JP2011256052A - Mold for molding glass substrate and method for producing glass substrate - Google Patents

Mold for molding glass substrate and method for producing glass substrate Download PDF

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JP2011256052A
JP2011256052A JP2010129008A JP2010129008A JP2011256052A JP 2011256052 A JP2011256052 A JP 2011256052A JP 2010129008 A JP2010129008 A JP 2010129008A JP 2010129008 A JP2010129008 A JP 2010129008A JP 2011256052 A JP2011256052 A JP 2011256052A
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glass substrate
molding surface
molding
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Masaya Kinoshita
将也 木下
Toshiya Tomisaka
俊也 富阪
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Konica Minolta Opto Inc
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Abstract

PROBLEM TO BE SOLVED: To provide a mold for molding glass substrate and a method for producing a glass substrate, that ensure good mold releasing of a glass substrate after molded and achieve molding of a glass substrate on which post-processes such as polishing can be performed in a short period of time.SOLUTION: A second press molding surface of an upper mold and a first press molding surface 31 of a lower mold 3 have a first region 32 and a second region 33 disposed on the outer peripheral side of the first region 32 in such a way that the second region 33 surrounds the first region 32. The first region 32 is configured in such a manner that the surface roughness of the first region 32 is made larger than that of the second region 33.

Description

本発明は、ガラス基板成形用金型及びガラス基板製造方法に関するものである。   The present invention relates to a glass substrate molding die and a glass substrate manufacturing method.

従来から、板状のガラス基板を製造するガラス基板製造方法として、例えば押圧成形面を有する上型と押圧成形面を有する下型とを備えたガラス基板成形用金型を用いて行なう方法が知られている。この方法は、下型の押圧成形面に供給された溶融状のガラス素材を、下型の押圧成形面と上型の押圧成形面とで押圧して板状のガラス基板に成形する。しかし、下型の押圧成形面及び上型の押圧成形面を平滑な面に形成していると成形後のガラス基板が押圧成形面から外れに難くなり、ガラス基板の型離れが悪くなるという問題点がある。   Conventionally, as a glass substrate manufacturing method for manufacturing a plate-like glass substrate, for example, a method of using a glass substrate molding die provided with an upper mold having a pressing surface and a lower mold having a pressing surface is known. It has been. In this method, the molten glass material supplied to the lower mold pressing surface is pressed between the lower mold pressing surface and the upper mold pressing surface to form a plate-shaped glass substrate. However, if the press molding surface of the lower mold and the press molding surface of the upper mold are formed as smooth surfaces, the glass substrate after molding becomes difficult to come off from the press molding surface, and the mold separation of the glass substrate becomes worse. There is a point.

一方、押圧成形面に粗面領域を形成したガラス基板成形用金型を用いて行なうものとして、例えば特許文献１に開示されたものがある。この方法は、上型の押圧成形面を、平滑領域と、平滑領域の外周側に配設され平滑領域よりも表面粗さが粗い粗面領域とで構成しておき、上型の押圧成形面と下型の押圧成形面との間に配設された溶融状のガラス素材をそれらの両押圧成形面で押圧して円板状のガラス基板を成形するようにしたものである。このような粗面領域を設けたものであれば、ガラス基板の型離れを改善できる。   On the other hand, as what is performed using the glass substrate shaping | molding die which formed the rough surface area | region in the press molding surface, there exist some which were disclosed by patent document 1, for example. In this method, the upper die pressing surface is composed of a smooth region and a rough surface region disposed on the outer peripheral side of the smooth region and having a rougher surface roughness than the smooth region. A molten glass material disposed between the lower mold and the press molding surface of the lower mold is pressed by both of the press molding surfaces to form a disk-shaped glass substrate. If such a rough surface area is provided, mold separation of the glass substrate can be improved.

特開２００８−２０８０１２号公報JP 2008-208012 A

ところで、例えば得られたガラス基板を情報記録媒体用として使用する場合は、その得られたガラス基板の中心部を取り除いてドーナツ状に形成した後、その表面を研磨加工等する。   By the way, for example, when the obtained glass substrate is used for an information recording medium, the center of the obtained glass substrate is removed to form a donut shape, and then the surface is polished.

しかしながら、上記特許文献１に開示のもののように、平滑領域の外周側に粗面領域を配設したのでは、その粗面領域の全体を平滑面になるまで研磨加工しなければならず、研磨加工等の後工程に時間がかかることになる。   However, if the rough surface region is disposed on the outer peripheral side of the smooth region as disclosed in Patent Document 1, the entire rough surface region must be polished until it becomes a smooth surface. It takes time for subsequent processes such as processing.

本発明は、成形後のガラス基板の型離れが良好で、しかも、研磨加工等の後工程を短時間で行い得るガラス基板を成形できるガラス基板成形用金型及びガラス基板製造方法の提供を目的とする。   An object of the present invention is to provide a glass substrate molding die and a glass substrate manufacturing method capable of forming a glass substrate that allows good mold separation of the glass substrate after molding and can perform subsequent steps such as polishing in a short time. And

上記課題を解決するため、本発明の一態様に係るガラス基板成形用金型は、互いに対向する第１押圧成形面と第２押圧成形面との間に配設された溶融状のガラス素材を、前記第１押圧成形面と第２押圧成形面とで押圧することによって板状のガラス基板に成形するガラス基板成形用金型であって、前記第１押圧成形面と第２押圧成形面との少なくとも一方は、第１領域と、前記第１領域の外周側に前記第１領域を囲むように配設された第２領域とを備え、前記第１領域は、前記第２領域よりも表面粗さが大きくなるように構成されていることを特徴とする。   In order to solve the above-mentioned problems, a glass substrate molding die according to an aspect of the present invention includes a molten glass material disposed between a first press molding surface and a second press molding surface facing each other. , A glass substrate molding die for molding into a plate-like glass substrate by pressing with the first press molding surface and the second press molding surface, wherein the first press molding surface and the second press molding surface; At least one of the first region and the second region disposed on the outer peripheral side of the first region so as to surround the first region, the first region being more surface than the second region It is characterized in that the roughness is increased.

