JP2011502276A5 - - Google Patents
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- JP2011502276A5 JP2011502276A5 JP2010530582A JP2010530582A JP2011502276A5 JP 2011502276 A5 JP2011502276 A5 JP 2011502276A5 JP 2010530582 A JP2010530582 A JP 2010530582A JP 2010530582 A JP2010530582 A JP 2010530582A JP 2011502276 A5 JP2011502276 A5 JP 2011502276A5
- Authority
- JP
- Japan
- Prior art keywords
- methacrylate
- methyl
- butyl
- hydroxy
- maleimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- -1 beta-hydroxy-gamma-butyrolactone methacrylate ester Chemical class 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N 2-methyl-2-propenoic acid methyl ester Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- GQRTVVANIGOXRF-UHFFFAOYSA-N (2-methyl-1-adamantyl) prop-2-enoate Chemical compound C1C(C2)CC3CC1C(C)C2(OC(=O)C=C)C3 GQRTVVANIGOXRF-UHFFFAOYSA-N 0.000 description 1
- OOIBFPKQHULHSQ-UHFFFAOYSA-N (3-hydroxy-1-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2(O)CC1(OC(=O)C(=C)C)C3 OOIBFPKQHULHSQ-UHFFFAOYSA-N 0.000 description 1
- QSCWXXFUEZLVOQ-CMDGGOBGSA-M (E)-2-methyl-3-(2-methyl-2-adamantyl)prop-2-enoate Chemical compound C1C(C2)CC3CC1C(\C=C(/C)C([O-])=O)(C)C2C3 QSCWXXFUEZLVOQ-CMDGGOBGSA-M 0.000 description 1
- HTUVMQSHLRSVPT-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethenylbenzene Chemical compound CCOCCOC=CC1=CC=CC=C1 HTUVMQSHLRSVPT-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N Hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N Maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- JYVXNLLUYHCIIH-LURJTMIESA-N Mevalonolactone Chemical compound C[C@]1(O)CCOC(=O)C1 JYVXNLLUYHCIIH-LURJTMIESA-N 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N N-Methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinylpyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- WMUQQXZSTBBYPS-UHFFFAOYSA-N benzyl 2-phenylethenyl carbonate Chemical compound C=1C=CC=CC=1C=COC(=O)OCC1=CC=CC=C1 WMUQQXZSTBBYPS-UHFFFAOYSA-N 0.000 description 1
- SOGAXMICEFXMKE-UHFFFAOYSA-N butyl 2-methylprop-2-enoate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229940057061 mevalonolactone Drugs 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- XTXNWQHMMMPKKO-UHFFFAOYSA-N tert-butyl 2-phenylethenyl carbonate Chemical compound CC(C)(C)OC(=O)OC=CC1=CC=CC=C1 XTXNWQHMMMPKKO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
Description
酸不安定性単位を含むポリマーは、上に記載したような他の非吸収性モノマー性単位を含むこともできる。酸不安定性基を含むポリマーの例には、２−メチル−２−アダマンチルメタクリレート、メバロノラクトンメタクリレート、３−ヒドロキシ−１−アダマンチルメタクリレート、ベータ−ヒドロキシ−ガンマ−ブチロラクトンのメタクリレートエステル、ｔ−ブチルノルボルニルカルボキシレート、ｔ−ブチルメチルアダマンチルメタクリレート、メチルアダマンチルアクリレート、ｔ−ブチルアクリレート及びｔ−ブチルメタクリレート； ｔ−ブトキシカルボニルオキシビニルベンゼン、ベンジルオキシカルボニルオキシビニルベンゼン； エトキシエチルオキシビニルベンゼン； ビニルフェノールのトリメチルシリルエーテル、及びメチルメタクリレートの２−トリス（トリメチルシリル）シリルエチルエステルと、メチルメタクリレート、ブチルメタクリレート、アクリル酸、メタクリル酸、ビニルアルコール、無水マレイン酸、Ｎ−ビニルピロリジノン、マレイミド、Ｎ−メチルマレイミド、及びこれの類似物とのコポリマーなどが挙げられる。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/876,793 | 2007-10-23 | ||
| US11/876,793 US8088548B2 (en) | 2007-10-23 | 2007-10-23 | Bottom antireflective coating compositions |
| PCT/IB2008/002847 WO2009053832A2 (en) | 2007-10-23 | 2008-10-21 | Bottom antireflective coating compositions |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011502276A JP2011502276A (ja) | 2011-01-20 |
| JP2011502276A5 true JP2011502276A5 (ja) | 2011-11-24 |
| JP5499386B2 JP5499386B2 (ja) | 2014-05-21 |
Family
ID=40474943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010530582A Active JP5499386B2 (ja) | 2007-10-23 | 2008-10-21 | 底面反射防止膜用コーティング組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8088548B2 (ja) |
| EP (1) | EP2212273A2 (ja) |
| JP (1) | JP5499386B2 (ja) |
| KR (1) | KR101537833B1 (ja) |
| CN (1) | CN101835735A (ja) |
| MY (1) | MY148382A (ja) |
| TW (1) | TWI464537B (ja) |
| WO (1) | WO2009053832A2 (ja) |
Families Citing this family (89)
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-
2007
- 2007-10-23 US US11/876,793 patent/US8088548B2/en active Active
-
2008
- 2008-09-12 TW TW097135282A patent/TWI464537B/zh active
- 2008-10-21 CN CN200880113002A patent/CN101835735A/zh active Pending
- 2008-10-21 JP JP2010530582A patent/JP5499386B2/ja active Active
- 2008-10-21 WO PCT/IB2008/002847 patent/WO2009053832A2/en active Application Filing
- 2008-10-21 MY MYPI2010001800A patent/MY148382A/en unknown
- 2008-10-21 EP EP08843074A patent/EP2212273A2/en not_active Withdrawn
- 2008-10-21 KR KR1020107011146A patent/KR101537833B1/ko active IP Right Grant
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