JP2021079561A - Method for manufacturing sealing material, and manufacturing equipment - Google Patents

Method for manufacturing sealing material, and manufacturing equipment Download PDF

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JP2021079561A
JP2021079561A JP2019206449A JP2019206449A JP2021079561A JP 2021079561 A JP2021079561 A JP 2021079561A JP 2019206449 A JP2019206449 A JP 2019206449A JP 2019206449 A JP2019206449 A JP 2019206449A JP 2021079561 A JP2021079561 A JP 2021079561A
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sealing
sealing material
materials
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manufacturing
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JP7321061B2 (en
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波多野　達夫
Tatsuo Hatano
達夫 波多野
渡辺　直樹
Naoki Watanabe
直樹 渡辺
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Tokyo Electron Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/30—Auxiliary operations or equipment
    • B29C64/307—Handling of material to be used in additive manufacturing
    • B29C64/321—Feeding
    • B29C64/336—Feeding of two or more materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/205—Means for applying layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/227—Driving means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/30—Auxiliary operations or equipment
    • B29C64/386—Data acquisition or data processing for additive manufacturing
    • B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y50/00—Data acquisition or data processing for additive manufacturing
    • B33Y50/02—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2023/00—Use of polyalkenes or derivatives thereof as moulding material
    • B29K2023/18—Polymers of hydrocarbons having four or more carbon atoms, e.g. polymers of butylene, e.g. PB, i.e. polybutylene
    • B29K2023/22—Copolymers of isobutene, e.g. butyl rubber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2027/00—Use of polyvinylhalogenides or derivatives thereof as moulding material
    • B29K2027/12—Use of polyvinylhalogenides or derivatives thereof as moulding material containing fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2083/00—Use of polymers having silicon, with or without sulfur, nitrogen, oxygen, or carbon only, in the main chain, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2103/00—Use of resin-bonded materials as moulding material
    • B29K2103/04—Inorganic materials
    • B29K2103/06—Metal powders, metal carbides or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/26—Sealing devices, e.g. packaging for pistons or pipe joints

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Civil Engineering (AREA)
  • Composite Materials (AREA)
  • Structural Engineering (AREA)
  • Gasket Seals (AREA)

Abstract

To provide a method for manufacturing a sealing material and manufacturing equipment capable of easily manufacturing a sealing material in which a plurality of materials are arranged at arbitrary positions.SOLUTION: A method for manufacturing a sealing material for shielding a gas comprises preparing a plurality of materials constituting the sealing material and forming the sealing material by compounding the plurality of materials by laminated molding.SELECTED DRAWING: Figure 1

Description

本開示は、シール材の製造方法および製造装置に関する。 The present disclosure relates to a method and an apparatus for manufacturing a sealing material.

例えば、半導体の製造工程には、基板に対して成膜処理やエッチング処理等の真空処理が行われる。これらの処理を行う処理装置には、チャンバ内の処理空間を真空保持するために、リング状のシール材が用いられる。 For example, in the semiconductor manufacturing process, a vacuum treatment such as a film forming treatment or an etching treatment is performed on the substrate. In the processing apparatus that performs these processes, a ring-shaped sealing material is used to hold the processing space in the chamber in a vacuum.

近時、半導体の微細化が進み、処理装置に要求される処理の制御性に対するスペックが厳しくなってきており、シール材には真空シールの性能のみならず、シール材が水や酸素に対する透過性が低いことも必要となる。また、このような処理としては高温での処理、腐食性の高いガスでの処理、プラズマを用いた処理が存在するため、シール材には耐熱性、耐食性、耐プラズマ性も要求される。 Recently, the miniaturization of semiconductors has progressed, and the specifications for the controllability of processing required for processing equipment have become stricter. In addition to the vacuum sealing performance of the sealing material, the sealing material is permeable to water and oxygen. Is also required to be low. Further, since such treatment includes treatment at high temperature, treatment with highly corrosive gas, and treatment using plasma, the sealing material is also required to have heat resistance, corrosion resistance, and plasma resistance.

しかしながら、シール材に複数の性能が要求される場合、一つの材料のみで要求される性能を全て満たすことが困難となることがある。そこで、複数の性能を満たすことが可能なシール材として、例えば特許文献１には、ガス透過性の低い基材と、その表面に形成された気体遮蔽膜との二重構造を有するものが提案されている。 However, when a plurality of performances are required for the sealing material, it may be difficult to satisfy all the required performances with only one material. Therefore, as a sealing material capable of satisfying a plurality of performances, for example, Patent Document 1 proposes a material having a double structure of a base material having low gas permeability and a gas shielding film formed on the surface thereof. Has been done.

また、このような二重構造を有するシール材の製造方法としては、臨界抽出処理されたゴム製芯材を被覆材とともに一体成型するものが提案されている（特許文献２、３）。 Further, as a method for producing a sealing material having such a double structure, a method in which a rubber core material subjected to critical extraction treatment is integrally molded together with a coating material has been proposed (Patent Documents 2 and 3).