この構成によれば、第１領域によって、成形後のガラス基板の型離れを良好にできる。また、例えば情報記録媒体用として使用する場合には、中心部に貫通孔を形成した後に両面を研磨するが、その貫通孔を形成する際に、第１領域を殆ど除去できる。従って、その後の研磨で第１領域を除去するための時間を短くできる。   According to this structure, the mold release of the glass substrate after shaping | molding can be made favorable by the 1st area | region. Further, for example, when used for an information recording medium, both sides are polished after forming a through hole in the central portion, but the first region can be almost removed when the through hole is formed. Therefore, the time for removing the first region in the subsequent polishing can be shortened.

他の一態様では、上述のガラス基板成形用金型において、前記ガラス基板成形用金型は、上型と、下型とを備え、前記第１押圧成形面は、前記下型に設けられ、前記第１領域は、前記第１押圧成形面の中心部を含むように構成されているものとすることができる。   In another aspect, in the glass substrate molding die described above, the glass substrate molding die includes an upper die and a lower die, and the first press-molding surface is provided on the lower die, The first region may be configured to include a central portion of the first press molding surface.

ガラス素材を第１押圧成形面に供給する際、真円度の高いものにするためには第１押圧成形面の中心部に滴下し始めるのが好ましいが、最初に滴下される下型の第１押圧成形面の中心部は、ガラス素材が最も温度の高い状態で供給される。そのため、例えば第１押圧成形面の中心部の表面粗さ（Ｒａ）が平滑な面になっている場合には、その中心部にガラス素材が強固に接着し（融着）、成形後のガラス基板が離れ難くなり、引き剥がしに大きな力が要ると共に、引き剥がした際に、上記中心部に接着したガラス素材の一部が破断して接着したまま残ってしまう場合がある。このような場合には、第１押圧成形面を再研磨等しなければ使用できず、工程が中断してしまう。   When supplying the glass material to the first press-molding surface, it is preferable to start dripping at the center of the first press-molded surface in order to achieve high roundness, The glass material is supplied at the highest temperature at the center of the 1-press molding surface. Therefore, for example, when the surface roughness (Ra) of the central portion of the first press-molding surface is a smooth surface, the glass material is firmly bonded (fused) to the central portion, and the glass after molding It becomes difficult to separate the substrate, and a large force is required for peeling off. When peeling off, a part of the glass material bonded to the central portion may be broken and remain bonded. In such a case, the first press-molded surface cannot be used unless it is re-polished, and the process is interrupted.

そこで、上記のように構成することにより、第１領域を、下型の第１押圧成形面の中心部を含むように構成すれば、供給されたガラス素材と第１領域との間に空気を介在させることができ、小さい力で容易に剥がすことができるとともに、ガラス素材の一部が破断して接着したまま残ってしまうようなことを防止できる。   Therefore, by configuring as described above, if the first region is configured to include the central portion of the first press molding surface of the lower mold, air is supplied between the supplied glass material and the first region. It can be interposed, and can be easily peeled off with a small force, and it can be prevented that a part of the glass material is broken and remains adhered.

また、他の一態様では、上述のガラス基板成形用金型において、前記第１領域は、円形状に形成されているとともに、その径方向に所定幅で、全周に渡って区画された複数の区画領域を備え、前記複数の区画領域は、互いに隣接する２つのうちの径外側のものが径内側のものよりも表面粗さが小さくなるようにして配設されている構成とできる。   According to another aspect, in the glass substrate molding die described above, the first region is formed in a circular shape, and has a plurality of sections having a predetermined width in the radial direction and partitioned over the entire circumference. The plurality of partition regions may be arranged such that the outer surface of the two adjacent regions is smaller in surface roughness than the inner surface.

この構成によれば、例えば最もガラス素材が接着し易い径内側の区画領域を、研磨工程で除去するのに時間を要する程度の大きさに粗くしておいても、情報記録媒体用基板に形成する際の貫通孔の穴あけで除去できる大きさにできる。その一方、径外側の区画領域を、研磨工程で比較的除去し易い程度の表面粗さで広範囲に形成でき、成形後の型離れを良好にできる。   According to this configuration, for example, even if the innermost partition area where the glass material is most likely to adhere is roughened to a size that requires time to be removed in the polishing process, it is formed on the substrate for the information recording medium. The size can be removed by drilling through-holes. On the other hand, the radially outer partition region can be formed over a wide range with a surface roughness that is relatively easy to remove in the polishing step, and the mold release after molding can be improved.

また、他の一態様では、上述のガラス基板成形用金型において、前記第１領域は、円形状に形成されているとともに、その径方向外側に行くに従って漸次表面粗さが小さくなるように構成されているものとすることができる。   According to another aspect, in the glass substrate molding die described above, the first region is formed in a circular shape, and the surface roughness gradually decreases toward the outside in the radial direction. Can be.

この構成によれば、情報記録媒体用基板に形成する際の中心部の貫通孔の穴あけで、表面粗さの大きい部分を除去できるとともに、その除去した後の第１領域は、径方向に表面粗さの差が大きい部分がなく、研磨工程で除去し易いものにできる。   According to this configuration, a portion having a large surface roughness can be removed by drilling a through hole at the center when forming the substrate for an information recording medium, and the first region after the removal is a surface in the radial direction. There is no portion with a large difference in roughness, and it can be easily removed in the polishing step.

また、他の一態様では、これら上述の何れかのガラス基板成形用金型において、前記第１領域は、その表面粗さが０．１μｍ〜３μｍの範囲になるように構成されているものとすることができる。   According to another aspect, in any one of the above glass substrate molding dies, the first region has a surface roughness in the range of 0.1 μm to 3 μm. can do.

