JP2010096833A

JP2010096833A - Scanning exposure apparatus and scanning exposure method

Info

Publication number: JP2010096833A
Application number: JP2008265184A
Authority: JP
Inventors: Takumi Togashi; 工富樫; Masaaki Matsuzaka; 昌明松坂; Hironori Kawashima; 洋徳川島
Original assignee: NSK Ltd
Current assignee: NSK Ltd
Priority date: 2008-10-14
Filing date: 2008-10-14
Publication date: 2010-04-30

Abstract

<P>PROBLEM TO BE SOLVED: To provide a scanning exposure apparatus and a scanning exposure method for suppressing influences of shadows of a light-shielding member on exposure when the light-shielding member is made to return toward an upstream side. <P>SOLUTION: In the scanning exposure apparatus 1, each light-shielding part 14 includes a plurality of light-shielding members 60, 61, 62, 63 disposed as movable at different heights from one another, wherein the light-shielding member 63 disposed at the highest position and having a wavy form on both side faces intersecting an X direction includes a width w4 in the X-direction larger than those of other light-shielding members 60, 61, 62. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、スキャン露光装置およびスキャン露光方法に関し、より詳細には、液晶ディスプレイやプラズマディスプレイ等の大型のフラットパネルディスプレイのカラーフィルタ基板やアレイ基板等に所望のパターンを露光転写するのに好適なスキャン露光装置およびスキャン露光方法に関する。 The present invention relates to a scan exposure apparatus and a scan exposure method, and more particularly, suitable for exposing and transferring a desired pattern to a color filter substrate or an array substrate of a large flat panel display such as a liquid crystal display or a plasma display. The present invention relates to a scan exposure apparatus and a scan exposure method.

大型の薄形テレビ等に用いられる液晶ディスプレイやプラズマディスプレイ等の大型のフラットパネルディスプレイの露光方法として、マスクを細分化して、これらマスクを保持する複数のマスク保持部を千鳥状に配置し、基板を一方向に移動させながら露光を行うスキャン露光方式が知られている（例えば、特許文献１参照。）。この露光方式では、基板に形成されるパターンに、ある程度繰り返される部位があることを前提として、これをつなぎ合わせることで大きなパターンを形成できることを利用したものである。この場合、マスクは、パネルに合わせて大きくする必要がなく、比較的安価なマスクを用いることができる。 As an exposure method for large flat panel displays such as liquid crystal displays and plasma displays used in large thin TVs, etc., the mask is subdivided, and a plurality of mask holders for holding these masks are arranged in a staggered manner, and the substrate There is known a scanning exposure method in which exposure is performed while moving the lens in one direction (see, for example, Patent Document 1). This exposure method utilizes the fact that a large pattern can be formed by joining together on the premise that there is a portion that is repeated to some extent in the pattern formed on the substrate. In this case, the mask does not need to be large in accordance with the panel, and a relatively inexpensive mask can be used.

また、特許文献１に記載の露光装置では、複数の遮光部材を用いて、基板の移動速度に合わせて遮光部材を移動させると共に、露光中に、移動した遮光部材を重ね合わせながら上流側に移動させるようにして、遮光部材の移動に伴う露光への影響を抑えることが提案されている。
特開２００７−３１０００７号公報 In the exposure apparatus described in Patent Document 1, a plurality of light shielding members are used to move the light shielding member in accordance with the moving speed of the substrate, and during exposure, the moved light shielding member is moved to the upstream side while being overlapped. Thus, it has been proposed to suppress the influence on the exposure due to the movement of the light shielding member.
JP 2007-310007 A

ところで、上記スキャン露光装置では、遮光部材が高い位置にある場合には、露光光が回折して遮光部材の内側へ回り込む光の幅が大きくなる一方、遮光部材が低い位置にある場合には、遮光部材の内側へ回り込む光の幅が小さい。このため、例えば、複数の遮光部材を重ね合わせながら上流側に戻す際、下方に位置する２枚の遮光部材が最も上流側と下流側に位置すると、遮光部材の影が露光に影響する可能性がある。
また、遮光部材はすべて長方形状の薄板によって形成され、移動方向の両側面が該移動方向と直交する方向に延びているため、遮光部材を高速で戻したとしても、遮光部材の移動方向の両側面による影が露光に影響する可能性がある。 By the way, in the above scanning exposure apparatus, when the light shielding member is at a high position, the width of light that diffracts the exposure light and wraps around the inside of the light shielding member is increased, while when the light shielding member is at a low position, The width of the light that goes inside the light shielding member is small. For this reason, for example, when returning a plurality of light shielding members to the upstream side while overlapping them, if the two light shielding members located below are located on the most upstream side and downstream side, the shadow of the light shielding member may affect the exposure. There is.
In addition, since the light shielding members are all formed of a rectangular thin plate and both side surfaces in the moving direction extend in a direction perpendicular to the moving direction, even if the light shielding member is returned at high speed, both sides in the moving direction of the light shielding member Surface shadows can affect exposure.

本発明は、前述した課題に鑑みてなされたものであり、その目的は、遮光部材を上流側に戻す際に、遮光部材の影が露光に影響するのをできるだけ抑えることができるスキャン露光装置及びスキャン露光方法を提供することにある。 The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a scanning exposure apparatus that can suppress the influence of the shadow of the light shielding member on the exposure as much as possible when returning the light shielding member to the upstream side. It is to provide a scanning exposure method.

本発明の上記目的は、下記の構成により達成される。
（１）所定の方向に沿って基板を搬送可能な基板搬送機構と、
複数のマスクをそれぞれ保持する複数のマスク保持部と、
前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、
前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、
を備え、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置であって、
前記各遮光部は、それぞれ異なる高さで移動可能に配置される複数の遮光部材を有し、
最も高い位置に配置される前記遮光部材は、前記所定の方向における幅が他の遮光部材のものより広いことを特徴とするスキャン露光装置。
（２）前記最も高い位置に配置される前記遮光部材は、前記所定の方向における両側面が、前記所定の方向と直交する方向に対して傾斜して、或いは、曲線状に設けられていることを特徴とする（１）に記載のスキャン露光装置。
（３）前記最も高く配置される前記遮光部材は、前記所定の方向における両側面が、波状に形成されていることを特徴とする（２）に記載のスキャン露光装置。
（４）所定の方向に沿って基板を搬送可能な基板搬送機構と、
複数のマスクをそれぞれ保持する複数のマスク保持部と、
前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、
前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、
を備え、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置であって、
前記各遮光部は、それぞれ異なる高さで移動可能に配置される少なくとも２枚の遮光部材を有し、
前記２枚の遮光部材の一方の前記所定の方向における上流側側面と、前記他方の遮光部材の前記所定の方向における下流側側面とは、前記所定の方向と直交する方向に対して傾斜して、或いは、曲線状に形成され、前記一方の遮光部材の下流側側面と、前記他方の遮光部材の上流側側面とは、前記直交方向に沿った直線状に形成されることを特徴とするスキャン露光装置。 The above object of the present invention can be achieved by the following constitution.
(1) a substrate transport mechanism capable of transporting a substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiation units that are respectively disposed above the plurality of mask holding units and irradiate the exposure light;
A plurality of light shielding portions arranged between each of the irradiation units and each of the mask holding units, for shielding the exposure light emitted from the irradiation unit;
A scanning exposure apparatus that irradiates the substrate transported in the predetermined direction with exposure light through the mask and exposes the pattern of the mask on the substrate,
Each of the light shielding portions has a plurality of light shielding members arranged to be movable at different heights,
The scan exposure apparatus, wherein the light shielding member arranged at the highest position has a width in the predetermined direction wider than that of other light shielding members.
(2) The light-shielding member disposed at the highest position is provided such that both side surfaces in the predetermined direction are inclined with respect to a direction orthogonal to the predetermined direction or are curved. (1) The scan exposure apparatus according to (1).
(3) The scan exposure apparatus according to (2), wherein the light shielding member disposed at the highest height has both side surfaces in the predetermined direction formed in a wave shape.
(4) a substrate transport mechanism capable of transporting a substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiation units that are respectively disposed above the plurality of mask holding units and irradiate the exposure light;
A plurality of light shielding portions arranged between each of the irradiation units and each of the mask holding units, for shielding the exposure light emitted from the irradiation unit;
A scanning exposure apparatus that irradiates the substrate transported in the predetermined direction with exposure light through the mask and exposes the pattern of the mask on the substrate,
Each of the light-shielding portions has at least two light-shielding members arranged to be movable at different heights,
The upstream side surface in one predetermined direction of the two light shielding members and the downstream side surface in the predetermined direction of the other light shielding member are inclined with respect to a direction orthogonal to the predetermined direction. Alternatively, the scan is formed in a curved shape, and the downstream side surface of the one light shielding member and the upstream side surface of the other light shielding member are formed in a straight line along the orthogonal direction. Exposure device.

