JP2020146664A - Water treatment device - Google Patents

Water treatment device Download PDF

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JP2020146664A
JP2020146664A JP2019048516A JP2019048516A JP2020146664A JP 2020146664 A JP2020146664 A JP 2020146664A JP 2019048516 A JP2019048516 A JP 2019048516A JP 2019048516 A JP2019048516 A JP 2019048516A JP 2020146664 A JP2020146664 A JP 2020146664A
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water
tank
pipe
reaction tank
air lift
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JP7240912B2 (en
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長野　晃弘
Akihiro Nagano
晃弘 長野
祐典 松本
Yusuke Matsumoto
祐典 松本
加藤　薫
Kaoru Kato
薫 加藤
孝 松枝
Takashi Matsue
孝 松枝
信宏 田中
Nobuhiro Tanaka
信宏 田中
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Sanki Engineering Co Ltd
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Sanki Engineering Co Ltd
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/10—Biological treatment of water, waste water, or sewage

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Abstract

To provide a water treatment device capable of purifying water with high efficiency by a simple configuration.SOLUTION: A water treatment device includes a reaction tank 20 storing water W as a treatment target with a carrier 1, an air lift pipe 29 having one end at a bottom of the reaction tank 20 and the other end above the water surface, an air supply pipe 30 feeding gas A into the air lift pipe 29, and an inclined plate 32c forming a downward slope from the other end of the airlift pipe 29 to the water surface of the reaction tank 20. By blowing gas A into the air lift pipe 29 from the air supply pipe 30, the carrier 1 and water W in the reaction tank 20 are inhaled into the air lift pipe 29, and then discharged with gas A from the other end of the air lift pipe 29, leading them to the inclined plate 32c. While the carrier 1 is dropped along the inclined plate 32c and returned to the reaction tank 20, the water treatment device is configured to discharge water W flowing downward through the gap of the inclined plate 32c through the discharge pipe 33 to the outside, and a distribution tank 40 is provided to return part of the water W passing through the discharge pipe 33 to the reaction tank 20.SELECTED DRAWING: Figure 1

Description

本発明は、排水や汚水等の水を浄化処理するための装置に関する。 The present invention relates to an apparatus for purifying water such as wastewater and sewage.

排水や汚水といった水を浄化する技術として、生物処理と呼ばれる方法が一般的に用いられている。水中に含まれる有機物等の物質を、微生物の働きにより分解し、あるいは無害化するのである。 As a technique for purifying water such as wastewater and sewage, a method called biological treatment is generally used. Substances such as organic substances contained in water are decomposed or rendered harmless by the action of microorganisms.

図７は、こうした生物処理を行うための装置として従来用いられている水処理装置の一例を示している。本従来例の水処理装置においては、活性炭やアンスラサイト、軽量骨材、あるいは樹脂等で形成された粒状の固形物である担体１が反応槽２内に投入されると共に、処理対象である水Ｗが反応槽２に導入されて、担体１に担持された微生物により水Ｗが浄化処理されるようになっている。反応槽２は、内部に水平方向に沿って設けられた仕切板３により上下に分割されており、該仕切板３の上側の処理室４に担体１が投入される。処理室４における仕切板３付近の高さには曝気管５が設けられ、外部の曝気ブロワ６から処理室４内へ空気Ａが送り込まれるようになっている。 FIG. 7 shows an example of a water treatment device conventionally used as a device for performing such biological treatment. In the water treatment apparatus of the present conventional example, the carrier 1 which is a granular solid substance formed of activated carbon, anthracite, lightweight aggregate, resin or the like is charged into the reaction tank 2 and the water to be treated is treated. W is introduced into the reaction vessel 2, and the water W is purified by the microorganisms supported on the carrier 1. The reaction tank 2 is divided into upper and lower parts by a partition plate 3 provided inside along the horizontal direction, and the carrier 1 is charged into the processing chamber 4 above the partition plate 3. An aeration pipe 5 is provided at a height near the partition plate 3 in the processing chamber 4, and air A is sent into the processing chamber 4 from an external aeration blower 6.

仕切板３には集水ストレーナ７が設けられており、処理室４において処理された水Ｗが集水ストレーナ７により担体１を除かれて下方の集水室８へ抜けるようになっている。集水室８は、さらに処理水管９を介して処理水槽１０に接続されている。 A water collecting strainer 7 is provided on the partition plate 3, and the water W treated in the treatment chamber 4 is removed from the carrier 1 by the water collecting strainer 7 and escapes to the lower water collecting chamber 8. The water collection chamber 8 is further connected to the treatment water tank 10 via a treatment water pipe 9.

また、集水室８には外部の逆洗ブロワ１１から逆洗用の送気管１２を通じて空気Ａを送り込むことができるようになっており、処理水槽１０の下方には、逆洗用の送水管１３の一端が接続されている。送水管１３の他端は処理水管９に接続されており、送水管１３の途中に備えた逆洗ポンプ１４の作動により、処理水槽１０内の水Ｗを処理水槽１０から反応槽２へ送り込むことができるようになっている。 In addition, air A can be sent from the external backwash blower 11 to the water collection chamber 8 through the backwash air supply pipe 12, and the backwash water pipe is below the treatment water tank 10. One end of 13 is connected. The other end of the water supply pipe 13 is connected to the treatment water pipe 9, and the water W in the treatment water tank 10 is sent from the treatment water tank 10 to the reaction tank 2 by the operation of the backwash pump 14 provided in the middle of the water supply pipe 13. Can be done.

反応槽２の上部にはサイホン管１５が設けられており、反応槽２内の水Ｗが一定の水位を超えると、超過分がサイホン管１５を通じて外部へ排出されるようになっている。 A siphon tube 15 is provided in the upper part of the reaction tank 2, and when the water W in the reaction tank 2 exceeds a certain water level, the excess amount is discharged to the outside through the siphon tube 15.

水処理を行う場合、反応槽２に対し、上方から処理対象の水Ｗが導入される。水Ｗ中の物質は、処理室４において担体１に担持された微生物の働きによって処理される。水Ｗは、処理室４内を下方へ向かう間に微生物反応により浄化され、仕切板３に設けられた集水ストレーナ７を通じて集水室８へ抜ける。さらに、処理水管９を通って処理水槽１０へ移り、沈殿等の必要な処理を経て、環境中へ放出される。 When water treatment is performed, water W to be treated is introduced into the reaction tank 2 from above. The substance in water W is treated by the action of microorganisms supported on the carrier 1 in the treatment chamber 4. The water W is purified by a microbial reaction while moving downward in the treatment chamber 4, and escapes to the water collection chamber 8 through the water collection strainer 7 provided on the partition plate 3. Further, it is transferred to the treated water tank 10 through the treated water pipe 9, and is released into the environment through necessary treatment such as precipitation.

浄化処理の実行中、反応槽２の処理室４に対しては、曝気ブロワ６から曝気管５を通して空気Ａが送り込まれる。これにより水Ｗ中に酸素が溶け込まされ、処理室４内の水Ｗ中の物質が、担体１に担持された好気性微生物により酸化される。 During the execution of the purification treatment, air A is sent from the aeration blower 6 to the treatment chamber 4 of the reaction tank 2 through the aeration pipe 5. As a result, oxygen is dissolved in the water W, and the substance in the water W in the treatment chamber 4 is oxidized by the aerobic microorganisms supported on the carrier 1.

運転時間の経過に伴い、処理室４内の担体１には微生物が繁殖し、担体１の表面に生物膜からなる固形物が形成される。こうした固形物は、担体１の目詰まりや固着を生じさせ、水Ｗの通過抵抗を増大させ、浄化効率の低下を招く。そこで、このような反応槽２を備えた水処理装置を運転する場合は、定期的に逆洗を行い、担体１の表面の固形物を剥がし落とす必要がある。 With the lapse of the operation time, microorganisms propagate on the carrier 1 in the processing chamber 4, and a solid substance composed of a biological membrane is formed on the surface of the carrier 1. Such a solid substance causes clogging or sticking of the carrier 1, increases the passage resistance of water W, and causes a decrease in purification efficiency. Therefore, when operating a water treatment apparatus provided with such a reaction tank 2, it is necessary to periodically perform backwashing to remove solid matter on the surface of the carrier 1.

逆洗を行う際は、逆洗ブロワ１１から反応槽２の集水室８へ多量の空気Ａを送り込む。集水室８へ送り込まれた空気Ａは、仕切板３の集水ストレーナ７を通じて処理室４へ流れ込む。処理室４では、流れ込んだ空気Ａの勢いにより、水Ｗと共に担体１が撹拌される。担体１が互いに衝突し、表面を擦り合わせながら水Ｗ中を上下に動くことで、担体１の表面に付着する固形物が剥離する。 When performing backwashing, a large amount of air A is sent from the backwash blower 11 to the water collecting chamber 8 of the reaction tank 2. The air A sent to the water collecting chamber 8 flows into the treatment chamber 4 through the water collecting strainer 7 of the partition plate 3. In the treatment chamber 4, the carrier 1 is agitated together with the water W by the force of the air A that has flowed in. The carriers 1 collide with each other and move up and down in water W while rubbing the surfaces, so that the solid matter adhering to the surface of the carrier 1 is peeled off.

続いて、送水管１３に設けられた逆洗ポンプ１４を作動させ、処理水槽１０内の水Ｗを反応槽２の集水室８へ送り込む。水Ｗは集水ストレーナ７を通じて処理室４へ流れ込み、先の空気Ａの吹き込みに伴い剥がれ落ちた固形物と共に、サイホン管１５から外部へ排出される。 Subsequently, the backwash pump 14 provided in the water supply pipe 13 is operated to send the water W in the treatment water tank 10 to the water collection chamber 8 of the reaction tank 2. The water W flows into the treatment chamber 4 through the water collecting strainer 7, and is discharged to the outside from the siphon pipe 15 together with the solid matter that has peeled off due to the previous blowing of the air A.

ところで、このような水処理装置では、本来の役割である水Ｗの浄化処理と、逆洗とを同時に実行することができない。つまり、逆洗の実行中は水Ｗの浄化処理を行うことができないので、連続的な浄化処理が要求される場所では複数個の反応槽が必要となり、浄化のための設備が大型化してしまう。また、逆洗を常時実行することはできないので、逆洗を行ってから次の逆洗を行うまでの間、徐々に担体１に固形物が増え、浄化効率が低下していってしまう。よって、一定以上の浄化効率を確保しようとすれば設備全体がさらに大型化してしまうという問題がある。 By the way, in such a water treatment device, the original role of purifying water W and backwashing cannot be performed at the same time. In other words, since the water W cannot be purified during the backwashing, a plurality of reaction tanks are required in places where continuous purification is required, and the equipment for purification becomes large. .. Further, since the backwash cannot be performed all the time, solid matter gradually increases in the carrier 1 from the backwash to the next backwash, and the purification efficiency is lowered. Therefore, there is a problem that the entire facility becomes larger if the purification efficiency above a certain level is to be secured.

また、逆洗のための逆洗ブロワ１１や送気管１２、送水管１３、逆洗ポンプ１４といった機構を備える必要があるし、逆洗に十分な量の水を確保するためには処理水槽１０の容積も大きくしなくてはならない。 Further, it is necessary to provide a mechanism such as a backwash blower 11 for backwashing, an air supply pipe 12, a water supply pipe 13, and a backwash pump 14, and a treatment water tank 10 is required to secure a sufficient amount of water for backwashing. The volume of the water pipe must also be increased.

そこで、こうした問題を解決し、コンパクトで浄化効率の高い水処理装置を実現し得る技術として、本願出願人により下記特許文献１に記載の下向流型生物膜浄化装置が既に提案され、実用化されている。 Therefore, as a technique capable of solving these problems and realizing a compact and highly efficient water treatment apparatus, the applicant of the present application has already proposed and put into practical use the downward flow type biofilm purification apparatus described in Patent Document 1 below. Has been done.

