JP2021023454A - Dishwasher - Google Patents

Dishwasher Download PDF

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JP2021023454A
JP2021023454A JP2019142008A JP2019142008A JP2021023454A JP 2021023454 A JP2021023454 A JP 2021023454A JP 2019142008 A JP2019142008 A JP 2019142008A JP 2019142008 A JP2019142008 A JP 2019142008A JP 2021023454 A JP2021023454 A JP 2021023454A
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hot water
rinsing
circuit
tank
heat pump
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JP7254344B2 (en
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大友　昇
Noboru Otomo
昇 大友
正信 齋藤
Masanobu Saito
正信 齋藤
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Atago Seisakusho Co Ltd
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B40/00—Technologies aiming at improving the efficiency of home appliances, e.g. induction cooking or efficient technologies for refrigerators, freezers or dish washers

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Abstract

To downsize a compressor configuring a heat pump and a hot water storage tank and to reduce running costs and save space in a hot water generation storage device of a dishwasher.SOLUTION: Prescribed amounts of rinsing hot water and washing hot water are delivered via a first circuit C1 or a second circuit C2 into a rinsing tank 3 and a washing tank 4 so as to be stored therein, respectively, before washing operation starts. During the washing operation, a heat pump 1 operates to cause hot water to flow into the rinsing tank 3 via the first circuit C1, and an operation control device 25 controls each circuit described herein so as to compensate the rinsing hot water lacking in the first circuit C2 with hot water via the second circuit C2 and city water via the third circuit C3.SELECTED DRAWING: Figure 1

Description

本発明は、食器洗浄装置に関し、特にヒートポンプにより高温水を生成し、この高温水を食器のすすぎや洗浄に利用する食器洗浄装置に関する。 The present invention relates to a dishwashing device, and more particularly to a dishwashing device that generates high-temperature water by a heat pump and uses the high-temperature water for rinsing and washing dishes.

一般に、業務用の食器洗浄装置の洗浄運転のプロセスは、食器を洗浄し、その後に洗剤を落とすために食器をすすぐプロセスから成っている。食器をすすぐ際には、約８０℃の温水が使用される。これは、温水による食器の殺菌、食器を高温にすることで食器の乾燥を促進する、といった理由による。一方、食器を洗浄する際には、洗剤を使用する都合上、それよりも低温の温水、例えば約６０℃の温水が使用されている。 In general, the washing operation process of a commercial dishwasher consists of the process of washing the dishes and then rinsing the dishes to remove the detergent. When rinsing the dishes, warm water at about 80 ° C. is used. This is because the tableware is sterilized with warm water and the tableware is heated to a high temperature to accelerate the drying of the tableware. On the other hand, when washing dishes, hot water at a lower temperature, for example, hot water at about 60 ° C. is used for the convenience of using a detergent.

従来、業務用の食器洗浄装置で８０℃以上の温水を生成、貯湯する方式は、幾つかの方式が知られている。１つは、燃焼ガスバーナーにより、熱交換器を介して水を加熱する方式であり、もう１つは、貯湯タンクに電気ヒーターを挿入し、水を加熱する方式である。前者は、単独で充分な加熱能力が得られる一方、後者は、加熱能力が不十分で、時間短縮のために、補助的にガス給湯器から温水の供給を受ける場合が多い。 Conventionally, there are several known methods for generating and storing hot water at 80 ° C. or higher with a commercial dishwashing device. One is a method in which water is heated by a combustion gas burner via a heat exchanger, and the other is a method in which an electric heater is inserted into a hot water storage tank to heat water. The former has a sufficient heating capacity by itself, while the latter has an insufficient heating capacity, and in many cases, hot water is supplementarily supplied from a gas water heater in order to shorten the time.

もう一つ別の方式は、特許文献１に記載されているように、ヒートポンプにより水を加熱して温水を生成し、貯湯タンクに貯湯するようにしたものである。ヒートポンプ式を採用することにより、ガス式に比べてランニングコストを低減することができ、電気ヒーター式に比べて高効率化を実現することができる。 In another method, as described in Patent Document 1, hot water is generated by heating water with a heat pump and stored in a hot water storage tank. By adopting the heat pump type, the running cost can be reduced as compared with the gas type, and higher efficiency can be realized as compared with the electric heater type.

特開平１０−８０３９１号公報Japanese Unexamined Patent Publication No. 10-80391

しかしながら、従来のヒートポンプ式の食器洗浄装置においては、必要量のすすぎ用温水を供給するためにはヒートポンプを構成する圧縮機（コンプレッサ）、や貯湯タンクが大型なものにならざるを得なかった。そのため、ランニングコストが依然として高く、その設置スペースも大きくなるという問題があった。 However, in the conventional heat pump type dishwashing apparatus, in order to supply the required amount of hot water for rinsing, the compressor and the hot water storage tank constituting the heat pump have to be large. Therefore, there is a problem that the running cost is still high and the installation space is also large.

