JP2015061072A - 発光ダイオード - Google Patents
発光ダイオード Download PDFInfo
- Publication number
- JP2015061072A JP2015061072A JP2014127164A JP2014127164A JP2015061072A JP 2015061072 A JP2015061072 A JP 2015061072A JP 2014127164 A JP2014127164 A JP 2014127164A JP 2014127164 A JP2014127164 A JP 2014127164A JP 2015061072 A JP2015061072 A JP 2015061072A
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- JP
- Japan
- Prior art keywords
- semiconductor layer
- type semiconductor
- light emitting
- emitting diode
- type electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000004065 semiconductor Substances 0.000 claims abstract description 120
- 230000000903 blocking effect Effects 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 9
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 139
- 238000003892 spreading Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 6
- 229910002601 GaN Inorganic materials 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0016—Processes relating to electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/385—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending at least partially onto a side surface of the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
Description
P型半導体層107上に完全に配置されたP型電極113の例と比べ、P型電極113の第1の延伸部113Fは、本発明の実施形態の発光ダイオード100の発光領域上に配置されない。よって、本実施形態によりP型電極113の遮光領域対発光領域の比率は、5.2%から3.7%に減少されることができる。このため、発光ダイオード100の光取り出し効率は、効果的に向上される。
101 基板
103 N型半導体層
105 発光層
107 P型半導体層
107A 第1領域
107B 第2領域
107C 第3領域
107S 傾斜した側壁
109 電流ブロック層
111 透明導電層
113 P型電極
113B 第1の本体部
113F 第1の延伸部
115 N型電極
115B 第2の本体部
115F 第2の延伸部
L 第1側
W 第2側
Claims (8)
- 発光ダイオードにおいて、
N型半導体層と、
前記N型半導体層の部分に配置され、前記N型半導体層の他の部分を露出する発光層と、
前記発光層上に配置されたP型半導体層と、
第1の本体部および第1の延伸部を含み、前記第1の本体部は、前記P型半導体層の上面の角に配置され、前記第1の延伸部は、前記第1の本体部から前記N型半導体層の前記露出された部分に隣接するP型半導体層の側壁に沿って前記N型半導体層の前記露出された部分に延伸する構成であるP型電極と、
前記N型半導体層の前記露出された部分に配置されたN型電極と、
前記P型電極の下方の前記P型半導体層の一部、および前記P型電極の下方の前記N型半導体層の一部に配置された電流ブロック層、および
前記P型半導体層の部分の上面に配置され、その一部が前記電流ブロック層と前記P型電極の間に配置される透明導電層を含むことを特徴とする発光ダイオード。 - 前記側壁は傾斜面である請求項1に記載した発光ダイオード。
- 前記N型半導体層は、長方形の形状を有し、前記長方形の第1側は、前記長方形の第2側より長く、前記P型電極の前記第1の延伸部は、前記第1側の方向に沿って延伸する構成である請求項2に記載した発光ダイオード。
- 前記N型電極は、第2の本体部および第2の延伸部を含み、前記N型電極の第2の延伸部および前記P型電極の第1の延伸部は、互いに平行する構成する請求項3に記載した発光ダイオード。
- 前記P型半導体層の上面は、第1の領域、第2の領域、および第3の領域に区分され、前記第1の領域は、前記P型電極の第1の本体部に対応し、前記第2の領域は、前記P型電極の第1の延伸部および前記N型電極の第2の延伸部に対応し、前記第3の領域は、前記N型電極の第2の本体部に対応する請求項4に記載した発光ダイオード。
- 前記P型電極の第1の延伸部は、前記P型半導体層と重複する前記N型半導体層の領域上に配置されないことを特徴とする請求項1〜5に記載した発光ダイオード。
- 前記N型半導体層は、前記基板上に配置される基板を更に有することを特徴とする請求項6に記載した発光ダイオード。
- 前記P型半導体層、N型半導体層、および発光層は、ガリウム含有窒化物から選ばれることを特徴とする請求項7に記載した発光ダイオード。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102133587A TWI578565B (zh) | 2013-09-17 | 2013-09-17 | 發光二極體 |
TW102133587 | 2013-09-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015061072A true JP2015061072A (ja) | 2015-03-30 |
JP5813180B2 JP5813180B2 (ja) | 2015-11-17 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014127164A Active JP5813180B2 (ja) | 2013-09-17 | 2014-06-20 | 発光ダイオード |
