JP2013197212A - Polishing composition - Google Patents
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- JP2013197212A JP2013197212A JP2012061155A JP2012061155A JP2013197212A JP 2013197212 A JP2013197212 A JP 2013197212A JP 2012061155 A JP2012061155 A JP 2012061155A JP 2012061155 A JP2012061155 A JP 2012061155A JP 2013197212 A JP2013197212 A JP 2013197212A
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- polishing composition
- abrasive grains
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- 238000005498 polishing Methods 0.000 title claims abstract description 178
- 239000000203 mixture Substances 0.000 title claims abstract description 85
- 239000006061 abrasive grain Substances 0.000 claims abstract description 54
- 239000000463 material Substances 0.000 claims abstract description 43
- 239000002210 silicon-based material Substances 0.000 claims abstract description 43
- 239000007800 oxidant agent Substances 0.000 claims abstract description 20
- 150000003839 salts Chemical class 0.000 claims abstract description 11
- 239000011164 primary particle Substances 0.000 claims abstract description 9
- 239000011163 secondary particle Substances 0.000 claims abstract description 7
- 150000003863 ammonium salts Chemical class 0.000 claims abstract description 5
- 239000002245 particle Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000001788 irregular Effects 0.000 abstract description 6
- 230000001590 oxidative effect Effects 0.000 abstract description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 15
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 13
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 229910052732 germanium Inorganic materials 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000003002 pH adjusting agent Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 3
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- CEJLBZWIKQJOAT-UHFFFAOYSA-N dichloroisocyanuric acid Chemical compound ClN1C(=O)NC(=O)N(Cl)C1=O CEJLBZWIKQJOAT-UHFFFAOYSA-N 0.000 description 2
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 2
- 239000010954 inorganic particle Substances 0.000 description 2
- 239000011146 organic particle Substances 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GLVYLTSKTCWWJR-UHFFFAOYSA-N 2-carbonoperoxoylbenzoic acid Chemical compound OOC(=O)C1=CC=CC=C1C(O)=O GLVYLTSKTCWWJR-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- YNJSNEKCXVFDKW-UHFFFAOYSA-N 3-(5-amino-1h-indol-3-yl)-2-azaniumylpropanoate Chemical compound C1=C(N)C=C2C(CC(N)C(O)=O)=CNC2=C1 YNJSNEKCXVFDKW-UHFFFAOYSA-N 0.000 description 1
- 238000004438 BET method Methods 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical class [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 241000135309 Processus Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XYDQMRVDDPZFMM-UHFFFAOYSA-N [Ag+2] Chemical class [Ag+2] XYDQMRVDDPZFMM-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- ZJRXSAYFZMGQFP-UHFFFAOYSA-N barium peroxide Chemical compound [Ba+2].[O-][O-] ZJRXSAYFZMGQFP-UHFFFAOYSA-N 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 1
- 229940077239 chlorous acid Drugs 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- QFWPJPIVLCBXFJ-UHFFFAOYSA-N glymidine Chemical compound N1=CC(OCCOC)=CN=C1NS(=O)(=O)C1=CC=CC=C1 QFWPJPIVLCBXFJ-UHFFFAOYSA-N 0.000 description 1
- RKKOMEIYHHASIN-UHFFFAOYSA-N hydroperoxyboronic acid Chemical compound OOB(O)O RKKOMEIYHHASIN-UHFFFAOYSA-N 0.000 description 1
- GEOVEUCEIQCBKH-UHFFFAOYSA-N hypoiodous acid Chemical compound IO GEOVEUCEIQCBKH-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002356 laser light scattering Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-N peroxydisulfuric acid Chemical compound OS(=O)(=O)OOS(O)(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-N 0.000 description 1
- 150000004968 peroxymonosulfuric acids Chemical class 0.000 description 1
- MPNNOLHYOHFJKL-UHFFFAOYSA-N peroxyphosphoric acid Chemical compound OOP(O)(O)=O MPNNOLHYOHFJKL-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- -1 silica Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- PFUVRDFDKPNGAV-UHFFFAOYSA-N sodium peroxide Chemical compound [Na+].[Na+].[O-][O-] PFUVRDFDKPNGAV-UHFFFAOYSA-N 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
本発明は、ＩＶ族化合物材料を含有する部分（以下、ＩＶ族材料部分ともいう）と酸化シリコンなどのケイ素材料を含有する部分（以下、ケイ素材料部分ともいう）とを有する研磨対象物を研磨する用途で使用される研磨用組成物に関する。本発明はまた、その研磨用組成物を用いた研磨方法及び基板の製造方法に関する。 The present invention polishes a polishing object having a portion containing a group IV compound material (hereinafter also referred to as a group IV material portion) and a portion containing a silicon material such as silicon oxide (hereinafter also referred to as a silicon material portion). The present invention relates to a polishing composition that is used in a use. The present invention also relates to a polishing method and a substrate manufacturing method using the polishing composition.
シリコンよりもキャリアの輸送特性に優れるシリコンゲルマニウム（ＳｉＧｅ）やＧｅなどのＩＶ族材料部分は、次世代の半導体用高移動度チャンネル材料として期待をされている。
ＩＶ族材料部分を使用するチャネルは、ケイ素材料部分とを有する研磨対象物を研磨して形成することができる。この場合、ＩＶ族材料部分とケイ素材料部分を非選択的に研磨除去することができる研磨用組成物を用いれば、ＩＶ族材料部分とケイ素材料部分を同時に研磨することが可能である。また、ＩＶ族材料部分とケイ素材料部分を非選択的に研磨することによって、ＩＶ族材料部分とケイ素材料部分との間に段差を生じさせることなく、所望とするパターン形状を良好に仕上げることができる。しかしながら、ＩＶ族化合物半導体基板を研磨する用途で従来使用されている例えば特許文献１、又は特許文献２に記載のような研磨用組成物は、ＩＶ族材料部分とケイ素部分を効率的に、且つ非選択的に研磨除去する能力に劣るために、ＩＶ族材料部分とケイ素材料部分を同時に研磨する目的での使用には不向きである。
Group IV material parts such as silicon germanium (SiGe) and Ge, which have better carrier transport properties than silicon, are expected as next-generation high mobility channel materials for semiconductors.
A channel using a group IV material portion can be formed by polishing a polishing object having a silicon material portion. In this case, if a polishing composition capable of non-selectively polishing and removing the group IV material portion and the silicon material portion is used, the group IV material portion and the silicon material portion can be polished simultaneously. Further, by non-selectively polishing the group IV material portion and the silicon material portion, a desired pattern shape can be satisfactorily finished without causing a step between the group IV material portion and the silicon material portion. it can. However, the polishing composition conventionally used for polishing a group IV compound semiconductor substrate, for example, as described in Patent Document 1 or Patent Document 2, can efficiently separate a Group IV material portion and a silicon portion, and Since it is inferior in the ability to polish and remove non-selectively, it is unsuitable for use for the purpose of simultaneously polishing the group IV material portion and the silicon material portion.
そこで本発明の目的は、ＩＶ族材料部分とケイ素材料部分を同時に研磨する目的での使用に適した研磨用組成物を提供すること、またその研磨用組成物を用いた研磨方法及び基板の製造方法を提供することにある。 Accordingly, an object of the present invention is to provide a polishing composition suitable for use for the purpose of simultaneously polishing a group IV material portion and a silicon material portion, and a polishing method and substrate production using the polishing composition. It is to provide a method.
上記の目的を達成するために、本発明の第１の態様では、ＩＶ族材料部分とケイ素材料部分とを有する研磨対象物を研磨する用途で使用される研磨用組成物であって、異形の砥粒と、標準電極が０．３Ｖ以上である酸化剤とを含有し、ｐＨが１以上６以下又は８以上１４以下である研磨用組成物を提供する。
前記砥粒の平均二次粒子径の値を前記砥粒の平均一次粒子径の値で除することにより得られる前記砥粒の平均会合度は１．６以上であることが好ましい。
前記砥粒は複数の突起を表面に有するいわゆる金平糖形の粒子であってもよい。その場合、この粒子のうち同粒子の体積平均粒子径よりも粒子径の大きな粒子が表面に有している突起の高さをそれぞれ同じ突起の基部における幅で除することにより得られる値の平均は０．２４５以上であることが好ましい。
前記複数の突起を表面に有する粒子のうち同粒子の体積平均粒子径よりも粒子径の大きな粒子が表面に有している突起の平均高さは２．５ｎｍ以上であることが好ましい。
上記第１の態様の研磨用組成物は塩をさらに含有してもよい。その場合、前記塩はアンモニウム塩であることが好ましい。
In order to achieve the above object, according to a first aspect of the present invention, there is provided a polishing composition for use in polishing a polishing object having a group IV material portion and a silicon material portion, A polishing composition containing abrasive grains and an oxidizing agent having a standard electrode of 0.3 V or more and having a pH of 1 to 6 or 8 to 14 is provided.
The average degree of association of the abrasive grains obtained by dividing the value of the average secondary particle diameter of the abrasive grains by the value of the average primary particle diameter of the abrasive grains is preferably 1.6 or more.
The abrasive grains may be so-called confetti-shaped particles having a plurality of protrusions on the surface. In that case, the average of the values obtained by dividing the height of the protrusions on the surface of the particles having a particle diameter larger than the volume average particle diameter of the particles by the width at the base of the same protrusion. Is preferably 0.245 or more.
Of the particles having a plurality of protrusions on the surface, the average height of protrusions on the surface of particles having a particle diameter larger than the volume average particle diameter of the particles is preferably 2.5 nm or more.
The polishing composition of the first aspect may further contain a salt. In that case, the salt is preferably an ammonium salt.
本発明の第２の態様では、上記第１の態様の研磨用組成物を用いて、ＩＶ族材料部分とケイ素材料部分とを有する研磨対象物を研磨する方法を提供する。
本発明の第３の態様では、上記第１の態様の研磨用組成物を用いて、ＩＶ族材料部分とケイ素材料部分とを有する研磨対象物を研磨することにより、基板を製造する方法を提供する。
According to a second aspect of the present invention, there is provided a method for polishing a polishing object having a group IV material portion and a silicon material portion using the polishing composition of the first aspect.
In the third aspect of the present invention, there is provided a method for producing a substrate by polishing a polishing object having a group IV material part and a silicon material part using the polishing composition of the first aspect. To do.