特開２００１−３４９４３７号公報Japanese Unexamined Patent Publication No. 2001-349437 特開平１０−３２３８４７号公報Japanese Unexamined Patent Publication No. 10-323847 特開２０００−５５２０４号公報Japanese Unexamined Patent Publication No. 2000-55204

本開示は、複数の材料を任意の位置に配置したシール材を容易に製造することができるシール材の製造方法および製造装置を提供する。 The present disclosure provides a method for producing a sealing material and a manufacturing apparatus capable of easily producing a sealing material in which a plurality of materials are arranged at arbitrary positions.

本開示の一態様に係るシール材の製造方法は、気体を遮蔽するシール材の製造方法であって、シール材を構成する複数の材料を準備することと、前記複数の材料を積層造形により複合化してシール材を形成することと、を有する。 The method for producing a sealing material according to one aspect of the present disclosure is a method for producing a sealing material that shields a gas, in which a plurality of materials constituting the sealing material are prepared and the plurality of materials are combined by laminated molding. It has the ability to form a sealing material.

本開示によれば、複数の材料を任意に配置したシール材を容易に製造することができるシール材の製造方法および製造装置が提供される。 According to the present disclosure, there is provided a method and an apparatus for manufacturing a sealing material capable of easily manufacturing a sealing material in which a plurality of materials are arbitrarily arranged.

一実施形態に係るシール材の製造方法を示すフローチャートである。It is a flowchart which shows the manufacturing method of the sealing material which concerns on one Embodiment. 一実施形態で製造されるシール材の一例を示す図である。It is a figure which shows an example of the sealing material manufactured in one Embodiment. 一実施形態で製造されるシール材の他の一例を示す図である。It is a figure which shows another example of the sealing material manufactured in one Embodiment. 図２のシール材の圧縮時の状態を示す断面図である。It is sectional drawing which shows the state at the time of compression of the sealing material of FIG. 図３のシール材の圧縮時の状態を示す断面図である。It is sectional drawing which shows the state at the time of compression of the sealing material of FIG. シール材の製造装置としての３Ｄプリンターを模式的に示す概略断面図である。It is the schematic sectional drawing which shows typically the 3D printer as the manufacturing apparatus of a sealing material. 真空処理を行う処理装置に一実施形態の製造方法により製造されたシール材を適用した例を説明するための図である。It is a figure for demonstrating the example which applied the sealing material manufactured by the manufacturing method of one Embodiment to the processing apparatus which performs vacuum processing.

以下、添付図面を参照して実施形態について具体的に説明する。
図１は、一実施形態に係るシール材の製造方法を示すフローチャートである。 Hereinafter, embodiments will be specifically described with reference to the accompanying drawings.
FIG. 1 is a flowchart showing a method for manufacturing a sealing material according to an embodiment.

本実施形態においては、気体を遮蔽するシール材を製造するに際し、最初に、シール材を構成する複数の材料を準備し（ステップ１）、次いで、これらの複数の材料を、積層造形により複合化してシール材を形成する（ステップ２）。シール材において、複数の材料は、要求される特性に応じて任意の位置に配置される。 In the present embodiment, when producing a sealing material that shields gas, first, a plurality of materials constituting the sealing material are prepared (step 1), and then these plurality of materials are composited by laminated molding. To form a sealing material (step 2). In the sealing material, the plurality of materials are arranged at arbitrary positions according to the required properties.

本実施形態で製造されるシール材は、環状（リング状）に形成され、シール面に密着されて圧縮変形することにより気体を遮蔽するものであり、典型例としてはＯリングを挙げることができる。このようなシール材は、例えば、真空処理を行う処理装置の処理容器（チャンバ）における真空シールに用いられる。 The sealing material produced in the present embodiment is formed in an annular shape (ring shape), is in close contact with the sealing surface and is compressed and deformed to shield the gas, and an O-ring can be mentioned as a typical example. .. Such a sealing material is used, for example, for vacuum sealing in a processing container (chamber) of a processing device that performs vacuum processing.

真空処理を行う処理装置としては、半導体装置の製造工程で用いられるＣＶＤ、ＡＬＤ、ＰＶＤ等の成膜処理を行う成膜装置や、ドライエッチングを行うエッチング装置を挙げることができる。成膜処理やエッチング等の真空処理としては、ガスを用いる処理およびプラズマを用いる処理を挙げることができる。 Examples of the processing device that performs vacuum processing include a film forming device that performs film forming processing such as CVD, ALD, and PVD used in the manufacturing process of a semiconductor device, and an etching device that performs dry etching. Examples of the vacuum treatment such as the film forming treatment and the etching include a treatment using a gas and a treatment using plasma.

近時、半導体装置の微細化が進み、処理装置に要求される処理の制御性に対するスペックが厳しくなってきており、シール材には真空シールの性能のみならず、シール材が水や酸素に対する透過性が低いことも必要となる。また、このような処理としては高温での処理、腐食性の高いガスでの処理、プラズマを用いた処理が存在するため、シール材には耐熱性、耐食性、耐プラズマ性も要求される。 Recently, the miniaturization of semiconductor devices has progressed, and the specifications for the controllability of processing required for processing devices have become stricter. Not only the performance of vacuum sealing but also the sealing material permeates water and oxygen. It is also necessary to have low sex. Further, since such treatment includes treatment at high temperature, treatment with highly corrosive gas, and treatment using plasma, the sealing material is also required to have heat resistance, corrosion resistance, and plasma resistance.

