JP2015096254A - Pure water purification apparatus - Google Patents

Pure water purification apparatus Download PDF

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JP2015096254A
JP2015096254A JP2013237255A JP2013237255A JP2015096254A JP 2015096254 A JP2015096254 A JP 2015096254A JP 2013237255 A JP2013237255 A JP 2013237255A JP 2013237255 A JP2013237255 A JP 2013237255A JP 2015096254 A JP2015096254 A JP 2015096254A
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ion exchange
pure water
exchange means
water
cutting
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JP6328912B2 (en
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正喜 内田
Masaki Uchida
正喜 内田
裕隆 石黒
Hirotaka Ishiguro
裕隆 石黒
敦史 藤田
Atsushi Fujita
敦史 藤田
吉田　幹
Miki Yoshida
幹 吉田
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Disco Corp
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Disco Abrasive Systems Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a pure water purification apparatus which can reduces running costs.SOLUTION: A pure water purification apparatus purifies waste water from a cutting apparatus as a processing apparatus to pure water. The pure water purification apparatus includes at least ion exchange means 53 and 54 of purifying fresh water to pure water and a suction pump 55 feeding pure water purified by the ion exchange means 53 and 54 at a specified water pressure. The ion exchange means 53 and 54 have an inflow inlet and a discharge outlet and, in the discharge outlet, a container connected to the suction pump 55 and an ion exchange resin housed in the container. A discharge pump 51 is arranged in the inflow inlet to feed fresh water. The pure water purification apparatus alleviates the suction force applied to the ion exchange means 53 and 54 by the suction pump 55 by applying pressure to fresh water of the discharge pump 51.

Description

本発明は、純水精製装置に関する。   The present invention relates to a pure water purifier.

半導体デバイス製造工程においては、半導体ウエーハの表面に形成されたＩＣ、ＬＳＩ等のデバイスをストリートに沿って切断することにより個々の半導体デバイスを製造している。また、サファイヤ基板の表面に窒化ガリウム系化合物半導体等が積層された光デバイスウエーハもストリートに沿って切断することにより個々の発光ダイオード、レーザーダイオード等の光デバイスに分割され、電気機器に広く利用されている。通常、この切断はダイサーと呼ばれる切削装置によって行われている。この切削装置は、切削ブレードを備えた切削手段と、切削ブレードに加工水（通常は純水を用いる）を供給する加工水供給手段を具備し、該加工水供給手段によって加工水を回転する切削ブレードに供給することにより切削ブレードを冷却するとともに、切削ブレードによる切削屑の排出を促しながら切削作業を実施する。   In the semiconductor device manufacturing process, individual semiconductor devices are manufactured by cutting devices such as ICs and LSIs formed on the surface of a semiconductor wafer along the streets. In addition, optical device wafers with gallium nitride compound semiconductors laminated on the surface of a sapphire substrate are also divided into individual optical devices such as light emitting diodes and laser diodes by cutting along the streets, and are widely used in electrical equipment. ing. Usually, this cutting is performed by a cutting device called a dicer. This cutting apparatus includes a cutting means provided with a cutting blade, and a processing water supply means for supplying processing water (usually using pure water) to the cutting blade, and the cutting water is rotated by the processing water supply means. The cutting blade is cooled by supplying it to the blade, and the cutting operation is carried out while promoting the discharge of cutting waste by the cutting blade.

半導体デバイス製造工程で用いられる純水は、水道水等に比較して、不純物が限界近くまで除去されたものであり、フィルタ等である程度の不純物が除去された清水からイオン交換手段によってイオン分の除去が行われるのが通常である。   The pure water used in the semiconductor device manufacturing process is one in which impurities are removed to near the limit compared to tap water, etc., and the ion content from the fresh water from which some impurities have been removed by a filter or the like by ion exchange means. Removal is usually done.

また、上述した切削装置で排出される加工水から切削屑及び各種イオンを除去して再び切削装置に供給される純水精製装置の一種である加工廃液処理装置にもイオン交換手段が用いられる（例えば、特許文献１、２参照）。これらの装置のイオン交換手段は、ガラス繊維等で耐圧強化されている樹脂性の硬質な容器にイオン交換樹脂を収容し、その容器のイオン交換樹脂に清水を通すことでイオン分を除去し純水に精製している（特許文献３参照）。   Further, an ion exchange means is also used in a processing waste liquid treatment apparatus which is a kind of pure water purification apparatus which removes cutting waste and various ions from the processing water discharged by the above-described cutting apparatus and is supplied to the cutting apparatus again ( For example, see Patent Documents 1 and 2). The ion exchange means of these devices is to remove the ion content by storing the ion exchange resin in a resinous hard container reinforced with glass fiber or the like and passing clean water through the ion exchange resin in the container. It is purified to water (see Patent Document 3).

