JP2016100602A - 埋め込み可能な医療デバイス用の密閉封止キャパシタ - Google Patents
埋め込み可能な医療デバイス用の密閉封止キャパシタ Download PDFInfo
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- JP2016100602A JP2016100602A JP2015223642A JP2015223642A JP2016100602A JP 2016100602 A JP2016100602 A JP 2016100602A JP 2015223642 A JP2015223642 A JP 2015223642A JP 2015223642 A JP2015223642 A JP 2015223642A JP 2016100602 A JP2016100602 A JP 2016100602A
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- anode lead
- anode
- casing
- orifice
- acid
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Abstract
【解決手段】封止アセンブリは、アノードリードオリフィスでケーシングに接続され、アノードリードの一部はオリフィス内を延びる。封止アセンブリは、隔離チューブ、金属板、およびエラストマーリングを含む。チューブは、アノードリードを受容し、アノードリードオリフィス内を延びる第1の部分と、ケーシングの内部に位置付けられた第2の部分とを有する。板は、壁の外面に隣接して配置され、アノードリードオリフィスを覆い、チューブの第1の部分が内部を延びるオリフィスを含有する。リングは、壁の内面に隣接して配置され、チューブの第2の部分が内部を延びるオリフィスを含有する。
【選択図】図1
Description
本発明の別の実施形態によれば、埋め込み可能な医療デバイス用の湿式電解キャパシタを形成するための方法が開示される。方法は、アノードリードが延びている平面多孔質アノード本体を、アノードリードオリフィスが形成された側壁を有しており、アノードリードオリフィスを通してアノードリードの一部が延びるようになされているケーシング内に配置するステップであって、封止アセンブリがアノードリードオリフィスでアノードリードを取り囲むステップを含む。封止アセンブリは、アノードリードオリフィス内に配置され、かつケーシングの内部に延びる金属ハウジングであって、アノードリードの一部が内部を延びるキャビティを画定する金属ハウジングと;キャビティ内に配置されたエラストマーリングであって、アノードリードの一部が内部を延びるオリフィスを含有するエラストマーリングと;キャビティ内に配置された金属板であって、この金属板が、アノードリードの一部が内部を延びるオリフィスを含有し、かつこの金属板の下面がキャビティ内のエラストマーリングに接触している金属板とを含む。方法はさらに、封止アセンブリとアノードリードとの間に密閉封止部を形成するステップを含む。
当業者を対象とする本発明の完全かつ可能な開示を、その最良の形態も含め、添付される図を参照する本明細書の残りの部分でより詳細に述べる。
次に図1および5〜11を参照すると、封止アセンブリ300の一実施形態がより詳細に記述される。封止アセンブリ300は、キャパシタ10のケーシング12に接続され、アノードリード220が内部を安全に延びることができる密閉封止部を提供する。特に封止アセンブリ300は、湿式電解キャパシタ10のケーシング部材14の側壁200に形成され、かつその内部を湿式電解キャパシタ10のアノードリード220が延びるアノードリードオリフィス34を、密閉状態で封止することができる(図1参照)。
さらに、隔離チューブ306を利用する場合、アノードリード220を最初に隔離チューブ306の隔離チューブオリフィス326に挿通することができ、そこでは隔離チューブの内径309により画定された隔離チューブオリフィスは、アノードリード220の直径221を巡って適合するようにかつ締まり嵌めが生成されるよう十分に大きく、その後、アノードリード220および隔離チューブ306は、金属ハウジング317のキャビティ328、エラストマーリングオリフィス327、および金属板オリフィス325内を挿通することができ、そこでは隔離チューブ306は、第1のケーシング部材12の側壁20の外部から外に延びる第1の部分と、エラストマーリング311でケーシング12の内部13内に延びる第2の部分とを有することができる。