JP2012194050A - Method and apparatus for measuring particle size - Google Patents

Method and apparatus for measuring particle size Download PDF

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JP2012194050A
JP2012194050A JP2011058090A JP2011058090A JP2012194050A JP 2012194050 A JP2012194050 A JP 2012194050A JP 2011058090 A JP2011058090 A JP 2011058090A JP 2011058090 A JP2011058090 A JP 2011058090A JP 2012194050 A JP2012194050 A JP 2012194050A
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particle size
sample
opening area
hole groups
substrate
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JP5533748B2 (en
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Nobuo Okumura
暢夫 奥村
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Toyota Motor Corp
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Abstract

PROBLEM TO BE SOLVED: To accurately measure the particle size of a coarse particle for high-concentration slurry.SOLUTION: The particle size measurement method includes the steps of: preparing a glass substrate 10 having a plurality of holes 20-23 formed on the surface thereof, whose opening area continuously or discontinuously increases from longitudinal one end 10a to the other end 10b, the holes not penetrating in thickness direction; applying slurry A to the one end 10a whose opening area is smaller in the holes 20-23; sweeping the slurry A from the one end 10a whose opening area is smaller in the holes 20-23 to the other end 10b of a larger opening area; and measuring the particle size of the slurry A on the basis of the presence of the particle of the slurry A having entered the holes 20-23.

Description

本発明は、粒度測定方法及び粒度測定装置に関する。   The present invention relates to a particle size measuring method and a particle size measuring device.

例えばスラリー（インキ類や塗料類）の品質制御の観点から、スラリーの材料分散性の評価は重要である。現在スラリーの粒度評価を行う方法として、グラインドゲージを用いた評価法（ＪＩＳ−Ｋ５１０１、Ｋ５６００）、レーザー回折／散乱式粒度分布測定装置を用いた評価法、フロー式粒子画像解析装置を用いた評価法がある。   For example, from the viewpoint of quality control of slurry (inks and paints), evaluation of the material dispersibility of the slurry is important. Currently, as a method of evaluating the particle size of a slurry, an evaluation method using a grind gauge (JIS-K5101, K5600), an evaluation method using a laser diffraction / scattering particle size distribution measuring device, and an evaluation using a flow particle image analyzer There is a law.

グラインドゲージを用いた評価法は、表面に長手方向の一端から他端に向けて深さが変化する凹溝を備える基板と、該凹溝の深い方から浅い方に向かって試料を掃引するスクレーパーとを備える粒度ゲージを用いて行われる（特許文献１参照）。この評価法では、初めに基板上の凹溝の最も深い側にスラリー等の試料が滴下され、スクレーパーにより当該試料が、掻き取られるように掃引される。これにより、基板面上に分散の度合いによって粒状若しくは線状の特異の模様が発生し、当該模様を視認し、基板上の目盛りから試料の粒度を測定している。   The evaluation method using a grind gauge includes a substrate having a concave groove whose depth changes from one end to the other end in the longitudinal direction on the surface, and a scraper that sweeps a sample from a deeper side to a shallower side of the concave groove. (See Patent Document 1). In this evaluation method, a sample such as slurry is first dropped on the deepest side of the groove on the substrate, and the sample is swept so as to be scraped off by a scraper. Thereby, a granular or linear peculiar pattern is generated on the substrate surface depending on the degree of dispersion, and the pattern is visually recognized, and the particle size of the sample is measured from the scale on the substrate.

レーザー回折／散乱式粒度分布測定装置を用いた評価法では、分散された試料にレーザーを照射して試料から回折光や散乱光を発生させ、その光強度分布パターンを解析することで、粒度を測定している（特許文献２参照）。   In an evaluation method using a laser diffraction / scattering particle size distribution measuring device, a dispersed sample is irradiated with a laser to generate diffracted light or scattered light from the sample, and the light intensity distribution pattern is analyzed to determine the particle size. It is measured (see Patent Document 2).

フロー式粒子画像解析装置を用いた評価法では、フローセルに試料を流し、レーザー光により粒子の通過を検出し、その検出に基づいて粒子の静止画像をＴＶカメラで撮像し画像処理を行う。この画像処理した粒子画像の粒子サイズを用いて、試料の粒度を測定している（特許文献３参照）。   In the evaluation method using the flow type particle image analyzer, a sample is passed through a flow cell, the passage of particles is detected by laser light, and a still image of the particles is captured by a TV camera based on the detection, and image processing is performed. The particle size of the sample is measured using the particle size of the image-processed particle image (see Patent Document 3).