図８〜図１０は下記特許文献１に記載の下向流型生物膜浄化装置と同等の水処理装置を示している。ここに示した水処理装置は、直径２ｍｍ〜１０ｍｍ程度の粒状の固形物である担体１が投入された反応槽２０と、該反応槽２０内に酸素を供給する散気装置２１を備えている。散気装置２１は、反応槽２０内に配置された散気管２１ａに対し、外部の散気ブロワ２２から反応槽２０内へ酸素を含む気体（例えば、空気）Ａを送り込むようになっている。 8 to 10 show a water treatment device equivalent to the downward flow type biofilm purification device described in Patent Document 1 below. The water treatment apparatus shown here includes a reaction tank 20 in which a carrier 1 which is a granular solid substance having a diameter of about 2 mm to 10 mm is charged, and an air diffuser 21 for supplying oxygen into the reaction tank 20. .. The air diffuser 21 is adapted to send a gas (for example, air) A containing oxygen from an external air diffuser 22 into the reaction tank 20 to the air diffuser 21a arranged in the reaction tank 20.

反応槽２０内における散気管２１ａよりも下方の位置には、下向きに開口２３ａを有する椀型の集水室２３が設けられている。開口２３ａの高さは、反応槽２０の最下部よりは上方である。集水室２３の内部には、処理水管２４の一端が開口している。処理水管２４は、集水室２３の内側から開口２３ａを通り、さらに反応槽２０の壁を貫通して外部へ延び、他端は処理水槽２５に接続されている。 A bowl-shaped water collecting chamber 23 having a downward opening 23a is provided at a position below the air diffuser 21a in the reaction tank 20. The height of the opening 23a is above the bottom of the reaction vessel 20. One end of the treated water pipe 24 is open inside the water collecting chamber 23. The treated water pipe 24 passes through the opening 23a from the inside of the water collecting chamber 23, further penetrates the wall of the reaction tank 20 and extends to the outside, and the other end is connected to the treated water tank 25.

処理対象の原水である水Ｗは、反応槽２０の外に設けた原水槽２６に貯留され、原水ポンプ２７によって汲み上げられ、原水管２８を通じて反応槽２０に供給されるようになっている。 The raw water W to be treated is stored in a raw water tank 26 provided outside the reaction tank 20, pumped up by the raw water pump 27, and supplied to the reaction tank 20 through the raw water pipe 28.

水処理の際には、反応槽２０に対して処理対象である水Ｗが上方から導入されると共に、散気装置２１から空気Ａが供給される。そして、水Ｗが担体１の槽を下方へ通過する間、微生物の働きによって浄化される。浄化された水は、集水室２３から処理水管２４に引き込まれ、処理水槽２５に導かれる。 At the time of water treatment, the water W to be treated is introduced into the reaction tank 20 from above, and the air A is supplied from the air diffuser 21. Then, while the water W passes downward through the tank of the carrier 1, it is purified by the action of microorganisms. The purified water is drawn from the water collecting chamber 23 into the treated water pipe 24 and guided to the treated water tank 25.

そして、本例の場合、このような水Ｗの浄化処理と並行して、担体１の洗浄処理をも実行できるようになっている。 Then, in the case of this example, the cleaning treatment of the carrier 1 can be performed in parallel with the purification treatment of the water W.

本例における反応槽２０は、下部に下方へ向かって断面積の小さくなる逆円錐形の縮径部２０ａを備え、縮径部２０ａよりも上側は、高さによらず径の等しい円柱形の形状である。このような形状の反応槽２０の中心軸に沿って、担体１を洗浄するためのエアリフト管２９が設けられている。エアリフト管２９は、下端を縮径部２０ａの最下部付近に、上端を反応槽２０における水面よりも上側に配置されており、下端付近には、エアリフト管２９内へ気体（例えば、空気）Ａを導入するための導気管３０の一端が接続されている。導気管３０は反応槽２０の外部へ延びており、導気管３０の他端から洗浄用ブロワ３１によりエアリフト管２９内へ空気Ａが送り込まれるようになっている。 The reaction tank 20 in this example is provided with an inverted conical reduced diameter portion 20a whose cross section decreases downward, and the upper side of the reduced diameter portion 20a is a cylindrical shape having the same diameter regardless of the height. The shape. An air lift pipe 29 for cleaning the carrier 1 is provided along the central axis of the reaction tank 20 having such a shape. The lower end of the air lift pipe 29 is arranged near the lowermost portion of the reduced diameter portion 20a, and the upper end is arranged above the water surface in the reaction tank 20. In the vicinity of the lower end, gas (for example, air) A enters the air lift pipe 29. One end of the air guide tube 30 for introducing the gas is connected. The air guide pipe 30 extends to the outside of the reaction tank 20, and air A is sent into the air lift pipe 29 by the cleaning blower 31 from the other end of the air guide pipe 30.

エアリフト管２９の上端部の周囲には、分離装置３２が設置されている。分離装置３２は、本体部３２ａと、遮蔽板３２ｂを備えている。本体部３２ａは、エアリフト管２９の上部を囲むように配置され、エアリフト管２９の上端から径方向外側に向かって下り勾配をなす傾斜板３２ｃと、該傾斜板３２ｃの下方に配置される受け皿３２ｄを備えている。傾斜板３２ｃは、両面間を水Ｗが通過でき、且つ担体１の粒を通さない程度の隙間を備えた板状の部材であり、例えば金網やパンチングメタル、あるいは柵状の部材等である。本例の場合、図１０に示す如く、長方形状の傾斜板３２ｃが４枚、平面視でエアリフト管２９を中心としてＸ字状に配置されている（図１０では、傾斜板３２ｃとしては手前側にあたる２枚のみが表れている）。４枚の傾斜板３２ｃの上辺は、正方形をなしてエアリフト管２９の上端を囲んでおり、該正方形を覆うように略四角台形状の誘導部３２ｅが設置され、エアリフト管２９の上端は、誘導部３２ｅの上部の中心に開口している。傾斜板３２ｃの上辺と、平面視で円形であるエアリフト管２９の上端の間が、誘導部３２ｅにより接続される形である。 A separation device 32 is installed around the upper end of the air lift pipe 29. The separation device 32 includes a main body portion 32a and a shielding plate 32b. The main body 32a is arranged so as to surround the upper portion of the air lift pipe 29, and has an inclined plate 32c having a downward slope from the upper end of the air lift pipe 29 in the radial direction outward and a saucer 32d arranged below the inclined plate 32c. It has. The inclined plate 32c is a plate-shaped member having a gap such that water W can pass between both sides and does not allow the particles of the carrier 1 to pass through, and is, for example, a wire mesh, a punching metal, a fence-shaped member, or the like. In the case of this example, as shown in FIG. 10, four rectangular inclined plates 32c are arranged in an X shape around the air lift pipe 29 in a plan view (in FIG. 10, the inclined plate 32c is on the front side). Only two of them are shown). The upper side of the four inclined plates 32c forms a square and surrounds the upper end of the air lift pipe 29. A substantially square trapezoidal guide portion 32e is installed so as to cover the square, and the upper end of the air lift pipe 29 guides. It opens in the center of the upper part of the portion 32e. The upper side of the inclined plate 32c and the upper end of the air lift pipe 29, which is circular in a plan view, are connected by the guide portion 32e.

各傾斜板３２ｃの傾斜方向に沿った２辺には、それぞれ上方へ立ち上がるように縁部３２ｆが設けられている。 Edges 32f are provided on the two sides of each inclined plate 32c along the inclined direction so as to rise upward.

遮蔽板３２ｂは、円筒面状の形状をなす部材であり、本体部３２ａの上方にエアリフト管２９の上端を囲むように設置される。遮蔽板３２ｂの下端は、本体部３２ａの上面をなす誘導部３２ｅあるいは傾斜板３２ｃの上部に対し、少なくとも担体１の通過を許容する程度の距離を開けて配置される。 The shielding plate 32b is a member having a cylindrical surface shape, and is installed above the main body portion 32a so as to surround the upper end of the air lift pipe 29. The lower end of the shielding plate 32b is arranged at a distance that allows at least the passage of the carrier 1 with respect to the upper portion of the guiding portion 32e or the inclined plate 32c forming the upper surface of the main body portion 32a.

受け皿３２ｄは、傾斜板３２ｃおよび誘導部３２ｅの下方に配置される皿状の部材であり、後述するように、傾斜板３２ｃから下方へ流れる水Ｗを受けるために設置される。一方、受け皿３２ｄは、傾斜板３２ｃに沿って落ちる担体１を受けることがないよう、各傾斜板３２ｃにあたる部分の縁が、傾斜板３２ｃの下辺を超えて径方向外側に張り出さないように設けられる。受け皿３２ｄの中心は、エアリフト管２９が貫通している。 The saucer 32d is a dish-shaped member arranged below the inclined plate 32c and the guide portion 32e, and is installed to receive the water W flowing downward from the inclined plate 32c, as will be described later. On the other hand, the saucer 32d is provided so that the edge of the portion corresponding to each inclined plate 32c does not extend radially outward beyond the lower side of the inclined plate 32c so as not to receive the carrier 1 falling along the inclined plate 32c. Be done. The air lift pipe 29 penetrates the center of the saucer 32d.

受け皿３２ｄには排出管３３の一端が接続されており、受け皿３２ｄの受けた水Ｗを外部へ排出できるようになっている。排出管３３の他端は、反応槽２０とは別に設けた洗浄水処理槽３４に接続されている。洗浄水処理槽３４の上部には、戻し管３５の一端が接続され、戻し管３５の他端は原水槽２６に接続されている。 One end of the discharge pipe 33 is connected to the saucer 32d so that the water W received by the saucer 32d can be discharged to the outside. The other end of the discharge pipe 33 is connected to a washing water treatment tank 34 provided separately from the reaction tank 20. One end of the return pipe 35 is connected to the upper part of the wash water treatment tank 34, and the other end of the return pipe 35 is connected to the raw water tank 26.

担体１の洗浄処理は、洗浄用ブロワ３１からエアリフト管２９に対して空気Ａを吹き込むことによって行う。洗浄用ブロワ３１から吹き込まれた空気Ａは、導気管３０からエアリフト管２９に到達すると、エアリフト管２９内を上方へ向かう。この際、エアリフト管２９の下端からは、反応槽２０の底部に溜まった担体１が水Ｗと共に吸入され、空気Ａの動きに伴ってエアリフト管２９内を上昇する。ここで、エアリフト管２９の下端は、下向きの傾斜を有する縮径部２０ａの最下部に開口しているので、反応槽２０の底部に溜まった担体１はエアリフト管２９の下端部の開口付近に自重によって集まり、これにより、エアリフト管２９への担体１の吸入がスムーズに行われる。尚、集水室２３は、担体１の溜まる反応槽２０の下部に位置しているが、開口２３ａが下を向くように配置されているので、浄化されて集水室２３から処理水管２４を通じて処理水槽２５へ抜き出される水Ｗに関しては、担体１が分離された状態で抜き出されることになる。 The cleaning treatment of the carrier 1 is performed by blowing air A from the cleaning blower 31 into the air lift pipe 29. When the air A blown from the cleaning blower 31 reaches the air lift pipe 29 from the air guide pipe 30, it goes upward in the air lift pipe 29. At this time, the carrier 1 accumulated at the bottom of the reaction tank 20 is sucked together with the water W from the lower end of the air lift pipe 29, and rises in the air lift pipe 29 with the movement of the air A. Here, since the lower end of the air lift pipe 29 is opened at the lowermost portion of the reduced diameter portion 20a having a downward inclination, the carrier 1 accumulated at the bottom of the reaction tank 20 is near the opening of the lower end portion of the air lift pipe 29. It gathers by its own weight, which allows the carrier 1 to be smoothly sucked into the air lift pipe 29. The water collecting chamber 23 is located at the lower part of the reaction tank 20 in which the carrier 1 is accumulated, but since the opening 23a is arranged so as to face downward, it is purified and is purified from the water collecting chamber 23 through the treated water pipe 24. With respect to the water W extracted to the treatment water tank 25, the carrier 1 is extracted in a separated state.