このような複数の性能を一つの材料で満たすことが困難であることから、例えば特許文献１には、ガス透過性の低い基材と、その表面に形成された気体遮蔽膜との二重構造を有するものが提案され、特許文献２、３には、二重構造を有するシール材の製造方法として、臨界抽出処理されたゴム製芯材を被覆材とともに一体成型するものが提案されている。 Since it is difficult to satisfy such a plurality of performances with one material, for example, Patent Document 1 describes a double structure of a base material having low gas permeability and a gas shielding film formed on the surface thereof. As a method for producing a sealing material having a double structure, a method of integrally molding a critically extracted rubber core material together with a coating material is proposed in Patent Documents 2 and 3.

しかし、特許文献２、３に示すような方法で複数の材料を複合化する場合、射出成形による成形と臨界抽出処理を行う必要があり製造に手間がかかるとともに、複数の材料の配置は二重構造に限られ、複数の材料を任意の位置に配置することはできない。また、射出成形できる材料は限られており、材料の組み合わせにも制限がある。 However, when a plurality of materials are composited by a method as shown in Patent Documents 2 and 3, it is necessary to perform molding by injection molding and critical extraction processing, which is troublesome to manufacture and the arrangement of the plurality of materials is double. Limited to the structure, multiple materials cannot be placed in any position. In addition, the materials that can be injection molded are limited, and the combination of materials is also limited.

そこで、本実施形態では、複数の材料を積層造形により複合化し、シール材を製造する。 Therefore, in the present embodiment, a plurality of materials are composited by laminated molding to manufacture a sealing material.

積層造形は、製品の三次元ＣＡＤなどのデジタルデータに基づき、製品を薄くスライスした元データを作製し、元データに基づいて所望の材料の薄層を順次積層し、製品を得るものである。積層造形により製品を製造する装置として、典型的には３Ｄプリンターが用いられる。 Laminated modeling is to obtain original data by thinly slicing a product based on digital data such as three-dimensional CAD of a product, and sequentially laminating thin layers of a desired material based on the original data. A 3D printer is typically used as an apparatus for manufacturing a product by laminated molding.

積層造形法としては、光造形法、熱溶解積層法、粉末法、インクジェット法等があり、材料に応じて使い分けることができる。積層造形する３Ｄプリンターには、使用する複数の材料に対応する積層造形機能を搭載することにより所望のシール材を製造することができる。 Examples of the additive manufacturing method include a stereolithography method, a fused deposition modeling method, a powder method, an inkjet method, and the like, which can be used properly according to the material. A desired sealing material can be manufactured by equipping a 3D printer for laminating molding with a laminating molding function corresponding to a plurality of materials to be used.

シール材を構成する材料としては、要求される特性に応じて、以下のようなものを挙げることができる。
真空シール性：基本的な特性であり、シール面との密着性により確保され、材料として、例えば、ブチルゴム、ウレタンゴム、およびニトリルゴムを挙げることができる。
低ガス透過性：ガス透過性の低い材料としては、カルレッツ（登録商標）のようなパーフロロエラストマーや、Ａｌ、Ｃｕ等の伸展性を有する金属を挙げることができる。
耐熱性：耐熱性を有する材料としては、耐熱温度が２００℃であるバイトン（登録商標）等のＣＦ系ゴムや、ブチル系ゴム、Ａｌ、Ｃｕ等の伸展性を有する金属を挙げることができる。
耐食性：腐食性ガスに対する耐食性が高い材料として、シリコーンゴム、フッ素ゴム、およびテフロン（登録商標）を挙げることができる。
耐プラズマ性：耐プラズマ性が高い材料として、フッ素ゴムおよびテフロン（登録商標）を挙げることができる。 Examples of the material constituting the sealing material include the following, depending on the required characteristics.
Vacuum sealability: This is a basic property that is ensured by adhesion to the sealing surface, and examples of the material include butyl rubber, urethane rubber, and nitrile rubber.
Low gas permeability: Examples of the material having low gas permeability include perfluoroelastomers such as Callets (registered trademark) and extensibility metals such as Al and Cu.
Heat resistance: Examples of the heat-resistant material include CF-based rubber such as Viton (registered trademark) having a heat-resistant temperature of 200 ° C., and extensible metal such as butyl rubber, Al, and Cu.
Corrosion resistance: Silicone rubber, fluororubber, and Teflon (registered trademark) can be mentioned as materials having high corrosion resistance against corrosive gas.
Plasma resistance: Fluororubber and Teflon (registered trademark) can be mentioned as materials having high plasma resistance.