特開２００４−２３０５２７号公報Japanese Patent Laid-Open No. 2004-230527 特開２０１１−４１８７８号公報JP 2011-41878 A 特開２００７−２４５００５号公報JP 2007-24505 A

通常、イオン交換手段に注入する清水の水圧を利用して、純水精製装置から加工装置へと純水を送出している。また、イオン交換手段の後にも水圧が減衰する工程、例えば、温調手段等があるため、加工装置が必要とする水圧より更に高い水圧で清水がイオン交換手段に注入されている。よって、イオン交換手段のイオン交換樹脂が収容される容器は一定以上の耐圧性能が求められるため、高価で、重く、収容されているイオン交換樹脂が容易に交換できないような容器が用いられている。   Usually, pure water is sent from the pure water purification device to the processing device using the pressure of fresh water injected into the ion exchange means. Further, since there is a step in which the water pressure is attenuated after the ion exchange means, for example, a temperature control means, fresh water is injected into the ion exchange means at a higher water pressure than the water pressure required by the processing apparatus. Therefore, since the container in which the ion exchange resin of the ion exchange means is accommodated is required to have a pressure resistance performance above a certain level, a container that is expensive, heavy, and in which the ion exchange resin accommodated cannot be easily replaced is used. .

よって、例えば遠隔地の工場で利用された純水精製装置のイオン交換樹脂が使用限度まで使用された際、イオン交換樹脂を廃棄する場合にも高いコストがかかり、現地でイオン交換樹脂の入れ替えをする場合にも、重量物のため作業が容易ではないことから、廃液処理装置メーカー等まで送り返す必要があり且つ輸送コストも多い。したがって、従来の純水精製装置は、ランニングコストが高コスト化するという問題が有った。   Therefore, for example, when the ion exchange resin of a deionized water purification device used at a remote factory is used up to the limit of use, there is a high cost even when the ion exchange resin is discarded. In this case, since the work is not easy due to the heavy load, it is necessary to send it back to the manufacturer of the waste liquid treatment apparatus and the transportation cost is high. Therefore, the conventional pure water purifier has a problem that the running cost is increased.

本発明は、上記問題にかんがみなされたもので、その目的は、ランニングコストの低コスト化を図ることができる純水精製装置を提供することである。   The present invention has been considered in view of the above problems, and an object of the present invention is to provide a pure water purifier capable of reducing the running cost.

上述した課題を解決し、目的を達成するために、本発明の純水精製装置は、清水を純水に精製するイオン交換手段と、該イオン交換手段によって精製された純水を所定の水圧で送出する吸引ポンプと、を少なくとも具備する純水精製装置であって、該イオン交換手段は、流入口と排出口を備え、該排出口に吸引ポンプが連結される容器と、該容器に収容されるイオン交換樹脂と、を具備し、該流入口には、吐出ポンプが配設されて清水が送給され、該吸引ポンプによって該イオン交換手段にかかる吸引力を、該吐出ポンプの清水への加圧によって緩和することを特徴とする。   In order to solve the above-described problems and achieve the object, the pure water purifying apparatus of the present invention includes an ion exchange means for purifying purified water into pure water, and pure water purified by the ion exchange means at a predetermined water pressure. A deionized water purifier comprising at least a suction pump for delivery, wherein the ion exchange means includes an inlet and a discharge port, and a suction pump is connected to the discharge port; An ion exchange resin, and the inlet is provided with a discharge pump to supply fresh water, and the suction pump applies a suction force applied to the ion exchange means to the fresh water of the discharge pump. It is characterized by relaxation by pressurization.

また、前記純水精製装置では、前記イオン交換手段の前記容器は、前記イオン交換樹脂を収容する本体部が単層樹脂で形成されていることが望ましい。   In the pure water purification apparatus, it is desirable that the container of the ion exchange means has a main body portion containing the ion exchange resin formed of a single layer resin.

本願発明の純水精製装置では、イオン交換手段の容器にかかる水圧が低くてすむため、例えばＰＯ（polyolefin）やＰＥＴ（polyethylene terephthalate）などの樹脂により単層で構成された樹脂製の容器でもイオン交換手段に用いることができる。このために、使用済みのイオン交換樹脂を容器ごと廃棄するのに、軽量のため処理作業も容易になり、処理費用も安くすむという効果もある。また、軽量で単純な構成であるため、輸送に係るコストも安く、中身の交換も容易となる。したがって、純水精製装置は、ランニングコストの低コスト化を図ることができる。   In the pure water purifying apparatus of the present invention, since the water pressure applied to the container of the ion exchange means is low, for example, even in a resin container composed of a single layer with a resin such as PO (polyolefin) or PET (polyethylene terephthalate) It can be used as an exchange means. For this reason, in order to discard the used ion exchange resin together with the container, there is an effect that the processing work becomes easy due to the light weight, and the processing cost can be reduced. Moreover, since it is a lightweight and simple structure, the cost which concerns on transportation is also cheap and the exchange of the contents becomes easy. Therefore, the pure water purifier can reduce the running cost.