水Ｗと共にエアリフト管２９内を上昇する間、担体１と水Ｗは空気Ａによって撹拌され、これにより、担体１の表面に付着した生物膜等の固形物は剥離し、担体１が洗浄される。そして、洗浄された担体１と、剥離した固形物を含む水Ｗが、空気Ａと共にエアリフト管２９の上端から排出される。 While ascending in the air lift pipe 29 together with the water W, the carrier 1 and the water W are agitated by the air A, whereby solids such as biological membranes adhering to the surface of the carrier 1 are peeled off and the carrier 1 is washed. .. Then, the washed carrier 1 and the water W containing the peeled solid matter are discharged from the upper end of the air lift pipe 29 together with the air A.

水Ｗと担体１は、エアリフト管２９の上端から分離装置３２の本体部３２ａの上方へ排出される。この際、エアリフト管２９の上端を囲むように配置された遮蔽板３２ｂにより、排出される水Ｗや担体１が勢い良く周囲に放出されることは防止され、水Ｗと担体１はエアリフト管２９の上端から本体部３２ａの誘導部３２ｅのなす面に沿うように排出され、さらに径方向外側に位置する傾斜板３２ｃへ誘導される。 The water W and the carrier 1 are discharged from the upper end of the air lift pipe 29 above the main body 32a of the separation device 32. At this time, the shielding plate 32b arranged so as to surround the upper end of the air lift pipe 29 prevents the discharged water W and the carrier 1 from being vigorously discharged to the surroundings, and the water W and the carrier 1 are separated from the air lift pipe 29. It is discharged from the upper end of the main body along the surface formed by the guide portion 32e of the main body portion 32a, and is further guided to the inclined plate 32c located on the outer side in the radial direction.

傾斜板３２ｃは、担体１の粒を通さない程度の隙間を備えているので、エアリフト管２９の上端から排出された担体１は傾斜板３２ｃの表面を伝って下方に落下し、反応槽２０内に戻される。この際、傾斜板３２ｃの傾斜方向に沿った二辺には縁部３２ｆが備えられているので、担体１が傾斜板３２ｃの側辺（縁部３２ｆの備えられた辺）を超えて受け皿３２ｄに落下することは防がれる。一方、排出された水Ｗの大半は、担体１から剥離した固形物と共に、傾斜板３２ｃの隙間から下方へ流れ、受け皿３２ｄに受けられる。 Since the inclined plate 32c has a gap such that the particles of the carrier 1 do not pass through, the carrier 1 discharged from the upper end of the air lift pipe 29 falls downward along the surface of the inclined plate 32c and is inside the reaction tank 20. Returned to. At this time, since the edge portions 32f are provided on the two sides of the inclined plate 32c along the inclined direction, the carrier 1 exceeds the side side of the inclined plate 32c (the side provided with the edge portion 32f) and the saucer 32d. It is prevented from falling into. On the other hand, most of the discharged water W flows downward through the gap of the inclined plate 32c together with the solid matter peeled from the carrier 1, and is received by the saucer 32d.

受け皿３２ｄの水Ｗは、担体１から剥離した固形物と共に排出管３３から外部の洗浄水処理槽３４へ排出され、貯留される。洗浄水処理槽３４では、水Ｗの沈殿処理が行われ、底部に沈殿した固形物は適宜抜き出されて汚泥として処理される。洗浄水処理槽３４の上澄みは、原水槽２６に戻され、再び反応槽２０へ戻される。 The water W in the saucer 32d is discharged from the discharge pipe 33 to the external washing water treatment tank 34 together with the solid matter peeled from the carrier 1, and is stored. In the washing water treatment tank 34, water W is settled, and the solid matter settled at the bottom is appropriately extracted and treated as sludge. The supernatant of the wash water treatment tank 34 is returned to the raw water tank 26 and returned to the reaction tank 20 again.

担体１の洗浄処理は、上述の如き水Ｗの浄化処理を行いつつ、それと同時に実行することができる。尚、洗浄処理は、浄化処理の実行中、連続的に行うこともできるが、通常は定期的に短時間、実行すれば十分である。 The cleaning treatment of the carrier 1 can be carried out at the same time as the purification treatment of water W as described above. The cleaning treatment can be continuously performed during the execution of the purification treatment, but it is usually sufficient to carry out the cleaning treatment periodically for a short time.

このような水処理装置によれば、担体１の洗浄に際して水Ｗの浄化処理を停止する必要がなく、したがって、水処理装置の稼働率を向上させることができ、また、担体１に多量の固形物が付着する前に担体１を洗浄することができる。このため、小型の設備で高い効率による水処理が可能である。担体１の洗浄処理に要する設備も、図７に示す如き例における逆洗用の設備と比較して小型である。 According to such a water treatment apparatus, it is not necessary to stop the purification treatment of the water W when cleaning the carrier 1, and therefore, the operating rate of the water treatment apparatus can be improved, and a large amount of solids are contained in the carrier 1. The carrier 1 can be washed before the object adheres. Therefore, it is possible to treat water with high efficiency with a small facility. The equipment required for the cleaning treatment of the carrier 1 is also smaller than the equipment for backwashing in the example shown in FIG. 7.

特開昭６１−２９１０９９号公報JP-A-61-291099

しかしながら、図８〜図１０に記載の如き水処理装置であっても、場合によっては要求される性能を満足できない可能性も考えられる。具体的には、例えば別の浄化処理を経た水を原水とし、これに対しさらに浄化処理を行うことを考えると、有機物の濃度が低く、且つアンモニアの残存する水を高速で処理する場合が想定される。具体的には、例えばＣ−ＢＯＤ（Carbonaceous Biochemical Oxygen Demand）にして２０ｍｇ／Ｌ程度の有機物に対し、アンモニアを２０ｍｇ／Ｌ程度含む水が処理対象となる。この場合、時間あたりの水処理量が、通常と比較して多くなる。通常の排水を処理しようとする場合、上記特許文献１に記載の如き下向流型生物膜浄化装置では、反応槽面積あたりの通水量は２０ｍ３／ｍ２・日程度であるが、上述のように有機物濃度が低く且つアンモニアの残存する水を処理しようとすると、通水量はこの２〜３倍程度になる。したがって、担体の目詰まりを防止するためには、原因となる固形物の量を少なくする必要がある。 However, even the water treatment apparatus as shown in FIGS. 8 to 10 may not be able to satisfy the required performance in some cases. Specifically, for example, considering that water that has undergone another purification treatment is used as raw water and further purification treatment is performed, it is assumed that water having a low concentration of organic matter and residual ammonia is treated at high speed. Will be done. Specifically, for example, C-BOD (Carbonaceous Biochemical Oxygen Demand) of about 20 mg / L of organic matter is treated with water containing about 20 mg / L of ammonia. In this case, the amount of water treated per hour is larger than usual. When treating ordinary wastewater, in the downward flow type biofilm purification device as described in Patent Document 1, the water flow rate per reaction tank area is about 20 m 3 / m 2 days, but the above-mentioned When trying to treat water having a low organic matter concentration and residual ammonia, the amount of water flowing through the water becomes about two to three times this amount. Therefore, in order to prevent clogging of the carrier, it is necessary to reduce the amount of solid matter that causes the carrier.

図８〜図１０に記載の水処理装置の場合、担体１の洗浄の効率は、例えば洗浄を行う時間や頻度、エアリフト管２９に送り込む空気Ａの量などによって制御することができる。つまり、反応槽２０内における固形物の量を少なくしようとすれば、これらを調整し、洗浄の程度を大きくすることで担体１に付着する固形物の量を少なく保てば良い。ところが、反応槽２０内に固形物が少ないということは、すなわち浄化反応を行う微生物が少ないことを意味する。特に、アンモニアを酸化する微生物は、好気性微生物の中でも増殖が比較的遅く、アンモニアの浄化を意図する場合、反応槽２０内における固形物量を減らしてしまうと、満足な浄化性能を出すことが難しい。閉塞防止のために固形物量を減らすことが、浄化性能を高めるうえで制限要因となってしまうのである。 In the case of the water treatment apparatus shown in FIGS. 8 to 10, the efficiency of cleaning the carrier 1 can be controlled by, for example, the time and frequency of cleaning, the amount of air A sent to the air lift pipe 29, and the like. That is, if the amount of solid matter in the reaction vessel 20 is to be reduced, the amount of solid matter adhering to the carrier 1 may be kept small by adjusting these and increasing the degree of washing. However, the fact that there are few solids in the reaction tank 20 means that there are few microorganisms that carry out the purification reaction. In particular, microorganisms that oxidize ammonia grow relatively slowly among aerobic microorganisms, and when purifying ammonia is intended, it is difficult to obtain satisfactory purification performance if the amount of solid matter in the reaction vessel 20 is reduced. .. Reducing the amount of solids to prevent blockage is a limiting factor in improving purification performance.

また、１５℃前後の低温の水を処理しようとする場合にも同様の問題がある。低温では微生物の反応速度が遅いので、浄化性能を高めるには多量の固形物を反応槽２０内に維持する必要があるが、そのために洗浄の程度を低くすれば、担体１の目詰まりが生じてしまう。 Further, there is a similar problem when trying to treat low temperature water of about 15 ° C. Since the reaction rate of microorganisms is slow at low temperatures, it is necessary to maintain a large amount of solid matter in the reaction vessel 20 in order to improve the purification performance. Therefore, if the degree of washing is lowered, the carrier 1 is clogged. Will end up.

本発明は、斯かる実情に鑑み、簡便な構成により高い効率で水を浄化し得る水処理装置を提供しようとするものである。 In view of such circumstances, the present invention intends to provide a water treatment apparatus capable of purifying water with high efficiency by a simple configuration.

本発明は、微生物を担持する担体と共に処理対象としての水を貯留する反応槽と、前記反応槽の底部に一端を、水面より上に他端を配置されたエアリフト管と、前記エアリフト管の内部へ気体を送り込む導気管と、前記エアリフト管の他端から前記反応槽の水面に向かって下り勾配をなし、水が両面間を通過できる隙間を備えた傾斜板とを備え、前記エアリフト管に前記導気管から気体を吹き込むことで、前記反応槽内の担体と水を前記エアリフト管内へ吸入し、気体と共に前記エアリフト管の他端から排出して前記傾斜板に導き、担体は前記傾斜板に沿って落下させて反応槽へ戻す一方、前記傾斜板の隙間から下方へ流れる水は排出管を通して外部へ排出するよう構成され、前記排出管を通る水の一部を前記反応槽へ戻す分配槽を設けたことを特徴とする水処理装置にかかるものである。 The present invention comprises a reaction vessel that stores water as a treatment target together with a carrier that carries microorganisms, an air lift pipe that has one end arranged at the bottom of the reaction tank and the other end above the water surface, and the inside of the air lift pipe. The air lift pipe is provided with an air guide pipe for feeding gas to the air lift pipe and an inclined plate having a downward gradient from the other end of the air lift pipe toward the water surface of the reaction tank and having a gap through which water can pass between both sides. By blowing gas from the air guide tube, the carrier and water in the reaction vessel are sucked into the air lift pipe, discharged from the other end of the air lift pipe together with the gas, and guided to the inclined plate, and the carrier is guided along the inclined plate. On the other hand, the water flowing downward from the gap of the inclined plate is configured to be discharged to the outside through the discharge pipe, and a part of the water passing through the discharge pipe is returned to the reaction tank. It is related to a water treatment device characterized by being provided.