次に、本実施例で製造されるシール材の例について、図２、図３を参照して説明する。図２の例では、シール材１０は、断面が円形状の芯材１１と、その外周に設けられた断面がリング状の外周材１２とで構成され、全体がリング状をなしている。図３の例では、シール材１０´は、中央部に断面が矩形状をなし、一方のシール面から他方のシール面に達する芯材１３と、芯材１３の内側に設けられ、断面が半円状をなす内側材１４と、芯材１３の外側に設けられ、断面が内側材１４とは逆向きの半円状をなす外側材１５とで構成され、全体がリング状をなしている。すなわち、中央の芯材１３の周囲に外周材を構成する内側材１４と外側材１５が設けられている。 Next, an example of the sealing material produced in this embodiment will be described with reference to FIGS. 2 and 3. In the example of FIG. 2, the sealing material 10 is composed of a core material 11 having a circular cross section and a ring-shaped outer peripheral material 12 having a ring-shaped cross section provided on the outer periphery thereof, and has a ring shape as a whole. In the example of FIG. 3, the sealing material 10'is provided inside the core material 13 having a rectangular cross section at the center and reaching the other sealing surface from one sealing surface, and has a semicircular cross section. It is composed of a circular inner member 14 and a semicircular outer member 15 provided on the outside of the core member 13 and having a cross section opposite to that of the inner member 14, and the whole is ring-shaped. That is, an inner member 14 and an outer member 15 constituting the outer peripheral member are provided around the central core member 13.

図２の例では、基材１１として相対的にガス透過性の低い材料（低ガス透過性材料）を用い、外周材１２として耐熱性材料を用いることにより、シール材１０は低透過性と耐熱性とを両立させることができる。また、外周材１２として耐食性材料または耐プラズマ性材料を用いることにより、シール材１０は低透過性と耐食性または耐プラズマ性とを両立させることができる。外周材１２は、耐熱性、耐食性、および耐プラズマ性の２つ以上を有することがより好ましい。図２の例の場合は、圧縮時には図４のように潰れ、真空シール性は外周材１２で確保しているので、外周材１２はシール性が高いことも要求される。本例の場合、芯材１１としては、ウレタンゴムが例示され、外周材１２としては、テフロン（登録商標）が例示される。 In the example of FIG. 2, by using a material having relatively low gas permeability (low gas permeability material) as the base material 11 and using a heat resistant material as the outer peripheral material 12, the sealing material 10 has low permeability and heat resistance. It is possible to achieve both sex and sex. Further, by using a corrosion-resistant material or a plasma-resistant material as the outer peripheral material 12, the sealing material 10 can achieve both low permeability and corrosion resistance or plasma resistance at the same time. It is more preferable that the outer peripheral material 12 has two or more of heat resistance, corrosion resistance, and plasma resistance. In the case of the example of FIG. 2, it is crushed as shown in FIG. 4 at the time of compression, and the vacuum sealing property is secured by the outer peripheral material 12, so that the outer peripheral material 12 is also required to have a high sealing property. In the case of this example, urethane rubber is exemplified as the core material 11, and Teflon (registered trademark) is exemplified as the outer peripheral material 12.

図３の例においても、芯材１３として相対的にガス透過性の低い材料を用い、内側材１４および外側材１５として耐熱性の高い材料を用いることにより、シール材１０´は低透過性と耐熱性とを両立させることができる。また、内側材１４および外側材１５として耐食性材料または耐プラズマ性材料を用いることにより、シール材１０´は低透過性と耐食性または耐プラズマ性とを両立させることができる。内側材１４および外側材１５は、耐熱性、耐食性、および耐プラズマ性の２つ以上を有することがより好ましい。内側材１４と外側材１５とを要求される特性に応じて異なる材料で構成してもよい。図３の例の場合は、圧縮時には図５のように潰れ、真空シール性は芯材１３で確保しているので、芯材１３はシール性が高いことも要求される。また、低ガス透過性材料で構成された芯材１３が一方のシール面から他方のシール面に達しているので、シール材１０´は、ガス透過性を低くする効果をより高めることができる。本例の場合、芯材１３としては、ブチルゴムが例示され、内側材１４および外側材１５としては、テフロン（登録商標）およびカルレッツ（登録商標）が例示される。 Also in the example of FIG. 3, by using a material having a relatively low gas permeability as the core material 13 and using a material having a high heat resistance as the inner material 14 and the outer material 15, the sealing material 10'has a low permeability. It is possible to achieve both heat resistance. Further, by using a corrosion-resistant material or a plasma-resistant material as the inner material 14 and the outer material 15, the sealing material 10'can achieve both low permeability and corrosion resistance or plasma resistance at the same time. It is more preferable that the inner member 14 and the outer member 15 have two or more of heat resistance, corrosion resistance, and plasma resistance. The inner material 14 and the outer material 15 may be made of different materials according to the required characteristics. In the case of the example of FIG. 3, it is crushed as shown in FIG. 5 at the time of compression, and the vacuum sealability is secured by the core material 13, so that the core material 13 is also required to have a high sealability. Further, since the core material 13 made of the low gas permeable material reaches from one sealing surface to the other sealing surface, the sealing material 10'can further enhance the effect of lowering the gas permeability. In the case of this example, butyl rubber is exemplified as the core material 13, and Teflon (registered trademark) and Carletz (registered trademark) are exemplified as the inner material 14 and the outer material 15.