図１は、実施形態に係る純水精製装置と隣接される加工装置としての切削装置の構成例を示す斜視図である。FIG. 1 is a perspective view illustrating a configuration example of a cutting device as a processing device adjacent to a pure water purification device according to an embodiment. 図２は、実施形態に係る純水精製装置の構成例を示す斜視図である。FIG. 2 is a perspective view illustrating a configuration example of the pure water purifying apparatus according to the embodiment. 図３は、実施形態に係る純水精製装置の構成例を分解して示す分解斜視図である。FIG. 3 is an exploded perspective view showing an exploded configuration example of the pure water purifying apparatus according to the embodiment. 図４は、実施形態に係る純水精製装置のイオン交換手段を示す斜視図である。FIG. 4 is a perspective view showing ion exchange means of the pure water purifying apparatus according to the embodiment. 図５は、図４中のＶ−Ｖ線に沿う断面図である。FIG. 5 is a cross-sectional view taken along line VV in FIG.

本発明を実施するための形態（実施形態）につき、図面を参照しつつ詳細に説明する。以下の実施形態に記載した内容により本発明が限定されるものではない。また、以下に記載した構成要素には、当業者が容易に想定できるもの、実質的に同一のものが含まれる。さらに、以下に記載した構成は適宜組み合わせることが可能である。また、本発明の要旨を逸脱しない範囲で構成の種々の省略、置換又は変更を行うことができる。   DESCRIPTION OF EMBODIMENTS Embodiments (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited by the contents described in the following embodiments. The constituent elements described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. Furthermore, the structures described below can be combined as appropriate. Various omissions, substitutions, or changes in the configuration can be made without departing from the scope of the present invention.

〔実施形態〕
本発明の実施形態に係る純水精製装置を図面に基いて説明する。図１は、実施形態に係る純水精製装置と隣接される加工装置としての切削装置の構成例を示す斜視図である。図２は、実施形態に係る純水精製装置の構成例を示す斜視図である。図３は、実施形態に係る純水精製装置の構成例を分解して示す分解斜視図である。図４は、実施形態に係る純水精製装置のイオン交換手段を示す斜視図である。図５は、図４中のＶ−Ｖ線に沿う断面図である。 Embodiment
A pure water purifier according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view illustrating a configuration example of a cutting device as a processing device adjacent to a pure water purification device according to an embodiment. FIG. 2 is a perspective view illustrating a configuration example of the pure water purifying apparatus according to the embodiment. FIG. 3 is an exploded perspective view showing an exploded configuration example of the pure water purifying apparatus according to the embodiment. FIG. 4 is a perspective view showing ion exchange means of the pure water purifying apparatus according to the embodiment. FIG. 5 is a cross-sectional view taken along line VV in FIG.

実施形態に係る純水精製装置１は、図１に示す加工装置としての切削装置１００に隣接されて配置される。切削装置１００は、図１に示すように、被加工物Ｗを保持するチャックテーブル１１０と、チャックテーブル１１０に保持された被加工物Ｗを切削するための切削ブレード１２１を備えた切削手段１２０と、チャックテーブル１１０をＸ軸方向に移動させるＸ軸移動手段（図示せず）と、切削手段１２０をＹ軸方向に移動させるＹ軸移動手段（図示せず）と、切削手段１２０をＺ軸方向に移動させるＺ軸移動手段（図示せず）と、チャックテーブル１１０をＺ軸と平行な軸心回りに回転させる回転駆動源（図示せず）等を備えている。切削装置１００は、Ｘ軸移動手段と、Ｙ軸移動手段と、Ｚ軸移動手段及び回転駆動源により、チャックテーブル１１０と切削手段１２０とをＸ軸方向、Ｙ軸方向、Ｚ軸方向及びＺ軸回りに相対的に移動させて、被加工物Ｗを切削してチップに分割するものである。   The pure water purification apparatus 1 according to the embodiment is disposed adjacent to a cutting apparatus 100 as a processing apparatus shown in FIG. As shown in FIG. 1, the cutting device 100 includes a chuck table 110 that holds a workpiece W, and a cutting means 120 that includes a cutting blade 121 for cutting the workpiece W held on the chuck table 110. An X-axis moving means (not shown) for moving the chuck table 110 in the X-axis direction, a Y-axis moving means (not shown) for moving the cutting means 120 in the Y-axis direction, and a cutting means 120 in the Z-axis direction Z axis moving means (not shown) for moving the chuck table 110, a rotation drive source (not shown) for rotating the chuck table 110 around an axis parallel to the Z axis, and the like. The cutting apparatus 100 includes an X-axis moving unit, a Y-axis moving unit, a Z-axis moving unit, and a rotational drive source to move the chuck table 110 and the cutting unit 120 in the X-axis direction, the Y-axis direction, the Z-axis direction, and the Z-axis. The workpiece W is moved relative to each other, and the workpiece W is cut and divided into chips.

なお、被加工物Ｗは、本実施形態では、シリコン、サファイア、ガリウムなどを母材とする円板状の半導体ウエーハや光デバイスウエーハである。また、本発明では、被加工物Ｗは、電子部品に使用される各種セラミック基板、樹脂基板、ガラス基板などであってもよい。被加工物Ｗは、図１に示すように、粘着シートＳに貼着され、粘着シートＳに環状フレームＦが貼着されて、粘着シートＳを介して環状フレームＦに装着される。   In the present embodiment, the workpiece W is a disk-shaped semiconductor wafer or optical device wafer whose base material is silicon, sapphire, gallium, or the like. In the present invention, the workpiece W may be various ceramic substrates, resin substrates, glass substrates and the like used for electronic components. As shown in FIG. 1, the workpiece W is attached to the adhesive sheet S, the annular frame F is attached to the adhesive sheet S, and the workpiece W is attached to the annular frame F via the adhesive sheet S.

