JP2022114974A - Optical system, exposure device and article manufacturing method - Google Patents

Optical system, exposure device and article manufacturing method Download PDF

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JP2022114974A
JP2022114974A JP2021011490A JP2021011490A JP2022114974A JP 2022114974 A JP2022114974 A JP 2022114974A JP 2021011490 A JP2021011490 A JP 2021011490A JP 2021011490 A JP2021011490 A JP 2021011490A JP 2022114974 A JP2022114974 A JP 2022114974A
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optical element
supports
optical system
supported
axis
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友樹 由井
Tomoki Yui
正人 羽切
Masato Hagiri
一貴 木村
Kazutaka Kimura
朋史 西川原
Tomofumi Nishigawara
美津留 関
Mitsuru Seki
恭平 白畑
Kyohei Shirahata
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Canon Inc
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Canon Inc
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Priority to JP2021011490A priority Critical patent/JP2022114974A/en
Priority to TW111100509A priority patent/TW202230046A/en
Priority to KR1020220006331A priority patent/KR20220108720A/en
Priority to CN202210076491.2A priority patent/CN114815514A/en
Publication of JP2022114974A publication Critical patent/JP2022114974A/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/005—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for correction of secondary colour or higher-order chromatic aberrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

To provide a technique which is advantageous to adjust relative arrangement of a first optical element and a second optical element constituting an optical system.SOLUTION: An optical system including a first optical element and a second optical element comprises: a plurality of first support portions supporting the first optical element; a plurality of second support portions supporting the second optical element; a plurality of first linear adjustment mechanisms adjusting the positions of the plurality of first support portions, respectively; and a plurality of second linear adjustment mechanisms adjusting the positions of the plurality of second support portions, respectively. The first optical element is adjusted at least for a first axis by adjustment of the positions of the plurality of first support portions performed by the plurality of first linear adjustment mechanisms, and the second optical element is adjusted for at least a second axis different from the first axis by adjustment of the positions of the plurality of second support portions performed by the plurality of second linear adjustment mechanisms.SELECTED DRAWING: Figure 1

Description

本発明は、光学系、露光装置および物品製造方法に関する。 The present invention relates to an optical system, an exposure apparatus, and an article manufacturing method.

特許文献１には、原版のパターンを基板に投影する投影光学系が記載されている。該投影光学系は、原版と基板との間の光路中に配置された第１凹面ミラー、凸面ミラー、第２凹面ミラーと、第１凹面ミラーおよび第２凹面ミラーを支持する支持機構とを備えている。該支持機構は、上部部材、中段部材、下部部材およびそれらの端部を連結する側部部材を含む棚形状の枠体を含み、該第１凹面ミラーは、該上部部材および該中段部材によって支持され、該第２凹面ミラーは、該下部部材によって支持される。このような構成によって第１凹面ミラーおよび第２凹面ミラーの独立した位置ずれによる結像性能の低下が抑えられる。 Japanese Unexamined Patent Application Publication No. 2002-200002 describes a projection optical system that projects a pattern of an original onto a substrate. The projection optical system includes a first concave mirror, a convex mirror, and a second concave mirror arranged in an optical path between the original and the substrate, and a support mechanism for supporting the first concave mirror and the second concave mirror. ing. The support mechanism includes a shelf-shaped frame including an upper member, a middle member, a lower member, and side members connecting their ends, and the first concave mirror is supported by the upper member and the middle member. and the second concave mirror is supported by the bottom member. With such a configuration, deterioration of imaging performance due to independent displacement of the first concave mirror and the second concave mirror can be suppressed.

第１光学素子および第２光学素子を有する光学系において、第１光学素子と第２光学素子との相対的な配置を調整可能な構成は、光学系の光学性能を調整するために重要である。特許文献１では、第１凹面ミラーと第２凹面ミラーとの相対的な配置を調整することについては言及されていない。 In an optical system having a first optical element and a second optical element, a configuration in which the relative arrangement of the first optical element and the second optical element can be adjusted is important for adjusting the optical performance of the optical system. . Patent Document 1 does not mention adjusting the relative arrangement of the first concave mirror and the second concave mirror.

本発明は、光学系を構成する第１光学素子と第２光学素子との相対的な配置を調整するために有利な技術を提供することを目的とする。 An object of the present invention is to provide an advantageous technique for adjusting the relative arrangement of a first optical element and a second optical element that constitute an optical system.

本発明の１つの側面は、第１光学素子および第２光学素子を含む光学系に係り、前記光学系は、前記第１光学素子を支持する複数の第１支持部と、前記第２光学素子を支持する複数の第２支持部と、前記複数の第１支持部の位置をそれぞれ調整する複数の第１リニア調整機構と、前記複数の第２支持部の位置をそれぞれ調整する複数の第２リニア調整機構と、を備え、前記複数の第１リニア調整機構による前記複数の第１支持部の位置の調整によって、前記第１光学素子が少なくとも第１軸に関して調整され、前記複数の第２リニア調整機構による前記複数の第２支持部の位置の調整によって、前記第２光学素子が、少なくとも、前記第１軸とは異なる第２軸に関して調整される。 One aspect of the present invention relates to an optical system including a first optical element and a second optical element, wherein the optical system includes a plurality of first supports that support the first optical element, the second optical element a plurality of second support portions for supporting a plurality of first linear adjustment mechanisms for adjusting the positions of the plurality of first support portions; and a plurality of second support portions for adjusting the positions of the plurality of second support portions. a linear adjustment mechanism, wherein the first optical element is adjusted with respect to at least a first axis by adjusting the positions of the plurality of first supports by the plurality of first linear adjustment mechanisms; By adjusting the positions of the plurality of second supports by the adjustment mechanism, the second optical element is adjusted with respect to at least a second axis different from the first axis.

本発明によれば、光学系を構成する第１光学素子と第２光学素子との相対的な配置を調整するために有利な技術が提供される。 According to the present invention, an advantageous technique is provided for adjusting the relative arrangement of the first optical element and the second optical element that constitute the optical system.

第１実施形態の光学系の構成を示す図。1 is a diagram showing the configuration of an optical system according to a first embodiment; FIG. 第２実施形態の光学系の構成を示す図。The figure which shows the structure of the optical system of 2nd Embodiment. 第１光学素子および第２光学素子の構成例を示す斜視図。FIG. 2 is a perspective view showing a configuration example of a first optical element and a second optical element; 第１支持部の構成例を示す図。FIG. 4 is a diagram showing a configuration example of a first support portion; 第２支持部の構成例を示す図。FIG. 4 is a diagram showing a configuration example of a second support portion; リニア調整機構の構成例を示す図。The figure which shows the structural example of a linear adjustment mechanism. 露光装置の構成例を示す図。FIG. 2 is a diagram showing a configuration example of an exposure apparatus;

以下、添付図面を参照して実施形態を詳しく説明する。なお、以下の実施形態は特許請求の範囲に係る発明を限定するものではない。実施形態には複数の特徴が記載されているが、これらの複数の特徴の全てが発明に必須のものとは限らず、また、複数の特徴は任意に組み合わせられてもよい。さらに、添付図面においては、同一若しくは同様の構成に同一の参照番号を付し、重複した説明は省略する。 Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. In addition, the following embodiments do not limit the invention according to the scope of claims. Although multiple features are described in the embodiments, not all of these multiple features are essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same or similar configurations are denoted by the same reference numerals, and redundant description is omitted.

本明細書および図面において、方向はＸＹＺ座標系において示される。ＸＹＺ座標系のＺ軸は、例えば、鉛直方向に平行である。特許請求の範囲に記載されている第１軸、第２軸、第３軸は、Ｙ軸、Ｘ軸、Ｚ軸にそれぞれ対応しうる。第１軸、第２軸、第３軸は、互いに異なる軸、例えば、相互に直交する軸を説明するために使用される用語である。 In the specification and drawings, directions are shown in an XYZ coordinate system. The Z-axis of the XYZ coordinate system is, for example, parallel to the vertical direction. The first, second, and third axes described in the claims may correspond to the Y-, X-, and Z-axes, respectively. A first axis, a second axis, and a third axis are terms used to describe axes that are different from each other, eg, mutually orthogonal.