特許第４４４８４８３号公報Japanese Patent No. 4448483 特開平９−２８１０２６号公報JP-A-9-281026 特開平９−６１３３９号公報JP-A-9-61339

しかしながら、グラインドゲージを用いた評価法では、凹溝の深い方から浅い方に向かって試料を掃引するので、凹溝の深い場所で、大きな粒子だけでなく小さな粒子も凹溝に入り込んでしまい、その分、大きな粒子のうち凹溝に入ることができないものが生じる。よって、粗大粒子の粒度の測定を精度よく行うことができない。また、模様等の視認により評価するため、その評価にばらつきが生じる。さらに、掃引から時間が経過すると、試料が乾燥し模様が変化することがある。   However, in the evaluation method using a grind gauge, the sample is swept from the deeper groove toward the shallower groove, so that not only large particles but also small particles enter the groove in the deep groove. As a result, some of the large particles cannot enter the groove. Therefore, the particle size of coarse particles cannot be measured with high accuracy. Further, since the evaluation is performed by visually recognizing the pattern or the like, the evaluation varies. Furthermore, as time elapses from sweeping, the sample may dry and the pattern may change.

レーザー回折／散乱式粒度分布測定装置を用いた評価法では、高濃度スラリーの場合多重散乱、回折、吸収が生じ、検出光量が少なくなる。このため、高濃度スラリーを測定することが難しく、希釈する必要がある。希釈すると実際のスラリーの分散状態を測定することができなくなり、粒度の測定精度が低下する。   In the evaluation method using the laser diffraction / scattering particle size distribution measuring apparatus, multiple scattering, diffraction, and absorption occur in the case of a high-concentration slurry, and the amount of detected light decreases. For this reason, it is difficult to measure a high concentration slurry and it is necessary to dilute. When diluted, the actual dispersion state of the slurry cannot be measured, and the measurement accuracy of the particle size decreases.

フロー式粒子画像解析装置を用いた評価法では、粒子を一つ一つ分離して撮像する必要があるため、スラリーを希釈する必要があり、上述のレーザー回折／散乱式粒度分布測定装置を用いた評価法と同様に、実際のスラリーの分散状態を測定することができなくなり、粒度の測定精度が低下する。   In the evaluation method using the flow type particle image analyzer, it is necessary to separate and image the particles one by one, so it is necessary to dilute the slurry, and the above-mentioned laser diffraction / scattering type particle size distribution measuring device is used. Similar to the evaluation method, the actual dispersion state of the slurry cannot be measured, and the measurement accuracy of the particle size is lowered.

本発明はかかる点に鑑みてなされたものであり、高濃度のスラリーなどの試料に対し粗大粒子の粒度測定を高精度に行うことができる粒度測定方法及び粒度測定装置を提供することをその目的とする。   The present invention has been made in view of the above points, and an object thereof is to provide a particle size measuring method and a particle size measuring device capable of measuring the particle size of coarse particles with high accuracy on a sample such as a high-concentration slurry. And

上記目的を達成するための本発明は、表面に、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ厚み方向に貫通しない複数の孔群を有する基板を用意する工程と、試料を、前記複数の孔群のうち開口面積が小さい基板の一端側に塗布する工程と、前記試料を、前記複数の孔群のうち開口面積が小さい基板の一端側から大きい他端側に向かって掃引する工程と、前記複数の孔群に入り込んだ前記試料の粒子の有無から前記試料の粒度を測定する工程と、を有する、粒度測定方法である。   In order to achieve the above object, the present invention has a plurality of hole groups on the surface, the opening area of which increases continuously or discontinuously from one end to the other end in the longitudinal direction and does not penetrate in the thickness direction. A step of preparing a substrate; a step of applying a sample to one end side of a substrate having a small opening area among the plurality of hole groups; and a one end side of a substrate having a small opening area of the plurality of hole groups. And a step of measuring the particle size of the sample from the presence / absence of particles of the sample that have entered the plurality of hole groups.