また、切削装置１００は、切削前後の被加工物Ｗを複数収容するカセットエレベータ１３０と、カセットエレベータ１３０に被加工物Ｗを出し入れする搬出入手段１４０と、切削後の被加工物Ｗを洗浄する洗浄手段１５０と、搬出入手段１４０とチャックテーブル１１０と洗浄手段１５０とに亘って被加工物Ｗを搬送する搬送手段１６０と、を備えている。   Further, the cutting apparatus 100 cleans the workpiece W after cutting, a cassette elevator 130 that houses a plurality of workpieces W before and after cutting, a loading / unloading means 140 that puts and removes the workpiece W into and from the cassette elevator 130. A cleaning unit 150, a carry-in / out unit 140, a chuck table 110, and a transport unit 160 that transports the workpiece W across the cleaning unit 150 are provided.

切削装置１００は、搬出入手段１４０によりカセットエレベータ１３０内から切削前の被加工物Ｗを取り出し、取り出された被加工物Ｗを搬送手段１６０によりチャックテーブル１１０に搬送する。そして、切削装置１００は、チャックテーブル１１０に被加工物Ｗを保持し、Ｘ軸移動手段と、Ｙ軸移動手段と、Ｚ軸移動手段及び回転駆動源により、チャックテーブル１１０と切削手段１２０とをＸ軸方向、Ｙ軸方向、Ｚ軸方向及びＺ軸回りに相対的に移動させて、被加工物Ｗを切削してチップに分割する。切削装置１００は、切削後の被加工物Ｗを搬送手段１６０によりチャックテーブル１１０から洗浄手段１５０に搬送した後、洗浄手段１５０により洗浄する。そして、切削装置１００は、切削後の被加工物Ｗを搬送手段１６０により搬出入手段１４０に搬送し、搬出入手段１４０によりカセットエレベータ１３０内に収容する。   The cutting apparatus 100 takes out the workpiece W before cutting from the cassette elevator 130 by the carry-in / out means 140, and conveys the removed workpiece W to the chuck table 110 by the conveying means 160. The cutting apparatus 100 holds the workpiece W on the chuck table 110, and the chuck table 110 and the cutting means 120 are moved by the X-axis moving means, the Y-axis moving means, the Z-axis moving means, and the rotational drive source. The workpiece W is cut relative to the X-axis direction, the Y-axis direction, the Z-axis direction, and the Z-axis direction, and divided into chips. The cutting apparatus 100 transports the workpiece W after cutting from the chuck table 110 to the cleaning unit 150 by the transport unit 160 and then cleans it by the cleaning unit 150. Then, the cutting apparatus 100 conveys the workpiece W after cutting to the carry-in / out means 140 by the conveyance means 160 and accommodates the workpiece W in the cassette elevator 130 by the carry-in / out means 140.

純水精製装置１は、切削装置１００からの切削屑と切削水などからなる廃液を純水に精製して再利用するためのものである。純水精製装置１は、図２及び図３に示すように、純水精製装置１の構成要素が配設された装置ハウジング１０（図２に示す）と、廃液収容手段２０と、廃液ろ過手段３０と、清水収容手段４０と、純水精製手段５０と、純水温度調整手段９０と、図示しない制御手段を具備している。   The pure water purifying apparatus 1 is for purifying and reusing a waste liquid composed of cutting waste and cutting water from the cutting apparatus 100 into pure water. As shown in FIGS. 2 and 3, the pure water purifying apparatus 1 includes an apparatus housing 10 (shown in FIG. 2) in which components of the pure water purifying apparatus 1 are disposed, a waste liquid storage means 20, and a waste liquid filtering means. 30, fresh water storage means 40, pure water purification means 50, pure water temperature adjustment means 90, and control means (not shown).

廃液収容手段２０は、切削装置１００により精製された廃液を収容するものである。廃液収容手段２０は、切削装置１００からの廃液を収容する廃液タンク２１と、廃液タンク２１内の廃液を送給する廃液送給ポンプ２２を備えている。   The waste liquid storage means 20 stores the waste liquid purified by the cutting device 100. The waste liquid storage means 20 includes a waste liquid tank 21 that stores the waste liquid from the cutting apparatus 100 and a waste liquid feed pump 22 that supplies the waste liquid in the waste liquid tank 21.

