JP2015218055A - Transportation rail and float transportation device - Google Patents

Transportation rail and float transportation device Download PDF

Info

Publication number
JP2015218055A
JP2015218055A JP2014104782A JP2014104782A JP2015218055A JP 2015218055 A JP2015218055 A JP 2015218055A JP 2014104782 A JP2014104782 A JP 2014104782A JP 2014104782 A JP2014104782 A JP 2014104782A JP 2015218055 A JP2015218055 A JP 2015218055A
Authority
JP
Japan
Prior art keywords
hole
line
virtual high
air supply
transport
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014104782A
Other languages
Japanese (ja)
Inventor
伊藤　彰彦
Akihiko Ito
彰彦 伊藤
貴裕 安田
Takahiro Yasuda
貴裕 安田
仁志 金井
Hitoshi Kanai
仁志 金井
佐藤　光
Hikari Sato
光 佐藤
角田　耕一
Koichi Tsunoda
耕一 角田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oiles Industry Co Ltd
Original Assignee
Oiles Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oiles Industry Co Ltd filed Critical Oiles Industry Co Ltd
Priority to JP2014104782A priority Critical patent/JP2015218055A/en
Priority to PCT/JP2015/063024 priority patent/WO2015178189A1/en
Priority to TW104114053A priority patent/TW201609512A/en
Publication of JP2015218055A publication Critical patent/JP2015218055A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G51/00—Conveying articles through pipes or tubes by fluid flow or pressure; Conveying articles over a flat surface, e.g. the base of a trough, by jets located in the surface
    • B65G51/02—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases
    • B65G51/03—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases over a flat surface or in troughs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Fluid Mechanics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To highly accurately stabilize a flotation amount of an object to be transported on a virtual high accuracy floating line.SOLUTION: A floating transportation device 1 comprises a transportation rail 2, which transports an object to be transported in a transportation direction X in a non-contact manner. The transportation rail 2 includes a transportation surface 20 which is provided with multiple hole arrays 21 arranged in the transportation direction X. In the hole array 21, gas supply holes 22 ejecting gas, and vacuum holes 23 sucking gas are arranged alternately at a predetermined interval in a direction perpendicular to the transportation direction X. A virtual high accuracy floating line L is configured to be in a direction perpendicular to the transportation direction X; positioned above a space between neighboring predetermined hole arrays 21a and 21b of the hole arrays 21 aligned in the transportation direction X. In addition, at least, the gas supply holes 22 and the vacuum holes 23 respectively constituting the hole arrays 21a and 21b, are arranged line-symmetrically with respect to the virtual high accuracy floating line L.

Description

本発明は、搬送対象物を浮上させて非接触で搬送する浮上搬送技術に関する。   The present invention relates to a levitating conveyance technique for levitating a conveyance object and conveying it in a non-contact manner.

製造ライン等において、搬送対象物を搬送用レールの搬送面から浮上させて非接触で搬送する浮上搬送装置が知られている。例えば、特許文献１には、液晶ディスプレイパネル、プラズマディスプレイパネル、有機ＥＬパネル等のフラットディスプレイパネルに用いられるガラス基板の光学検査に用いる搬送装置として、ガラス基板を浮上させる搬送用レール（浮上ステージ）と、搬送用レール上に浮上しているガラス基板を搬送する搬送機構と、を備えた浮上搬送装置が開示されている。この浮上搬送装置の搬送用レールには、気体を噴出する給気孔（噴出穴）および気体を吸引するバキューム孔（吸引孔）が、千鳥状、すなわち搬送方向および搬送方向に対して垂直な方向のそれぞれにおいて、一定間隔で交互に配置されている。このように、給気孔とバキューム孔とを均等に配置して、搬送用レールの搬送面から気体の噴出と吸引とを同時に行うことにより、搬送用レールの搬送面からの搬送対象物の浮上高さを一定に保つことができる。   In a production line or the like, a levitation conveyance device that levitates an object to be conveyed from a conveyance surface of a conveyance rail and conveys the object without contact is known. For example, in Patent Document 1, as a transfer device used for optical inspection of a glass substrate used in a flat display panel such as a liquid crystal display panel, a plasma display panel, or an organic EL panel, a transfer rail (floating stage) that floats the glass substrate is used. And a floating mechanism that conveys a glass substrate that has floated on a rail for conveyance. The transport rail of the levitation transport apparatus has staggered, that is, a direction perpendicular to the transport direction and the transport direction, that is, air supply holes (spout holes) for ejecting gas and vacuum holes (suction holes) for sucking gas. In each, they are alternately arranged at regular intervals. In this way, the air supply holes and the vacuum holes are evenly arranged, and the ejection height of the object to be conveyed from the conveyance surface of the conveyance rail can be increased by simultaneously ejecting and sucking gas from the conveyance surface of the conveyance rail. Can be kept constant.

特開２０１０−２８１６５１号公報JP 2010-281651 A

光学検査装置の光学検査位置、レジスト塗布装置のレジスト塗布位置など、搬送用レール上の、搬送対象物の搬送方向に対して垂直な方向に沿って設定された所定のラインにおいて、搬送対象物の搬送用レールからの浮上量に高い精度を求められる場合がある（以下、このようなラインを仮想高精度浮上ラインと呼ぶ）。しかしながら、給気孔およびバキューム孔が千鳥状に均等配置された従来の搬送用レールでは、仮想高精度浮上ラインにおける搬送対象物の浮上量を高精度に安定させることが困難であった。   In a predetermined line set along the direction perpendicular to the conveyance direction of the object to be conveyed, such as the optical inspection position of the optical inspection apparatus and the resist coating position of the resist coating apparatus, the conveyance object There is a case where high accuracy is required for the flying height from the conveyance rail (hereinafter, such a line is referred to as a virtual high-accuracy flying line). However, with the conventional transfer rail in which the air supply holes and the vacuum holes are uniformly arranged in a staggered manner, it is difficult to stabilize the floating amount of the transfer object in the virtual high-precision floating line with high accuracy.

