JP2016532317A - ナノ構造化されたシリコン系太陽電池およびナノ構造化されたシリコン系太陽電池を製造する方法 - Google Patents
ナノ構造化されたシリコン系太陽電池およびナノ構造化されたシリコン系太陽電池を製造する方法 Download PDFInfo
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- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 72
- 239000010703 silicon Substances 0.000 title claims abstract description 72
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 71
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 238000000034 method Methods 0.000 claims abstract description 73
- 239000002086 nanomaterial Substances 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000000151 deposition Methods 0.000 claims description 62
- 238000001020 plasma etching Methods 0.000 claims description 60
- 229910052751 metal Inorganic materials 0.000 claims description 42
- 239000002184 metal Substances 0.000 claims description 42
- 239000010410 layer Substances 0.000 claims description 37
- 230000008021 deposition Effects 0.000 claims description 30
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 21
- 238000000231 atomic layer deposition Methods 0.000 claims description 19
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 17
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 14
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 239000003989 dielectric material Substances 0.000 claims description 10
- 239000002356 single layer Substances 0.000 claims description 10
- 238000007747 plating Methods 0.000 claims description 9
- 238000009713 electroplating Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 5
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 5
- 238000007650 screen-printing Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 229910052718 tin Inorganic materials 0.000 claims description 5
- 238000007641 inkjet printing Methods 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 238000001465 metallisation Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 230000006798 recombination Effects 0.000 abstract description 17
- 238000005215 recombination Methods 0.000 abstract description 17
- 210000004027 cell Anatomy 0.000 description 79
- 238000002310 reflectometry Methods 0.000 description 38
- 238000002161 passivation Methods 0.000 description 18
- 230000008901 benefit Effects 0.000 description 11
- 230000008569 process Effects 0.000 description 10
- 239000013078 crystal Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 8
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- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 7
- 238000001878 scanning electron micrograph Methods 0.000 description 7
- 229910052796 boron Inorganic materials 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 239000006117 anti-reflective coating Substances 0.000 description 4
- 229910021418 black silicon Inorganic materials 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 210000002381 plasma Anatomy 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