（５）所定の方向に沿って基板を搬送可能な基板搬送機構と、複数のマスクをそれぞれ保持する複数のマスク保持部と、前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、を備え、該各遮光部は、それぞれ異なる高さで移動可能に配置される少なくとも３枚の遮光部材を有し、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置のスキャン露光方法であって、
前記基板が前記マスクの下方で搬送されている状態で、前記複数の遮光部材を前記基板と同速度で前記所定の方向に移動させることによって、前記マスクのパターンを遮光して前記基板に遮光領域を形成する工程と、
前記基板が前記マスクの下方で搬送されている状態で、前記マスクに対して下流側に移動した後の前記複数の遮光部材を前記所定の方向と反対方向に移動させ、前記露光中の前記マスクのパターンを横切って、前記マスクに対して上流側に戻す工程と、
を有し、
前記遮光工程は、下から２枚の前記遮光部材を最も上流側と最も下流側に配置した状態で行なわれ、
前記戻し工程は、最も高く配置される前記所定の方向における幅が最も広い前記遮光部材の下方に、前記残りの遮光部材を配置した状態で行なわれることを特徴とするスキャン露光方法。
（６）所定の方向に沿って基板を搬送可能な基板搬送機構と、複数のマスクをそれぞれ保持する複数のマスク保持部と、前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、を備え、該各遮光部は、それぞれ異なる高さで移動可能に配置される少なくとも２枚の遮光部材を有し、該２枚の遮光部材の一方の前記所定の方向における上流側側面と、前記他方の遮光部材の前記所定の方向における下流側側面とは、前記所定の方向と直交する方向に対して傾斜して、或いは、曲線状に形成され、前記一方の遮光部材の下流側側面と、前記他方の遮光部材の上流側側面とは、前記直交方向に沿った直線状に形成されており、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置のスキャン露光方法であって、
前記基板が前記マスクの下方で搬送されている状態で、前記遮光部材を前記基板と同速度で前記所定の方向に移動させることによって、前記マスクのパターンを遮光して前記基板に遮光領域を形成する工程と、
前記基板が前記マスクの下方で搬送されている状態で、前記マスクに対して下流側に移動した後の前記複数の遮光部材を前記所定の方向と反対方向に移動させ、前記露光中の前記マスクのパターンを横切って、前記マスクに対して上流側に戻す工程と、
を有し、
前記遮光工程は、前記一方の遮光部材の上流側側面と前記他方の遮光部材の下流側側面とをオーバーラップさせた状態で行なわれ、
前記戻し工程は、前記一方の遮光部材の下流側側面と前記他方の遮光部材の上流側側面とをオーバーラップさせた状態で行なわれることを特徴とするスキャン露光方法。 (5) A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of mask holders, which are disposed above the plurality of mask holders, respectively. A plurality of irradiation units that irradiate the light, and a plurality of light shielding units that are arranged between the respective irradiation units and the respective mask holding units and shield the exposure light emitted from the irradiation unit, Each light shielding portion has at least three light shielding members arranged to be movable at different heights, and irradiates exposure light through the mask onto the substrate transported in the predetermined direction. A scan exposure method of a scan exposure apparatus for exposing the pattern of the mask to the substrate,
With the substrate being transported under the mask, the plurality of light shielding members are moved in the predetermined direction at the same speed as the substrate, thereby shielding the mask pattern and shielding the substrate from the light shielding region. Forming a step;
In a state where the substrate is transported under the mask, the plurality of light shielding members after moving downstream with respect to the mask are moved in a direction opposite to the predetermined direction, and the mask being exposed Crossing the pattern and returning to the upstream side with respect to the mask;
Have
The light shielding step is performed in a state where the two light shielding members from the bottom are arranged on the most upstream side and the most downstream side,
The scanning exposure method, wherein the returning step is performed in a state where the remaining light shielding member is disposed below the light shielding member having the widest width in the predetermined direction.
(6) A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and the exposure light disposed above the plurality of mask holders, respectively. A plurality of irradiation units that irradiate the light, and a plurality of light shielding units that are arranged between the respective irradiation units and the respective mask holding units and shield the exposure light emitted from the irradiation unit, Each of the light shielding portions has at least two light shielding members that are movably arranged at different heights. One of the two light shielding members on the upstream side surface in the predetermined direction and the other light shielding member. The downstream side surface in the predetermined direction of the member is inclined with respect to a direction orthogonal to the predetermined direction or formed in a curved shape, and the downstream side surface of the one light shielding member and the other side surface What is the upstream side of the shading member? A scan that is formed in a straight line along the orthogonal direction and irradiates the substrate with the exposure light through the mask and exposes the pattern of the mask onto the substrate. A scanning exposure method for an exposure apparatus, comprising:
With the substrate being transported under the mask, the light shielding member is moved in the predetermined direction at the same speed as the substrate, thereby shielding the mask pattern and forming a light shielding region on the substrate. And a process of
In a state where the substrate is transported under the mask, the plurality of light shielding members after moving downstream with respect to the mask are moved in a direction opposite to the predetermined direction, and the mask being exposed Crossing the pattern and returning to the upstream side with respect to the mask;
Have
The light shielding step is performed in a state where the upstream side surface of the one light shielding member and the downstream side surface of the other light shielding member are overlapped,
The scanning exposure method, wherein the returning step is performed in a state where the downstream side surface of the one light shielding member and the upstream side surface of the other light shielding member overlap each other.