本発明によれば、ＩＶ族材料部分とケイ素材料部分を同時に研磨する目的での使用に適した研磨用組成物と、その研磨用組成物を用いた研磨方法及び基板の製造方法とが提供される。 According to the present invention, a polishing composition suitable for use for the purpose of simultaneously polishing a group IV material portion and a silicon material portion, a polishing method using the polishing composition, and a method for manufacturing a substrate are provided. The
以下、本発明の一実施形態を説明する。
本実施形態の研磨用組成物は、特定の砥粒と特定の酸化剤を水に混合して調製され、必要に応じてｐＨ調整剤を添加することによりｐＨが１以上６以下又は８以上１４以下の範囲に調整されている。従って、研磨用組成物は、特定の砥粒及び特定の酸化剤を含有し、必要に応じてさらにｐＨ調整剤を含有している。
Hereinafter, an embodiment of the present invention will be described.
The polishing composition of this embodiment is prepared by mixing specific abrasive grains and a specific oxidizing agent in water, and the pH is adjusted to 1 to 6 or 8 to 14 by adding a pH adjuster as necessary. The following range has been adjusted. Therefore, the polishing composition contains specific abrasive grains and a specific oxidizing agent, and further contains a pH adjuster as necessary.
この研磨用組成物は、ＩＶ族材料部分とケイ素材料部分とを有する研磨対象物を研磨する用途、さらに言えばその研磨対象物を研磨して基板を製造する用途においてＩＶ族材料部分とケイ素材料部分を同時に研磨する目的で使用される。ＩＶ族材料部分の例としては、ＳｉＧｅ、ＳｉＣなどがあげられる。また、ケイ素材料の例としては、ポリシリコン、酸化シリコン、窒化シリコン等が挙げられる。 This polishing composition is used for polishing a polishing object having a group IV material portion and a silicon material portion, and more specifically, in a use for polishing a polishing object to manufacture a substrate, and a group IV material portion and a silicon material. Used for the purpose of polishing parts simultaneously. Examples of the group IV material portion include SiGe and SiC. Examples of the silicon material include polysilicon, silicon oxide, silicon nitride, and the like.
（砥粒）
研磨用組成物中に含まれる砥粒は、異形すなわち非球形の外形を有している。異形の砥粒を使用した場合、非異形すなわち球形の外形を有する砥粒を使用した場合に比べて、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にケイ素材料部分の研磨速度が向上するという有利がある。異形の砥粒の典型例としては、中央部にくびれを有するいわゆる繭形の粒子や、複数の突起を表面に有するいわゆる金平糖形の粒子がある。
(Abrasive grains)
The abrasive grains contained in the polishing composition have an irregular or non-spherical outer shape. When using the irregular shaped abrasive grains, the polishing rate of the group IV material portion and the silicon material portion by the polishing composition, particularly the polishing of the silicon material portion, compared with the case of using the non-deformed or spherical outer shape abrasive grains. There is an advantage that the speed is improved. Typical examples of irregularly shaped abrasive grains include so-called bowl-shaped particles having a constriction at the center and so-called confetti-shaped particles having a plurality of protrusions on the surface.
研磨用組成物中の砥粒が複数の突起を表面に有する粒子を含む場合、その粒子が表面に有する突起の数は、粒子１つあたり平均で３つ以上であることが好ましく、より好ましくは５つ以上である。 When the abrasive grains in the polishing composition contain particles having a plurality of protrusions on the surface, the number of protrusions that the particles have on the surface is preferably 3 or more on an average, more preferably 5 or more.
ここでいう突起とは、砥粒の粒子径に比べて十分に小さい高さ及び幅を有するものである。さらに言えば、図１において点Ａ及び点Ｂを通る曲線ＡＢとして示されている部分の長さが、砥粒粒子の最大内接円の円周長さ、より正確には、砥粒粒子の外形を投影した輪郭に内接する最大の円の円周長さの４分の１を超えないような突起である。なお、突起の幅とは、突起の基部における幅のことをいい、図１においては点Ａと点Ｂの間の距離として表されるものである。また、突起の高さとは、突起の基部と、その基部から最も離れた突起の部位との間の距離のことをいい、図１においては直線ＡＢと直交する線分ＣＤの長さとして表されるものである。 The protrusions herein have a height and width that are sufficiently smaller than the particle diameter of the abrasive grains. Furthermore, in FIG. 1, the length of the portion shown as the curve AB passing through the points A and B is the circumferential length of the largest inscribed circle of the abrasive grains, more precisely, the abrasive grains. The projections do not exceed a quarter of the circumference of the largest circle inscribed in the contour projected from the contour. Note that the width of the protrusion refers to the width at the base of the protrusion, and is represented as the distance between the point A and the point B in FIG. Further, the height of the protrusion refers to the distance between the base of the protrusion and the portion of the protrusion farthest from the base, and is represented as the length of the line segment CD orthogonal to the straight line AB in FIG. Is.
