環装置の配管
系統図である。 １……薬液循環装置、２……薬液槽、３……過器、４
……薬液流出口、５……気体圧送器、６……薬液吐出
口、A,B……回収槽、1b……薬液排出口、2a……薬液導
入口、3a,3b……気体給排口、4a,5a,7a,8a,4b,5b,7b,8b
……弁、6a……排気口、9a,9b,10a,10b……液面検出
器、L1……薬液回収配管、L2,L3……薬液供給配管FIG. 1 is a piping system diagram of a semiconductor substrate processing tank chemical liquid circulating apparatus of the present invention. 1 ... Chemical solution circulation device, 2 ... Chemical solution tank, 3 ... Transporter, 4
…… Chemical solution outlet, 5 …… Gas pressure feeder, 6 …… Chemical solution discharge port, A, B …… Recovery tank, 1b …… Chemical solution discharge port, 2a …… Chemical solution inlet port, 3a, 3b …… Gas supply / discharge Mouth, 4a, 5a, 7a, 8a, 4b, 5b, 7b, 8b
…… Valve, 6a …… Exhaust port, 9a, 9b, 10a, 10b …… Liquid level detector, L 1 …… Chemical liquid recovery pipe, L 2 , L 3 …… Chemical liquid supply pipe
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭58−87826（ＪＰ，Ａ) 特開 昭56−152970（ＪＰ，Ａ) 特開 昭58−193725（ＪＰ，Ａ) 特開 昭58−147125（ＪＰ，Ａ) 実開 昭60−39302（ＪＰ，Ｕ) 実開 昭58−77044（ＪＰ，Ｕ) 特公 昭45−12361（ＪＰ，Ｂ１) 特公 昭54−16944（ＪＰ，Ｂ２) 実公 昭53−46292（ＪＰ，Ｙ２) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-58-87826 (JP, A) JP-A-56-152970 (JP, A) JP-A-58-193725 (JP, A) JP-A-58- 147125 (JP, A) Actually open 60-39302 (JP, U) Actually open 58-77044 (JP, U) Special public 45-12361 (JP, B1) Special public 54-16944 (JP, B2) Actual public Sho 53-46292 (JP, Y2)
Claims (1)
体圧送器とを有し、複数の半導体基板を収納した半導体
収納箱を薬液槽内に浸漬して半導体基板の薬液処理を行
なう装置に用いる薬液循環装置であって、 組をなす薬液槽と密閉回収槽とは、薬液槽を上方に、密
閉回収槽を下方に配置し高さ位置を異ならせて設置され
たものであり、 配管は、上下に高さの異なる薬液槽と密閉回収槽との間
に並列に設置され、開閉制御による薬液の給排を行なう
薬液回収用配管と薬液供給用配管とからなり、 前記薬液供給用配管は、薬液を瀘過する瀘過器を有して
おり、 気体圧送器は、前記回収槽内に高圧気体を送り込み、該
槽内の薬液を前記薬液供給用配管内に押し出すものであ
り、 薬液槽から密閉回収槽への薬液回収は、薬液回収用配管
に通して薬液を自然落下させて回収することにより行な
われるものであり、 密閉回収槽から薬液槽への薬液供給は、気体圧送器から
密閉回収槽内に高圧気体を送り込み、その高圧気体によ
り薬液を薬液供給用配管に通して圧送供給することによ
り行なわれるものであることを特徴とする薬液循環装
置。1. A semiconductor substrate chemical treatment for a semiconductor substrate by immersing a semiconductor storage box having a set of a chemical liquid tank and a closed recovery tank, piping, and a gas pressure feeder, and storing a plurality of semiconductor substrates in the chemical liquid tank. The chemical liquid circulation device used in the device for performing the above, and the chemical liquid tank and the sealed recovery tank that make up the set are those installed at different height positions with the chemical liquid tank above and the sealed recovery tank below. Yes, the piping is installed in parallel between the chemical solution tanks of different heights and the closed recovery tank, and is composed of a chemical solution recovery piping and a chemical solution supply piping for supplying and discharging the chemical solution by opening / closing control. The supply pipe has a filter for filtering the chemical liquid, and the gas pressure feeder sends high-pressure gas into the recovery tank and pushes the chemical liquid in the tank into the chemical liquid supply pipe. Yes, the chemical solution recovery from the chemical solution tank to the closed recovery tank is done through the chemical solution recovery pipe. This is done by allowing the liquid to drop naturally and collecting it.The chemical solution is supplied from the closed recovery tank to the chemical tank by feeding a high-pressure gas from the gas pressure feeder into the closed recovery tank, and supplying the chemical solution with the high-pressure gas. A chemical liquid circulation device, characterized in that the chemical liquid circulation device is carried out by feeding under pressure through a pipe for use.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61101386A JP2546825B2 (en) | 1986-05-01 | 1986-05-01 | Chemical circulation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61101386A JP2546825B2 (en) | 1986-05-01 | 1986-05-01 | Chemical circulation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62258735A JPS62258735A (en) | 1987-11-11 |
| JP2546825B2 true JP2546825B2 (en) | 1996-10-23 |
Family
ID=14299320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61101386A Expired - Fee Related JP2546825B2 (en) | 1986-05-01 | 1986-05-01 | Chemical circulation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2546825B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294435A (en) * | 1988-09-29 | 1990-04-05 | Nec Corp | Etching apparatus |
| JPH04256318A (en) * | 1991-02-08 | 1992-09-11 | Nec Yamagata Ltd | Chemical treatment device |
| JP3761457B2 (en) * | 2001-12-04 | 2006-03-29 | Ｎｅｃエレクトロニクス株式会社 | Chemical processing equipment for semiconductor substrates |
| JP4725801B2 (en) * | 2006-11-27 | 2011-07-13 | パナソニック電工株式会社 | Wiring board processing equipment |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49129360A (en) * | 1973-04-16 | 1974-12-11 | ||
| JPS5346292U (en) * | 1976-09-24 | 1978-04-19 | ||
| JPS5416944A (en) * | 1977-07-08 | 1979-02-07 | Hitachi Ltd | Input/output interface control system |
| JPS587709B2 (en) * | 1980-04-25 | 1983-02-10 | 沖電気工業株式会社 | Etching device |
| JPS5876135A (en) * | 1981-11-02 | 1983-05-09 | Hitachi Ltd | Mechanism for supplying chemical liquid |
| JPS5877044U (en) * | 1981-11-19 | 1983-05-24 | 富士通株式会社 | Thin film peeling device |
| JPS5887826A (en) * | 1981-11-20 | 1983-05-25 | Hitachi Ltd | Treatment of substance and device thereof |
| JPS58193725A (en) * | 1981-12-18 | 1983-11-11 | Nec Kyushu Ltd | Method for supplying organic chemical to production device for semiconductor |
| JPS58147125A (en) * | 1982-02-26 | 1983-09-01 | Nippon Telegr & Teleph Corp <Ntt> | Wet processing device |
-
1986
- 1986-05-01 JP JP61101386A patent/JP2546825B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62258735A (en) | 1987-11-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |