JP2017170418A - 積層体の製造方法及び積層体 - Google Patents
積層体の製造方法及び積層体 Download PDFInfo
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Abstract
Description
本発明の一態様に係る積層体の製造方法は、多孔質性を有するシート状又はチューブ状の支持体と、この支持体の外面に積層される半透膜層とを備える積層体の製造方法であって、溶媒にフッ素樹脂を分散した半透膜層用組成物を上記支持体の外面に塗布する塗布工程と、上記塗布工程後の支持体の塗布面を水に浸漬する浸漬工程と、上記支持体を浸漬した水を加熱する加熱工程とを備える。
以下、本発明の実施形態に係る積層体の製造方法及び積層体について詳説する。
当該積層体の製造方法は、多孔質性を有するシート状又はチューブ状の支持体と、この支持体の外面に積層される半透膜層とを備える積層体の製造方法である。当該積層体の製造方法は、図1に示すように、溶媒にフッ素樹脂を分散した半透膜層用組成物を上記支持体の外面に塗布する塗布工程S1と、上記塗布工程S1後の支持体の塗布面を水に浸漬する浸漬工程S2と、上記支持体を浸漬した水を加熱する加熱工程S3と、上記加熱工程S3後の積層体をアニール処理するアニール工程S4とを備える。
塗布工程S1では、溶媒にフッ素樹脂を分散した半透膜層用組成物を上記支持体の外面に塗布する。
半透膜層用組成物に分散するフッ素樹脂は、粉末状(以下、「フッ素樹脂粉末」ともいう)である。上記フッ素樹脂としては、アモルファスフッ素樹脂、ポリテトラフルオロエチレン(PTFE)、テトラフルオロエチレン−パーフルオロアルキルビニルエーテル共重合体(PFA)等を挙げることができる。中でも、アモルファスフッ素樹脂が好ましい。上記フッ素樹脂をアモルファスフッ素樹脂とすることで、半透膜層の支持体に対する被覆性が向上し、半透膜層のピンホールやクラックの発生を低減できる。
上記支持体は、シート状又はチューブ状の多孔質体である。上記支持体の材質としては、特に限定されず、例えば各種エラストマー、ポリオレフィン、フッ素樹脂等を挙げることができる。中でも耐薬品性、耐熱性等に優れるフッ素樹脂が好ましく、PTFEが特に好ましい。
浸漬工程S2では、上記塗布工程S1後の支持体のうち、少なくとも塗布面を水に浸漬する。具体的には、例えば支持体を収納可能な容積を有する水槽に支持体を浸漬する。この水槽内の水は、貯留水であっても流水であってもよい。
加熱工程S3では、上記支持体を浸漬した水を加熱する。具体的には、上記支持体の半透膜層用組成物が塗布された面を水に浸漬した状態で、水を加熱し、半透膜層用組成物に含まれる溶媒を気化させ、除去する。これにより、上記支持体の外面に半透膜層を形成する。
アニール工程S4は、上記加熱工程S3後の積層体をアニール処理する。具体的には、上記加熱工程S3後の積層体を水から取り出し、一定時間の加熱を行う。このように上記加熱工程後の積層体をアニール処理する工程をさらに備えることで、フッ素樹脂の結晶化度を飽和させることができるので、半透膜層の強度が向上し、半透膜層のピンホールやクラックの発生の抑止効果を高められる。
図2の積層体は、分子又はイオンの分離に用いられる膜状の積層体である。当該積層体は、多孔質性を有するシート状の支持体1と、この支持体1の片面に積層される半透膜層2とを備える。当該積層体は、例えば図1の積層体の製造方法を用いて製造することができる。
支持体1は、積層体の製造方法で説明した支持体と同様であるので、説明を省略する。
半透膜層2は、分子又はイオンを分離する層である。半透膜層2の主成分としては、分子又はイオンを分離する層を形成できる限り特に限定されないが、アモルファスフッ素樹脂、ポリテトラフルオロエチレン(PTFE)、テトラフルオロエチレン−パーフルオロアルキルビニルエーテル共重合体(PFA)等を挙げることができる。中でもアモルファスフッ素樹脂が好ましい。このように上記半透膜層2の主成分をアモルファスフッ素樹脂とすることで、半透膜層2の支持体1に対する被覆性が向上し、半透膜層2のピンホールやクラックが低減できる。