上述の課題に鑑み、本発明の食器洗浄装置は、ヒートポンプと、貯湯タンクと、すすぎ用タンクと、洗浄用タンクと、前記ヒートポンプと外部から供給される市水との熱交換により生成された温水を、前記貯湯タンクを介することなく前記すすぎ用タンク及び前記洗浄用タンクに直接供給する第１の回路と、前記ヒートポンプと前記市水との熱交換により生成された温水を前記貯湯タンクに貯湯し、この貯湯タンクに貯湯された温水を前記すすぎ用タンク及び前記洗浄用タンクに供給する第２の回路と、前記市水を前記すすぎ用タンクに供給する第３の回路と、を備える食器洗浄装置であって、
この食器洗浄装置の洗浄運転開始前に予め前記第１の回路又は第２の回路を介して前記すすぎ用タンクに所定量のすすぎ用温水を貯えておき、この食器洗浄装置の洗浄運転時に前記すすぎ用タンクに第１の回路を介して温水を流入させ、この第１の回路で不足するすすぎ用温水を前記第２の回路を介した温水と前記第３の回路を介した前記市水とで補うように前記第１、第２及び第３の回路を制御する制御装置と、を備えることを特徴とする。 In view of the above problems, the dishwashing apparatus of the present invention includes hot water generated by heat exchange between a heat pump, a hot water storage tank, a rinsing tank, a washing tank, and the heat pump and city water supplied from the outside. The hot water generated by the heat exchange between the heat pump and the city water and the first circuit that directly supplies the rinsing tank and the cleaning tank without going through the hot water storage tank are stored in the hot water storage tank. A dishwashing apparatus including a second circuit for supplying hot water stored in the hot water storage tank to the rinsing tank and the washing tank, and a third circuit for supplying the city water to the rinsing tank. And
A predetermined amount of hot water for rinsing is stored in the rinsing tank in advance via the first circuit or the second circuit before the start of the washing operation of the dishwashing device, and the rinsing is performed during the washing operation of the dishwashing device. Hot water is flowed into the tank through the first circuit, and the hot water for rinsing that is insufficient in the first circuit is mixed with the hot water through the second circuit and the city water through the third circuit. It is characterized by including a control device for controlling the first, second and third circuits so as to supplement the first, second and third circuits.

本発明の食器洗浄装置によれば、洗浄運転開始前に予めすすぎ用タンクに所定量のすすぎ用温水を貯えておき、洗浄運転時にヒートポンプを介してすすぎ用タンクに温水を供給すると共に、不足するすすぎ用温水を貯湯タンクに貯えられた温水と市水とで補っているので、ヒートポンプを構成する圧縮機、並びに貯湯タンクを小型化し、ランニングコストの低減と省スペース化を実現することができる。 According to the dishwashing apparatus of the present invention, a predetermined amount of hot water for rinsing is stored in the rinsing tank in advance before the start of the washing operation, and the hot water is supplied to the rinsing tank via the heat pump during the washing operation and is insufficient. Since the hot water for rinsing is supplemented with the hot water stored in the hot water storage tank and the city water, the compressor constituting the heat pump and the hot water storage tank can be miniaturized, and running costs can be reduced and space can be saved.

本発明の実施形態による食器洗浄装置の構成を示す図である。It is a figure which shows the structure of the dishwashing apparatus by embodiment of this invention.

本発明の実施形態における食器洗浄装置を図１に基づいて説明する。図示のように、この食器洗浄装置１００は、ヒートポンプ１、貯湯タンク２、すすぎ用タンク３、洗浄用タンク４を備えている。図１の中で、一点鎖線で囲んだ部分はヒートポンプ／貯湯タンクユニットＵ１、点線で囲んだ部分は食器洗浄装置本体５、破線で囲んだ部分はすすぎ用ユニットＵ２である。 The dishwashing apparatus according to the embodiment of the present invention will be described with reference to FIG. As shown in the figure, the dishwashing device 100 includes a heat pump 1, a hot water storage tank 2, a rinsing tank 3, and a washing tank 4. In FIG. 1, the portion surrounded by the alternate long and short dash line is the heat pump / hot water storage tank unit U1, the portion surrounded by the dotted line is the dishwashing device main body 5, and the portion surrounded by the broken line is the rinsing unit U2.