本発明によれば、試料を、開口面積が小さい孔群側から開口面積が大きい孔群側に向かって掃引するので、小さい粒子から先に孔に入り込む。このため、開口面積が大きい孔に大きい粒子がより高い確率で入るので、粒度測定の精度を向上できる。また、希釈することなく高濃度の試料の粒度測定を行うことができるので、高い測定精度を確保できる。   According to the present invention, since the sample is swept from the hole group side having a small opening area toward the hole group side having a large opening area, the sample enters the holes first from small particles. For this reason, since a large particle enters a hole having a large opening area with a higher probability, the accuracy of particle size measurement can be improved. Moreover, since the particle size measurement of a high concentration sample can be performed without diluting, high measurement accuracy can be ensured.

別の観点による本発明は、基板と、当該基板の表面に備えられ、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ一面から他面に貫通する複数の孔群を有するシートと、を用意する工程と、試料を、前記複数の孔群のうち開口面積が小さいシートの一端側に塗布する工程と、前記試料を、前記複数の孔群のうち開口面積が小さいシートの一端側から大きい他端側に向かって掃引する工程と、前記複数の孔群に入り込んだ前記試料の粒子の有無から前記試料の粒度を測定する工程と、を有する、粒度測定方法である。   According to another aspect of the present invention, there is provided a substrate and a surface of the substrate, the opening area continuously or discontinuously increases from one end to the other end in the longitudinal direction, and penetrates from one surface to the other surface. A sheet having a plurality of hole groups, a step of applying a sample to one end side of a sheet having a small opening area among the plurality of hole groups, and a sample of the plurality of hole groups. A step of sweeping from one end side of the sheet having a small opening area toward the other end side, and a step of measuring the particle size of the sample from the presence or absence of the particles of the sample entering the plurality of hole groups, This is a particle size measurement method.

前記粒度測定方法は、前記試料を掃引した後に前記シートを前記基板から離脱する工程をさらに有するものであってもよい。   The particle size measurement method may further include a step of removing the sheet from the substrate after sweeping the sample.

上記粒度測定方法は、前記複数の孔群の容積が異なる複数のシートを用いて行われてもよい。   The particle size measurement method may be performed using a plurality of sheets having different volumes of the plurality of hole groups.

上記粒度測定方法は、掃引工程時に、前記掃引体の掃引速度を変更させるようにしてもよい。   In the particle size measurement method, the sweep speed of the sweep body may be changed during the sweep process.

上記粒度測定方法は、掃引される試料の量を変化させて前記試料の粒度を測定するようにしてもよい。   The particle size measurement method may measure the particle size of the sample by changing the amount of the sample to be swept.

別の観点による本発明は、表面に、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ厚み方向に貫通しない複数の孔群を有する基板と、前記複数の孔群のうち開口面積が小さい基板の一端側に塗布された試料を、前記複数の孔群のうち開口面積が小さい基板の一端側から大きい他端側に向かって掃引する掃引体と、を有する、粒度測定装置である。   According to another aspect of the present invention, there is provided a substrate having a plurality of hole groups on the surface, the opening area of which increases continuously or discontinuously from one end to the other in the longitudinal direction and does not penetrate in the thickness direction. A sweep body that sweeps a sample applied to one end side of a substrate having a small opening area among the plurality of hole groups from one end side of the substrate having a small opening area to the other end side of the plurality of hole groups; A particle size measuring device.

また、別の観点による本発明は、基板と、前記基板の表面に備えられ、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ一面から他面に貫通する複数の孔群を有するシートと、前記シートの複数の孔群のうち開口面積が小さい一端側に塗布された試料を、前記複数の孔群のうち開口面積が小さいシートの一端側から大きい他端側に向かって掃引する掃引体と、を有する、粒度測定装置である。   According to another aspect of the present invention, there is provided a substrate and a surface of the substrate, the opening area continuously or discontinuously increases from one end to the other end in the longitudinal direction, and from one surface to the other surface. A sheet having a plurality of hole groups penetrating through and a sample applied to one end side having a small opening area among the plurality of hole groups of the sheet, from one end side of the sheet having a small opening area among the plurality of hole groups. And a sweeping body that sweeps toward the other large end side.

前記粒度測定装置の前記シートは、前記基板から離脱可能であってもよい。   The sheet of the particle size measuring device may be detachable from the substrate.

上記粒度測定装置は、前記複数の孔群の容積が異なる複数のシートを有していてもよい。   The particle size measuring apparatus may include a plurality of sheets having different volumes of the plurality of hole groups.

上記粒度測定装置は、前記掃引体の掃引速度が変更可能に構成されていてもよい。   The particle size measuring apparatus may be configured such that the sweep speed of the sweep body can be changed.

上記粒度測定装置は、掃引する試料の量が定量的に調整可能に構成されていてもよい。   The particle size measuring apparatus may be configured such that the amount of sample to be swept can be adjusted quantitatively.

本発明によれば、高濃度のスラリーなどの試料に対し粗大粒子の粒度測定を高精度に行うことができる。   According to the present invention, it is possible to measure the particle size of coarse particles with high accuracy on a sample such as a high-concentration slurry.

粒度測定装置の構成の概略を模式的に示す断面図である。It is sectional drawing which shows the outline of a structure of a particle size measuring apparatus typically. 粒度測定装置の構成の概略を模式的に示す平面図である。It is a top view which shows the outline of a structure of a particle size measuring apparatus typically. シートのある粒度測定装置の断面図である。It is sectional drawing of the particle size measuring apparatus with a sheet | seat.

以下、図面を参照して、本発明の好ましい実施の形態について説明する。図１は、本実施の形態に係る粒度測定装置１の概略を示す模式図である。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic diagram showing an outline of a particle size measuring apparatus 1 according to the present embodiment.

粒度測定装置１は、平板状のガラス基板１０と、ガラス基板１０上に塗布された試料であるスラリーＡを掃引する掃引体１１を有している。   The particle size measuring apparatus 1 includes a flat glass substrate 10 and a sweep body 11 that sweeps a slurry A that is a sample applied on the glass substrate 10.

ガラス基板１０は、表面に、長手方向（図１の左右方向）の一端１０ａから他端１０ｂに向かって開口面積（孔面積）が不連続的に大きくなる複数の孔群を有している。例えばガラス基板１０は、４つの孔群２０、２１、２２、２３を有し、孔群２０は、各辺Ｂが１０μｍ×１０μｍの方形の孔Ｃを有し、孔群２１は、各辺Ｂが２０μｍ×２０μｍの方形の孔Ｃを有し、孔群２２は、各辺Ｂが５０μｍ×５０μｍの方形の孔Ｃを有し、孔群２３は、各辺Ｂが１００μｍ×１００μｍの方形の孔Ｃを有している。これらの孔Ｃは、有底孔であり、ガラス基板１０を貫通していない。ガラス基板１０には、一端１０ａから他端１０ｂに向かって孔群２０〜２３がこの順に形成されている。図２に示すように各孔群２０〜２３は、例えば方形の範囲に形成され、隣り合う孔群同士の間には、孔のない平坦部３０が形成されている。   The glass substrate 10 has a plurality of hole groups whose opening area (hole area) increases discontinuously from one end 10a in the longitudinal direction (left-right direction in FIG. 1) to the other end 10b on the surface. For example, the glass substrate 10 has four hole groups 20, 21, 22, and 23, the hole group 20 has square holes C each side B of 10 μm × 10 μm, and the hole group 21 includes each side B Has a square hole C of 20 μm × 20 μm, the hole group 22 has a square hole C with each side B of 50 μm × 50 μm, and the hole group 23 has a rectangular hole with each side B of 100 μm × 100 μm C. These holes C are bottomed holes and do not penetrate the glass substrate 10. In the glass substrate 10, hole groups 20 to 23 are formed in this order from one end 10a to the other end 10b. As shown in FIG. 2, each hole group 20-23 is formed in the square range, for example, and the flat part 30 without a hole is formed between adjacent hole groups.

掃引体１１は、薄い方形の板状に形成されて、板の端面をガラス基板１０の表面に押しあてて移動させることにより、一端１０ａに塗布されたスラリーＡを他端１０ｂに向かって掃引できる。   The sweep body 11 is formed in a thin rectangular plate shape, and can move the slurry A applied to the one end 10a toward the other end 10b by moving the end face of the plate against the surface of the glass substrate 10. .

次に、以上のように構成された粒度測定装置１を用いた粒度測定方法について説明する。先ず、図１に示すようにガラス基板１０が用意される。次に、スラリーＡが、ガラス基板１０の開口面積が最も小さい孔群２０側の一端１０ａ付近に塗布される。続いて、掃引体１１がガラス基板１０の一端１０ａに押しあてられ、その状態で、他端１０ｂ側に移動する。これにより、ガラス基板１０の一端１０ａ付近のスラリーＡが他端１０ｂ側に掃引され、このとき、スラリーＡ内の粒子が、小さいものから順にその大きさに合った孔群２０〜２３に入り込む。そして、各孔群２０〜２３に粒子が入ったか否かを確認することにより、スラリーＡの粒度を測定する。例えば図２に示すように孔群２０、２１、２２への粒子の入り込みが確認でき、孔群２３への粒子の入り込みが確認できない場合、１０μｍ〜５０μｍの粒子径Ｄを有する粒子が含まれることが分かる。また、孔群２２に入り込んだ粒子よりも孔群２０に入り込んだ粒子が多い場合には、より小さい１０μｍ以下の粒子がより多く含まれていることが分かる。   Next, a particle size measuring method using the particle size measuring apparatus 1 configured as described above will be described. First, a glass substrate 10 is prepared as shown in FIG. Next, the slurry A is applied to the vicinity of the one end 10a on the hole group 20 side where the opening area of the glass substrate 10 is the smallest. Subsequently, the sweep body 11 is pressed against one end 10a of the glass substrate 10, and in that state, moves to the other end 10b side. Thereby, the slurry A near the one end 10a of the glass substrate 10 is swept to the other end 10b side, and at this time, the particles in the slurry A enter the hole groups 20 to 23 corresponding to the size in order from the smallest. And the particle size of the slurry A is measured by confirming whether the particle | grains entered into each hole group 20-23. For example, as shown in FIG. 2, if particles can enter into the hole groups 20, 21, and 22 and particles cannot enter into the hole group 23, particles having a particle diameter D of 10 μm to 50 μm are included. I understand. In addition, when there are more particles that have entered the hole group 20 than particles that have entered the hole group 22, it can be seen that a larger number of smaller particles of 10 μm or less are contained.

本実施の形態によれば、スラリーＡを、ガラス基板１０の開口面積が小さい孔群２０がある一端１０ａ側から、開口面積が大きい孔群２３がある他端１０ｂ側に向けて掃引するので、小さい粒子から先に孔に入り込む。このため、開口面積の大きい孔に大きい粒子がより高い確率で入るので、粒度測定の精度を向上できる。また、希釈することなく高濃度のスラリーＡの粒度測定を行うことができるので、高い測定精度を確保できる。   According to the present embodiment, the slurry A is swept from the one end 10a side having the hole group 20 having a small opening area of the glass substrate 10 toward the other end 10b side having the hole group 23 having a large opening area. The small particles enter the holes first. For this reason, since a large particle enters a hole having a large opening area with a higher probability, the accuracy of particle size measurement can be improved. Moreover, since the particle size measurement of the high concentration slurry A can be performed without dilution, high measurement accuracy can be ensured.

前記実施の形態において、孔群２０〜２３がガラス基板１０に形成されていたが、図３に示すようにガラス基板１０の表面に設置可能なシート４０に形成されていてもよい。孔群２０〜２３は、上記ガラス基板１０と同様にシート４０の一端４０ａ側から他端４０ｂ側に向けてこの順に形成されている。孔群２０〜２３の孔は、シート４０の一面から他面に貫通している。なお、本実施の形態においてガラス基板１０には、孔が形成されていない。また、シート４０は、スクリーン版や金属メッシュにより形成されていてもよく、金属メッシュの場合エッチング処理により成形されてもよい。   In the said embodiment, although the hole groups 20-23 were formed in the glass substrate 10, you may form in the sheet | seat 40 which can be installed in the surface of the glass substrate 10, as shown in FIG. The hole groups 20 to 23 are formed in this order from the one end 40 a side to the other end 40 b side of the sheet 40 in the same manner as the glass substrate 10. The holes of the hole groups 20 to 23 penetrate from one surface of the sheet 40 to the other surface. In the present embodiment, no hole is formed in the glass substrate 10. Moreover, the sheet | seat 40 may be formed with the screen plate and the metal mesh, and may be shape | molded by the etching process in the case of a metal mesh.

本実施の形態では、先ず、スラリーＡが、ガラス基板１０上のシート４０の孔群２０側の一端４０ａ付近に塗布される。次に、掃引体１１が、シート４０の一端４０ａに押しあてられ、その状態で、他端４０ｂ側に移動する。これにより、シート４０の一端４０ａ付近のスラリーＡが他端４０ｂ側に掃引され、このとき、スラリーＡ内の粒子が、小さいものから順にその大きさに合った孔群２０〜２３に入り込む。そして、シート４０の各孔群２０〜２３に粒子が入ったか否かを確認することにより、スラリーＡの粒度を測定する。   In the present embodiment, first, the slurry A is applied to the vicinity of the one end 40 a on the hole group 20 side of the sheet 40 on the glass substrate 10. Next, the sweep body 11 is pressed against one end 40a of the sheet 40, and in that state, moves to the other end 40b side. As a result, the slurry A in the vicinity of the one end 40a of the sheet 40 is swept to the other end 40b side, and at this time, the particles in the slurry A enter the hole groups 20 to 23 corresponding to the size in order from the smallest. And the particle size of the slurry A is measured by confirming whether the particle | grains entered into each hole group 20-23 of the sheet | seat 40. FIG.

本実施の形態においても、スラリーＡを、シート４０の開口面積が小さい孔群２０がある一端４０ａ側から、開口面積が大きい孔群２３がある他端４０ｂ側に向けて掃引するので、小さい粒子から先に孔に入り込む。このため、開口面積が大きい孔に大きい粒子がより高い確率で入るので、粒度の測定の精度を向上できる。また、希釈することなく高濃度のスラリーＡの粒度測定を行うことができるので、高い測定精度を確保できる。加えて、試料であるスラリーＡに応じて開口面積の異なるシート４０を容易に取り換えることができる。   Also in the present embodiment, the slurry A is swept from the one end 40a side having the hole group 20 having a small opening area of the sheet 40 toward the other end 40b side having the hole group 23 having a large opening area. Go into the hole first. For this reason, since a large particle enters a hole having a large opening area with a higher probability, the accuracy of particle size measurement can be improved. Moreover, since the particle size measurement of the high concentration slurry A can be performed without dilution, high measurement accuracy can be ensured. In addition, the sheet 40 having a different opening area can be easily replaced according to the slurry A as a sample.

前記実施の形態において、スラリーＡを掃引した後にシート４０をガラス基板１０から離脱させ、その後粒度を測定してもよい。こうすることにより、より容易かつ精度よく、各孔群２０〜２３における粒子の有無を確認することができる。   In the above embodiment, the sheet 40 may be detached from the glass substrate 10 after the slurry A is swept, and then the particle size may be measured. By carrying out like this, the presence or absence of the particle | grains in each hole group 20-23 can be confirmed more easily and accurately.

前記実施の形態において、粒度測定装置１は、複数の孔群の容積（孔の深さ×開口面積）が異なる複数のシートを有し、それらのシートを用いてスラリーＡの粒度測定を行うようにしてもよい。かかる場合、スラリーＡに応じてシート４０を選択することができ、スラリーＡの粒度に合った孔群の容積を有するシート４０を用いて、粒度の測定を行うことができる。よって、粒度測定の精度をさらに向上できる。   In the embodiment, the particle size measuring apparatus 1 has a plurality of sheets having different volumes (hole depth × opening area) of a plurality of hole groups, and performs particle size measurement of the slurry A using these sheets. It may be. In such a case, the sheet 40 can be selected according to the slurry A, and the particle size can be measured using the sheet 40 having a hole group volume that matches the particle size of the slurry A. Therefore, the accuracy of particle size measurement can be further improved.

また、粒度測定装置１は、掃引体１１の掃引速度が変更可能に構成されていてもよい。具体的には、粒度測定装置１は、掃引体１１のモータ等の駆動源を制御して、掃引体１１の掃引速度を変更する速度制御部を備えていてもよい。かかる場合、掃引工程時に、掃引体１１の掃引速度を変更させることができるので、例えばスラリーＡが、各大きさの孔群に入り込む時間を確保することができ、スラリーＡが、対応する寸法の孔に入らずに掃引されることが防止される。また、掃引速度を下げて、次に大きい面積の孔にスラリーＡが持ちこされていないことを確認することもできる。この結果、粒度測定の精度を向上できる。   Further, the particle size measuring apparatus 1 may be configured such that the sweep speed of the sweep body 11 can be changed. Specifically, the particle size measurement apparatus 1 may include a speed control unit that controls a drive source such as a motor of the sweep body 11 to change the sweep speed of the sweep body 11. In this case, since the sweep speed of the sweep body 11 can be changed during the sweep process, for example, it is possible to secure time for the slurry A to enter the hole group of each size, and the slurry A has a corresponding size. Sweeping without entering the hole is prevented. It is also possible to confirm that the slurry A is not brought into the hole having the next largest area by reducing the sweep speed. As a result, the accuracy of particle size measurement can be improved.

粒度測定装置１は、掃引するスラリーＡの量が定量的に調整可能に構成されていてもよい。かかる場合、掃引されるスラリーＡの量を変化させて粒度を測定することができるので、適切な量のスラリーＡで粒度を測定でき、粒度測定の精度を向上できる。   The particle size measuring apparatus 1 may be configured such that the amount of the slurry A to be swept can be adjusted quantitatively. In such a case, since the particle size can be measured by changing the amount of the slurry A to be swept, the particle size can be measured with an appropriate amount of the slurry A, and the accuracy of the particle size measurement can be improved.

以上、添付図面を参照しながら本発明の好適な実施の形態について説明したが、本発明はかかる例に限定されない。当業者であれば、特許請求の範囲に記載された思想の範疇内において、各種の変更例または修正例に想到し得ることは明らかであり、それらについても当然に本発明の技術的範囲に属するものと了解される。   The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It is obvious for those skilled in the art that various modifications or modifications can be conceived within the scope of the idea described in the claims, and these naturally belong to the technical scope of the present invention. It is understood.

例えば以上の実施の形態において、孔群２０〜２３は、ガラス基板１０の表面若しくはシート４０に一端から他端に向けて不連続的に開口面積が大きくなるように形成されていたが、連続的に開口面積が大きくなるように形成されていてもよい。また、孔群の数は、４つであったが、これに限定されるものではない。また、孔群の孔の径や形も任意に選択できる。さらに、以上の実施の形態では、試料がスラリーＡであったが、これに限られず他の試料の精度の測定にも本発明は適用できる。   For example, in the above embodiment, the hole groups 20 to 23 are formed on the surface of the glass substrate 10 or the sheet 40 so that the opening area is discontinuously increased from one end to the other end. The opening area may be increased. Moreover, although the number of hole groups was four, it is not limited to this. Moreover, the diameter and shape of the hole of a hole group can also be selected arbitrarily. Furthermore, in the above embodiment, the sample is the slurry A. However, the present invention is not limited to this, and the present invention can be applied to the measurement of the accuracy of other samples.

１ 粒度測定装置
１０ ガラス基板
１０ａ 一端
１０ｂ 他端
１１ 掃引体
２０〜２３ 孔群
３０ 平坦部
４０ シート
４０ａ 一端
４０ｂ 他端
Ａ スラリー DESCRIPTION OF SYMBOLS 1 Particle size measuring apparatus 10 Glass substrate 10a One end 10b The other end 11 Sweep body 20-23 Hole group 30 Flat part 40 Sheet 40a One end 40b The other end A Slurry

Claims (12)