廃液ろ過手段３０は、廃液収容手段２０から送給された廃液から切削屑を除去して清水を精製するものである。廃液ろ過手段３０は、廃液収容手段２０から送給された廃液が配管３１を介して導入される第１のフィルタ３２と、廃液が配管３１を介して導入される第２のフィルタ３３と、第１のフィルタ３２及び第２のフィルタ３３を着脱自在に設けた清水受けパン３６などを備えている。廃液送給ポンプ２２と第１のフィルタ３２及び第２のフィルタ３３とを接続する配管３１には、電磁開閉弁３４ａ，３４ｂが設けられている。電磁開閉弁３４ａ，３４ｂが開くと、第１のフィルタ３２及び第２のフィルタ３３に廃液が導入される。また、配管３１には、廃液の圧力を検出する圧力検出手段３５が取り付けられている。   The waste liquid filtering means 30 is for purifying fresh water by removing cutting waste from the waste liquid fed from the waste liquid storage means 20. The waste liquid filtering means 30 includes a first filter 32 into which the waste liquid fed from the waste liquid storage means 20 is introduced through the pipe 31, a second filter 33 into which the waste liquid is introduced through the pipe 31, and a second filter 33. A fresh water receiving pan 36 in which the first filter 32 and the second filter 33 are detachably provided is provided. The piping 31 that connects the waste liquid feed pump 22 to the first filter 32 and the second filter 33 is provided with electromagnetic on-off valves 34a and 34b. When the electromagnetic on-off valves 34 a and 34 b are opened, the waste liquid is introduced into the first filter 32 and the second filter 33. Further, a pressure detection means 35 for detecting the pressure of the waste liquid is attached to the pipe 31.

第１のフィルタ３２及び第２のフィルタ３３は、導入された廃液をろ過し、廃液中の切削屑を捕捉して、清水に精製する。第１のフィルタ３２及び第２のフィルタ３３は、精製した清水を清水受けパン３６上に流出する。清水受けパン３６は、フレキシブルホースなどからなる配管３７を通して清水を清水収容手段４０に送る。   The first filter 32 and the second filter 33 filter the introduced waste liquid, capture the cutting waste in the waste liquid, and purify it into fresh water. The first filter 32 and the second filter 33 flow the purified fresh water onto the fresh water receiving pan 36. The fresh water receiving pan 36 sends fresh water to the fresh water storage means 40 through a pipe 37 made of a flexible hose or the like.

清水収容手段４０は、廃液ろ過手段３０からの清水を貯留するものである。清水収容手段４０は、廃液ろ過手段３０からの清水を収容する清水貯留タンク４１を備えている。   The fresh water storage means 40 stores fresh water from the waste liquid filtering means 30. The fresh water storage means 40 includes a fresh water storage tank 41 that stores fresh water from the waste liquid filtering means 30.

純水精製手段５０は、清水を純水に精製するものである。純水精製手段５０は、吐出ポンプ５１と、紫外線照射手段５２と、第１のイオン交換手段５３と、第２のイオン交換手段５４と、吸引ポンプ５５と、精密フィルタ５６などを具備している。吐出ポンプ５１は、清水貯留タンク４１内の清水を配管５７を通して紫外線照射手段５２に送給する。紫外線照射手段５２は、導入された清水に紫外線を照射して殺菌する。紫外線照射手段５２は、配管５８を通して第１のイオン交換手段５３及び第２のイオン交換手段５４の流入口７１に接続している。紫外線照射手段５２と第１のイオン交換手段５３及び第２のイオン交換手段５４とを接続する配管５８には、電磁開閉弁５９ａ，５９ｂが設けられている。電磁開閉弁５９ａ，５９ｂが開くと、第１のイオン交換手段５３及び第２のイオン交換手段５４に清水が導入される。   The pure water purifying means 50 purifies fresh water into pure water. The pure water purifying means 50 includes a discharge pump 51, an ultraviolet irradiation means 52, a first ion exchange means 53, a second ion exchange means 54, a suction pump 55, a precision filter 56, and the like. . The discharge pump 51 supplies the fresh water in the fresh water storage tank 41 to the ultraviolet irradiation means 52 through the pipe 57. The ultraviolet irradiation means 52 sterilizes the introduced fresh water by irradiating it with ultraviolet rays. The ultraviolet irradiation means 52 is connected to the inlet 71 of the first ion exchange means 53 and the second ion exchange means 54 through the pipe 58. Electromagnetic on-off valves 59a and 59b are provided in a pipe 58 that connects the ultraviolet irradiation means 52 to the first ion exchange means 53 and the second ion exchange means 54. When the electromagnetic on-off valves 59a and 59b are opened, fresh water is introduced into the first ion exchange means 53 and the second ion exchange means 54.

