JP2012087406A - シリコンおよびニオビウムを基にした複合耐火物上に高温酸化に対する保護被膜を形成する方法 - Google Patents
シリコンおよびニオビウムを基にした複合耐火物上に高温酸化に対する保護被膜を形成する方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 50
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 46
- 239000010703 silicon Substances 0.000 title claims abstract description 46
- 239000002131 composite material Substances 0.000 title claims abstract description 41
- 230000003647 oxidation Effects 0.000 title claims abstract description 32
- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 32
- 239000010955 niobium Substances 0.000 title claims abstract description 24
- 229910052758 niobium Inorganic materials 0.000 title claims abstract description 18
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 title claims abstract description 17
- 239000011253 protective coating Substances 0.000 title claims abstract description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 46
- 239000011651 chromium Substances 0.000 claims abstract description 46
- 238000000576 coating method Methods 0.000 claims abstract description 45
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 41
- 239000011248 coating agent Substances 0.000 claims abstract description 40
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000007789 gas Substances 0.000 claims abstract description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 31
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 16
- 239000001301 oxygen Substances 0.000 claims abstract description 16
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 10
- 238000006243 chemical reaction Methods 0.000 claims abstract description 7
- 230000001590 oxidative effect Effects 0.000 claims abstract description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 70
- 239000000203 mixture Substances 0.000 claims description 30
- 239000004568 cement Substances 0.000 claims description 24
- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical compound O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 claims description 22
- 229910052796 boron Inorganic materials 0.000 claims description 19
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 18
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 16
- 239000000843 powder Substances 0.000 claims description 14
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 11
- 229910052718 tin Inorganic materials 0.000 claims description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000011065 in-situ storage Methods 0.000 claims description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 claims description 6
- 238000000137 annealing Methods 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910000510 noble metal Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000002407 reforming Methods 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 description 22
- 229910020010 Nb—Si Inorganic materials 0.000 description 18
- 239000000758 substrate Substances 0.000 description 15
- 229910045601 alloy Inorganic materials 0.000 description 14
- 239000000956 alloy Substances 0.000 description 14
- 238000009792 diffusion process Methods 0.000 description 13
- 229910021332 silicide Inorganic materials 0.000 description 9
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 9
- 229910010271 silicon carbide Inorganic materials 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910000676 Si alloy Inorganic materials 0.000 description 6
- 239000012190 activator Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 229910001257 Nb alloy Inorganic materials 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052735 hafnium Inorganic materials 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000012010 growth Effects 0.000 description 3
- 238000001764 infiltration Methods 0.000 description 3
- 230000008595 infiltration Effects 0.000 description 3
- 229910000765 intermetallic Inorganic materials 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- YTPZWYPLOCEZIX-UHFFFAOYSA-N [Nb]#[Nb] Chemical compound [Nb]#[Nb] YTPZWYPLOCEZIX-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- -1 ammonium halide Chemical class 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910001068 laves phase Inorganic materials 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910000601 superalloy Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910006501 ZrSiO Inorganic materials 0.000 description 1