この構成によれば、これにより、成形後のガラス基板の型離れをよくできるとともに、研磨工程での除去時間が長くなるのを抑えることができる。   According to this configuration, it is possible to improve the mold release of the glass substrate after molding, and to suppress an increase in the removal time in the polishing process.

又、本発明の一態様に係るガラス基板製造方法は、これら上述の何れかのガラス基板成形用金型を用いてガラス基板を成形するガラス基板製造方法であって、前記第１押圧成形面と第２押圧成形面との間に溶融状のガラス素材を配設し、前記第１押圧成形面と第２押圧成形面とで前記ガラス素材を押圧することにより板状のガラス基板を得ることを特徴とする方法である。   A glass substrate manufacturing method according to an aspect of the present invention is a glass substrate manufacturing method in which a glass substrate is formed using any of the above-described glass substrate forming molds, and the first press molding surface and Disposing a molten glass material between the second press molding surface and pressing the glass material with the first press molding surface and the second press molding surface to obtain a plate-like glass substrate It is a characteristic method.

この構成によれば、成形後のガラス基板の型離れが良好で、しかも、研磨加工等の後工程を短時間で行うことができる。   According to this structure, the mold release of the glass substrate after shaping | molding is favorable, and also post-processes, such as a grinding process, can be performed in a short time.

本発明にかかるガラス基板成形用金型は、成形後のガラス基板の型離れが良好で、しかも、研磨加工等の後工程を短時間で行い得るガラス基板を成形できる。そして、ガラス基板の型離れが良好で、研磨加工等の後工程を短時間で行い得るガラス基板製造方法を提供できる。   The mold for forming a glass substrate according to the present invention can form a glass substrate that has good mold separation from the molded glass substrate and can perform subsequent steps such as polishing in a short time. In addition, it is possible to provide a glass substrate manufacturing method in which the mold release of the glass substrate is good and a post-process such as polishing can be performed in a short time.

本発明の第１実施形態のガラス基板成形用金型の要部の正面図である。It is a front view of the principal part of the metal substrate molding die of a 1st embodiment of the present invention. 図１の下型の平面図である。It is a top view of the lower mold | type of FIG. 図２のＩＩＩ−ＩＩＩ線の一部を省略した拡大断面図である。It is the expanded sectional view which abbreviate | omitted some III-III lines of FIG. 下型の第１押圧成形面にガラス素材を供給する際の説明図である。It is explanatory drawing at the time of supplying a glass raw material to the 1st press molding surface of a lower mold | type. ガラス素材を下型の第１押圧成形面と上型の第２押圧成形面とで押圧した状態の要部の正面図である。It is a front view of the principal part of the state which pressed the glass raw material with the 1st press molding surface of the lower mold | type, and the 2nd press molding surface of the upper mold | type. 第２実施形態の下型の平面図である。It is a top view of the lower model of a 2nd embodiment. 図６のＶＩＩ−ＶＩＩ線の一部を省略した拡大断面図である。FIG. 7 is an enlarged cross-sectional view in which a part of the line VII-VII in FIG. 6 is omitted. 第３実施形態の下型の平面図である。It is a top view of the lower model of a 3rd embodiment. 図８のＩＸ−ＩＸ線の一部を省略した拡大断面図である。It is the expanded sectional view which abbreviate | omitted a part of IX-IX line of FIG. 成形したガラス基板の斜視図である。It is a perspective view of the shape | molded glass substrate.

以下、本発明を実施するための形態について、図面を参照しながら詳細に説明する。図１は、本発明の一実施形態のガラス基板成形用金型の要部の正面図である。   Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings. FIG. 1 is a front view of an essential part of a glass substrate molding die according to an embodiment of the present invention.

本発明のガラス基板成形用金型１は、ガラス基板、例えば情報記録媒体用に供されるものを成形する金型である。この第１実施形態のガラス基板成形用金型１は、上型２と、上型２の下方側に配設された下型３とを備えている。   The glass substrate molding die 1 of the present invention is a mold for molding a glass substrate, for example, one used for an information recording medium. The glass substrate molding die 1 according to the first embodiment includes an upper die 2 and a lower die 3 disposed on the lower side of the upper die 2.

下型３は、その上面に、円形状の第１押圧成形面３１を備えている。この第１押圧成形面３１は、後述の上型２の第２押圧成形面２１と対向し、第１押圧成形面３１と第２押圧成形面２１との間に配設された溶融状のガラス素材１０を、第１押圧成形面３１と第２押圧成形面２１とによって所定厚さの円板状に押圧成形できるようになっている（図５参照）。   The lower mold 3 includes a circular first pressing molding surface 31 on the upper surface. The first press molding surface 31 is opposed to a second press molding surface 21 of the upper mold 2 described later, and is a molten glass disposed between the first press molding surface 31 and the second press molding surface 21. The material 10 can be press-molded into a disk shape having a predetermined thickness by the first press-molding surface 31 and the second press-molding surface 21 (see FIG. 5).

第１押圧成形面３１は、図２、図３に示すように、径内側の円形状の第１領域３２と、第１領域３２の径外側（外周側）に、第１領域３２を囲むように第１領域３２の全周部に配設された第２領域３３とを備えている。   As shown in FIGS. 2 and 3, the first press-molding surface 31 surrounds the first region 32 on the radially inner circular first region 32 and on the radially outer side (outer peripheral side) of the first region 32. And a second region 33 disposed on the entire circumference of the first region 32.