本発明のスキャン露光装置によれば、各遮光部は、それぞれ異なる高さで移動可能に配置される複数の遮光部材を有し、最も高い位置に配置される遮光部材は、所定の方向における幅が他の遮光部材のものより広いので、遮光部材を上流側に戻す際に、遮光部材の影が露光に影響するのをできるだけ抑えることができる。
また、最も高い位置に配置される遮光部材は、所定の方向における両側面が、所定の方向と直交する方向に対して傾斜して、或いは、曲線状に設けられているので、遮光部材を上流側に戻す際に、遮光部材の影が露光に影響するのをさらに抑えることができる。
さらに、上記遮光部材を有するスキャン露光装置のスキャン露光方法によれば、遮光工程は、下から２枚の遮光部材を最も上流側と最も下流側に配置した状態で行なわれ、戻し工程は、最も高く配置される所定の方向における幅が最も広い遮光部材の下方に、他の遮光部材を配置した状態で行なわれるので、遮光部材を用いて露光用光を遮光する際に、精度の良い遮光領域が形成可能であると共に、遮光部材を上流側に戻す際に、遮光部材の影が露光に影響するのをできるだけ抑えることができる。 According to the scanning exposure apparatus of the present invention, each light shielding portion has a plurality of light shielding members arranged to be movable at different heights, and the light shielding member arranged at the highest position has a width in a predetermined direction. However, when the light shielding member is returned to the upstream side, the influence of the shadow of the light shielding member on the exposure can be suppressed as much as possible.
Further, since the light shielding member disposed at the highest position is provided with both side surfaces in a predetermined direction inclined or curved with respect to a direction orthogonal to the predetermined direction, the light shielding member is disposed upstream. When returning to the side, it is possible to further suppress the shadow of the light shielding member from affecting the exposure.
Further, according to the scan exposure method of the scan exposure apparatus having the light shielding member, the light shielding step is performed in a state where the two light shielding members from the bottom are arranged on the most upstream side and the most downstream side, and the returning step is most performed. Since it is performed in a state where another light-shielding member is arranged below the light-shielding member having the widest width in a predetermined direction, a highly accurate light-shielding region when shielding the exposure light using the light-shielding member. Can be formed, and when returning the light shielding member to the upstream side, it is possible to suppress the shadow of the light shielding member from affecting the exposure as much as possible.

また、本発明のスキャン露光装置及びスキャン露光方法によれば、各遮光部は、それぞれ異なる高さで移動可能に配置される少なくとも２枚の遮光部材を有し、２枚の遮光部材の一方の所定の方向における上流側側面と、前記他方の遮光部材の前記所定の方向における下流側側面とは、前記所定の方向と直交する方向に対して傾斜して、或いは、曲線状に形成され、前記一方の遮光部材の下流側側面と、前記他方の遮光部材の上流側側面とは、前記直交方向に沿った直線状に形成される。これにより、遮光工程は、一方の遮光部材の上流側側面と他方の遮光部材の下流側側面とをオーバーラップさせた状態で行なわれ、直線状の側面によって精度の良い遮光領域が形成可能である。また、戻し工程は、一方の遮光部材の下流側側面と他方の遮光部材の上流側側面とをオーバーラップさせた状態で行なわれ、非直線状の側面によって遮光部材の影が露光に影響するのをできるだけ抑えることができる。 Further, according to the scan exposure apparatus and the scan exposure method of the present invention, each light shielding portion has at least two light shielding members that are movably arranged at different heights, and one of the two light shielding members. The upstream side surface in a predetermined direction and the downstream side surface in the predetermined direction of the other light shielding member are inclined with respect to a direction orthogonal to the predetermined direction or formed in a curved shape, The downstream side surface of one light shielding member and the upstream side surface of the other light shielding member are formed in a straight line shape along the orthogonal direction. Thus, the light shielding step is performed in a state where the upstream side surface of one light shielding member and the downstream side surface of the other light shielding member overlap each other, and a highly accurate light shielding region can be formed by the linear side surface. . The returning step is performed in a state where the downstream side surface of one light shielding member and the upstream side surface of the other light shielding member overlap each other, and the shadow of the light shielding member affects the exposure by the non-linear side surface. Can be suppressed as much as possible.

（第１実施形態）
以下、本発明の第１実施形態に係るスキャン露光装置及びスキャン露光方法の実施形態を図面に基づいて詳細に説明する。尚、以下の説明では、下地パターン層であるブラックマトリクス層が形成された露光領域と、下地パターン層が形成されていない非露光領域を有した、複数のカラーフィルタ用パネルを形成するためのガラス基板に、赤（Ｒ）、緑（Ｇ）、青（Ｂ）の着色層のいずれかを形成する近接スキャン露光装置及び露光方法について説明する。 (First embodiment)
Hereinafter, embodiments of a scan exposure apparatus and a scan exposure method according to a first embodiment of the present invention will be described in detail with reference to the drawings. In the following description, a glass for forming a plurality of color filter panels having an exposed region in which a black matrix layer as a base pattern layer is formed and a non-exposed region in which a base pattern layer is not formed. A proximity scanning exposure apparatus and an exposure method for forming any of red (R), green (G), and blue (B) colored layers on a substrate will be described.

先ず、本実施形態の近接スキャン露光装置１の構成について概略説明する。図１及び図２に示すように、本実施形態のスキャン露光装置１は、基板（カラーフィルタ基板）Ｗを浮上させて支持すると共に、所定方向（図１のＸ方向）に搬送する基板搬送機構１０と、複数のマスクＭをそれぞれ保持し、所定方向と直交する方向（図１のＹ方向）に沿って千鳥状に二列配置された複数（図１に示す実施形態において、左右それぞれ６個）のマスク保持部１１と、マスク保持部１１を駆動するマスク駆動部１２と、複数のマスク保持部１１の上部にそれぞれ配置されて露光用光を照射する複数の照射部１３と、各照射部１３と各マスク保持部１１との間にそれぞれ配置され、照射部１３から出射された露光用光を遮光する複数の遮光部１４と、スキャン露光装置１の各作動部分の動きを制御する制御部１５と、を主に備える。 First, a schematic configuration of the proximity scan exposure apparatus 1 of the present embodiment will be described. As shown in FIGS. 1 and 2, the scan exposure apparatus 1 of the present embodiment floats and supports a substrate (color filter substrate) W and transports it in a predetermined direction (X direction in FIG. 1). 10 and a plurality of masks M, each holding a plurality of masks M and arranged in two rows in a staggered manner along a direction orthogonal to a predetermined direction (Y direction in FIG. 1) (in the embodiment shown in FIG. ) Mask holding unit 11, mask driving unit 12 that drives the mask holding unit 11, a plurality of irradiation units 13 that are arranged above the plurality of mask holding units 11 and irradiate exposure light, and each irradiation unit 13 and each mask holding unit 11, a plurality of light shielding units 14 that shield the exposure light emitted from the irradiation unit 13, and a control unit that controls the movement of each operating part of the scan exposure apparatus 1. 15 and mainly comprises .