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical class [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000003698 anagen phase Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229940117975 chromium trioxide Drugs 0.000 description 1
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- LIZIAPBBPRPPLV-UHFFFAOYSA-N niobium silicon Chemical compound [Si].[Nb] LIZIAPBBPRPPLV-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 235000008113 selfheal Nutrition 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 239000012720 thermal barrier coating Substances 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
- F01D25/00—Component parts, details, or accessories, not provided for in, or of interest apart from, other groups
- F01D25/005—Selecting particular materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
- C23C10/08—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases only one element being diffused
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
- C23C10/34—Embedding in a powder mixture, i.e. pack cementation
- C23C10/36—Embedding in a powder mixture, i.e. pack cementation only one element being diffused
- C23C10/44—Siliconising
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C12/00—Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces
- C23C12/02—Diffusion in one step
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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- Chemical & Material Sciences (AREA)
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- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
Abstract
【解決手段】保護される表面上に存在するクロムが、シリコンおよび酸素を含む反応性ガスと反応して、その第1相は粘塑性特性を有するシリカを基にした酸化物相でありその第2相は、シリコン、クロムおよび酸素を基にした2相を有する複合被膜を生成し、第1相と第2相とが高温で合体し、これによって保護被膜が形成され、ここで第2相は、作業中に酸化ガスとの反応によって第1相を改質するリザーバーとして作用する。本発明は、好ましくは航空エンジンの分野で使用される。
【選択図】なし
Description
・第1相は、シリカ(SiO2)を基にし、第2相は、シリコン、クロムおよび酸素(CrSiO)を基にする。
SiO2 75%
SiC 25%(質量パーセント)
を有するシリコンドナーセメント中または上に配置する。これらのパーセンテージは、化学量論組成に対応する。
クロム酸(CrO3)と呼ばれる三酸化クロム:250g.L−1
硫酸(H2SO4):2.5g.L−1
電流密度:50A/dm2
T:60〜65℃
で生成される電解クロムの蒸着物でまず被覆する。
SiO2 75%
SiC 25%(質量パーセント)
を有するシリコンドナーセメント中または上に配置する。
SiO2 75%
SiC 25%(質量パーセント)
を有するシリコンドナーセメント中または上に配置する。
SiO2 50%
B4C 50%(質量パーセント)
また、この場合、得られる結果は特別である。すなわち、基質MASCは、高温でのその酸化特性が特別である二酸化シリコン、酸化クロム、ホウ化クロムおよび酸ケイ化クロム(chromium oxysilicide)の蒸着物で被覆される。
SiO2 16%
B4C 84%(質量パーセント)
この場合も、得られる被膜は高温酸化に対して特別な耐性を有する。
SiO2 50%
B4C 50%(質量パーセント)
試料を、1000℃で1時間の50サイクルの酸化試験に付す。この試験の後、0.74mg/cm2の質量増加があり、一方、保護されていない同じ試料はこの温度にて1時間で完全に破壊される。
SiO2 16%
B4C 84%(質量パーセント)
試料を、1000℃で1時間の300サイクルの酸化試験に付す。この試験の後、1.09mg/cm2の質量減少があり、一方、保護されていない同じ試料はこの温度にて1時間で完全に破壊される。
Claims (14)
- シリコンおよびニオビウムを基にした複合耐火物の表面上に高温酸化に対する保護被膜を形成する方法であって、その第1相は調節可能な粘塑性特性を有するシリカ(SiO2)を基にした酸化物相であり第2相はシリコン、クロムおよび酸素(CrSiO)を基にする2相を有する複合被膜を生成させるために、保護される表面上に存在するクロムを、シリコンおよび酸素を含む反応性ガスと反応させ、前記第1相および第2相を高温で合体させ、これによって保護被膜が形成され、前記第2相が、作業中に、酸化ガスとの反応によって前記第1相を改質するリザーバーとして作用することを特徴とする方法。
- 前記反応性ガスは一酸化シリコン(SiO)を含み、1450℃以上の温度に置かれたシリカ(SiO2)を含むドナーセメントからin situで生成されることを特徴とする請求項1記載の方法。
- ドナーセメントが粉末の形態のシリカ(SiO2)および炭化シリコン(SiC)の混合物を含むことを特徴とする請求項2記載の方法。
- シリカ(SiO2)を基にした第1相が、ホウ素および/またはゲルマニウム型の溶融元素を更に含み、これにより、作業温度範囲にしたがってこの相の粘組成特性を調整することが可能になることを特徴とする請求項1〜3のいずれか1項に記載の方法。
- 第1相がホウ素を更に含み、前記反応性ガスが一酸化シリコン(SiO)および一酸化ホウ素(BO)を含むことを特徴とする請求項4記載の方法。
- 複合物に関して、粉末形態のシリカ(SiO2)および炭化シリコン(SiC)を含むドナーセメントから生成される一酸化シリコン(SiO)を含む第1反応性ガスをまず反応させ、次いで粉末形態のシリカ(SiO2)および炭化ホウ素(B4C)を含む第2のドナーセメントから生成される一酸化シリコン(SiO)および一酸化ホウ素(BO)を含む第2の反応性ガスを反応させることを特徴とする請求項5記載の方法。
- 保護される表面上に存在するクロムの全部または一部が、シリコンおよびニオビウムを基にした複合物に由来することを特徴とする請求項1〜6のいずれか1項に記載の方法。
- 前記保護される表面上に存在するクロムの全部または一部が、所望の厚さの層を形成するための前記保護される表面上の事前蒸着によって得られることを特徴とする請求項1〜6のいずれか1項に記載の方法。
- 事前蒸着物が、電解蒸着技術によってもしくはカソード噴霧法による蒸着によって得られ、前記層の所望の厚さが5〜20μmであり、好適な厚さが15μmであることを特徴とする請求項8記載の方法。
- 前記保護される表面上に事前にスズの蒸着物が形成され、好ましくはそれに続いて減圧で熱処理作業を行うことを特徴とする請求項1〜8のいずれか1項に記載の方法。
- 前記保護される表面上に、白金、パラジウムおよび金から選択される貴金属の蒸着物を事前に形成し、好ましくは続いて相互拡散アニーリング作業を実施する、請求項1〜8のいずれか1項に記載の方法。
- 前記保護される表面上に事前に窒化チタンの蒸着物を形成する、請求項1〜8のいずれか1項に記載の方法。
- 請求項1〜12のいずれか1項に記載の方法を実施することによって得られる保護被膜。
- その一表面が、請求項1〜12のいずれか1項に記載の方法を実施することによって得られるものなどの保護被膜を備えている、シリコンおよびニオビウムを基にした複合物の部品。
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FR1003882A FR2965568B1 (fr) | 2010-09-30 | 2010-09-30 | Procede pour former un revetement protecteur contre l'oxydation a haute temperature sur un materiau composite refractaire a base de silicium et de niobium |