代替例として、隔離チューブ306は、アノードリード220の挿入前に封止アセンブリ300のオリフィスに挿通することができ、その後、上記にて論じたように、アノードリード220を金属ハウジング317のキャビティ328、エラストマーリングオリフィス327、および金属板オリフィス325に挿通することができる。いずれにしても、アノードリード220および任意選択の隔離チューブ306は、アノードリード220の第1の部分および隔離チューブ306の第1の部分が側壁20の外面27を超えて延び、それと共にアノードリード220の第2の部分および隔離チューブ306の第2の部分がケーシング内に残されるように、側壁20の外面27から延びることができ、この場合隔離チューブ306は、一般にアノードリード220を巡って滑り状態で適合するスリーブとして働くことができる。
平面アノードは、典型的にはバルブ金属組成物から形成される。組成物の比電荷は約2,000μF・V/g〜約80,000μF・V/g、いくつかの実施形態では約5,000μF・V/g〜約40,000μF・V/gまたはそれ以上、いくつかの実施形態では約10,000μF・V/g〜約20,000μF・V/gのように変化し得る。バルブ金属組成物は、バルブ金属(即ち酸化可能な金属)またはバルブ金属をベースにした化合物、例えばタンタル、ニオブ、アルミニウム、ハフニウム、チタン、これらの合金、これらの酸化物、およびこれらの窒化物などを含有する。例えばバルブ金属組成物は、ニオブの導電性酸化物、例えばニオブと酸素との原子比1:1.0±1.0、いくつかの実施形態では1:1.0±0.3、いくつかの実施形態では1:1.0±0.1、およびいくつかの実施形態では1:1.0±0.05を有する酸化ニオブを含有していてもよい。酸化ニオブは、NbO0.7、NbO1.0、NbO1.1、およびNbO2であってもよい。そのようなバルブ金属酸化物の例は、Fifeの米国特許第6,322,912号;Fifeらの第6,391,275号;Fifeらの第6,416,730号;Fifeの第6,527,937号;Kimmelらの第6,576,099号;Fifeらの第6,592,740号;およびKimmelらの第6,639,787号;およびKimmelらの第7,220,397号、ならびにSchnitterの米国特許出願公開第2005/0019581号;Schnitterらの第2005/0103638号;Thomasらの第2005/0013765号に記載されている。
封止アセンブリおよび平面アノードに加え、様々な技法のいずれかを使用して構成され得るカソードもキャパシタでは用いられる。一実施形態では、カソードは、タンタル、ニオブ、アルミニウム、ニッケル、ハフニウム、チタン、銅、銀、鋼(例えばステンレス)、これらの合金(例えば導電性酸化物)、およびこれらの複合体(例えば導電性酸化物でコーティングされた金属)などの、任意の金属を含んでいてもよい、電気化学的に活性な材料でコーティングされた金属基板を含有する。チタンおよびタンタルならびにこれらの合金は、本発明で使用するのに特に適切である。基板の幾何学的構成は、容器、缶、箔、シート、スクリーン、メッシュの形をとるなど、当業者に周知のように一般には様々であってもよい。必ずしも必要ではないが、例えば一実施形態では、金属基板は、平面アノードが開示されたキャパシタケーシングを形成することができ、そのようなケーシングは、D字形または平面アノードの形状に概ね対応する任意の形状を有することができる。例えば、円筒形、長方形、三角形、角柱形など、任意の幾何学的構成を本発明で用いてもよいことを理解すべきである。
Tは、OまたはSであり;
Dは、置換されていてもよいC1−C5アルキレンラジカル(例えば、メチレン、エチレン、n−プロピレン、n−ブチレン、n−ペンチレンなど)であり;
R7は、直鎖状または分枝状の、置換されていてもよいC1−C18アルキルラジカル(例えば、メチル、エチル、n−またはiso−プロピル、n−、iso−、sec−、またはtert−ブチル、n−ペンチル、1−メチルブチル、2−メチルブチル、3−メチルブチル、1−エチルプロピル、1,1−ジメチルプロピル、1,2−ジメチルプロピル、2,2−ジメチルプロピル、n−ヘキシル、n−ヘプチル、n−オクチル、2−エチルヘキシル、n−ノニル、n−デシル、n−ウンデシル、n−ドデシル、n−トリデシル、n−テトラデシル、n−ヘキサデシル、n−オクタデシルなど);置換されていてもよいC5−C12シクロアルキルラジカル(例えば、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル、シクロノニル、シクロデシルなど);置換されていてもよいC6−C14アリールラジカル(例えば、フェニル、ナフチルなど);置換されていてもよいC7−C18アラルキルラジカル(例えば、ベンジル、o−、m−、p−トリル、2,3−、2,4−、2,5−、2−6、3−4−、3,5−キシリル、メシチルなど);置換されていてもよいC1−C4ヒドロキシアルキルラジカルまたはヒドロキシルラジカルであり;