第１のイオン交換手段５３及び第２のイオン交換手段５４は、イオン交換して清水を純水に精製するものである。また、第１のイオン交換手段５３及び第２のイオン交換手段５４の排出口７２と吸引ポンプ５５とを接続する配管６０には、第１のイオン交換手段５３及び第２のイオン交換手段５４の排出口７２からの純水の圧力を検出する圧力検出手段６１ａ，６１ｂが取り付けられている。吸引ポンプ５５は、配管６０内の第１のイオン交換手段５３及び第２のイオン交換手段５４によって精製された純水を所定の水圧で精密フィルタ５６及び純水温度調整手段９０に向けて送出する。なお、本実施形態では、吸引ポンプ５５は、第１のイオン交換手段５３及び第２のイオン交換手段５４によって精製された純水を所定の圧力としての０．３ＭＰａ（ゲージ圧）で配管６２を通して精密フィルタ５６に送出する。精密フィルタ５６は、イオン交換樹脂７４（図５に示す）などの樹脂屑などの微細な物質を捕捉するものである。純水温度調整手段９０は、純水を所定温度に調整して切削装置１００の切削水供給手段に循環するものである。   The first ion exchange means 53 and the second ion exchange means 54 are for ion exchange to purify fresh water into pure water. In addition, a pipe 60 connecting the discharge port 72 of the first ion exchange means 53 and the second ion exchange means 54 and the suction pump 55 is connected to the first ion exchange means 53 and the second ion exchange means 54. Pressure detecting means 61a and 61b for detecting the pressure of pure water from the discharge port 72 are attached. The suction pump 55 sends the pure water purified by the first ion exchange means 53 and the second ion exchange means 54 in the pipe 60 toward the precision filter 56 and the pure water temperature adjustment means 90 at a predetermined water pressure. . In the present embodiment, the suction pump 55 passes the pure water purified by the first ion exchange means 53 and the second ion exchange means 54 through the pipe 62 at a predetermined pressure of 0.3 MPa (gauge pressure). Send to precision filter 56. The precision filter 56 captures fine substances such as resin waste such as ion exchange resin 74 (shown in FIG. 5). The pure water temperature adjusting means 90 adjusts the pure water to a predetermined temperature and circulates it to the cutting water supply means of the cutting apparatus 100.

第１のイオン交換手段５３及び第２のイオン交換手段５４は、図４及び図５に示すように、流入口７１と排出口７２を備え、排出口７２に配管６０を介して吸引ポンプ５５が連結される容器７３と、容器７３に収容されるイオン交換樹脂７４（図５に示す）とを具備している。容器７３は、イオン交換樹脂７４を収容する本体部７５と、本体部７５の上部に着脱自在な着脱キャップ７６とを備えている。本体部７５は、ＰＯ（polyolefin）、ＰＥＴ（polyethylene terephthalate）、ＰＥ（polyethylene）、ＰＶＣ（polyvinyl chloride）などで構成され、単層樹脂で形成されている。本体部７５は、０〜−０．０１ＭＰａ（ゲージ圧）程度の内部の水圧に耐えることができる程度の強度を有している。このために、本体部７５は、内部の水圧が大きく変化すると、内部の水圧に応じて変形することとなる。本体部７５は、射出成形、ブロー成形、押し出し成型などの安価に大量に生産可能な方法により製造される。   As shown in FIGS. 4 and 5, the first ion exchange means 53 and the second ion exchange means 54 include an inflow port 71 and a discharge port 72, and a suction pump 55 is connected to the discharge port 72 via a pipe 60. The container 73 connected and the ion exchange resin 74 (shown in FIG. 5) accommodated in the container 73 are comprised. The container 73 includes a main body portion 75 that stores the ion exchange resin 74, and a removable cap 76 that is detachable on the upper portion of the main body portion 75. The main body 75 is made of PO (polyolefin), PET (polyethylene terephthalate), PE (polyethylene), PVC (polyvinyl chloride), or the like, and is formed of a single layer resin. The main body 75 has a strength that can withstand an internal water pressure of about 0 to -0.01 MPa (gauge pressure). For this reason, when the internal water pressure changes greatly, the main body 75 will be deformed in accordance with the internal water pressure. The main body 75 is manufactured by a method that can be mass-produced at a low cost, such as injection molding, blow molding, and extrusion molding.

着脱キャップ７６は、本体部７５の上部中央に設けられた開口を塞ぐように、本体部７５に取り付けられる。着脱キャップ７６は、流入口７１と排出口７２とが設けられている。流入口７１は、着脱キャップ７６を貫通して本体部７５内のイオン交換樹脂７４内に開口した管状に形成されている。流入口７１には、配管５８、紫外線照射手段５２及び配管５７を介して、吐出ポンプ５１が配設されて、清水が送給される。排出口７２は、イオン交換樹脂７４の上側を開口し、着脱キャップ７６の外周方向に延びた管状に形成されている。排出口７２は、配管６０を介して吸引ポンプ５５に接続している。着脱キャップ７６は、二層構造であったり、複数の材料を組み合わせて構成されてもよい。イオン交換樹脂７４としては、アニオン交換樹脂、カチオン交換樹脂のうちの少なくとも一方などが用いられる。   The detachable cap 76 is attached to the main body 75 so as to close an opening provided in the upper center of the main body 75. The detachable cap 76 is provided with an inlet 71 and an outlet 72. The inflow port 71 is formed in a tubular shape that passes through the detachable cap 76 and opens into the ion exchange resin 74 in the main body 75. A discharge pump 51 is disposed at the inlet 71 via the pipe 58, the ultraviolet irradiation means 52, and the pipe 57, and fresh water is supplied. The discharge port 72 is formed in a tubular shape that opens on the upper side of the ion exchange resin 74 and extends in the outer peripheral direction of the detachable cap 76. The discharge port 72 is connected to the suction pump 55 via the pipe 60. The detachable cap 76 may have a two-layer structure or a combination of a plurality of materials. As the ion exchange resin 74, at least one of an anion exchange resin and a cation exchange resin is used.