第１領域３２は、この実施形態では、第１押圧成形面３１の中心Ｏを中心とする円形状の領域で、その直径Ｒ１が２５ｍｍである。この第１領域３２の表面粗さ（Ｒａ）は、３．０μｍになるように形成されている。尚、表面粗さ（Ｒａ）は、ＪＩＳＢ０６０１：２００１に規定されている算術平均高さのことであり、例えば触針式表面粗さ測定機を用いて測定できる。   In this embodiment, the first region 32 is a circular region centered on the center O of the first press-molding surface 31, and has a diameter R1 of 25 mm. The first region 32 has a surface roughness (Ra) of 3.0 μm. The surface roughness (Ra) is an arithmetic average height defined in JIS B0601: 2001, and can be measured using, for example, a stylus type surface roughness measuring machine.

第２領域３３は、第１領域３２と同心の円環状の領域で、その外周の直径Ｒ２が６５ｍｍで、内周の直径が２５ｍｍである。この第２領域３３の表面粗さ（Ｒａ）は、０．１μｍになるように形成されている。   The second region 33 is an annular region concentric with the first region 32, and has an outer diameter R2 of 65 mm and an inner diameter of 25 mm. The surface roughness (Ra) of the second region 33 is formed to be 0.1 μm.

これらの第１領域３２と第２領域３３とは、例えば、次のようにして形成できる。第１押圧成形面３１を、例えば研磨加工又は研削加工を施して形成するに際して調整することによって行なう。或いは、第１領域３２及び第２領域３３を研磨加工等によって表面粗さ（Ｒａ）が０．１μｍになるように形成し、その後、第１領域３２をブラスト処理或いはエッチング処理によって粗面化させて表面粗さ（Ｒａ）が３．０μｍになるように形成する。   The first region 32 and the second region 33 can be formed as follows, for example. For example, the first press-molding surface 31 is adjusted by forming it by performing polishing or grinding. Alternatively, the first region 32 and the second region 33 are formed by polishing or the like so that the surface roughness (Ra) is 0.1 μm, and then the first region 32 is roughened by blasting or etching. The surface roughness (Ra) is 3.0 μm.

又、この実施形態の下型３は、図示しないカートリッジヒーター（インサートヒーター）等の加熱部材によって第１押圧成形面３１が所定の温度で保持され得るように構成されている。尚、この第１押圧成形面３１の温度は、特に限定されないが、用いるガラス素材のガラス転移点（Ｔｇ）に対してー２００°Ｃ〜＋１００°Ｃの範囲（この実施形態では、５００°Ｃ）に保持するのが好ましい。   Further, the lower mold 3 of this embodiment is configured such that the first pressing surface 31 can be held at a predetermined temperature by a heating member such as a cartridge heater (insert heater) (not shown). The temperature of the first pressing surface 31 is not particularly limited, but is in the range of −200 ° C. to + 100 ° C. (in this embodiment, 500 ° C.) with respect to the glass transition point (Tg) of the glass material used. ) Is preferably retained.

又、この実施形態では、下型３は、図示しない駆動装置によって、図１の上下方向に移動可能とされており、これにより、第１押圧成形面３１が後述の上型２の第２押圧成形面２１に退行・接近する方向に移動可能になっている。   In this embodiment, the lower mold 3 can be moved in the vertical direction of FIG. 1 by a driving device (not shown), whereby the first press-molding surface 31 can be moved to the second press of the upper mold 2 described later. The molding surface 21 can be moved in the direction of retreating / approaching.

尚、この下型３の材質は、特に限定されず、例えばステンレス、超硬合金、鋳鉄、セラミック等を使用できる。   In addition, the material of this lower mold | type 3 is not specifically limited, For example, stainless steel, a cemented carbide, cast iron, a ceramic etc. can be used.

上型２は、図１に示すように、その下面に、円形状の第２押圧成形面２１を備えている。又、この実施形態では、第２押圧成形面２１は、第１押圧成形面３１と同様に、図示しないが第１領域と第２領域とを備えている。これらの第１領域と第２領域との夫々は、第１押圧成形面３１の第１領域３２、第２領域３３と同構成を採っている。   The upper mold | type 2 is equipped with the circular 2nd press molding surface 21 in the lower surface, as shown in FIG. Moreover, in this embodiment, the 2nd press molding surface 21 is provided with the 1st area | region and the 2nd area | region which are not shown in figure like the 1st press molding surface 31. FIG. Each of the first region and the second region has the same configuration as the first region 32 and the second region 33 of the first press-molding surface 31.

又、この上型２も、下型３と同様に、図示しないカートリッジヒーター（インサートヒーター）等の加熱部材によって、第２押圧成形面２１が所定の温度で保持され得るように構成されている。尚、この第２押圧成形面２１の温度も、特に限定されないが、用いるガラス素材のガラス転移点（Ｔｇ）に対してー２００°Ｃ〜＋１００°Ｃの範囲に保持するのが好ましい。   The upper die 2 is also configured so that the second press-molded surface 21 can be held at a predetermined temperature by a heating member such as a cartridge heater (insert heater) (not shown), like the lower die 3. The temperature of the second press-molding surface 21 is not particularly limited, but is preferably maintained in the range of −200 ° C. to + 100 ° C. with respect to the glass transition point (Tg) of the glass material to be used.

尚、この上型２の材質についても、特に限定されず、例えばステンレス、超硬合金、鋳鉄、セラミック等を使用できる。   The material of the upper mold 2 is not particularly limited, and for example, stainless steel, cemented carbide, cast iron, ceramic, or the like can be used.

次に、このガラス基板成形用金型１を用いてガラス基板を成形する方法について説明する。まず、溶融状（この実施形態では１１００°Ｃ〜１２００°Ｃの状態）にしたガラス素材１０を、下型３の第１押圧成形面３１に供給する。   Next, a method for forming a glass substrate using the glass substrate forming die 1 will be described. First, the glass material 10 in a molten state (in the state of 1100 ° C. to 1200 ° C. in this embodiment) is supplied to the first press molding surface 31 of the lower mold 3.