qは、0〜8の整数であり、いくつかの実施形態では0〜2、いくつかの実施形態では0であり;
nは、2〜5,000であり、いくつかの実施形態では4〜2000であり、いくつかの実施形態では5〜1,000である)。ラジカル「D」または「R7」に関する置換基の例には、例えば、アルキル、シクロアルキル、アリール、アラルキル、アルコキシ、ハロゲン、エーテル、チオエーテル、ジスルフィド、スルホキシド、スルホン、スルホネート、アミノ、アルデヒド、ケト、カルボン酸エステル、カルボン酸、カーボネート、カルボキシレート、シアノ、アルキルシラン、およびアルコキシシラン基、およびカルボキシルアミド基などが含まれる。
T、D、R7、およびqは上記にて定義される)。特に適切なチオフェンモノマーは、「D」が、置換されていてもよいC2−C3アルキレンラジカルのものである。例えば、置換されていてもよい3,4−アルキレンジオキシチオフェンは、一般構造を有するものを用いてもよい。
望む場合には、上述の付着ステップの1つまたは複数を、コーティングの所望の厚さを達成するまで繰り返してもよい。いくつかの実施形態では、コーティングの比較的薄い層のみが一度に形成される。コーティングの合計目標となる厚さは、一般に、キャパシタの所望の性質に応じて変化してもよい。典型的には、得られる伝導性ポリマーコーティングは、約0.2μm〜約50μm、いくつかの実施形態では約0.5μm〜約20μm、いくつかの実施形態では約1μm〜約5μmの厚さを有する。コーティングの厚さは、基板上の全ての場所で必ずしも同一である必要はないことを理解すべきである。しかし、基板上のコーティングの平均厚さは、一般に、上述の範囲内に包含される。
キャパシタは、一般に、溶液(例えば水性または非水性)、分散体、ゲルなどの液体の形をとることができる作用電解質(図示せず)も含む。作用電解質はケーシング内に配設され、平面アノードとカソードとの間に接続経路を提供する電気的に活性な材料である。望む場合には、平面アノードに、最初に電解質(図示せず)を含浸させ、その後、ケーシング内に配置してもよい(以下に論じる)。電解質は、生成の後段でキャパシタに添加してもよい。様々な適切な電解質は、参照によりその全体が全ての目的で本明細書に組み込まれるEvansらの米国特許第5,369,547号および第6,594,140号に記載されている。
12 ケーシング
14 第1のケーシング部材
16 第2のケーシング部材
18 対面壁
20 側壁
24 対面壁
26 縁部
34 アノードリードオリフィス
120 注入口
200 アノード
220 アノードリード
300 封止アセンブリ
301 金属板
306 隔離チューブ
311 エラストマーリング
317 金属ハウジング
Claims (24)
- 誘電体層でコーティングされた多孔質アノード本体を含む平面アノードであって、アノードリードが前記多孔質アノード本体から延びている平面アノードと、
前記平面アノードに電気接触している作用電解質と、
前記平面アノードおよび前記作用電解質が配置されている内部を有するケーシングであって、アノードリードオリフィスを画定する壁を有するケーシングと、
前記アノードリードオリフィスで前記ケーシングに接続された封止アセンブリであって、
前記アノードリードオリフィス内に配置され、かつ前記ケーシングの内部に延びている金属ハウジングであり、前記アノードリードの一部が内部を延びているキャビティを画定する金属ハウジング、
前記キャビティ内に配置されたエラストマーリングであり、前記アノードリードの一部が内部を延びているオリフィスを含有するエラストマーリング、および
前記キャビティ内に配置された金属板であり、前記金属板が、前記アノードリードの一部が内部を延びているオリフィスを含有し、前記金属板の下面が、前記キャビティ内で前記エラストマーリングに接触している金属板
を含む封止アセンブリと
を含む、埋め込み可能な医療デバイス用湿式電解キャパシタ。 - 前記封止アセンブリが、前記アノードリードの一部を受容する隔離チューブをさらに含み、前記隔離チューブは、前記ケーシングの外に延びる第1の部分と、前記アノードリードオリフィスを通って前記ケーシングの内部に延びる第2の部分とを有する、請求項1に記載の湿式電解キャパシタ。