すなわち、搬送対象物の搬送方向に対して垂直な方向に一定間隔で交互に配置された給気孔およびバキューム孔（以下、孔アレイと呼ぶ）の上に仮想高精度浮上ラインを設定した場合、搬送対象物が仮想高精度浮上ラインを通過する際、仮想高精度浮上ラインの真下に位置する孔アレイの給気孔から噴出する圧縮気体およびこの孔アレイのバキューム孔に吸引される気体の影響を受け、搬送対象物の搬送用レールからの浮上量を高精度に維持し、安定させることができない。   That is, when a virtual high-precision levitation line is set on air supply holes and vacuum holes (hereinafter referred to as a hole array) alternately arranged at regular intervals in a direction perpendicular to the conveyance direction of the conveyance object, When the object passes through the virtual high precision levitation line, it is affected by the compressed gas ejected from the air supply holes of the hole array located directly below the virtual high precision levitation line and the gas sucked into the vacuum holes of this hole array, The flying height of the transport object from the transport rail cannot be maintained and stabilized with high accuracy.

また、隣接する孔アレイの間の上に仮想高精度浮上ラインを設定した場合、仮想高精度浮上ラインを挟んで隣接する孔アレイ各々の給気孔およびバキューム孔の並び順が互いに異なるため、搬送対象物が仮想高精度浮上ラインへ進入直前に受ける気体の流れと、搬送対象物が仮想高精度浮上ラインから離脱直後に受ける気体の流れとが異なる。これにより、孔アレイ上に仮想高精度浮上ラインを設定した場合と同様に、搬送対象物の搬送用レールからの浮上量を高精度に維持し、安定させることができない。   In addition, when a virtual high-accuracy levitation line is set between adjacent hole arrays, the arrangement order of the air supply holes and the vacuum holes of each adjacent hole array across the virtual high-accuracy levitation line is different. The gas flow received immediately before the object enters the virtual high precision levitation line is different from the gas flow received immediately after the object to be transported from the virtual high precision levitation line. Thereby, similarly to the case where the virtual high-accuracy levitation line is set on the hole array, the levitation amount of the conveyance object from the conveyance rail cannot be maintained and stabilized with high accuracy.

本発明は上記事情に鑑みてなされたものであり、その目的は、仮想高精度浮上ラインにおける搬送対象物の浮上量を高精度に維持し、安定させることができる搬送レールおよび浮上搬送装置を提供することにある。   The present invention has been made in view of the above circumstances, and an object thereof is to provide a conveyance rail and a levitation conveyance apparatus that can maintain and stabilize the flying height of a conveyance object in a virtual high-precision levitation line with high accuracy. There is to do.

上記課題を解決するために、本発明では、所定の隣接する孔アレイと孔アレイとの間の上方に仮想高精度浮上ラインを設定するとともに、少なくとも仮想高精度浮上ラインを挟んで隣接する孔アレイ各々の給気孔およびバキューム孔の並び順を、給気孔同士およびバキューム孔同士がそれぞれ仮想高精度浮上ラインを挟んで対向する順番とした。   In order to solve the above-described problem, in the present invention, a virtual high-precision levitation line is set above a predetermined adjacent hole array and the hole array, and at least a hole array adjacent to each other with the virtual high-precision levitation line interposed therebetween The arrangement order of the air supply holes and the vacuum holes was set so that the air supply holes and the vacuum holes face each other across the virtual high-accuracy levitation line.

例えば、本発明の搬送用レールは、気体を用いて搬送対象物を浮上させて、搬送方向に非接触で搬送する搬送用レールであって、
前記気体を噴出する給気孔および気体を吸引するバキューム孔が前記搬送方向に対して垂直な方向に沿って一定間隔で交互に配置された孔アレイが、前記搬送方向に複数配列された搬送面を備え、
前記搬送方向に対して垂直な方向に沿って設定された仮想高精度浮上ラインが、前記搬送方向に複数配列された前記孔アレイのうち、搬送方向において隣接する所定の孔アレイと孔アレイとの間の上方に位置するとともに、少なくとも当該隣接する所定の孔アレイのうちの一方を構成する給気孔が他方を構成する給気孔と前記仮想高精度浮上ラインを挟んで対向し、かつ当該隣接する所定の孔アレイのうちの一方を構成するバキューム孔が他方を構成するバキューム孔と前記仮想高精度浮上ラインを挟んで対向する位置に配置されている。 For example, the transport rail of the present invention is a transport rail that floats a transport object using gas and transports it in the transport direction in a non-contact manner.
A plurality of hole arrays in which the air supply holes for ejecting the gas and the vacuum holes for sucking the gas are alternately arranged at regular intervals along the direction perpendicular to the transport direction are provided as a transport surface arranged in the transport direction. Prepared,
Among the hole arrays in which a plurality of virtual high precision levitation lines set along a direction perpendicular to the transport direction are arranged in the transport direction, a predetermined hole array adjacent to the transport direction and the hole array And at least an air supply hole constituting one of the adjacent predetermined hole arrays is opposed to an air supply hole constituting the other across the virtual high-accuracy levitation line, and the adjacent predetermined A vacuum hole constituting one of the hole arrays is disposed at a position facing the vacuum hole constituting the other across the virtual high-precision levitation line.