- 229910016460 CzSi Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- WIHKEPSYODOQJR-UHFFFAOYSA-N [9-(4-tert-butylphenyl)-6-triphenylsilylcarbazol-3-yl]-triphenylsilane Chemical compound C1=CC(C(C)(C)C)=CC=C1N1C2=CC=C([Si](C=3C=CC=CC=3)(C=3C=CC=CC=3)C=3C=CC=CC=3)C=C2C2=CC([Si](C=3C=CC=CC=3)(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=C21 WIHKEPSYODOQJR-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 230000004298 light response Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- -1 single crystal Chemical compound 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
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- H01L31/02—Details
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Abstract
Description
○ 室温;25℃+/−10度
○ SF6とO2のガス流比=0.5〜2
○ 1つの電源のみを使用。
従来のエミッター(ドーピング前のRIE)の場合は、40〜200オーム/平方。
選択エミッターの場合は、RIE前は<10オーム/平方であり、RIE後に非コンタクト領域で40〜200オーム/平方となる。
ドーピング後のRIEの場合は、<10オーム/平方であり、RIE後に40〜200オーム/平方となる。
Claims (25)
- シリコン基板を備えるシリコン系太陽電池を製造する方法であって、前記シリコン基板が表面を有し、前記表面の少なくとも一部が、200〜450nmの平均高さ、および100〜200nmのピッチを有する円錐形状ナノ構造を備え、前記方法が、エミッタードーピングのステップ、メタルコンタクト堆積のステップ、ならびにマスクレス反応性イオンエッチング(RIE)によって前記シリコン系太陽電池上に200〜450nmの高さ、および100〜200nmのピッチを有する円錐形状ナノ構造を製造するステップを含む、方法。
- 前記円錐形状ナノ構造を製造するステップが前記エミッタードーピングのステップおよび前記メタルコンタクト堆積のステップの前に行われる、請求項1に記載の方法。
- 前記円錐形状ナノ構造を製造するステップが前記エミッタードーピングのステップおよび前記メタルコンタクト堆積のステップの後に行われる、請求項1に記載の方法。
- 前記円錐形状ナノ構造を製造するステップが前記エミッタードーピングのステップの後に、および前記メタルコンタクト堆積のステップの前に行われる、請求項1に記載の方法。
- 前記方法が前記エミッターのテクスチャ加工およびエッチバックの機能を有し、それによって、前記メタルコンタクトの下のシート抵抗が1〜20オーム/平方の範囲になるように、および前記反応性イオンエッチングされた表面の他の場所のシート抵抗が40〜200オーム/平方の範囲となるように、選択エミッター太陽電池のドーピングレベルを調整し前記エミッターのシート抵抗を変える、請求項1、請求項3または請求項4に記載の方法。
- 前記メタルコンタクト堆積のステップが前記選択エミッター太陽電池に適用され、Agの堆積を含み、前記堆積方法がスクリーン印刷である、請求項1から請求項5のいずれかに記載方法。
- 前記メタルコンタクト堆積のステップが前記選択エミッター太陽電池に適用され、積み重ねられたNi、CuおよびAgまたはSnの堆積を含み、前記堆積方法が、蒸着、スパッタリング、インクジェット印刷、めっき(電気めっき、無電解めっき、または光誘起めっきなど)である、請求項1から請求項5のいずれかに記載の方法。
- 前記エミッタードーピングのステップがレーザドーピングを含む、請求項1から請求項7のいずれかに記載の方法。
- 前記レーザドーピングが300〜1100nmの範囲の波長を備える光ビームに前記シリコン太陽電池をさらす、請求項8に記載の方法。
- 前記レーザドーピングが532nmの波長を備える光ビームに前記シリコン太陽電池をさらす、請求項8または請求項9に記載の方法。
- 前記レーザドーピングがパルスレーザによって行われ、レーザパルスが1s〜1ps(10−12s)(1μs(10−6s)〜100ns(10−9s)など)の範囲のパルス幅を有する、請求項8から請求項10のいずれかに記載の方法。
- 前記レーザドーピングがパルスレーザによって行われ、レーザパルスが1kHz〜100MHz(100kHz〜200kHzなど)の範囲のパルス周波数を有する、請求項8から請求項11のいずれかに記載の方法。
- 前記レーザドーピングが連続波レーザによって行われる、請求項8から請求項10のいずれかに記載の方法。
- 誘電体材料の単一層または積層を堆積させることによって前記シリコン系太陽電池を不動態化するステップをさらに含む、請求項1から請求項13のいずれかに記載の方法。
- 前記不動態化するステップが前記レーザドーピングに先立って行われる、請求項14に記載の方法。
- 誘電体材料の前記単一層または積層を堆積させるステップが原子層堆積(ALD)によってAl2O3を堆積させるステップを含む、請求項14または請求項15のいずれかに記載の方法。
- 誘電体材料の前記単一層または前記積層を堆積させるステップがプラズマ促進化学気相堆積(PECVD)によって堆積させたSiNx:Hを堆積させるステップをさらに含む、請求項14から請求項16のいずれかに記載の方法。
- 誘電体材料の前記単一層または前記積層を前記堆積させるステップが5〜50nm(5〜30nmなど)の範囲の厚さを有するAl2O3の層を堆積させるステップを含む、請求項14から請求項17のいずれかに記載の方法。