図１（ａ）、（ｂ）は、第１実施形態の光学系１００の構成を示す側面図、断面図である。図１（ｂ）は、図１（ａ）における鎖線によって光学系１００を切断した断面を示している。光学系１００は、例えば、露光装置における投影光学系、即ち、原版のパターンを基板に投影する投影光学系として適用されうる。光学系１００は、第１光学素子１および第２光学素子２を備えうる。光学系１００の物体面を射出した光は、第１光学素子１に入射した後に第２光学素子２に入射し、光学系１００の像面に入射しうる。他の観点において、光学系１００の物体面と像面との間の光路に第１光学素子１が配置され、該光路における第１光学素子１と像面との間に第２光学素子２が配置されうる。 1A and 1B are a side view and a cross-sectional view showing the configuration of the optical system 100 of the first embodiment. FIG. 1(b) shows a cross section of the optical system 100 taken along the dashed line in FIG. 1(a). The optical system 100 can be applied, for example, as a projection optical system in an exposure apparatus, that is, a projection optical system that projects a pattern of an original onto a substrate. The optical system 100 may comprise a first optical element 1 and a second optical element 2 . Light exiting the object plane of the optical system 100 can enter the first optical element 1 , enter the second optical element 2 , and enter the image plane of the optical system 100 . In another aspect, the first optical element 1 is arranged in the optical path between the object plane and the image plane of the optical system 100, and the second optical element 2 is arranged in the optical path between the first optical element 1 and the image plane. can be placed.

第１光学素子１および第２光学素子２は、収差を少なくとも部分的に相殺可能でありうる。第１光学素子１および第２光学素子２によって収差が少なくとも部分的に相殺される機能は、第１光学素子１と第２光学素子２との相対配置が目標相対配置に調整されることによって実現されうる。該収差は、例えば、倍率収差および歪曲収差を含みうるが、他の収差であってもよい。 The first optical element 1 and the second optical element 2 may be capable of at least partially canceling aberrations. The function of at least partially canceling aberrations by the first optical element 1 and the second optical element 2 is realized by adjusting the relative arrangement of the first optical element 1 and the second optical element 2 to the target relative arrangement. can be The aberrations may include, for example, magnification aberrations and distortion aberrations, but may also be other aberrations.

光学系１００は、第１光学素子１を支持する複数の第１支持部として、例えば、複数の第１支持部１０５と、１又は複数の第１支持部１０６とを備えうる。複数の第１支持部１０５は、第１光学素子１を下方から支持しうる。１又は複数の第１支持部１０６は、第１光学素子１をその上方において支持しうる。光学系１００は、第２光学素子２を支持する複数の第２支持部として、例えば、２つの第２支持部１１０を備えうる。複数の第２支持部１１０、１１０は、第２光学素子２を下方から支持しうる。光学系１００は、第２光学素子２を支持する１又は複数の第３支持部１１１を備えてもよい。１又は複数の第３支持部１１１は、第２光学素子２をその上方において支持しうる。 The optical system 100 can include, for example, a plurality of first supports 105 and one or a plurality of first supports 106 as a plurality of first supports that support the first optical element 1 . The plurality of first supports 105 can support the first optical element 1 from below. One or more first supports 106 can support the first optical element 1 thereabove. The optical system 100 can include, for example, two second supports 110 as a plurality of second supports that support the second optical element 2 . The plurality of second supports 110, 110 can support the second optical element 2 from below. The optical system 100 may include one or more third supports 111 that support the second optical element 2 . One or more third supports 111 can support the second optical element 2 thereabove.

図３に例示されるように、第１光学素子１の外形は、第１円弧４０１と第１弦４０２とによって規定される図形から第１弦４０２の一端側の第１部分４１１と第１弦４０２の他端側の第２部分４１２とを切り欠いた形状を有しうる。第１光学素子１は、複数の第１支持部１０５、１０５、１０６によって支持される第１被支持部４２１、第２被支持部４２２および第３被支持部４２３を含みる。第１被支持部４２１は、第１部分４１１に配置され複数の第１支持部１０５、１０５、１０６のうちの１つの第１支持部１０５によって支持されうる。第２被支持部４２２は、第２部分４１２に配置され複数の第１支持部１０５、１０５、１０６のうちの他の１つの第１支持部１０５によって支持されうる。第３被支持部４２３は、複数の第１支持部１０５、１０５、１０６のうちの更に他の１つの第１支持部１０６によって支持されうる。第１光学素子１は、第１弦４０２を下側、第１円弧４０１を上側とするように複数の第１支持部１０５、１０５、１０６によって支持されうる。このような構造は、２つの第１支持部１０５およびそれらの位置を調整する後述の第１調整機構１１３の配置を容易にするために有利である。 As illustrated in FIG. 3 , the outer shape of the first optical element 1 is a first portion 411 on one end side of the first chord 402 from a figure defined by the first arc 401 and the first chord 402 and the first chord. It can have a shape in which a second portion 412 on the other end side of 402 is notched. The first optical element 1 includes a first supported portion 421 , a second supported portion 422 and a third supported portion 423 supported by the plurality of first support portions 105 , 105 and 106 . The first supported part 421 may be disposed on the first part 411 and supported by one of the first supporting parts 105 , 105 , 106 . The second supported portion 422 may be disposed on the second portion 412 and supported by another first support portion 105 of the plurality of first support portions 105 , 105 , and 106 . The third supported portion 423 may be supported by still another first support portion 106 of the plurality of first support portions 105 , 105 and 106 . The first optical element 1 can be supported by a plurality of first supports 105, 105, and 106 so that the first chord 402 is on the bottom side and the first arc 401 is on the top side. Such a structure is advantageous for facilitating the arrangement of the two first support portions 105 and the first adjustment mechanism 113 for adjusting their positions, which will be described later.

第１被支持部４２１は、第１光学素子１が複数の第１支持部１０５、１０５、１０６によって支持された状態において水平な被支持面を有しうる。第２被支持部４２２は、第１光学素子１が複数の第１支持部１０５、１０５、１０６によって支持された状態において水平な被支持面を有しうる。このような水平な被支持面は、第１光学素子１が複数の第１支持部１０５、１０５、１０６によって支持されたときの第１光学素子１の変形を抑えるために有利である。第１光学素子１のＺ軸方向の位置は、２つの第１支持部１０５が第１光学素子１を保持するために有する保持面の位置によって定まる。 The first supported portion 421 can have a horizontal supported surface when the first optical element 1 is supported by the plurality of first support portions 105 , 105 , and 106 . The second supported portion 422 can have a horizontal supported surface when the first optical element 1 is supported by the plurality of first support portions 105 , 105 , and 106 . Such a horizontal supported surface is advantageous for suppressing deformation of the first optical element 1 when the first optical element 1 is supported by the plurality of first support portions 105 , 105 and 106 . The position of the first optical element 1 in the Z-axis direction is determined by the positions of the holding surfaces of the two first supports 105 for holding the first optical element 1 .

第２光学素子２の外形は、第２円弧４５１と第２弦４５２とによって規定される形状を有し、第２光学素子２は、第２円弧４５１を下側、第２弦４５２を上側とするように複数の第２支持部１１０、１１０、１１１によって支持されうる。 The outer shape of the second optical element 2 has a shape defined by the second arc 451 and the second chord 452, and the second optical element 2 has the second arc 451 on the lower side and the second chord 452 on the upper side. It may be supported by a plurality of second supports 110, 110, and 111 so as to do.

光学系１００は、第１光学素子１を支持する複数の第１支持部１０５、１０５、１０６の位置をそれぞれ調整する複数の第１リニア調整機構１１３、１１３、１１２を備えうる。複数の第１リニア調整機構１１３、１１３、１１２による複数の第１支持部１０５、１０５、１０６の位置の調整によって、第１光学素子１が少なくともＹ軸（第１軸）に関して調整されうる。光学系１００は、第２光学素子２を支持する複数の第２支持部１１０、１１０の位置をそれぞれ調整する複数の第２リニア調整機構１１４、１１４を備えうる。光学系１００は、第２光学素子２を支持する１又は複数の第３支持部１１１を調整する１又は複数の第３リニア調整機構を備えてもよい。複数の第２リニア調整機構１１４、１１４による複数の第２支持部１１０の位置の調整によって、第２光学素子２が少なくともＸ軸（第２軸）に関して調整されうる。複数の第２リニア調整機構１１４、１１４は、例えば、中間体１１７、１１７を介して複数の第２支持部１１０、１１０を支持し、複数の第２支持部１１０、１１０の位置を調整しうる。 The optical system 100 can include a plurality of first linear adjustment mechanisms 113 , 113 , 112 that adjust positions of a plurality of first supports 105 , 105 , 106 that support the first optical element 1 . By adjusting the positions of the plurality of first supports 105, 105, 106 by the plurality of first linear adjustment mechanisms 113, 113, 112, the first optical element 1 can be adjusted at least about the Y-axis (first axis). The optical system 100 can include a plurality of second linear adjustment mechanisms 114, 114 for adjusting the positions of the plurality of second supports 110, 110 that support the second optical element 2, respectively. The optical system 100 may include one or more third linear adjustment mechanisms for adjusting one or more third supports 111 that support the second optical element 2 . By adjusting the positions of the plurality of second supports 110 by the plurality of second linear adjustment mechanisms 114, 114, the second optical element 2 can be adjusted at least about the X axis (second axis). The plurality of second linear adjustment mechanisms 114, 114 may, for example, support the plurality of second supports 110, 110 via intermediate bodies 117, 117 and adjust the positions of the plurality of second supports 110, 110. .