ヒートポンプ１は、周知のように、凝縮機６、不図示の圧縮機、膨張弁及び蒸発器を冷媒配管で循環接続し、冷媒配管の中に冷媒として例えば二酸化炭素（ＣＯ２）を流通可能に封入することで構成される。凝縮器６は水熱交換器であって、凝縮器６の中を流通する冷媒と外部から供給される市水との熱交換により、市水を加熱して温水を生成する。さらに、ヒートポンプ１は、その動作を制御するためのヒートポンプ制御装置７を備えている。 As is well known, the heat pump 1 circulates and connects a condenser 6, a compressor (not shown), an expansion valve, and an evaporator with a refrigerant pipe so that, for example, carbon dioxide (CO 2 ) can be circulated as a refrigerant in the refrigerant pipe. It is composed by enclosing. The condenser 6 is a water heat exchanger, and heats the city water to generate hot water by heat exchange between the refrigerant flowing in the condenser 6 and the city water supplied from the outside. Further, the heat pump 1 includes a heat pump control device 7 for controlling its operation.

食器洗浄装置１００は、ヒートポンプ１で生成された温水を食器洗浄装置本体５に洗浄用温水として、すすぎ用ユニットＵ２にすすぎ用温水として供給するために、３系統の回路を備えている。第１の回路Ｃ１は、ヒートポンプ１と市水との熱交換により生成された温水を、貯湯タンク２を介することなく、すすぎ用タンク３及び洗浄用タンク４に直接供給する回路である。 The dishwashing device 100 includes three circuits for supplying the hot water generated by the heat pump 1 to the dishwashing device main body 5 as hot water for washing and to the rinsing unit U2 as hot water for rinsing. The first circuit C1 is a circuit that directly supplies hot water generated by heat exchange between the heat pump 1 and city water to the rinsing tank 3 and the cleaning tank 4 without going through the hot water storage tank 2.

第２の回路Ｃ２は、ヒートポンプ１と市水との熱交換により生成された温水を貯湯タンク２に貯湯し、この貯湯タンク２に貯湯された温水をすすぎ用タンク３及び洗浄用タンク４に供給する回路である。 The second circuit C2 stores hot water generated by heat exchange between the heat pump 1 and city water in the hot water storage tank 2, and supplies the hot water stored in the hot water storage tank 2 to the rinsing tank 3 and the cleaning tank 4. It is a circuit to do.

第３の回路Ｃ３は、市水をヒートポンプ１の凝縮器６、貯湯タンク２及びすすぎ用タンク３に供給する回路である。以下、各回路の構成を詳しく説明する。 The third circuit C3 is a circuit that supplies city water to the condenser 6 of the heat pump 1, the hot water storage tank 2, and the rinsing tank 3. Hereinafter, the configuration of each circuit will be described in detail.

＜第１の回路Ｃ１の構成＞
第１の回路Ｃ１は、ヒートポンプ１で生成された温水をすすぎ用タンク３及び洗浄用タンク４に直接供給する第１の温水供給配管８を備えている。第１の温水供給配管８はヒートポンプ１の水出口（ＯＵＴ）とすすぎ用タンク３及び洗浄用タンク４の間に配設されており、その途中に、温水の流路を制御するための、第１の３方向弁Ｂ１、第１の開閉弁ＳＢ１、及び第２の開閉弁ＳＢ２が設けられている。 <Structure of the first circuit C1>
The first circuit C1 includes a first hot water supply pipe 8 that directly supplies the hot water generated by the heat pump 1 to the rinsing tank 3 and the cleaning tank 4. The first hot water supply pipe 8 is arranged between the water outlet (OUT) of the heat pump 1 and the rinsing tank 3 and the cleaning tank 4, and a first hot water flow path for controlling the hot water flow path is arranged in the middle of the first hot water supply pipe 8. A three-way valve B1, a first on-off valve SB1, and a second on-off valve SB2 are provided.

市水は、逆止弁付減圧器９及び定流量弁１０を介してヒートポンプ１の水入口（ＩＮ）に流入される。そして、流入された市水はヒートポンプ１の凝縮器６との熱交換によって加熱され、ヒートポンプ１の凝縮器６の出口（ＯＵＴ）から第１の温水供給配管８に流れるようになっている。 City water flows into the water inlet (IN) of the heat pump 1 via the pressure reducing device 9 with a check valve and the constant flow valve 10. Then, the inflowing city water is heated by heat exchange with the condenser 6 of the heat pump 1 and flows from the outlet (OUT) of the condenser 6 of the heat pump 1 to the first hot water supply pipe 8.

また、第１の温水供給配管８には第３の開閉弁ＳＢ３を介してすすぎ用熱交換器１１が接続されている。すすぎ用熱交換器１１は温水とすすぎ用タンク３に貯えられたすすぎ用温水との熱交換を行うことにより、すすぎ用温水の保温または加熱を行う。そのため、すすぎ用熱交換器１１はすすぎ用タンク２内に設置することが好ましい。 Further, a rinsing heat exchanger 11 is connected to the first hot water supply pipe 8 via a third on-off valve SB3. The rinsing heat exchanger 11 retains or heats the rinsing hot water by exchanging heat between the hot water and the rinsing hot water stored in the rinsing tank 3. Therefore, it is preferable to install the rinse heat exchanger 11 in the rinse tank 2.