- 前記メタルコンタクト堆積のステップが前記レーザドーピング後に適用され、前記メタルコンタクト堆積のステップが前記レーザドーピングにさらされるシリコンの領域上に行われ、前記メタルコンタクト堆積のステップが積み重ねられたNi、Cu、およびAgまたはSnの堆積を含み、前記メタルコンタクト堆積のステップが無電解/直流電気めっき、電気めっきまたは光誘起めっきによる、請求項8から請求項18のいずれかに記載の方法。
- 前記不動態化するステップが半導体の層を堆積させるステップをさらに含む、請求項14から請求項19のいずれかに記載の方法。
- 誘電体材料の前記単一層または前記積層を前記堆積させるステップがSiO2の層を堆積させるステップを含み、前記半導体の層を堆積させるステップが非晶質シリコンまたは多結晶シリコンを堆積させるステップを含む、請求項20に記載の方法。
- 前記SiO2の層を前記堆積させるステップが、20〜130℃の範囲の温度で硝酸中でのウェット化学酸化、または800〜1200℃の範囲の温度で酸素または水雰囲気中での熱酸化によって0.8〜2nmの厚さを有するSiO2の層を堆積させるステップを含む、請求項20に記載の方法。
- 前記半導体の層を前記堆積させるステップが、500〜700℃の範囲の温度でSiH4、B2H6、BCl3、および/またはPH3使用する低圧化学気相堆積(LPCVD)によって、あるいは200〜400℃の温度でSiH4、Ar、B2H6、BCl3、および/またはPH3を使用するPECVDによって5〜100nmの厚さを有する非晶質シリコンまたは多結晶シリコンの層を堆積させるステップを含む、請求項20から請求項22のいずれかに記載の方法。
- 前記レーザドーピングおよび前記金属堆積が前記不動態化するステップの後に行われる、請求項15から請求項23のいずれかに記載の方法。
- 前記シリコン系太陽電池が60〜99%の単結晶シリコンを含有する疑似単結晶シリコン系太陽電池である、請求項1から請求項24のいずれかに記載の方法。
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Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3022070B1 (fr) * | 2014-06-04 | 2016-06-24 | Univ D'aix-Marseille | Procede de texturation aleatoire d'un substrat semiconducteur |
DE102016201827B3 (de) * | 2016-02-08 | 2017-05-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Texturierung der Oberfläche von kristallinem Silizium, insbesondere zur Reflexionsminderung bei Solarzellen |
US20180053662A1 (en) * | 2016-08-17 | 2018-02-22 | Globalfoundries Inc. | Texturing of silicon surface with direct-self assembly patterning |
FI127794B (en) * | 2017-02-15 | 2019-02-28 | Aalto Korkeakoulusaeaetioe | Semiconductor structures and their manufacture |
EP3379584A1 (en) * | 2017-03-20 | 2018-09-26 | Université catholique de Louvain | Method for producing improved black silicon on a silicon substrate |
CN106981543B (zh) * | 2017-04-05 | 2018-05-22 | 中国电子科技集团公司第四十四研究所 | 采用铝硅共晶薄膜辅助干法刻蚀制备黑硅层的方法 |
KR20190068352A (ko) * | 2017-12-08 | 2019-06-18 | 삼성에스디아이 주식회사 | 태양전지 셀 |
CN111081811B (zh) * | 2018-10-22 | 2021-04-02 | 中国科学院上海微***与信息技术研究所 | 半导体陷光结构及其制备方法 |
EP3671863B1 (en) * | 2018-12-20 | 2021-06-09 | IMEC vzw | Smoothed rear side doped layer for a bifacial solar cell |
CN111574071B (zh) * | 2020-06-01 | 2022-06-24 | 中建材玻璃新材料研究院集团有限公司 | 一种高透过宽色系盖板玻璃的制备方法 |
CN111816727A (zh) * | 2020-07-14 | 2020-10-23 | 普乐新能源科技(徐州)有限公司 | 一种基于lpcvd的高效掺杂非晶硅技术的交叉指式背接触异质结太阳电池 |
CN113284961B (zh) * | 2021-07-22 | 2021-09-28 | 浙江爱旭太阳能科技有限公司 | 一种太阳能电池及其钝化接触结构、电池组件及光伏*** |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6091021A (en) * | 1996-11-01 | 2000-07-18 | Sandia Corporation | Silicon cells made by self-aligned selective-emitter plasma-etchback process |
JP2008507849A (ja) * | 2004-07-26 | 2008-03-13 | ハー. ヴェアナー,ユルゲン | 線形焦点式レーザビームを用いた固形物のレーザドーピング方法、および該方法に基づいて製造された太陽電池エミッタ |
JP2010034539A (ja) * | 2008-06-26 | 2010-02-12 | Semiconductor Energy Lab Co Ltd | 光電変換装置モジュールおよび光電変換装置モジュールの作製方法 |