基板搬送機構１０は、浮上ユニット１６と、基板ＷのＹ方向一側（図１において上辺）を保持してＸ方向に搬送する基板駆動ユニット１７とを備える。浮上ユニット１６は、複数のフレーム１９上にそれぞれ設けられた複数の排気エアパッド２０及び吸排気エアパッド２１を備え、ポンプ（図示せず）やソレノイドバルブ（図示せず）を介して排気エアパッド２０や吸排気エアパッド２１からエアを排気或いは、吸排気する。基板駆動ユニット１７は、図１に示すように、浮上ユニット１６によって浮上、支持された基板Ｗの一端を保持する吸着パッド２２を備え、モータ２３、ボールねじ２４、及びナット（図示せず）からなるボールねじ機構２５によって、ガイドレール２６に沿って基板ＷをＸ方向に搬送する。なお、図２に示すように、複数のフレーム１９は、地面にレベルブロック１８を介して設置された装置ベース２７上に他のレベルブロック２８を介して配置されている。また、基板Ｗは、ボールねじ機構２５の代わりに、リニアサーボアクチュエータによって搬送されてもよい。 The substrate transport mechanism 10 includes a floating unit 16 and a substrate driving unit 17 that holds one side of the substrate W in the Y direction (upper side in FIG. 1) and transports it in the X direction. The levitation unit 16 includes a plurality of exhaust air pads 20 and intake / exhaust air pads 21 respectively provided on a plurality of frames 19, and the exhaust air pads 20 and the intake / exhaust air pads 21 are provided via pumps (not shown) and solenoid valves (not shown). Air is exhausted or sucked and exhausted from the exhaust air pad 21. As shown in FIG. 1, the substrate driving unit 17 includes a suction pad 22 that holds one end of the substrate W that is levitated and supported by the levitating unit 16, and includes a motor 23, a ball screw 24, and a nut (not shown). The substrate W is transported in the X direction along the guide rail 26 by the ball screw mechanism 25. As shown in FIG. 2, the plurality of frames 19 are arranged via another level block 28 on the apparatus base 27 installed on the ground via the level block 18. Further, the substrate W may be transported by a linear servo actuator instead of the ball screw mechanism 25.

マスク駆動部１２は、フレーム（図示せず）に取り付けられ、マスク保持部１１をＸ方向に沿って駆動するＸ方向駆動部３１と、Ｘ方向駆動部３１の先端に取り付けられ、マスク保持部１１をＹ方向に沿って駆動するＹ方向駆動部３２と、Ｙ方向駆動部３２の先端に取り付けられ、マスク保持部１１をθ方向（Ｘ，Ｙ方向からなる水平面の法線回り）に回転駆動するθ方向駆動部３３と、θ方向駆動部３３の先端に取り付けられ、マスク保持部１１をＺ方向（Ｘ，Ｙ方向からなる水平面の鉛直方向）に駆動するＺ方向駆動部３４と、を有する。これにより、Ｚ方向駆動部３４の先端に取り付けられたマスク保持部１１は、マスク駆動部１２によってＸ，Ｙ，Ｚ，θ方向に駆動可能である。なお、Ｘ，Ｙ，θ，Ｚ方向駆動部３１，３２，３３，３４の配置の順序は、適宜変更可能である。 The mask drive unit 12 is attached to a frame (not shown), and is attached to the X direction drive unit 31 that drives the mask holding unit 11 along the X direction, and the tip of the X direction drive unit 31. Is attached to the tip of the Y direction drive unit 32, and the mask holding unit 11 is rotationally driven in the θ direction (around the horizontal plane of the X and Y directions). A θ-direction drive unit 33 and a Z-direction drive unit 34 that is attached to the tip of the θ-direction drive unit 33 and drives the mask holding unit 11 in the Z direction (vertical direction of the horizontal plane composed of the X and Y directions). Accordingly, the mask holding unit 11 attached to the tip of the Z direction driving unit 34 can be driven in the X, Y, Z, and θ directions by the mask driving unit 12. Note that the order of arrangement of the X, Y, θ, and Z direction drive units 31, 32, 33, and 34 can be changed as appropriate.

また、図１に示すように、千鳥状に二列配置された搬入側及び搬出側マスク保持部１１ａ，１１ｂ間には、各マスク保持部１１ａ，１１ｂのマスクＭを同時に交換可能なマスクチェンジャ２が配設されている。マスクチェンジャ２により搬送される使用済み或いは未使用のマスクＭは、マスクストッカ３，４との間でローダー５により受け渡しが行われる。なお、マスクストッカ３，４とマスクチェンジャ２とで受け渡しが行われる間にマスクプリアライメント機構（図示せず）によってマスクＭのプリアライメントが行われる。 Further, as shown in FIG. 1, a mask changer 2 in which the masks M of the mask holding portions 11a and 11b can be simultaneously exchanged between the carry-in side and carry-out side mask holding portions 11a and 11b arranged in two rows in a staggered manner. Is arranged. The used or unused mask M transported by the mask changer 2 is transferred to and from the mask stockers 3 and 4 by the loader 5. The mask M is pre-aligned by a mask pre-alignment mechanism (not shown) during the transfer between the mask stockers 3 and 4 and the mask changer 2.

図２に示すように、マスク保持部１１の上部に配置される照射部１３は、ＹＡＧレーザーや、エキシマレーザー等の光源４１と、この光源４１から照射された光を集光する凹面鏡４２と、この凹面鏡４２の焦点近傍に切替え自在に配置された二種類のオプチカルインテグレータ４３と、光路の向きを変えるための平面ミラー４５及び球面ミラー４６と、この平面ミラー４５とオプチカルインテグレータ４３との間に配置されて照射光路を開閉制御する露光制御用シャッター４４と、を備える。なお、光源４１としては、紫外線を含んだ連続光に放射する、超高圧水銀ランプであってもよく、フラッシュ光を放射するＹＡＧレーザーやエキシマレーザーであってもよい。 As shown in FIG. 2, the irradiation unit 13 disposed on the upper part of the mask holding unit 11 includes a light source 41 such as a YAG laser or an excimer laser, and a concave mirror 42 that collects light emitted from the light source 41, Two types of optical integrators 43 arranged so as to be switchable near the focal point of the concave mirror 42, a plane mirror 45 and a spherical mirror 46 for changing the direction of the optical path, and arranged between the plane mirror 45 and the optical integrator 43. And an exposure control shutter 44 for controlling the opening and closing of the irradiation light path. The light source 41 may be an ultra-high pressure mercury lamp that emits continuous light including ultraviolet light, or a YAG laser or excimer laser that emits flash light.

図３に示すように、各遮光部１４は、それぞれ異なる高さで移動可能に配置される第１〜第４の遮光部材６０，６１，６２，６３を有する。各遮光部材６０，６１，６２，６３は、搬送方向に直交する方向に延在しており、その一端部はリニアモータ７０，７１，７２，７３に連結されている。リニアモータ７０，７１，７２，７３は、不図示のドライバにより、ガイドレール７５，７６，７７，７８に沿ってＸ軸方向に移動自在となっている。 As shown in FIG. 3, each light shielding portion 14 includes first to fourth light shielding members 60, 61, 62, 63 that are movably arranged at different heights. Each light shielding member 60, 61, 62, 63 extends in a direction orthogonal to the transport direction, and one end thereof is connected to linear motors 70, 71, 72, 73. The linear motors 70, 71, 72, 73 are movable in the X-axis direction along guide rails 75, 76, 77, 78 by a driver (not shown).

これら遮光部材６０，６１，６２，６３のうち、第１〜第３の遮光部材６０，６１，６２は、Ｘ方向（所定の方向）における両側面が直交方向に沿った直線状の略長方形に形成される一方、最も高い位置に配置される第４の遮光部材６３は、Ｘ方向における両側面が波状に形成されている。また、第４の遮光部材６３の搬送方向における最も狭い位置での幅ｗ４は、残りの遮光部材６０，６１，６２の幅ｗ１，ｗ２，ｗ３より広くなるように設定されている。これにより、４つの遮光部材６０，６１，６２，６３は、第４の遮光部材６３の下方に、残りの遮光部材６０，６１，６２が上面視で隠れるように配置することができる。 Among these light shielding members 60, 61, 62, 63, the first to third light shielding members 60, 61, 62 have a substantially rectangular shape with both side surfaces in the X direction (predetermined direction) along the orthogonal direction. On the other hand, the fourth light shielding member 63 arranged at the highest position is formed in a wavy shape on both side surfaces in the X direction. The width w4 at the narrowest position in the transport direction of the fourth light shielding member 63 is set to be wider than the widths w1, w2, and w3 of the remaining light shielding members 60, 61, and 62. Accordingly, the four light shielding members 60, 61, 62, and 63 can be arranged below the fourth light shielding member 63 so that the remaining light shielding members 60, 61, and 62 are hidden in a top view.

