JP2020514809A - 非再入型の2次的にひずめる(nrqd)回折格子及び回折格子プリズムに基づく4次元多平面広帯域結像システム - Google Patents
非再入型の2次的にひずめる(nrqd)回折格子及び回折格子プリズムに基づく4次元多平面広帯域結像システム Download PDFInfo
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Abstract
Description
再入型刻線を有しないQD回折格子であって、多素子光学系で各回折次数に対応する焦点距離及び空間的位置を生成するための非再入型の2次的にひずめる(NRQD)回折格子と、
空間の中で波長に基づいて光路を調整することによって、非再入型の2次的にひずめる(NRQD)回折格子による広帯域光の分散を補正するためにペアで設けられた回折格子プリズムと、
非再入型の2次的にひずめる(NRQD)回折格子の各回折次数に対応する光学系の焦点距離を効果的に修正し、光路を調整することによって回折格子プリズムシステムの設計上のニーズを満たすためのレンズシステムと、
光検出デバイスとを含む。
Claims (13)
- 光学素子として、
再入型刻線を有しないQD回折格子であって、多素子光学系で各回折次数に対応する焦点距離及び空間的位置を生成するための非再入型の2次的にひずめる(NRQD)回折格子と、
空間の中で波長に基づいて光路を調整することによって、非再入型の2次的にひずめる(NRQD)回折格子による広帯域光の分散を補正するためにペアで設けられた回折格子プリズムと、
非再入型の2次的にひずめる(NRQD)回折格子の各回折次数に対応する光学系の焦点距離を効果的に修正し、光路を調整することによって回折格子プリズムシステムの設計上のニーズを満たすためのレンズシステムと、
光検出デバイスとを含む
ことを特徴とする4次元多平面広帯域結像システム。 - 前記NRQD回折格子は、2つ以上のNRQD円弧マスクパターンを組み合わせたマスクパターンにより設計することによって、複数の物平面(4つ以上)の集束像を同一の像平面に合理的に分布させる
請求項1に記載の4次元多平面広帯域結像システム。 - 前記NRQD回折格子は、マルチレベル(デジタル型)又は連続(アナログ型)の断面構造である
請求項1または2に記載の4次元多平面広帯域結像システム。 - 周期的に分布する溝構造が異なる透過率、異なる反射率、異なる光学的厚さ又は異なる偏光感度を有するものを含む様々なタイプのNRQD回折格子が使用される
請求項1ないし3のいずれかに記載の4次元多平面広帯域結像システム。 - 前記回折格子プリズムが、体積位相ホログラフィック(volume phase holographic(VPH))回折格子プリズムである
請求項1に記載の4次元多平面広帯域結像システム。 - 前記回折格子プリズムの設計は、その回折格子構造の刻線密度により限定でき、回折格子プリズムの基底材料の屈折率が1.4〜1.5である場合、刻線密度の範囲は1mm当たり100ないし800刻線である
請求項1に記載の4次元多平面広帯域結像システム。 - 前記回折格子プリズムの設計は、その回折格子構造の刻線密度により限定でき、回折格子プリズムの基底材料の屈折率が1.5〜1.6である場合、刻線密度の範囲は1mm当たり100ないし900刻線である
請求項1に記載の4次元多平面広帯域結像システム。 - 前記回折格子プリズムの設計は、その回折格子構造の刻線密度により限定でき、回折格子プリズムの基底材料の屈折率が1.6〜1.7である場合、刻線密度の範囲は1mm当たり100ないし1200刻線である
請求項1に記載の4次元多平面広帯域結像システム。 - 前記回折格子プリズムの設計は、その回折格子構造の刻線密度により限定でき、回折格子プリズムの基底材料の屈折率が1.7より大きい場合、刻線密度の範囲は1mm当たり100ないし1400刻線である
請求項1に記載の4次元多平面広帯域結像システム。 - 回折格子プリズム構造を構成する回折格子とプリズムは、屈折率が異なる
請求項1または5に記載の4次元多平面広帯域結像システム。 - 2対以上の回折格子プリズムを使用して、2つ以上のNRQD回折格子による広帯域光の分散を補正する
請求項1、2、5のいずれかに記載の4次元多平面広帯域結像システム。 - 蛍光、明視野/暗視野、位相差、微分干渉(DIC)及び構造化照明を含む様々な形態の顕微鏡製品に利用可能である
請求項1、2、5のいずれかに記載の4次元多平面広帯域結像システム。 - 顕微技術、天文光学、光によるデータ記憶、生物医学画像形成、波面解析及び仮想現実/拡張現実を含む様々な最新の技術と柔軟に組み合わせることができる
請求項1、2、5のいずれかに記載の4次元多平面広帯域結像システム。
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CN114217456B (zh) * | 2021-12-31 | 2024-04-12 | 浙江全视通科技有限公司 | 一种3d成像*** |
CN114967367A (zh) * | 2022-05-31 | 2022-08-30 | 中国科学院光电技术研究所 | 一种用于透明基底的双面光刻方法 |
CN114994938B (zh) * | 2022-07-19 | 2022-10-25 | 中国科学院长春光学精密机械与物理研究所 | 色散增强光学元件及光谱合束、锁定、测量结构 |
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