ここで、前記隣接する所定の孔アレイ各々を構成する給気孔およびバキューム孔は、前記仮想高精度浮上ラインに対して線対称となる位置に配置されていてもよい。また、前記仮想高精度浮上ラインに対して前記搬送方向の上流側に配置された複数の孔アレイ、および前記仮想高精度浮上ラインに対して前記搬送方向の下流側に配置された複数の孔アレイは、それぞれ、各孔アレイを構成する給気孔およびバキューム孔が前記搬送方向において一定間隔で交互に配置されていてもよい。   Here, the air supply holes and the vacuum holes that constitute each of the adjacent predetermined hole arrays may be arranged at positions that are line-symmetric with respect to the virtual high-precision levitation line. A plurality of hole arrays disposed upstream of the virtual high-accuracy levitation line in the transport direction; and a plurality of hole arrays disposed downstream of the virtual high-accuracy levitation line in the transport direction. The air supply holes and the vacuum holes constituting each hole array may be alternately arranged at regular intervals in the transport direction.

また、例えば、本発明の浮上搬送装置は、気体を用いて搬送対象物を浮上させて、搬送方向に非接触で搬送する浮上搬送装置であって、
前記搬送用レールと、
前記搬送用レールの前記搬送面の前記給気孔から噴出する圧縮気体を供給するための給気ポンプと、
前記搬送用レールの前記搬送面の前記バキューム孔に気体を吸引するための吸引ポンプと、を備える。 Further, for example, the levitation conveyance device of the present invention is a levitation conveyance device that levitates an object to be conveyed using gas and conveys the object in a conveyance direction in a non-contact manner,
The transport rail;
An air supply pump for supplying compressed gas ejected from the air supply holes of the transfer surface of the transfer rail;
A suction pump for sucking gas into the vacuum hole of the transfer surface of the transfer rail.

本発明では、隣接する孔アレイと孔アレイとの間の上方に仮想高精度浮上ラインが位置しているので、搬送対象物がこの仮想高精度浮上ラインを通過する際、この仮想高精度浮上ラインの下方に孔アレイは存在せず、したがって給気孔から噴出する圧縮気体およびバキューム孔に吸引される気体の影響を受けない。また、少なくとも仮想高精度浮上ラインを挟んで隣接する孔アレイ各々を構成する給気孔およびバキューム孔の並び順を、給気孔同士およびバキューム孔同士がそれぞれ仮想高精度浮上ラインを挟んで対向する順番としたので、搬送対象物が仮想高精度浮上ラインへ進入直前に受ける気体の流れと、搬送対象物が仮想高精度浮上ラインから離脱直後に受ける気体の流れとが同じになる。このため、仮想高精度浮上ラインにおける気体の流れの変動を小さくできるので、仮想高精度浮上ラインにおける搬送対象物の浮上量を高精度に維持し、安定させることができる。   In the present invention, since the virtual high precision levitation line is located above between the adjacent hole array, when the transport object passes through the virtual high precision levitation line, this virtual high precision levitation line There is no hole array below, so that it is not affected by the compressed gas ejected from the air supply holes and the gas sucked into the vacuum holes. Further, the arrangement order of the air supply holes and the vacuum holes constituting each of the adjacent hole arrays with at least the virtual high precision levitation line interposed therebetween is the order in which the air supply holes and the vacuum holes face each other with the virtual high precision levitation line interposed therebetween. Therefore, the gas flow received immediately before entering the virtual high precision levitation line is the same as the gas flow received immediately after leaving the virtual high precision levitation line. For this reason, since the fluctuation | variation of the gas flow in a virtual high precision levitation line can be made small, the floating amount of the conveyance target object in a virtual high precision levitation line can be maintained with high precision, and can be stabilized.

図１は、本発明の一実施の形態に係る浮上搬送装置１の概略構成図である。FIG. 1 is a schematic configuration diagram of a levitation transport apparatus 1 according to an embodiment of the present invention. 図２は、図１に示す浮上搬送装置１のＡ部拡大図である。FIG. 2 is an enlarged view of a portion A of the levitation transport apparatus 1 shown in FIG. 図３（Ａ）は、搬送対象物７が仮想高精度浮上ラインＬ内のＢ点を通過する際の状態を説明するための図であり、図３（Ｂ）は、搬送対象物７が仮想高精度浮上ラインＬ内のＣ点を通過する際の状態を説明するための図である。FIG. 3A is a diagram for explaining a state when the conveyance object 7 passes through the point B in the virtual high precision levitation line L, and FIG. 3B is a diagram in which the conveyance object 7 is virtual. It is a figure for demonstrating the state at the time of passing the C point in the high precision levitation line L. FIG. 図４（Ａ）は、搬送対象物７が仮想高精度浮上ラインＬを挟んで隣接する孔アレイ２１ａ、２１ｂ以外の孔アレイ２１上に設定されたラインＭ内のＤ点を通過する際の状態を説明するための図であり、図４（Ｂ）は、搬送対象物７が仮想高精度浮上ラインＬを挟んで隣接する孔アレイ２１ａ、２１ｂ以外の隣接する孔アレイ２１と孔アレイ２１との間の上に設定されたラインＮ内のＥ点を通過する際の状態を説明するための図である。FIG. 4A shows a state in which the conveyance object 7 passes through a point D in the line M set on the hole array 21 other than the adjacent hole arrays 21a and 21b with the virtual high-precision levitation line L interposed therebetween. 4B is a diagram for explaining the relationship between the hole array 21 and the hole array 21 other than the hole arrays 21a and 21b adjacent to each other with the transport object 7 sandwiching the virtual high-precision levitation line L. It is a figure for demonstrating the state at the time of passing the E point in the line N set on the upper side. 図５は、本発明の一実施の形態に係る浮上搬送装置１において、搬送対象物７の、搬送用レール２の搬送面２０からの浮上量の測定結果を示す図である。FIG. 5 is a diagram illustrating a measurement result of the floating amount of the conveyance object 7 from the conveyance surface 20 of the conveyance rail 2 in the levitation conveyance apparatus 1 according to the embodiment of the present invention.