なお、第４の遮光部材６３のＸ方向における両側面は、波状に限定されず、曲線状に形成されればよく、或いは、平行四辺形や台形等によって、該直交方向に対して傾斜して形成されてもよい。ただし、波状とすることで、遮光部材の影を効果的にぼかすことができると共に、Ｘ方向における幅の増加を抑えることができる。
また、第４の遮光部材６３のＸ方向における両側面は、該直交方向に対して傾斜して設けられればよいので、基板Ｗ、若しくは、マスクＭのパターンに対して、即ち、該直交方向に対して若干斜めに配置されてもよく、この場合は長方形状のものが使用されてもよい。
また、本実施形態では、第１及び第２の遮光部材６０，６１の幅ｗ１，ｗ２を同一としている。 Note that both side surfaces of the fourth light shielding member 63 in the X direction are not limited to a wave shape and may be formed in a curved shape, or may be inclined with respect to the orthogonal direction by a parallelogram, a trapezoid, or the like. It may be formed. However, by making it wavy, it is possible to effectively blur the shadow of the light shielding member and to suppress an increase in the width in the X direction.
Further, both side surfaces of the fourth light shielding member 63 in the X direction may be provided so as to be inclined with respect to the orthogonal direction, so that the substrate W or the mask M pattern, that is, in the orthogonal direction. On the other hand, it may be arranged slightly obliquely, and in this case, a rectangular shape may be used.
In the present embodiment, the widths w1 and w2 of the first and second light shielding members 60 and 61 are the same.

次に、このように構成された近接スキャン露光装置１の動作について説明する。ここで、使用される基板としては、例えば、図４に示すように、パネル間の非露光領域ＮＲを有する基板Ｗを用い、赤（Ｒ）、緑（Ｇ）、青（Ｂ）の着色層のいずれかのパターンを基板Ｗに塗布されたフォトレジストに転写する場合について説明する。 Next, the operation of the proximity scan exposure apparatus 1 configured as described above will be described. Here, as the substrate used, for example, as shown in FIG. 4, a substrate W having a non-exposed region NR between panels is used, and red (R), green (G), and blue (B) colored layers are used. A case where any one of the above patterns is transferred to a photoresist coated on the substrate W will be described.

近接スキャン露光装置１は、浮上ユニット１６の排気エアパッド２０及び吸排気エアパッド２１の空気流によって基板Ｗを浮上させて保持し、基板Ｗの一端を基板駆動ユニット１７で吸着してＸ方向に一定の速度で搬送する。そして、マスク保持部１１の下方に位置する基板Ｗに対して、照射部１３からの露光用光ＥＬがマスクＭを介して照射され、マスクＭのパターンを基板Ｗに塗布されたフォトレジストに転写する。このとき、基板ＷとマスクＭとの位置誤差は、図示しない撮像手段が検出する基板Ｗ及びマスクＭの位置データに基づいて制御部１５から出力される指令信号によって、θ方向駆動部３３、及びＹ方向駆動部３２が作動してマスクＭの位置を微調整することで補正（位置合わせ）される。 The proximity scanning exposure apparatus 1 floats and holds the substrate W by the air flow of the exhaust air pad 20 and the intake / exhaust air pad 21 of the floating unit 16, and adsorbs one end of the substrate W by the substrate driving unit 17 to be constant in the X direction. Transport at speed. The substrate W located below the mask holding unit 11 is irradiated with the exposure light EL from the irradiation unit 13 through the mask M, and the pattern of the mask M is transferred to the photoresist applied to the substrate W. To do. At this time, the positional error between the substrate W and the mask M is determined by the θ direction drive unit 33 and the command signal output from the control unit 15 based on the position data of the substrate W and the mask M detected by an imaging unit (not shown). Correction is performed (position alignment) by operating the Y-direction drive unit 32 and finely adjusting the position of the mask M.

ここで、図５に示すように、基板ＷがマスクＭの下方で搬送され、基板Ｗにパターンの露光転写が行なわれている状態で、基板Ｗの非露光領域ＮＲがマスクＭのパターン領域の下方に入る。すると、マスクＭに対して上流側に待機していた複数の遮光部材６０，６１，６２，６３は、搬送方向に必要重ね代を持って並べられ非露光領域ＮＲの幅に対応するように配置される。そして、遮光部材６０，６１，６２，６３を基板Ｗの搬送と同速度でＸ方向に移動させ、マスクＭのパターンを遮光して、非露光領域ＮＲ上に遮光領域を形成する。 Here, as shown in FIG. 5, the non-exposed region NR of the substrate W is the pattern region of the mask M while the substrate W is transported under the mask M and the pattern is exposed and transferred to the substrate W. Go down. Then, the plurality of light shielding members 60, 61, 62, 63 that have been waiting on the upstream side with respect to the mask M are arranged with a necessary overlap margin in the transport direction and arranged so as to correspond to the width of the non-exposure region NR. Is done. Then, the light shielding members 60, 61, 62, 63 are moved in the X direction at the same speed as the conveyance of the substrate W to shield the pattern of the mask M, thereby forming a light shielding region on the non-exposure region NR.

このとき、下から２枚の第１及び第２の遮光部材６０，６１が、最も上流側と最も下流側に配置されることで、露光光が回折して遮光部材６０，６１の内側へ回り込む光の幅が小さくなり、露光領域ＥＲと被露光領域ＮＲ（遮光領域）との境界をくっきりと露光転写することができる。 At this time, the two first and second light shielding members 60 and 61 from the bottom are arranged on the most upstream side and the most downstream side, so that the exposure light is diffracted and goes inside the light shielding members 60 and 61. The width of the light is reduced, and the transfer between the exposure area ER and the exposed area NR (light-shielding area) can be clearly exposed and transferred.

一方、図６に示すように、遮光動作が完了し、次の遮光領域を遮光するまでの露光動作中、マスクＭに対して下流側に移動した後の遮光部材６０，６１，６２，６３をＸ方向と反対方向に高速で移動させ、露光中のマスクＭのパターンを横切って、マスクＭに対して上流側に戻す必要がある。この戻し工程時には、最も高く配置される第４の遮光部材６３の下方に、残りの遮光部材６０，６１，６２が隠れるように重なって配置されることで、遮光部材６０，６１，６２，６３が横切る幅をできるだけ小さくして露光への影響を極力抑えることができ、また、露光光が回折して第４の遮光部材６３の内側へ回り込む光の幅が大きくなり、遮光部材６３の影がくっきりと残らず、露光への影響を抑えることができる。また、遮光部材６３のＸ方向における両側面が波状に形成されているので、直線状のすじムラとならず、遮光部材６３の影を分散してぼかすことができ、露光への影響を抑えることができる。 On the other hand, as shown in FIG. 6, during the exposure operation until the light shielding operation is completed and the next light shielding region is shielded, the light shielding members 60, 61, 62, and 63 after moving to the downstream side with respect to the mask M are moved. It is necessary to move at a high speed in the direction opposite to the X direction and to return to the upstream side with respect to the mask M across the pattern of the mask M being exposed. At the time of this returning process, the remaining light shielding members 60, 61, 62 are arranged so as to be hidden below the fourth light shielding member 63 that is arranged highest, thereby shielding the light shielding members 60, 61, 62, 63. The width of the light shielding member 63 can be made as small as possible to suppress the influence on the exposure as much as possible, and the width of the light that diffracts the exposure light and wraps inside the fourth light shielding member 63 is increased. It does not remain clearly and the influence on exposure can be suppressed. In addition, since both side surfaces of the light shielding member 63 in the X direction are formed in a wave shape, there is no linear streak unevenness, and the shadow of the light shielding member 63 can be dispersed and blurred, thereby suppressing the influence on exposure. Can do.