このガラス素材１０としては、例えばＳｉＯ２、Ｎａ２Ｏ、ＣａＯを主成分としたソ−ダライムガラス、又は、ＳｉＯ２、Ａｌ２Ｏ３、Ｒ２Ｏ（Ｒ＝Ｋ，Ｎａ、Ｌｉ）を主成分としたアルミノシリケートガラス、或いは、Ｌｉ２Ｏ−ＳｉＯ２系ガラス、さらには、Ｌｉ２Ｏ−Ａｌ２Ｏ３−ＳｉＯ２系ガラス等を使用できるが、これに限定されず、種々のものを使用できる。 As the glass material 10, for example SiO 2, Na 2 O, Seo mainly containing CaO - da-lime glass, or, SiO 2, Al 2 O 3 , R 2 O (R = K, Na, Li) and Aluminosilicate glass as a main component, Li 2 O—SiO 2 glass, or Li 2 O—Al 2 O 3 —SiO 2 glass or the like can be used, but the present invention is not limited to this, and various types can be used. Can be used.

又、ガラス素材１０を、第１押圧成形面３１に供給する際、図４に示すように第１押圧成形面３１の中心Ｏの位置に滴下し始めるのが好ましい。これにより、ガラス素材１０を、真円度の高い円形状に押圧できる。   Moreover, when supplying the glass material 10 to the 1st press molding surface 31, it is preferable to start dripping at the position of the center O of the 1st press molding surface 31, as shown in FIG. Thereby, the glass raw material 10 can be pressed in circular shape with high roundness.

その後、下型３を上昇させ、第１押圧成形面３１に供給されたガラス素材１０を、第１押圧成形面３１と上型２の第２押圧成形面２１とで押圧する。これにより、所定厚さの円板状のガラス基板１０ａを得ることができる。   Thereafter, the lower mold 3 is raised and the glass material 10 supplied to the first press molding surface 31 is pressed by the first press molding surface 31 and the second press molding surface 21 of the upper mold 2. Thereby, the disk-shaped glass substrate 10a of predetermined thickness can be obtained.

その後、下型３を下降させ、ガラス基板１０ａを金型１から取り出すが、その際、上型２の第２押圧成形面２１及び下型３の第１押圧成形面３１が表面粗さ（Ｒａ）３．０μｍの第１領域３２を備えているため、容易に剥がすことができる。   Thereafter, the lower mold 3 is lowered, and the glass substrate 10a is taken out from the mold 1. At this time, the second press molding surface 21 of the upper mold 2 and the first press molding surface 31 of the lower mold 3 are surface roughness (Ra ) Since the first region 32 of 3.0 μm is provided, it can be easily peeled off.

又、溶融状のガラス素材１０が供給される際に最初に滴下される下型３の第１押圧成形面３１の中心Ｏ及びその近傍は、ガラス素材１０の温度が最も高い状態で供給される。そのため、例えば下型３の中心Ｏ及びその近傍の表面粗さ（Ｒａ）が、例えば０．１μｍ以下の平滑な面になっているような場合には、第１押圧成形面３１にガラス素材１０が強固に接着し（融着）、成形後のガラス基板が離れ難くなり、引き剥がしに大きな力が要ると共に、引き剥がした際に、上記中心Ｏ及びその近傍に接着したガラス素材１０の一部が破断して接着したまま残ってしまう場合がある。このような場合には、第１押圧成形面３１を再研磨等しなければ使用できず、工程が中断してしまう。   Moreover, the center O of the 1st press molding surface 31 of the lower mold | type 3 first dripped when the molten glass raw material 10 is supplied, and its vicinity are supplied in the state with the highest temperature of the glass raw material 10. FIG. . Therefore, for example, when the surface roughness (Ra) of the center O of the lower mold 3 and the vicinity thereof is a smooth surface of, for example, 0.1 μm or less, the glass material 10 is formed on the first pressing molding surface 31. Is firmly bonded (fused), and it becomes difficult to separate the glass substrate after molding, and a large force is required for peeling, and when the glass substrate 10 is peeled off, the glass material 10 adhered to the center O and its vicinity. The part may break and remain adhered. In such a case, the first press-molding surface 31 cannot be used unless it is repolished, and the process is interrupted.

しかし、この実施形態では、第１押圧成形面３１の中心部に第１領域３２が配設されているため、供給されたガラス素材１０と第１領域３２との間に空気を介在させることができ、小さい力で容易に剥がすことができるとともに、ガラス素材の一部が破断して接着したまま残ってしまうようなことを防止できる。   However, in this embodiment, since the 1st area | region 32 is arrange | positioned in the center part of the 1st press molding surface 31, it can interpose air between the supplied glass raw material 10 and the 1st area | region 32. FIG. It can be easily peeled off with a small force, and it can be prevented that a part of the glass material is broken and remains adhered.

このようにして得られたガラス基板１０ａは、図１０に示すように、その両面１１夫々に、上型２の第２押圧成形面２１、下型３の第１押圧成形面３１が転写されており、第１領域が転写された径内側の第１領域転写部１１ａと、第２領域が転写された径外側の第２領域転写部１１ｂとを備えている。   As shown in FIG. 10, the glass substrate 10 a thus obtained has the second press molding surface 21 of the upper mold 2 and the first press molding surface 31 of the lower mold 3 transferred to both surfaces 11 thereof. The first area transfer portion 11a on the inner diameter side where the first area is transferred and the second area transfer portion 11b on the outer diameter side where the second area is transferred are provided.

以上のようにして得たガラス基板１０ａは、この実施形態では、機械加工等の加工が施されてドーナツ状の情報記録媒体用基板に成形される。   In this embodiment, the glass substrate 10a obtained as described above is processed into a doughnut-shaped information recording medium substrate by being subjected to processing such as machining.