第１のイオン交換手段５３及び第２のイオン交換手段５４は、流入口７１から導入された清水をイオン交換樹脂７４内に導き、イオン交換樹脂７４によりイオン交換して純水に精製し、排出口７２から吸引ポンプ５５に送り出す。   The first ion exchange means 53 and the second ion exchange means 54 guide the fresh water introduced from the inflow port 71 into the ion exchange resin 74, exchange the ions with the ion exchange resin 74, purify them into pure water, and discharge them. It sends out to the suction pump 55 from the outlet 72.

制御手段は、純水精製装置１を構成する上述した構成要素をそれぞれ制御して、純水精製装置１に廃液を純水に精製させるものである。制御手段は、圧力検出手段３５，６１ａ，６１ｂの検出結果に基いて、電磁開閉弁３４ａ，３４ｂ，５９ａ，５９ｂ、吐出ポンプ５１及び吸引ポンプ５５を制御して、廃液を廃液収容手段２０に収容した後、廃液ろ過手段３０でろ過して清水に精製し、清水を清水収容手段４０に収容した後、純水精製手段５０で純水に精製し、精密フィルタ５６及び純水温度調整手段９０に向けて送出して、純水精製装置１に廃液を純水に精製させる。なお、制御手段は、例えばＣＰＵ等で構成された演算処理装置やＲＯＭ、ＲＡＭ等を備える図示しないマイクロプロセッサを主体として構成されている。また、制御手段には、純水精製開始情報などの処理情報を入力する操作盤（図示せず）が接続されている。   The control means controls the above-described components constituting the pure water purification apparatus 1 so that the pure water purification apparatus 1 purifies the waste liquid into pure water. The control means controls the electromagnetic on-off valves 34a, 34b, 59a, 59b, the discharge pump 51 and the suction pump 55 based on the detection results of the pressure detection means 35, 61a, 61b, and stores the waste liquid in the waste liquid storage means 20. Then, the liquid is filtered by the waste liquid filtering means 30 and purified to fresh water. After the fresh water is stored in the fresh water storage means 40, the purified water is purified to pure water by the pure water purification means 50, and the precision filter 56 and the pure water temperature adjustment means 90 are supplied. The waste liquid is purified to pure water by the pure water purifier 1. Note that the control means is configured mainly by a microprocessor (not shown) provided with an arithmetic processing unit constituted by a CPU or the like, a ROM, a RAM, or the like. Further, an operation panel (not shown) for inputting processing information such as pure water purification start information is connected to the control means.

制御手段は、純水精製装置１に廃液を純水に精製させる際には、吸引ポンプ５５から精密フィルタ５６に送出される純水の圧力を０．３ＭＰａ（ゲージ圧）に調整する。そして、制御手段は、圧力検出手段６１ａ，６１ｂの検出結果に基いて、配管６０内即ち排出口７２から排出される純水の圧力が０ＭＰａ（ゲージ圧）から−０．０１ＭＰａ（ゲージ圧）となるように、吐出ポンプ５１を制御する。即ち、制御手段は、第１のイオン交換手段５３及び第２のイオン交換手段５４の容器７３内の純水の圧力を０ＭＰａ（ゲージ圧）から−０．０１ＭＰａ（ゲージ圧）に維持する。   The control means adjusts the pressure of pure water sent from the suction pump 55 to the precision filter 56 to 0.3 MPa (gauge pressure) when the pure water purifier 1 purifies the waste liquid into pure water. Based on the detection results of the pressure detection means 61a and 61b, the control means sets the pressure of pure water discharged from the pipe 60, that is, the discharge port 72, from 0 MPa (gauge pressure) to -0.01 MPa (gauge pressure). Thus, the discharge pump 51 is controlled. That is, the control means maintains the pressure of pure water in the containers 73 of the first ion exchange means 53 and the second ion exchange means 54 from 0 MPa (gauge pressure) to -0.01 MPa (gauge pressure).

なお、第１のイオン交換手段５３及び第２のイオン交換手段５４の容器７３内の純水の圧力が−０．０１ＭＰａ（ゲージ圧）よりも低くなると、容器７３内にイオン交換樹脂７４に付着していた気泡が大量に発生して、イオン交換樹脂７４の性能を充分に発揮できなくなる。また、第１のイオン交換手段５３及び第２のイオン交換手段５４の容器７３内の純水の圧力が０ＭＰａ（ゲージ圧）よりも高くなると、容器７３内に正圧がかかり、容器７３を頑丈な圧力容器とする必要があるからである。こうすることで、純水精製装置１は、吸引ポンプ５５によって第１のイオン交換手段５３及び第２のイオン交換手段５４にかかる吸引力を、吐出ポンプ５１の清水の加圧によって緩和する。   When the pressure of pure water in the container 73 of the first ion exchange means 53 and the second ion exchange means 54 becomes lower than −0.01 MPa (gauge pressure), the ion exchange resin 74 adheres to the container 73. A large amount of the generated bubbles are generated, and the performance of the ion exchange resin 74 cannot be sufficiently exhibited. Further, when the pressure of pure water in the container 73 of the first ion exchange means 53 and the second ion exchange means 54 becomes higher than 0 MPa (gauge pressure), a positive pressure is applied in the container 73, and the container 73 is made strong. This is because it is necessary to use a pressure vessel. By doing so, the pure water purification apparatus 1 relaxes the suction force applied to the first ion exchange means 53 and the second ion exchange means 54 by the suction pump 55 by pressurizing the fresh water of the discharge pump 51.