以下、本発明の一実施の形態について、図面を参照して説明する。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

図１は、本実施の形態に係る浮上搬送装置１の概略構成図である。また、図２は、図１に示す浮上搬送装置１のＡ部拡大図である。   FIG. 1 is a schematic configuration diagram of a levitation transport apparatus 1 according to the present embodiment. FIG. 2 is an enlarged view of part A of the levitation transport apparatus 1 shown in FIG.

図示するように、本実施の形態に係る浮上搬送装置１は、液晶ディスプレイパネル、プラズマディスプレイパネル、有機ＥＬパネル等のフラットディスプレイパネルに用いられるガラス基板等の搬送対象物７（図３参照）を非接触で搬送するための搬送面２０を備えた搬送用レール２と、給気ポンプ３と、給気ポンプ３を搬送レール２の給気ポンプ接続口（不図示）に接続するための給気用ホース４と、吸引ポンプ５と、吸引ポンプ５を搬送レール２の吸引ポンプ接続口（不図示）に接続するための吸引用ホース６と、を備えている。   As shown in the figure, the levitation transport device 1 according to the present embodiment is configured to transport a transport object 7 (see FIG. 3) such as a glass substrate used in a flat display panel such as a liquid crystal display panel, a plasma display panel, or an organic EL panel. Supply rail 2 having a transfer surface 20 for non-contact transfer, an air supply pump 3, and an air supply for connecting the air supply pump 3 to an air supply pump connection port (not shown) of the transfer rail 2. Hose 4, suction pump 5, and suction hose 6 for connecting suction pump 5 to a suction pump connection port (not shown) of conveyance rail 2.

搬送レール２の搬送面２０には、搬送対象物７の搬送方向Ｘにおいて一定間隔Ｐ１で配列された孔アレイ２１が形成されている。各孔アレイ２１は、圧縮気体を噴出する給気孔２２および気体を吸引するバキューム孔２３が搬送方向Ｘに対して垂直な方向Ｙに沿って一定間隔Ｐ２（例えばＰ２＝Ｐ１）で交互に配置されて構成されている。なお、図の簡略化のため、一部の給気孔２２およびバキューム孔２３にのみ符号を付している。   On the transport surface 20 of the transport rail 2, a hole array 21 arranged at a constant interval P <b> 1 in the transport direction X of the transport object 7 is formed. In each hole array 21, air supply holes 22 for ejecting compressed gas and vacuum holes 23 for sucking the gas are alternately arranged at a constant interval P2 (for example, P2 = P1) along a direction Y perpendicular to the conveyance direction X. Configured. For simplification of the drawing, only some of the air supply holes 22 and the vacuum holes 23 are denoted by reference numerals.

搬送方向Ｘに複数配列された孔アレイ２１のうち、所定の隣接する孔アレイ２１ａ、２１ｂの間の上方には、搬送方向Ｘに対して垂直な方向Ｙに沿って仮想高精度浮上ラインＬが設定されている。仮想高精度浮上ラインＬは、搬送対象物７の搬送用レール２からの浮上量に高い精度を求められる位置を示すラインであり、光学検査装置の光学検査位置、レジスト塗布装置のレジスト塗布位置などが該当する。   Among the plurality of hole arrays 21 arranged in the transport direction X, a virtual high-precision levitation line L is formed above a predetermined adjacent hole array 21a, 21b along a direction Y perpendicular to the transport direction X. Is set. The virtual high-accuracy levitation line L is a line indicating a position where high accuracy is required for the flying height of the conveyance object 7 from the conveyance rail 2, such as an optical inspection position of an optical inspection apparatus, a resist coating position of a resist coating apparatus, and the like. Is applicable.

仮想高精度浮上ラインＬを搬送方向Ｘに対して挟んで隣接する孔アレイ２１ａ、２１ｂは、これらの孔アレイ２１ａ、２１ｂを構成する給気孔２２およびバキューム孔２３のそれぞれが仮想高精度浮上ラインＬに対して線対称となるように配置されている。また、仮想高精度浮上ラインＬに対して搬送方向Ｘの上流側２４ａに配置された複数の孔アレイ２１を構成する給気孔２２およびバキューム孔２３は、搬送方向Ｘにおいて一定間隔Ｐ１で交互に配置されている。同様に、仮想高精度浮上ラインＬに対して搬送方向Ｘの下流側２４ｂに配置された複数の孔アレイ２１を構成する給気孔２２およびバキューム孔２３も、搬送方向Ｘにおいて一定間隔Ｐ１で交互に配置されている。   The adjacent hole arrays 21a and 21b sandwiching the virtual high-accuracy levitation line L with respect to the transport direction X are the air supply holes 22 and the vacuum holes 23 constituting the hole arrays 21a and 21b, respectively. Are arranged so as to be line symmetrical. Further, the air supply holes 22 and the vacuum holes 23 constituting the plurality of hole arrays 21 arranged on the upstream side 24a in the transport direction X with respect to the virtual high-precision levitation line L are alternately arranged at a constant interval P1 in the transport direction X. Has been. Similarly, the air supply holes 22 and the vacuum holes 23 constituting the plurality of hole arrays 21 arranged on the downstream side 24b in the transport direction X with respect to the virtual high precision levitation line L are also alternately arranged at a constant interval P1 in the transport direction X. Has been placed.

搬送レール２の内部には、給気ポンプ接続口を各孔アレイ２１の給気孔２２に繋ぐ給気用通気路（不図示）、および吸引ポンプ接続口を各孔アレイ２１のバキューム孔２３に繋ぐバキューム用通気路（不図示）が形成されている。   Inside the transport rail 2, an air supply passage (not shown) that connects the supply pump connection port to the supply hole 22 of each hole array 21, and a suction pump connection port is connected to the vacuum hole 23 of each hole array 21. A vacuum air passage (not shown) is formed.