より詳しくは、得れられたガラス基板１０ａは、その中心部が、コアドリル等で穴あけされ、例えば直径２０ｍｍの大きさの貫通孔１２（図１０の一点鎖線で示す）が形成されてドーナツ状に形成される。従って、この状態で、第１領域転写部１１ａが殆ど除去される。   More specifically, the obtained glass substrate 10a has a central portion drilled with a core drill or the like, and, for example, a through hole 12 having a diameter of 20 mm is formed (shown by a one-dot chain line in FIG. 10) to form a donut shape. It is formed. Accordingly, in this state, the first area transfer portion 11a is almost removed.

その後、両面１１が研磨（研削を含む）されて平滑な面（例えば表面粗さが０．２ｎｍ〜０．４ｎｍの面）に形成されるが、その研磨に際して、第１領域転写部１１ａを殆ど研磨することなく、表面粗さが第１領域転写部１１ａよりも小さい第２領域転写部１１ｂを研磨すればよく、容易に短時間で平滑面に形成できる。従って、第１領域転写部１１ａを有しないものを研磨する場合に比べて、研磨工程に要する時間が殆ど差違のないものにできる。   Thereafter, both surfaces 11 are polished (including grinding) to form a smooth surface (for example, a surface having a surface roughness of 0.2 nm to 0.4 nm). What is necessary is just to grind the 2nd area | region transfer part 11b whose surface roughness is smaller than the 1st area | region transfer part 11a, without grind | polishing, and it can form in a smooth surface easily in a short time. Accordingly, the time required for the polishing process can be made almost the same as that when the one without the first region transfer portion 11a is polished.

次に、第２実施形態のガラス基板成形用金型１００について、図６及び図７に基づいて説明する。第２実施形態の下型１３０の第１押圧成形面１３１及び上型１２０の第２押圧成形面１２１は、先の第１実施形態のものと同様に、第１領域１３２、１２２と、第２領域１３３、１２３とを備えている。   Next, the glass substrate molding die 100 of the second embodiment will be described with reference to FIGS. 6 and 7. The first press molding surface 131 of the lower mold 130 of the second embodiment and the second press molding surface 121 of the upper mold 120 are similar to those of the first embodiment, and the first regions 132, 122 and the second Regions 133 and 123.

下型１３０の第１領域１３２は、この第２実施形態では、第１押圧成形面１３１の中心Ｏを中心とする円形状の領域で、その直径Ｒ３が３０ｍｍである。又、第１領域１３２は、径方向に所定幅で全周に渡って区画された複数（この第２実施形態では２つ）の区画領域１３２ａ、１３２ｂを備えている。   In the second embodiment, the first region 132 of the lower mold 130 is a circular region centered on the center O of the first press-molding surface 131 and has a diameter R3 of 30 mm. The first region 132 includes a plurality of (two in the second embodiment) partitioned regions 132a and 132b partitioned over the entire circumference with a predetermined width in the radial direction.

２つの区画領域は、互いに隣接するうちの径外側の径大区画領域１３２ｂが径内側の径小区画領域１３２ａよりも表面粗さが小さくなるようにして配設されている。より詳しくは、径小区画領域１３２ａは、上記中心Ｏを中心にした直径Ｒ４が１０ｍｍの円形状の領域で、その表面粗さ（Ｒａ）は、３．０μｍに形成されている。   The two partitioned regions are arranged such that the larger diameter partitioned region 132b on the outer diameter side adjacent to each other has a smaller surface roughness than the smaller diameter partitioned region 132a on the inner diameter side. More specifically, the small-diameter partition region 132a is a circular region having a diameter R4 of 10 mm with the center O as the center, and the surface roughness (Ra) is formed to be 3.0 μm.

径大区画領域１３２ｂは、径小区画領域１３２ａと同心で、内径が１０ｍｍで、外径が３０ｍｍのドーナツ状の領域で、その表面粗さ（Ｒａ）は、１．０μｍに形成されている。   The large-diameter partition region 132b is a donut-shaped region that is concentric with the small-diameter partition region 132a, has an inner diameter of 10 mm, and an outer diameter of 30 mm, and has a surface roughness (Ra) of 1.0 μm.

第２領域１３３は、内径が３０ｍｍで、外径が６５ｍｍのドーナツ状の領域で、その表面粗さ（Ｒａ）は、０．１μｍに形成されている。   The second region 133 is a donut-shaped region having an inner diameter of 30 mm and an outer diameter of 65 mm, and has a surface roughness (Ra) of 0.1 μm.

上型１２０の第２押圧成形面１２１の第１領域１２２と第２領域１２３とは、下型１３０の第１領域１３２、第２領域１３３夫々と同構成を採っている。第２実施形態のその他は、先の第１実施形態のものと同構成を採っている。   The first region 122 and the second region 123 of the second press molding surface 121 of the upper mold 120 have the same configuration as the first region 132 and the second region 133 of the lower mold 130, respectively. The rest of the second embodiment has the same configuration as that of the first embodiment.

この第２実施形態のように構成することにより、最もガラス素材が接着し易い径小区画領域１３２ａを、研磨工程で除去するのに時間を要する程度の大きさに粗くしておいても、情報記録媒体用基板に形成する際の貫通孔１２の穴あけで除去できる。その一方、径外側の区画領域１３２ｂを、研磨工程で比較的除去し易い程度の表面粗さで広範囲に形成でき、成形後の型離れを良好にできる。   By configuring as in the second embodiment, even if the small-diameter divided region 132a to which the glass material is most easily bonded is roughened to a size that requires time to be removed in the polishing process, the information can be obtained. It can be removed by drilling the through-hole 12 when it is formed on the recording medium substrate. On the other hand, the partition region 132b outside the diameter can be formed over a wide range with a surface roughness that is relatively easy to remove in the polishing step, and the mold release after molding can be improved.