積層造形では、三次元データに基づいて所望の材料を適宜配置した薄層を形成し、このような薄層を積層することにより製品が得られるので、従来よりも簡易に複数の材料を複合化することができる。また、積層造形法では、三次元データに基づいて材料を配置するので、複数の材料を任意の位置に配置することができるとともに、材料の組み合わせに制限がない。 In laminated modeling, a thin layer in which desired materials are appropriately arranged is formed based on three-dimensional data, and a product can be obtained by laminating such thin layers. Therefore, a plurality of materials can be combined more easily than before. can do. Further, in the additive manufacturing method, since the materials are arranged based on the three-dimensional data, a plurality of materials can be arranged at arbitrary positions, and there is no limitation on the combination of materials.

また、このように本実施形態ではシール材を任意の材料の組み合わせができることから、例えばメタルシールを使用せざるを得なかった部分に本実施形態のシール材を用いることが可能となる。すなわち、ＰＶＤ成膜のような要求されるスペックが厳しく、チャンバ内の酸素量を極めて少なくする必要がある場合、従来はシール材から透過する酸素を少なくするためにメタルシールを用いていた。メタルシールの場合、ゴムを用いたシール材よりもシール性が劣るため、締め付けのためのボルトの本数を増やし、締め付け圧力も増加する必要があり、その対応のために高コストとなる。これに対して、本実施形態では、例えば、図２のように、芯材１１をメタルとし、外周材１２をゴムとしたシール材を製造することができ、メタルシールをこのようなシール材に置き換えることにより、上記のような問題を解消することができる。 Further, since the sealing material can be any combination of materials in the present embodiment as described above, it is possible to use the sealing material of the present embodiment in a portion where, for example, a metal seal has to be used. That is, when the required specifications such as PVD film formation are strict and it is necessary to extremely reduce the amount of oxygen in the chamber, a metal seal has been conventionally used in order to reduce the oxygen permeating from the sealing material. In the case of a metal seal, since the sealing property is inferior to that of a sealing material using rubber, it is necessary to increase the number of bolts for tightening and the tightening pressure, which increases the cost. On the other hand, in the present embodiment, for example, as shown in FIG. 2, a sealing material in which the core material 11 is made of metal and the outer peripheral material 12 is made of rubber can be manufactured, and the metal seal can be used as such a sealing material. By replacing it, the above-mentioned problem can be solved.

次に、シール材の製造装置について説明する。
図６は、シール材の製造装置としての３Ｄプリンターを模式的に示す概略断面図である。図６の製造装置は、図２に示したシール材を製造する場合を例にしている状態を示している。 Next, a sealing material manufacturing apparatus will be described.
FIG. 6 is a schematic cross-sectional view schematically showing a 3D printer as a sealing material manufacturing apparatus. The manufacturing apparatus of FIG. 6 shows a state in which the case of manufacturing the sealing material shown in FIG. 2 is taken as an example.

シール材の製造装置としての３Ｄプリンター１００は、筐体１を有し、筐体１の中に基台２が設けられている。基台２上にはシール材を形成するためのシール材形成部を構成する型３が配置される。基台２の上方には、型３の中に材料を吐出する材料吐出部４が水平方向および垂直方向に移動可能に設けられている。 The 3D printer 100 as a sealing material manufacturing apparatus has a housing 1, and a base 2 is provided in the housing 1. A mold 3 forming a seal material forming portion for forming the seal material is arranged on the base 2. Above the base 2, a material discharging portion 4 for discharging the material into the mold 3 is provided so as to be movable in the horizontal direction and the vertical direction.

材料吐出部４は駆動部５により水平方向および垂直方向に駆動される。材料吐出部４には、第１の材料供給源６から図２の外周材１２を構成する材料Ａが供給され、第２の材料供給源７から図２の芯材１１を構成する材料Ｂが供給され、材料吐出部４からは材料Ａおよび材料Ｂのいずれかが選択的に吐出される。 The material discharge unit 4 is driven by the drive unit 5 in the horizontal direction and the vertical direction. The material discharge unit 4 is supplied with the material A constituting the outer peripheral material 12 of FIG. 2 from the first material supply source 6, and the material B constituting the core material 11 of FIG. 2 from the second material supply source 7. It is supplied, and either the material A or the material B is selectively discharged from the material discharge unit 4.

また、図示はしていないが、型３内に供給される材料によっては、材料を加熱する機能、材料を溶融する機能等の他の機能が付加される。 Further, although not shown, other functions such as a function of heating the material and a function of melting the material are added depending on the material supplied into the mold 3.