今回開示された実施の形態はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は、上記実施形態の構成に限定されるものではなく、特許請求の範囲によって示され、特許請求の範囲と均等の意味及び範囲内での全ての変更が含まれることが意図される。
支持体として平膜状のPTFE多孔質シート(住友電工ファインポリマー社製「ポアフロンFP−045−80」)を準備した。また、半透膜用組成物として、アモルファスフッ素樹脂(ソルベイソレクシス社製の「AD60」)を溶媒としてのパーフルオロポリエーテル(ソルベイソレクシス社製のガルデン(登録商標)「HT110」、沸点110℃、表面張力16dyne/cm)に分散した半透膜層用組成物を準備した。半透膜層用組成物におけるアモルファスフッ素樹脂の含有量は9質量%であり、溶媒の沸点は110℃であった。
支持体を中空糸状のPTFE多孔質チューブ(住友電工ファインポリマー社製「ポアフロンTB1009」)とし、このチューブの外面に半透膜用組成物を塗布した以外は、No.1と同様にしてNo.2の積層体を作製した。
半透膜用組成物の塗布後、支持体を水に浸漬せず、大気中で溶媒を気化させ除去した以外は、No.1と同様にしてNo.3の積層体を作製した。
半透膜用組成物の塗布後、支持体を水に浸漬せず、大気中で溶媒を気化させ除去した以外は、No.2と同様にしてNo.4の積層体を作製した。
上記No.1〜No.4の積層体について、以下の評価を行った。
外観を目視したところ、No.1〜No.4の積層体すべてに光沢のある半透膜層が形成されていた。
積層体の断面をSEMにより観察し、積層体の半透膜層の厚みを計測した。また、10nm以上の径を有する孔の有無を以下の評価基準で確認した。これらの結果を表1に示す。なお、半透膜層の支持体の外面からの平均含浸距離は0μmであった。
A : 10nm以上の径を有する孔がない。
B : 10nm以上の径を有する孔がある。
No.1及びNo.3のシート状の積層体について、ヘキサンを滴下し、透過性を以下の基準で確認した。なお、ピンホールが存在する場合に、ヘキサンが透過する。結果を表1に示す。
A : ヘキサンが透過されず弾かれる。
B : ヘキサンが透過する。
A : 空気のリークがない。
B : 空気のリークがある。
JIS−P8117(2009)に準拠して、100cm3の空気が1.22kPaの平均圧力差で6.45cm2の積層体を通過する時間を測定した。結果を表1に示す。なお、No.1及びNo.2は、測定時間内に空気が積層体を通過することが無かった。
No.1と同様の手順で、半透膜層用組成物の塗布厚さを調整することで、半透膜の平均厚さが2.6μmのNo.5の積層体を得た。
2、12 半透膜層
Claims (9)
- 多孔質性を有するシート状又はチューブ状の支持体と、この支持体の外面に積層される半透膜層とを備える積層体の製造方法であって、
溶媒にフッ素樹脂を分散した半透膜層用組成物を上記支持体の外面に塗布する塗布工程と、
上記塗布工程後の支持体の塗布面を水に浸漬する浸漬工程と、
上記支持体を浸漬した水を加熱する加熱工程と
を備える積層体の製造方法。 - 上記加熱工程後の積層体をアニール処理するアニール工程をさらに備える請求項1に記載の積層体の製造方法。
- 上記溶媒の沸点が50℃以上150℃以下である請求項1又は請求項2に記載の積層体の製造方法。
- 上記支持体の空孔率が30%以上90%以下である請求項1、請求項2又は請求項3に記載の積層体の製造方法。
- 分子又はイオンの分離に用いられる積層体であって、
多孔質性を有するシート状又はチューブ状の支持体と、この支持体の外面に積層される半透膜層とを備え、
上記半透膜層の上記支持体の外面からの平均含浸距離が5μm以下である積層体。 - 上記半透膜層の主成分がアモルファスフッ素樹脂である請求項5に記載の積層体。
- ガーレー秒が600秒以上である請求項5又は請求項6に記載の積層体。
- 動的分子径が0.40nm未満の分子を選択的に透過する請求項5、請求項6又は請求項7に記載の積層体。
- ヘリウム、水素、二酸化炭素、酸素、窒素又はメタンを選択的に透過する請求項5から請求項8のいずれか1項に記載の積層体。
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