本発明の水処理装置において、前記分配槽は前記反応槽内に配置することができる。 In the water treatment apparatus of the present invention, the distribution tank can be arranged in the reaction tank.

本発明の水処理装置において、前記分配槽は、前記排出管からの水が供給される前段側の空間と、水を下流側へ排出する後段側の空間とに内部を分割する分割板と、前記前段側の空間と前記分配槽の外側を仕切る外壁に設けられた堰と、前記堰に設けられた流出口とを備え、前記排出管から前段側の空間へ供給された水は、一部が前記流出口から前記反応槽へ流れ、一部が前記分割板を越えて前記後段側の空間へ流れるよう構成することができる。 In the water treatment apparatus of the present invention, the distribution tank has a dividing plate that divides the inside into a space on the front stage side where water is supplied from the discharge pipe and a space on the rear stage side where water is discharged to the downstream side. A part of the water supplied from the discharge pipe to the space on the front stage side is provided with a weir provided on the outer wall partitioning the space on the front stage side and the outside of the distribution tank and an outlet provided on the weir. Can flow from the outlet to the reaction vessel, and a part of the water can flow over the dividing plate to the space on the rear stage side.

本発明の水処理装置において、前記堰は高さを可変に構成することができる。 In the water treatment apparatus of the present invention, the height of the weir can be varied.

本発明の水処理装置において、前記流出口は、前記堰の上縁に設けられ、下方に向かって幅が狭くなる形状を有する切れ込みとし、前記流出口のなす角度は５°以上６０°未満とすることができる。 In the water treatment apparatus of the present invention, the outlet is a notch provided on the upper edge of the weir and has a shape that narrows downward, and the angle formed by the outlet is 5 ° or more and less than 60 °. can do.

本発明の水処理装置においては、前記流出口の下端部に、先端部の形状を鈍く形成した鈍角部を備えることができる。 In the water treatment apparatus of the present invention, an obtuse angle portion having an obtuse shape of the tip portion can be provided at the lower end portion of the outlet.

本発明の水処理装置は、前記前段側の空間を、前記排出管が接続される前段槽と、前記堰が設けられた中段槽とに分割する水位調整板を備え、前記排出管から前記前段槽に供給された水は、前記水位調整板を越えて前記中段槽に流れるよう構成することができる。 The water treatment apparatus of the present invention includes a water level adjusting plate that divides the space on the front stage side into a front stage tank to which the discharge pipe is connected and a middle stage tank provided with the weir, and the front stage from the discharge pipe. The water supplied to the tank can be configured to flow over the water level adjusting plate to the middle tank.

本発明の水処理装置において、前記前段側の空間に接続された前記排出管の出口は、下向きに設置することができる。 In the water treatment apparatus of the present invention, the outlet of the discharge pipe connected to the space on the front stage side can be installed facing downward.

本発明の水処理装置によれば、簡便な構成により高い効率で水を浄化し得るという優れた効果を奏し得る。 According to the water treatment apparatus of the present invention, it is possible to obtain an excellent effect that water can be purified with high efficiency by a simple configuration.

本発明の実施による水処理装置の形態の一例を示す全体概略図である。It is an overall schematic diagram which shows an example of the form of the water treatment apparatus by carrying out this invention. 本実施例の水処理装置の要部の形態を示す斜視図であり、分配槽の構成を示している。It is a perspective view which shows the form of the main part of the water treatment apparatus of this Example, and shows the structure of a distribution tank. 本実施例の水処理装置における流出口の形状について簡略的に説明する図である。It is a figure which briefly explains the shape of the outlet in the water treatment apparatus of this Example. 本実施例の水処理装置の要部の形態の別の一例を示す概略断面図である。It is schematic cross-sectional view which shows another example of the form of the main part of the water treatment apparatus of this Example. 本発明の参考例による水処理装置の形態を示す概略図である。It is the schematic which shows the form of the water treatment apparatus by the reference example of this invention. 本発明の別の参考例による水処理装置の形態を示す概略図である。It is the schematic which shows the form of the water treatment apparatus by another reference example of this invention. 従来における水処理装置の一例を示す全体概略図である。It is an overall schematic diagram which shows an example of the conventional water treatment apparatus. 従来における水処理装置の別の一例を示す全体概略図である。It is an overall schematic diagram which shows another example of the conventional water treatment apparatus. 従来における水処理装置の別の一例における要部を示す概略正断面図であり、特に反応槽の構成を示している。It is a schematic front sectional view which shows the main part in another example of the conventional water treatment apparatus, and shows the structure of the reaction tank in particular. 従来における水処理装置の別の一例における要部を示す斜視図であり、分離装置の構成を示している。It is a perspective view which shows the main part in another example of the conventional water treatment apparatus, and shows the structure of the separation apparatus.

以下、本発明の実施の形態を添付図面を参照して説明する。 Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

図１、図２は本発明の実施による水処理装置の形態の一例を示しており、図中、図８〜図１０と同一の符号を付した部分は同一物を表している。 1 and 2 show an example of the form of the water treatment apparatus according to the implementation of the present invention, and in the drawings, the parts having the same reference numerals as those in FIGS. 8 to 10 represent the same objects.

本実施例の水処理装置は、基本的な構成は図８〜図１０に示す従来例と同様であり、微生物を担持する担体１と共に処理対象としての水Ｗを貯留する反応槽２０と、該反応槽２０内に酸素を供給する散気装置２１を備えている。反応槽２０内の散気管２１ａよりも下方の位置には椀型の集水室２３が設けられ、集水室２３の内部には、処理水管２４の一端が開口している。処理水管２４は、集水室２３の内側と、処理水槽２５を接続している。処理対象の原水である水Ｗは、反応槽２０の外に設けた原水槽２６に貯留され、原水ポンプ２７によって汲み上げられ、原水管２８を通じて反応槽２０に供給されるようになっている。 The basic configuration of the water treatment apparatus of this embodiment is the same as that of the conventional example shown in FIGS. 8 to 10, and the reaction tank 20 for storing the water W to be treated together with the carrier 1 carrying the microorganism and the water treatment apparatus 20 An air diffuser 21 for supplying oxygen into the reaction vessel 20 is provided. A bowl-shaped water collecting chamber 23 is provided at a position below the air diffuser pipe 21a in the reaction tank 20, and one end of the treated water pipe 24 is opened inside the water collecting chamber 23. The treated water pipe 24 connects the inside of the water collecting chamber 23 to the treated water tank 25. The raw water W to be treated is stored in a raw water tank 26 provided outside the reaction tank 20, pumped up by the raw water pump 27, and supplied to the reaction tank 20 through the raw water pipe 28.

また、円筒形の壁の下部に逆円錐形の縮径部２０ａを備えた反応槽２０の中心軸に沿って、エアリフト管２９が設けられている。エアリフト管２９は、反応槽２０の底部に一端（下端）が、水面より上に他端（上端）が位置するように配置されており、エアリフト管２９の下端付近には、導気管３０の一端が接続されている。そして、導気管３０の他端から洗浄用ブロワ３１によりエアリフト管２９内へ気体（例えば、空気）Ａが送り込まれるようになっている。 Further, an air lift pipe 29 is provided along the central axis of the reaction tank 20 having an inverted conical reduced diameter portion 20a at the lower part of the cylindrical wall. The air lift pipe 29 is arranged so that one end (lower end) is located at the bottom of the reaction tank 20 and the other end (upper end) is located above the water surface, and one end of the air guide pipe 30 is located near the lower end of the air lift pipe 29. Is connected. Then, the gas (for example, air) A is sent into the air lift pipe 29 from the other end of the air guide pipe 30 by the cleaning blower 31.

水面から上方へ突出するように配置されたエアリフト管２９の上端部の周囲には、本体部３２ａと、遮蔽板３２ｂを備えた分離装置３２が設けられている。本体部３２ａは、傾斜板３２ｃと受け皿３２ｄを備えており、傾斜板３２ｃとしては、エアリフト管２９の上端を囲むように長方形状の板が複数枚（ここでは４枚）配置されている。各傾斜板３２ｃは、両面間を水Ｗが通過でき、且つ担体１が通過できない程度の隙間を備えている。各傾斜板３２ｃは、エアリフト管２９の上端から径方向外側の水面へ向かう向きに下り勾配をなすように配置され、エアリフト管２９の上端と、４枚の傾斜板３２ｃの上辺の間は、略四角台形状の誘導部３２ｅにより接続されている。各傾斜板３２ｃの傾斜方向に沿った２辺には、それぞれ上方へ突出する縁部３２ｆが設けられている。 A separation device 32 provided with a main body portion 32a and a shielding plate 32b is provided around the upper end portion of the air lift pipe 29 arranged so as to project upward from the water surface. The main body portion 32a includes an inclined plate 32c and a saucer 32d, and as the inclined plate 32c, a plurality of rectangular plates (here, four) are arranged so as to surround the upper end of the air lift pipe 29. Each inclined plate 32c has a gap between both sides so that water W can pass through and carrier 1 cannot pass through. Each inclined plate 32c is arranged so as to form a downward slope from the upper end of the air lift pipe 29 toward the water surface on the outer side in the radial direction, and the space between the upper end of the air lift pipe 29 and the upper side of the four inclined plates 32c is substantially equal. It is connected by a square trapezoidal guide portion 32e. Edges 32f projecting upward are provided on the two sides of each inclined plate 32c along the inclined direction.

エアリフト管２９から排出される水Ｗや担体１を分離装置３２で受けるにあたっては、エアリフト管２９の出口である上端を傾斜板３２ｃで取り囲むことが確実且つ効率が良く、好適である。この際、例えば傾斜板３２ｃを円錐面とし、その頂点にあたる位置にエアリフト管２９の上端を配置しても良いが、円錐面状の部材は形成に手間や費用が嵩んでしまう。そこで、本実施例のように長方形状の傾斜板３２ｃでエアリフト管２９の上端を囲むようにすると、分離装置３２を平面的で単純な形状の傾斜板３２ｃにより構成することができ、分離装置３２を備えた反応槽２０を設置するにあたり、建設費を低く抑えることができる。また、このようにした場合、円形断面のエアリフト管２９と傾斜板３２ｃとの間や、傾斜板３２ｃ同士の間には隙間が生じることになるが、エアリフト管２９と傾斜板３２ｃとの間は誘導部３２ｅで接続し、また、傾斜板３２ｃには傾斜方向に関して両脇に縁部３２ｆを設けることで、水Ｗや担体１を傾斜板３２ｃへ正しく誘導し、また傾斜板３２ｃの脇から担体１が落下することを防止し、後述する担体１の洗浄にあたり、エアリフト管２９から排出された担体１を確実に反応槽２０へ戻すことができる。 When receiving the water W and the carrier 1 discharged from the air lift pipe 29 by the separating device 32, it is preferable to surround the upper end of the air lift pipe 29 with the inclined plate 32c because it is reliable and efficient. At this time, for example, the inclined plate 32c may be a conical surface, and the upper end of the air lift pipe 29 may be arranged at a position corresponding to the apex of the conical surface, but the conical surface-shaped member is troublesome and costly to form. Therefore, if the upper end of the air lift pipe 29 is surrounded by the rectangular inclined plate 32c as in the present embodiment, the separating device 32 can be configured by the inclined plate 32c having a flat and simple shape, and the separating device 32 can be formed. When installing the reaction tank 20 equipped with the above, the construction cost can be kept low. Further, in this case, a gap is generated between the air lift pipe 29 and the inclined plate 32c having a circular cross section and between the inclined plates 32c, but there is a gap between the air lift pipe 29 and the inclined plate 32c. By connecting with the guiding portion 32e and providing the inclined plate 32c with edge portions 32f on both sides in the inclined direction, the water W and the carrier 1 are correctly guided to the inclined plate 32c, and the carrier is also provided from the side of the inclined plate 32c. It is possible to prevent the carrier 1 from falling, and to surely return the carrier 1 discharged from the air lift pipe 29 to the reaction tank 20 when cleaning the carrier 1 described later.