- 前記隔離チューブが絶縁性材料を含む、請求項2に記載の湿式電解キャパシタ。
- 前記エラストマーリングと前記金属ハウジングの前記キャビティとがそれぞれ先細り部分を有し、前記エラストマーリングの先細り部分は、前記キャビティの先細り部分で前記キャビティ内に位置付けられる、請求項1に記載の湿式電解キャパシタ。
- 前記金属ハウジングが、チタンまたはその合金を含む、請求項1に記載の湿式電解キャパシタ。
- 前記金属板が、チタンまたはその合金を含む、請求項1に記載の湿式電解キャパシタ。
- 電気化学的に活性なカソード材料が、前記ケーシングの少なくとも一部に配設される、請求項1に記載の湿式電解キャパシタ。
- 前記電気化学的に活性なカソード材料が、伝導性ポリマーを含む、請求項7に記載の湿式電解キャパシタ。
- 前記伝導性ポリマーが、ポリ(3,4−エチレンジオキシチオフェン)である、請求項8に記載の湿式電解キャパシタ。
- 前記ケーシングが、チタンまたはその合金を含む、請求項1に記載の湿式電解キャパシタ。
- 前記多孔質アノード本体が、タンタル、ニオブ、またはそれらの導電性酸化物を含む、請求項1に記載の湿式電解キャパシタ。
- 前記アノードリードがタンタルを含む、請求項1に記載の湿式電解キャパシタ。
- 前記平面アノードの少なくとも一部を取り囲むセパレータをさらに含む、請求項1に記載の湿式電解キャパシタ。
- 前記封止アセンブリが、前記アノードリードオリフィスで密閉封止をもたらす、請求項1に記載の湿式電解キャパシタ。
- 請求項1に記載の湿式電解キャパシタを含む、埋め込み可能な心臓電気除細動器。
- 埋め込み可能な医療デバイスで使用される湿式電解キャパシタを形成するための方法であって、
アノードリードが延びている平面多孔質アノード本体を、アノードリードオリフィスが形成された側壁を有しており前記アノードリードオリフィスを通して前記アノードリードの一部が延びるようになされているケーシング内に配置するステップであり、封止アセンブリが前記アノードリードオリフィスで前記アノードリードを取り囲み、前記封止アセンブリは、前記アノードリードオリフィス内に配置され、かつ前記ケーシングの内部に延びる金属ハウジングであって、前記アノードリードの一部が内部に延びるキャビティを画定する金属ハウジングと、前記キャビティ内に配置されたエラストマーリングであって、前記アノードリードの一部が内部を延びるオリフィスを含有するエラストマーリングと、前記キャビティ内に配置された金属板であって、前記金属板が、前記アノードリードの一部が内部を延びるオリフィスを含有し、前記金属板の下面は前記キャビティ内で前記エラストマーリングに接触している金属板とを含むステップと、
前記封止アセンブリと前記アノードリードとの間に密閉封止を形成するステップと
を含む方法。 - 前記金属板および前記エラストマーリングが、前記密閉封止を生成するように一緒に溶接される、請求項16に記載の方法。
- 前記金属ハウジングを前記ケーシングに溶接するステップをさらに含む、請求項16に記載の方法。
- 前記封止アセンブリが、前記アノードリードの一部を受容する隔離チューブをさらに含み、前記隔離チューブは、前記ケーシングの外に延びる第1の部分と、前記アノードリードオリフィスを通って前記ケーシングの内部に延びる第2の部分とを有する、請求項16に記載の方法。
- 前記隔離チューブが絶縁性材料を含む、請求項19に記載の方法。
- 前記金属ハウジングがチタンまたはその合金を含む、請求項16に記載の方法。
- 前記金属板がチタンまたはその合金を含む、請求項16に記載の方法。
- 前記ケーシングの少なくとも一部が、電気化学的に活性なカソード材料でコーティングされる、請求項16に記載の方法。
- 作用電解質を前記ケーシング内に導入するステップをさらに含む、請求項16に記載の方法。
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US14/542,761 US9620293B2 (en) | 2014-11-17 | 2014-11-17 | Hermetically sealed capacitor for an implantable medical device |