研磨用組成物中の砥粒が複数の突起を表面に有する粒子を含む場合、その粒子のうち同粒子の体積平均粒子径よりも粒子径の大きな粒子が表面に有している突起の高さをそれぞれ同じ突起の基部における幅で除することにより得られる値の平均は０．２４５以上であることが好ましく、より好ましくは０．２５５以上である。この値の平均が大きくなるにつれて、突起の形状が比較的鋭いことが理由で、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にケイ素材料部分の研磨速度が向上する。なお、砥粒粒子の各突起の高さ及びその基部における幅は、一般的な画像解析ソフトウエアを用いて、走査型電子顕微鏡による砥粒粒子の画像を解析することにより求めることができる。 When the abrasive grains in the polishing composition contain particles having a plurality of protrusions on the surface, the height of the protrusions on the surface of the particles having a particle diameter larger than the volume average particle diameter of the particles Is preferably 0.245 or more, and more preferably 0.255 or more. As the average of this value increases, the polishing rate of the group IV material portion and the silicon material portion by the polishing composition, particularly the polishing rate of the silicon material portion, improves because the shape of the protrusion is relatively sharp. The height of each projection of the abrasive grain and the width at the base thereof can be obtained by analyzing the image of the abrasive grain with a scanning electron microscope using general image analysis software.
研磨用組成物中の砥粒が複数の突起を表面に有する粒子を含む場合、その粒子のうち同粒子の体積平均粒子径よりも粒子径の大きな粒子が表面に有している突起の平均高さは、２．５ｎｍ以上であることが好ましく、より好ましくは２．７ｎｍ以上、さらに好ましくは３．０ｎｍ以上である。この突起の平均高さが大きくなるにつれて、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にケイ素材料部分の研磨速度が向上する。 When the abrasive grains in the polishing composition contain particles having a plurality of protrusions on the surface, the average height of protrusions on the surface of the particles having a particle diameter larger than the volume average particle diameter of the same particles. The thickness is preferably 2.5 nm or more, more preferably 2.7 nm or more, and further preferably 3.0 nm or more. As the average height of the protrusions increases, the polishing rate of the group IV material portion and the silicon material portion by the polishing composition, in particular, the polishing rate of the silicon material portion increases.
研磨用組成物中の砥粒は、無機粒子及び有機粒子のいずれであってもよい。無機粒子の具体例としては、シリカ、アルミナ、セリア、チタニアなどの金属酸化物からなる粒子が挙げられる。有機粒子の具体例としては、ポリメタクリル酸メチル（ＰＭＭＡ）粒子が挙げられる。その中でもシリカ粒子が好ましく、特に好ましいのはコロイダルシリカである。 The abrasive grains in the polishing composition may be either inorganic particles or organic particles. Specific examples of the inorganic particles include particles made of a metal oxide such as silica, alumina, ceria, titania and the like. Specific examples of the organic particles include polymethyl methacrylate (PMMA) particles. Among these, silica particles are preferable, and colloidal silica is particularly preferable.
研磨用組成物中の砥粒の含有量は０．１質量％以上であることが好ましく、より好ましくは０．５質量％以上、さらに好ましくは１質量％以上である。砥粒の含有量が多くなるにつれて、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にケイ素材料部分の研磨速度が向上する。 The content of abrasive grains in the polishing composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and further preferably 1% by mass or more. As the content of the abrasive grains increases, the polishing rate of the group IV material part and the silicon material part by the polishing composition, particularly, the polishing rate of the silicon material part is improved.
研磨用組成物中の砥粒の含有量はまた、３０質量％以下であることが好ましく、より好ましくは２５質量％以下、さらに好ましくは２０質量％以下である。砥粒の含有量が少なくなるにつれて、研磨用組成物の材料コストを抑えることができるのに加え、砥粒の凝集が起こりにくくなる。 The content of abrasive grains in the polishing composition is also preferably 30% by mass or less, more preferably 25% by mass or less, and further preferably 20% by mass or less. As the content of the abrasive grains decreases, the material cost of the polishing composition can be suppressed, and the aggregation of the abrasive grains is less likely to occur.
砥粒の平均一次粒子径は５ｎｍ以上であることが好ましく、より好ましくは７ｎｍ以上、さらに好ましくは１０ｎｍ以上である。砥粒の平均一次粒子径が大きくなるにつれて、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にケイ素材料部分の研磨速度が向上する。なお、砥粒の平均一次粒子径の値は、例えば、ＢＥＴ法で測定される砥粒の比表面積に基づいて計算することができる。 The average primary particle diameter of the abrasive grains is preferably 5 nm or more, more preferably 7 nm or more, and further preferably 10 nm or more. As the average primary particle diameter of the abrasive grains increases, the polishing rate of the group IV material portion and the silicon material portion by the polishing composition, particularly the polishing rate of the silicon material portion, improves. In addition, the value of the average primary particle diameter of an abrasive grain can be calculated based on the specific surface area of the abrasive grain measured by BET method, for example.
砥粒の平均一次粒子径はまた、１５０ｎｍ以下であることが好ましく、より好ましくは１１０ｎｍ以下、さらに好ましくは１００ｎｍ以下である。砥粒の平均一次粒子径が小さくなるにつれて、研磨用組成物を用いて研磨対象物を研磨することによりスクラッチのより少ない研磨面を得ることが容易になる。 The average primary particle diameter of the abrasive grains is also preferably 150 nm or less, more preferably 110 nm or less, and still more preferably 100 nm or less. As the average primary particle diameter of the abrasive grains decreases, it becomes easier to obtain a polished surface with less scratches by polishing the object to be polished using the polishing composition.