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FR2988736B1 (fr) | 2012-04-02 | 2014-03-07 | Onera (Off Nat Aerospatiale) | Procede d'obtention d'un revetement d'aluminiure de nickel sur un substrat metallique, et piece munie d'un tel revetement |
CN112593184B (zh) * | 2020-11-27 | 2022-07-01 | 北京钢研高纳科技股份有限公司 | 提高铌基合金抗氧化性能的方法、应用及抗氧化铌基合金 |
CN113136551A (zh) * | 2021-03-15 | 2021-07-20 | 北京航空航天大学 | 一种Nb-Si基合金抗氧化成分快速筛选的高通量方法 |
CN115043410B (zh) * | 2021-12-29 | 2024-03-01 | 渤海大学 | 一种Sm3+掺杂SiO2纳/微米棒及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06305898A (ja) * | 1993-03-10 | 1994-11-01 | Internatl Business Mach Corp <Ibm> | 単結晶ティップ構造物およびその形成方法 |
JP2008127275A (ja) * | 2006-11-21 | 2008-06-05 | United Technol Corp <Utc> | 抗酸化コーティングの方法および被覆製品 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2612442A (en) * | 1949-05-19 | 1952-09-30 | Sintercast Corp America | Coated composite refractory body |
US5019334A (en) | 1988-06-06 | 1991-05-28 | General Electric Company | Low density high strength alloys of Nb-Ti-Al for use at high temperatures |
US4980244A (en) | 1988-07-01 | 1990-12-25 | General Electric Company | Protective alloy coatings comprising Cr-Al-Ru containing one or more of Y, Fe, Ni and Co |
US4904546A (en) | 1989-04-03 | 1990-02-27 | General Electric Company | Material system for high temperature jet engine operation |
FR2668479B1 (fr) * | 1990-10-24 | 1993-10-01 | Aerospatiale Ste Nationale Indle | Piece en materiau composite carbone, protegee contre l'oxydation et son procede de fabrication. |
US5833773A (en) | 1995-07-06 | 1998-11-10 | General Electric Company | Nb-base composites |
US5932033A (en) | 1998-08-12 | 1999-08-03 | General Electric Company | Silicide composite with niobium-based metallic phase and silicon-modified laves-type phase |
US6313015B1 (en) | 1999-06-08 | 2001-11-06 | City University Of Hong Kong | Growth method for silicon nanowires and nanoparticle chains from silicon monoxide |
DE19949541C2 (de) * | 1999-10-14 | 2002-02-28 | Forschungszentrum Juelich Gmbh | Metallisches Bauteil mit Schicht sowie Herstellungsverfahren für eine solche Schicht |
US6419765B1 (en) | 2000-12-13 | 2002-07-16 | General Electric Company | Niobium-silicide based composites resistant to low temperature pesting |
US6521356B2 (en) * | 2001-02-02 | 2003-02-18 | General Electric Company | Oxidation resistant coatings for niobium-based silicide composites |
KR100454715B1 (ko) * | 2002-03-14 | 2004-11-05 | 한국과학기술연구원 | MoSi₂―Si₃N₄복합피복층 및 그 제조방법 |
US7189459B2 (en) * | 2002-12-31 | 2007-03-13 | General Electric Company | Turbine blade for extreme temperature conditions |
US7005191B2 (en) * | 2003-05-01 | 2006-02-28 | Wisconsin Alumni Research Foundation | Oxidation resistant coatings for ultra high temperature transition metals and transition metal alloys |
US7250224B2 (en) * | 2004-10-12 | 2007-07-31 | General Electric Company | Coating system and method for vibrational damping of gas turbine engine airfoils |
US20070128447A1 (en) * | 2005-12-02 | 2007-06-07 | General Electric Company | Corrosion inhibiting ceramic coating and method of application |
US7779892B2 (en) * | 2007-05-09 | 2010-08-24 | United Technologies Corporation | Investment casting cores and methods |
US7981520B2 (en) * | 2007-08-08 | 2011-07-19 | General Electric Company | Oxide-forming protective coatings for niobium-based materials |
US8247085B2 (en) * | 2008-11-21 | 2012-08-21 | General Electric Company | Oxide-forming protective coatings for niobium-based materials |
CN101481791B (zh) * | 2009-01-07 | 2011-04-20 | 江苏华阳金属管件有限公司 | 高韧性纳米晶硅化物涂层的制备方法 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06305898A (ja) * | 1993-03-10 | 1994-11-01 | Internatl Business Mach Corp <Ibm> | 単結晶ティップ構造物およびその形成方法 |
JP2008127275A (ja) * | 2006-11-21 | 2008-06-05 | United Technol Corp <Utc> | 抗酸化コーティングの方法および被覆製品 |
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US8591992B2 (en) | 2013-11-26 |
CA2753184A1 (fr) | 2012-03-30 |
CN102443757B (zh) | 2015-11-25 |
CA2753184C (fr) | 2018-06-05 |
US20120082857A1 (en) | 2012-04-05 |
FR2965568B1 (fr) | 2012-10-19 |
JP5894405B2 (ja) | 2016-03-30 |
CN102443757A (zh) | 2012-05-09 |
EP2436806B1 (fr) | 2015-02-18 |
US20130330540A1 (en) | 2013-12-12 |
EP2436806A1 (fr) | 2012-04-04 |
FR2965568A1 (fr) | 2012-04-06 |
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