第１実施形態において、複数の第１リニア調整機構１１３、１１３、１１２は、複数の第１リニア調整機構１１３、１１３、１１２のうち１つの第１リニア調整機構が複数の第１支持部１０５、１０５、１０６のうちの１つに割り当てられるように配置されうる。また、複数の第２リニア調整機構１１４、１１４は、複数の第２リニア調整機構１１４、１１４のうち１つの第２リニア調整機構が複数の第２支持部１１０、１１０のうちの１つに割り当てられるように配置されうる。他の観点において、複数の第１支持部１０５、１０５、１０６の各々の位置は、それに対して割り当てられた第１リニア調整機構以外によっては調整されない。複数の第２支持部１１０、１１０の各々の位置は、それに対して割り当てられた第２リニア調整機構以外によっては調整されない。更に他の観点において、複数の第１リニア調整機構１１３、１１３、１１２は、Ｙ軸方向（第１方向）に関してのみ調整軸を有することができ、複数の第２リニア調整機構１１４、１１４は、Ｘ軸方向（第２方向）に関してのみ調整軸を有することができる。複数の第１リニア調整機構１１３、１１３、１１２が複数の第１支持部１０５、１０５、１０６のそれぞれの位置を調整する方向は、Ｙ軸方向（第１方向）に平行でありうる。複数の第２リニア調整機構１１４、１１４が複数の第２支持部１１０、１１０の位置を調整する方向は、Ｙ軸方向（第１方向）と異なるＸ軸方向（第２方向）に平行でありうる。 In the first embodiment, one of the plurality of first linear adjustment mechanisms 113 , 113 , and 112 includes the plurality of first support portions 105 , 105, 106 can be arranged to be assigned. One of the plurality of second linear adjustment mechanisms 114, 114 is assigned to one of the plurality of second support portions 110, 110. can be arranged so that In another aspect, the position of each of the plurality of first supports 105, 105, 106 is adjusted only by the first linear adjustment mechanism assigned thereto. The position of each of the plurality of second supports 110, 110 is adjusted only by the second linear adjustment mechanism assigned thereto. In yet another aspect, the plurality of first linear adjustment mechanisms 113, 113, 112 can have adjustment axes only in the Y-axis direction (first direction), and the plurality of second linear adjustment mechanisms 114, 114 It is possible to have an adjustment axis only with respect to the X-axis direction (second direction). The direction in which the first linear adjustment mechanisms 113, 113, 112 adjust the positions of the first supports 105, 105, 106 may be parallel to the Y-axis direction (first direction). The direction in which the plurality of second linear adjustment mechanisms 114, 114 adjust the positions of the plurality of second support portions 110, 110 is parallel to the X-axis direction (second direction) different from the Y-axis direction (first direction). sell.

光学系１００は、枠体１０１を備え、枠体１０１は、複数の第１リニア調整機構１１３、１１３、１１２および複数の第２リニア調整機構１１４、１１４を支持しうる。他の観点において、枠体１０１は、複数の第１支持部１０５、１０５、１０６および複数の第２支持部１１０を支持する。更に他の観点において、枠体１０１は、第１光学素子１および第２光学素子２を支持する。複数の第１リニア調整機構１１３、１１３は、枠体１０１によって支持されたベース１１５によって支持されてもよいし、枠体１０１によって直接に支持されてもよい。複数の第２リニア調整機構１１４、１１４は、枠体１０１によって支持されたベース１１６によって支持されてもよいし、枠体１０１によって直接に支持されてもよい。 The optical system 100 comprises a frame 101, and the frame 101 can support a plurality of first linear adjustment mechanisms 113, 113, 112 and a plurality of second linear adjustment mechanisms 114,114. From another point of view, the frame 101 supports the plurality of first supports 105 , 105 , 106 and the plurality of second supports 110 . In still another aspect, the frame 101 supports the first optical element 1 and the second optical element 2 . The plurality of first linear adjustment mechanisms 113 , 113 may be supported by the base 115 supported by the frame 101 or may be directly supported by the frame 101 . The plurality of second linear adjustment mechanisms 114 , 114 may be supported by a base 116 supported by the frame 101 or may be directly supported by the frame 101 .

光学系１００は、第１光学素子１の位置および姿勢および第２光学素子２の位置および姿勢を測定するための測定システムを備えうる。そのような測定システムは、例えば、複数の測距センサ１１８、１１９、１２０を含みうる。複数の測距センサ１１８、１１９、１２０は、それぞれベース１１６、ベース１１５、枠体１０１に取り付けられうる。一例において、光学系１００は、ベース１１６によって支持された複数の測距センサ１１８、ベース１１５によって支持された複数の測距センサ１１９、枠体１０１によって支持された複数の測距センサ１２０を備えうる。複数の測距センサ１１８は、相互の相対位置が既知でありうる。複数の測距センサ１１９は、相互の相対位置が既知でありうる。複数の測距センサ１２０は、相互の相対位置が既知でありうる。 The optical system 100 may comprise a measurement system for measuring the position and orientation of the first optical element 1 and the position and orientation of the second optical element 2 . Such a measurement system may include multiple ranging sensors 118, 119, 120, for example. A plurality of ranging sensors 118, 119, 120 can be attached to the base 116, the base 115, and the frame 101, respectively. In one example, optical system 100 can include multiple ranging sensors 118 supported by base 116, multiple ranging sensors 119 supported by base 115, and multiple ranging sensors 120 supported by frame 101. . The multiple ranging sensors 118 may have known relative positions to each other. The multiple ranging sensors 119 may have known relative positions to each other. The multiple ranging sensors 120 may have known relative positions to each other.

図４には、第１支持部１０５の構成例が示されている。第１支持部１０５は、例えば、第１光学素子１の重量を受ける受け部材１０２と、一対の規制部材１０３と、一対の規制部材１０３を連結し受け部材１０２を支持する連結部材１０４とを含みうる。受け部材１０２は、第１光学素子１の第１被支持部４２１または第２被支持部４２２の被支持面と接触し、第１光学素子１のＺ軸方向（第３軸方向）の位置を規制する。受け部材１０２は、ナイロンまたはＰＯＭ（ポリアセタール）で構成されうる。一対の規制部材１０３は、第１光学素子１のＹ軸方向（第１軸方向）の位置を規制する。一対の規制部材１０３は、例えば、第１光学素子１と接触する突起部を有し、該突起部は、ナイロンまたはＰＯＭ（ポリアセタール）で構成されうる。一対の規制部材１０３は、例えば、突起部を支持するバネ部を有し、第１光学素子１に対してそれを挟み込む方向に力を加えうる。連結部材１０４は、受け部材１０２を介して第１光学素子１を支持する。 FIG. 4 shows a configuration example of the first support portion 105. As shown in FIG. The first support section 105 includes, for example, a receiving member 102 that receives the weight of the first optical element 1 , a pair of regulating members 103 , and a connecting member 104 that connects the pair of regulating members 103 and supports the receiving member 102 . sell. The receiving member 102 is in contact with the supported surface of the first supported portion 421 or the second supported portion 422 of the first optical element 1, and adjusts the position of the first optical element 1 in the Z-axis direction (third axis direction). regulate. The receiving member 102 may be constructed of nylon or POM (polyacetal). A pair of regulating members 103 regulates the position of the first optical element 1 in the Y-axis direction (first axis direction). The pair of regulating members 103 has, for example, protrusions that come into contact with the first optical element 1, and the protrusions can be made of nylon or POM (polyacetal). The pair of regulating members 103 has, for example, a spring portion that supports the protrusion, and can apply force to the first optical element 1 in the direction of sandwiching it. The connecting member 104 supports the first optical element 1 via the receiving member 102 .