以上説明したように、本実施形態のスキャン露光装置１、各遮光部１４は、それぞれ異なる高さで移動可能に配置される複数の遮光部材６０，６１，６２，６３を有し、最も高い位置に配置される第４の遮光部材６３は、Ｘ方向における幅ｗ４が他の遮光部材６０，６１，６２のものより広いので、遮光部材６０，６１，６２，６３を上流側に戻す際に、遮光部材の影が露光に影響するのをできるだけ抑えることができる。 As described above, the scanning exposure apparatus 1 of the present embodiment and each light shielding unit 14 have a plurality of light shielding members 60, 61, 62, and 63 that are movably arranged at different heights, and the highest position. Since the width w4 in the X direction is wider than that of the other light shielding members 60, 61, 62, the fourth light shielding member 63 arranged at the position of when the light shielding members 60, 61, 62, 63 are returned to the upstream side. It is possible to suppress the shadow of the light shielding member from affecting the exposure as much as possible.

また、第４の遮光部材６３は、Ｘ方向における両側面が、Ｙ方向に対して傾斜して、或いは、波状のような曲線状に形成されているので、遮光部材６０，６１，６２，６３を上流側に戻す際に、遮光部材の影が露光に影響するのをさらに抑えることができる。 The fourth light shielding member 63 has both side surfaces in the X direction inclined with respect to the Y direction or formed in a wavy curved shape, so that the light shielding members 60, 61, 62, and 63 are formed. When returning to the upstream side, the influence of the shadow of the light shielding member on the exposure can be further suppressed.

さらに、スキャン露光方法によれば、遮光工程は、下から２枚の第１及び第２の遮光部材６０，６１を最も上流側と最も下流側に配置した状態で行なわれ、戻し工程は、最も高く配置されるＸ方向における幅ｗ４が最も広い第４の遮光部材６３の下方に、他の遮光部材６０，６１，６２を配置した状態で行なわれるので、遮光部材６０，６１，６２，６３を用いて露光用光を遮光する際に、精度の良い遮光領域が形成可能であると共に、遮光部材６０，６１，６２，６３を上流側に戻す際に、遮光部材の影が露光に影響するのをできるだけ抑えることができる。 Further, according to the scan exposure method, the light shielding step is performed in a state where the first and second light shielding members 60 and 61 from the bottom are arranged on the most upstream side and the most downstream side, and the returning step is most performed. Since the other light shielding members 60, 61, 62 are disposed below the fourth light shielding member 63 having the widest width w4 in the X direction, the light shielding members 60, 61, 62, 63 are arranged. It is possible to form a light-shielding region with high accuracy when shielding the exposure light by using it, and the shadow of the light-shielding member affects the exposure when the light-shielding members 60, 61, 62, 63 are returned to the upstream side. Can be suppressed as much as possible.

なお、各遮光部材６０，６１，６２，６３の高さは任意に設定できるが、露光領域と遮光領域の境界の露光精度に影響を与える下から２枚の遮光部材６０，６１は、マスクＭの上面にできるだけ近い方が好ましく、一方、戻し工程で露光への影響を抑える遮光部材６３は、その下の遮光部材６２との高さ方向の間隔を、下から２枚の遮光部材６０，６１同士の間隔より大きくして、できるだけ高く配置されることが望ましい。 The height of each light shielding member 60, 61, 62, 63 can be set arbitrarily, but the two light shielding members 60, 61 from the bottom that affect the exposure accuracy at the boundary between the exposure region and the light shielding region are mask M. On the other hand, the light shielding member 63 that suppresses the influence on the exposure in the returning step has a height direction distance from the lower light shielding member 62 of the two light shielding members 60 and 61 from the bottom. It is desirable that the gap be arranged as high as possible with a gap larger than the distance between them.

また、最も高く配置される遮光部材は、本実施形態のように波状に形成するほうが好ましいが、図７に示すように、長方形状の遮光部材６３ａであっても上記効果を奏することができる。 Further, it is preferable that the light shielding member arranged highest is formed in a wave shape as in the present embodiment, but the above-described effect can be achieved even with a rectangular light shielding member 63a as shown in FIG.

（第２実施形態）
次に、本発明の第２実施形態に係るスキャン露光装置及びスキャン露光方法の実施形態を図面に基づいて詳細に説明する。なお、本実施形態は、遮光部の遮光部材の構成において第１実施形態と異なる。そのため、第１実施形態と同一または同等部分については、同一符号を付して説明を省略或いは簡略化する。 (Second Embodiment)
Next, a scan exposure apparatus and a scan exposure method according to a second embodiment of the present invention will be described in detail with reference to the drawings. In addition, this embodiment differs from 1st Embodiment in the structure of the light-shielding member of a light-shielding part. For this reason, the same or equivalent parts as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted or simplified.

本実施形態では、各遮光部１４は、それぞれ異なる高さで配置される２枚の遮光部材６４，６５を有し、その一端部はリニアモータ７０，７１に連結され、不図示のドライバにより、ガイドレール７５，７６に沿ってＸ軸方向に移動可能となっている。 In this embodiment, each light-shielding part 14 has two light-shielding members 64 and 65 arranged at different heights, one end of which is connected to linear motors 70 and 71, and a driver (not shown) It can move along the guide rails 75 and 76 in the X-axis direction.

遮光部材６４，６５は、Ｘ方向における一側面をＹ方向に沿った直線状、Ｘ方向における他側面を波状とした幅ｗ５を有した同一形状とし、互いにＸ方向の向きを反対にして配置されている。即ち、一方の遮光部材６４のＸ方向における上流側側面と、他方の遮光部材６５のＸ方向における下流側側面とは、波状に形成され、一方の遮光部材６４の下流側側面と、他方の遮光部材６５の上流側側面とは、Ｙ方向に沿った直線状に形成される。 The light shielding members 64 and 65 are arranged in the same shape having a width w5 in which one side surface in the X direction is linear along the Y direction and the other side surface in the X direction is corrugated, and the X direction is opposite to each other. ing. That is, the upstream side surface in the X direction of one light shielding member 64 and the downstream side surface in the X direction of the other light shielding member 65 are formed in a wave shape, and the downstream side surface of one light shielding member 64 and the other light shielding surface. The upstream side surface of the member 65 is linearly formed along the Y direction.