制御部８は、駆動部５による材料吐出部４の駆動、および材料吐出部４からの複数の材料の吐出を制御する。制御部８には、製品であるシール材の三次元ＣＡＤデータなどのデジタルデータに基づいて得られた、製品を薄くスライスした元データが記憶されている。そして、元データに対応して、駆動部５による材料吐出部４の駆動制御、および材料吐出部４から吐出する材料Ａ、材料Ｂの切り替え制御を行う。これにより、元データに基づいて、所望の位置に材料Ａまたは材料Ｂが配置された薄層が順次積層されるように制御する。 The control unit 8 controls the drive of the material discharge unit 4 by the drive unit 5 and the discharge of a plurality of materials from the material discharge unit 4. The control unit 8 stores the original data obtained by thinly slicing the product, which is obtained based on digital data such as three-dimensional CAD data of the sealing material of the product. Then, in response to the original data, the drive unit 5 performs drive control of the material discharge unit 4 and switching control of the material A and the material B to be discharged from the material discharge unit 4. As a result, based on the original data, the thin layers in which the material A or the material B is arranged at a desired position are controlled to be sequentially laminated.

図示の例では、型３の中に、元データに基づき、材料Ａ、材料Ｂが予め定められた位置に配置されるように、薄層２１〜２６が順次形成され、積層された状態を示している。この例では、材料Ａを白抜き、材料Ｂをハッチングで示しており、薄層２１〜２６と順次積層することで、図２のシール材の途中まで形成されていることを示している。なお、薄層を積層したままの状態では材料Ａと材料Ｂとの間に段差が形成されるが、その後に成形処理等を行うことにより、滑らかな状態とすることができる。 In the illustrated example, thin layers 21 to 26 are sequentially formed and laminated in the mold 3 so that the material A and the material B are arranged at predetermined positions based on the original data. ing. In this example, the material A is outlined and the material B is shown by hatching, and it is shown that the material A is formed halfway through the sealing material of FIG. 2 by sequentially laminating the thin layers 21 to 26. In the state where the thin layers are still laminated, a step is formed between the material A and the material B, but it can be made smooth by performing a molding process or the like after that.

次に、本実施形態により製造されたシール材の適用例について説明する。
図６は、真空処理を行う処理装置に一実施形態の製造方法により製造されたシール材を適用した例を説明するための図である。 Next, an application example of the sealing material produced by the present embodiment will be described.
FIG. 6 is a diagram for explaining an example in which a sealing material manufactured by the manufacturing method of one embodiment is applied to a processing device that performs vacuum treatment.

処理装置２００は、チャンバ１０１と、チャンバ１０１内で基板を載置する載置台１０２と、チャンバ１０１の上部に設けられるガス導入部１０３と、チャンバ１０１の底部に設けられる排気配管１０４とを有する。また、チャンバ１０１の側壁には、真空ゲージ等に接続される配管１０５が設けられている。チャンバ１０１内は、排気配管１０４に接続された真空ポンプ（図示せず）により真空排気され、所定の真空圧力に保持される。また、ガス導入部１０３は例えばシャワーヘッドを有し、処理ガスをチャンバ１０１内に導入する。プラズマ処理を行う場合には、ガス導入部１０３がプラズマ源を有するものであってもよいし、ガス導入部１０３の代わりにプラズマ源が配置されてもよい。載置台１０２には基板Ｓを加熱するヒータが設けられていてもよい。 The processing device 200 includes a chamber 101, a mounting table 102 on which a substrate is placed in the chamber 101, a gas introduction unit 103 provided at the upper part of the chamber 101, and an exhaust pipe 104 provided at the bottom of the chamber 101. Further, a pipe 105 connected to a vacuum gauge or the like is provided on the side wall of the chamber 101. The inside of the chamber 101 is evacuated by a vacuum pump (not shown) connected to the exhaust pipe 104, and is maintained at a predetermined vacuum pressure. Further, the gas introduction unit 103 has, for example, a shower head, and introduces the processing gas into the chamber 101. When performing plasma treatment, the gas introduction unit 103 may have a plasma source, or a plasma source may be arranged in place of the gas introduction unit 103. The mounting table 102 may be provided with a heater for heating the substrate S.

チャンバ１０１と、チャンバ１０１に接続されるガス導入部１０３、排気配管１０４、配管１０５との間には、真空シールするための本実施形態により製造されたシール材１１０が介在されている。 A sealing material 110 manufactured according to the present embodiment for vacuum sealing is interposed between the chamber 101 and the gas introduction unit 103, the exhaust pipe 104, and the pipe 105 connected to the chamber 101.

処理装置２００としては、ＣＶＤ、ＡＬＤ、ＰＶＤ等の成膜処理を行う成膜装置や、ドライエッチングを行うエッチング装置が用いられる。シール材１１０は、上述したように、複数の材料を積層造形により複合化して製造されたものであるため、真空シール性のみならず、ガス透過性や耐熱性等の他の複数の性能を満たすことができる。 As the processing device 200, a film forming apparatus that performs film forming processing such as CVD, ALD, and PVD, and an etching apparatus that performs dry etching are used. As described above, since the sealing material 110 is manufactured by compounding a plurality of materials by laminating molding, it satisfies not only vacuum sealing property but also other plurality of performances such as gas permeability and heat resistance. be able to.