図５には、第２支持部１１０の構成例が示されている。第２支持部１１０は、例えば、第２光学素子２の重量を受ける受け部材１０７と、一対の規制部材１０８と、一対の規制部材１０８を連結し受け部材１０７を支持する連結部材１０９とを含みうる。受け部材１０７は、第２光学素子２の外周（円弧）と接触し、第２光学素子２のＺ軸方向（第３軸方向）の位置およびＸ軸方向（第２軸方向）の位置を規制する。受け部材１０７は、ナイロンまたはＰＯＭ（ポリアセタール）で構成されうる。一対の規制部材１０８は、第２光学素子２のＹ軸方向（第１軸方向）の位置を規制する。一対の規制部材１０８は、例えば、第２光学素子２と接触する突起部を有し、該突起部は、ナイロンまたはＰＯＭ（ポリアセタール）で構成されうる。一対の規制部材１０８は、例えば、突起部を支持するバネ部を有し、第２光学素子２に対してそれを挟み込む方向に力を加えうる。連結部材１０９は、受け部材１０７を介して第２光学素子２を支持する。 FIG. 5 shows a configuration example of the second support portion 110. As shown in FIG. The second support section 110 includes, for example, a receiving member 107 that receives the weight of the second optical element 2 , a pair of regulating members 108 , and a connecting member 109 that connects the pair of regulating members 108 and supports the receiving member 107 . sell. The receiving member 107 is in contact with the outer circumference (arc) of the second optical element 2 and regulates the position of the second optical element 2 in the Z-axis direction (third axis direction) and the X-axis direction (second axis direction). do. The receiving member 107 can be constructed of nylon or POM (polyacetal). A pair of regulating members 108 regulates the position of the second optical element 2 in the Y-axis direction (first axis direction). The pair of regulating members 108 has, for example, protrusions that come into contact with the second optical element 2, and the protrusions can be made of nylon or POM (polyacetal). The pair of regulating members 108 has, for example, a spring portion that supports the protrusion, and can apply force to the second optical element 2 in the direction of sandwiching it. The connecting member 109 supports the second optical element 2 via the receiving member 107 .

第１支持部１０６は、第１光学素子１の上部を支持し、第１光学素子１のＹ軸方向（第１軸方向）の位置を規制する。第１支持部１０６と第１光学素子１との間には、Ｚ軸方向に関して隙間が設けられうる。これにより、第１光学素子１は、Ｘ軸周りの回転（ωＸ軸）に関して自由度が与えられうる。第３支持部１１１は、第２光学素子２の上部を支持し、第２光学素子２のＹ軸方向（第１軸方向）の位置を規制する。第３支持部１１１と第２光学素子２との間には、Ｚ軸方向に関して隙間が設けられうる。これにより、第２光学素子２は、Ｚ軸に関して自由度が与えられうる。 The first supporting portion 106 supports the upper portion of the first optical element 1 and regulates the position of the first optical element 1 in the Y-axis direction (first axis direction). A gap can be provided between the first supporting portion 106 and the first optical element 1 in the Z-axis direction. Thereby, the first optical element 1 can be given a degree of freedom with respect to rotation around the X-axis (ωX-axis). The third support portion 111 supports the upper portion of the second optical element 2 and regulates the position of the second optical element 2 in the Y-axis direction (first axis direction). A gap can be provided between the third support portion 111 and the second optical element 2 in the Z-axis direction. Thereby, the second optical element 2 can be given a degree of freedom with respect to the Z axis.

前述のように、複数の第１リニア調整機構１１３、１１３、１１２は、Ｙ軸方向（第１方向）に関してのみ調整軸を有しうる。複数の第１リニア調整機構１１３、１１３、１１２は、例えば、リニアガイド、ネジ機構（送りネジ機構）または弾性ヒンジで構成されうるが、他の機構によって構成されてもよい。複数の第１支持部１０５、１０５、１０６の各々の位置は、それに対して割り当てられた単一の第１リニア調整機構によってのみ調整されうる。このような構成は、各第１支持部の位置が２以上の軸を有する調整機構（例えば、２以上のリニア調整機構の組み合わせ）によって調整可能な構成に比べて、高い剛性で第１光学素子１を支持するために有利である。 As described above, the plurality of first linear adjustment mechanisms 113, 113, 112 can have adjustment axes only in the Y-axis direction (first direction). The plurality of first linear adjustment mechanisms 113, 113, 112 can be configured by, for example, linear guides, screw mechanisms (feed screw mechanisms), or elastic hinges, but may be configured by other mechanisms. The position of each of the plurality of first supports 105, 105, 106 can only be adjusted by a single first linear adjustment mechanism assigned thereto. Such a configuration provides a high rigidity to the first optical element compared to a configuration in which the position of each first support portion can be adjusted by an adjustment mechanism having two or more axes (for example, a combination of two or more linear adjustment mechanisms). It is advantageous to support 1.

第１リニア調整機構１１３、１１３、１１２による第１支持部１０５、１０５、１０６の位置の調整によって、第１光学素子１がＹ軸（第１軸）を含む３つの軸に関して調整されうる。該３つの軸は、Ｙ軸（第１軸）、Ｘ軸（第２軸）の周りの回転（ωＸ軸）、Ｚ軸（第３軸）の周りの回転（ωＺ軸）でありうる。ここで、第１調整機構１１３、１１３、１１２によって第１支持部１０５、１０５、１０６をそれぞれＹ軸に沿って移動させる方向および移動量を同一にすることによって第１光学素子１をＹ軸方向に沿って移動させることができる。また、第１調整機構１１３、１１３によって第１支持部１０５、１０５をＹ軸に沿って移動させる方向または移動量と、第１調整機構１１２によって第１支持部１０６をＹ軸に沿って移動させる方向または移動量とを異ならせることができる。これによって、第１光学素子１をＸ軸の周り、即ちωＸ軸について回転させることができる。また、１つの第１調整機構１１３によって第１支持部１０５、１０５をＹ軸に沿って移動させる方向または移動量と他の第１調整機構１１３によって第１支持部１０５、１０５をＹ軸に沿って移動させる方向または移動量とを異ならせることができる。これによって、第１光学素子１をＺ軸の周り、即ちωＺ軸について回転させることができる。 By adjusting the positions of the first supports 105, 105, 106 by the first linear adjustment mechanisms 113, 113, 112, the first optical element 1 can be adjusted with respect to three axes including the Y-axis (first axis). The three axes can be the Y-axis (first axis), rotation about the X-axis (second axis) (ωX-axis), and rotation about the Z-axis (third axis) (ωZ-axis). Here, the first optical element 1 is moved in the Y-axis direction by making the direction and amount of movement of the first support portions 105, 105, and 106 along the Y-axis the same by the first adjustment mechanisms 113, 113, and 112, respectively. can be moved along Also, the direction or amount of movement of the first support portions 105 and 105 along the Y-axis by the first adjustment mechanisms 113 and 113 and the movement of the first support portion 106 along the Y-axis by the first adjustment mechanism 112 are shown. The direction or amount of movement can be different. Thereby, the first optical element 1 can be rotated around the X axis, that is, about the ωX axis. In addition, one first adjustment mechanism 113 moves the first support portions 105 along the Y axis in the direction or amount of movement, and another first adjustment mechanism 113 moves the first support portions 105 along the Y axis. The direction or amount of movement can be made different. Thereby, the first optical element 1 can be rotated around the Z axis, that is, about the ωZ axis.

前述のように、複数の第２リニア調整機構１１４、１１４は、Ｘ軸方向（第２方向）に関してのみ調整軸を有しうる。複数の第２リニア調整機構１１４、１１４は、例えば、リニアガイド、ネジ機構（送りネジ機構）または弾性ヒンジで構成されうるが、他の機構によって構成されてもよい。複数の第２支持部１１０、１１０の各々の位置は、それに対して割り当てられた単一の第２リニア調整機構によってのみ調整されうる。このような構成は、各第２支持部の位置が２以上の軸を有する調整機構（例えば、２以上のリニア調整機構の組み合わせ）によって調整可能な構成に比べて、高い剛性で第２光学素子２を支持するために有利である。 As described above, the plurality of second linear adjustment mechanisms 114, 114 can have adjustment axes only with respect to the X-axis direction (second direction). The plurality of second linear adjustment mechanisms 114, 114 can be composed of, for example, linear guides, screw mechanisms (feed screw mechanisms) or elastic hinges, but may be composed of other mechanisms. The position of each of the plurality of second supports 110, 110 can only be adjusted by a single second linear adjustment mechanism assigned thereto. Such a configuration provides a high rigidity to the second optical element compared to a configuration in which the position of each second support can be adjusted by an adjustment mechanism having two or more axes (for example, a combination of two or more linear adjustment mechanisms). 2 is advantageous.