次に、第３実施形態のガラス基板成形用金型２００について、図８及び図９に基づいて説明する。第２実施形態の下型２３０の第１押圧成形面２３１及び上型２２０の第２押圧成形面２２１も、先の第１実施形態のものと同様に、第１領域２３２、２２２と、第２領域２３３、２２３とを備えている。   Next, a glass substrate molding die 200 according to the third embodiment will be described with reference to FIGS. The first press molding surface 231 of the lower mold 230 of the second embodiment and the second press molding surface 221 of the upper mold 220 also have the first regions 232 and 222 and the second press molding surface 221 as in the first embodiment. Regions 233 and 223.

下型１３０の第１領域２３２は、この第３実施形態では、第１押圧成形面２３１の中心Ｏを中心とする円形状の領域で、その直径Ｒ５が３０ｍｍである。第１領域２３２の表面粗さ（Ｒａ）は、径外側（外周側）に行くに従って漸次小さくなるように構成されている。   In the third embodiment, the first region 232 of the lower mold 130 is a circular region centered on the center O of the first press-molding surface 231 and has a diameter R5 of 30 mm. The surface roughness (Ra) of the first region 232 is configured to gradually decrease toward the outer diameter side (outer peripheral side).

詳しくは、第１領域２３２は、その中心Ｏで表面粗さ（Ｒａ）が最も大きく、３．０μｍに形成されている。そして、径外側（外周側）に行くに従ってその表面粗さ（Ｒａ）が漸次小さくなるように形成され、第２領域２３３との境界で第２領域２３３と同じになるように形成されている。   Specifically, the first region 232 has the largest surface roughness (Ra) at the center O, and is formed to 3.0 μm. And it is formed so that the surface roughness (Ra) becomes gradually smaller toward the outer side (outer peripheral side), and is formed to be the same as the second region 233 at the boundary with the second region 233.

第２領域２３３は、その表面粗さ（Ｒａ）が０．１μｍになるように形成されている。   The second region 233 is formed so that its surface roughness (Ra) is 0.1 μm.

上型２２０の第２押圧成形面２２１の第１領域２２２と第２領域２２３とは、下型２３０の第１領域２３２、第２領域２３３夫々と同構成を採っている。第３実施形態のその他は、先の第１実施形態のものと同構成を採っている。   The first area 222 and the second area 223 of the second press molding surface 221 of the upper mold 220 have the same configuration as the first area 232 and the second area 233 of the lower mold 230, respectively. The rest of the third embodiment has the same configuration as that of the first embodiment.

この第３実施形態のように構成することにより、径方向外側に漸次表面粗さを小さくしているため、情報記録媒体用基板に形成する際の貫通孔１２の穴あけで、表面粗さの大きい部分を除去できるとともに、その除去した後の第１領域２３２は、径方向に表面粗さの差が大きい部分なく、研磨工程で比較的除去し易いものにできる。   By configuring as in the third embodiment, the surface roughness is gradually reduced outward in the radial direction, so that the surface roughness is large when the through hole 12 is formed in the information recording medium substrate. The portion can be removed, and the first region 232 after the removal can be made relatively easy to remove in the polishing step without a portion having a large difference in surface roughness in the radial direction.

尚、上記実施形態では、上型の第２押圧成形面と下型の第１押圧成形面とに、夫々、第１領域と第２領域とを形成したが、この形態のものに限らず、適宜変更でき、上型の第２押圧成形面と下型の第１押圧成形面との何れか一方に、第１領域と第２領域とを形成すればよい。   In the above embodiment, the first region and the second region are formed on the second press molding surface of the upper die and the first press molding surface of the lower die, respectively. The first region and the second region may be formed on any one of the upper die second pressing surface and the lower die first pressing surface.

ただし、下型の第１押圧成形面の中心及びその近傍は、溶融状のガラス素材１０が供給される際に最初に滴下されてガラス素材が強固に接着しやすいので、少なくとも下型の第１押圧成形面に第１領域と第２領域とを形成しておくのが好ましい。   However, the center and the vicinity of the first press molding surface of the lower mold are first dropped when the molten glass material 10 is supplied, and the glass material is easily firmly bonded, so at least the first mold of the lower mold It is preferable to form the first region and the second region on the pressing surface.

又、上型の第２押圧成形面と下型の第１押圧成形面との夫々に、第１領域と第２領域とを形成する場合において、第２押圧成形面と下型の第１押圧成形面との夫々の第１領域を同じにしてもよいが、異なるものにしてもよい。   Further, when the first region and the second region are formed on the second press molding surface of the upper die and the first press molding surface of the lower die, respectively, the second press molding surface and the first press of the lower die are formed. Each first area with the molding surface may be the same or different.

又、第１領域の表面粗さの大きさは、特に限定されない。ただし、表面粗さが０．１μｍよりも小さくなると、成形後のガラス基板の型離れをよくできなくなる。一方、表面粗さが３．０μｍを超えると、研磨工程での除去時間が長くなってしまう。従って、第１領域を、０．１μｍよりも小さく、３．０μｍを超えない範囲内の表面粗さのものにしておくのが好ましい。   Moreover, the magnitude | size of the surface roughness of a 1st area | region is not specifically limited. However, if the surface roughness is less than 0.1 μm, the mold release of the glass substrate after molding cannot be improved. On the other hand, when the surface roughness exceeds 3.0 μm, the removal time in the polishing process becomes long. Therefore, it is preferable that the first region has a surface roughness within a range smaller than 0.1 μm and not exceeding 3.0 μm.

又、第１領域の大きさについても、特に限定されない。ただし、情報記録媒体用基板に形成する際にあける貫通孔１２と同程度の大きさ又はそれ以下の大きさのものにしておけば、貫通孔１２をあける際に、全部又は大部分を除去できる点で好ましい。   Also, the size of the first region is not particularly limited. However, if the through-hole 12 is formed, the whole or most of the through-hole 12 can be removed if the through-hole 12 is formed to have the same size as or smaller than the through-hole 12 formed on the information recording medium substrate. This is preferable.