図３（Ａ）は、搬送対象物７が仮想高精度浮上ラインＬ内のＢ点（図２参照）を通過する際の状態を説明するための図であり、図３（Ｂ）は、搬送対象物７が図２に示す仮想高精度浮上ラインＬ内のＣ点（図２参照）を通過する際の状態を説明するための図である。また、図４（Ａ）は、搬送対象物７が仮想高精度浮上ラインＬを挟んで隣接する孔アレイ２１ａ、２１ｂ以外の孔アレイ２１上に設定されたラインＭ内のＤ点（図２参照）を通過する際の状態を説明するための図であり、図４（Ｂ）は、搬送対象物７が仮想高精度浮上ラインＬを挟んで隣接する孔アレイ２１ａ、２１ｂ以外の隣接する孔アレイ２１と孔アレイ２１との間の上に設定されたラインＮ内のＥ点（図２参照）を通過する際の状態を説明するための図である。   FIG. 3A is a diagram for explaining a state when the conveyance object 7 passes through a point B (see FIG. 2) in the virtual high precision levitation line L, and FIG. It is a figure for demonstrating the state at the time of the target object 7 passing C point (refer FIG. 2) in the virtual high precision levitation line L shown in FIG. 4A shows a point D in the line M set on the hole array 21 other than the hole arrays 21a and 21b adjacent to the conveyance object 7 with the virtual high-precision levitation line L interposed therebetween (see FIG. 2). 4B is a diagram for explaining the state when passing through, and FIG. 4B is an adjacent hole array other than the adjacent hole arrays 21a and 21b with the transport target 7 sandwiching the virtual high-precision levitation line L therebetween. It is a figure for demonstrating the state at the time of passing through the E point (refer FIG. 2) in the line N set up between 21 and the hole array 21. FIG.

図４（Ａ）に示すように、搬送対象物７が孔アレイ２１ａ、２１ｂ以外の孔アレイ２１上に設定されたラインＭを通知する際、仮想高精度浮上ラインの真下に位置する孔アレイ２１の給気孔２２から噴出する圧縮気体およびこの孔アレイ２１のバキューム孔２３に吸引される気体の影響を受け、ラインＭにおける搬送対象物７の搬送用レール２からの浮上量を高精度に維持し、安定させることができない。   As shown in FIG. 4 (A), when the conveyance object 7 notifies the line M set on the hole array 21 other than the hole arrays 21a and 21b, the hole array 21 positioned immediately below the virtual high-precision levitation line. Under the influence of the compressed gas ejected from the air supply holes 22 and the gas sucked into the vacuum holes 23 of the hole array 21, the flying height of the conveyance object 7 on the line M from the conveyance rail 2 is maintained with high accuracy. Can not be stabilized.

また、図４（Ｂ）に示すように、搬送対象物７が孔アレイ２１ａ、２１ｂ以外の隣接する孔アレイ２１と孔アレイ２１との間の上に設定されたラインＮを通過する際、このラインＮを挟んで隣接する孔アレイ２１各々の給気孔２２およびバキューム孔２３の並び順が互いに異なるため、搬送対象物７がラインＮへ進入直前に受ける気体の流れと、搬送対象物７がラインＮから離脱直後に受ける気体の流れとが異なる。具体的には、搬送対象物７がラインＮへ進入直前に受ける気体の流れおよび搬送対象物７がラインＮから離脱直後に受ける気体の流れの一方が給気孔２２から噴出される圧縮気体の流れとなり、他方がバキューム孔２３に吸引される気体の流れになる。このため、ラインＮにおける搬送対象物７の搬送用レール２からの浮上量を高精度に維持し、安定させることができない。   Further, as shown in FIG. 4B, when the transport object 7 passes through the line N set between the adjacent hole array 21 and the hole array 21 other than the hole arrays 21a and 21b, Since the arrangement order of the air supply holes 22 and the vacuum holes 23 of each of the adjacent hole arrays 21 across the line N is different from each other, the flow of the gas received immediately before the transfer object 7 enters the line N and the transfer object 7 are The gas flow received immediately after separation from N is different. Specifically, the flow of compressed gas in which one of the gas flow received immediately before the conveyance object 7 enters the line N and the gas flow received immediately after the conveyance object 7 leaves the line N is ejected from the air supply hole 22. The other becomes a gas flow sucked into the vacuum hole 23. For this reason, the flying height of the transfer object 7 on the line N from the transfer rail 2 cannot be maintained with high accuracy and stabilized.

しかし、本実施の形態に係る浮上搬送装置１では、隣接する孔アレイ２１ａと孔アレイ２１ｂとの間の上に仮想高精度浮上ラインＬを設定しているので、図３（Ａ）および図３（Ｂ）に示すように、搬送対象物７がこの仮想高精度浮上ラインＬを通過する際、この仮想高精度浮上ラインＬの真下に給気孔２２およびバキューム孔２３は存在せず、したがって給気孔から噴出する圧縮気体およびバキューム孔に吸引される気体の影響を受けない。   However, in the levitation transport apparatus 1 according to the present embodiment, the virtual high-accuracy levitation line L is set between the adjacent hole array 21a and the hole array 21b, so FIG. 3 (A) and FIG. As shown in (B), when the conveyance object 7 passes through the virtual high precision levitation line L, the air supply hole 22 and the vacuum hole 23 do not exist immediately below the virtual high precision levitation line L, and therefore the air supply hole. It is not affected by the compressed gas ejected from the gas and the gas sucked into the vacuum hole.