第２リニア調整機構１１４、１１４による第２支持部１１０、１１０の位置の調整によって、第２光学素子２がＸ軸（第２軸）を含む３つの軸に関して調整されうる。第２リニア調整機構１１４、１１４によって第２光学素子２を調整可能な３つの軸は、第１リニア調整機構１１３、１１３、１１２によって第１光学素子１を調整可能な３つの軸の全てと異なりうる。第２リニア調整機構１１４、１１４による第２支持部１１０、１１０の位置の調整によって第２光学素子２を調整可能な３つの軸は、Ｘ軸（第２軸）、Ｚ軸（第３軸）、Ｙ軸（第１軸）周りの回転（ωＹ軸）でありうる。 By adjusting the positions of the second supports 110, 110 by the second linear adjustment mechanisms 114, 114, the second optical element 2 can be adjusted with respect to three axes including the X axis (second axis). The three axes in which the second optical element 2 can be adjusted by the second linear adjustment mechanisms 114, 114 are different from all the three axes in which the first optical element 1 can be adjusted by the first linear adjustment mechanisms 113, 113, 112. sell. The three axes along which the second optical element 2 can be adjusted by adjusting the positions of the second supports 110 and 110 by the second linear adjustment mechanisms 114 and 114 are the X axis (second axis) and the Z axis (third axis). , a rotation about the Y-axis (first axis) (ωY-axis).

ここで、１つの第２調整機構１１３によって第２支持部１１０をＸ軸に沿って移動させる方向および移動量を他の第２調整機構１１３によって第２支持部１１０をＸ軸に沿って移動させる方向および移動量と同一にすることができる。これによって第２光学素子２をＸ軸方向に沿って移動させることができる。また、１つの第２調整機構１１３によって第２支持部１１０をＸ軸に沿って移動させる移動量を他の第２調整機構１１３によって第２支持部１１０をＸ軸に沿って移動させる移動量を同一として、方向を逆方向とすることができる。これによって第２光学素子２をＺ軸方向に沿って移動させることができる。また、１つの第２調整機構１１３によって第２支持部１１０をＸ軸に沿って移動させる方向および移動量のうち少なくとも移動量を他の第２調整機構１１３によって第２支持部１１０をＸ軸に沿って移動させる方向および移動量と異ならせることができる。これによって第２光学素子２をＹ軸の周り、即ちωＹ軸について回転させることができる。 Here, the direction and amount of movement of the second support portion 110 along the X-axis by one second adjustment mechanism 113 is changed by moving the second support portion 110 along the X-axis by another second adjustment mechanism 113. The direction and amount of movement can be the same. Thereby, the second optical element 2 can be moved along the X-axis direction. Further, the amount of movement of the second support portion 110 along the X-axis by one second adjustment mechanism 113 is defined as the amount of movement of the second support portion 110 along the X-axis by another second adjustment mechanism 113. As the same, the direction can be reversed. Thereby, the second optical element 2 can be moved along the Z-axis direction. At least the amount of movement of the direction and amount of movement of the second support portion 110 along the X axis by one second adjustment mechanism 113 is adjusted by another second adjustment mechanism 113 to move the second support portion 110 along the X axis. The direction and amount of movement along can be different. This allows the second optical element 2 to be rotated around the Y axis, that is, about the ωY axis.

以上のような機構によって、第１光学素子１および第２光学素子２を高い剛性で支持しつつ第１光学素子１と第２光学素子２との相対的な配置を６軸（６自由度）に関して調整することができる。 With the mechanism as described above, the relative arrangement of the first optical element 1 and the second optical element 2 can be controlled in six axes (six degrees of freedom) while supporting the first optical element 1 and the second optical element 2 with high rigidity. can be adjusted for

複数の測距センサ１２０は、第１光学素子１の複数の箇所のＹ軸方向の位置（基準位置から該複数の箇所までのＹ軸方向における距離）を測定するために使用されうる。プロセッサＰＲＣは、複数の測距センサ１２０の出力に基づいて、第１光学素子１のωＸ軸、ωＺ軸に関する回転量を得ることができる。複数の測距センサ１１９は、第２光学素子２の複数の箇所のＺ軸方向の位置（基準位置から該複数の箇所までのＺ軸方向における距離）を測定するために使用されうる。プロセッサＰＲＣは、複数の測距センサ１１９の出力に基づいて、第２光学素子２のＺ軸方向の位置およびωＹ軸に関する回転量を得ることができる。複数の測距センサ１１８は、第２光学素子２の複数の箇所のＸ軸方向の位置（基準位置から該複数の箇所までのＸ軸方向における距離）を測定するために使用されうる。プロセッサＰＲＣは、複数の測距センサ１１８の出力に基づいて、第２光学素子２のＸ軸方向の位置を取得することができる。 A plurality of ranging sensors 120 can be used to measure the positions of a plurality of locations on the first optical element 1 in the Y-axis direction (distances in the Y-axis direction from a reference position to the plurality of locations). The processor PRC can obtain the amount of rotation of the first optical element 1 about the ωX-axis and the ωZ-axis based on the outputs of the plurality of distance measuring sensors 120 . A plurality of ranging sensors 119 can be used to measure the Z-axis direction positions of a plurality of locations on the second optical element 2 (distances in the Z-axis direction from a reference position to the plurality of locations). The processor PRC can obtain the position of the second optical element 2 in the Z-axis direction and the amount of rotation about the ωY-axis based on the outputs of the plurality of distance measuring sensors 119 . A plurality of ranging sensors 118 can be used to measure the positions of a plurality of locations of the second optical element 2 in the X-axis direction (distances in the X-axis direction from the reference position to the plurality of locations). The processor PRC can obtain the position of the second optical element 2 in the X-axis direction based on the outputs of the plurality of ranging sensors 118 .

プロセッサＰＲＣは、光学系１００の結像性能の評価結果に基づいて、第１光学素子１の位置および姿勢を調整するために複数の第１リニア調整機構１１３、１１３、１１２の駆動量を決定しうる。プロセッサＰＲＣは、光学系１００の結像性能の評価結果に基づいて、第２光学素子２の位置および姿勢を調整するために複数の第２リニア調整機構１１４、１１４の駆動量を決定しうる。プロセッサＰＲＣは、その駆動量と測定システムを使って得られる第１光学素子１および第２光学素子２の位置および姿勢とに基づいて複数の第１リニア調整機構１１３、１１３、１１２および複数の第２リニア調整機構１１４、１１４をフィードバック制御しうる。これにより、第１光学素子１と第２光学素子２との相対的な配置（位置および姿勢）を調整することができる。 The processor PRC determines driving amounts of the plurality of first linear adjustment mechanisms 113, 113, and 112 to adjust the position and orientation of the first optical element 1 based on the evaluation result of the imaging performance of the optical system 100. sell. The processor PRC can determine driving amounts of the plurality of second linear adjustment mechanisms 114, 114 to adjust the position and orientation of the second optical element 2 based on the imaging performance evaluation result of the optical system 100. FIG. The processor PRC adjusts the plurality of first linear adjustment mechanisms 113, 113, 112 and the plurality of second linear adjustment mechanisms 113, 113, 112 based on the drive amount and the positions and orientations of the first optical element 1 and the second optical element 2 obtained using the measurement system. The two linear adjustment mechanisms 114, 114 may be feedback controlled. Thereby, the relative arrangement (position and attitude) of the first optical element 1 and the second optical element 2 can be adjusted.

図６（ａ）、（ｂ）には、第１リニア調整機構１１３および第２リニア調整機構１１４、１１４の構成例が示されている。図６（ａ）には、リニアガイドが例示されている。リニアガイドは、第１支持部または第２支持部に結合される移動子３０１と、枠体１０１側に結合される固定子３０２とを含みうる。移動子３０１は、固定子３０２に対して１軸方向に移動可能である。図６（ｂ）には、ネジ機構が例示されている。ネジ機構は、第１支持部または第２支持部に結合される移動子３０３と、枠体１０１側に結合される固定子３０２と、固定子３０２に対して１軸方向に移動子３０３を移動させるネジ３０５とを含みうる。 6A and 6B show configuration examples of the first linear adjustment mechanism 113 and the second linear adjustment mechanisms 114, 114. FIG. FIG. 6(a) illustrates a linear guide. The linear guide may include a mover 301 coupled to the first support or the second support, and a stator 302 coupled to the frame 101 side. The mover 301 is uniaxially movable with respect to the stator 302 . FIG. 6(b) illustrates a screw mechanism. The screw mechanism includes a mover 303 coupled to the first support or the second support, a stator 302 coupled to the frame 101 side, and moving the mover 303 uniaxially with respect to the stator 302. and a screw 305 that allows the

以下、第２実施形態の光学系１００の構成を説明する。第２実施形態として言及しない事項は、第１実施形態に従いうる。図２（ａ）、（ｂ）は、第２実施形態の光学系１００の構成を示す側面図、断面図である。図２（ｂ）は、図２（ａ）における鎖線によって光学系１００を切断した断面を示している。 The configuration of the optical system 100 of the second embodiment will be described below. Matters not mentioned in the second embodiment may follow the first embodiment. 2A and 2B are a side view and a cross-sectional view showing the configuration of the optical system 100 of the second embodiment. FIG. 2(b) shows a cross section of the optical system 100 taken along the dashed line in FIG. 2(a).