WO2011033826A1 (ja) * | 2009-09-18 | 2011-03-24 | 信越化学工業株式会社 | 太陽電池、その製造方法及び太陽電池モジュール |
WO2011065648A1 (en) * | 2009-11-27 | 2011-06-03 | Lg Electronics Inc. | Solar cell |
JP2012164961A (ja) * | 2011-02-08 | 2012-08-30 | Samsung Sdi Co Ltd | 太陽電池およびその製造方法 |
WO2012121706A1 (en) * | 2011-03-08 | 2012-09-13 | Alliance For Sustainable Energy, Llc | Efficient black silicon photovoltaic devices with enhanced blue response |
WO2012172226A1 (fr) * | 2011-06-17 | 2012-12-20 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de realisation d'une cellule photovoltaique a emetteur selectif |
JP2013518426A (ja) * | 2010-01-27 | 2013-05-20 | コミサリア ア レネルジー アトミック エ オ ゼネルジー アルテルナティブ | 結晶酸化シリコンパッシベーション薄膜を含む太陽電池及びその製造方法 |
WO2013076267A1 (en) * | 2011-11-23 | 2013-05-30 | Imec | Method for forming metal silicide layers |
JP2013128095A (ja) * | 2011-12-16 | 2013-06-27 | Lg Electronics Inc | 太陽電池及びその製造方法 |
WO2013100084A1 (ja) * | 2011-12-27 | 2013-07-04 | 京セラ株式会社 | 電極用導電性ペースト、太陽電池および太陽電池の製造方法 |
WO2013129578A1 (ja) * | 2012-02-28 | 2013-09-06 | 京セラ株式会社 | 太陽電池の電極用導電性ペースト、太陽電池および太陽電池の製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6858462B2 (en) | 2000-04-11 | 2005-02-22 | Gratings, Inc. | Enhanced light absorption of solar cells and photodetectors by diffraction |
JP4339990B2 (ja) | 2000-08-31 | 2009-10-07 | 京セラ株式会社 | シリコン基板の粗面化法 |
US20030178057A1 (en) | 2001-10-24 | 2003-09-25 | Shuichi Fujii | Solar cell, manufacturing method thereof and electrode material |
DE10340147B4 (de) | 2002-08-27 | 2014-04-10 | Kyocera Corp. | Trockenätzverfahren und Trockenätzvorrichtung |
US8637340B2 (en) * | 2004-11-30 | 2014-01-28 | Solexel, Inc. | Patterning of silicon oxide layers using pulsed laser ablation |
WO2007042521A2 (de) | 2005-10-10 | 2007-04-19 | X-Fab Semiconductor Foundries Ag | Herstellung von selbstorganisierten nadelartigen nano-strukturen und ihre recht umfangreichen anwendungen |
WO2008127807A1 (en) | 2007-03-09 | 2008-10-23 | University Of Virginia Patent Foundation | Systems and methods of laser texturing of material surfaces and their applications |
DE102006013670A1 (de) | 2006-03-24 | 2007-09-27 | X-Fab Semiconductor Foundries Ag | Breitbandig entspiegelte optische Bauteile mit gekrümmten Oberflächen |
DE102006046131B4 (de) | 2006-09-28 | 2020-06-25 | X-Fab Semiconductor Foundries Ag | Verfahren zur Herstellung einer optischen Schnittstelle für integrierte Optikanwendungen |
WO2011047359A2 (en) | 2009-10-16 | 2011-04-21 | Cornell University | Method and apparatus including nanowire structure |
CN101734611B (zh) | 2009-12-16 | 2011-08-31 | 北京大学 | 基于无掩膜深反应离子刻蚀制备黑硅的方法 |
US20120111396A1 (en) | 2010-05-04 | 2012-05-10 | Sionyx, Inc. | Photovoltaic Devices and Associated Methods |
CN101880914B (zh) | 2010-05-25 | 2012-09-12 | 中国科学院微电子研究所 | 利用等离子体浸没离子注入制备黑硅的方法 |
