JP2014511769A5 - - Google Patents

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Publication number: JP2014511769A5
Authority: JP; Japan
Prior art keywords: polishing; item; polishing system; optical element; layer
Prior art date: 2012-03-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP2014501190A

Other languages

English (en)

Japanese (ja)

Other versions

JP5968418B2 (ja

JP2014511769A (ja

Filing date

2012-03-20

Publication date

2015-05-07

2012-03-20 Application filed filed Critical

2012-03-20 Priority claimed from PCT/US2012/029837 external-priority patent/WO2012129244A1/en

2014-05-19 Publication of JP2014511769A publication Critical patent/JP2014511769A/ja

2015-05-07 Publication of JP2014511769A5 publication Critical patent/JP2014511769A5/ja

2016-08-10 Application granted granted Critical

2016-08-10 Publication of JP5968418B2 publication Critical patent/JP5968418B2/ja

Status Active legal-status Critical Current

2032-03-20 Anticipated expiration legal-status Critical

Links

238000005498 polishing Methods 0.000 claims description 67
230000003287 optical Effects 0.000 claims description 23
239000002002 slurry Substances 0.000 claims description 14
239000002904 solvent Substances 0.000 claims description 12
239000004094 surface-active agent Substances 0.000 claims description 10
238000005296 abrasive Methods 0.000 claims description 6
239000000463 material Substances 0.000 claims description 6
239000000654 additive Substances 0.000 claims description 5
230000000996 additive Effects 0.000 claims description 5
239000003945 anionic surfactant Substances 0.000 claims description 4
239000003093 cationic surfactant Substances 0.000 claims description 3
239000005350 fused silica glass Substances 0.000 claims description 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
230000001808 coupling Effects 0.000 description 3
238000010168 coupling process Methods 0.000 description 3
238000005859 coupling reaction Methods 0.000 description 3
239000000758 substrate Substances 0.000 description 3
229940063953 AMMONIUM LAURYL SULFATE Drugs 0.000 description 1
BTBJBAZGXNKLQC-UHFFFAOYSA-N Ammonium lauryl sulfate Chemical compound [NH4+].CCCCCCCCCCCCOS([O-])(=O)=O BTBJBAZGXNKLQC-UHFFFAOYSA-N 0.000 description 1
OFJATJUUUCAKMK-UHFFFAOYSA-N Cerium(IV) oxide Chemical compound [O-2]=[Ce+4]=[O-2] OFJATJUUUCAKMK-UHFFFAOYSA-N 0.000 description 1
229910000420 cerium oxide Inorganic materials 0.000 description 1
239000002738 chelating agent Substances 0.000 description 1
238000001035 drying Methods 0.000 description 1
238000005259 measurement Methods 0.000 description 1
239000007787 solid Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

JP2014501190A 2011-03-21 2012-03-20 コンバージェント研磨方法およびコンバージェント研磨システム Active JP5968418B2 (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US201161454893P	2011-03-21	2011-03-21
US61/454,893		2011-03-21
PCT/US2012/029837 WO2012129244A1 (en)	2011-03-21	2012-03-20	Method and system for convergent polishing

Related Child Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2016133727A Division JP6232172B2 (ja)	2011-03-21	2016-07-05	コンバージェント研磨方法およびコンバージェント研磨システム

Publications (3)

Publication Number	Publication Date
JP2014511769A JP2014511769A (ja)	2014-05-19
JP2014511769A5 true JP2014511769A5 (zh)	2015-05-07
JP5968418B2 JP5968418B2 (ja)	2016-08-10

Family

ID=46879717

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
JP2014501190A Active JP5968418B2 (ja)	2011-03-21	2012-03-20	コンバージェント研磨方法およびコンバージェント研磨システム
JP2016133727A Active JP6232172B2 (ja)	2011-03-21	2016-07-05	コンバージェント研磨方法およびコンバージェント研磨システム

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
JP2016133727A Active JP6232172B2 (ja)	2011-03-21	2016-07-05	コンバージェント研磨方法およびコンバージェント研磨システム

Country Status (6)

Country	Link
EP (2)	EP2688712B1 (zh)
JP (2)	JP5968418B2 (zh)
KR (1)	KR20140019392A (zh)
CN (1)	CN103534062A (zh)
RU (1)	RU2610991C2 (zh)
WO (1)	WO2012129244A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US10287457B2 (en)	2012-11-02	2019-05-14	Lawrence Livermore National Security, Llc	Polishing slurry preventing agglomeration of charged colloids without loss of surface activity
CN110977679A (zh) *	2019-12-20	2020-04-10	成都精密光学工程研究中心	一种全口径低缺陷平面工件的加工设备及方法
CN112405209A (zh) *	2020-11-11	2021-02-26	上饶市光耀光学设备制造有限公司	一种光学镜片加工用的精磨抛光装置

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2012
- 2012-03-20 CN CN201280014310.8A patent/CN103534062A/zh active Pending
- 2012-03-20 EP EP12760262.1A patent/EP2688712B1/en active Active
- 2012-03-20 WO PCT/US2012/029837 patent/WO2012129244A1/en active Application Filing
- 2012-03-20 JP JP2014501190A patent/JP5968418B2/ja active Active
- 2012-03-20 KR KR1020137027590A patent/KR20140019392A/ko not_active Application Discontinuation
- 2012-03-20 RU RU2013146696A patent/RU2610991C2/ru active
- 2012-03-20 EP EP16207175.7A patent/EP3187304B1/en active Active
2016
- 2016-07-05 JP JP2016133727A patent/JP6232172B2/ja active Active

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Cheng et al.	2009	Experimentation on MR fluid using a 2-axis wheel tool
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