第２実施形態では、第１光学素子１の位置および姿勢および第２光学素子２の位置および姿勢を測定するための測定システムは、複数の測距センサ１２０、２０１、２０２を含む。第２実施形態では、複数の測距センサ１２０、２０１、２０２の全てが枠体１０１に直接に取り付けられている。複数の測距センサ１２０、２０１、２０２の全ては、枠体１０１に設けられた１つの位置基準に対して位置合わせされており、複数の測距センサ１２０、２０１、２０２の全ての相互の相対位置が既知である。したがって、プロセッサＰＲＣは、枠体１０１の該位置基準とし、第１光学素子１および第２光学素子２の位置および姿勢を示す情報を取得することができる。 In the second embodiment, the measurement system for measuring the position and orientation of the first optical element 1 and the position and orientation of the second optical element 2 includes multiple ranging sensors 120 , 201 , 202 . In the second embodiment, all of the plurality of ranging sensors 120, 201, 202 are attached directly to the frame 101. FIG. All of the plurality of ranging sensors 120, 201, 202 are aligned with respect to one position reference provided on the frame 101, and all of the plurality of ranging sensors 120, 201, 202 are relative to each other. Position is known. Therefore, the processor PRC can acquire information indicating the positions and orientations of the first optical element 1 and the second optical element 2 using the position reference of the frame 101 .

複数の測距センサ１２０は、第１光学素子１の複数の箇所のＹ軸方向の位置（基準位置から該複数の箇所までのＹ軸方向における距離）を測定するために使用されうる。プロセッサＰＲＣは、複数の測距センサ１２０の出力に基づいて、第１光学素子１のωＸ軸、ωＺ軸に関する回転量を得ることができる。 A plurality of ranging sensors 120 can be used to measure the positions of a plurality of locations on the first optical element 1 in the Y-axis direction (distances in the Y-axis direction from a reference position to the plurality of locations). The processor PRC can obtain the amount of rotation of the first optical element 1 about the ωX-axis and the ωZ-axis based on the outputs of the plurality of distance measuring sensors 120 .

複数の測距センサ２０２は、第１光学素子１および第２光学素子２の複数の箇所のＺ軸方向の位置（基準位置から該複数の箇所までのＺ軸方向における距離）を測定するために使用されうる。プロセッサＰＲＣは、複数の測距センサ２０２の出力に基づいて、第１光学素子１および第２光学素子２のＺ軸方向の位置およびωＹ軸に関する回転量を得ることができる。複数の測距センサ２０１は、第１光学素子１および第２光学素子２の複数の箇所のＸ軸方向の位置（基準位置から該複数の箇所までのＸ軸方向における距離）を測定するために使用されうる。プロセッサＰＲＣは、複数の測距センサ２０１の出力に基づいて、第１光学素子１および第２光学素子２のＸ軸方向の位置を取得することができる。 The multiple ranging sensors 202 are used to measure the Z-axis direction positions of multiple locations on the first optical element 1 and the second optical element 2 (distances in the Z-axis direction from the reference position to the multiple locations). can be used. The processor PRC can obtain the positions of the first optical element 1 and the second optical element 2 in the Z-axis direction and the amount of rotation about the ωY-axis based on the outputs of the plurality of distance measuring sensors 202 . A plurality of ranging sensors 201 are used to measure the X-axis direction positions of a plurality of locations on the first optical element 1 and the second optical element 2 (distances in the X-axis direction from the reference position to the plurality of locations). can be used. The processor PRC can acquire the positions of the first optical element 1 and the second optical element 2 in the X-axis direction based on the outputs of the plurality of distance measuring sensors 201 .

以下、図７を参照しながら、第１実施形態または第２実施形態によって代表される光学系１００を適用した露光装置ＥＸＰについて説明する。露光装置ＥＸＰは、露光装置ＥＸＰは、原版５０（レチクル）を保持する原版ステージ５１と、不図示の照明光学系によって照明される原版５０のパターンを基板５８に投影する投影光学系ＰＯと、基板５８を保持する基板ステージ５９とを備えうる。 The exposure apparatus EXP to which the optical system 100 represented by the first embodiment or the second embodiment is applied will be described below with reference to FIG. The exposure apparatus EXP includes an original stage 51 that holds an original 50 (reticle), a projection optical system PO that projects a pattern of the original 50 illuminated by an illumination optical system (not shown) onto a substrate 58, a substrate and a substrate stage 59 that holds 58 .

投影光学系ＰＯは、光学系１００の適用例である。投影光学系ＰＯは、原版５０と基板５８との間の光路中に原版５０の側から順に配置された第１凹面ミラー５４、凸面ミラー５６、第２凹面ミラー５７を含みうる。また、投影光学系ＰＯは、凸面ミラー５６の収差を補正するためにメニスカスレンズ５５を含みうる。第１凹面ミラー５４の曲率中心、凸面ミラー５６の曲率中心および第２凹面ミラー５７の曲率中心を結ぶ線は典型的に水平である。投影光学系ＰＯは、等倍系として構成されてもよいし、変倍系として構成されてもよい。一例において、投影光学系ＰＯは、１よりも大きな投影倍率を有しうる。第１凹面ミラー５４は、第１光学素子１の適用例であり、第２凹面ミラー５７は、第２光学素子２の適用例である。投影光学系ＰＯは、光学性能の向上のために、屈折光学系５２を含んでもよい。投影光学系ＰＯは、光軸を折り曲げるための１つ又は複数のミラー５３を含んでもよい。 The projection optical system PO is an application example of the optical system 100 . The projection optical system PO can include a first concave mirror 54 , a convex mirror 56 and a second concave mirror 57 arranged in order from the original 50 side in the optical path between the original 50 and the substrate 58 . The projection optical system PO may also include a meniscus lens 55 to correct aberrations of the convex mirror 56 . A line connecting the center of curvature of the first concave mirror 54, the center of curvature of the convex mirror 56 and the center of curvature of the second concave mirror 57 is typically horizontal. The projection optical system PO may be configured as a unity magnification system, or may be configured as a variable magnification system. In one example, the projection optical system PO can have a projection magnification greater than one. The first concave mirror 54 is an application example of the first optical element 1 , and the second concave mirror 57 is an application example of the second optical element 2 . The projection optical system PO may include a refractive optical system 52 to improve optical performance. The projection optical system PO may include one or more mirrors 53 for folding the optical axis.

投影光学系ＰＯが変倍系として構成される場合、第１凹面ミラー５４の反射面と凸面ミラー５６の反射面との第１距離と、第２凹面ミラー５７の反射面と凸面ミラー５６との第２距離とが互いに異なりうる。一例において、第１距離は第２距離よりも小さい。このような投影光学系ＰＯでは、第１凹面ミラー５４と第２凹面ミラー５７が独立して動くことにより、倍率・歪曲収差といった結像性能が変化してしまう。結像性能の変化を抑えるためには、第１凹面ミラー５４と第２凹面ミラー５７の剛性を確保したまま相対位置合わせを行う必要がある。 When the projection optical system PO is configured as a variable power system, the first distance between the reflecting surface of the first concave mirror 54 and the reflecting surface of the convex mirror 56 and the distance between the reflecting surface of the second concave mirror 57 and the convex mirror 56 are: the second distance can be different from each other. In one example, the first distance is less than the second distance. In such a projection optical system PO, the independent movement of the first concave mirror 54 and the second concave mirror 57 changes imaging performance such as magnification and distortion. In order to suppress changes in imaging performance, it is necessary to perform relative positioning while ensuring the rigidity of the first concave mirror 54 and the second concave mirror 57 .