以上、実施形態について説明したが、今回開示された実施形態は、全ての点で例示であって制限的なものではないと考えられるべきである。上記の実施形態は、添付の特許請求の範囲およびその主旨を逸脱することなく、様々な形態で省略、置換、変更されてもよい。 Although the embodiments have been described above, the embodiments disclosed this time should be considered to be exemplary in all respects and not restrictive. The above embodiments may be omitted, replaced or modified in various forms without departing from the scope of the appended claims and their gist.

例えば、上記実施形態では、シール材の構造として図２、図３を例にとって説明したが、図２、図３の例はあくまで例示であり、これ以外の種々の材料の配置であってよい。例えば、シール時の圧縮によって潰れた際に、最も応力がかかる部分を強度の高い材料にすることや、腐食性のガスやプラズマが接する部分のみ耐食性や耐プラズマ性の高い材料にすることであってもよい。また、得ようとする特性によっては、異なる材料の界面に材料の濃度勾配を持たせてもよい。さらに、シール材の断面の形状は円形に限らず、圧縮時の変形を考慮して、楕円形や多角形等の種々の形状を採用することができる。さらに、上記図２、図３では、２種の材料を複合化した例を示したが、３種以上の材料を複合化してもよい。 For example, in the above embodiment, the structure of the sealing material has been described by taking FIGS. 2 and 3 as examples, but the examples of FIGS. 2 and 3 are merely examples, and various other material arrangements may be used. For example, the part that is most stressed when crushed by compression during sealing is made of a high-strength material, and only the part that comes into contact with corrosive gas or plasma is made of a material with high corrosion resistance and plasma resistance. You may. Further, depending on the characteristics to be obtained, a concentration gradient of the material may be provided at the interface of different materials. Further, the cross-sectional shape of the sealing material is not limited to a circular shape, and various shapes such as an elliptical shape and a polygonal shape can be adopted in consideration of deformation during compression. Further, in FIGS. 2 and 3 above, an example in which two kinds of materials are composited is shown, but three or more kinds of materials may be composited.

１０，１０´，１１０；シール材
１１，１３；芯材
１２；外周材
１４；内側材
１５；外側材
１００；３Ｄプリンター（シール材の製造装置）
２００；処理装置 10, 10', 110; Sealing material 11, 13; Core material 12; Outer peripheral material 14; Inner material 15; Outer material 100; 3D printer (sealing material manufacturing equipment)
200; Processing device

Claims (13)

