JP2019179748A5

JP2019179748A5 -

Info

Publication number: JP2019179748A5
Application number: JP2018070220A
Authority: JP
Filing date: 2018-03-30
Publication date: 2021-04-08
Anticipated expiration: 2038-03-30

Claims

物体の表面の一部に真空領域を形成可能な真空形成部材と、
前記真空領域を介して前記物体に荷電粒子ビームを照射する照射装置と、
前記物体の表面とは反対側の裏面に保持力を及ぼし、前記物体を保持して前記真空形成部材に対して移動可能なステージと
を備え、
前記ステージは、前記物体の裏面における前記真空形成部材の位置に応じて、前記裏面の一部の領域に対して前記裏面の他の領域とは異なる前記保持力を及ぼす
荷電粒子装置。 A vacuum forming member capable of forming a vacuum region on a part of the surface of an object,
An irradiation device that irradiates the object with a charged particle beam through the vacuum region,
A stage that exerts a holding force on the back surface opposite to the front surface of the object, holds the object, and can move with respect to the vacuum forming member.
With
The stage is a charged particle device that exerts a holding force different from other regions on the back surface of a part of the back surface depending on the position of the vacuum forming member on the back surface of the object.

前記ステージは、前記物体の前記裏面との間に形成される空間を複数の区画に分割する隔壁部材を備え、
前記複数の区画のうちの前記物体の表面における前記真空形成部材の位置に対応した一の区画の気圧を、前記複数の区画のうちの他の区画の気圧と異ならせる気圧調整装置を更に備える
請求項１に記載の荷電粒子装置。 The stage includes a partition member that divides a space formed between the object and the back surface into a plurality of sections.
A claim further comprising a pressure adjusting device for making the air pressure of one compartment corresponding to the position of the vacuum forming member on the surface of the object among the plurality of compartments different from the air pressure of the other compartments of the plurality of compartments. Item 2. The charged particle apparatus according to item 1.

前記真空形成部材は、第１排気装置を用いて前記真空領域を形成し、
前記気圧調整装置は、前記第１排気装置とは異なる第２排気装置を用いて前記空間を排気する
請求項２に記載の荷電粒子装置。 The vacuum forming member forms the vacuum region by using the first exhaust device.
The charged particle device according to claim 2 , wherein the air pressure adjusting device exhausts the space by using a second exhaust device different from the first exhaust device.

前記第２排気装置は、拡散ポンプ、クライオポンプ、ターボ分子ポンプ及びスパッタイオンポンプのうち少なくとも１つを含む
請求項３に記載の荷電粒子装置。 The charged particle device according to claim 3, wherein the second exhaust device includes at least one of a diffusion pump, a cryopump, a turbo molecular pump, and a sputter ion pump.

前記真空形成部材は、第１排気装置を用いて前記真空領域を形成し、
前記気圧調整装置は、前記第１排気装置を用いて前記空間を排気する
請求項２に記載の荷電粒子装置。 The vacuum forming member forms the vacuum region by using the first exhaust device.
The charged particle device according to claim 2 , wherein the air pressure adjusting device exhausts the space by using the first exhaust device.

前記気圧調整装置は、前記一の区画の気圧を、前記他の区画の気圧よりも低く調整する
請求項２から５のいずれか一項に記載の荷電粒子装置。 The air pressure adjusting device adjusts the air pressure in the one section to be lower than the air pressure in the other section.
The charged particle apparatus according to any one of claims 2 to 5.

前記ステージは、前記物体を保持する保持部材を備え、
前記保持部材は、前記空間に、前記他方の面を支持する複数のピン状部材を有する
請求項２から６のいずれか一項に記載の荷電粒子装置。 The stage comprises a holding member that holds the object.
The charged particle device according to any one of claims 2 to 6 , wherein the holding member has a plurality of pin-shaped members that support the other surface in the space.

前記気圧調整装置は、前記真空形成装置が形成する真空領域による吸引力に起因した前記物体の変形を抑制するように前記一の区画の気圧を調整する
請求項２から７のいずれか一項に記載の荷電粒子装置。 The air pressure adjusting device, in any one of claims 2 to 7 for adjusting the pressure of the one compartment so to suppress the deformation of the object due to the suction force by the vacuum area in which the vacuum forming apparatus forms The charged particle device described.