すすぎ用熱交換器１１通った温水は第１の電磁弁ＤＢ１を介してすすぎ用タンク３に供給することができる。また、すすぎ用熱交換器１１から流出する温水をヒートポンプ１の凝縮器６の入口（ＩＮ）に還流させる還流路が設けられている。この還流路が形成されることで、すすぎ用タンク３に貯えられたすすぎ用温水の保温または加熱を行うことができる。 The hot water that has passed through the rinse heat exchanger 11 can be supplied to the rinse tank 3 via the first solenoid valve DB1. Further, a reflux path is provided to return the hot water flowing out of the rinse heat exchanger 11 to the inlet (IN) of the condenser 6 of the heat pump 1. By forming this reflux path, it is possible to keep or heat the hot water for rinsing stored in the rinsing tank 3.

この還流路はすすぎ用熱交換器１１の温水出口側に還流配管１２と、この還流配管１２に設けられた第２の電磁弁ＤＢ２、逆止弁ＧＢ及び第２の３方向弁Ｂ２を備えており、これらの弁が開くことにより、ヒートポンプ１に戻る還流路が形成される。この還流路は循環ポンプ１６により循環する。又循環ポンプ１６は駆動する状態になってもエアがみしないように配置される。そして、全体としては、ヒートポンプ１→第１の温水供給配管８→すすぎ用熱交換器１１→還流配管１２→ヒートポンプ１という配管経路にて温水循環路が形成される。 This return passage is provided with a return pipe 12 on the hot water outlet side of the rinse heat exchanger 11, a second solenoid valve DB2, a check valve GB, and a second three-way valve B2 provided in the return pipe 12. By opening these valves, a return path to the heat pump 1 is formed. This return path is circulated by the circulation pump 16. Further, the circulation pump 16 is arranged so that air does not see even when it is driven. Then, as a whole, a hot water circulation path is formed by a piping path of heat pump 1 → first hot water supply pipe 8 → rinsing heat exchanger 11 → reflux pipe 12 → heat pump 1.

また、洗浄用熱交換器１３は第４の開閉弁ＳＢ４を介してすすぎ用熱交換器１１に直列に連結されている。この洗浄用熱交換器１３は、すすぎ用熱交換器１１から流出する温水と洗浄用タンク４に貯えられた洗浄用温水との熱交換を行うことで、洗浄用温水の保温を行う。洗浄用熱交換器１３は洗浄用タンク４内に、または洗浄用タンク４の外面に接するように設置される。洗浄用熱交換器１３から流出した温水は第５の開閉弁ＳＢ５及び温水の逆流を防止するための逆止弁１４を介してすすぎ用熱交換器１１に流入させることができるにようになっている。 Further, the cleaning heat exchanger 13 is connected in series with the rinsing heat exchanger 11 via the fourth on-off valve SB4. The cleaning heat exchanger 13 keeps the cleaning hot water warm by exchanging heat between the hot water flowing out from the rinsing heat exchanger 11 and the cleaning hot water stored in the cleaning tank 4. The cleaning heat exchanger 13 is installed in the cleaning tank 4 or in contact with the outer surface of the cleaning tank 4. The hot water flowing out of the cleaning heat exchanger 13 can flow into the rinsing heat exchanger 11 via the fifth on-off valve SB5 and the check valve 14 for preventing the backflow of the hot water. There is.

＜第２の回路Ｃ２の構成＞
第２の回路Ｃ２は、ヒートポンプ１と市水との熱交換により生成された温水を循環させながら貯湯タンク２に貯湯するための循環配管１５を備えている。この場合、循環配管１５に介設された第１の３方向弁Ｂ１及び第２の３方向弁Ｂ２により、第１の回路Ｃ１と第２の回路Ｃ２の温水経路が切り換えられるようになっている。第１の３方向弁Ｂ１は、ヒートポンプ１の出口（ＯＵＴ）側、第２の３方向弁Ｂ２は、ヒートポンプ１の入口（ＩＮ）側に設けられている。また、循環配管１５に温水を循環させる循循ポンプ１６が設けられている。 <Structure of the second circuit C2>
The second circuit C2 includes a circulation pipe 15 for storing hot water in the hot water storage tank 2 while circulating hot water generated by heat exchange between the heat pump 1 and city water. In this case, the hot water paths of the first circuit C1 and the second circuit C2 can be switched by the first three-way valve B1 and the second three-way valve B2 interposed in the circulation pipe 15. .. The first three-way valve B1 is provided on the outlet (OUT) side of the heat pump 1, and the second three-way valve B2 is provided on the inlet (IN) side of the heat pump 1. Further, a circulation pump 16 for circulating hot water is provided in the circulation pipe 15.

