JP2013209696A - 真空蒸着装置およびその蒸着源 - Google Patents
真空蒸着装置およびその蒸着源 Download PDFInfo
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- JP2013209696A JP2013209696A JP2012079799A JP2012079799A JP2013209696A JP 2013209696 A JP2013209696 A JP 2013209696A JP 2012079799 A JP2012079799 A JP 2012079799A JP 2012079799 A JP2012079799 A JP 2012079799A JP 2013209696 A JP2013209696 A JP 2013209696A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
【解決手段】真空蒸着装置では、基板上にマスクを介して所定パターンの蒸着膜が形成される。基板に対向して蒸発源が配置されている。蒸発源は坩堝と、この坩堝に収納した蒸発物質を基板へ導く複数の噴射ノズル33とを有している。噴射ノズルは一列上に配置される。噴射ノズル列の両側には、上拡散防止板31と下拡散防止板32とが配置されており、各噴射ノズル間には横拡散防止板34が配置されている。蒸発源は移動手段により上下方向に移動される。
【選択図】図1
Description
2 マスク
3 蒸着源
3a ヒータ
3b 坩堝
3c 蒸着物質
3d 放熱手段
3e ハウジング
4 移動手段
5 モータ
6 真空排気手段
7 基板保持手段
8 マスク保持手段
9 真空チャンバ
12 蒸着膜
13 斜面状の膜
31 上拡散防止板(第1の拡散防止板)
32 下拡散防止板(第1の拡散防止板)
33 噴射ノズル
34 横拡散防止板(第2の拡散防止板)
35 蒸発部
100 真空蒸着装置。
Claims (5)
- 基板上にマスクを介して所定パターンの蒸着膜を形成するために、蒸発源に収納した蒸発物質を加熱して蒸着させる真空蒸着装置において、
前記蒸発源は坩堝と、この坩堝に収納した蒸発物質を基板へ導く複数の噴射ノズルとを有し、この噴射ノズルは一列上に配置され、この噴射ノズル列の両側に配置された第1の拡散防止板と、各噴射ノズル間に配置された第2の拡散防止板と、前記蒸発源を移動させる移動手段とを設けたことを特徴とする真空蒸着装置。 - 前記噴射ノズル列は水平方向に延びており、前記移動装置は前記蒸発源を上下方向に移動させるものであることを特徴とする請求項1に記載の真空蒸着装置。
- 基板上にマスクを介して所定パターンの蒸着膜を形成する真空蒸着装置に用いるものであって蒸着物質を収納した蒸発源において、
坩堝と、この坩堝に収納した蒸発物質を基板へ導く複数の噴射ノズルとを有し、この噴射ノズルは一列上に配置され、この噴射ノズル列の両側に配置された第1の拡散防止板と、各噴射ノズル間に配置された第2の拡散防止板とを備えたことを特徴とする真空蒸着装置に用いる蒸発源。 - 前記ノズル列におけるノズル間のピッチは、中央部のピッチが広く両端側が狭いことを特徴とする請求項3に記載の真空蒸着装置に用いる蒸発源。
- 前記ノズル列におけるノズル間のピッチが等ピッチであることを特徴とする請求項3に記載の真空蒸着装置に用いる蒸発源。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012079799A JP2013209696A (ja) | 2012-03-30 | 2012-03-30 | 真空蒸着装置およびその蒸着源 |
KR1020120136354A KR20130113303A (ko) | 2012-03-30 | 2012-11-28 | 진공 증착 장치 및 그 증착원 |
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JP2012079799A JP2013209696A (ja) | 2012-03-30 | 2012-03-30 | 真空蒸着装置およびその蒸着源 |
Publications (2)
Publication Number | Publication Date |
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JP2013209696A true JP2013209696A (ja) | 2013-10-10 |
JP2013209696A6 JP2013209696A6 (ja) | 2013-12-12 |
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JP2012079799A Pending JP2013209696A (ja) | 2012-03-30 | 2012-03-30 | 真空蒸着装置およびその蒸着源 |
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JP (1) | JP2013209696A (ja) |
KR (1) | KR20130113303A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111108230A (zh) * | 2018-06-08 | 2020-05-05 | 株式会社爱发科 | 真空蒸镀装置用蒸镀源 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102182114B1 (ko) * | 2013-12-16 | 2020-11-24 | 삼성디스플레이 주식회사 | 증발장치 |
KR102381054B1 (ko) * | 2017-07-11 | 2022-03-31 | 엘지전자 주식회사 | 증착 장치 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010121214A (ja) * | 2004-11-26 | 2010-06-03 | Samsung Mobile Display Co Ltd | 蒸発源及びこれを備えた蒸着装置 |
US20100310759A1 (en) * | 2009-06-09 | 2010-12-09 | Samsung Mobile Display Co.,Ltd. | Method and apparatus for cleaning organic deposition materials |
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2012
- 2012-03-30 JP JP2012079799A patent/JP2013209696A/ja active Pending
- 2012-11-28 KR KR1020120136354A patent/KR20130113303A/ko not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010121214A (ja) * | 2004-11-26 | 2010-06-03 | Samsung Mobile Display Co Ltd | 蒸発源及びこれを備えた蒸着装置 |
US20100310759A1 (en) * | 2009-06-09 | 2010-12-09 | Samsung Mobile Display Co.,Ltd. | Method and apparatus for cleaning organic deposition materials |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111108230A (zh) * | 2018-06-08 | 2020-05-05 | 株式会社爱发科 | 真空蒸镀装置用蒸镀源 |
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KR20130113303A (ko) | 2013-10-15 |
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