本体部３２ａの上方には、エアリフト管２９の上端を囲むように円筒面状の遮蔽板３２ｂが設置される。傾斜板３２ｃおよび誘導部３２ｅの下方には、受け皿３２ｄが設置される。受け皿３２ｄには排出管３３が接続されており、分離装置３２に回収された水Ｗは、排出管３３を通って外部に排出され、洗浄水処理槽３４に導かれるようになっている。洗浄水処理槽３４の上部には、戻し管３５の一端が接続され、戻し管３５の他端は原水槽２６に接続されている。 A cylindrical shielding plate 32b is installed above the main body 32a so as to surround the upper end of the air lift pipe 29. A saucer 32d is installed below the inclined plate 32c and the guide portion 32e. A discharge pipe 33 is connected to the saucer 32d, and the water W collected in the separation device 32 is discharged to the outside through the discharge pipe 33 and guided to the washing water treatment tank 34. One end of the return pipe 35 is connected to the upper part of the wash water treatment tank 34, and the other end of the return pipe 35 is connected to the raw water tank 26.

以上の構成については図８〜図１０に示した例と概ね共通しているが、本実施例の場合、反応槽２０の内部に分配槽４０を備えた点を特徴としている。この分配槽４０は、排出管３３の途中に設けられており、排出管３３を通る水Ｗの一部を反応槽２０へ戻すようになっている。 The above configuration is almost the same as the examples shown in FIGS. 8 to 10, but the present embodiment is characterized in that the distribution tank 40 is provided inside the reaction tank 20. The distribution tank 40 is provided in the middle of the discharge pipe 33, and a part of the water W passing through the discharge pipe 33 is returned to the reaction tank 20.

分配槽４０の構成を図２に示す。分配槽４０は、内部に水Ｗを貯留する方形の槽であり、内部は垂直方向に沿った面をなす２枚の板（水位調整板４１および分割板４２）により、３つの空間（前段槽４０ａ、中段槽４０ｂ、後段槽４０ｃ）に分割されている。尚、ここでは、分割板４２の前段側にあたる空間（ここに示した例においては、前段槽４０ａと中段槽４０ｂにより構成される空間）を「前段側の空間」、分割板４２の後段側にあたる空間（後段槽４０ｃにより構成される空間）を「後段側の空間」と称することとする。 The configuration of the distribution tank 40 is shown in FIG. The distribution tank 40 is a square tank that stores water W inside, and the inside is composed of two plates (water level adjusting plate 41 and dividing plate 42) forming a surface along the vertical direction, and three spaces (pre-stage tank). It is divided into 40a, a middle tank 40b, and a rear tank 40c). Here, the space corresponding to the front stage side of the dividing plate 42 (in the example shown here, the space composed of the front stage tank 40a and the middle stage tank 40b) corresponds to the "front stage side space" and the rear stage side of the dividing plate 42. The space (the space composed of the rear tank 40c) will be referred to as the "space on the rear side".

前段槽４０ａの下部には、排出管３３の上流側の部分（上流側の排出管３３ａ）が接続され、後段槽４０ｃの底部には、排出管３３の下流側の部分（下流側の排出管３３ｂ）が接続されている。中段槽４０ｂと後段槽４０ｃの間を分割する分割板４２の高さは、前段槽４０ａと中段槽４０ｂの間を分割する水位調整板４１の高さよりも低く設定されている。そして、排出管３３から分配槽４０に流れる水Ｗは、まず前段側の空間をなす前段槽４０ａに供給され、次いで水位調整板４１を越えて中段槽４０ｂに流れ、さらに分割板４２を越えて後段側の空間をなす後段槽４０ｃに流入し、後段槽４０ｃから下流側の排出管３３ｂへ排出されるようになっている。 An upstream part (upstream side discharge pipe 33a) of the discharge pipe 33 is connected to the lower part of the front stage tank 40a, and a downstream part (downstream side discharge pipe) of the discharge pipe 33 is connected to the bottom of the rear stage tank 40c. 33b) is connected. The height of the dividing plate 42 that divides between the middle tank 40b and the rear tank 40c is set lower than the height of the water level adjusting plate 41 that divides between the front tank 40a and the middle tank 40b. Then, the water W flowing from the discharge pipe 33 to the distribution tank 40 is first supplied to the front tank 40a forming the space on the front stage side, then flows over the water level adjusting plate 41 to the middle stage tank 40b, and further exceeds the dividing plate 42. It flows into the rear tank 40c forming a space on the rear side, and is discharged from the rear tank 40c to the discharge pipe 33b on the downstream side.

中段槽４０ｂと、分配槽４０の外側を仕切る外壁の一部には、高さを調整可能な堰４３が設置されており、堰４３の上縁部には、流出口４３ａが設けられている。流出口４３ａは、下方に向かって幅が狭くなるよう、堰４３の上縁部にＶ字状に形成された切れ込みと、該切れ込みから外側へ伸びる樋状の導水部を備えている。堰４３の高さを、流出口４３ａの下端の高さが分割板４２の上縁の高さより低くなるよう設定すると、中段槽４０ｂ内に溜まった水Ｗの一部は、堰４３の流出口４３ａから外側へ流れる。分配槽４０は反応槽２０の内部に備えられているので（図１参照）、流出口４３ａから外側へ流れた水Ｗは反応槽２０へ戻ることになる。 A weir 43 whose height can be adjusted is installed in a part of the outer wall partitioning the middle stage tank 40b and the outside of the distribution tank 40, and an outflow port 43a is provided at the upper edge of the weir 43. .. The outflow port 43a is provided with a V-shaped notch formed at the upper edge of the weir 43 and a gutter-shaped water guiding portion extending outward from the notch so that the width becomes narrower downward. When the height of the weir 43 is set so that the height of the lower end of the outlet 43a is lower than the height of the upper edge of the dividing plate 42, a part of the water W collected in the middle tank 40b is discharged from the weir 43. It flows outward from 43a. Since the distribution tank 40 is provided inside the reaction tank 20 (see FIG. 1), the water W flowing outward from the outlet 43a returns to the reaction tank 20.

つまり、本実施例では、担体１の洗浄を行う際、エアリフト管２９の上端から排出されて分離装置３２に回収された水Ｗは分配槽４０を経由するが、そのうち一部は分割板４２を越えて後段槽４０ｃに流入し、排出管３３から外部（洗浄水処理槽３４）へ排出され、一部は流出口４３ａから反応槽２０へ流れることになる。一方、水Ｗと共にエアリフト管２９の上端から排出された担体１に関しては、全量が傾斜板３２ｃ上面を通って反応槽２０へ落下する。 That is, in this embodiment, when the carrier 1 is washed, the water W discharged from the upper end of the air lift pipe 29 and collected in the separation device 32 passes through the distribution tank 40, but a part of the water W passes through the dividing plate 42. After that, it flows into the subsequent tank 40c, is discharged from the discharge pipe 33 to the outside (washing water treatment tank 34), and a part of the flow flows from the outlet 43a to the reaction tank 20. On the other hand, with respect to the carrier 1 discharged from the upper end of the air lift pipe 29 together with the water W, the entire amount of the carrier 1 falls to the reaction tank 20 through the upper surface of the inclined plate 32c.

水Ｗの浄化処理に伴って担体１に蓄積した固形物は、担体１の洗浄処理（エアリフト管２９への空気Ａの吹き込み）の実行により担体１から剥離する。図８〜図１０に示した例の場合、剥離した固形物を含んでエアリフト管２９の上端から排出され、分離装置３２により回収された水Ｗのほぼ全量が排出管３３から外部へ排出されることになるが、図１、図２に示す本実施例の場合、水Ｗは一旦分配槽４０を経由し、そのうち流出口４３ａを通る一部は、固形物と共にそのまま反応槽２０へ戻される。 The solid matter accumulated on the carrier 1 due to the purification treatment of the water W is peeled off from the carrier 1 by executing the cleaning treatment of the carrier 1 (blowing air A into the air lift pipe 29). In the case of the examples shown in FIGS. 8 to 10, the peeled solid matter is discharged from the upper end of the air lift pipe 29, and almost the entire amount of the water W recovered by the separation device 32 is discharged from the discharge pipe 33 to the outside. However, in the case of the present embodiment shown in FIGS. 1 and 2, the water W once passes through the distribution tank 40, and a part of the water W passing through the outlet 43a is returned to the reaction tank 20 as it is together with the solid matter.

つまり、図８〜図１０に示した従来の水処理装置では、担体１の目詰まりや固着の防止のために洗浄を行った場合に、担体１から剥離した固形物の大部分を反応槽２０の外部へ排出することになり、これが浄化処理の効率向上を制限する要因となっていたが、本実施例によれば、洗浄処理により担体１の目詰まりや固着は防止しつつも、剥離した固形物の一部を反応槽２０に戻すことで、反応槽２０内における微生物群の保持量を保ち、浄化効率を向上させることができるのである。 That is, in the conventional water treatment apparatus shown in FIGS. 8 to 10, most of the solid matter separated from the carrier 1 is removed from the carrier 1 when the carrier 1 is washed to prevent clogging or sticking. This was a factor that limited the improvement of the efficiency of the purification treatment, but according to this embodiment, the carrier 1 was peeled off while being prevented from being clogged or stuck by the cleaning treatment. By returning a part of the solid matter to the reaction tank 20, the retention amount of the microbial community in the reaction tank 20 can be maintained and the purification efficiency can be improved.

一般に、微生物による水処理を行う際には、浄化性能の指標として槽内における固形物の滞留時間（ＳＲＴ：Sludge Retention Time）を用いることができる。これは、槽内に存在する固形物の総量を、浄化処理や洗浄に伴って単位時間あたりに流出する固形物の量で割った値として求めることができ、この値が大きいほど浄化性能が高いと言うことができる。一般的な水処理装置においては、ＳＲＴがおおむね１０日程度以上あれば良いとされるが、特にアンモニアの除去を目的とする場合、アンモニア酸化細菌は増殖が遅いため、高めのＳＲＴ値が要求される。 Generally, when water treatment is performed by microorganisms, the retention time (SRT: Sludge Retention Time) of solid matter in the tank can be used as an index of purification performance. This can be obtained as a value obtained by dividing the total amount of solids existing in the tank by the amount of solids flowing out per unit time due to purification treatment or cleaning, and the larger this value, the higher the purification performance. Can be said. In a general water treatment device, it is said that the SRT should be about 10 days or more, but especially when the purpose is to remove ammonia, ammonia-oxidizing bacteria grow slowly, so a high SRT value is required. To.