貯湯タンク２に貯湯された温水は逆止弁付き電動混合弁１７、第２の温水供給配管１８、第６の開閉弁ＳＢ６及び第７の開閉弁ＳＢ７を介して、すすぎ用タンク３及び洗浄用タンク４に供給されるようになっている。逆止弁付き電動混合弁１７は貯湯タンク２から流出する温水に市水を混合することにより、温水温度を調節するための弁である。 The hot water stored in the hot water storage tank 2 is used for rinsing tank 3 and cleaning via an electric mixing valve 17 with a check valve, a second hot water supply pipe 18, a sixth on-off valve SB6 and a seventh on-off valve SB7. It is designed to be supplied to the tank 4. The electric mixing valve 17 with a check valve is a valve for adjusting the temperature of hot water by mixing city water with the hot water flowing out of the hot water storage tank 2.

また、貯湯タンク２には貯湯タンク制御回路１９が設けられている。この貯湯タンク制御回路１９は、貯湯タンク２の温水温度、温水量をセンサ出力に基づいて検知し、その検知信号をヒートトポンプ制御装置７に送る。この検知信号に応じて、ヒートトポンプ制御装置７は貯湯タンク２の温水温度、温水量が目標値となるようにヒートポンプ１の動作、特に圧縮機の動作をフィードバック制御するようになっている。 Further, the hot water storage tank 2 is provided with a hot water storage tank control circuit 19. The hot water storage tank control circuit 19 detects the hot water temperature and the hot water amount of the hot water storage tank 2 based on the sensor output, and sends the detection signal to the heat pump control device 7. In response to this detection signal, the heat pump control device 7 feedback-controls the operation of the heat pump 1, particularly the operation of the compressor, so that the hot water temperature and the amount of hot water in the hot water storage tank 2 become target values.

＜第３の回路Ｃ３の構成＞
第３の回路Ｃ３は市水供給配管２０を介して、ヒートポンプ１の凝縮器６、貯湯タンク２及びすすぎ用タンク３に供給する回路である。市水供給配管２０とヒートポンプ１の凝縮器６の入口（ＩＮ）へ至る配管の間には前述の逆止弁付減圧器９及び定流量弁１０が設けられている。市水温水供給配管２０とすすぎ用タンク３の間には第３の電磁弁ＤＢ３が設けられている。 <Structure of the third circuit C3>
The third circuit C3 is a circuit that supplies the heat pump 1 to the condenser 6, the hot water storage tank 2, and the rinsing tank 3 via the city water supply pipe 20. The pressure reducing device 9 with a check valve and the constant flow rate valve 10 described above are provided between the city water supply pipe 20 and the pipe leading to the inlet (IN) of the condenser 6 of the heat pump 1. A third solenoid valve DB3 is provided between the city water hot water supply pipe 20 and the rinsing tank 3.

また、すすぎ用タンク３の温水は、すすぎ用ポンプ２１を介して食器洗浄装置本体５のすすぎノズル２２に供給される。また、洗浄用タンク４の温水は、洗浄用ポンプ２３を介して食器洗浄装置本体５の洗浄ノズル２４に供給される。 Further, the hot water in the rinsing tank 3 is supplied to the rinsing nozzle 22 of the dishwashing apparatus main body 5 via the rinsing pump 21. Further, the hot water in the washing tank 4 is supplied to the washing nozzle 24 of the dishwashing apparatus main body 5 via the washing pump 23.

また、運転制御装置２５は、ヒートポンプ制御装置７及び貯湯タンク制御回路１９を統合的に制御することに加えて、第１、第２、第３の電磁弁ＤＢ１，ＤＢ２，ＤＢ３、第１及び第２の３方向弁Ｂ１，Ｂ２、逆止弁付き電動混合弁１７の開閉、循環ポンプ１６を制御する。図中の符合「Ｓ」は運転制御装置２５の制御信号を表している。なお、第１乃至第７の開閉弁ＳＢ〜ＳＢ７は手動式でも電動式でもよく、電動式の場合は運転制御装置２５により開閉を制御することができる。 In addition to controlling the heat pump control device 7 and the hot water storage tank control circuit 19 in an integrated manner, the operation control device 25 integrates the first, second, and third solenoid valves DB1, DB2, DB3, first, and first. It controls the opening and closing of the three-way valves B1 and B2 of 2 and the electric mixing valve 17 with a check valve, and the circulation pump 16. The sign "S" in the figure represents a control signal of the operation control device 25. The first to seventh on-off valves SB to SB7 may be a manual type or an electric type, and in the case of the electric type, the opening and closing can be controlled by the operation control device 25.