Country Status (3)
Country | Link |
---|---|
US (1) | US9397263B2 (ja) |
JP (1) | JP5813180B2 (ja) |
TW (1) | TWI578565B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015074353A1 (zh) * | 2013-11-25 | 2015-05-28 | 扬州中科半导体照明有限公司 | 一种半导体发光二极管芯片 |
USD845920S1 (en) | 2015-08-12 | 2019-04-16 | Epistar Corporation | Portion of light-emitting diode unit |
TWI702738B (zh) * | 2017-01-24 | 2020-08-21 | 晶元光電股份有限公司 | 發光二極體元件 |
US12018672B2 (en) | 2020-04-02 | 2024-06-25 | Idex Health And Science Llc | Precision volumetric pump with a bellows hermetic seal |
Citations (6)
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---|---|---|---|---|
JPH10256602A (ja) * | 1997-03-12 | 1998-09-25 | Sharp Corp | 半導体発光素子 |
WO2002071450A2 (en) * | 2001-03-06 | 2002-09-12 | Emcore Corporation | Led lead for improved light extraction |
JP2006073618A (ja) * | 2004-08-31 | 2006-03-16 | Toyoda Gosei Co Ltd | 光学素子およびその製造方法 |
WO2007136392A1 (en) * | 2006-05-19 | 2007-11-29 | Bridgelux, Inc. | Low optical loss electrode structures for leds |
WO2010024375A1 (ja) * | 2008-08-29 | 2010-03-04 | 日亜化学工業株式会社 | 半導体発光素子及び半導体発光装置 |
JP2013008817A (ja) * | 2011-06-24 | 2013-01-10 | Toshiba Corp | 半導体発光素子及びその製造方法 |
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US6445007B1 (en) * | 2001-03-19 | 2002-09-03 | Uni Light Technology Inc. | Light emitting diodes with spreading and improving light emitting area |
US6650018B1 (en) * | 2002-05-24 | 2003-11-18 | Axt, Inc. | High power, high luminous flux light emitting diode and method of making same |
KR100665120B1 (ko) * | 2005-02-28 | 2007-01-09 | 삼성전기주식회사 | 수직구조 질화물 반도체 발광소자 |
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KR101457204B1 (ko) * | 2008-02-01 | 2014-11-03 | 서울바이오시스 주식회사 | 발광 다이오드 및 그 제조방법 |
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-
2013
- 2013-09-17 TW TW102133587A patent/TWI578565B/zh active
-
2014
- 2014-03-12 US US14/207,373 patent/US9397263B2/en active Active
- 2014-06-20 JP JP2014127164A patent/JP5813180B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10256602A (ja) * | 1997-03-12 | 1998-09-25 | Sharp Corp | 半導体発光素子 |
WO2002071450A2 (en) * | 2001-03-06 | 2002-09-12 | Emcore Corporation | Led lead for improved light extraction |
JP2006073618A (ja) * | 2004-08-31 | 2006-03-16 | Toyoda Gosei Co Ltd | 光学素子およびその製造方法 |
WO2007136392A1 (en) * | 2006-05-19 | 2007-11-29 | Bridgelux, Inc. | Low optical loss electrode structures for leds |
WO2010024375A1 (ja) * | 2008-08-29 | 2010-03-04 | 日亜化学工業株式会社 | 半導体発光素子及び半導体発光装置 |
JP2013008817A (ja) * | 2011-06-24 | 2013-01-10 | Toshiba Corp | 半導体発光素子及びその製造方法 |
Also Published As
Publication number | Publication date |
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JP5813180B2 (ja) | 2015-11-17 |
TWI578565B (zh) | 2017-04-11 |
US9397263B2 (en) | 2016-07-19 |
TW201513396A (zh) | 2015-04-01 |
US20150076445A1 (en) | 2015-03-19 |
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