ＳＲＴは、図８〜図１０に示した例の場合、以下の式で表すことができる。
［式１］
ＳＲＴ＝ＶＣ／（ＱＯＵＴＣＯＵＴ＋ＱＷＡＳＨＣＷＡＳＨ） In the case of the examples shown in FIGS. 8 to 10, the SRT can be expressed by the following equation.
[Equation 1]
SRT = VC / (Q OUT C OUT + Q WASH C WASH )

ただし、
・Ｖ：反応槽における水の容量
・Ｃ：反応槽内における固形物の濃度
・ＱＯＵＴ：水の浄化処理に伴って処理水管から排出される水の量
・ＣＯＵＴ：処理水管から排出される水中の固形物の濃度
・ＱＷＡＳＨ：担体の洗浄処理に伴って排出管から排出される水の量
・ＣＷＡＳＨ：排出管から排出される水中の固形物の濃度 However,
・ V: Capacity of water in the reaction tank ・ C: Concentration of solid matter in the reaction tank ・ Q OUT : Amount of water discharged from the treated water pipe during water purification treatment ・ C OUT : Discharged from the treated water pipe Concentration of solids in water ・ Q WASH : Amount of water discharged from the discharge pipe during the cleaning treatment of the carrier ・ C WASH : Concentration of solids in water discharged from the discharge pipe

一方、図１、図２に示す本実施例の場合、ＳＲＴは以下の式で表すことができる。
［式２］
ＳＲＴ＝（ＶＣ＋ａＱＷＡＳＨＣＷＡＳＨ）／｛ＱＯＵＴＣＯＵＴ＋（１−ａ）ＱＷＡＳＨＣＷＡＳＨ｝ On the other hand, in the case of this embodiment shown in FIGS. 1 and 2, the SRT can be expressed by the following equation.
[Equation 2]
SRT = (VC + aQ WASH C WASH ) / {Q OUT C OUT + (1-a) Q WASH C WASH }

ただし、
・ａ：担体の洗浄処理の際、分配槽から反応槽に戻る水の割合（０＜ａ≦１） However,
-A: Percentage of water returning from the distribution tank to the reaction tank during the washing treatment of the carrier (0 <a≤1)

つまり、本実施例においては、分配槽４０を設置することにより、担体１の洗浄処理の際にエアリフト管２９から排出される水Ｗのうち、割合ａに相当する量が反応槽２０へ戻されることになる。その結果、上記式２におけるＳＲＴの値は、上記式１におけるＳＲＴの値よりも大きくなり、浄化性能を向上させることができるのである。 That is, in this embodiment, by installing the distribution tank 40, the amount of water W discharged from the air lift pipe 29 during the cleaning treatment of the carrier 1 is returned to the reaction tank 20 in an amount corresponding to the ratio a. It will be. As a result, the value of SRT in the above formula 2 becomes larger than the value of SRT in the above formula 1, and the purification performance can be improved.

担体１の洗浄時において、分離装置３２から分配槽４０を通って反応槽２０に戻る水Ｗの割合（以下、「返流量」と称する）ａは、分割板４２に対する堰４３の高さを変えることで調整することができる。すなわち、仮に流出口４３ａの下端を分割板４２の上端よりも高く設定した場合には、前段側の空間をなす中段槽４０ｂから流れる水Ｗのうち、概ね全量が分割板４２を越えて後段側の空間をなす後段槽４０ｃに流入することになるが、流出口４３ａの下端の位置を分割板４２の上端よりも低くすれば、中段槽４０ｂ内の水Ｗの一部が流出口４３ａを越えて反応槽２０へ戻る。そして、流出口４３ａの位置が分割板４２の上端に対して低いほど、返流量は大きくなる。 At the time of cleaning the carrier 1, the ratio of water W returning from the separation device 32 to the reaction tank 20 through the distribution tank 40 (hereinafter referred to as “return flow rate”) a changes the height of the weir 43 with respect to the dividing plate 42. It can be adjusted by. That is, if the lower end of the outflow port 43a is set higher than the upper end of the dividing plate 42, almost all of the water W flowing from the middle stage tank 40b forming the space on the front stage side exceeds the dividing plate 42 on the rear stage side. If the position of the lower end of the outlet 43a is lower than the upper end of the dividing plate 42, a part of the water W in the middle tank 40b will exceed the outlet 43a. Return to the reaction tank 20. The lower the position of the outlet 43a with respect to the upper end of the dividing plate 42, the larger the return flow rate.

流出口４３ａからの返流量は、該流出口４３ａの形状にも左右される。流出口４３ａは、図３に示す如く、下方に向かって幅が狭くなる形状を有する切れ込みとして構成されているが、この切れ込みである流出口４３ａのなす角度αが小さければ、それだけ流出口４３ａの上下の位置による返流量の変動は小さくなる。つまり、角度αを十分小さくすれば、堰４３の高さの変更を介した返流量の調整は容易になる。ただし、角度αが小さすぎると、返流量の変更に必要な堰４３の高さの変更量が大きくなりすぎてしまう。したがって、流出口４３ａのなす角度αとして好適な範囲は、例えば５°以上６０°未満、より好ましくは１０°以上３０°以下である。 The return flow rate from the outlet 43a also depends on the shape of the outlet 43a. As shown in FIG. 3, the outlet 43a is configured as a notch having a shape whose width narrows downward. However, the smaller the angle α formed by the outlet 43a, which is the notch, the more the outlet 43a The fluctuation of the return flow rate depending on the vertical position becomes small. That is, if the angle α is made sufficiently small, the return flow rate can be easily adjusted by changing the height of the weir 43. However, if the angle α is too small, the amount of change in the height of the weir 43 required for changing the return flow rate becomes too large. Therefore, a suitable range for the angle α formed by the outlet 43a is, for example, 5 ° or more and less than 60 °, more preferably 10 ° or more and 30 ° or less.

また、角度αをこのように十分小さくする場合、水Ｗ中に含まれる固形物等が流出口４３ａに詰まりやすくなってしまうことが考えられる。そこで、図３に示す如く、流出口４３ａの下端部に、切れ込みの先端部の形状が鈍くなっている鈍角部４３ｂを備えるようにしても良い。このようにすると、流出口４３ａの下端部に極端に幅の狭い部分が存在しないため、流出口４３ａに詰まりが生じにくくなる。尚、ここでは鈍角部４３ｂの形状として逆台形状を例示したが、鈍角部４３ｂの形状はこれに限定されず、例えば円弧等の曲線であっても良いし、鋭角の三角形以外の多角形状であっても良い。 Further, when the angle α is made sufficiently small in this way, it is conceivable that solid matter or the like contained in the water W tends to be clogged in the outlet 43a. Therefore, as shown in FIG. 3, an obtuse angle portion 43b in which the shape of the tip portion of the notch is blunt may be provided at the lower end portion of the outlet 43a. In this way, since there is no extremely narrow portion at the lower end of the outlet 43a, the outlet 43a is less likely to be clogged. Although the inverted trapezoidal shape is illustrated here as the shape of the obtuse angle portion 43b, the shape of the obtuse angle portion 43b is not limited to this, and may be a curved line such as an acute triangle, or a polygonal shape other than an acute triangle. There may be.

また、本実施例では、分割板４２の前段側の空間を水位調整板４１により前段槽４０ａと中段槽４０ｂとに分割しており、上流側の排出管３３ａから供給される水Ｗは、一旦前段槽４０ａに貯留され、水位調整板４１の上端を越えて中段槽４０ｂに流れ、均等な水位で貯留されたうえで分割板４２の上端または流出口４３ａに流れる。このため、前段槽４０ａに流れ込む水Ｗの流量が多い場合も、水Ｗは均等な水位で流出口４３ａと分割板４２に分配される。こうして、上流側の排出管３３ａから供給される水Ｗの量が多くても、流出口４３ａへの水Ｗの分配量を安定させることができる。 Further, in this embodiment, the space on the front stage side of the dividing plate 42 is divided into the front stage tank 40a and the middle stage tank 40b by the water level adjusting plate 41, and the water W supplied from the discharge pipe 33a on the upstream side is once. It is stored in the front tank 40a, flows over the upper end of the water level adjusting plate 41 to the middle tank 40b, is stored at a uniform water level, and then flows to the upper end of the dividing plate 42 or the outflow port 43a. Therefore, even when the flow rate of the water W flowing into the front tank 40a is large, the water W is distributed to the outlet 43a and the dividing plate 42 at an even water level. In this way, even if the amount of water W supplied from the discharge pipe 33a on the upstream side is large, the amount of water W distributed to the outlet 43a can be stabilized.

堰４３の高さを可変にする機構としては、適宜の機構を採用することができる。例えば、高さの異なる複数の堰４３を用意し、必要な返流量の設定に応じて交換するようにしても良いし、あるいは、堰４３を上下２枚に分割した構成とし、流出口４３ａを備えた上側の板を下側の板に対してスライドさせることで高さを変更できるようにしても良い。 As a mechanism for changing the height of the weir 43, an appropriate mechanism can be adopted. For example, a plurality of weirs 43 having different heights may be prepared and replaced according to a required return flow rate setting, or the weir 43 may be divided into two upper and lower weirs to provide an outlet 43a. The height may be changed by sliding the provided upper plate with respect to the lower plate.

分配槽４０は、ここでは反応槽２０の内部に設置した場合を説明したが、反応槽２０の外部（例えば、反応槽２０から外へ伸びる排出管３３の下流側端部など）に設置することも可能である。ただし、その場合は流出口４３ａから排出される水Ｗを反応槽２０に戻すための配管を別途設ける必要がある。分配槽４０を反応槽２０内に配置すれば、流出口４３ａから排出された水Ｗはそのまま反応槽２０に戻ることになり、返流のための配管が不要であるという点で有利である。 Although the case where the distribution tank 40 is installed inside the reaction tank 20 has been described here, it should be installed outside the reaction tank 20 (for example, the downstream end of the discharge pipe 33 extending outward from the reaction tank 20). Is also possible. However, in that case, it is necessary to separately provide a pipe for returning the water W discharged from the outlet 43a to the reaction tank 20. If the distribution tank 40 is arranged in the reaction tank 20, the water W discharged from the outflow port 43a returns to the reaction tank 20 as it is, which is advantageous in that no piping for return is required.

図４は、分配槽の形態の別の一例を示している。この別の実施例の分配槽５０では、図２に示した分配槽４０における水位調整板４１にあたる構成が省略されており、分配槽５０の内部は、分割板５１により、前段側の空間をなす前段槽５０ａと、後段側の空間をなす後段槽５０ｂの２つに分割されている。そして、前段槽５０ａに上流側の排出管３３ａの出口が接続されると共に、前段槽５０ａと分配槽５０の外側を仕切る外壁の一部に、高さを可変に構成され、且つ上端部に流出口５２ａを備えた堰５２が設置されている。 FIG. 4 shows another example of the form of the distribution tank. In the distribution tank 50 of this other embodiment, the configuration corresponding to the water level adjusting plate 41 in the distribution tank 40 shown in FIG. 2 is omitted, and the inside of the distribution tank 50 forms a space on the front stage side by the dividing plate 51. It is divided into two, a front tank 50a and a rear tank 50b forming a space on the rear side. Then, the outlet of the discharge pipe 33a on the upstream side is connected to the front stage tank 50a, and the height is variably configured in a part of the outer wall that separates the front stage tank 50a and the outside of the distribution tank 50, and the flow flows to the upper end portion. A weir 52 provided with an outlet 52a is installed.