＜食器洗浄装置１００の運転＞
以下、食器洗浄装置１００の運転例を説明する。先ず、洗浄運転開始前に、予め第１の回路Ｃ１又は第２の回路Ｃ２を介してすすぎ用タンク３及び洗浄用タンク４にそれぞれ所定量のすすぎ用温水及び洗浄用温水を貯える。この場合、以下に説明する３つの方法がある。 <Operation of dishwashing device 100>
An operation example of the dishwashing apparatus 100 will be described below. First, before the start of the cleaning operation, a predetermined amount of hot water for rinsing and hot water for cleaning are stored in the rinsing tank 3 and the cleaning tank 4 via the first circuit C1 or the second circuit C2, respectively. In this case, there are three methods described below.

第１の方法は、ヒートポンプ１で生成された温水を第１の回路Ｃ１により、すすぎ用タンク３及び洗浄用タンク４に供給するという方法である。 The first method is a method in which the hot water generated by the heat pump 1 is supplied to the rinsing tank 3 and the cleaning tank 4 by the first circuit C1.

第２の方法は、すすぎ用タンク３に市水を流入させ、第２の回路Ｃ２により所定の温度、例えば８０℃まで炊き上げる方法である。この場合、上述の温水循環路を利用することができる。 The second method is a method in which city water flows into the rinsing tank 3 and is cooked to a predetermined temperature, for example, 80 ° C. by the second circuit C2. In this case, the above-mentioned hot water circulation path can be used.

第３の方法は、食器洗浄装置１００の運転を行わない期間、例えば夜間に第２の回路Ｃ２により所定の温度、例えば８５℃の温水を貯湯タンク２に貯湯しておき、洗浄運転直前にすすぎ用タンク３及び洗浄用タンク４に供給する方法である。第１及び第２の方法はすすぎ用タンク３等を所定温度、例えば８０℃の温水で満たすのに時間がかかるが、第３の方法は、予め貯えた温水を供給するので、時間を短縮することができる。 In the third method, hot water having a predetermined temperature, for example, 85 ° C. is stored in the hot water storage tank 2 by the second circuit C2 during a period when the dishwashing device 100 is not operated, for example, at night, and rinsed immediately before the washing operation. This is a method of supplying to the tank 3 and the cleaning tank 4. In the first and second methods, it takes time to fill the rinsing tank 3 and the like with hot water at a predetermined temperature, for example, 80 ° C., but in the third method, the hot water stored in advance is supplied, so that the time is shortened. be able to.

次に、食器洗浄装置１００の洗浄運転時には、すすぎ用タンク３に所定の流量で供給するので、このままでは貯湯量は減少していくことになる。特に、すすぎ用温水の流量は比較的大きく設定されるので、ヒートポンプ１の能力が小さいと流量が不足することになる。 Next, during the washing operation of the dishwashing device 100, the rinsing tank 3 is supplied with a predetermined flow rate, so that the amount of hot water stored will decrease as it is. In particular, since the flow rate of the hot water for rinsing is set to be relatively large, if the capacity of the heat pump 1 is small, the flow rate will be insufficient.

そこで、ヒートポンプ１の運転により第１の回路Ｃ１を介して温水をすすぎ用タンク３に流入させ、この第１の回路Ｃ１で不足するすすぎ用温水を第２の回路Ｃ２を介した温水と第３の回路Ｃ３を介した市水とで補うように、運転制御装置２５により、これらの回路の制御を行う。 Therefore, by operating the heat pump 1, hot water is made to flow into the rinsing tank 3 through the first circuit C1, and the rinsing hot water lacking in the first circuit C1 is combined with the hot water through the second circuit C2. The operation control device 25 controls these circuits so as to supplement with the city water via the circuit C3.

この場合、すすぎ用温水の必要流量を例えば２リットル／分とし、第１の回路Ｃ１を経由した温水の流量を１リットル／分とすると、不足分の１リットル／分は、貯湯タンク２からの温水と市水とで補うことになる。市水を混合する理由は、貯湯タンク２を小型化するためである。その分温水の温度は低下するが、貯湯タンク２の温水の温度を例えば８５℃と高くすることにより、すすぎ用温水の温度を約８０℃に保持することができる。 In this case, if the required flow rate of the hot water for rinsing is, for example, 2 liters / minute, and the flow rate of the hot water via the first circuit C1 is 1 liter / minute, the shortage of 1 liter / minute is from the hot water storage tank 2. It will be supplemented with hot water and city water. The reason for mixing the city water is to reduce the size of the hot water storage tank 2. Although the temperature of the hot water decreases by that amount, the temperature of the hot water for rinsing can be maintained at about 80 ° C. by raising the temperature of the hot water in the hot water storage tank 2 to, for example, 85 ° C.