前記気圧調整装置が気圧を調整する前記一の区画の位置は、前記ステージの移動による前記物体と前記真空形成部材との相対的な位置関係の変化に伴って変化する
請求項２から８のいずれか一項に記載の荷電粒子装置。 Any of claims 2 to 8 , wherein the position of the one section in which the atmospheric pressure adjusting device adjusts the atmospheric pressure changes according to a change in the relative positional relationship between the object and the vacuum forming member due to the movement of the stage. The charged particle apparatus according to one item.

前記ステージは、前記物体の前記裏面の複数の領域に静電力を及ぼして前記保持力を発生させる複数の静電チャックを備え、
一部の前記静電チャックが及ぼす静電力を、他の前記静電チャックが及ぼす静電力と異ならせる
請求項１から９のいずれか一項に記載の荷電粒子装置。 The stage comprises a plurality of electrostatic chucks that exert an electrostatic force on a plurality of regions on the back surface of the object to generate the holding force.
The charged particle device according to any one of claims 1 to 9 , wherein the electrostatic force exerted by some of the electrostatic chucks is different from the electrostatic force exerted by the other electrostatic chucks.

前記物体の表面における前記真空形成部材の位置に対応した前記裏面の一部の領域に前記一部の静電チャックが及ぼす静電力を、前記裏面の他の領域に前記他の静電チャックが及ぼす前記静電力より大きくする
請求項１０に記載の荷電粒子装置。 The electrostatic force exerted by the part of the electrostatic chuck on a part of the back surface corresponding to the position of the vacuum forming member on the surface of the object is exerted on the other area of the back surface by the other electrostatic chuck. The charged particle device according to claim 10 , wherein the electrostatic force is made larger than the electrostatic force.

前記一部の静電チャックは、前記真空形成部材が形成する前記真空領域による吸引力に起因した前記物体の変形を抑制するように、前記一部の領域に及ぼす前記静電力を調整する
請求項１１に記載の荷電粒子装置。 A claim that the partial electrostatic chuck adjusts the electrostatic force exerted on the partial region so as to suppress deformation of the object due to the attractive force formed by the vacuum region formed by the vacuum forming member. 11. The charged particle apparatus according to 11.

前記一部の領域の位置は、前記ステージの移動による前記物体と前記真空形成装置の相対位置の変化に伴って移動し、前記移動に伴って前記他の静電チャックが前記一部の静電チャックとなる
請求項１１又は１２に記載の荷電粒子装置。 The position of the partial region moves with the change in the relative position between the object and the vacuum forming apparatus due to the movement of the stage, and the other electrostatic chuck causes the partial electrostatic chuck with the movement. The charged particle apparatus according to claim 11 or 12 , which serves as a chuck.

前記ステージと前記物体の前記裏面との間に形成される空間を排気して、前記物体の前記裏面に前記保持力の少なくとも一部を付与する気圧調整装置を更に備える
請求項１０から１３のいずれか一項に記載の荷電粒子装置。 Any of claims 10 to 13 , further comprising a pressure regulating device that exhausts the space formed between the stage and the back surface of the object to impart at least a part of the holding force to the back surface of the object. The charged particle apparatus according to one item.

前記物体の表面の前記真空領域が形成されている領域以外の領域は、非真空領域又は前記真空領域よりも真空度が低い領域である
請求項１から１４のいずれか一項に記載の荷電粒子装置。 The charged particle according to any one of claims 1 to 14, wherein the region other than the region where the vacuum region is formed on the surface of the object is a non-vacuum region or a region having a lower degree of vacuum than the vacuum region. apparatus.

前記真空形成部材は、前記物体の表面と対向するように設けられ、第３排気装置と連通している第１の開口を有する、
請求項１から１５のいずれか一項に記載の荷電粒子装置。 The vacuum forming member is provided so as to face the surface of the object and has a first opening communicating with a third exhaust device.
The charged particle apparatus according to any one of claims 1 to 15.

前記真空形成部材は、前記第１の開口の周囲に前記物体の表面と対向するように設けられ、第４排気装置と連通している第２の開口を有する
請求項１６に記載の荷電粒子装置。 The charged particle device according to claim 16, wherein the vacuum forming member is provided around the first opening so as to face the surface of the object and has a second opening communicating with the fourth exhaust device. ..

前記第１の開口内の空間の真空度は、前記第２の開口における真空度よりも高い
請求項１７に記載の荷電粒子装置。 The charged particle apparatus according to claim 17, wherein the degree of vacuum in the space in the first opening is higher than the degree of vacuum in the second opening.