従って、この遮光部材６４，６５を用いたスキャン露光装置１では、第１実施形態と同様、基板Ｗの非露光領域ＮＲ上に遮光領域を形成する場合には、図９（ａ）に示すように、非露光領域ＮＲの幅に合わせて、一方の遮光部材６４の波状の上流側側面と他方の遮光部材６５の波状の下流側側面とをオーバーラップさせた状態で、これら遮光部材６４，６５を基板Ｗの搬送と同速度で移動させる。これにより、露光領域ＥＲと被露光領域ＮＲ（遮光領域）との境界が一方の遮光部材６４の直線状の下流側側面と、他方の遮光部材６５の直線状の上流側側面とで形成されるので、該境界をくっきりと露光転写することができる。 Therefore, in the scan exposure apparatus 1 using the light shielding members 64 and 65, as in the first embodiment, when the light shielding region is formed on the non-exposure region NR of the substrate W, as shown in FIG. In addition, in accordance with the width of the non-exposure region NR, the light shielding members 64 and 65 are overlapped with the waved upstream side surface of one light shielding member 64 and the waved downstream side surface of the other light shielding member 65. Are moved at the same speed as the transfer of the substrate W. Thereby, the boundary between the exposure region ER and the exposed region NR (light shielding region) is formed by the linear downstream side surface of one light shielding member 64 and the linear upstream side surface of the other light shielding member 65. Therefore, the boundary can be clearly exposed and transferred.

一方、戻し工程では、図９（ｂ）に示すように、できるだけ重ね代を大きして、一方の遮光部材６４の直線状の下流側側面と他方の遮光部材６５の直線状の上流側側面とをオーバーラップさせた状態で、これら遮光部材６４，６５を高速で搬送方向と反対に戻す。これにより、一方の遮光部材６４の波状の上流側側面と他方の遮光部材６５の波状の下流側側面の影をぼかすことができ、露光への影響を抑えることができる。なお、その他の構成及び作用については、第１実施形態のものと同様である。また、この場合、２つの遮光部材６４，６５の下方に他の遮光部材を設け、他の遮光部材を最も上流側と最も下流側に配置して遮光を行なってもよい。 On the other hand, in the returning step, as shown in FIG. 9B, the overlap margin is made as large as possible, and the linear downstream side surface of one light shielding member 64 and the linear upstream side surface of the other light shielding member 65 The light shielding members 64 and 65 are returned to the direction opposite to the conveying direction at a high speed in a state where they are overlapped. Thereby, the shadow of the wavy upstream side surface of one light shielding member 64 and the wavy downstream side surface of the other light shielding member 65 can be blurred, and the influence on exposure can be suppressed. Other configurations and operations are the same as those in the first embodiment. In this case, another light shielding member may be provided below the two light shielding members 64 and 65, and the other light shielding members may be arranged on the most upstream side and the most downstream side to perform light shielding.

尚、本発明は、前述した実施形態に限定されるものではなく、適宜、変形、改良、等が可能である。
なお、上記実施形態では、最も高く配置された遮光部材のＸ方向両側面の波形状は、遮光部材の面に沿って形成されているが、立体的に形成されてもよい。 In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably.
In addition, in the said embodiment, although the wave shape of the X direction both sides | surfaces of the light shielding member arrange | positioned highest is formed along the surface of a light shielding member, you may form in three dimensions.

例えば、上記実施形態においては、基板搬送機構１０は、浮上ユニット１６と基板駆動ユニット１７によって基板Ｗを浮上して保持しながら搬送する場合について述べたが、これに限らず、基板Ｗを上面に載置しながら保持及び搬送するものであってもよい。 For example, in the above-described embodiment, the case where the substrate transport mechanism 10 transports the substrate W while being floated and held by the floating unit 16 and the substrate driving unit 17 is described. You may hold | maintain and convey while mounting.

本発明の実施形態である近接スキャン露光装置の平面図である。It is a top view of the proximity scanning exposure apparatus which is embodiment of this invention. 図１における近接スキャン露光装置の正面図である。It is a front view of the proximity scan exposure apparatus in FIG. 本実施形態の遮光部材とマスクのパターンとを示す斜視図である。It is a perspective view which shows the light shielding member and mask pattern of this embodiment. 非露光領域を有する基板を示す図である。It is a figure which shows the board | substrate which has a non-exposure area | region. 遮光工程における遮光部材の位置関係を示し、（ａ）は側面図であり、（ｂ）は上面図である。The positional relationship of the light shielding member in a light shielding process is shown, (a) is a side view, and (b) is a top view. 戻し工程における遮光部材の位置関係を示し、（ａ）は側面図であり、（ｂ）は上面図である。The positional relationship of the light-shielding member in a return process is shown, (a) is a side view, (b) is a top view. 本実施形態の変形例における遮光部材とマスクのパターンとを示す斜視図である。It is a perspective view which shows the light shielding member and the pattern of a mask in the modification of this embodiment. 本発明の第２実施形態に係る遮光部材とマスクのパターンとを示す斜視図である。It is a perspective view which shows the light shielding member and mask pattern which concern on 2nd Embodiment of this invention. （ａ）は、遮光工程における遮光部材の位置関係を示す上面図であり、（ｂ）は、戻し工程における遮光部材の状態を示す上面図である。(A) is a top view which shows the positional relationship of the light shielding member in a light-shielding process, (b) is a top view which shows the state of the light-shielding member in a return process.

符号の説明Explanation of symbols

１近接スキャン露光装置
１０基板搬送機構
１１マスク保持部
１３照射部
１４遮光部
６０第１の遮光部材
６１第２の遮光部材
６２第３の遮光部材
６３第４の遮光部材
６４，６５遮光部材
ＥＬ露光用光
Ｍマスク
Ｗガラス基板 DESCRIPTION OF SYMBOLS 1 Proximity scanning exposure apparatus 10 Substrate conveyance mechanism 11 Mask holding part 13 Irradiation part 14 Light shielding part 60 1st light shielding member 61 2nd light shielding member 62 3rd light shielding member 63 4th light shielding member 64, 65 Light shielding member EL Exposure Optical M Mask W Glass substrate

Claims

所定の方向に沿って基板を搬送可能な基板搬送機構と、
複数のマスクをそれぞれ保持する複数のマスク保持部と、
前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、
前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、
を備え、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置であって、
前記各遮光部は、それぞれ異なる高さで移動可能に配置される複数の遮光部材を有し、
最も高い位置に配置される前記遮光部材は、前記所定の方向における幅が残りの遮光部材のものより広いことを特徴とするスキャン露光装置。 A substrate transport mechanism capable of transporting a substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiation units that are respectively disposed above the plurality of mask holding units and irradiate the exposure light;
A plurality of light shielding portions arranged between each of the irradiation units and each of the mask holding units, for shielding the exposure light emitted from the irradiation unit;
A scanning exposure apparatus that irradiates the substrate transported in the predetermined direction with exposure light through the mask and exposes the pattern of the mask on the substrate,
Each of the light shielding portions has a plurality of light shielding members arranged to be movable at different heights,
The scanning exposure apparatus characterized in that the light shielding member arranged at the highest position has a width in the predetermined direction wider than that of the remaining light shielding members.

前記最も高い位置に配置される前記遮光部材は、前記所定の方向における両側面が、前記所定の方向と直交する方向に対して傾斜して、或いは、曲線状に設けられていることを特徴とする請求項１に記載のスキャン露光装置。 The light-shielding member arranged at the highest position is characterized in that both side surfaces in the predetermined direction are inclined or curved in a direction orthogonal to the predetermined direction. The scan exposure apparatus according to claim 1.