第１又は実施形態によって代表される光学系１００が適用された投影光学系ＰＯによれば、第１凹面ミラー５４および第２凹面ミラー５７の剛性の低下を抑制しつつ第１凹面ミラー５４および第２凹面ミラー５７を２自由度以上に関して相対位置合わせが行える。 According to the projection optical system PO to which the optical system 100 represented by the first or the embodiment is applied, the rigidity of the first concave mirror 54 and the second concave mirror 57 is suppressed while reducing the stiffness of the first concave mirror 54 and the second concave mirror 57 . Relative positioning of the two concave mirrors 57 can be performed with respect to two or more degrees of freedom.

以下、実施形態の物品製造方法を説明する。物品製造方法は、例えば、液晶デバイス等のマイクロディバイスや微細構造を有する素子等の物品を製造するのに好適である。物品製造方法は、薄膜形成前洗浄工程、薄膜形成工程、レジスト塗布工程、露光工程、現像工程、処理工程（例えば、エッチング工程）、レジスト剥離工程の繰り返しと、その後に実施される検査、修正工程とを含みうる。薄膜形成前工程では、ガラス基板を洗浄する。レジスト塗布工程では、薄膜の上にレジストを塗布する。露光工程では、上記の露光装置ＥＸＰを用いて基板を露光してレジストに潜像パターンを形成する。現像工程では、基板を現像して潜像パターンを物理的なパターンに変える。処理工程は、パターンが形成された基板を処理して物品を得る工程である。処理工程は、例えば、エッチング工程およびそれに続く工程を含みうる。エッチング工程では、前述の物理的なパターンの開口に露出している薄膜をエッチングする。レジスト剥離工程では、前述の物理パターンとしてのレジストを剥離する。以上の薄膜形成前洗浄工程からレジスト剥離工程の繰り返しによって液晶表示デバイスが形成される。検査、修正工程では、液晶表示デバイスを検査し、不具合を有する液晶表示デバイスを修正する。本実施形態の物品の製造方法は、従来の方法と比べ、物品の性能・品質・生産性・生産コストの少なくとも１つにおいて有利である。 A method for manufacturing an article according to an embodiment will be described below. The article manufacturing method is suitable for manufacturing articles such as microdevices such as liquid crystal devices and elements having fine structures. The method for manufacturing an article includes repeating a washing process before thin film formation, a thin film forming process, a resist coating process, an exposure process, a developing process, a treatment process (e.g., an etching process), and a resist stripping process, and then an inspection and repair process. and In the thin film formation pre-process, the glass substrate is washed. In the resist application step, a resist is applied on the thin film. In the exposure step, the substrate is exposed using the exposure apparatus EXP to form a latent image pattern on the resist. In the developing step, the substrate is developed to transform the latent image pattern into a physical pattern. A processing step is a step of processing a patterned substrate to obtain an article. Processing steps can include, for example, an etching step and subsequent steps. In the etching step, the thin film exposed in the openings of the physical pattern described above is etched. In the resist stripping step, the resist as the physical pattern described above is stripped. A liquid crystal display device is formed by repeating the washing process before thin film formation and the resist stripping process. In the inspection and repair process, the liquid crystal display devices are inspected, and defective liquid crystal display devices are repaired. The article manufacturing method of the present embodiment is advantageous in at least one of article performance, quality, productivity, and production cost compared to conventional methods.

発明は上記実施形態に制限されるものではなく、発明の精神及び範囲から離脱することなく、様々な変更及び変形が可能である。従って、発明の範囲を公にするために請求項を添付する。 The invention is not limited to the embodiments described above, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the claims are appended to make public the scope of the invention.

１：第１光学素子、２：第２光学素子、１０５：第１支持部、１０６、第１支持部、１１０、第２支持部、１１２：第１リニア調整機構、１１３：第１リニア調整機構、１１４：第２リニア調整機構 1: first optical element, 2: second optical element, 105: first support, 106, first support, 110, second support, 112: first linear adjustment mechanism, 113: first linear adjustment mechanism , 114: second linear adjustment mechanism

Claims (20)