また、仮想高精度浮上ラインＬを挟んで隣接する孔アレイ２１ａ、２１ｂをそれぞれ構成する給気孔２２およびバキューム孔２３が、仮想高精度浮上ラインＬに対して線対称となるように配置されているので、搬送対象物７が仮想高精度浮上ラインＬへ進入直前に受ける気体の流れと、搬送対象物７が仮想高精度浮上ラインＬから離脱直後に受ける気体の流れとが同じになる。具体的には、図３（Ａ）に示すように、ともに給気孔２２から噴出される圧縮気体の流れになるか、あるいは、図３（Ｂ）に示すように、ともにバキューム孔２３に吸引される気体の流れになる。このため、仮想高精度浮上ラインＬにおける気体の流れの変動を小さくできるので、仮想高精度浮上ラインＬにおける搬送対象物７の浮上量を高精度に維持し、安定させることができる。   Further, the air supply holes 22 and the vacuum holes 23 constituting the hole arrays 21a and 21b adjacent to each other with the virtual high-accuracy levitation line L interposed therebetween are arranged so as to be symmetrical with respect to the virtual high-accuracy levitation line L. Therefore, the gas flow that the transport object 7 receives immediately before entering the virtual high precision levitation line L is the same as the gas flow that the transport object 7 receives immediately after leaving the virtual high precision levitation line L. Specifically, as shown in FIG. 3 (A), both are compressed gas flows ejected from the air supply holes 22, or both are sucked into the vacuum holes 23 as shown in FIG. 3 (B). Gas flow. For this reason, since the fluctuation | variation of the gas flow in the virtual high precision levitation line L can be made small, the floating amount of the conveyance target object 7 in the virtual high precision levitation line L can be maintained and stabilized with high precision.

図５は、本実施の形態に係る浮上搬送装置１において、搬送対象物７の、搬送用レール２の搬送面２０からの浮上量の測定結果を示す図である。   FIG. 5 is a diagram illustrating a measurement result of the floating amount of the conveyance target 7 from the conveyance surface 20 of the conveyance rail 2 in the levitation conveyance apparatus 1 according to the present embodiment.

ここで、実線のグラフ８０は、図２に示す仮想高精度浮上ラインＬ内のＢ点における測定結果を示すグラフであり、点線のグラフ８１は、図２に示すラインＭのＤ点における測定結果を示すグラフであり、一点鎖線のグラフ８２は、図２に示すラインＮ内のＥ点における測定結果を示すグラフである。   Here, the solid line graph 80 is a graph showing the measurement result at the point B in the virtual high precision levitation line L shown in FIG. 2, and the dotted line graph 81 is the measurement result at the point D of the line M shown in FIG. A one-dot chain line graph 82 is a graph showing a measurement result at point E in the line N shown in FIG.

また、縦軸は、搬送対象物７の搬送面２０からの浮上量（μｍ）を示しており、横軸は、搬送対象物７の先端部の、搬送方向Ｘにおける各測定点（グラフ８０はＢ点、グラフ８１はＤ点、グラフ８２はＥ点）からの移動距離（ｍｍ）を示している。なお、搬送対象物７には、長さ２００ｍｍのガラス基板を用いた。   Further, the vertical axis indicates the flying height (μm) of the transport object 7 from the transport surface 20, and the horizontal axis indicates each measurement point in the transport direction X of the front end portion of the transport object 7 (the graph 80 indicates B point, graph 81 shows the moving distance (mm) from point D, and graph 82 shows point E). Note that a glass substrate having a length of 200 mm was used for the conveyance object 7.

グラフ８１に示すように、搬送対象物７が孔アレイ２１ａ、２１ｂ以外の孔アレイ２１上に設定されたラインＭを通過する場合、搬送対象物７の先端部のラインＭへの進入時（領域Ｆ）および搬送対象部７の後端部のラインＭからの離脱時（領域Ｇ）において、浮上量が大きく変動している。また、グラフ８２に示すように、搬送対象物７が孔アレイ２１ａ、２１ｂ以外の隣接する孔アレイ２１と孔アレイ２１との間の上に設定されたラインＮを通過する場合も、搬送対象物７の先端部のラインＮへの進入時（領域Ｆ）および搬送対象部７の後端部のラインＮからの離脱時（領域Ｇ）において、浮上量が大きく変動している。   As shown in the graph 81, when the transport object 7 passes through the line M set on the hole array 21 other than the hole arrays 21 a and 21 b, when the tip of the transport object 7 enters the line M (area) F) and at the time of separation from the line M of the rear end portion of the conveyance target portion 7 (region G), the flying height greatly fluctuates. Further, as shown in the graph 82, the transport object 7 also passes when the transport object 7 passes through the line N set between the adjacent hole array 21 and the hole array 21 other than the hole arrays 21a and 21b. The flying height greatly fluctuates when the leading end portion 7 enters the line N (region F) and when the trailing end portion of the conveyance target portion 7 leaves the line N (region G).

一方、グラフ８０に示すように、搬送対象物７が仮想高精度浮上ラインＬを通過する場合、搬送対象物７の先端部の仮想高精度浮上ラインＬへの進入時（領域Ｆ）および搬送対象部７の後端部の仮想高精度浮上ラインＬからの離脱時（領域Ｇ）における浮上量の変動が、搬送対象物７がラインＭを通過する場合（グラフ８１）および搬送対象物７がラインＮを通過する場合（グラフ８２）に比べて小さく、仮想高精度浮上ラインＬにおける搬送対象物７の浮上量を高精度に維持し、安定させることが可能であることが証明された。   On the other hand, as shown in the graph 80, when the transport object 7 passes through the virtual high precision levitation line L, the tip of the transport object 7 enters the virtual high precision levitation line L (area F) and the transport target. When the transport object 7 passes through the line M (graph 81) when the rear end of the section 7 leaves the virtual high-precision levitation line L (region G), the transport object 7 is a line. It is proved that it is smaller than the case of passing through N (graph 82), and it is possible to maintain and stabilize the flying height of the conveyance object 7 in the virtual high-precision floating line L with high accuracy.

