JP2017110293A5 - - Google Patents

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Publication number
JP2017110293A5
JP2017110293A5 JP2016219861A JP2016219861A JP2017110293A5 JP 2017110293 A5 JP2017110293 A5 JP 2017110293A5 JP 2016219861 A JP2016219861 A JP 2016219861A JP 2016219861 A JP2016219861 A JP 2016219861A JP 2017110293 A5 JP2017110293 A5 JP 2017110293A5
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JP
Japan
Prior art keywords
carbon film
forming method
film forming
film formation
etching step
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016219861A
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Japanese (ja)
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JP2017110293A (en
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Publication date
Application filed filed Critical
Priority to US15/377,141 priority Critical patent/US20170170065A1/en
Publication of JP2017110293A publication Critical patent/JP2017110293A/en
Publication of JP2017110293A5 publication Critical patent/JP2017110293A5/ja
Pending legal-status Critical Current

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Claims (1)

前記エッチング工程と、前記第２のカーボン膜成膜工程とを、複数回繰り返すことを特徴とする請求項１から請求項４のいずれか１項に記載のカーボン膜の成膜方法。 And the etching step, said second carbon film formation step, the carbon film forming method according to any one of claims 1 to 4, wherein a plurality of times.
JP2016219861A 2015-12-15 2016-11-10 Carbon film deposition method, and film deposition apparatus Pending JP2017110293A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/377,141 US20170170065A1 (en) 2015-12-15 2016-12-13 Carbon film forming method, carbon film forming apparatus, and storage medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015244234 2015-12-15
JP2015244234 2015-12-15

Publications (2)

Publication Number Publication Date
JP2017110293A JP2017110293A (en) 2017-06-22
JP2017110293A5 true JP2017110293A5 (en) 2019-07-11

Family

ID=59079425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016219861A Pending JP2017110293A (en) 2015-12-15 2016-11-10 Carbon film deposition method, and film deposition apparatus

Country Status (1)

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JP (1) JP2017110293A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10446736B2 (en) * 2017-11-27 2019-10-15 International Business Machines Corporation Backside coupling with superconducting partial TSV for transmon qubits
JP2022133762A (en) * 2021-03-02 2022-09-14 東京エレクトロン株式会社 Film forming method, processor, and processing system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG195494A1 (en) * 2012-05-18 2013-12-30 Novellus Systems Inc Carbon deposition-etch-ash gap fill process
JP6045975B2 (en) * 2012-07-09 2016-12-14 東京エレクトロン株式会社 Carbon film forming method and film forming apparatus

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