第１光学素子および第２光学素子を含む光学系であって、
前記第１光学素子を支持する複数の第１支持部と、
前記第２光学素子を支持する複数の第２支持部と、
前記複数の第１支持部の位置をそれぞれ調整する複数の第１リニア調整機構と、
前記複数の第２支持部の位置をそれぞれ調整する複数の第２リニア調整機構と、を備え、
前記複数の第１リニア調整機構による前記複数の第１支持部の位置の調整によって、前記第１光学素子が少なくとも第１軸に関して調整され、
前記複数の第２リニア調整機構による前記複数の第２支持部の位置の調整によって、前記第２光学素子が、少なくとも、前記第１軸とは異なる第２軸に関して調整される、
ことを特徴とする光学系。 An optical system including a first optical element and a second optical element,
a plurality of first supports that support the first optical element;
a plurality of second supports that support the second optical element;
a plurality of first linear adjustment mechanisms for adjusting the positions of the plurality of first support portions;
a plurality of second linear adjustment mechanisms for adjusting the positions of the plurality of second support portions,
adjusting the positions of the plurality of first supports by the plurality of first linear adjustment mechanisms to adjust the first optical element with respect to at least a first axis;
Adjustment of the positions of the plurality of second supports by the plurality of second linear adjustment mechanisms adjusts the second optical element with respect to at least a second axis different from the first axis,
An optical system characterized by: 前記複数の第１リニア調整機構は、前記複数の第１リニア調整機構のうち１つの第１リニア調整機構が前記複数の第１支持部のうちの１つの第１支持部に割り当てられるように配置され、
前記複数の第２リニア調整機構は、前記複数の第２リニア調整機構のうち１つの第２リニア調整機構が前記複数の第２支持部のうちの１つの第２支持部に割り当てられるように配置されている、
ことを特徴とする請求項１に記載の光学系。 The plurality of first linear adjustment mechanisms are arranged such that one of the plurality of first linear adjustment mechanisms is assigned to one of the plurality of first supports. is,
The plurality of second linear adjustment mechanisms are arranged such that one of the plurality of second linear adjustment mechanisms is assigned to one of the plurality of second supports. has been
2. The optical system according to claim 1, characterized in that: 前記複数の第１支持部の各々の位置は、それに対して割り当てられた第１リニア調整機構以外によっては調整されず、
前記複数の第２支持部の各々の位置は、それに対して割り当てられた第２リニア調整機構以外によっては調整されない、
ことを特徴とする請求項２に記載の光学系。 the position of each of the plurality of first supports is adjusted only by a first linear adjustment mechanism assigned thereto;
the position of each of the plurality of second supports is adjusted only by a second linear adjustment mechanism assigned thereto;
3. The optical system according to claim 2, characterized in that: 前記複数の第１リニア調整機構が前記複数の第１支持部の位置を調整する方向は、第１方向に平行であり、
前記複数の第２リニア調整機構が前記複数の第２支持部の位置を調整する方向は、前記第１方向と異なる第２方向に平行である、
ことを特徴とする請求項１乃至３のいずれか１項に記載の光学系。 a direction in which the plurality of first linear adjustment mechanisms adjust the positions of the plurality of first support portions is parallel to the first direction;
A direction in which the plurality of second linear adjustment mechanisms adjust the positions of the plurality of second support portions is parallel to a second direction different from the first direction,
4. The optical system according to any one of claims 1 to 3, characterized in that: 前記複数の第１リニア調整機構による前記複数の第１支持部の位置の調整によって、前記第１光学素子が前記第１軸を含む３つの軸に関して調整され、
前記複数の第２リニア調整機構による前記複数の第２支持部の位置の調整によって、前記第２光学素子が前記第２軸を含む３つの軸に関して調整される、
ことを特徴とする請求項４に記載の光学系。 By adjusting the positions of the plurality of first supports by the plurality of first linear adjustment mechanisms, the first optical element is adjusted with respect to three axes including the first axis,
By adjusting the positions of the plurality of second supports by the plurality of second linear adjustment mechanisms, the second optical element is adjusted with respect to three axes including the second axis,
5. The optical system according to claim 4, characterized in that: 前記複数の第２リニア調整機構による前記複数の第２支持部の位置の調整によって前記第２光学素子を調整可能な前記３つの軸は、前記複数の第１リニア調整機構による前記複数の第１支持部の位置の調整によって前記第１光学素子を調整可能な前記３つの軸の全てと異なる、
ことを特徴とする請求項５に記載の光学系。 The three axes in which the second optical element can be adjusted by adjusting the positions of the plurality of second supports by the plurality of second linear adjustment mechanisms are adjusted to the plurality of first axes by the plurality of first linear adjustment mechanisms. different from all three axes in which the first optical element can be adjusted by adjusting the position of the haptics;
6. The optical system according to claim 5, characterized in that: 前記第１軸と前記第２軸とは、互いに直交し、
前記複数の第１リニア調整機構による前記複数の第１支持部の位置の調整によって前記第１光学素子を調整可能な前記３つの軸は、前記第１軸、前記第２軸の周りの回転、前記第１軸および前記第２軸に直交する第３軸の周りの回転であり、
前記複数の第２リニア調整機構による前記複数の第２支持部の位置の調整によって前記第２光学素子を調整可能な前記３つの軸は、前記第２軸、前記第３軸、前記第１軸の周りの回転である、
ことを特徴とする請求項６に記載の光学系。 the first axis and the second axis are orthogonal to each other,
The three axes capable of adjusting the first optical element by adjusting the positions of the plurality of first supports by the plurality of first linear adjustment mechanisms are rotation about the first axis and the second axis; rotation about a third axis orthogonal to the first axis and the second axis;
The three axes capable of adjusting the second optical element by adjusting the positions of the plurality of second support portions by the plurality of second linear adjustment mechanisms are the second axis, the third axis, and the first axis. is a rotation around
7. The optical system according to claim 6, characterized in that: 前記第１光学素子の外形は、第１円弧と第１弦とによって規定される図形から前記第１弦の一端側の第１部分と前記第１弦の他端側の第２部分とを切り欠いた形状を有し、
前記第１光学素子は、前記第１部分に配置され前記複数の第１支持部のうちの１つによって支持される第１被支持部と、前記第２部分に配置され前記複数の第１支持部のうちの他の１つによって支持される第２被支持部とを含み、
前記第１光学素子は、前記第１弦を下側、前記第１円弧を上側とするように前記複数の第１支持部によって支持される、
ことを特徴とする請求項１乃至７のいずれか１項に記載の光学系。 The outer shape of the first optical element is obtained by cutting a first portion on one end side of the first chord and a second portion on the other end side of the first chord from a figure defined by the first arc and the first chord. having a missing shape,
The first optical element includes a first supported portion arranged in the first portion and supported by one of the plurality of first support portions, and a plurality of first supports arranged in the second portion. a second supported portion supported by the other one of the portions;
The first optical element is supported by the plurality of first supports so that the first chord is on the lower side and the first arc is on the upper side,
8. The optical system according to any one of claims 1 to 7, characterized in that: 前記第１被支持部は、前記第１光学素子が前記複数の第１支持部によって支持された状態において水平な被支持面を有し、
前記第２被支持部は、前記第１光学素子が前記複数の第１支持部によって支持された状態において水平な被支持面を有する、
ことを特徴とする請求項８に記載の光学系。 the first supported portion has a supported surface that is horizontal when the first optical element is supported by the plurality of first support portions;
The second supported portion has a horizontal supported surface in a state in which the first optical element is supported by the plurality of first support portions,
9. The optical system according to claim 8, characterized in that: 前記第２光学素子の外形は、第２円弧と第２弦とによって規定される形状を有し、
前記第２光学素子は、前記第２円弧を下側、前記第２弦を上側とするように前記複数の第２支持部によって支持される、
ことを特徴とする請求項８又は９に記載の光学系。 the outer shape of the second optical element has a shape defined by a second arc and a second chord;
The second optical element is supported by the plurality of second supports so that the second arc is on the lower side and the second chord is on the upper side,
10. The optical system according to claim 8 or 9, characterized in that: 第１光学素子および第２光学素子を含む光学系であって、
前記第１光学素子を支持する複数の第１支持部と、
前記第２光学素子を支持する複数の第２支持部と、を備え、
前記第１光学素子の外形は、第１円弧と第１弦とによって規定される図形から前記第１弦の一端側の第１部分と前記第１弦の他端側の第２部分とを切り欠いた形状を有し、
前記第１光学素子は、前記第１部分に配置され前記複数の第１支持部のうちの１つによって支持される第１被支持部と、前記第１部分に配置され前記複数の第１支持部のうちの他の１つによって支持される第２被支持部とを含み、
前記第１光学素子は、前記第１弦を下側、前記第１円弧を上側とするように前記複数の第１支持部によって支持される、
ことを特徴とする光学系。 An optical system including a first optical element and a second optical element,
a plurality of first supports that support the first optical element;
a plurality of second supports that support the second optical element,
The outer shape of the first optical element is obtained by cutting a first portion on one end side of the first chord and a second portion on the other end side of the first chord from a figure defined by the first arc and the first chord. having a missing shape,
The first optical element includes a first supported portion arranged in the first portion and supported by one of the plurality of first support portions, and the plurality of first supports arranged in the first portion. a second supported portion supported by the other one of the portions;
The first optical element is supported by the plurality of first supports so that the first chord is on the lower side and the first arc is on the upper side,
An optical system characterized by: 前記第１被支持部は、前記第１光学素子が前記複数の第１支持部によって支持された状態において水平な被支持面を有し、
前記第２被支持部は、前記第１光学素子が前記複数の第１支持部によって支持された状態において水平な被支持面を有する、
ことを特徴とする請求項１１に記載の光学系。 the first supported portion has a supported surface that is horizontal when the first optical element is supported by the plurality of first support portions;
The second supported portion has a horizontal supported surface in a state in which the first optical element is supported by the plurality of first support portions,
12. The optical system according to claim 11, characterized by: 前記第２光学素子の外形は、第２円弧と第２弦とによって規定される形状を有し、
前記第２光学素子は、前記第２円弧を下側、前記第２弦を上側とするように前記複数の第２支持部によって支持される、
ことを特徴とする請求項１１又は１２に記載の光学系。 the outer shape of the second optical element has a shape defined by a second arc and a second chord;
The second optical element is supported by the plurality of second supports so that the second arc is on the lower side and the second chord is on the upper side,
13. The optical system according to claim 11 or 12, characterized in that: 前記第１光学素子および第２光学素子は、凹面ミラーである、
ことを特徴とする請求項１乃至１３のいずれか１項に記載の光学系。 wherein the first optical element and the second optical element are concave mirrors;
14. The optical system according to any one of claims 1 to 13, characterized in that: 前記第１光学素子および前記第２光学素子は、収差を少なくとも部分的に相殺可能である、
ことを特徴とする請求項１乃至１４のいずれか１項に記載の光学系。 the first optical element and the second optical element are capable of at least partially canceling aberrations;
15. The optical system according to any one of claims 1 to 14, characterized in that: 前記収差は、倍率収差および歪曲収差を含む、
ことを特徴とする請求項１５に記載の光学系。 The aberration includes magnification aberration and distortion aberration,
16. The optical system according to claim 15, characterized in that: 前記第１光学素子の位置および姿勢および前記第２光学素子の位置および姿勢を測定するための測定システムを更に備える、
ことを特徴とする請求項１乃至１６のいずれか１項に記載の光学系。 further comprising a measurement system for measuring the position and orientation of the first optical element and the position and orientation of the second optical element;
17. The optical system according to any one of claims 1 to 16, characterized in that: 前記複数の第１リニア調整機構は、リニアガイド、ネジ機構および弾性ヒンジの少なくとも１つを含み、
前記複数の第２リニア調整機構は、リニアガイド、ネジ機構および弾性ヒンジの少なくとも１つを含む、
ことを特徴とする請求項１乃至１７のいずれか１項に記載の光学系。 the plurality of first linear adjustment mechanisms include at least one of a linear guide, a screw mechanism and an elastic hinge;
the plurality of second linear adjustment mechanisms include at least one of a linear guide, a screw mechanism and an elastic hinge;
18. The optical system according to any one of claims 1 to 17, characterized in that: 原版のパターンを基板に投影する投影光学系として構成された請求項１乃至１８のいずれか１項に記載の光学系と、
前記原版を保持する原版ステージと、
前記基板を保持する基板ステージと、
前記原版を照明する照明光学系と、
を備えることを特徴とする露光装置。 19. The optical system according to any one of claims 1 to 18, which is configured as a projection optical system for projecting a pattern of an original onto a substrate;
an original plate stage for holding the original plate;
a substrate stage that holds the substrate;
an illumination optical system that illuminates the original;
An exposure apparatus comprising: 請求項１９に記載の露光装置を用いて基板を露光する露光工程と、
前記露光工程で露光された前記基板を現像する現像工程と、
前記現像工程を経た前記基板を処理して物品を得る処理工程と、
を含むことを特徴とする物品製造方法。 an exposure step of exposing a substrate using the exposure apparatus according to claim 19;
a developing step of developing the substrate exposed in the exposing step;
a processing step for obtaining an article by processing the substrate that has undergone the developing step;
An article manufacturing method comprising:
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