前記最も高く配置される前記遮光部材は、前記所定の方向における両側面が、波状に形成されていることを特徴とする請求項２に記載のスキャン露光装置。 The scan exposure apparatus according to claim 2, wherein the light shielding member arranged highest is formed in a wave shape on both side surfaces in the predetermined direction.

所定の方向に沿って基板を搬送可能な基板搬送機構と、
複数のマスクをそれぞれ保持する複数のマスク保持部と、
前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、
前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、
を備え、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置であって、
前記各遮光部は、それぞれ異なる高さで移動可能に配置される少なくとも２枚の遮光部材を有し、
前記２枚の遮光部材の一方の前記所定の方向における上流側側面と、前記他方の遮光部材の前記所定の方向における下流側側面とは、前記所定の方向と直交する方向に対して傾斜して、或いは、曲線状に形成され、前記一方の遮光部材の下流側側面と、前記他方の遮光部材の上流側側面とは、前記直交方向に沿った直線状に形成されることを特徴とするスキャン露光装置。 A substrate transport mechanism capable of transporting a substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiation units that are respectively disposed above the plurality of mask holding units and irradiate the exposure light;
A plurality of light shielding portions arranged between each of the irradiation units and each of the mask holding units, for shielding the exposure light emitted from the irradiation unit;
A scanning exposure apparatus that irradiates the substrate transported in the predetermined direction with exposure light through the mask and exposes the pattern of the mask on the substrate,
Each of the light-shielding portions has at least two light-shielding members arranged to be movable at different heights,
The upstream side surface in one predetermined direction of the two light shielding members and the downstream side surface in the predetermined direction of the other light shielding member are inclined with respect to a direction orthogonal to the predetermined direction. Alternatively, the scan is formed in a curved shape, and the downstream side surface of the one light shielding member and the upstream side surface of the other light shielding member are formed in a straight line along the orthogonal direction. Exposure device.

所定の方向に沿って基板を搬送可能な基板搬送機構と、複数のマスクをそれぞれ保持する複数のマスク保持部と、前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、を備え、該各遮光部は、それぞれ異なる高さで移動可能に配置される少なくとも３枚の遮光部材を有し、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置のスキャン露光方法であって、
前記基板が前記マスクの下方で搬送されている状態で、前記複数の遮光部材を前記基板と同速度で前記所定の方向に移動させることによって、前記マスクのパターンを遮光して前記基板に遮光領域を形成する工程と、
前記基板が前記マスクの下方で搬送されている状態で、前記マスクに対して下流側に移動した後の前記複数の遮光部材を前記所定の方向と反対方向に移動させ、前記露光中の前記マスクのパターンを横切って、前記マスクに対して上流側に戻す工程と、
を有し、
前記遮光工程は、下から２枚の前記遮光部材を最も上流側と最も下流側に配置した状態で行なわれ、
前記戻し工程は、最も高く配置される前記所定の方向における幅が最も広い前記遮光部材の下方に、前記残りの遮光部材を配置した状態で行なわれることを特徴とするスキャン露光方法。 A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of mask holders, respectively, are disposed above the plurality of mask holders and irradiates the exposure light. A plurality of irradiation units, and a plurality of light shielding units that are arranged between the irradiation units and the mask holding units and shield the exposure light emitted from the irradiation units, respectively, The unit includes at least three light-shielding members that are movably arranged at different heights, irradiates exposure light through the mask to the substrate transported in the predetermined direction, and the substrate A scan exposure method of a scan exposure apparatus that exposes the mask pattern to:
With the substrate being transported under the mask, the plurality of light shielding members are moved in the predetermined direction at the same speed as the substrate, thereby shielding the mask pattern and shielding the substrate from the light shielding region. Forming a step;
In a state where the substrate is transported under the mask, the plurality of light shielding members after moving downstream with respect to the mask are moved in a direction opposite to the predetermined direction, and the mask being exposed Crossing the pattern and returning to the upstream side with respect to the mask;
Have
The light shielding step is performed in a state where the two light shielding members from the bottom are arranged on the most upstream side and the most downstream side,
The scanning exposure method, wherein the returning step is performed in a state where the remaining light shielding member is disposed below the light shielding member having the widest width in the predetermined direction.

所定の方向に沿って基板を搬送可能な基板搬送機構と、複数のマスクをそれぞれ保持する複数のマスク保持部と、前記複数のマスク保持部の上方にそれぞれ配置され、前記露光用光を照射する複数の照射部と、前記各照射部と前記各マスク保持部との間にそれぞれ配置され、前記照射部から出射された前記露光用光を遮光する複数の遮光部と、を備え、該各遮光部は、それぞれ異なる高さで移動可能に配置される少なくとも２枚の遮光部材を有し、該２枚の遮光部材の一方の前記所定の方向における上流側側面と、前記他方の遮光部材の前記所定の方向における下流側側面とは、前記所定の方向と直交する方向に対して傾斜して、或いは、曲線状に形成され、前記一方の遮光部材の下流側側面と、前記他方の遮光部材の上流側側面とは、前記直交方向に沿った直線状に形成されており、前記所定の方向に搬送される基板に対して前記マスクを介して露光用光を照射し、前記基板に前記マスクのパターンを露光するスキャン露光装置のスキャン露光方法であって、
前記基板が前記マスクの下方で搬送されている状態で、前記遮光部材を前記基板と同速度で前記所定の方向に移動させることによって、前記マスクのパターンを遮光して前記基板に遮光領域を形成する工程と、
前記基板が前記マスクの下方で搬送されている状態で、前記マスクに対して下流側に移動した後の前記複数の遮光部材を前記所定の方向と反対方向に移動させ、前記露光中の前記マスクのパターンを横切って、前記マスクに対して上流側に戻す工程と、
を有し、
前記遮光工程は、前記一方の遮光部材の上流側側面と前記他方の遮光部材の下流側側面とをオーバーラップさせた状態で行なわれ、
前記戻し工程は、前記一方の遮光部材の下流側側面と前記他方の遮光部材の上流側側面とをオーバーラップさせた状態で行なわれることを特徴とするスキャン露光方法。 A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of mask holders, respectively, are disposed above the plurality of mask holders and irradiates the exposure light. A plurality of irradiation units, and a plurality of light shielding units that are arranged between the irradiation units and the mask holding units and shield the exposure light emitted from the irradiation units, respectively, The portion includes at least two light shielding members that are movably arranged at different heights, and the upstream side surface of one of the two light shielding members in the predetermined direction and the other light shielding member The downstream side surface in the predetermined direction is inclined or curved with respect to the direction orthogonal to the predetermined direction, and the downstream side surface of the one light shielding member and the other light shielding member The upstream side surface is the above A scanning exposure apparatus that is formed in a straight line along the intersecting direction and irradiates the substrate with the exposure light through the mask and exposes the mask pattern onto the substrate. Scanning exposure method of
With the substrate being transported under the mask, the light shielding member is moved in the predetermined direction at the same speed as the substrate, thereby shielding the mask pattern and forming a light shielding region on the substrate. And a process of
In a state where the substrate is transported under the mask, the plurality of light shielding members after moving downstream with respect to the mask are moved in a direction opposite to the predetermined direction, and the mask being exposed Crossing the pattern and returning to the upstream side with respect to the mask;
Have
The light shielding step is performed in a state where the upstream side surface of the one light shielding member and the downstream side surface of the other light shielding member are overlapped,
The scanning exposure method, wherein the returning step is performed in a state where a downstream side surface of the one light shielding member and an upstream side surface of the other light shielding member overlap each other.