分配槽５０の作用効果については、図２に示した分配槽４０と基本的に同様である。ただし、ここに示す分配槽５０のように水位調整板４１（図２参照）を省略した場合、図４中に示す如く上流側の排出管３３ａの下流側端部を前段槽５０ａの内部に伸ばし、出口を下向きに設置することが好ましい。図２に示した分配槽４０の場合、前段槽４０ａに流れ込む水Ｗの流量が多くても、水Ｗは上述したように、一旦水位調整板４１を越えることで水位を均等に調整されて流出口４３ａと分割板４２に分配される。一方、ここに示す分配槽５０の場合、水位調整板４１に相当する構成を備えていないため、仮に前段槽５０ａに水Ｗを供給する上流側の排出管３３ａの出口が真横あるいは上を向いていると、流量が多い場合に水Ｗの勢いのために水面の高さが安定せず、流出口５２ａへの水Ｗの分配が不安定になるおそれがある。そこで、上流側の排出管３３ａの出口を下に向けて設置しておけば、流量が多い場合であっても、前段槽５０ａに供給される水Ｗは一旦底面に向けて流れてから槽内を上昇するので、前段槽５０ａにおける水位が安定し、それにより流出口５２ａへの水Ｗの分配量が安定する。 The action and effect of the distribution tank 50 is basically the same as that of the distribution tank 40 shown in FIG. However, when the water level adjusting plate 41 (see FIG. 2) is omitted as in the distribution tank 50 shown here, the downstream end of the upstream discharge pipe 33a is extended to the inside of the front tank 50a as shown in FIG. , It is preferable to install the outlet downward. In the case of the distribution tank 40 shown in FIG. 2, even if the flow rate of the water W flowing into the pre-stage tank 40a is large, the water W once exceeds the water level adjusting plate 41 and the water level is evenly adjusted and flows as described above. It is distributed to the outlet 43a and the dividing plate 42. On the other hand, since the distribution tank 50 shown here does not have a configuration corresponding to the water level adjusting plate 41, the outlet of the discharge pipe 33a on the upstream side that supplies water W to the front tank 50a is oriented to the side or upward. If this is the case, the height of the water surface may not be stable due to the momentum of the water W when the flow rate is large, and the distribution of the water W to the outlet 52a may become unstable. Therefore, if the outlet of the discharge pipe 33a on the upstream side is installed facing downward, the water W supplied to the front tank 50a once flows toward the bottom surface and then inside the tank even when the flow rate is large. Therefore, the water level in the pre-stage tank 50a is stabilized, whereby the amount of water W distributed to the outlet 52a is stabilized.

ところで、上記本実施例のように、浄化効率を高める目的で担体１の洗浄に伴って剥離した固形物を反応槽２０に戻すことを考えた場合、例えば図５に参考例として示す如く、排出管３３の途中に開度によって内部を流通する水Ｗの量を調整できる流量調整バルブ３３ｃを設け、洗浄水処理槽３４へ向かう水Ｗの量を制限することが考えられる。この場合、エアリフト管２９から排出されたが洗浄水処理槽３４へ向かうことができない余剰の水Ｗは、受け皿３２ｄから溢れて反応槽２０に戻ることになる。 By the way, when it is considered to return the solid matter peeled off by the washing of the carrier 1 to the reaction vessel 20 for the purpose of improving the purification efficiency as in the above-mentioned embodiment, for example, as shown in FIG. 5 as a reference example, discharge is performed. It is conceivable to provide a flow rate adjusting valve 33c in the middle of the pipe 33 that can adjust the amount of water W flowing inside according to the opening degree to limit the amount of water W flowing toward the washing water treatment tank 34. In this case, the excess water W discharged from the air lift pipe 29 but unable to go to the washing water treatment tank 34 overflows from the saucer 32d and returns to the reaction tank 20.

しかしながら、このような仕組みを採用した場合、水Ｗに含まれる固形物により、流量調整バルブ３３ｃが閉塞するリスクが生じる。流量調整バルブ３３ｃが閉塞すれば、水Ｗと共に固形物の全量が反応槽２０に戻り、浄化効率が著しく低下してしまうことになる。このような事態を避けるためには流量調整バルブ３３ｃを頻繁にメンテナンスする必要があり、手間や費用が生じてしまう。 However, when such a mechanism is adopted, there is a risk that the flow rate adjusting valve 33c is blocked by the solid matter contained in the water W. If the flow rate adjusting valve 33c is closed, the entire amount of solid matter returns to the reaction tank 20 together with the water W, and the purification efficiency is significantly lowered. In order to avoid such a situation, it is necessary to frequently maintain the flow rate adjusting valve 33c, which causes labor and cost.

また、水処理装置の運転にあたっては、浄化の効率や担体１における微生物の担持量、反応槽２０への水Ｗの供給量といった条件に応じ、担体１の洗浄の際にエアリフト管２９へ送り込む空気Ａの量や、洗浄処理の時間等を変更するような場合も考えられる。こういった変更を行えば、洗浄処理の際に反応槽２０に戻される水Ｗの量や、洗浄処理による反応槽２０中の固形物量の変動量が変化する。このため、適当な浄化効率を保つためには、洗浄処理の条件の変更に伴い、流量調整バルブ３３ｃの開度を都度調節する必要がある。こうした調節を手動で行うのは非常に煩雑である。開度の自動調節機構を別途装備することもできるが、それにも費用と手間が生じる。 Further, in the operation of the water treatment apparatus, the air sent to the air lift pipe 29 when cleaning the carrier 1 depends on the conditions such as the efficiency of purification, the amount of microorganisms supported on the carrier 1, and the amount of water W supplied to the reaction tank 20. It is also possible to change the amount of A, the cleaning treatment time, and the like. If such a change is made, the amount of water W returned to the reaction tank 20 during the washing treatment and the amount of fluctuation in the amount of solid matter in the reaction tank 20 due to the washing treatment will change. Therefore, in order to maintain an appropriate purification efficiency, it is necessary to adjust the opening degree of the flow rate adjusting valve 33c each time as the cleaning treatment conditions are changed. Making these adjustments manually is very cumbersome. It is possible to equip an automatic opening adjustment mechanism separately, but that also requires cost and labor.

また、図６に別の参考例として示すように、洗浄水処理槽３４に溜まった固形物を反応槽２０へ戻す固形物戻し管３９を設け、担体１の洗浄処理の間あるいは洗浄処理の後、適当な量の固形物を反応槽２０へ戻すことも考えられるが、この方式では固形物を反応槽２０へ戻すためにポンプ３９ａを設置し、作動させる必要がある。 Further, as shown as another reference example in FIG. 6, a solid matter return pipe 39 for returning the solid matter accumulated in the washing water treatment tank 34 to the reaction tank 20 is provided, and during or after the washing treatment of the carrier 1. It is conceivable to return an appropriate amount of solid matter to the reaction vessel 20, but in this method, it is necessary to install and operate the pump 39a in order to return the solid matter to the reaction vessel 20.

これに対し、図１、図２あるいは図４に示すように、分離装置３２により回収された水Ｗの一部を分配槽４０，５０を用いて反応槽２０へ戻す方式を採用した場合、エアリフト管２９から排出される水Ｗの量が変動しても、必ず概ね一定の割合の水Ｗを反応槽２０へ戻すことができる。図５に示す流量調整バルブ３３ｃや、図６に示すポンプ３９ａのような装置は不要であり、分割板４２，５１と堰４３，５２を備えた分配槽４０，５０を反応槽２０に設置しただけの簡単な構成で、反応槽２０への固形物の回収を実行できる。 On the other hand, as shown in FIGS. 1, 2 or 4, when a method of returning a part of the water W recovered by the separation device 32 to the reaction tank 20 using the distribution tanks 40 and 50 is adopted, the air lift Even if the amount of water W discharged from the pipe 29 fluctuates, a substantially constant proportion of water W can always be returned to the reaction tank 20. Devices such as the flow rate adjusting valve 33c shown in FIG. 5 and the pump 39a shown in FIG. 6 are unnecessary, and the distribution tanks 40 and 50 provided with the dividing plates 42 and 51 and the weirs 43 and 52 are installed in the reaction tank 20. It is possible to recover the solid matter into the reaction vessel 20 with a simple configuration.

また、図示は省略するが、例えば傾斜板３２ｃの一部を板状の部材で覆い、エアリフト管２９から排出される水Ｗの一部を傾斜板３２ｃを通過させずに反応槽２０へ戻すといった仕組みも考えられる。このような構成を採用した場合、非常に簡単な構成である程度安定した返流量を確保できると思われるが、エアリフト管２９からの水Ｗの排出が多い場合には、想定より多くの水Ｗが傾斜板３２ｃを通過してしまうような事態も考えられる。図１〜図４に示すように分配槽４０，５０を設けた構成であれば、より安定した返流量を確保することができる。 Further, although not shown, for example, a part of the inclined plate 32c is covered with a plate-shaped member, and a part of the water W discharged from the air lift pipe 29 is returned to the reaction tank 20 without passing through the inclined plate 32c. A mechanism is also conceivable. When such a configuration is adopted, it seems that a stable return flow rate can be secured to some extent with a very simple configuration, but when the amount of water W discharged from the air lift pipe 29 is large, more water W than expected is generated. It is conceivable that the plate passes through the inclined plate 32c. If the distribution tanks 40 and 50 are provided as shown in FIGS. 1 to 4, a more stable return flow rate can be secured.

以上のように、上記本実施例は、微生物を担持する担体１と共に処理対象としての水Ｗを貯留する反応槽２０と、反応槽２０の底部に一端を、水面より上に他端を配置されたエアリフト管２９と、エアリフト管２９の内部へ気体（空気）Ａを送り込む導気管３０と、エアリフト管２９の他端から反応槽２０の水面に向かって下り勾配をなし、水Ｗが両面間を通過できる隙間を備えた傾斜板３２ｃとを備え、エアリフト管２９に導気管３０から気体Ａを吹き込むことで、反応槽２０内の担体１と水Ｗをエアリフト管２９内へ吸入し、気体Ａと共にエアリフト管２９の他端から排出して傾斜板３２ｃに導き、担体１は傾斜板３２ｃに沿って落下させて反応槽２０へ戻す一方、傾斜板３２ｃの隙間から下方へ流れる水Ｗは排出管３３を通して外部へ排出するよう構成され、排出管３３を通る水Ｗの一部を反応槽２０へ戻す分配槽４０，５０を設けている。このようにすると、担体１の洗浄により目詰まりや固着は防止しつつ、剥離した固形物の一部を反応槽２０に戻すことで、反応槽２０内における微生物群の保持量を保ち、浄化効率を向上させることができる。 As described above, in the above embodiment, the reaction tank 20 for storing the water W to be treated together with the carrier 1 carrying the gas, and one end at the bottom of the reaction tank 20 and the other end above the water surface are arranged. The air lift pipe 29, the air guide pipe 30 that sends gas (air) A into the inside of the air lift pipe 29, and the other end of the air lift pipe 29 form a downward gradient toward the water surface of the reaction tank 20, and the water W forms a downward gradient between both sides. By providing an inclined plate 32c having a gap through which the gas can pass and blowing the gas A into the air lift pipe 29 from the air guide pipe 30, the carrier 1 and the water W in the reaction tank 20 are sucked into the air lift pipe 29 together with the gas A. The water W is discharged from the other end of the air lift pipe 29 and guided to the inclined plate 32c, and the carrier 1 is dropped along the inclined plate 32c and returned to the reaction tank 20, while the water W flowing downward from the gap of the inclined plate 32c is discharged from the discharge pipe 33. Distribution tanks 40 and 50 are provided so as to discharge a part of the water W passing through the discharge pipe 33 to the reaction tank 20. In this way, while preventing clogging and sticking by washing the carrier 1, by returning a part of the exfoliated solid matter to the reaction tank 20, the retention amount of the microorganisms in the reaction tank 20 is maintained, and the purification efficiency is maintained. Can be improved.

また、各実施例において、分配槽４０，５０は反応槽２０内に配置することができる。このようにすれば、流出口４３ａ，５２ａから排出された水Ｗがそのまま反応槽２０に戻るので、返流のための配管を不要とすることができる。 Further, in each embodiment, the distribution tanks 40 and 50 can be arranged in the reaction tank 20. In this way, the water W discharged from the outlets 43a and 52a returns to the reaction tank 20 as it is, so that the piping for return can be eliminated.