砥粒の平均二次粒子径は３００ｎｍ以下であることが好ましく、より好ましくは２７０ｎｍ以下、さらに好ましくは２５０ｎｍ以下である。砥粒の平均二次粒子径が小さくなるにつれて、研磨用組成物を用いて研磨対象物を研磨することによりスクラッチのより少ない研磨面を得ることが容易になる。砥粒の平均二次粒子径の値は、例えば、レーザー光散乱法により測定することができる。 The average secondary particle diameter of the abrasive grains is preferably 300 nm or less, more preferably 270 nm or less, and further preferably 250 nm or less. As the average secondary particle diameter of the abrasive grains decreases, it becomes easier to obtain a polished surface with less scratches by polishing the object to be polished using the polishing composition. The value of the average secondary particle diameter of the abrasive grains can be measured by, for example, a laser light scattering method.
砥粒の平均二次粒子径の値を平均一次粒子径の値で除することにより得られる砥粒の平均会合度は１．６以上であることが好ましく、より好ましくは１．７以上である。平均会合度が高い砥粒は、繭形又はその他の異形の形状を有している。砥粒の平均会合度が高くなるにつれて、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にケイ素材料部分の研磨速度が向上する。 The average degree of association of the abrasive grains obtained by dividing the value of the average secondary particle diameter of the abrasive grains by the value of the average primary particle diameter is preferably 1.6 or more, more preferably 1.7 or more. . The abrasive grains having a high average degree of association have a bowl shape or other irregular shape. As the average degree of association of the abrasive grains increases, the polishing rate of the group IV material portion and the silicon material portion by the polishing composition, in particular, the polishing rate of the silicon material portion increases.
砥粒の平均会合度はまた、５以下であることが好ましく、より好ましくは４．５以下、さらに好ましくは４以下である。砥粒の平均会合度が小さくなるにつれて、研磨用組成物を用いて研磨対象物を研磨することによりスクラッチのより少ない研磨面を得ることが容易になる。 The average degree of association of the abrasive grains is also preferably 5 or less, more preferably 4.5 or less, and still more preferably 4 or less. As the average degree of association of the abrasive grains decreases, it becomes easier to obtain a polished surface with less scratches by polishing the object to be polished using the polishing composition.
（酸化剤）
研磨用組成物中に含まれる酸化剤は、０．３Ｖ以上の標準電極電位を有している。０．３Ｖ以上の標準電極電位を有する酸化剤を使用した場合には、０．３Ｖ未満の標準電極電位を有する酸化剤を使用した場合に比べて、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にＩＶ族材料部分の研磨速度が向上するという有利がある。０．３Ｖ以上の標準電極電位を有する酸化剤の具体例としては、過酸化水素、過酸化ナトリウム、過酸化バリウム、有機酸化剤、オゾン水、銀（ Ｉ Ｉ ） 塩、鉄（ Ｉ Ｉ Ｉ ） 塩、過マンガン酸、クロム酸、重クロム酸、ペルオキソ二硫酸、ペルオキソリン酸、ペルオキソ硫酸、ペルオキソホウ酸、過ギ酸、過酢酸、過安息香酸、過フタル酸、次亜塩素酸、次亜臭素酸、次亜ヨウ素酸、塩素酸、亜塩素酸、過塩素酸、臭素酸、ヨウ素酸、過ヨウ素酸、硫酸、過硫酸、クエン酸、ジクロロイソシアヌル酸及びそれらの塩等が挙げられる。これらの中でも、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にＩＶ族化合物材料の研磨速度が大きく向上することから、過酸化水素、過硫酸アンモニウム、過ヨウ素酸、次亜塩素酸、及びジクロロイソシアヌル酸ナトリウムが好ましい。
(Oxidant)
The oxidizing agent contained in the polishing composition has a standard electrode potential of 0.3 V or higher. When an oxidizing agent having a standard electrode potential of 0.3 V or higher is used, the group IV material portion and silicon by the polishing composition are compared with the case of using an oxidizing agent having a standard electrode potential of less than 0.3 V. There is an advantage that the polishing rate of the material portion, particularly the polishing rate of the group IV material portion is improved. Specific examples of the oxidizing agent having a standard electrode potential of 0.3 V or more include hydrogen peroxide, sodium peroxide, barium peroxide, organic oxidizing agent, ozone water, silver (I I) salt, iron (I I I) Salt, permanganic acid, chromic acid, dichromic acid, peroxodisulfuric acid, peroxophosphoric acid, peroxosulfuric acid, peroxoboric acid, performic acid, peracetic acid, perbenzoic acid, perphthalic acid, hypochlorous acid, hypobromine Examples include acids, hypoiodous acid, chloric acid, chlorous acid, perchloric acid, bromic acid, iodic acid, periodic acid, sulfuric acid, persulfuric acid, citric acid, dichloroisocyanuric acid, and salts thereof. Among these, since the polishing rate of the group IV material part and the silicon material part by the polishing composition, particularly the polishing rate of the group IV compound material is greatly improved, hydrogen peroxide, ammonium persulfate, periodic acid, hypochlorous acid Acid and sodium dichloroisocyanurate are preferred.