US9330910B2 (en) | 2010-11-01 | 2016-05-03 | The Board Of Trustees Of The University Of Illinois | Method of forming an array of nanostructures |
CN102110724B (zh) | 2010-11-12 | 2012-10-03 | 北京大学 | 双面微纳复合结构的太阳能电池及其制备方法 |
-
2014
- 2014-09-26 KR KR1020167010416A patent/KR20160090287A/ko not_active Application Discontinuation
- 2014-09-26 WO PCT/DK2014/050305 patent/WO2015043606A1/en active Application Filing
- 2014-09-26 JP JP2016544725A patent/JP2016532317A/ja active Pending
- 2014-09-26 US US15/022,137 patent/US9705017B2/en active Active
- 2014-09-26 EP EP14784184.5A patent/EP3050120B1/en active Active
- 2014-09-26 CN CN201480053529.8A patent/CN105793999A/zh active Pending
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6091021A (en) * | 1996-11-01 | 2000-07-18 | Sandia Corporation | Silicon cells made by self-aligned selective-emitter plasma-etchback process |
JP2008507849A (ja) * | 2004-07-26 | 2008-03-13 | ハー. ヴェアナー,ユルゲン | 線形焦点式レーザビームを用いた固形物のレーザドーピング方法、および該方法に基づいて製造された太陽電池エミッタ |
JP2010034539A (ja) * | 2008-06-26 | 2010-02-12 | Semiconductor Energy Lab Co Ltd | 光電変換装置モジュールおよび光電変換装置モジュールの作製方法 |
WO2011033826A1 (ja) * | 2009-09-18 | 2011-03-24 | 信越化学工業株式会社 | 太陽電池、その製造方法及び太陽電池モジュール |
WO2011065648A1 (en) * | 2009-11-27 | 2011-06-03 | Lg Electronics Inc. | Solar cell |
JP2013518426A (ja) * | 2010-01-27 | 2013-05-20 | コミサリア ア レネルジー アトミック エ オ ゼネルジー アルテルナティブ | 結晶酸化シリコンパッシベーション薄膜を含む太陽電池及びその製造方法 |
JP2012164961A (ja) * | 2011-02-08 | 2012-08-30 | Samsung Sdi Co Ltd | 太陽電池およびその製造方法 |
WO2012121706A1 (en) * | 2011-03-08 | 2012-09-13 | Alliance For Sustainable Energy, Llc | Efficient black silicon photovoltaic devices with enhanced blue response |
WO2012172226A1 (fr) * | 2011-06-17 | 2012-12-20 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de realisation d'une cellule photovoltaique a emetteur selectif |
WO2013076267A1 (en) * | 2011-11-23 | 2013-05-30 | Imec | Method for forming metal silicide layers |
JP2013128095A (ja) * | 2011-12-16 | 2013-06-27 | Lg Electronics Inc | 太陽電池及びその製造方法 |
WO2013100084A1 (ja) * | 2011-12-27 | 2013-07-04 | 京セラ株式会社 | 電極用導電性ペースト、太陽電池および太陽電池の製造方法 |
WO2013129578A1 (ja) * | 2012-02-28 | 2013-09-06 | 京セラ株式会社 | 太陽電池の電極用導電性ペースト、太陽電池および太陽電池の製造方法 |
Non-Patent Citations (2)
Title |
---|
K.N.NGUYEN ET AL.: "BLACK SILICON WITH SUB-PERCENT REFLECTIVITY:INFLUENCE OF THE 3D TEXTUREIZATION GEOMETRY", 16TH INTERNATIONAL SOLIDSTATE SENSORS, ACTUATORS AND MICROSYSTEMS CONFERENCE, JPN6018026127, 2011, pages 354 - 357, ISSN: 0004140294 * |
KENTARO KUTSUKAKE ET AL.: "Control of Grain Boundary Propagation in Mono-Like Si:Utilization of Functional Grain Boundaries", APPLIED PHYSICS EXPRESS, vol. 6, JPN6018026129, 31 January 2013 (2013-01-31), pages 025505 - 1, ISSN: 0004140293 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11583954B2 (en) | 2019-03-04 | 2023-02-21 | Kabushiki Kaisha Toshiba | Welding method |
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