また、各実施例において、分配槽４０は、排出管３３からの水Ｗが供給される前段側の空間と、水Ｗを下流側へ排出する後段側の空間とに内部を分割する分割板４２，５１と、前記前段側の空間と分配槽４０の外側を仕切る外壁に設けられた堰４３，５２と、堰４３，５２に設けられた流出口４３ａ，５２ａとを備え、排出管３３から前段側の空間へ供給された水Ｗは、一部が前記流出口４３ａ，５２ａから反応槽２０へ流れ、一部が分割板４２，５１を越えて前記後段側の空間へ流れるよう構成されている。このようにすれば、分割板４２，５１と堰４３，５２を備えた分配槽４０，５０を反応槽２０に設置しただけの簡単な構成で、反応槽２０への固形物の回収を行うことができる。 Further, in each embodiment, the distribution tank 40 is divided into a space on the front stage side where the water W from the discharge pipe 33 is supplied and a space on the rear stage side where the water W is discharged to the downstream side. , 51, weirs 43 and 52 provided on the outer wall partitioning the space on the front stage side from the outside of the distribution tank 40, and outlets 43a and 52a provided on the weirs 43 and 52, and the discharge pipe 33 to the front stage. A part of the water W supplied to the space on the side flows from the outlets 43a and 52a to the reaction tank 20, and a part of the water W passes over the dividing plates 42 and 51 and flows to the space on the rear stage side. .. In this way, the solid matter can be recovered into the reaction tank 20 with a simple configuration in which the distribution tanks 40 and 50 provided with the dividing plates 42 and 51 and the weirs 43 and 52 are installed in the reaction tank 20. Can be done.

また、各実施例において、堰４３，５２は高さを可変に構成されている。このようにすれば、堰４３，５２の高さを変えることにより、分配槽４０，５０から反応槽２０に戻る水Ｗの割合を調整することができる。 Further, in each embodiment, the weirs 43 and 52 are configured to have a variable height. In this way, the proportion of water W returning from the distribution tanks 40 and 50 to the reaction tank 20 can be adjusted by changing the heights of the weirs 43 and 52.

また、各実施例において、流出口４３ａは、堰４３の上縁に設けられ、下方に向かって幅が狭くなる形状を有する切れ込みとし、流出口４３ａのなす角度は５°以上６０°未満とすることができる。このようにすれば、堰４３の高さの変更を介した返流量の調整を容易にすることができる。 Further, in each embodiment, the outlet 43a is provided on the upper edge of the weir 43 and has a shape that narrows downward, and the angle formed by the outlet 43a is 5 ° or more and less than 60 °. be able to. In this way, it is possible to easily adjust the return flow rate by changing the height of the weir 43.

また、各実施例においては、流出口４３ａの下端部に、先端部の形状を鈍く形成した鈍角部４３ｂを備えることができる。このようにすれば、流出口４３ａに詰まりを生じにくくすることができる。 Further, in each embodiment, an obtuse angle portion 43b in which the shape of the tip portion is bluntly formed can be provided at the lower end portion of the outlet 43a. By doing so, it is possible to prevent clogging of the outlet 43a.

また、一部の実施例は、前記前段側の空間を、排出管３３が接続される前段槽４０ａと、堰４３が設けられた中段槽４０ｂとに分割する水位調整板４１を備え、排出管３３から前段槽４０ａに供給された水Ｗは、水位調整板４１を越えて中段槽４０ｂに流れるよう構成されている。このようにすれば、流量が多い場合における流出口４３ａへの水Ｗの分配量を安定させることができる。 Further, some embodiments include a water level adjusting plate 41 that divides the space on the front stage side into a front stage tank 40a to which the discharge pipe 33 is connected and a middle stage tank 40b provided with a weir 43, and the discharge pipe. The water W supplied from the 33 to the front tank 40a is configured to flow over the water level adjusting plate 41 to the middle tank 40b. By doing so, it is possible to stabilize the amount of water W distributed to the outlet 43a when the flow rate is large.

また、一部の実施例において、前記前段側の空間に接続された排出管３３の出口は、下向きに設置されている。このようにしても、流量が多い場合における流出口５２ａへの水Ｗの分配量を安定させることができる。 Further, in some embodiments, the outlet of the discharge pipe 33 connected to the space on the front stage side is installed facing downward. Even in this way, the amount of water W distributed to the outlet 52a when the flow rate is large can be stabilized.

したがって、上記本実施例によれば、簡便な構成により高い効率で水を浄化し得る。 Therefore, according to the present embodiment, water can be purified with high efficiency by a simple configuration.

尚、本発明の水処理装置は、上述の実施例にのみ限定されるものではなく、本発明の要旨を逸脱しない範囲内において種々変更を加え得ることは勿論である。 The water treatment apparatus of the present invention is not limited to the above-described embodiment, and it goes without saying that various modifications can be made without departing from the gist of the present invention.

１ 担体
２０ 反応槽
２９ エアリフト管
３０ 導気管
３２ｃ 傾斜板
３３ 排出管
４０ 分配槽
４０ａ 前段槽
４０ｂ 中段槽
４１ 水位調整板
４２ 分割板
４３ 堰
４３ａ 流出口
５０ 分配槽
５１ 分割板
５２ 堰
５２ａ 流出口
Ａ 空気
Ｗ 水 1 Carrier 20 Reaction tank 29 Air lift pipe 30 Air guide pipe 32c Inclined plate 33 Discharge pipe 40 Distribution tank 40a Front stage tank 40b Middle stage tank 41 Water level adjustment plate 42 Divided plate 43 Weir 43a Outlet 50 Distribution tank 51 Divided plate 52 Weir 52a Outlet A Air W water

Claims (8)

微生物を担持する担体と共に処理対象としての水を貯留する反応槽と、
前記反応槽の底部に一端を、水面より上に他端を配置されたエアリフト管と、
前記エアリフト管の内部へ気体を送り込む導気管と、
前記エアリフト管の他端から前記反応槽の水面に向かって下り勾配をなし、水が両面間を通過できる隙間を備えた傾斜板とを備え、
前記エアリフト管に前記導気管から気体を吹き込むことで、前記反応槽内の担体と水を前記エアリフト管内へ吸入し、気体と共に前記エアリフト管の他端から排出して前記傾斜板に導き、担体は前記傾斜板に沿って落下させて反応槽へ戻す一方、前記傾斜板の隙間から下方へ流れる水は排出管を通して外部へ排出するよう構成され、
前記排出管を通る水の一部を前記反応槽へ戻す分配槽を設けたこと
を特徴とする水処理装置。 A reaction tank that stores water as a treatment target together with a carrier that supports microorganisms,
An air lift tube having one end at the bottom of the reaction vessel and the other end above the water surface.
An air guide tube that sends gas into the air lift tube and
It is provided with an inclined plate having a downward gradient from the other end of the air lift pipe toward the water surface of the reaction tank and having a gap through which water can pass between both sides.
By blowing gas into the air lift pipe from the air guide pipe, the carrier and water in the reaction vessel are sucked into the air lift pipe, discharged from the other end of the air lift pipe together with the gas, and guided to the inclined plate. It is configured to drop along the inclined plate and return it to the reaction tank, while the water flowing downward through the gap of the inclined plate is discharged to the outside through the discharge pipe.
A water treatment apparatus provided with a distribution tank for returning a part of water passing through the discharge pipe to the reaction tank. 前記分配槽は前記反応槽内に配置されていることを特徴とする請求項１に記載の水処理装置。 The water treatment apparatus according to claim 1, wherein the distribution tank is arranged in the reaction tank. 前記分配槽は、
前記排出管からの水が供給される前段側の空間と、水を下流側へ排出する後段側の空間とに内部を分割する分割板と、
前記前段側の空間と前記分配槽の外側を仕切る外壁に設けられた堰と、
前記堰に設けられた流出口とを備え、
前記排出管から前段側の空間へ供給された水は、一部が前記流出口から前記反応槽へ流れ、一部が前記分割板を越えて前記後段側の空間へ流れるよう構成されていることを特徴とする請求項１または２に記載の水処理装置。 The distribution tank
A dividing plate that divides the inside into a space on the front stage side where water is supplied from the discharge pipe and a space on the rear stage side where water is discharged to the downstream side.
A weir provided on the outer wall that separates the space on the front stage side from the outside of the distribution tank,
With an outlet provided on the weir,
The water supplied from the discharge pipe to the space on the front stage side is configured so that a part of the water flows from the outlet to the reaction tank and a part of the water flows over the dividing plate to the space on the rear stage side. The water treatment apparatus according to claim 1 or 2. 前記堰は高さを可変に構成されていることを特徴とする請求項３に記載の水処理装置。 The water treatment apparatus according to claim 3, wherein the weir has a variable height. 前記流出口は、前記堰の上縁に設けられ、下方に向かって幅が狭くなる形状を有する切れ込みであり、前記流出口のなす角度は５°以上６０°未満であることを特徴とする請求項４に記載の水処理装置。 The claim is a notch provided on the upper edge of the weir and having a shape in which the width narrows downward, and the angle formed by the outlet is 5 ° or more and less than 60 °. Item 4. The water treatment apparatus according to item 4. 前記流出口の下端部に、先端部の形状を鈍く形成した鈍角部を備えたことを特徴とする請求項５に記載の水処理装置。 The water treatment apparatus according to claim 5, further comprising an obtuse-angled portion having an obtuse-shaped tip portion at the lower end portion of the outlet. 前記前段側の空間を、前記排出管が接続される前段槽と、前記堰が設けられた中段槽とに分割する水位調整板を備え、
前記排出管から前記前段槽に供給された水は、前記水位調整板を越えて前記中段槽に流れるよう構成されていることを特徴とする請求項３〜６のいずれか一項に記載の水処理装置。 A water level adjusting plate for dividing the space on the front stage side into a front stage tank to which the discharge pipe is connected and a middle stage tank provided with the weir is provided.
The water according to any one of claims 3 to 6, wherein the water supplied from the discharge pipe to the front stage tank is configured to flow over the water level adjusting plate to the middle stage tank. Processing equipment. 前記前段側の空間に接続された前記排出管の出口は、下向きに設置されていることを特徴とする請求項３〜７のいずれか一項に記載の水処理装置。 The water treatment apparatus according to any one of claims 3 to 7, wherein the outlet of the discharge pipe connected to the space on the front stage side is installed facing downward.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61291099A (en) * 1985-06-17 1986-12-20 Sanki Eng Co Ltd Downward flow type biological membrane purifying apparatus
JPH10244295A (en) * 1998-01-12 1998-09-14 Saitama Pref Gov Nitrogen removal device
JP2003200184A (en) * 2001-10-25 2003-07-15 Sanki Eng Co Ltd Catchment mechanism for descending flow type water treatment device
JP2003260494A (en) * 2002-03-12 2003-09-16 Takuma Co Ltd Biological membrane filtering method and system therefor
JP2003334579A (en) * 2002-05-21 2003-11-25 Nishihara Neo Kogyo Kk Sludge transfer device and soil water treatment device
JP2006110442A (en) * 2004-10-14 2006-04-27 Yanmar Co Ltd Sludge disposal equipment

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61291099A (en) * 1985-06-17 1986-12-20 Sanki Eng Co Ltd Downward flow type biological membrane purifying apparatus
JPH10244295A (en) * 1998-01-12 1998-09-14 Saitama Pref Gov Nitrogen removal device
JP2003200184A (en) * 2001-10-25 2003-07-15 Sanki Eng Co Ltd Catchment mechanism for descending flow type water treatment device
JP2003260494A (en) * 2002-03-12 2003-09-16 Takuma Co Ltd Biological membrane filtering method and system therefor
JP2003334579A (en) * 2002-05-21 2003-11-25 Nishihara Neo Kogyo Kk Sludge transfer device and soil water treatment device
JP2006110442A (en) * 2004-10-14 2006-04-27 Yanmar Co Ltd Sludge disposal equipment

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