なお、標準電極電位とは、酸化反応に関与するすべての化学種が標準状態にあるときに次式で表される。
Ｅ０＝−△Ｇ０／ｎＦ＝（ＲＴ／ｎＦ）ｌｎＫ
The standard electrode potential is expressed by the following formula when all chemical species involved in the oxidation reaction are in the standard state.
E0 = −ΔG0 / nF = (RT / nF) lnK
ここで、Ｅ０は標準電極電位、△Ｇ０は酸化反応の標準ギブスエネルギー変化、Ｋはその平行定数、Ｆはファラデー定数、Ｔは絶対温度、ｎは酸化反応に関与する電子数である。従って、標準電極電位は温度により変動するので、本明細書中においては２５℃における標準電極電位を採用している。なお、水溶液系の標準電極電位は、例えば改訂４版化学便覧（基礎編）ＩＩ、ｐｐ４６４−４６８（日本化学会編）等に記載されている。 Here, E0 is the standard electrode potential, ΔG0 is the standard Gibbs energy change of the oxidation reaction, K is its parallel constant, F is the Faraday constant, T is the absolute temperature, and n is the number of electrons involved in the oxidation reaction. Accordingly, since the standard electrode potential varies depending on the temperature, the standard electrode potential at 25 ° C. is adopted in this specification. The standard electrode potential of the aqueous solution system is described in, for example, the revised 4th edition Chemical Handbook (Basic Edition) II, pp 464-468 (Edited by Chemical Society of Japan).
研磨用組成物中の酸化剤の含有量は０．０１ｍｏｌ／Ｌ以上であることが好ましく、より好ましくは０．１ｍｏｌ／Ｌ以上である。酸化剤の含有量が多くなるにつれて、研磨用組成物によるＩＶ族材料部分の研磨速度が向上する。 The content of the oxidizing agent in the polishing composition is preferably 0.01 mol / L or more, more preferably 0.1 mol / L or more. As the content of the oxidizing agent increases, the polishing rate of the group IV material portion by the polishing composition is improved.
研磨用組成物中の酸化剤の含有量はまた、１００ｍｏｌ／Ｌ以下であることが好ましく、より好ましくは５０ｍｏｌ／Ｌ以下である。酸化剤の含有量が少なくなるにつれて、研磨用組成物の材料コストを抑えることができるのに加え、研磨使用後の研磨用組成物の処理、すなわち廃液処理の負荷を軽減することができる。 The content of the oxidizing agent in the polishing composition is also preferably 100 mol / L or less, more preferably 50 mol / L or less. As the content of the oxidizing agent decreases, the material cost of the polishing composition can be reduced, and the load on the processing of the polishing composition after polishing, that is, the waste liquid treatment can be reduced.
（ｐＨ調整剤）
研磨用組成物のｐＨの値は１以上６以下又は８以上１４以下の範囲内である必要がある。ｐＨが７前後である場合には、研磨用組成物によるケイ素材料部分の研磨速度が大きく低下するという不利がある。
(PH adjuster)
The pH value of the polishing composition needs to be in the range of 1 to 6 or 8 to 14. When the pH is around 7, there is a disadvantage that the polishing rate of the silicon material portion by the polishing composition is greatly reduced.
研磨用組成物のｐＨの値を１以上６以下又は８以上１４以下の範囲に調整するために必要に応じて使用されるｐＨ調整剤は酸及びアルカリのいずれであってもよく、また無機及び有機の化合物のいずれであってもよい。 The pH adjuster used as necessary to adjust the pH value of the polishing composition to a range of 1 to 6 or 8 to 14 may be either acid or alkali, and inorganic and Any of organic compounds may be used.
本実施形態によれば以下の作用効果が得られる。
本実施形態の研磨用組成物では、研磨用組成物によるＩＶ族材料部分及びケイ素材料部分の研磨速度、特にケイ素材料部分の研磨速度を向上させるために、異形の砥粒が使用されている。また、研磨用組成物によるＩＶ族材料部分の研磨速度を向上させるために、標準電極電位が０．３Ｖ以上である酸化剤も使用されている。さらには、研磨用組成物のｐＨの値を１以上６以下又は８以上１４以下の範囲内に調整することにより、研磨用組成物によるケイ素材料部分の研磨速度を高く保つようにしている。そのため、この研磨用組成物を用いた場合には、ＩＶ族材料部分とケイ素材料部分の両方を高い研磨速度で研磨することができる。従って、本実施形態の研磨用組成物は、ＩＶ族材料部分とケイ素材料部分を同時に研磨する目的での使用に適する。
According to this embodiment, the following effects can be obtained.
In the polishing composition of the present embodiment, irregular shaped grains are used in order to improve the polishing rate of the group IV material part and the silicon material part by the polishing composition, particularly the polishing rate of the silicon material part. Further, an oxidizing agent having a standard electrode potential of 0.3 V or more is also used in order to improve the polishing rate of the group IV material portion by the polishing composition. Further, the polishing rate of the silicon material portion by the polishing composition is kept high by adjusting the pH value of the polishing composition within the range of 1 to 6 or 8 to 14. Therefore, when this polishing composition is used, both the group IV material part and the silicon material part can be polished at a high polishing rate. Therefore, the polishing composition of this embodiment is suitable for use for the purpose of simultaneously polishing the group IV material portion and the silicon material portion.