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DE112017002538T5 (de) | 2016-05-19 | 2019-02-14 | Denso Corporation | Objektwahrnehmungsgerät und Objektwahrnehmungsverfahren |
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US9870869B1 (en) * | 2016-06-28 | 2018-01-16 | Avx Corporation | Wet electrolytic capacitor |
US10832871B2 (en) | 2016-11-14 | 2020-11-10 | Avx Corporation | Wet electrolytic capacitor for an implantable medical device |
US10737101B2 (en) | 2016-11-14 | 2020-08-11 | Avx Corporation | Medical device containing a solid electrolytic capacitor |
US10431389B2 (en) | 2016-11-14 | 2019-10-01 | Avx Corporation | Solid electrolytic capacitor for high voltage environments |
US10957493B2 (en) | 2017-12-05 | 2021-03-23 | Avx Corporation | Wet electrolytic capacitor for an implantable medical device |
JPWO2021153751A1 (ja) * | 2020-01-30 | 2021-08-05 | ||
US11450486B2 (en) * | 2020-04-03 | 2022-09-20 | Greatbatch Ltd. | Electrolytic capacitor having a tantalum anode |
WO2024097127A1 (en) * | 2022-11-04 | 2024-05-10 | Tc1 Llc | Systems and methods for implantable device enclosures |
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-
2014
- 2014-11-17 US US14/542,761 patent/US9620293B2/en active Active
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2015
- 2015-10-28 DE DE102015221050.2A patent/DE102015221050A1/de active Pending
- 2015-10-28 CN CN201510726554.4A patent/CN105609314B/zh active Active
- 2015-11-12 FR FR1560794A patent/FR3028659B1/fr active Active
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112017002538T5 (de) | 2016-05-19 | 2019-02-14 | Denso Corporation | Objektwahrnehmungsgerät und Objektwahrnehmungsverfahren |
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JP6721964B2 (ja) | 2020-07-15 |
HK1218806A1 (zh) | 2017-03-10 |
FR3028659A1 (fr) | 2016-05-20 |
US9620293B2 (en) | 2017-04-11 |
FR3028659B1 (fr) | 2021-07-02 |
CN105609314A (zh) | 2016-05-25 |
DE102015221050A1 (de) | 2016-05-19 |
CN105609314B (zh) | 2018-12-04 |
US20160141110A1 (en) | 2016-05-19 |
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