JP2011127218A - 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 - Google Patents
薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 Download PDFInfo
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- JP2011127218A JP2011127218A JP2010187379A JP2010187379A JP2011127218A JP 2011127218 A JP2011127218 A JP 2011127218A JP 2010187379 A JP2010187379 A JP 2010187379A JP 2010187379 A JP2010187379 A JP 2010187379A JP 2011127218 A JP2011127218 A JP 2011127218A
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- 238000000427 thin-film deposition Methods 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims abstract description 72
- 230000003068 static effect Effects 0.000 claims abstract description 49
- 230000005611 electricity Effects 0.000 claims abstract description 48
- 238000000034 method Methods 0.000 claims abstract description 10
- 238000000151 deposition Methods 0.000 claims description 9
- 239000012044 organic layer Substances 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 26
- 239000010409 thin film Substances 0.000 description 18
- 238000007740 vapor deposition Methods 0.000 description 14
- 239000010408 film Substances 0.000 description 9
- 230000008021 deposition Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
【解決手段】基板110を支持するホルダー102と、基板の一面に対向するように配されるマスク103と、基板とマスクとの間に発生した静電気をマスクに電流を流して除去する静電気除去部120と、を備える薄膜蒸着装置とする。
【選択図】図1
Description
Light Emitting Diode:OLED)のアノード電極になる第1電極層321が連結される。前記第1電極層321は平坦化膜337の上部に形成されており、この第1電極層321を覆うように画素定義膜338が形成される。そして、この画素定義膜338に所定の開口部を形成した後、OLEDの有機層326が形成され、これらの上部に共通電極として第2電極層327が蒸着される。
102 ホルダー
103 マスク
104 蒸着源
110 基板
120 静電気除去部
Claims (8)
- 基板を支持するホルダーと、
前記基板の一面に対向するように配されるマスクと、
前記基板と前記マスクとの間の静電気を除去する静電気除去部と、
を備えることを特徴とする薄膜蒸着装置。 - 前記静電気除去部は、前記基板と前記マスクとの間に発生した静電気を前記マスクに電流を流して除去することを特徴とする請求項1に記載の薄膜蒸着装置。
- 前記静電気除去部は、一定の時間間隔で前記マスクに前記電流を流すことを特徴とする請求項2に記載の薄膜蒸着装置。
- 前記静電気除去部は、
前記マスクに電流を供給する電源と、
前記電流量を調節する抵抗と、
前記電源、前記抵抗、及び前記マスクと連結されて閉回路をなす電線と、
を備えることを特徴とする請求項1に記載の薄膜蒸着装置。 - 基板上に、互いに対向する第1電極及び第2電極と、前記第1電極及び第2電極の間に位置する有機層とを備える有機発光ディスプレイ装置の製造方法であって、
前記基板の一面に対向するように配されたマスクを通じて前記基板上に前記有機層を蒸着する工程と、
前記マスクと前記基板との間の静電気を除去する工程と、
前記マスクと前記基板とを互いに離隔させる工程と、
を含むことを特徴とする有機発光ディスプレイ装置の製造方法。 - 前記静電気除去工程は、前記マスクに電流を流して前記静電気を除去することを特徴とする請求項5に記載の有機発光ディスプレイ装置の製造方法。
- 前記静電気除去工程は、一定の時間間隔で前記マスクに前記電流を流すことを特徴とする請求項6に記載の有機発光ディスプレイ装置の製造方法。
- 前記静電気除去工程は、前記マスク、前記マスクに電流を供給する電源、及び前記電流の量を調節する抵抗が閉回路をなして、前記マスクに電流を供給することを特徴とする請求項6に記載の有機発光ディスプレイ装置の製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0125029 | 2009-12-15 | ||
KR1020090125029A KR101156433B1 (ko) | 2009-12-15 | 2009-12-15 | 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
Publications (2)
Publication Number | Publication Date |
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JP2011127218A true JP2011127218A (ja) | 2011-06-30 |
JP5557653B2 JP5557653B2 (ja) | 2014-07-23 |
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JP2010187379A Active JP5557653B2 (ja) | 2009-12-15 | 2010-08-24 | 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US8173481B2 (ja) |
JP (1) | JP5557653B2 (ja) |
KR (1) | KR101156433B1 (ja) |
CN (1) | CN102148234B (ja) |
TW (1) | TWI560288B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014145130A (ja) * | 2013-01-29 | 2014-08-14 | Samsung Display Co Ltd | 蒸着マスク |
KR20150066510A (ko) * | 2013-08-19 | 2015-06-16 | 주식회사 엘지화학 | 유기물 마스크를 포함하는 적층체 및 이를 이용한 유기 발광 소자의 제조방법 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101968664B1 (ko) * | 2012-08-06 | 2019-08-14 | 삼성디스플레이 주식회사 | 박막 형성 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
CN105144844B (zh) * | 2013-03-29 | 2017-05-31 | 大日本印刷株式会社 | 元件制造方法以及元件制造装置 |
KR20150053161A (ko) * | 2013-11-07 | 2015-05-15 | 삼성디스플레이 주식회사 | 증착 장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 |
CN106159107B (zh) | 2016-08-09 | 2018-05-29 | 京东方科技集团股份有限公司 | 有机发光二极管照明灯片及其制备方法 |
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2009
- 2009-12-15 KR KR1020090125029A patent/KR101156433B1/ko active IP Right Grant
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- 2010-08-24 JP JP2010187379A patent/JP5557653B2/ja active Active
- 2010-12-08 US US12/962,910 patent/US8173481B2/en active Active
- 2010-12-14 TW TW099143846A patent/TWI560288B/zh active
- 2010-12-14 CN CN201010599753.0A patent/CN102148234B/zh active Active
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- 2012-04-02 US US13/437,848 patent/US8482422B2/en active Active
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JP2014145130A (ja) * | 2013-01-29 | 2014-08-14 | Samsung Display Co Ltd | 蒸着マスク |
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Also Published As
Publication number | Publication date |
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TWI560288B (en) | 2016-12-01 |
CN102148234B (zh) | 2015-05-27 |
US20120186517A1 (en) | 2012-07-26 |
JP5557653B2 (ja) | 2014-07-23 |
US8482422B2 (en) | 2013-07-09 |
US8173481B2 (en) | 2012-05-08 |
US20110143473A1 (en) | 2011-06-16 |
KR20110068179A (ko) | 2011-06-22 |
CN102148234A (zh) | 2011-08-10 |
TW201127970A (en) | 2011-08-16 |
KR101156433B1 (ko) | 2012-06-18 |
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