このように、本発明によれば、洗浄運転開始前に予めすすぎ用タンクに所定量のすすぎ用温水を貯えておき、洗浄運転時にヒートポンプ１を介してすすぎ用タンク３に温水を供給すると共に、不足するすすぎ用温水を貯湯タンク２に貯えられた温水と市水とで補っているので、ヒートポンプ１を構成する圧縮機、並びに貯湯タンク２を小型化し、ランニングコストの低減と省スペース化を実現することができる。 As described above, according to the present invention, a predetermined amount of hot water for rinsing is stored in the rinsing tank in advance before the start of the washing operation, and the hot water is supplied to the rinsing tank 3 via the heat pump 1 during the washing operation. Since the shortage of hot water for rinsing is supplemented by the hot water stored in the hot water storage tank 2 and the city water, the compressor constituting the heat pump 1 and the hot water storage tank 2 are downsized to reduce running costs and space. can do.

本発明には、上述の実施形態の他にも、更には上述した具体的記述以外にも、本発明の趣旨を逸脱しない限りにおいて、当業者の知識に基づいて、種々なる変更、修正、改良等を加えることができる。 In addition to the above-described embodiments, the present invention includes various changes, modifications, and improvements based on the knowledge of those skilled in the art, as long as the gist of the present invention is not deviated from the above-mentioned specific description. Etc. can be added.

１ ヒートポンプ
２ 貯湯タンク
３ すすぎ用タンク
４ 洗浄用タンク
５ 食器洗浄装置本体
６ 凝縮器
７ ヒートポンプ制御装置
８ 第１の温水供給配管
９ 逆止弁付減圧器
１０ 定流量弁
１１ すすぎ用熱交換器
１２ 還流配管
１３ 洗浄用熱交換器
１４ 逆止弁
１５ 循環配管
１６ 循環ポンプ
１７ 逆止弁付き電動混合弁
１８ 第２の温水供給配管
１９ 貯湯タンク制御回路
２０ 市水供給配管
２１ すすぎ用ポンプ
２２ すすぎノズル
２３ 洗浄用ポンプ
２４ 洗浄ノズル
２５ 運転制御装置
Ｕ１ ヒートポンプ／貯湯タンクユニット
Ｕ２ すすぎ用ユニット
Ｃ１ 第１の回路
Ｃ２ 第２の回路
Ｃ３ 第３の回路 1 Heat pump 2 Hot water storage tank 3 Rinse tank 4 Washing tank 5 Dishwashing device body 6 Condenser 7 Heat pump control device 8 First hot water supply pipe 9 Pressure reducing device with check valve 10 Constant flow valve 11 Rinse heat exchanger 12 Circulation pipe 13 Cleaning heat exchanger 14 Check valve 15 Circulation pipe 16 Circulation pump 17 Electric mixing valve with check valve 18 Second hot water supply pipe 19 Hot water storage tank control circuit 20 City water supply pipe 21 Rinse pump 22 Rinse nozzle 23 Cleaning pump 24 Cleaning nozzle 25 Operation control device U1 Heat pump / hot water storage tank unit U2 Rinse unit C1 First circuit C2 Second circuit C3 Third circuit

Claims (5)