なお、本発明は、上記の実施の形態に限定されるものではなく、その要旨の範囲内で数々の変形が可能である。   In addition, this invention is not limited to said embodiment, Many deformation | transformation are possible within the range of the summary.

例えば、上記の実施の形態では、仮想高精度浮上ラインＬを搬送方向Ｘに対して挟んで隣接する孔アレイ２１ａ、２１ｂを構成する給気孔２２およびバキューム孔２３のそれぞれを、仮想高精度浮上ラインＬに対して線対称となる位置に配置した。しかし、本発明はこれに限定されない。少なくとも、給気孔２２同士およびバキューム孔２３同士がそれぞれ仮想高精度浮上ラインＬを挟んで対向する位置に、孔アレイ２１ａ、２１ｂを構成する給気孔２２およびバキューム孔２３のそれぞれを配置すればよい。この場合でも上記の実施の形態と同様の効果が期待できる。   For example, in the above-described embodiment, each of the air supply holes 22 and the vacuum holes 23 constituting the hole arrays 21a and 21b adjacent to each other with the virtual high-precision levitation line L sandwiched in the transport direction X is replaced with the virtual high-precision levitation line. They are arranged at positions that are line-symmetric with respect to L. However, the present invention is not limited to this. The air supply holes 22 and the vacuum holes 23 constituting the hole arrays 21a and 21b may be arranged at least at positions where the air supply holes 22 and the vacuum holes 23 face each other with the virtual high-precision levitation line L interposed therebetween. Even in this case, the same effect as the above-described embodiment can be expected.

また、上記の実施の形態に係る浮上搬送装置１において、搬送対象物７の搬送方向Ｘに搬送用レールを複数配置してもよい。この場合、仮想高精度浮上ラインＬが設定される搬送用レールにのみ上述の搬送用レール２を用い、仮想高精度浮上ラインＬが設定されない搬送用レールには、従来の搬送用レール、すなわち給気孔およびバキューム孔が搬送方向Ｘおよび搬送方向に対して垂直な方向Ｙのそれぞれにおいて、一定間隔で交互に配置された搬送用レールを用いてもよい。   In the levitation transport apparatus 1 according to the above-described embodiment, a plurality of transport rails may be arranged in the transport direction X of the transport object 7. In this case, the above-described transfer rail 2 is used only for the transfer rail for which the virtual high-accuracy levitation line L is set, and the conventional transfer rail, that is, the supply rail is used for the transfer rail to which the virtual high-accuracy levitation line L is not set. A transport rail in which air holes and vacuum holes are alternately arranged at regular intervals in the transport direction X and the direction Y perpendicular to the transport direction may be used.

また、上記の実施の形態では、液晶ディスプレイパネル、プラズマディスプレイパネル等のフラットディスプレイパネルに用いられるガラス基板等の搬送対象物７を搬送対象とする場合を例に挙げたが、本発明は、撓みやすいシート状の搬送対象物を浮上搬送する浮上搬送装置に広く適用できる。   In the above-described embodiment, the case where the object to be transported 7 such as a glass substrate used in a flat display panel such as a liquid crystal display panel or a plasma display panel is taken as an example of transport is described as an example. The present invention can be widely applied to a levitation conveyance apparatus that levitates and conveys an easy sheet-like conveyance object.

１：浮上搬送装置、 ２：搬送用レール、 ３：給気ポンプ、 ４：給気用ホース、 ５：吸引ポンプ、 ６：吸引用ホース、 ７：搬送対象物、 ２０：搬送面、 ２１、２１ａ、２１ｂ：孔アレイ、 ２２：給気孔、 ２３：バキューム孔 DESCRIPTION OF SYMBOLS 1: Levitation conveyance apparatus, 2: Rail for conveyance, 3: Air supply pump, 4: Hose for air supply, 5: Suction pump, 6: Hose for suction, 7: Object to be conveyed, 20: Conveyance surface, 21, 21a 21b: hole array, 22: air supply hole, 23: vacuum hole

Claims (4)

