JP2021508087A - 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置 - Google Patents

着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置 Download PDF

Info

Publication number
JP2021508087A
JP2021508087A JP2020534451A JP2020534451A JP2021508087A JP 2021508087 A JP2021508087 A JP 2021508087A JP 2020534451 A JP2020534451 A JP 2020534451A JP 2020534451 A JP2020534451 A JP 2020534451A JP 2021508087 A JP2021508087 A JP 2021508087A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
colored photosensitive
contact angle
colorant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2020534451A
Other languages
English (en)
Japanese (ja)
Inventor
キム，フン−シク
パク，スル−キ
リ，ジェ−ウル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of JP2021508087A publication Critical patent/JP2021508087A/ja
Priority to JP2022076613A priority Critical patent/JP2022103263A/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
JP2020534451A 2018-02-05 2019-01-31 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置 Pending JP2021508087A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022076613A JP2022103263A (ja) 2018-02-05 2022-05-06 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020180014221A KR20190094731A (ko) 2018-02-05 2018-02-05 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치
KR10-2018-0014221 2018-02-05
PCT/KR2019/001385 WO2019151807A1 (ko) 2018-02-05 2019-01-31 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022076613A Division JP2022103263A (ja) 2018-02-05 2022-05-06 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置

Publications (1)

Publication Number Publication Date
JP2021508087A true JP2021508087A (ja) 2021-02-25

Family

ID=67478791

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020534451A Pending JP2021508087A (ja) 2018-02-05 2019-01-31 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置
JP2022076613A Pending JP2022103263A (ja) 2018-02-05 2022-05-06 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022076613A Pending JP2022103263A (ja) 2018-02-05 2022-05-06 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置

Country Status (5)

Country Link
JP (2) JP2021508087A (ko)
KR (2) KR20190094731A (ko)
CN (1) CN111684357B (ko)
TW (1) TWI766141B (ko)
WO (1) WO2019151807A1 (ko)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013050459A (ja) * 2006-11-10 2013-03-14 Qualcomm Inc 拡張ｓｐｓ軌道情報を用いた位置特定のための方法および装置
WO2015190294A1 (ja) * 2014-06-09 2015-12-17 旭硝子株式会社 撥インク剤、ネガ型感光性樹脂組成物、隔壁および光学素子

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI313397B (en) * 2003-03-28 2009-08-11 Sumitomo Chemical Co Colored photosensitive resin composition
JP2011102991A (ja) * 2005-02-21 2011-05-26 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
KR101420470B1 (ko) 2007-05-29 2014-07-16 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 블랙 매트릭스
WO2011162001A1 (ja) * 2010-06-23 2011-12-29 旭硝子株式会社 硬化性組成物および硬化膜の製造方法
US9482946B2 (en) 2011-03-30 2016-11-01 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device
JP5910629B2 (ja) * 2011-04-28 2016-04-27 旭硝子株式会社 ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子
JP2013050549A (ja) * 2011-08-30 2013-03-14 Asahi Glass Co Ltd ネガ型感光性樹脂組成物、隔壁、光学素子
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
WO2016048119A1 (ko) * 2014-09-26 2016-03-31 주식회사 엘지화학 자외선 경화형 잉크 조성물, 이를 이용한 디스플레이 기판의 베젤 패턴의 제조방법 및 이에 의하여 제조된 베젤 패턴
JP6915960B2 (ja) * 2015-01-07 2021-08-11 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色感光性樹脂組成物
KR102279575B1 (ko) * 2015-03-26 2021-07-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치
KR102497605B1 (ko) * 2015-12-23 2023-02-08 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 칼라필터, 화상표시장치, 및 칼라필터의 제조방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013050459A (ja) * 2006-11-10 2013-03-14 Qualcomm Inc 拡張ｓｐｓ軌道情報を用いた位置特定のための方法および装置
WO2015190294A1 (ja) * 2014-06-09 2015-12-17 旭硝子株式会社 撥インク剤、ネガ型感光性樹脂組成物、隔壁および光学素子

Also Published As

Publication number Publication date
KR20190094731A (ko) 2019-08-14
WO2019151807A1 (ko) 2019-08-08
TW201940523A (zh) 2019-10-16
CN111684357A (zh) 2020-09-18
JP2022103263A (ja) 2022-07-07
TWI766141B (zh) 2022-06-01
CN111684357B (zh) 2023-10-13
KR20230023678A (ko) 2023-02-17

Similar Documents

Publication Publication Date Title
JP2015041104A (ja) 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
CN105388705B (zh) 着色感光性树脂组合物
KR20150093331A (ko) 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
KR20160112640A (ko) 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
JP2017120379A (ja) 着色感光性樹脂組成物、カラーフィルター及びこれを具備した画像表示装置
JP6625511B2 (ja) 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
KR102558671B1 (ko) 청색 감광성 수지 조성물, 이를 포함하는 청색 컬러필터 및 디스플레이 소자
KR101860580B1 (ko) 흑색 감광성 수지 조성물, 이를 포함하는 컬러 필터 및 표시 장치
CN109765757B (zh) 着色感光性树脂组合物、图案层、滤色器和显示装置
JP2016051176A (ja) 着色感光性樹脂組成物
JP2004361455A (ja) 着色感光性樹脂組成物
JP2022103263A (ja) 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置
KR102545896B1 (ko) 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR102039670B1 (ko) 청색 감광성 수지 조성물, 이를 포함하는 청색 컬러필터 및 표시장치
KR101689058B1 (ko) 착색 감광성 수지 조성물 및 이를 이용하는 컬러 필터
KR102543959B1 (ko) 적외선 투과 감광성 수지 조성물
KR102596395B1 (ko) 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
TWI765958B (zh) 著色感光性樹脂組成物、包括使用著色感光性樹脂組成物製造之黑色矩陣、柱間隔物或黑色柱間隔物的彩色濾光片、以及包括彩色濾光片的顯示裝置
KR102397093B1 (ko) 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
KR102338255B1 (ko) 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR101988257B1 (ko) 착색 감광성 수지 조성물
KR102039673B1 (ko) 적색 감광성 수지 조성물, 이를 포함하는 적색 컬러필터 및 표시장치
KR101946100B1 (ko) 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
KR20220122364A (ko) 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 이를 포함하는 표시장치
KR20230161014A (ko) 흑색 감광성 수지 조성물, 격벽 구조물 및 화상표시장치

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200619

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210630

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210720

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20211019

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20220104