前記実施形態は次のように変更されてもよい。
・ 前記実施形態の研磨用組成物は、二種類以上の砥粒を含有してもよい。この場合、一部の砥粒については必ずしも異形である必要はない。
・ 前記実施形態の研磨用組成物は、二種類以上の酸化剤を含有してもよい。この場合、一部の酸化剤については必ずしも０．３Ｖ以上の標準電極電位を有している必要はない。
・ 前記実施形態の研磨用組成物は、塩をさらに含有してもよい。塩は、砥粒の表面の電荷二重層を小さくする働きを有し、その結果、砥粒とケイ素材料部分の間の電気的反発を小さくする。そのため、研磨用組成物中に塩が含まれることにより、研磨用組成物によるケイ素材料部分の研磨速度は向上する。使用する塩の種類は特に限定されないが、硫酸アンモニウムなどのアンモニウム塩であることが好ましい。アンモニウム塩を使用した場合には、研磨用組成物中への金属不純物の混入を避けることができる。
・ 前記実施形態の研磨用組成物は、防腐剤のような公知の添加剤を必要に応じてさらに含有してもよい。
・ 前記実施形態の研磨用組成物は一液型であってもよいし、二液型をはじめとする多液型であってもよい。
・ 前記実施形態の研磨用組成物は、研磨用組成物の原液を水で希釈することにより調製されてもよい。
The embodiment may be modified as follows.
-The polishing composition of the said embodiment may contain a 2 or more types of abrasive grain. In this case, some abrasive grains are not necessarily irregular.
-The polishing composition of the said embodiment may contain a 2 or more types of oxidizing agent. In this case, some oxidizing agents do not necessarily have a standard electrode potential of 0.3 V or higher.
-The polishing composition of the said embodiment may further contain a salt. The salt serves to reduce the charge double layer on the surface of the abrasive grain, thereby reducing the electrical repulsion between the abrasive grain and the silicon material portion. Therefore, when the salt is contained in the polishing composition, the polishing rate of the silicon material portion by the polishing composition is improved. Although the kind of salt to be used is not particularly limited, an ammonium salt such as ammonium sulfate is preferable. When an ammonium salt is used, contamination of metal impurities into the polishing composition can be avoided.
-Polishing composition of the said embodiment may further contain well-known additives like a preservative as needed.
The polishing composition of the above embodiment may be a one-component type or a multi-component type including a two-component type.
-The polishing composition of the said embodiment may be prepared by diluting the undiluted | stock solution of polishing composition with water.
次に、本発明の実施例及び比較例を説明する。
コロイダルシリカ及び酸化剤を、必要に応じて塩及びｐＨ調整剤とともに水と混合することにより、実施例１〜１３及び比較例１〜８の研磨用組成物を調製した。また、酸化剤を水と混合して比較例９及び１０の研磨用組成物を調製した。各研磨用組成物中の成分の詳細、及び各研磨用組成物のｐＨを測定した結果を表１に示す。
Next, examples and comparative examples of the present invention will be described.
The polishing composition of Examples 1-13 and Comparative Examples 1-8 was prepared by mixing colloidal silica and an oxidizing agent with water with a salt and a pH adjuster as needed. In addition, polishing compositions of Comparative Examples 9 and 10 were prepared by mixing an oxidizing agent with water. The details of the components in each polishing composition and the results of measuring the pH of each polishing composition are shown in Table 1.
表１中、“Ｈ２Ｏ２”は過酸化水素を表し、“ＡＰＳ”は過硫酸アンモニウムを表す。ｐＨ調整はＫＯＨまたは酢酸で実施した。 In Table 1, “H 2 O 2 ” represents hydrogen peroxide, and “APS” represents ammonium persulfate. The pH adjustment was performed with KOH or acetic acid.