以上のように、本実施形態に係る純水精製装置１によれば、第１のイオン交換手段５３及び第２のイオン交換手段５４の容器７３にかかる水圧が低くてすむため、例えばＰＯ（polyolefin）やＰＥＴ（polyethylene terephthalate）などの樹脂により単層で構成された本体部７５をイオン交換手段５３，５４の容器に用いることができる。このために、使用済みのイオン交換樹脂７４を容器７３ごと廃棄する際に、イオン交換手段５３，５４が軽量のため処理作業も容易になり、処理費用も安くすむという効果もある。また、イオン交換手段５３，５４が軽量で単純な構成であるため、輸送に係るコストも安く、イオン交換樹脂７４の交換も容易となる。したがって、純水精製装置１は、ランニングコストの低コスト化を図ることができる。   As described above, according to the pure water purification apparatus 1 according to the present embodiment, the water pressure applied to the containers 73 of the first ion exchange means 53 and the second ion exchange means 54 can be low. ) And PET (polyethylene terephthalate), etc., a main body portion 75 formed of a single layer can be used as a container for the ion exchange means 53 and 54. For this reason, when the used ion exchange resin 74 is discarded together with the container 73, the ion exchange means 53 and 54 are lightweight, so that the processing work is facilitated and the processing cost can be reduced. In addition, since the ion exchange means 53 and 54 are light and simple, the transportation cost is low and the exchange of the ion exchange resin 74 is easy. Therefore, the pure water purifier 1 can reduce the running cost.

また、純水精製装置１は、吸引ポンプ５５によってイオン交換手段５３，５４の容器７３にかかる吸引力を、吐出ポンプ５１の清水への加圧によって緩和する。このために、純水精製装置１は、配管６０に設けられた圧力検出手段６１ａ，６１ｂの検出結果に基いて、吐出ポンプ５１を制御することにより、イオン交換手段５３，５４の容器７３内の水圧を０ＭＰａから−０．０１ＭＰａに容易に維持することができる。したがって、純水精製装置１は、ランニングコストの低コスト化を確実に図ることができる。   Further, the pure water purification apparatus 1 relaxes the suction force applied to the container 73 of the ion exchange means 53 and 54 by the suction pump 55 by pressurizing the fresh water of the discharge pump 51. For this purpose, the deionized water purification apparatus 1 controls the discharge pump 51 based on the detection results of the pressure detection means 61a and 61b provided in the pipe 60, so that the ion exchange means 53 and 54 in the container 73 are contained. The water pressure can be easily maintained from 0 MPa to -0.01 MPa. Therefore, the pure water purifier 1 can reliably reduce the running cost.

なお、本発明は上記実施形態に限定されるものではない。即ち、本発明の骨子を逸脱しない範囲で種々変形して実施することができる。   The present invention is not limited to the above embodiment. That is, various modifications can be made without departing from the scope of the present invention.

１ 純水精製装置
５１ 吐出ポンプ
５３ 第１のイオン交換手段
５４ 第２のイオン交換手段
５５ 吸引ポンプ
７１ 流入口
７２ 排出口
７３ 容器
７４ イオン交換樹脂
７５ 本体部 DESCRIPTION OF SYMBOLS 1 Pure water refiner | purifier 51 Discharge pump 53 1st ion exchange means 54 2nd ion exchange means 55 Suction pump 71 Inflow port 72 Outlet port 73 Container 74 Ion exchange resin 75 Main part

Claims (2)

清水を純水に精製するイオン交換手段と、該イオン交換手段によって精製された純水を所定の水圧で送出する吸引ポンプと、を少なくとも具備する純水精製装置であって、
該イオン交換手段は、
流入口と排出口を備え、該排出口に吸引ポンプが連結される容器と、
該容器に収容されるイオン交換樹脂と、を具備し、
該流入口には、吐出ポンプが配設されて清水が送給され、
該吸引ポンプによって該イオン交換手段にかかる吸引力を、該吐出ポンプの清水への加圧によって緩和することを特徴とする純水精製装置。 A pure water purifier comprising at least an ion exchange means for purifying purified water into pure water, and a suction pump for sending pure water purified by the ion exchange means at a predetermined water pressure,
The ion exchange means
A container having an inlet and an outlet, and a suction pump connected to the outlet;
An ion exchange resin accommodated in the container,
The inlet is provided with a discharge pump to supply fresh water,
A pure water purifying apparatus characterized in that the suction force applied to the ion exchange means by the suction pump is reduced by pressurization of the discharge pump to fresh water. 前記イオン交換手段の前記容器は、前記イオン交換樹脂を収容する本体部が単層樹脂で形成されている請求項１記載の純水精製装置。   The pure water purifier according to claim 1, wherein the container of the ion exchange means has a main body portion containing the ion exchange resin formed of a single layer resin.
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