気体を遮蔽するシール材の製造方法であって、
シール材を構成する複数の材料を準備することと、
前記複数の材料を積層造形により複合化してシール材を形成することと、
を有する、シール材の製造方法。 It is a method of manufacturing a sealing material that shields gas.
Preparing multiple materials that make up the sealing material and
Forming a sealing material by compounding the plurality of materials by laminated molding,
A method for manufacturing a sealing material. 前記複数の材料は、要求される特性に応じて任意の位置に配置される、請求項１に記載のシール材の製造方法。 The method for producing a sealing material according to claim 1, wherein the plurality of materials are arranged at arbitrary positions according to required properties. 前記シール材は、環状に形成され、シール面に密着されて圧縮変形することにより気体を遮蔽する、請求項２に記載のシール材の製造方法。 The method for producing a sealing material according to claim 2, wherein the sealing material is formed in an annular shape, is brought into close contact with the sealing surface, and is compressed and deformed to shield gas. 前記シール材は、真空処理を行う処理装置の処理容器における真空シールに用いられる、請求項３に記載のシール材の製造方法。 The method for producing a sealing material according to claim 3, wherein the sealing material is used for vacuum sealing in a processing container of a processing device that performs vacuum processing. 前記シール材を構成する複数の材料は、低ガス透過性、耐熱性、耐食性、耐プラズマ性の少なくとも一種の特性を有する、請求項４に記載のシール材の製造方法。 The method for producing a sealing material according to claim 4, wherein the plurality of materials constituting the sealing material have at least one property of low gas permeability, heat resistance, corrosion resistance, and plasma resistance. 前記低ガス透過性を有する材料は、パーフロロエラストマー、伸展性を有する金属から選択されたものである、請求項５に記載のシール材の製造方法。 The method for producing a sealing material according to claim 5, wherein the material having low gas permeability is selected from a perfluoroelastomer and a metal having extensibility. 前記耐熱性を有する材料は、ＣＦ系ゴム、ブチル系ゴム、伸展性を有する金属から選択されたものである、請求項５または請求項６に記載のシール材の製造方法。 The method for producing a sealing material according to claim 5 or 6, wherein the heat-resistant material is selected from CF-based rubber, butyl-based rubber, and extensible metal. 前記耐食性を有する材料は、シリコーンゴム、フッ素ゴム、およびテフロン（登録商標）から選択されたものである、請求項５から請求項７のいずれか一項に記載のシール材の製造方法。 The method for producing a sealing material according to any one of claims 5 to 7, wherein the corrosion-resistant material is selected from silicone rubber, fluororubber, and Teflon (registered trademark). 前記耐プラズマ性を有する材料は、フッ素ゴムおよびテフロン（登録商標）から選択されたものである、請求項５から請求項８のいずれか一項に記載のシール材の製造方法。 The method for producing a sealing material according to any one of claims 5 to 8, wherein the plasma-resistant material is selected from fluororubber and Teflon (registered trademark). 前記シール材は、低ガス透過性の第１の材料で構成された芯材と、前記芯材の周囲に設けられた耐熱性、耐食性、および耐プラズマ性の少なくとも一つを有する第２の材料で構成された外周材とを有する、請求項４から請求項９のいずれか一項に記載のシール材の製造方法。 The sealing material is a core material composed of a first material having low gas permeability and a second material having at least one of heat resistance, corrosion resistance, and plasma resistance provided around the core material. The method for producing a sealing material according to any one of claims 4 to 9, further comprising an outer peripheral material composed of. 前記外周材は、前記芯材の外周に断面が環状をなすように設けられ、前記外周材が前記シール面に密着される、請求項１０に記載のシール材の製造方法。 The method for manufacturing a sealing material according to claim 10, wherein the outer peripheral material is provided on the outer periphery of the core material so as to form an annular cross section, and the outer peripheral material is brought into close contact with the sealing surface. 前記芯材は、一方のシール面から他方のシール面に達するように設けられ、前記外周材は、前記芯材の内側に設けられた内側材と、前記芯材の外側に設けられた外側材とを有し、前記芯材が前記シール面に密着される、請求項１０に記載のシール材の製造方法。 The core material is provided so as to reach the other sealing surface from one sealing surface, and the outer peripheral material includes an inner material provided inside the core material and an outer material provided outside the core material. The method for producing a sealing material according to claim 10, wherein the core material is brought into close contact with the sealing surface. 気体を遮蔽するシール材の製造装置であって、
シール材を形成するシール材形成部と、
シール材を構成する複数の材料をそれぞれ供給する複数の材料供給源と、
前記複数の材料供給源からの複数の材料を前記シール材形成部に吐出する材料吐出部と、
前記材料形成部を水平方向および垂直方向に駆動する駆動部と、
制御部と、
を有し、
前記制御部は、前記シール材形成部に前記複数の材料が積層造形により複合化されてシール材が形成されるように、前記駆動部による前記材料吐出部の駆動、および前記材料吐出部からの前記複数の材料の吐出を制御する、シール材の製造装置。 A device for manufacturing sealing materials that shields gas.
The seal material forming part that forms the seal material and
Multiple material sources that supply multiple materials that make up the sealing material, and
A material discharge unit that discharges a plurality of materials from the plurality of material sources to the seal material forming unit, and a material discharge unit.
A drive unit that drives the material forming unit in the horizontal and vertical directions,
Control unit and
Have,
The control unit drives the material discharge unit by the drive unit and from the material discharge unit so that the plurality of materials are composited in the seal material forming unit to form the seal material. A sealing material manufacturing apparatus that controls the discharge of the plurality of materials.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS537554U (en) * 1976-07-06 1978-01-23
US5028056A (en) * 1986-11-24 1991-07-02 The Gates Rubber Company Fiber composite sealing element
WO2006115064A1 (en) * 2005-04-22 2006-11-02 Nok Corporation Gasket
WO2017018525A1 (en) * 2015-07-29 2017-02-02 株式会社カネカ Method for manufacturing photocurable three-dimensional stereoscopic fabricated object
JP2019503907A (en) * 2016-01-21 2019-02-14 スリーエム イノベイティブ プロパティズ カンパニー Lamination process of fluoroelastomer
WO2019105605A1 (en) * 2017-11-28 2019-06-06 Carl Freudenberg Kg Seal arrangement

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10323847A (en) 1997-05-23 1998-12-08 Nok Corp Manufacture of composite structure o-ring
JP2000055204A (en) 1998-08-05 2000-02-22 Nok Corp Manufacture of composite structure o-ring
JP2001225392A (en) * 2000-02-17 2001-08-21 Nippon Mektron Ltd Method for manufacturing gasket for precise equipment
JP2001349437A (en) 2000-06-05 2001-12-21 Toyota Industries Corp Seal material
KR20070018463A (en) * 2005-08-10 2007-02-14 동부일렉트로닉스 주식회사 Double structure O-ring and it's manufacturing method
JP2016205530A (en) * 2015-04-23 2016-12-08 東京瓦斯株式会社 Composite gasket
EP3272542B1 (en) * 2016-07-19 2019-03-27 OCE Holding B.V. Method of printing on a three-dimensional object

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS537554U (en) * 1976-07-06 1978-01-23
US5028056A (en) * 1986-11-24 1991-07-02 The Gates Rubber Company Fiber composite sealing element
WO2006115064A1 (en) * 2005-04-22 2006-11-02 Nok Corporation Gasket
WO2017018525A1 (en) * 2015-07-29 2017-02-02 株式会社カネカ Method for manufacturing photocurable three-dimensional stereoscopic fabricated object
JP2019503907A (en) * 2016-01-21 2019-02-14 スリーエム イノベイティブ プロパティズ カンパニー Lamination process of fluoroelastomer
WO2019105605A1 (en) * 2017-11-28 2019-06-06 Carl Freudenberg Kg Seal arrangement

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