実施例１〜１３及び比較例１〜１０の各研磨用組成物を用いて、シリコンゲルマニウムブランケットウェーハ、ゲルマニウムブランケットウェーハ及びオルトケイ酸テトラエチル（ＴＥＯＳ）ブランケットウェーハの表面を、表２に記載の条件で研磨したときに求められる研磨速度の値を表３の“ＳｉＧｅの研磨速度”欄、“Ｇｅの研磨速度”欄及び“ＴＥＯＳの研磨速度”欄に示す。研磨速度の値は、ＴＥＯＳブランケットウェーハについては光干渉式膜厚測定装置を用いて測定される研磨前後のウェーハの厚みの差を研磨時間で除することにより求め、シリコンゲルマニウムブランケットウェーハにおよびゲルマニウムウェーハついては、研磨前後のウェーハの重量の差を密度と研磨時間で除することによって求めた。また、こうして求めた実施例１〜１３及び比較例１〜１０の各研磨用組成物によるシリコンゲルマニウムの研磨速度を同じ研磨用組成物によるＴＥＯＳの研磨速度で除して得られる値を表３の“ＳｉＧｅの研磨速度／ＴＥＯＳの研磨速度”欄に、ゲルマニウムの研磨速度を同じ研磨用組成物によるＴＥＯＳの研磨速度で除して得られる値を表３の“Ｇｅの研磨速度／ＴＥＯＳの研磨速度”欄に、示す。シリコンゲルマニウムの研磨速度の値は、３００Å／ｍｉｎ以上の場合に合格レベルであるが、より好ましくは５００Å／ｍｉｎ以上、さらに好ましくは７００Å／ｍｉｎ以上である。ゲルマニウムの研磨速度の値は、６００Å／ｍｉｎ以上の場合に合格レベルであるが、より好ましくは１０００Å／ｍｉｎ以上、さらに好ましくは１４００Å／ｍｉｎ以上である。ＴＥＯＳの研磨速度の値は、１００Å／ｍｉｎ以上の場合に合格レベルであるが、より好ましくは２００Å／ｍｉｎ以上、さらに好ましくは３００Å／ｍｉｎ以上である。シリコンゲルマニウムの研磨速度をＴＥＯＳの研磨速度で除した値は、３０以下の場合に合格レベルであるが、より好ましくは２０以下、さらに好ましくは１０以下である。シリコンゲルマニウムの研磨速度をＴＥＯＳの研磨速度で除した値は、６０以下の場合に合格レベルであるが、より好ましくは４０以下、さらに好ましくは２０以下である。 Using the polishing compositions of Examples 1 to 13 and Comparative Examples 1 to 10, the surfaces of a silicon germanium blanket wafer, a germanium blanket wafer, and a tetraethyl orthosilicate (TEOS) blanket wafer were polished under the conditions shown in Table 2. The values of the polishing rate required at this time are shown in the “SiGe polishing rate” column, the “Ge polishing rate” column, and the “TEOS polishing rate” column in Table 3. For the TEOS blanket wafer, the polishing rate value is obtained by dividing the difference in wafer thickness before and after polishing measured by using an optical interference type film thickness measuring apparatus by the polishing time, and for the silicon germanium blanket wafer and the germanium wafer. The difference in the weight of the wafer before and after polishing was divided by the density and the polishing time. Further, the values obtained by dividing the polishing rate of silicon germanium by the polishing compositions of Examples 1 to 13 and Comparative Examples 1 to 10 thus obtained by the polishing rate of TEOS by the same polishing composition are shown in Table 3. In the column “SiGe polishing rate / TEOS polishing rate”, the value obtained by dividing the germanium polishing rate by the TEOS polishing rate with the same polishing composition is shown in Table 3 as “Ge polishing rate / TEOS polishing rate”. "" Column. The value of the polishing rate of silicon germanium is a pass level when it is 300 ｍｉｎ / min or more, more preferably 500 Å / min or more, and still more preferably 700 Å / min or more. The value of germanium polishing rate is acceptable when it is 600 Å / min or more, more preferably 1000 Å / min or more, and still more preferably 1400 Å / min or more. The TEOS polishing rate value is acceptable when it is 100 Å / min or more, more preferably 200 Å / min or more, and even more preferably 300 Å / min or more. The value obtained by dividing the polishing rate of silicon germanium by the polishing rate of TEOS is an acceptable level when it is 30 or less, more preferably 20 or less, and even more preferably 10 or less. The value obtained by dividing the polishing rate of silicon germanium by the polishing rate of TEOS is a pass level when it is 60 or less, more preferably 40 or less, and still more preferably 20 or less.
表３に示すように、実施例１〜１３の研磨用組成物の場合には、シリコンゲルマニウムの研磨速度が５００Å／ｍｉｎ以上でかつＴＥＯＳの研磨速度が１００Å／ｍｉｎ以上であった。またゲルマニウムの研磨速度が１０００Å／ｍｉｎ以上でかつＴＥＯＳの研磨速度が１００Å／ｍｉｎ以上であり、ＩＶ族材料部分とケイ素材料部分を同時に研磨する目的で満足に使用できるレベルの結果が得られた。 As shown in Table 3, in the case of the polishing compositions of Examples 1 to 13, the polishing rate of silicon germanium was 500 Å / min or more and the polishing rate of TEOS was 100 以上 / min or more. Moreover, the polishing rate of germanium was 1000 Å / min or more and the polishing rate of TEOS was 100 Å / min or more, and a result that can be satisfactorily used for the purpose of simultaneously polishing the group IV material portion and the silicon material portion was obtained.
これに対し、比較例１〜１０の研磨用組成物の場合には、シリコンゲルマニウムの研磨速度又はＴＥＯＳの研磨速度が合格レベルに達しておらず、またゲルマニウムの研磨速度又はＴＥＯＳの研磨速度についても合格レベルに達しておらず、ＩＶ族材料部分とケイ素材料部分を同時に研磨する目的で満足に使用できるレベルの結果が得られなかった。 On the other hand, in the case of the polishing compositions of Comparative Examples 1 to 10, the polishing rate of silicon germanium or the polishing rate of TEOS did not reach an acceptable level, and the polishing rate of germanium or the polishing rate of TEOS was also The acceptable level was not reached, and a result that could be used satisfactorily for the purpose of simultaneously polishing the group IV material portion and the silicon material portion was not obtained.
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| PCT/JP2012/080218 WO2013077368A1 (en) | 2011-11-25 | 2012-11-21 | Polishing composition |
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