気体を用いて搬送対象物を浮上させて、搬送方向に非接触で搬送する搬送用レールであって、
前記気体を噴出する給気孔および気体を吸引するバキューム孔が前記搬送方向に対して垂直な方向に沿って一定間隔で交互に配置された孔アレイが、前記搬送方向に複数配列された搬送面を備え、
前記搬送方向に対して垂直な方向に沿って設定された仮想高精度浮上ラインが、前記搬送方向に複数配列された前記孔アレイのうち、搬送方向において隣接する所定の孔アレイと孔アレイとの間の上方に位置するとともに、少なくとも当該隣接する所定の孔アレイのうちの一方を構成する給気孔が他方を構成する給気孔と前記仮想高精度浮上ラインを挟んで対向し、かつ当該隣接する所定の孔アレイのうちの一方を構成するバキューム孔が他方を構成するバキューム孔と前記仮想高精度浮上ラインを挟んで対向する位置に配置されている
ことを特徴とする搬送用レール。 A transportation rail that floats an object to be transported using gas and transports the object in the transport direction in a non-contact manner,
A plurality of hole arrays in which the air supply holes for ejecting the gas and the vacuum holes for sucking the gas are alternately arranged at regular intervals along the direction perpendicular to the transport direction are provided as a transport surface arranged in the transport direction. Prepared,
Among the hole arrays in which a plurality of virtual high precision levitation lines set along a direction perpendicular to the transport direction are arranged in the transport direction, a predetermined hole array adjacent to the transport direction and the hole array And at least an air supply hole constituting one of the adjacent predetermined hole arrays is opposed to an air supply hole constituting the other across the virtual high-accuracy levitation line, and the adjacent predetermined A conveying rail, wherein a vacuum hole constituting one of the hole arrays is disposed at a position facing a vacuum hole constituting the other across the virtual high-precision levitation line. 請求項１に記載の搬送用レールであって、
前記隣接する所定の孔アレイ各々を構成する給気孔およびバキューム孔は、前記仮想高精度浮上ラインに対して線対称となる位置に配置されている
ことを特徴とする搬送用レール。 The conveyance rail according to claim 1,
An air supply hole and a vacuum hole constituting each of the adjacent predetermined hole arrays are arranged at positions that are line-symmetric with respect to the virtual high-precision levitation line. 請求項１または２に記載の搬送用レールであって、
前記仮想高精度浮上ラインに対して前記搬送方向の上流側に配置された複数の孔アレイ、および前記仮想高精度浮上ラインに対して前記搬送方向の下流側に配置された複数の孔アレイは、それぞれ、各孔アレイを構成する給気孔およびバキューム孔が前記搬送方向において一定間隔で交互に配置されている
ことを特徴とする搬送用レール。 It is a rail for conveyance according to claim 1 or 2,
A plurality of hole arrays arranged on the upstream side in the transport direction with respect to the virtual high-precision levitation line, and a plurality of hole arrays arranged on the downstream side in the transport direction with respect to the virtual high-precision levitation line, Each of the air supply holes and the vacuum holes constituting each hole array is alternately arranged at regular intervals in the transport direction. 気体を用いて搬送対象物を浮上させて、搬送方向に非接触で搬送する浮上搬送装置であって、
請求項１ないし３のいずれか一項に記載の搬送用レールと、
前記搬送用レールの前記搬送面の前記給気孔から噴出する圧縮気体を供給するための給気ポンプと、
前記搬送用レールの前記搬送面の前記バキューム孔に気体を吸引するための吸引ポンプと、を備える
ことを特徴とする浮上搬送装置。
A levitation transport device that levitates an object to be transported using gas and transports the object in a non-contact manner in the transport direction,
The conveyance rail according to any one of claims 1 to 3,
An air supply pump for supplying compressed gas ejected from the air supply holes of the transfer surface of the transfer rail;
And a suction pump for sucking gas into the vacuum hole of the transport surface of the transport rail.
JP2014104782A 2014-05-20 2014-05-20 Transportation rail and float transportation device Pending JP2015218055A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014104782A JP2015218055A (en) 2014-05-20 2014-05-20 Transportation rail and float transportation device
PCT/JP2015/063024 WO2015178189A1 (en) 2014-05-20 2015-04-30 Conveyance rail and flotation conveying device
TW104114053A TW201609512A (en) 2014-05-20 2015-05-01 Conveyance rail and flotation conveying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014104782A JP2015218055A (en) 2014-05-20 2014-05-20 Transportation rail and float transportation device

Publications (1)

Publication Number Publication Date
JP2015218055A true JP2015218055A (en) 2015-12-07

Family

ID=54553863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014104782A Pending JP2015218055A (en) 2014-05-20 2014-05-20 Transportation rail and float transportation device

Country Status (3)

Country Link
JP (1) JP2015218055A (en)
TW (1) TW201609512A (en)
WO (1) WO2015178189A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4307872B2 (en) * 2003-03-18 2009-08-05 オリンパス株式会社 Board inspection equipment
JP4426276B2 (en) * 2003-10-06 2010-03-03 住友重機械工業株式会社 Conveying device, coating system, and inspection system
AU2005262191A1 (en) * 2004-07-09 2006-01-19 Oc Oerllikon Balzers Ag Gas bearing substrate-loading mechanism process
JP2010232472A (en) * 2009-03-27 2010-10-14 Dainippon Screen Mfg Co Ltd Substrate transfer device and substrate processing apparatus
JP2011124342A (en) * 2009-12-09 2011-06-23 Tokyo Electron Ltd Substrate processing device, substrate processing method, and recording medium recording program for implementing the substrate processing method

Also Published As

Publication number Publication date
WO2015178189A1 (en) 2015-11-26
TW201609512A (en) 2016-03-16

Similar Documents

Publication Publication Date Title
JP5998086B2 (en) Air plate for levitation
JP2011225355A (en) Air floating unit, stage device, inspection system, exposure system, and application system
KR101187006B1 (en) Noncontact conveying plate for large area panel
JP2009051654A (en) Substrate carrying device and substrate inspection device
JP2003063643A (en) Thin plate conveying system and apparatus
JP2008076170A (en) Substrate inspection device
TWI637928B (en) Glass plate manufacturing method and glass plate manufacturing device
JP4392692B2 (en) Semiconductor wafer and liquid crystal glass air levitation transfer device
JP2016035960A (en) Transport device
JP2008130892A (en) Air float carrying apparatus and air carrying method
JP2007204278A (en) Substrate floating carrying device
KR102588108B1 (en) Glass plate manufacturing method and manufacturing device
JP2008041989A (en) Air table for transferring sheet material, and apparatus for transferring the sheet material
WO2015178189A1 (en) Conveyance rail and flotation conveying device
JP5312760B2 (en) Conveyed object levitating apparatus and stage apparatus using the same
JP6076606B2 (en) Levitation conveyance device and levitation conveyance method
JP4171293B2 (en) Method and apparatus for conveying thin plate material
JP6147521B2 (en) Levitation conveyance device, conveyance rail, and levitation conveyance method
JP2008114954A (en) Object floating device and stage device
JP6641663B2 (en) Method for manufacturing glass plate and apparatus for manufacturing the same
JP2016016989A (en) Transport rail and floating transport device
KR102497947B1 (en) Manufacturing method of glass plate and manufacturing apparatus therefor
JP6026603B2 (en) Glass substrate transfer apparatus and glass substrate manufacturing method
WO2021100392A1 (en) Apparatus for manufacturing glass plate and method for manufacturing same
CN109790064A (en) The manufacturing method of glass substrate