又、上記実施形態では、下型３を上側に可動させるようにしているが、この形態のものに限らず、適宜変更できる。例えば下型３を可動させずに上型２を下側に可動させるようにし、或いは、下型３を上側に可動させるとともに、上型２を下側に可動させるようにしてもよい。   Moreover, in the said embodiment, although the lower mold | type 3 is made to move upwards, it can change suitably not only in this form. For example, the upper mold 2 may be moved downward without moving the lower mold 3, or the lower mold 3 may be moved upward and the upper mold 2 may be moved downward.

１、１００、２００ ガラス基板成形用金型
２、１２０、２２０ 上型
３、１３０、２３０ 下型
３１、１３１，２３１ 第１押圧成形面
２１、１２１、２２１ 第２押圧成形面
３２、１３２，２３２ 第１領域
３３、１３３，２３３ 第２領域
１０ ガラス素材
１０ａ ガラス基板 1, 100, 200 Glass substrate molding die 2, 120, 220 Upper mold 3, 130, 230 Lower mold 31, 131, 231 First press molding surface 21, 121, 221 Second press molding surface 32, 132, 232 First region 33, 133, 233 Second region 10 Glass material 10a Glass substrate

Claims (6)

互いに対向する第１押圧成形面と第２押圧成形面との間に配設された溶融状のガラス素材を、前記第１押圧成形面と第２押圧成形面とで押圧することによって板状のガラス基板に成形するガラス基板成形用金型であって、
前記第１押圧成形面と第２押圧成形面との少なくとも一方は、第１領域と、前記第１領域の外周側に前記第１領域を囲むように配設された第２領域とを備え、
前記第１領域は、前記第２領域よりも表面粗さが大きくなるように構成されていることを特徴とするガラス基板成形用金型。 By pressing a molten glass material disposed between a first press molding surface and a second press molding surface facing each other with the first press molding surface and the second press molding surface, a plate-like shape is obtained. A glass substrate molding mold for molding on a glass substrate,
At least one of the first press-molding surface and the second press-molding surface includes a first region and a second region disposed on the outer peripheral side of the first region so as to surround the first region,
The glass substrate molding die, wherein the first region is configured to have a surface roughness larger than that of the second region. 前記ガラス基板成形用金型は、上型と、下型とを備え、
前記第１押圧成形面は、前記下型に設けられ、
前記第１領域は、前記第１押圧成形面の中心部を含むように構成されていることを特徴とする請求項１に記載のガラス基板成形用金型。 The glass substrate molding die includes an upper die and a lower die,
The first press molding surface is provided on the lower mold,
2. The glass substrate molding die according to claim 1, wherein the first region is configured to include a central portion of the first press molding surface. 前記第１領域は、円形状に形成されているとともに、その径方向に所定幅で、全周に渡って区画された複数の区画領域を備え、
前記複数の区画領域は、互いに隣接する２つのうちの径外側のものが径内側のものよりも表面粗さが小さくなるようにして配設されていることを特徴とする請求項１又は２記載のガラス基板成形用金型。 The first region is formed in a circular shape, and includes a plurality of partition regions having a predetermined width in the radial direction and partitioned over the entire circumference.
3. The plurality of partition regions are arranged such that a surface roughness is smaller at a radially outer side of two adjacent regions than that at a radially inner side. Mold for glass substrate molding. 前記第１領域は、円形状に形成されているとともに、その径方向外側に行くに従って漸次表面粗さが小さくなるように構成されていることを特徴とする請求項１又は２記載のガラス基板成形用金型。   3. The glass substrate molding according to claim 1, wherein the first region is formed in a circular shape, and is configured such that the surface roughness gradually decreases toward the outer side in the radial direction. Mold. 前記第１領域は、その表面粗さが０．１μｍ〜３μｍの範囲になるように構成されていることを特徴とする請求項１〜４の何れか一項に記載のガラス基板成形用金型。   5. The glass substrate molding die according to claim 1, wherein the first region has a surface roughness in a range of 0.1 μm to 3 μm. . 請求項１〜５の何れか一項に記載のガラス基板成形用金型を用いてガラス基板を成形するガラス基板製造方法であって、
前記第１押圧成形面と第２押圧成形面との間に溶融状のガラス素材を配設し、前記第１押圧成形面と第２押圧成形面とで前記ガラス素材を押圧することにより板状のガラス基板を得ることを特徴とするガラス基板製造方法。 It is a glass substrate manufacturing method which shape | molds a glass substrate using the glass substrate shaping die as described in any one of Claims 1-5,
A molten glass material is disposed between the first pressure molding surface and the second pressure molding surface, and the glass material is pressed between the first pressure molding surface and the second pressure molding surface to form a plate shape. A glass substrate manufacturing method comprising obtaining a glass substrate.
JP2010129008A 2010-06-04 2010-06-04 Mold for molding glass substrate and method for producing glass substrate Pending JP2011256052A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014050496A1 (en) * 2012-09-27 2014-04-03 Hoya株式会社 Method for producing glass substrate for information recording medium
CN108779017A (en) * 2016-03-17 2018-11-09 Ａｇｃ株式会社 Glass plate and glass structures

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014050496A1 (en) * 2012-09-27 2014-04-03 Hoya株式会社 Method for producing glass substrate for information recording medium
CN108779017A (en) * 2016-03-17 2018-11-09 Ａｇｃ株式会社 Glass plate and glass structures
JPWO2017159412A1 (en) * 2016-03-17 2019-01-24 Ａｇｃ株式会社 Glass plate and glass structure
EP3431449A4 (en) * 2016-03-17 2019-10-16 Agc Inc. Glass plate and glass structure

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