JP2021530861A - 1.02〜1.06μmクラッド励起方式を用いる高出力イッテルビウム:エルビウム(Yb:Er)ファイバーレーザーシステム - Google Patents
1.02〜1.06μmクラッド励起方式を用いる高出力イッテルビウム:エルビウム(Yb:Er)ファイバーレーザーシステム Download PDFInfo
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- 239000000835 fiber Substances 0.000 title claims abstract description 143
- 230000005284 excitation Effects 0.000 title claims abstract description 86
- 229910052691 Erbium Inorganic materials 0.000 title claims abstract description 8
- 229910052769 Ytterbium Inorganic materials 0.000 title claims abstract description 6
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 title claims abstract description 6
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 title claims abstract 4
- 238000000034 method Methods 0.000 title description 11
- 150000002500 ions Chemical class 0.000 claims abstract description 47
- 230000005855 radiation Effects 0.000 claims abstract 3
- 238000005253 cladding Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 238000010899 nucleation Methods 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 claims 1
- 230000010355 oscillation Effects 0.000 abstract description 23
- 230000003071 parasitic effect Effects 0.000 description 18
- 238000010586 diagram Methods 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 229910019142 PO4 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000003321 amplification Effects 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004476 mid-IR spectroscopy Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000024241 parasitism Effects 0.000 description 1
- OYLRFHLPEAGKJU-UHFFFAOYSA-N phosphane silicic acid Chemical compound P.[Si](O)(O)(O)O OYLRFHLPEAGKJU-UHFFFAOYSA-N 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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Abstract
Description
12 ファイバー
14 ダイオードレーザーベースポンプ
15 高低反射ミラー
20 Yb:Erレーザー/増幅器
22 ファイバー
24 波長反射器
26 Yb励起ファイバーレーザー
30 Yb:Erファイバー増幅器/ブースター
32 フィルター
34 Ybファイバーレーザー/ポンプ
36 波長反射器
38 波長反射器
40 波長反射器
42 Tmファイバーレーザーシステム
Claims (18)
- エルビウム(Er+3)およびイッテルビウム(Yb+3)のイオンを添加されたコアを有するダブルクラッドファイバーと、
前記コアの側面に位置し、それらの間に共振空洞を定める少なくとも2つの離間した高低反射ミラーと、
1.02〜1.06μm波長範囲の励起波長で放射を発生させる励起レーザーであって、前記Yb:Er添加ダブルクラッドファイバーに結合される1.02〜1.06μm波長範囲の光を出力する、励起レーザーと
を備える、ファイバーレーザー。 - 前記励起レーザーが、シングルモード(SM)ファイバーレーザーまたはマルチモード(MM)ファイバーレーザーであって、ファブリペロー共振器として構成される、またはMOPFAとして構成される、請求項1に記載のファイバーレーザー。
- 前記励起レーザーが、バルクまたは半導体レーザーから選択される、請求項1に記載のファイバーレーザー。
- 前記ダブルクラッドファイバーが、端面励起または側面励起される、請求項1に記載のファイバーレーザー。
- ダブルクラッドファイバーの前記コアが、複数の横モードまたは単一の横モードの伝搬をサポートするように構成される、請求項1に記載のファイバーレーザー。
- エルビウム(Er+3)およびイッテルビウム(Yb+3)のイオンを添加されたコアを有するダブルクラッドファイバーと、
1.02〜1.06μm波長範囲の励起波長で放射を発生させる励起レーザーであって、前記Yb:Er添加ダブルクラッドファイバーに結合される1.02〜1.06μm波長範囲の光を出力する、励起レーザーと
を備える、ファイバー増幅器。 - 前記励起レーザーが、ファブリペロー構成を有するSMファイバーまたはMMファイバーレーザーから選択される、請求項6に記載の増幅器。
- 前記励起レーザーが、バルクまたは半導体レーザーである、請求項6に記載の増幅器。
- 前記ファイバーが、端面励起または側面励起される、請求項6に記載の増幅器。
- 前記コアが、複数の横モードまたは単一の横モードの伝搬をサポートするように構成される、請求項6に記載の増幅器。
- Yb:Erファイバー増幅器をシードするYb:Erファイバーレーザーを含み、前記Yb:Erファイバーレーザーおよび増幅器のうちの少なくとも一方または両方が、Er+3およびYb+3のイオンを添加されたコア、ならびに前記コアを囲むクラッディングで構成されたダブルクラッド光ファイバーをベースとする、主発振器出力ファイバー増幅器(MOPFA)構成と、
主発振器および増幅器のうちの少なくとも一方のYb:Er添加アクティブファイバーに結合される1.02〜1.06μm波長範囲の励起光を出力する励起レーザーと
を備える、ファイバーレーザーシステム。 - 前記励起レーザーが、SMまたはMMファイバーレーザーであって、ファブリペロー共振器またはMOPFAアーキテクチャで構成される、請求項11に記載のファイバーレーザーシステム。
- 前記励起レーザーが、バルクレーザーまたは半導体であって、前記バルクレーザーがNd:YAGまたはYb:YAGから選択される、請求項11に記載のファイバーレーザーシステム。
- 前記励起ファイバーレーザーが、Yb:ErファイバーレーザーとYb:Er増幅器の両方にエネルギーを与える、請求項11に記載のファイバーレーザーシステム。
- 前記Yb:Erファイバーレーザーおよび増幅器が、それぞれの励起レーザーを有する、請求項11に記載のファイバーレーザーシステム。
- 前記Yb:Erファイバー増幅器が、単方向に励起される、または双方向に励起される、請求項11に記載のファイバーレーザーシステム。
- 前記アクティブファイバーが、端面励起または側面励起される、請求項11に記載のファイバーレーザーシステム。
- 前記Yb:Er添加アクティブファイバーの温度を、室温より上に維持するように制御可能なサーモスタットをさらに備える、請求項11に記載のファイバーレーザーシステム。
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US201862691935P | 2018-06-29 | 2018-06-29 | |
US62/691,935 | 2018-06-29 | ||
PCT/US2019/039751 WO2020006371A1 (en) | 2018-06-29 | 2019-06-28 | High-power ytterbium:erbium (yb:er) fiber laser system with 1.02 -1.06 um clad pumping scheme |
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- 2019-06-28 JP JP2020571681A patent/JP2021530861A/ja active Pending
- 2019-06-28 CN CN201980043416.2A patent/CN112400260A/zh active Pending
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US20210119401A1 (en) | 2021-04-22 |
WO2020006371A1 (en) | 2020-01-02 |
KR20210020938A (ko) | 2021-02-24 |
EP3794692A1 (en) | 2021-03-24 |
CN112400260A (zh) | 2021-02-23 |
EP3794692A4 (en) | 2022-03-02 |
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