JP2018120924A - プラズマ処理装置のチャンバ本体の内部のクリーニングを含むプラズマ処理方法 - Google Patents
プラズマ処理装置のチャンバ本体の内部のクリーニングを含むプラズマ処理方法 Download PDFInfo
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Abstract
【解決手段】プラズマ処理装置のチャンバ本体の内部のクリーニングを含むプラズマ処理方法が提供される。この方法は、フルオロカーボンガス及び/又はハイドロフルオロカーボンガスを含む処理ガスのプラズマを生成することにより、ステージ上に載置された被加工物のエッチング対象膜を低温でエッチングするメインエッチングを含むエッチング工程と、被加工物をチャンバから搬出する工程と、静電チャックの温度が高い温度に設定された状態で、クリーニングガスのプラズマを生成することにより、チャンバ本体の内部をクリーニングする工程と、を含む。
【選択図】図1
Description
Claims (7)
- プラズマ処理装置のチャンバ本体の内部のクリーニングを含むプラズマ処理方法であって、
前記プラズマ処理装置は、
チャンバを提供する前記チャンバ本体と、
前記チャンバ内に設けられたステージであり、その上に載置される被加工物を保持するよう構成された静電チャックを有する、該ステージと、
前記静電チャックの温度を調整する温度調整機構と、
を備え、
前記チャンバ内でフルオロカーボンガス及び/又はハイドロフルオロカーボンガスを含む処理ガスのプラズマを生成することにより、前記静電チャック上に載置された被加工物のエッチング対象膜をエッチングする工程であり、前記温度調整機構によって前記静電チャックの温度が−30℃以下の温度に設定された状態で該エッチング対象膜をエッチングするメインエッチングを含む、該工程と、
エッチングする前記工程の実行後に前記被加工物を前記チャンバから搬出する工程と、
前記被加工物を搬出する前記工程の実行後に、前記温度調整機構により前記静電チャックの温度が0℃以上の温度に設定された状態で、前記チャンバ内で酸素を含むクリーニングガスのプラズマを生成することにより、前記チャンバ本体の内部をクリーニングする工程と、
を含むプラズマ処理方法。 - エッチングする前記工程は、前記メインエッチングの実行後に、前記エッチング対象膜を更にエッチングするオーバーエッチングを更に含む、請求項1に記載のプラズマ処理方法。
- クリーニングする前記工程の実行前に前記静電チャックの温度を0℃以上の温度に上昇させるために、前記オーバーエッチングの実行時に前記温度調整機構により前記静電チャックの温度を上昇させる工程を更に含む、請求項2に記載のプラズマ処理方法。
- 前記オーバーエッチングの実行時に、前記静電チャックの温度が、−30℃より高く、0℃より低い温度に設定される、請求項2に記載のプラズマ処理方法。
- エッチングする前記工程の実行後、且つ、前記被加工物を前記チャンバから搬出する前記工程の実行前に、前記静電チャックを除電する工程と、
クリーニングする前記工程の実行前に前記静電チャックの温度を0℃以上の温度に上昇させるために、前記静電チャックを除電する前記工程の実行時に前記温度調整機構により前記静電チャックの温度を上昇させる工程を更に含む、
請求項1又は2に記載のプラズマ処理方法。 - 前記ステージは、流路が形成された下部電極を有し、
前記静電チャックは、前記下部電極上に設けられており、
前記温度調整機構は、
第1の熱交換媒体を供給する第1の温度調節器、及び、
第1の熱交換媒体の温度よりも高い温度を有する第2の熱交換媒体を供給する第2の温度調節器、
を有し、
前記メインエッチングの実行時に、前記第1の熱交換媒体が前記第1の温度調節器から前記流路に供給され、
前記静電チャックの温度を上昇させる前記工程の実行時に、前記第2の熱交換媒体が前記第2の温度調節器から前記流路に供給される、
請求項3又は5項に記載のプラズマ処理方法。 - 前記ステージは、流路が形成された冷却台、及び、前記静電チャック内に設けられたヒータを有し、
前記静電チャックは、前記冷却台の上に設けられており、
前記静電チャックと前記冷却台の間には、シールされた空間が設けられており、
前記温度調整機構は、
前記ヒータと、
前記流路に冷媒を供給するよう構成されたチラーユニット、及び、
前記空間に、前記チラーユニット、排気装置、及び、伝熱ガスのソースのうち一つを選択的に接続するよう構成された配管系、
を有し、
前記メインエッチングの実行時に、前記チラーユニットから前記流路に前記冷媒が供給され、前記チラーユニットから前記空間に前記冷媒が供給され、
前記静電チャックの温度を上昇させる前記工程の実行時に、前記ヒータによって前記静電チャックが加熱され、前記空間が前記排気装置によって減圧される、
請求項3又は5に記載のプラズマ処理方法。
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