ヒートポンプと、
貯湯タンクと、
すすぎ用タンクと、
洗浄用タンクと、
前記ヒートポンプと外部から供給される市水との熱交換により生成された温水を、前記貯湯タンクを介することなく、前記すすぎ用タンク及び前記洗浄用タンクに直接供給する第１の回路と、
前記ヒートポンプと前記市水との熱交換により生成された温水を前記貯湯タンクに貯湯し、この貯湯タンクに貯湯された温水を前記すすぎ用タンク及び前記洗浄用タンクに供給する第２の回路と、
前記市水を前記すすぎ用タンクに供給する第３の回路と、を備える食器洗浄装置であって、
この食器洗浄装置の洗浄運転開始前に予め前記第１の回路又は第２の回路を介して前記すすぎ用タンクに所定量のすすぎ用温水を貯えておき、この食器洗浄装置の洗浄運転時に前記すすぎ用タンクに第１の回路を介して温水を流入させ、この第１の回路で不足するすすぎ用温水を前記第２の回路を介した温水と前記第３の回路を介した前記市水とで補うように前記第１、第２及び第３の回路を制御する制御装置と、を備えることを特徴とする食器洗浄装置。 With a heat pump
Hot water storage tank and
Rinse tank and
Cleaning tank and
A first circuit that directly supplies hot water generated by heat exchange between the heat pump and city water supplied from the outside to the rinsing tank and the cleaning tank without going through the hot water storage tank.
A second circuit that stores hot water generated by heat exchange between the heat pump and the city water in the hot water storage tank and supplies the hot water stored in the hot water storage tank to the rinsing tank and the cleaning tank.
A dishwashing apparatus comprising a third circuit for supplying the city water to the rinsing tank.
A predetermined amount of hot water for rinsing is stored in the rinsing tank in advance via the first circuit or the second circuit before the start of the washing operation of the dishwashing device, and the rinsing is performed during the washing operation of the dishwashing device. Hot water is flowed into the tank through the first circuit, and the hot water for rinsing that is insufficient in the first circuit is mixed with the hot water through the second circuit and the city water through the third circuit. A dishwashing device including a control device for controlling the first, second, and third circuits so as to supplement the first, second, and third circuits. 前記第１の回路は、前記ヒートポンプにより生成された温水が供給され、この温水と前記すすぎ用タンクに貯えられたすすぎ用温水との熱交換を行うことで、すすぎ用温水の保温または加熱を行う、すすぎ用熱交換器を備えることを特徴とする請求項１に記載の食器洗浄装置。 In the first circuit, hot water generated by the heat pump is supplied, and the hot water for rinsing is kept warm or heated by exchanging heat between the hot water and the hot water for rinsing stored in the rinsing tank. The dishwashing apparatus according to claim 1, further comprising a heat exchanger for rinsing. 前記すすぎ用熱交換器から流出する温水を前記ヒートポンプに還流させる還流路を備え、この還流路が形成されることで、前記すすぎ用タンクに貯えられたすすぎ用温水の保温または加熱を行うことを特徴とする請求項２に記載の食器洗浄装置。 A return path for returning the hot water flowing out of the rinse heat exchanger to the heat pump is provided, and by forming this return path, the hot water for rinsing stored in the rinse tank can be kept warm or heated. The dishwashing apparatus according to claim 2. 前記すすぎ用熱交換器に連結され、このすすぎ用熱交換器から流出する温水と前記洗浄用タンクに貯えられた洗浄用温水との熱交換を行うことで、洗浄用温水の保温を行う洗浄用熱交換器を備えることを特徴とする請求項２または３に記載の食器洗浄装置。 For cleaning, which is connected to the rinsing heat exchanger and exchanges heat between the hot water flowing out of the rinsing heat exchanger and the cleaning hot water stored in the cleaning tank to keep the cleaning hot water warm. The dishwashing apparatus according to claim 2 or 3, further comprising a heat exchanger. 前記第２の回路は、前記貯湯タンクから流出する温水に前記市水を混合する混合弁を備えることを特徴とする請求項１乃至４のいずれかに記載の食器洗浄装置。 The dishwashing apparatus according to any one of claims 1 to 4, wherein the second circuit includes a mixing valve that mixes the city water with the hot water flowing out of the hot water storage tank.
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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02224631A (en) * 1988-11-17 1990-09-06 Sanyo Electric Co Ltd Washer
JPH1080391A (en) * 1996-09-10 1998-03-31 Hoshizaki Electric Co Ltd Warm water generating apparatus of tableware washing machine
JP2004263954A (en) * 2003-03-03 2004-09-24 Matsushita Electric Ind Co Ltd Heat pump hot water supply device
JP2006023064A (en) * 2004-06-08 2006-01-26 Denso Corp Heat pump type hot water supply apparatus
JP2009192154A (en) * 2008-02-14 2009-08-27 Panasonic Electric Works Co Ltd Hot water supply system
JP2014202424A (en) * 2013-04-05 2014-10-27 日立アプライアンス株式会社 Water heater
KR20170045480A (en) * 2015-10-19 2017-04-27 린나이코리아 주식회사 Hot-water system for dish washer
KR20180077754A (en) * 2016-12-29 2018-07-09 린나이코리아 주식회사 Dishwasher system
KR20180077741A (en) * 2016-12-29 2018-07-09 린나이코리아 주식회사 Dishwasher

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02224631A (en) * 1988-11-17 1990-09-06 Sanyo Electric Co Ltd Washer
JPH1080391A (en) * 1996-09-10 1998-03-31 Hoshizaki Electric Co Ltd Warm water generating apparatus of tableware washing machine
JP2004263954A (en) * 2003-03-03 2004-09-24 Matsushita Electric Ind Co Ltd Heat pump hot water supply device
JP2006023064A (en) * 2004-06-08 2006-01-26 Denso Corp Heat pump type hot water supply apparatus
JP2009192154A (en) * 2008-02-14 2009-08-27 Panasonic Electric Works Co Ltd Hot water supply system
JP2014202424A (en) * 2013-04-05 2014-10-27 日立アプライアンス株式会社 Water heater
KR20170045480A (en) * 2015-10-19 2017-04-27 린나이코리아 주식회사 Hot-water system for dish washer
KR20180077754A (en) * 2016-12-29 2018-07-09 린나이코리아 주식회사 Dishwasher system
KR20180077741A (en) * 2016-12-29 2018-07-09 린나이코리아 주식회사 Dishwasher

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