前記真空形成部材は、前記物体と前記真空形成部材との間の間隙、及び、前記第１の開口と前記第２の開口とによって、前記物体の表面に非接触で前記真空領域を形成する差動排気方式の真空形成部材である
請求項１７又は１８に記載の荷電粒子装置。 The difference in the vacuum forming member is that the gap between the object and the vacuum forming member and the first opening and the second opening form the vacuum region in a non-contact manner with respect to the surface of the object. The charged particle device according to claim 17 or 18, which is a vacuum forming member of a dynamic exhaust system.

前記真空領域の気圧は、１×１０^−３パスカル以下である
請求項１から１９のいずれか一項に記載の荷電粒子装置。 The charged particle apparatus according to any one of claims 1 to 19 , wherein the atmospheric pressure in the vacuum region is 1 × 10 ^{-3 pascal or less.}

前記真空形成部材と前記物体との間の距離は、１μｍ以上且つ１０μｍ以下である
請求項１から２０のいずれか一項に記載の荷電粒子装置。 The charged particle apparatus according to any one of claims 1 to 20 , wherein the distance between the vacuum forming member and the object is 1 μm or more and 10 μm or less.

請求項１から２１のいずれか一項に記載の荷電粒子装置と、
大気圧下で前記物体を計測する計測装置と
を備え、
前記荷電粒子装置は、前記荷電粒子ビームが照射された前記物体からの荷電粒子の検出結果に基づいて、前記物体を計測する荷電粒子線計測装置である
計測システム。 The charged particle apparatus according to any one of claims 1 to 21 and
Equipped with a measuring device that measures the object under atmospheric pressure,
The charged particle device is a measurement system that is a charged particle beam measuring device that measures the object based on the detection result of the charged particles from the object irradiated with the charged particle beam.

前記計測装置で計測される前記物体上の領域の少なくとも一部を、前記荷電粒子線計測装置で計測する
請求項２２に記載の計測システム。 The measurement system according to claim 22 , wherein at least a part of a region on the object measured by the measuring device is measured by the charged particle beam measuring device.

前記領域には、所定の指標物が形成されている
請求項２３に記載の計測システム。 The measurement system according to claim 23 , wherein a predetermined index object is formed in the region.

前記領域にはレジストパターンが形成されている
請求項２３又は２４に記載の計測システム。 The measurement system according to claim 23 or 24 , wherein a resist pattern is formed in the region.

前記荷電粒子線計測装置は、前記物体の内部に形成されたパターンに関する情報を取得する
請求項２２から２５のいずれか一項に記載の計測システム。 The measuring system according to any one of claims 22 to 25 , wherein the charged particle beam measuring device acquires information about a pattern formed inside the object.

前記計測装置による計測後に、前記荷電粒子線計測装置による計測を行う
請求項２２から２６のいずれか一項に記載の計測システム。 The measurement system according to any one of claims 22 to 26 , wherein the measurement by the charged particle beam measuring device is performed after the measurement by the measuring device.

前記計測装置は、光学顕微鏡及び回折干渉計の少なくとも一方を含み、
前記回折干渉計は、前記物体上で回折された回折光同士を互いに干渉させて得られる干渉光を検出することで前記物体を計測する
請求項２２から２７のいずれか一項に記載の計測システム。 The measuring device includes at least one of an optical microscope and a diffraction interferometer.
The diffraction interferometer measurement system according to any one of claims 22 27 for measuring the object by detecting the interference light obtained by interference between the diffracted light together diffracted on said object ..

物体の表面に荷電粒子ビームを照射する荷電粒子ビームの照射方法であって、
前記物体の表面とは反対側の裏面に保持力を及ぼして前記物体をステージ上に保持することと、
前記物体の表面の一部に真空領域を形成することと、
前記真空領域を介して前記物体に荷電粒子ビームを照射することと、
前記物体と前記真空領域との相対位置を変更することと、
前記物体の表面における前記真空領域の位置に応じて、前記裏面の一部の領域に対して前記裏面の他の領域とは異なる前記保持力を及ぼすことと
を含む荷電粒子ビームの照射方法。 It is an irradiation method of a charged particle beam that irradiates the surface of an object with a charged particle beam.
To hold the object on the stage by applying a holding force to the back surface opposite to the front surface of the object.
Forming a vacuum region on a part of the surface of the object
Irradiating the object with a charged particle beam through the vacuum region,
Changing the relative position of the object and the vacuum region,
A method of irradiating a charged particle beam, which comprises exerting the holding force different from the other regions of the back surface on a part of the back surface according to the position of the vacuum region on the surface of the object.