表面に、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ厚み方向に貫通しない複数の孔群を有する基板を用意する工程と、
試料を、前記複数の孔群のうち開口面積が小さい基板の一端側に塗布する工程と、
前記試料を、前記複数の孔群のうち開口面積が小さい基板の一端側から大きい他端側に向かって掃引する工程と、
前記複数の孔群に入り込んだ前記試料の粒子の有無から前記試料の粒度を測定する工程と、を有する、粒度測定方法。 Preparing a substrate having a plurality of hole groups on the surface, the opening area continuously or discontinuously increasing from one end to the other in the longitudinal direction and not penetrating in the thickness direction;
Applying a sample to one end of a substrate having a small opening area among the plurality of hole groups;
Sweeping the sample from one end side of the substrate having a small opening area to the other end side of the plurality of hole groups; and
Measuring the particle size of the sample from the presence or absence of particles of the sample that have entered the plurality of hole groups. 基板と、当該基板の表面に備えられ、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ一面から他面に貫通する複数の孔群を有するシートと、を用意する工程と、
試料を、前記複数の孔群のうち開口面積が小さいシートの一端側に塗布する工程と、
前記試料を、前記複数の孔群のうち開口面積が小さいシートの一端側から大きい他端側に向かって掃引する工程と、
前記複数の孔群に入り込んだ前記試料の粒子の有無から前記試料の粒度を測定する工程と、を有する、粒度測定方法。 A sheet having a substrate and a plurality of hole groups that are provided on the surface of the substrate, have an opening area that increases continuously or discontinuously from one end to the other in the longitudinal direction, and penetrates from one surface to the other surface. And a step of preparing
Applying a sample to one end side of a sheet having a small opening area among the plurality of hole groups;
Sweeping the sample from one end side of the sheet having a small opening area to the other end side of the plurality of hole groups; and
Measuring the particle size of the sample from the presence or absence of particles of the sample that have entered the plurality of hole groups. 前記試料を掃引した後に、前記シートを前記基板から離脱する工程をさらに有する請求項２に記載の粒度測定方法。   The particle size measurement method according to claim 2, further comprising a step of separating the sheet from the substrate after sweeping the sample. 前記複数の孔群の容積が異なる複数のシートを用いて行われる、請求項２又は３に記載の粒度測定方法。   The particle size measurement method according to claim 2 or 3, wherein the method is performed using a plurality of sheets having different volumes of the plurality of hole groups. 掃引工程時に、前記掃引体の掃引速度を変更させる、請求項１〜４のいずれかに記載の粒度測定方法。   The particle size measurement method according to any one of claims 1 to 4, wherein a sweep speed of the sweep body is changed during a sweep process. 掃引される試料の量を変化させて前記試料の粒度を測定する、請求項１〜５のいずれかに記載の粒度測定方法。   The particle size measurement method according to claim 1, wherein the particle size of the sample is measured by changing the amount of the sample to be swept. 表面に、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ厚み方向に貫通しない複数の孔群を有する基板と、
前記複数の孔群のうち開口面積が小さい基板の一端側に塗布された試料を、前記複数の孔群のうち開口面積が小さい基板の一端側から大きい他端側に向かって掃引する掃引体と、を有する、粒度測定装置。 On the surface, a substrate having a plurality of hole groups in which the opening area continuously or discontinuously increases from one end to the other end in the longitudinal direction and does not penetrate in the thickness direction;
A sweep body that sweeps a sample applied to one end side of a substrate having a small opening area among the plurality of hole groups from one end side of the substrate having a small opening area to the other end side of the plurality of hole groups; A particle size measuring apparatus. 基板と、
前記基板の表面に備えられ、長手方向の一端から他端に向かって開口面積が連続的にまたは不連続的に大きくなり、かつ一面から他面に貫通する複数の孔群を有するシートと、
前記シートの複数の孔群のうち開口面積が小さい一端側に塗布された試料を、前記複数の孔群のうち開口面積が小さいシートの一端側から大きい他端側に向かって掃引する掃引体と、を有する、粒度測定装置。 A substrate,
A sheet that is provided on the surface of the substrate, has an opening area that increases continuously or discontinuously from one end to the other in the longitudinal direction, and has a plurality of hole groups that penetrate from one surface to the other surface;
A sweep body that sweeps a sample applied to one end side having a small opening area among the plurality of hole groups of the sheet from one end side of the sheet having a small opening area to the other end side of the plurality of hole groups; A particle size measuring apparatus. 前記シートは、前記基板から離脱可能である、請求項８に記載の粒度測定装置。   The particle size measuring apparatus according to claim 8, wherein the sheet is detachable from the substrate. 前記複数の孔群の容積が異なる複数のシートを有する、請求項８又は９に記載の粒度測定装置。   The particle size measuring device according to claim 8 or 9, comprising a plurality of sheets having different volumes of the plurality of hole groups. 前記掃引体の掃引速度が変更可能に構成されている、請求項７〜１０のいずれかに記載の粒度測定装置。   The particle size measurement apparatus according to any one of claims 7 to 10, wherein a sweep speed of the sweep body is configured to be changeable. 掃引する試料の量が定量的に調整可能に構成されている、請求項７〜１１のいずれかに記載の粒度測定装置。   The particle size measuring device according to any one of claims 7 to 11, wherein the amount of sample to be swept is configured to be quantitatively adjustable.
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